CN105891609A - Thermal mechanical type electromagnetic radiation detector - Google Patents
Thermal mechanical type electromagnetic radiation detector Download PDFInfo
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- CN105891609A CN105891609A CN201410816760.XA CN201410816760A CN105891609A CN 105891609 A CN105891609 A CN 105891609A CN 201410816760 A CN201410816760 A CN 201410816760A CN 105891609 A CN105891609 A CN 105891609A
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Abstract
The invention provides a thermal mechanical type electromagnetic radiation detector. The electromagnetic radiation detector is composed of a metamaterial wave absorber, supporting legs and a substrate. The electromagnetic radiation detector is prepared on a transparent substrate through adopting a surface sacrificial layer process, and a suspended movable structure according to which the supporting legs support the metamaterial wave absorber can be formed. In detection imaging, electromagnetic wave energy entering the metamaterial wave absorber is converted into thermal energy, and the supporting legs are bent after temperature changes; a beam of visible light passes through the transparent substrate and enters the reflecting mirror surface of the metamaterial wave absorber; an optical detection system is used for reading the deflection angle change and distribution of the metamaterial wave absorber; and therefore, detection imaging of electromagnetic waves can be realized. The thermal mechanical type electromagnetic radiation detector provided by the invention has the advantages of high sensitivity, high resolution, high reliability, high uniformity, low cost and simple preparation process and the like, can be used as a single detector to work independently, can also be distributed into an array to work as an imaging device, and can be flexibly designed according to the wavelength of detected electromagnetic waves and actual application requirements.
Description
Technical field
The invention belongs to electromagnetic radiation detection technical field of imaging, relate to design and the preparation method of a kind of thermomechanical formula electromagnetic radiation detector, especially
Relate to a kind of to prepare on a transparent substrate, light based on Meta Materials wave-absorber reads electromagnetic radiation detector.
Background technology
In general, according to its detection principle, electromagnetic radiation detector can be divided into thermal detector and photon type detector.Photon type detector one
As prepared by semi-conducting material, select the semi-conducting material of corresponding different band gap according to detection radiation wavelength, incident electromagnetic wave excites electronics to high energy
Level, thus produce faradic current or cause conductivity variations.Photon type detector has obvious advantage in terms of response time and detectivity,
Detect at high-energy electromagnetic radiation (such as x-ray, alpha ray) and visible ray, achieve in terms of infrared and terahertz imaging etc. and be widely applied, but with
The increase of electromagnetic radiation wavelength, photon energy weakens, and photon type detector needs huge, high in the detection of infrared, Terahertz and microwave band
The cryogenic equipment of cost suppresses noise, and along with target wavelength increase detection difficulty is increasing.The ultimate principle of thermal detector work is to inhale
Income radio magnetic wave energy is also translated into heat, and be further converted to certain physical quantity that can read, and the change of this physical quantity can be typically
Resistance variations (surveying radiation hot type) or change in voltage (thermoelectric pile formula).Due to its low cost and non-brake method, hot-probing is at infrared and terahertz wave band
Detection imaging has more wide application prospect.But, existing thermal detector is limited to absorbing material, absorbance is not enough, sensitivity is relatively low,
Response frequency range is single, is the most only operated in long wave infrared region, therefore, develops for different-waveband, even multiband, broadband absorbing material
It it is the key point breaking through the above-mentioned bottleneck of heat-sensitive eye.
In recent years, Meta Materials enters into the sight line of researcher as a kind of Novel manual electromagnetic material.Meta Materials refers to have not available for natural material
The artificial composite structure of extraordinary physical property or the general designation of composite, be to be designed to, by nature material, the cycle knot that different unit combines
Structure, its physical characteristic is not dependent on forming the chemical composition of its nature material, and depends on the geometry of its component units, size, direction
With arrangement mode etc..When on electromagnetic wave incident to Meta Materials, the periodic cells structure of these engineer interacts with electromagnetic wave, just
As the atom in nature material is with electromagnetic wave phase interaction.By the most well-designed, Meta Materials just can possess some nature materials and be cannoted
The character realized, therefore has many special application, such as perfect wave-absorber, negative index, perfect lens etc..Since experimental verification in 2008
After, Meta Materials wave-absorber has obtained widely studied as an important application of Meta Materials, service band from the beginning of microwave, progressively expand to Terahertz,
Infrared, even visible light wave range.
Meta Materials is prepared as movable structure, makes it become can to realize the important directions that the device of specific function is Meta Materials application in future, some bases
" super device " in movable Meta Materials can realize the such as function such as manipulator, photoswitch.At present, the commonly used upper strata resonance of Meta Materials wave-absorber
Structure, middle dielectric layer, the sandwich structure in lower-layer reflecting mirror face, by using different resonance structures and dielectric layer material, Meta Materials wave-absorber
Can realize selectivity single tape, many bands and wide band absorption, but most research is only in the absorption characteristic of Meta Materials wave-absorber, seldom
Meta Materials wave-absorber is applied to functional device.
