CN110408913A - The pressure control device of Tubular PECVD device - Google Patents
The pressure control device of Tubular PECVD device Download PDFInfo
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- CN110408913A CN110408913A CN201910790348.8A CN201910790348A CN110408913A CN 110408913 A CN110408913 A CN 110408913A CN 201910790348 A CN201910790348 A CN 201910790348A CN 110408913 A CN110408913 A CN 110408913A
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- reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Abstract
The invention discloses the pressure control devices of Tubular PECVD device, including at least one set of reaction chamber, every group of reaction chamber is correspondingly provided with VAT valve and main pumping pump, each group reaction chamber shares a forepump, every group of reaction chamber includes the first reaction chamber and the second reaction chamber, the first reaction chamber in every group of reaction chamber is connected to by the first main line with main pumping pump, second reaction chamber is connected to by the second main line with main pumping pump, first main line formation confluence pipeline in parallel with the second main line, the pipeline that converges is connected with main pumping pump, VAT valve is set to collecting pipe road, the first reaction chamber in each group reaction chamber passes through the first bye-pass and connect with forepump, the second reaction chamber in each group reaction chamber passes through the second bye-pass and connect with forepump.When core of the invention is that two pipes share main pumping pump, technical process is staggered, and being equivalent to moment all only one main pumping pumps is a reaction chamber job, remaining time another pipe is worked using forepump, greatly reduces the cost of equipment.
Description
Technical field
The present invention relates to the pressure controls of Tubular PECVD device more particularly to a kind of Tubular PECVD device in photovoltaic manufacture
Device processed.
Background technique
Tubular type PECVD is photovoltaic manufacturing field essential equipment, in recent years, with the swift and violent hair of China's photovoltaic industry
Exhibition, photovoltaic products have come into our life, photovoltaic products popularize it is adjoint be product cost reduction, production electricity
Most derives from equipment to the cost of pond piece, so, how to try every possible means to reduce equipment cost, becomes present photovoltaic apparatus research
Importance.
The existing general every pipe of tubular type PECVD (reaction chamber) pumps with one, individually controls between every pipe, and cost is relatively high,
It is that two pipes share a biggish vacuum pump of power ratio, that is, are equivalent to a pump while taking out two there are also a kind of technical solution
Pipe.This scheme is more lower than the first cost, but the power pumped, than original increasing, cost does not reduce more yet
It is few, how with powerful pump is not added to realize that two pipes vacuumize, becomes the key for reducing cost.
Summary of the invention
The technical problem to be solved by the present invention is to overcome the deficiencies in the prior art, provide a kind of tubular type effectively reduced cost
The pressure control device of PECVD device.
In order to solve the above technical problems, the invention adopts the following technical scheme:
A kind of pressure control device of Tubular PECVD device, including at least one set of reaction chamber, every group of reaction chamber are correspondingly provided with
VAT valve and main pumping pump, each group reaction chamber share a forepump, and every group of reaction chamber includes the first reaction chamber and the second reaction chamber,
The first reaction chamber in every group of reaction chamber is connected to by the first main line with main pumping pump, and the second reaction chamber in every group of reaction chamber is logical
It crosses the second main line to be connected to main pumping pump, and the first main line formation confluence pipeline in parallel with the second main line, the collecting pipe
Lu Yuzhu takes out pump connection, and the VAT valve is set to collecting pipe road, and the first reaction chamber in each group reaction chamber passes through the first branch pipe
Road is connect with forepump, and the second reaction chamber in each group reaction chamber passes through the second bye-pass and connect with forepump.
As a further improvement of the above technical scheme:
First main line is advised equipped with the first film.
First bye-pass is set on the first main line, and is located at the upstream of VAT valve, and the first film rule are located at the
The upstream of one bye-pass.
Second main line is advised equipped with the second film.
Second bye-pass is set on the second main line, and is located at the upstream of VAT valve, and second film rule are located at the
The upstream of two bye-passes.
