CN106277816A - The multistage atmosphere isolation device of coating film production line - Google Patents
The multistage atmosphere isolation device of coating film production line Download PDFInfo
- Publication number
- CN106277816A CN106277816A CN201610616844.8A CN201610616844A CN106277816A CN 106277816 A CN106277816 A CN 106277816A CN 201610616844 A CN201610616844 A CN 201610616844A CN 106277816 A CN106277816 A CN 106277816A
- Authority
- CN
- China
- Prior art keywords
- isolation
- atmosphere
- production line
- coating film
- narrow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
Abstract
The present invention relates to a kind of multistage atmosphere isolation device of coating film production line, for isolating the work atmosphere of adjacent two coating chambers in coating film production line, adjacent successively including at least two and that separate mutually with dividing plate isolation room and at least two connect the vacuum pump arranged with described isolation room one_to_one corresponding, being additionally provided with two ends in the middle part of described dividing plate and be respectively communicated with the narrow-gap channel of described adjacent two isolation rooms, the two ends of the passage wallboard of the both sides up and down of described narrow-gap channel are definite length extended in two isolation rooms that described narrow-gap channel is connected respectively from described dividing plate.The present invention is on traditional air pocket isolation method basis, increase the progression of air pocket isolation, the most also coordinate and use narrow-gap channel to connect adjacent isolation room and realize the isolation of isolation effect more preferable slit, so that the gas isolating effect promoting of whole isolating device, can effectively meet the gas isolating demand of high-precision requirement, being especially suitable for such as IMITO etc. needs kinds of processes atmosphere to synchronize the coating process of work continuously.
Description
Technical field
The present invention relates to substrate film coating production technical field, particularly relate to a kind of coating film production line multistage gas isolating dress
Put.
Background technology
In glass substrate plated film produces, IMITO technique (disappear shadow ITO) makes by introducing optical film (AR film)
The reflectance of ITO sensor layer is equal to AR film layer, so that naked eyes None-identified ITO sensor layer, reaches " disappear shadow "
Effect.IMITO process requirements plating membrane production equipment possesses SiO2+ ITO connection plating function, but, SiO in PVD equipment2One-tenth
Film atmosphere differs huge with ITO, for realizing connection plating function, it is necessary to be equipped with efficient atmosphere isolation device.
Existing atmosphere isolation device mainly has two kinds: rotating room (Rotary chamber) the gentle trap type of isolating device every
From device.Wherein, rotating room's isolating device can play good gas isolating effect, but, this isolating device is specific to
AR film plated film type, high cost；And although air pocket formula isolating device is with low cost, but, its gas isolating effect is limited, nothing
Method meets the Production requirement of IMITO technique.
Summary of the invention
The technical problem to be solved is, it is provided that a kind of multistage atmosphere isolation device of coating film production line, to carry
Rise gas isolating effect.
For solving above-mentioned technical problem, the present invention provides following technical scheme: a kind of multistage gas isolating of coating film production line
Device, for isolating the work atmosphere of adjacent two coating chambers in coating film production line, adjacent successively including at least two and with every
Isolation room and at least two that plate separates mutually connect the vacuum pump arranged, in described dividing plate with described isolation room one_to_one corresponding
Portion is additionally provided with two ends and is respectively communicated with the narrow-gap channel of described adjacent two isolation rooms, the conduit wall of the both sides up and down of described narrow-gap channel
The two ends of plate are definite length extended in two isolation rooms that described narrow-gap channel is connected respectively from described dividing plate.
Further, the isolation room being positioned at two ends in described at least two isolation room is respectively equipped with and corresponding plating
The slit groove that film room connects, the cell wall plate of the both sides up and down of described slit groove is respectively facing internal extension of isolation room and makes a reservation for
Length.
Further, the length to height ratio of described narrow-gap channel is in the range of 54:500 ~ 58:500.
Further, the length to height ratio of described slit groove of entrance side it is positioned in the range of 70:600 ~ 80:600；It is positioned at
The length to height ratio of the described slit groove of mouth side is in the range of 54:600 ~ 58:600.