It is ε for complex dielectric permittivityr, complex permeability is μrElectromagnetic medium, its complex refractivity indexWhen electromagnetic wave enters with incidence angle θ
When being mapped to this electromagnetic medium surface, situation about polarizing corresponding to transverse electric mode (TE) and TM mode (TM), its reflectance (it is flat that touch by reflection coefficient
Side) can be obtained by below equation:
In the case of vertical incidence, above-mentioned formula can be reduced to:
Wherein,It is the natural impedance of this medium, andIt it is free space natural impedance.For Meta Materials wave-absorber, due to
Have employed upper strata resonance structure, middle dielectric layer, the sandwich structure in lower-layer reflecting mirror face, when electromagnetic wave incident, transmitted wave is reflected by continuous print
Minute surface stops, so its absorbance can be expressed as:
By adjusting size, cycle and the geometry etc. of Meta Materials wave-absorber top layer resonance structure, its DIELECTRIC CONSTANT ε can be regulatedr(ω);Pass through
Adjusting interlayer dielectric thickness and electromagnetic property, change dielectric layer couples with top layer resonance structure, can regulate its magnetic permeability μr(ω).Therefore,
Under suitably design, the natural impedance of Meta Materials wave-absorber can be made in specific frequencyWith free space wave
Impedance Z0Equal, it is achieved impedance matching, it is possible to reach the absorbance of 100%.
Summary of the invention
The present invention is directed to the deficiency of existing electromagnetic radiation detection imaging technique, it is proposed that a kind of thermomechanical formula electromagnetic radiation based on Meta Materials wave-absorber is visited
Surveying device, described electromagnetic radiation detector is made up of Meta Materials wave-absorber, supporting leg and substrate, the preparation of Meta Materials wave-absorber is existed by micro-nano processing method
In transparent substrates, Meta Materials wave-absorber is fixed on substrate by supporting leg, forms suspension movable structure.Described Meta Materials wave-absorber is by the upper strata cycle
Property resonance structure, middle dielectric layer and the sandwich structure of lower-layer reflecting mirror face composition, resonance structure size can be adjusted according to different target wavelength
With shape and thickness of dielectric layers.Described electromagnetic radiation detector is operated under non-refrigeration environment, can work separately as detector, it is also possible to multiple
Detector is arranged into one-dimensional or two-dimensional array and works as image device, it is achieved the imaging to specific wavelength electromagnetic wave, particularly at infrared and Terahertz
The detection imaging of wave band.
When carrying out detection imaging, the upper strata of Meta Materials wave-absorber periodically resonance structure, towards object under test or electromagnetic wave source, separately has a branch of visible ray
On through transparent substrates collimated incident to the mirror surface of Meta Materials wave-absorber.Time on by incident electromagnetic wave Voice segment to Meta Materials wave-absorber, super
Material wave-absorber electromagnetic wave absorption energy is also translated into heat;It is by two kinds of thermal coefficient of expansions owing to supporting a part for Meta Materials wave-absorber supporting leg
The material composition differed greatly, due to variations in temperature, supporting leg bends, and drives the deflection of Meta Materials wave-absorber, it is seen that light is collimated to through transparent substrates
On the mirror surface of Meta Materials wave-absorber, the visible ray that mirror surface reflection is incident, Systems for optical inspection reads the deflection angle of Meta Materials wave-absorber and becomes
Change or the deflection distribution of Meta Materials wave-absorber in detector array, realize the detection to electromagnetic wave or imaging finally by data processing module.
For achieving the above object, the present invention takes techniques below scheme:
A kind of thermomechanical formula electromagnetic radiation detector, by Meta Materials wave-absorber, supporting leg and substrate composition, Meta Materials wave-absorber is to absorb incident electromagnetic wave
Structure, under the support of supporting leg by anchor point clamped on substrate formed suspension movable structure, can deflect in the plane be perpendicular to substrate.
Described Meta Materials wave-absorber is by being positioned at the resonance structure of top layer, middle dielectric layer and being positioned at the sandwich structure that the mirror surface of bottom forms.
Wherein resonance structure and the middle dielectric layer of top layer can be overlapped mutually repeatedly, to realize wide band absorption or the absorption of many bands.Described resonance structure is the cycle
Property arrangement sub-wavelength structure, it is possible to achieve Meta Materials wave-absorber couples with the resonance of incident electromagnetic wave electric field.The shape of described second wavelength metallic structure,
Size, arrangement mode, cycle etc. are determined by the wavelength of detection electromagnetic wave, and the shape of described resonance structure includes diamond type, " mouth " font, splitting ring
Type, " ten " font, " H " type, ring-like, " Jerusalem cross " type of double splitting etc.;Different resonance structures can be by mutually nested, combination, superposition
Etc. mode, form many bands or the Meta Materials wave-absorber in broadband;The material of preparing of described resonance structure can be metallic film, such as gold, aluminum, copper etc.,
Can also be silicon or the semiconductor film material such as germanium of doping, or metal silicide, such as cobalt silicide, Titanium silicide or tungsten silicide etc., or metal
Oxide, such as vanadium oxide etc., it is also possible to be metal nitride, such as titanium nitride etc., can also be other high conductivity materials, as Graphene, carbon are received
The thin-film materials such as mitron.