The position that first main line corresponds to the first film rule is equipped with first pressure valve.
The position of the corresponding second film rule of second main line is equipped with second pressure valve.
The first main pumping valve, second supervisor are equipped on first main line between the first bye-pass and confluence pipeline
Road is equipped with the second main pumping valve between the second bye-pass and confluence pipeline.
First bye-pass is equipped with the first pre- pumping valve, and second bye-pass is equipped with second and takes out valve in advance.
Compared with the prior art, the advantages of the present invention are as follows:
The pressure control device of Tubular PECVD device of the invention is taken out two pipe vacuum using small-power pump, increased simultaneously
One common forepump, by taking ten pipes as an example, ten pipes share 6 pumps, achieve the purpose that reduce cost, core of the invention is
Under the premise of not influencing reaction chamber normal process flow, the cost of equipment is greatly reduced, because when two pipes share main pumping pump,
Its technical process is staggered, and being equivalent to moment all only one main pumping pumps is a reaction chamber job, remaining time another pipe
It is worked using shared forepump.Meanwhile integrating the vacuum pipe of two pipes, occupied space is also reduced, equipment is made
Degree of integration is higher.
Detailed description of the invention
Fig. 1 is the schematic diagram of one group of reaction chamber in the present invention.
Fig. 2 is the schematic diagram of two groups of reaction chambers in the present invention.
Fig. 3 is the structural schematic diagram of each pipeline and each valve interface in the present invention.
Each label indicates in figure:
1, VAT valve；2, main pumping pump；3, forepump；4, the first reaction chamber；5, the second reaction chamber；6, the first main line；7,
Two main lines；8, converge pipeline；9, the first bye-pass；10, the second bye-pass；11, the first film is advised；12, the second film is advised；
13, first pressure valve；14, second pressure valve；15, the first main pumping valve；16, the second main pumping valve；17, the first pre- pumping valve；18, second
It is pre- to take out valve.
Specific embodiment
Below in conjunction with Figure of description and specific embodiment, invention is further described in detail.
The pressure control device of the Tubular PECVD device of the present embodiment, for there are five groups of (ten pipes) reaction chambers.Every group
Reaction chamber is correspondingly provided with a VAT valve 1 and a main pumping pump 2, and five groups of reaction chambers share a forepump 3, every group of reaction chamber packet
The first reaction chamber 4 and the second reaction chamber 5 are included, the first reaction chamber 4 in every group of reaction chamber passes through the first main line 6 and main pumping pump 2
Connection, the second reaction chamber 5 in every group of reaction chamber pump 2 with main pumping by the second main line 7 and are connected to, and the first main line 6 and the
Two main line 7 is in parallel to form confluence pipeline 8, and confluence pipeline 8 is connect with main pumping pump 2, and VAT valve 1 is set on confluence pipeline 8, and five groups
The first reaction chamber 4 in reaction chamber is connect by the first bye-pass 9 with forepump 3, the second reaction chamber 5 in five groups of reaction chambers
It is connect by the second bye-pass 10 with forepump 3.VAT valve 1 is accurate control butterfly valve, for controlling the first reaction chamber 4 and the
The pressure of two reaction chambers 5.
Fig. 1 shows that one group of schematic diagram in five groups of reaction chambers, Fig. 2 show two groups in five groups of reaction chambers
The connection structure of schematic diagram, excess-three group is similar.Every two pipe shares a low power main pumping pump 2 and is used in ten pipes (reaction chamber)
Main pumping, a powerful forepump 3 pre- pumping shared for ten pipes, only needs 6 pumps, when two pipes work, two in total in this way
The process time of pipe is staggered, and when the first reaction chamber 4 carries out technique, connects the first main line 6 and (needs to open main pumping pump when technique
2 and VAT valve 1 accurately controls the interior pressure of the first reaction chamber 4 at this time, that is, the low power main pumping pump of application is 2), disconnects first
Bye-pass 9, and 5 needs of the second reaction chamber are taken out in advance, connect the second bye-pass 10 (utilize high-power forepump 3, at this time the
Pressure does not need accurately to control in two reaction chambers 5, reaches certain vacuum degree), disconnect the second main line 7.