After using technique scheme, the present invention at least has the advantages that the present invention is by arranging at least two
Adjacent isolation room, and connect vacuum pump correspondingly to carry out evacuation process for each isolation room, it is achieved multistage gas
Trap type is isolated, and twisted molecular layer atmosphere the evolving path reaches gas isolating effect；And, between adjacent isolation room also by
Narrow-gap channel is connected, and slit isolation can limit atmosphere diffusion more efficiently.The present invention is at traditional air pocket isolation method base
On plinth, increase the progression of air pocket isolation, the most also coordinate and use narrow-gap channel to connect adjacent isolation room and realize isolation effect
Fruit preferably slit isolation, so that the gas isolating of whole isolating device is effective, can effectively meet the gas of high-precision requirement
Atmosphere isolation requirement, being especially suitable for such as IMITO etc. needs kinds of processes atmosphere to synchronize the coating process of work continuously.
Accompanying drawing explanation
Fig. 1 is the structural principle schematic diagram of coating film production line atmosphere isolation device of the present invention.
Detailed description of the invention
With specific embodiment, the application is described in further detail below in conjunction with the accompanying drawings.Should be appreciated that following signal
Property embodiment and explanation only be used for explain the present invention, not as a limitation of the invention, and, in the case of not conflicting,
Embodiment in the application and the feature in embodiment can be combined with each other.
The embodiment of the present invention provides a kind of multistage atmosphere isolation device of coating film production line, for isolating in coating film production line
The work atmosphere of adjacent two coating chambers, such as: be arranged at SiO2Between coating chamber and ITO coating chamber, to avoid SiO2Coating chamber and
The work atmosphere of ITO coating chamber interpenetrates, thus ensures SiO2The plated film quality of plated film and ITO plated film.
As it is shown in figure 1, the multistage atmosphere isolation device of described coating film production line includes that at least two adjoins and successively with dividing plate
Isolation room 1 and at least two that 10 phases separate connect the vacuum pump 2 arranged with described isolation room 1 one_to_one corresponding.Such as Fig. 1 institute
In the embodiment shown, described isolation room 1 is provided with altogether 4, it is to be understood that the quantity of isolation room 1 can be according to actual need
Want and increase and decrease, but usually less than 2.In the middle part of described dividing plate 10, it is additionally provided with two ends is respectively communicated with adjacent two isolation rooms 1
Narrow-gap channel 12, the two ends of the passage wallboard 14,16 of the both sides up and down of described narrow-gap channel 12 from described dividing plate 10 respectively to
Definite length extended in adjacent two isolation rooms 1 that described narrow-gap channel 12 is connected.Alternatively, the growing tall of described narrow-gap channel 12
Ratio is in the range of 54:500 ~ 58:500.Usually, the ratio that grows tall of narrow-gap channel 12 is the biggest, and gas isolating effect is the best.And
During actual enforcement, the height of described narrow-gap channel 12 may be designed as meeting and installs corresponding conveyer belt and ensure that workpiece can be with transmission
Band passes unopposed through the minimum constructive height of described narrow-gap channel 12 together, thus to promote gas isolating effect.
Heater element array 15 also can be set at the top of each isolation room 1, can be movement inside isolation room 1
Glass substrate heats, and it is mainly in the mode of heat radiation and slight conduction of heat for the hot heat output of glass substrate, effectively to protect
Hold the temperature of glass substrate in the range of suitably.
Described at least two isolation room 1 is sequentially connected in series setting, wherein, be positioned at the isolation room 1 at two ends be respectively equipped with
The slit groove 17 that a corresponding coating chamber 3,4 connects, the cell wall plate 18 of the both sides up and down of described slit groove 17 is respectively
Towards the internal definite length extended of isolation room 1.Described slit groove 18 is substantially identical with the principle of described narrow-gap channel 12,
The effect of gas isolating is played between isolation room and the coating chamber in the external world.It is positioned at the length to height ratio of the described slit groove 18 of entrance side
In the range of 70:600 ~ 80:600；It is positioned at the length to height ratio of described slit groove 18 of outlet side in the range of 54:600 ~ 58:
600。
The present invention is by arranging the adjacent isolation room of at least two 1, and is that each isolation room 1 connects very correspondingly
Empty pump 2 carries out evacuation process, it is achieved multistage air pocket formula is isolated, and twisted molecular layer atmosphere the evolving path reaches gas isolating
Effect；And, it being connected also by narrow-gap channel 12 between adjacent isolation room 1, slit isolation can limit gas more efficiently
Atmosphere spreads.The present invention, on traditional air pocket isolation method basis, increases the progression of air pocket isolation, coordinates simultaneously and use slit
Passage 12 connects adjacent isolation room 1 and realizes the isolation of isolation effect more preferable slit, so that the atmosphere of whole isolating device
Isolation effect is more preferable, can effectively meet the gas isolating demand of high-precision requirement.Also can be further in isolation room 1 and corresponding plating
Also design slit groove 18 between film room, and gas isolating effect can be promoted further.