Described dielectric layer can be silica-based dielectric material, such as silicon nitride or silicon oxide, it is also possible to be polymer, such as polyimides (Polyimide)
With Parylene-C (Parylene-C);Its thickness can dielectric constant based on its material itself and the geometry of top layer resonance structure and size
It is adjusted, thus adjusts effective dielectric constant and the equivalent permeability of Meta Materials wave-absorber so that it is with the matches impedances of free space, reach to carry
The mesh of high incident electromagnetic wave absorption efficiency.
Described mirror surface is a kind of metal to incident electromagnetic wave with fine reflection or metal compound film, and its thickness is more than electromagnetic wave
Skin depth, thus eliminate the transmission of incident electromagnetic wave.Incident electromagnetic wave by middle dielectric layer top layer resonance structure and bottom mirror surface it
Between couple, thus realize Meta Materials wave-absorber and couple with the resonance in incident electromagnetic wave magnetic field.Additionally, visible ray also must be had very by mirror surface
Good reflection efficiency, to realize the working method of optical read-out.
Described supporting leg is the structure supporting Meta Materials wave-absorber, it is possible to make Meta Materials wave-absorber deflect in the plane be perpendicular to substrate;Described
Supporting leg comprises deformation supporting leg and supporting leg is thermally isolated;Described deformation supporting leg is differed the biggest material by two kinds of thermal coefficient of expansions and forms, wherein one layer of material
Material is the material of high thermal expansion coefficient, and such as metal, polymer etc., another layer material is the semiconductor medium with less thermal conductivity and thermal coefficient of expansion
Material, such as silicon nitride, silicon oxide etc.;After Meta Materials wave-absorber absorption of electromagnetic radiation energy, electromagnetic radiation energy is converted into heat and is transmitted to shape
Becoming on supporting leg, double material effect makes supporting leg deform upon;On described deformation supporting leg, the thickness of bi-material can adjust than with length, to the greatest extent may be used to obtain
The deformation quantity that energy is big;Described semiconductor medium material that supporting leg only include thermal conductivity less being thermally isolated, this semiconductor medium material can be with composition deformation
Supporting leg to have less thermal conductivity consistent with the material of thermal coefficient of expansion, described in the thickness of supporting leg is thermally isolated and length can adjust, with obtain maximum every
The thermal efficiency;The semiconductor medium material of described supporting leg can be identical with the intermediate medium layer material of Meta Materials wave-absorber, and makes in same preparation process
Standby;Described deformation supporting leg one end is connected to Meta Materials wave-absorber, and the other end is connected to supporting leg is thermally isolated, described in supporting leg one end be thermally isolated be connected to deformation
Supporting leg, the other end is clamped on substrate;Described deformation supporting leg and the quantity of supporting leg is thermally isolated and arrangement mode can have various ways, including orthoscopic,
Broken-line type, two-fold wire type and many broken-line types etc..
The substrate of described support electromagnetic radiation detector is the disk material having high-transmission rate to visible ray, such as glass, quartz, polymer etc..Electromagnetism
During radiation detector work, reading visible ray is by transparent substrates face collimated incident to the mirror surface of Meta Materials wave-absorber, and target electromagnetic radiation
By in lens focus to Meta Materials wave-absorber top layer resonance structure, electromagnetic wave energy is converted into heat by Meta Materials wave-absorber, and supporting leg deforms upon band
Dynamic Meta Materials wave-absorber deflection, in the amount of deflection of optical pickup system reading Meta Materials wave-absorber or detector array, the deflection of Meta Materials wave-absorber divides
Cloth, realizes the detection to incident electromagnetic wave or imaging finally by data and image processing module.It is super that such design can make electromagnetic wave be directly incident on
On material wave-absorber, it is to avoid electromagnetic wave energy loss, thus improve the detector absorption efficiency to incident electromagnetic wave, be particularly suited for infrared and
The non-brake method imaging of terahertz wave band.
Described electromagnetic radiation detector, it is possible to use any surface sacrificial process is prepared on a transparent substrate;Described sacrificial layer material includes half
Conductive medium material or polymeric material, such as silicon dioxide, polyimides etc.;Described sacrificial layer material is prepared into by the way of spin coating or deposit
On bright substrate, after preparation forms anchor point on sacrifice layer, prepare Meta Materials wave-absorber and supporting leg;Finally, dry etching or wet etching skill are carried out
Art, removes sacrifice layer so that Meta Materials wave-absorber is unsettled under the support of supporting leg, and clamped on a transparent substrate by anchor point.