It is completed when the process time of the first reaction chamber 4, the first main line 6 is cut off, connect the first bye-pass 9, first is anti-
It answers room 4 to connect with forepump 3, disconnects, taken out in advance the stage with main pumping pump 2, simultaneously, connect the second main line 7, disconnection the
Two bye-passes 10, such second reaction chamber 5 connect with main pumping pump 2, disconnect with forepump 3, and the second reaction chamber 5 is after pre- take out
Main pumping can be carried out, carries out technique using the main pumping pump 2 of small-power and shared VAT valve 1.First reaction chamber 41 exhausts it in advance
Afterwards, next round working procedure can be entered.
The present invention is exactly two pipe vacuum to be taken out using small-power pump, simultaneously under the premise of considering prior art disadvantage
Increase a common forepump, in this way, ten pipes share 6 pumps (5 small 1 big), achieving the purpose that reduce cost, (prior art is
10 small pump or 5 high-power pumps).Core of the invention is before not influencing reaction chamber normal process flow
It puts, greatly reduces the cost of equipment, because technical process is staggered, and is equivalent to the moment when two pipes share main pumping pump 2
All only one main pumping pump 2 is a reaction chamber job, remaining time another pipe is worked using forepump 3 is shared.
In the present embodiment, the first main line 6 is equipped with the first film rule 11.First bye-pass 9 is set to the first main line 6
On, and it is located at the upstream of VAT valve 1, the first film rule 11 are located at the upstream of the first bye-pass 9.Second main line 7 is equipped with second
Film rule 12.Second bye-pass 10 is set on the second main line 7, and is located at the upstream of VAT valve 1, and the second film rule 12 are located at the
The upstream of two bye-passes 10.The first film rule 11 are used to measure the pressure of the first reaction chamber 4, and the second film rule 12 are used to measure the
The pressure of two reaction chambers 5, the pressure measured feed back to controller, VAT valve 1 are fed back to according to pressure value by controller, by VAT
Valve 1 adjusts the pressure of each reaction chamber.
In the present embodiment, the position of the corresponding the first film rule 11 of the first main line 6 is equipped with first pressure valve 13.Second supervisor
The position of the corresponding second film rule 12 in road 7 is equipped with second pressure valve 14.When first reaction chamber 4 does not do that technique production is pre- to take out, precision
It is of less demanding, it can be detected with first pressure valve 13, similarly, and when the second reaction chamber 5 does not do that technique production is pre- to take out, required precision
It is not high, it can be detected with second pressure valve 14.The first film rule 11 and the second film rule 12 are anti-in the first reaction chamber 4 and second
Room 5 is answered to detect when doing technique (main pumping).
In the present embodiment, it is equipped with the first main pumping valve 15 between the first bye-pass 9 and confluence pipeline 8 on the first main line 6,
The second main pumping valve 16 is equipped between the second bye-pass 10 and confluence pipeline 8 on second main line 7.First bye-pass 9 is equipped with
First pre- pumping valve 17, the second bye-pass 10 are equipped with the second pre- pumping valve 18.The on-off of each pipeline is controlled by each valve.
Fig. 3 is the structure chart of each valve and pipeline in the present embodiment.A is that layer 5 shares main pumpings 2 interfaces of pump, b the
Two tube reaction room interfaces of five floor, c are the VAT valve 7 of layer 5, and d is layer 5 two pre- pumping valve interfaces, and e is first to the 4th
Main pumpings of sharing of layer pumps 2 interfaces, and f is ten to manage the interfaces for sharing forepump 3, and each layer of roughing pipe all passes through pumping valve d in advance and connects
Mouth (layer 5 d, other each layers are similar) is connected on the interface f of forepump 3.The vacuum pipe of two pipes is integrated,
Occupied space is reduced, keeps the degree of integration of equipment higher.