Although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, permissible
Understand and these embodiments can be carried out multiple change without departing from the principles and spirit of the present invention, revise, replace
And modification, the scope of the present invention is limited by claims and equivalency range thereof.
Claims (4)
1. the multistage atmosphere isolation device of coating film production line, for isolating the work of adjacent two coating chambers in coating film production line
Atmosphere, it is characterised in that described atmosphere isolation device include that at least two is adjacent successively and the isolation room that separates mutually with dividing plate with
And at least two connects the vacuum pump arranged with described isolation room one_to_one corresponding, in the middle part of described dividing plate, it is additionally provided with two ends connects respectively
The narrow-gap channel of logical described adjacent two isolation rooms, the two ends of the passage wallboard of the both sides up and down of described narrow-gap channel are from described dividing plate
Definite length extended in two isolation rooms that described narrow-gap channel is connected respectively.
2. the multistage atmosphere isolation device of coating film production line as claimed in claim 1, it is characterised in that described at least two is isolated
The isolation room being positioned at two ends in room is respectively equipped with the slit groove connected with corresponding coating chamber, described slit groove
The cell wall plate of both sides up and down be respectively facing the internal definite length extended of isolation room.
3. the multistage atmosphere isolation device of coating film production line as claimed in claim 1, it is characterised in that the length of described narrow-gap channel
High ratio is in the range of 54:500 ~ 58:500.
4. coating film production line atmosphere isolation device as claimed in claim 2, it is characterised in that be positioned at the described slit of entrance side
The length to height ratio of groove is in the range of 70:600 ~ 80:600；It is positioned at the length to height ratio of described slit groove of outlet side in the range of 54:
600~58:600。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610616844.8A CN106277816B (en) | 2016-07-29 | 2016-07-29 | Coating film production line multistage atmosphere isolation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610616844.8A CN106277816B (en) | 2016-07-29 | 2016-07-29 | Coating film production line multistage atmosphere isolation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106277816A true CN106277816A (en) | 2017-01-04 |
| CN106277816B CN106277816B (en) | 2019-08-23 |
Family
ID=57663433
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610616844.8A Active CN106277816B (en) | 2016-07-29 | 2016-07-29 | Coating film production line multistage atmosphere isolation device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106277816B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113774354B (en) * | 2021-08-24 | 2024-04-26 | 中国建材国际工程集团有限公司 | Novel gas isolation device and magnetron sputtering continuous coating line and working method |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4369730A (en) * | 1981-03-16 | 1983-01-25 | Energy Conversion Devices, Inc. | Cathode for generating a plasma |
| EP0076426A2 (en) * | 1981-09-28 | 1983-04-13 | Energy Conversion Devices, Inc. | Multiple chamber deposition and isolation system and method |
| CN2067711U (en) * | 1989-05-06 | 1990-12-19 | 中科院上海硅酸盐研究所 | Gas seperating device for continuous processing equipment with multi-chamber |
| US5946587A (en) * | 1992-08-06 | 1999-08-31 | Canon Kabushiki Kaisha | Continuous forming method for functional deposited films |
| CN101428973A (en) * | 2008-11-19 | 2009-05-13 | 苏州新爱可镀膜设备有限公司 | Magnetic controlled film coating chamber for film coating glass |
| CN101962755A (en) * | 2010-09-30 | 2011-02-02 | 深圳市金凯新瑞光电有限公司 | Continuous multiple sputter coating chamber atmosphere isolation system |