One utilizes polyimides as sacrifice layer, the method preparing described electromagnetic radiation detector on a glass substrate, comprises the following steps:
1) spin-on polyimide and solidifies on transparent glass substrate, forms sacrifice layer;
2) deposit sheet metal, as reflective mirror material;
3) photoetching for the first time with photoresist for mask corrosion mirror metal layer, then with photoresist and mirror metal layer collectively as mask, with oxygen etc.
Plasma etching polyimide sacrificial layer, forms anchor point;
4) photoetching for the second time with photoresist for mask corrosion mirror metal layer, forms the mirror surface of Meta Materials wave-absorber lower floor;
5) deposit low stress SiNx, this layer material is for preparing the ground floor structure of deformation supporting leg, being thermally isolated in supporting leg and Meta Materials wave-absorber
Between dielectric layer;
6) depositing another layer of metal another layer material as deformation supporting leg, its thickness should meet deformation supporting leg thermal expansion mistake with the thickness ratio of silicon nitride
Join and produce the biggest deformation requirement;
7) photoetching for the third time and with photoresist for mask corrosion the 6th step in metal, form another Rotating fields on deformation supporting leg;
8) after four mask, deposit the thin metal of third layer, use stripping technology to form Meta Materials wave-absorber resonance structure at the middle and upper levels;
9) the 5th photoetching etch silicon nitride, forms the dielectric layer of Meta Materials wave-absorber, the ground floor structure of deformation supporting leg and supporting leg is thermally isolated,;
10) oxygen plasma etch polyimide sacrificial layer, discharges Meta Materials wave-absorber, forms unsettled electromagnetic radiation detector.
In sum, the present invention proposes a kind of thermomechanical formula electromagnetic radiation detector based on Meta Materials wave-absorber and preparation method thereof, and the present invention has
There is a following advantage:
1) electromagnetic radiation detector that the present invention proposes have employed the Meta Materials wave-absorber absorbing material as incident electromagnetic wave, compensate for nature material and absorbs
Rate is not enough and the shortcoming of the non-adjustable knot of absorption characteristic, and Meta Materials wave-absorber has the absorption characteristic of almost Perfect at specific wavelength, can be greatly improved
The sensitivity of device;Additionally, Meta Materials wave-absorber also has the advantage of flexible design, can adjust for the electromagnetic wave detection demand of different-waveband
The structure of Meta Materials wave-absorber and size, it is possible to realize selectivity detection or broadband detection according to the actual requirements, increase the application model of device
Enclose;
2) method preparing electromagnetic radiation detector on a transparent substrate that the present invention proposes, makes reading visible ray incide bottom mirror surface from substrate surface
On, the most tested electromagnetic wave is directly incident on the upper strata resonance structure of Meta Materials wave-absorber, can avoid the substrate loss to electromagnetic wave energy,
Drastically increase the absorption efficiency of electromagnetic wave energy, thus improve detector sensitivity;
3) present invention propose focal plane arrays (FPA) use surface sacrificial process prepare, prepare focal plane arrays (FPA) with bulk silicon technological compared with, sacrifice layer process system
Uniformity and the reliability of standby focal plane arrays (FPA) are obviously improved, and preparation technology is simple, cost is lower;
4) the polyimide sacrificial layer technique that the present invention proposes is the preparation technology of a kind of low temperature, low cost, it is adaptable to the substrate material of the non-refractories such as glass
Material.Use oxygen plasma dry etching polyimides release hanging structure simultaneously, therefore avoid because wet etching discharges the unsettled knot brought
Structure Problem of Failure;
5) electromagnetic radiation detector that the present invention proposes uses optical read-out mode, and the output signal information of detector can be carried out whole by optical pickup system
Body process, therefore the present invention propose electromagnetic radiation detector both can work alone as detector is single, it is also possible to be arranged into one-dimensional or
Two-dimensional array works as image device, substantially without the treating capacity of the information of increasing during detector quantity in increasing array, and compares electricity reading
The mode gone out, the preparation technology of light reading focal plane arrays (FPA) is simple, it is easy to improves the scale of array, thus improves the spatial discrimination of detector
Rate.