It should be noted that the present embodiment in addition to the present embodiment, is also possible to by taking five groups of reaction chambers of common ten pipe as an example
It is extra or be less than five groups.
Although the present invention has been disclosed as a preferred embodiment, however, it is not intended to limit the invention.It is any to be familiar with ability
The technical staff in domain, without deviating from the scope of the technical scheme of the present invention, all using the technology contents pair of the disclosure above
Technical solution of the present invention makes many possible changes and modifications or equivalent example modified to equivalent change.Therefore, all
Without departing from the content of technical solution of the present invention, according to the present invention technical spirit any simple modification made to the above embodiment,
Equivalent variations and modification, all shall fall within the protection scope of the technical scheme of the invention.
Claims (9)
1. a kind of pressure control device of Tubular PECVD device, it is characterised in that: including at least one set of reaction chamber, every group of reaction
Room is correspondingly provided with VAT valve (1) and main pumping pump (2), and each group reaction chamber shares a forepump (3), and every group of reaction chamber includes first
Reaction chamber (4) and the second reaction chamber (5), the first reaction chamber (4) in every group of reaction chamber pass through the first main line (6) and main pumpings pump
(2) it is connected to, the second reaction chamber (5) in every group of reaction chamber pumps (2) with main pumping by the second main line (7) and is connected to, and first is main
Pipeline (6) formation confluence pipeline (8) in parallel with the second main line (7), the confluence pipeline (8) pumps (2) with main pumping and connect, described
VAT valve (1) is set in confluence pipeline (8), and the first reaction chamber (4) in each group reaction chamber is by the first bye-pass (9) and pre-
Pump (3) connection is taken out, the second reaction chamber (5) in each group reaction chamber is connect by the second bye-pass (10) with forepump (3).
2. the pressure control device of Tubular PECVD device according to claim 1, it is characterised in that: first supervisor
Road (6) is equipped with the first film rule (11).
3. the pressure control device of Tubular PECVD device according to claim 2, it is characterised in that: first branch pipe
Road (9) is set on the first main line (6), and is located at the upstream of VAT valve (1), and the first film rule (11) are located at the first branch pipe
The upstream on road (9).
4. the pressure control device of Tubular PECVD device according to claim 1, it is characterised in that: second supervisor
Road (7) is equipped with the second film rule (12).
5. the pressure control device of Tubular PECVD device according to claim 4, it is characterised in that: second branch pipe
Road (10) is set on the second main line (7), and is located at the upstream of VAT valve (1), and the second film rule (12) are located at the second branch pipe
The upstream on road (10).
6. the pressure control device of Tubular PECVD device according to claim 3, it is characterised in that: first supervisor
The position of the corresponding the first film rule (11) in road (6) is equipped with first pressure valve (13).
7. the pressure control device of Tubular PECVD device according to claim 5, it is characterised in that: second supervisor
The position of the corresponding second film rule (12) in road (7) is equipped with second pressure valve (14).
8. according to claim 1 to the pressure control device of Tubular PECVD device described in 7 any one, it is characterised in that: institute
It states and is equipped with the first main pumping valve (15) on the first main line (6) between the first bye-pass (9) and confluence pipeline (8), described second
The second main pumping valve (16) is equipped on main line (7) between the second bye-pass (10) and confluence pipeline (8).