| CN102534538A (en) * | 2010-12-17 | 2012-07-04 | 上海空间电源研究所 | Atmosphere isolation device between vacuum chambers |
| TW201447008A (en) * | 2013-06-03 | 2014-12-16 | Adpv Technology Ltd | Gas reaction continuous chamber and gas reaction method |
-
2016
- 2016-07-29 CN CN201610616844.8A patent/CN106277816B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4369730A (en) * | 1981-03-16 | 1983-01-25 | Energy Conversion Devices, Inc. | Cathode for generating a plasma |
| EP0076426A2 (en) * | 1981-09-28 | 1983-04-13 | Energy Conversion Devices, Inc. | Multiple chamber deposition and isolation system and method |
| CN2067711U (en) * | 1989-05-06 | 1990-12-19 | 中科院上海硅酸盐研究所 | Gas seperating device for continuous processing equipment with multi-chamber |
| US5946587A (en) * | 1992-08-06 | 1999-08-31 | Canon Kabushiki Kaisha | Continuous forming method for functional deposited films |
| CN101428973A (en) * | 2008-11-19 | 2009-05-13 | 苏州新爱可镀膜设备有限公司 | Magnetic controlled film coating chamber for film coating glass |
| CN101962755A (en) * | 2010-09-30 | 2011-02-02 | 深圳市金凯新瑞光电有限公司 | Continuous multiple sputter coating chamber atmosphere isolation system |
| CN102534538A (en) * | 2010-12-17 | 2012-07-04 | 上海空间电源研究所 | Atmosphere isolation device between vacuum chambers |
| TW201447008A (en) * | 2013-06-03 | 2014-12-16 | Adpv Technology Ltd | Gas reaction continuous chamber and gas reaction method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113774354B (en) * | 2021-08-24 | 2024-04-26 | 中国建材国际工程集团有限公司 | Novel gas isolation device and magnetron sputtering continuous coating line and working method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106277816B (en) | 2019-08-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| SG152213A1 (en) | Multi-port pumping system for substrate processing chambers | |
| CN104046960B (en) | A kind of gas distributor being applied to film deposition techniques | |
| CN106463365A (en) | Substrate support with more uniform edge purge | |
| CN107164742A (en) | Vacuum chamber with shared pump | |
| CN103866288A (en) | Reaction unit and method for atom layer film deposition | |
| CN109906498A (en) | Integrated direct dielectric and metal deposit | |
| TWI658167B (en) | Apparatus for distributing gas and apparatus for processing substrate including the same | |
| CN106277816A (en) | The multistage atmosphere isolation device of coating film production line | |
| US9490152B2 (en) | Asymmetrical chamber configuration | |
| CN103591777A (en) | Combined type vacuum oven suitable for being used in lithium battery processing process | |
| CN203586695U (en) | Combined vacuum oven applied in lithium battery processing process | |
| CN103774120A (en) | Gas uniformizing device for PECVD (Plasma Enhanced Chemical Vapor Deposition) system | |
| CN203382068U (en) | Vacuum adsorption conveying synchronous belt | |
| CN105336640A (en) | Reaction cavity and reaction equipment | |
| CN209652421U (en) | A kind of feeding system suitable for ultra-large atomic layer deposition | |
| CN104979249B (en) | Air inlet-outlet device, the bench heat treater with air inlet-outlet device and disengaging gas method | |
| CN104103482B (en) | Wafer process cavity | |
| CN204834655U (en) | High temperature diffusion stove and be used for its diffusion of gases shower | |
| CN103882397B (en) | Reaction chamber and magnetron sputtering equipment | |
| CN211339682U (en) | Film coating equipment | |
| TW201242070A (en) | Systems and methods for mutli-chamber photovoltaic module processing | |
| CN110408913A (en) | The pressure control device of Tubular PECVD device | |
| CN207031539U (en) | For producing the coating apparatus of coated glass | |
| CN105697332A (en) | Vacuum exhaust table | |
| CN206735362U (en) | Vacuum cup |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20201214 Address after: 201100 4a, building 1, No.1000 Qishen Road, Minhang District, Shanghai Patentee after: Aifake (China) Investment Co.,Ltd. Address before: 518000 2nd floor, Haowei building, Langshan No.2 Road, North District, Nanshan District, Shenzhen City, Guangdong Province Patentee before: ULVAC HIVAC OPTOELECTRONIC FILMS (SHENZHEN) Co.,Ltd. |