Accompanying drawing explanation
Figure 1A is the electromagnetic radiation detector perspective view that the present invention proposes, and Figure 1B is the electromagnetic radiation detector two dimension battle array that the present invention proposes
Row perspective view;
Fig. 2 A is the Meta Materials wave-absorber plan structure schematic diagram that the present invention proposes, and Fig. 2 B is the cross-section structure of the Meta Materials wave-absorber that the present invention proposes
Schematic diagram;
Fig. 3 A-3H is the resonance structure geometry schematic diagram of other several Meta Materials wave-absorber top layers, and Fig. 3 I is to have surpassing of layer resonance structure more
Material wave-absorber generalized section;
Fig. 4 A is the electromagnetic radiation detector plan structure schematic diagram that the present invention proposes, and Fig. 4 B is the electromagnetic radiation detector side-looking knot that the present invention proposes
Structure and operation principle schematic diagram;
Fig. 5 is the electromagnetic radiation detector preparation technology flow chart that proposes of the present invention and the detector prepared and array electronic microphotograph;
Reference identical in accompanying drawing represents identical parts.
Wherein:
101-Meta Materials wave-absorber;102-supporting leg;103-substrate;201-resonance structure;202-dielectric layer;203-mirror surface;401-
Deformation supporting leg;402-is thermally isolated supporting leg;501-sacrifice layer.
Detailed description of the invention
For making the object, technical solutions and advantages of the present invention clearer, below in conjunction with accompanying drawing, structure and the method for the present invention are described in detail.
A kind of thermomechanical formula electromagnetic radiation detector based on Meta Materials wave-absorber, as shown in Figure 1A, including a Meta Materials wave-absorber (101),
Two supporting legs (102) supporting Meta Materials wave-absorber and substrate (103);Meta Materials wave-absorber (101) is unsettled under the support of supporting leg (102)
Clamped in transparent substrates (103), can deflect in the plane be perpendicular to substrate;Described electromagnetic radiation detector can be as detector
Single work alone, it is also possible to being arranged into one-dimensional or two-dimensional array and work as image device, Figure 1B is that described electromagnetic radiation detector is arranged into
Two-dimensional array perspective view.
Described Meta Materials wave-absorber (101), its top view as shown in Figure 2 A, for two-dimensional periodic structure;As shown in the profile in Fig. 2 B, institute
Stating Meta Materials wave-absorber (101) is by the resonance structure (201) being positioned at top layer, middle dielectric layer (202) and be positioned at the mirror surface (203) of bottom
The sandwich structure of composition.
Described resonance structure (201) is the sub-wavelength structure of periodic arrangement, it is possible to achieve Meta Materials wave-absorber and the resonance of incident electromagnetic wave electric field
Coupling.The shape of described second wavelength metallic structure, size, arrangement mode, cycle etc. are determined by the wavelength of detection electromagnetic wave;Described resonance structure
Preparing material can be metal, such as gold, aluminum, copper etc., it is also possible to be the semi-conducting materials such as the silicon adulterated or germanium, or metal silicide, such as cobalt silication
Thing, Titanium silicide or tungsten silicide etc., or metal-oxide, such as vanadium oxide etc., it is also possible to be metal nitride, such as titanium nitride etc., can also be
Other high conductivity materials, such as Graphene, CNT etc..Except the diamond type resonance structure shown in Fig. 2, the resonance structure of other shapes such as figure
Shown in 3, including " mouth " font (Fig. 3 A), cleave ring-like (Fig. 3 B), " ten " font (Fig. 3 C), " H " type (Fig. 3 D), the ring-like (figure of double splitting
3E), " Jerusalem cross " type (Fig. 3 F) etc..And, these resonance structures can be formed by the mode such as mutually nested, combination, superposition
Many bands or wide band absorption;It is to absorb humorous by " mouth " font resonance structure with the biobelt of the mutually nested formation of " ten " font resonance structure as shown in Figure 3 G
Shake structure, be the wide band absorption resonance realized by the multiple various sizes of diamond type resonance structure of multiplexing in a periodic cells as shown in figure 3h
Structure.In described Meta Materials wave-absorber (101), resonance structure (201) and the middle dielectric layer (202) of top layer can also be overlapped mutually repeatedly,
To realize wide band absorption or the absorption of many bands, it is three band or broadband Meta Materials of three layers of different size resonance structure and dielectric layer superposition formation as shown in fig. 31
Wave-absorber section of structure.
Described dielectric layer (202) can be silica-based dielectric material, such as silicon nitride or silicon oxide, it is also possible to be polymer, such as polyimides
And Parylene-C (Parylene-C) (Polyimide);Described dielectric layer (201) thickness can dielectric constant based on its material itself and
Geometry and the size of top layer resonance structure (201) are adjusted, thus adjust effective dielectric constant and the equivalent permeability of Meta Materials wave-absorber,
Make the matches impedances of itself and free space, reach to improve the mesh of incident electromagnetic wave absorption efficiency.
Described mirror surface (203) is a kind of metal to incident electromagnetic wave with fine reflection or metal compound film, and its thickness is more than
The skin depth of electromagnetic wave, thus eliminate the transmission of incident electromagnetic wave.Additionally, mirror surface (203) also must have well reflection to visible ray
Efficiency, to realize the working method of optical read-out.Incident electromagnetic wave by middle dielectric layer (202) at top layer resonance structure (201) and bottom
Mirror surface couples between (203), thus realizes Meta Materials wave-absorber and couple with the resonance in incident electromagnetic wave magnetic field.