9. according to claim 1 to the pressure control device of Tubular PECVD device described in 7 any one, it is characterised in that: institute
The first bye-pass (9) are stated equipped with the first pre- pumping valve (17), second bye-pass (10) is equipped with second and takes out valve (18) in advance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910790348.8A CN110408913B (en) | 2019-08-26 | 2019-08-26 | Pressure control device of tubular PECVD equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910790348.8A CN110408913B (en) | 2019-08-26 | 2019-08-26 | Pressure control device of tubular PECVD equipment |
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| Publication Number | Publication Date |
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| CN110408913A true CN110408913A (en) | 2019-11-05 |
| CN110408913B CN110408913B (en) | 2021-09-10 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201910790348.8A Active CN110408913B (en) | 2019-08-26 | 2019-08-26 | Pressure control device of tubular PECVD equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113416944A (en) * | 2021-06-22 | 2021-09-21 | 江苏微导纳米科技股份有限公司 | Coating equipment and working method thereof |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5575853A (en) * | 1994-07-01 | 1996-11-19 | Tokyo Electron Limited | Vacuum exhaust system for processing apparatus |
| US20010001950A1 (en) * | 1998-02-18 | 2001-05-31 | Takeshi Kawamura | Vacuum exhaust system |
| US7585141B2 (en) * | 2005-02-01 | 2009-09-08 | Varian Semiconductor Equipment Associates, Inc. | Load lock system for ion beam processing |
| CN102741975A (en) * | 2010-04-30 | 2012-10-17 | 应用材料公司 | Twin chamber processing system |
| JP2015045075A (en) * | 2013-08-29 | 2015-03-12 | 株式会社アルバック | Film deposition device and film deposition method |
| CN105552001A (en) * | 2015-12-10 | 2016-05-04 | 武汉华星光电技术有限公司 | Vacuum system |
| JP2017089512A (en) * | 2015-11-11 | 2017-05-25 | 株式会社アルバック | Evacuation device |
| CN107675145A (en) * | 2017-11-23 | 2018-02-09 | 湖南顶立科技有限公司 | A kind of vacuum equipment pressure regulator control system and vacuum equipment |
| CN109023305A (en) * | 2018-08-28 | 2018-12-18 | 湖南红太阳光电科技有限公司 | The Tubular PECVD device of resource sharing between a kind of pipe |
| CN110352265A (en) * | 2017-08-22 | 2019-10-18 | 商先创国际股份有限公司 | Processing equipment for substrate and the method that operates this processing equipment |
-
2019
- 2019-08-26 CN CN201910790348.8A patent/CN110408913B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5575853A (en) * | 1994-07-01 | 1996-11-19 | Tokyo Electron Limited | Vacuum exhaust system for processing apparatus |
| US20010001950A1 (en) * | 1998-02-18 | 2001-05-31 | Takeshi Kawamura | Vacuum exhaust system |
| US7585141B2 (en) * | 2005-02-01 | 2009-09-08 | Varian Semiconductor Equipment Associates, Inc. | Load lock system for ion beam processing |
| CN102741975A (en) * | 2010-04-30 | 2012-10-17 | 应用材料公司 | Twin chamber processing system |
| JP2015045075A (en) * | 2013-08-29 | 2015-03-12 | 株式会社アルバック | Film deposition device and film deposition method |
| JP2017089512A (en) * | 2015-11-11 | 2017-05-25 | 株式会社アルバック | Evacuation device |
| CN105552001A (en) * | 2015-12-10 | 2016-05-04 | 武汉华星光电技术有限公司 | Vacuum system |
| CN110352265A (en) * | 2017-08-22 | 2019-10-18 | 商先创国际股份有限公司 | Processing equipment for substrate and the method that operates this processing equipment |
| CN107675145A (en) * | 2017-11-23 | 2018-02-09 | 湖南顶立科技有限公司 | A kind of vacuum equipment pressure regulator control system and vacuum equipment |
| CN109023305A (en) * | 2018-08-28 | 2018-12-18 | 湖南红太阳光电科技有限公司 | The Tubular PECVD device of resource sharing between a kind of pipe |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113416944A (en) * | 2021-06-22 | 2021-09-21 | 江苏微导纳米科技股份有限公司 | Coating equipment and working method thereof |
| CN113416944B (en) * | 2021-06-22 | 2022-04-19 | 江苏微导纳米科技股份有限公司 | Coating equipment and working method thereof |
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| CN110408913B (en) | 2021-09-10 |
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