As shown in the top view of Fig. 4 A and the side view of Fig. 4 B, described supporting leg (102) is the structure supporting Meta Materials wave-absorber, props up including deformation
Lower limb (401) and supporting leg (402) two section is thermally isolated.Described deformation supporting leg (401) is differed the biggest material by two kinds of thermal coefficient of expansions and forms,
Layer of material is the material of high thermal expansion coefficient, and such as metal, polymer etc., another layer material is to have partly leading of less thermal conductivity and thermal coefficient of expansion
Body dielectric material, such as silicon nitride, silicon oxide etc.;The thickness of the two material can adjust than with deformation supporting leg (401) length, to obtain to the greatest extent
Possible big deformation quantity.Described semiconductor medium material that supporting leg (402) only include thermal conductivity less being thermally isolated, this semiconductor medium material is permissible
Consistent with the layer of material of deformation supporting leg (401), described in the thickness of supporting leg (402) is thermally isolated and length can adjust, to obtain maximum heat insulation effect
Rate.Described semiconductor medium material can be identical with the middle dielectric layer of Meta Materials wave-absorber (101) (202) material, and in same preparation process
Middle preparation.Described deformation supporting leg (401) one end is connected to Meta Materials wave-absorber (101), and the other end is connected to supporting leg (402) is thermally isolated;Described
Supporting leg (402) one end being thermally isolated and is connected to deformation supporting leg (401), the other end is clamped on substrate (103) by anchor point.Described deformation supporting leg (401)
Various ways can be had, including orthoscopic, broken-line type, two-fold wire type and many broken-line types etc. with the quantity and arrangement mode that supporting leg (402) is thermally isolated.
The substrate (103) of described support electromagnetic radiation detector is the disk material having high-transmission rate to visible ray, such as glass, quartz, polymer
Deng.During electromagnetic radiation detector work, reading visible ray is by the reflection of transparent substrates (103) face collimated incident to Meta Materials wave-absorber (101)
On minute surface (203), and target electromagnetic radiation by lens focus on Meta Materials wave-absorber (101) top layer resonance structure (201), Meta Materials
Electromagnetic wave energy is converted into heat by wave-absorber, and supporting leg deforms upon drive Meta Materials wave-absorber deflection, and optical pickup system reads Meta Materials wave-absorber
Amount of deflection or detector array in the deflection distribution of Meta Materials wave-absorber, realize the detection of electromagnetic wave or imaging finally by data processing module.
As shown in Figure 4 B, such design can make electromagnetic wave be directly incident on Meta Materials wave-absorber, it is to avoid electromagnetic wave energy loss, thus improves
The detector absorption efficiency to incident electromagnetic wave, is particularly suited for infrared and terahertz wave band non-brake method imaging.
Described electromagnetic radiation detector, it is possible to use any surface sacrificial process is prepared in transparent substrates (103).Described sacrifice layer material
Material (501) includes semiconductor medium material and polymeric material, such as silicon dioxide, polyimides etc.;Described sacrificial layer material passes through spin coating or shallow lake
Long-pending mode is prepared in transparent substrates (103), after preparation forms anchor point on sacrifice layer, prepares Meta Materials and inhales ripple (101) body and supporting leg (102);
Finally, carry out dry etching or wet etch techniques, remove sacrifice layer (501) release electromagnetic radiation detector.
One utilize polyimides as sacrifice layer, the method preparing described electromagnetic radiation detector on a glass substrate, process chart such as Fig. 5 institute
Show, comprise the following steps:
1) spin-on polyimide is in transparent glass substrate, solidifies at a certain temperature, forms sacrifice layer (501), thickness 1~10 μm, structural profile
Figure profile such as Fig. 5 A;
2) deposit thin layer Aurum metallicum/chromium, the thickness 20~200nm of gold is to ensure good flatness and the reflectance of mirror surface, and wherein chromium is Jin Yujie
Adhesion layer between matter layer, thickness is 5~30nm;
3) photoetching for the first time with photoresist for mask corrosion chrome gold, then with photoresist and chrome gold collectively as mask, use oxygen plasma etch polyamides
Imines sacrifice layer, forms anchor point, section of structure such as Fig. 5 B;
4) photoetching for the second time with photoresist for mask corrosion chrome gold, forms the mirror surface of Meta Materials wave-absorber lower floor, section of structure such as Fig. 5 C;
5) deposit low stress SiNx, thickness 0.2~2 μm, this layer material for prepare the middle dielectric layer of Meta Materials wave-absorber, one layer of deformation supporting leg
With supporting leg is thermally isolated, thickness needs to meet deformation supporting leg simultaneously, supporting leg and the performance requirement of Meta Materials wave-absorber are thermally isolated, and section of structure is such as
Fig. 5 D;
6) deposit metallic aluminium is as another layer material of deformation supporting leg, thickness 0.1~1.5 μm, and the thickness ratio of the thickness of aluminum and silicon nitride should meet deformation and prop up
Lower limb thermal expansion mismatch produces the biggest deformation requirement;
7) photoetching for the third time with photoresist for mask corrosion aluminum, forms deformation supporting leg one Rotating fields, section of structure such as Fig. 5 E;
8) after four mask, depositing metal chrome gold, the thickness 20~200nm of gold, the thickness 5~30nm of chromium, wherein chromium is between gold and dielectric layer
Adhesion layer, use stripping technology formed Meta Materials wave-absorber resonance structure at the middle and upper levels, section of structure such as Fig. 5 F;
9) the 5th photoetching and with photoresist and aluminum collectively as mask, etch silicon nitride, formed the dielectric layer of Meta Materials wave-absorber, deformation supporting leg another
One Rotating fields and supporting leg is thermally isolated, section of structure such as Fig. 5 G;
10) oxygen plasma isotropic etching polyimide sacrificial layer, discharges Meta Materials wave-absorber, forms unsettled electromagnetic radiation detector, and structure is cutd open
Face figure such as Fig. 5 H.
Use electromagnetic radiation detector and detector array electron micrograph prepared by above-mentioned technique respectively as shown in Fig. 5 I and 5J.
Claims (9)
1. a thermomechanical formula electromagnetic radiation detector, it is characterised in that: described electromagnetic radiation detector is by Meta Materials wave-absorber, supporting leg and substrate
Composition, described Meta Materials wave-absorber is the structure of absorption of electromagnetic radiation;Described supporting leg one end is connected on Meta Materials wave-absorber, and the other end is clamped at lining
, make Meta Materials wave-absorber form the structure of suspending movable at the end;Described electromagnetic radiation detector works under non-refrigeration environment, can be with single detector
Work alone, it is also possible to multiple detectors are arranged into one-dimensional or two-dimensional array as image device, it is achieved the detection imaging to specific wavelength electromagnetic wave,
It is particularly suited for infrared and terahertz wave band non-brake method imaging.
2. electromagnetic radiation detector as claimed in claim 1, it is characterised in that: described Meta Materials wave-absorber be by the resonance structure being positioned at top layer,
The sandwich structure of the mirror surface composition of middle dielectric layer and bottom;When target electromagnetic radiation is by the top layer of lens focus to Meta Materials wave-absorber
Time on resonance structure, and resonance structure generation coupled resonance, Meta Materials wave-absorber electromagnetic wave absorption energy, and it is translated into heat;Described super material
In material wave-absorber, resonance structure and the middle dielectric layer of top layer can be overlapped mutually repeatedly, to realize many bands or wide band absorption.
3. Meta Materials wave-absorber as claimed in claim 2, it is characterised in that the resonance structure being positioned at top layer described in: is the sub-ripple of periodic arrangement
Long structure, couples with the resonance of incident electromagnetic wave for realizing Meta Materials wave-absorber;The shape of described resonance structure, size, arrangement mode, cycle
Determining Deng by the wavelength of detected electromagnetic wave, the shape of described resonance structure includes diamond type, " mouth " font, cleaves ring-like, " ten " font, " H "
Type, ring-like, " Jerusalem cross " type of double splitting etc.;Described resonance structure can be by the mode such as mutually nested, combination, superposition, and formation is many
Band or the Meta Materials wave-absorber in broadband;The material of preparing of described resonance structure can be metallic film, such as gold, aluminum, copper etc., it is also possible to be doping
The semiconductor film material such as silicon or germanium, or metal silicide, such as cobalt silicide, Titanium silicide or tungsten silicide etc., or metal-oxide, such as oxidation
Vanadium etc., it is also possible to be metal nitride, such as titanium nitride etc., can also be other high conductivity materials, such as the thin-film material such as Graphene, CNT.
4. Meta Materials wave-absorber as claimed in claim 2, it is characterised in that: described dielectric layer can be silica-based dielectric material, such as silicon nitride
Or silicon oxide, it is also possible to it is polymeric material, such as polyimides (Polyimide) and Parylene-C (Parylene-C);Described medium thickness
Degree can dielectric constant based on material itself and the geometry of top layer resonance structure and size be adjusted, thus adjust Meta Materials wave-absorber etc.
Effect dielectric constant and equivalent permeability so that it is with the matches impedances of free space, reach to improve the purpose of incident electromagnetic wave absorption efficiency.
5. Meta Materials wave-absorber as claimed in claim 2, it is characterised in that: described mirror surface is a kind of visible to incident electromagnetic wave and reading
Light is respectively provided with continuous metal or the metal compound film of fine reflecting effect;Its thickness is more than the skin depth of incident electromagnetic wave, thus eliminates incidence
The transmission of electromagnetic wave, and ensure that good reflection reads visible ray.
6. electromagnetic radiation detector as claimed in claim 1, it is characterised in that: described supporting leg is the structure supporting Meta Materials wave-absorber, and can
So that Meta Materials wave-absorber deflects in the plane be perpendicular to substrate;Described supporting leg comprises deformation supporting leg and supporting leg is thermally isolated;Described deformation supporting leg
Being differed the biggest materials by two kinds of thermal coefficient of expansions to form, wherein layer of material is the material of high thermal expansion coefficient, such as metal, polymer etc.,
Another layer material is the semiconductor medium material with less thermal conductivity and thermal coefficient of expansion, such as silicon nitride, silicon oxide etc.;Inhale at Meta Materials wave-absorber
After receiving electromagnetic radiation energy, electromagnetic radiation energy being converted into heat and is transmitted on deformation supporting leg, double material effect makes supporting leg deform upon;Described
On deformation supporting leg, the thickness of bi-material can adjust than with length, to obtain the biggest deformation quantity;The described supporting leg that is thermally isolated only includes thermal conductivity
Less semiconductor medium material, this semiconductor medium material can be with the quasiconductor with less thermal conductivity and thermal coefficient of expansion of composition deformation supporting leg
Dielectric material is consistent, described in the thickness of supporting leg is thermally isolated and length can adjust, to obtain maximum heat-insulating efficiency;The semiconductor medium material of described supporting leg
Material can be identical with the intermediate medium layer material of Meta Materials wave-absorber, and prepares in same preparation process;Described deformation supporting leg one end is connected to super material
Material wave-absorber, the other end is connected to supporting leg is thermally isolated, described in supporting leg one end be thermally isolated be connected to deformation supporting leg, the other end is clamped on substrate;Described
Deformation supporting leg can be had various ways, including orthoscopic, broken-line type, two-fold wire type and many broken-line types etc. with quantity and arrangement mode that supporting leg is thermally isolated.
7. electromagnetic radiation detector as claimed in claim 1, it is characterised in that: described substrate is the disk to visible ray with high permeability
Material, such as glass, quartz, polymer etc.;When carrying out electromagnetic radiation detection imaging, target electromagnetic radiation inhales ripple by lens focus to Meta Materials
On the top layer resonance structure of body, electromagnetic wave energy is converted into heat by Meta Materials wave-absorber, and double material effect makes deformation supporting leg bend, and drives
Meta Materials wave-absorber deflects;Visible ray is irradiated on the bottom mirror surface of Meta Materials wave-absorber through transparent substrates, and optical pickup system reads super material
In the amount of deflection of material wave-absorber or detector array, the deflection distribution of Meta Materials wave-absorber, realizes the detection to electromagnetic wave finally by data processing module
Or imaging.
8. electromagnetic radiation detector as claimed in claim 1, it is characterised in that: any surface sacrificial process can be used to prepare thoroughly
On bright substrate;Described sacrificial layer material includes semiconductor medium material or polymeric material, such as silicon dioxide, polyimides etc.;Described sacrifice layer material
Material is prepared in transparent substrates by the way of spin coating or deposit, after preparation forms anchor point on sacrifice layer, prepares Meta Materials wave-absorber and supporting leg;
Finally, by dry etching or wet etch techniques, remove sacrifice layer so that Meta Materials wave-absorber is unsettled under the support of supporting leg, and passes through anchor point
Clamped on a transparent substrate.
Surface sacrificial process the most as claimed in claim 8, one utilizes polyimides as sacrifice layer, prepares described on a glass substrate
The method of electromagnetic radiation detector, comprises the following steps:
(1). spin-on polyimide is on transparent glass substrate and solidifies, and forms sacrifice layer;
(2). deposit thin layer Aurum metallicum/chromium is as bottom reflecting mirror surface layer, and wherein chromium is the adhesion layer between gold and dielectric layer;
(3). photoetching for the first time with photoresist for mask corrosion chrome gold, then with photoresist and chrome gold collectively as mask, use oxygen plasma dry method
Etching polyimide sacrificial layer, forms anchor point;
(4). photoetching for the second time with photoresist for mask corrosion chrome gold, form the mirror surface of Meta Materials wave-absorber lower floor;
(5). depositing certain thickness low stress SiNx, this layer material is less as having in the dielectric layer in the middle of Meta Materials wave-absorber, deformation supporting leg
The material of thermal conductivity and thermal coefficient of expansion and the material that supporting leg is thermally isolated,;
(6). deposit metallic aluminium is as the material layer of high thermal expansion coefficient in deformation supporting leg;
(7). photoetching for the third time with photoresist for mask corrosion aluminum, form a Rotating fields of deformation supporting leg;
(8). after four mask, depositing metal chrome gold, wherein chromium is the adhesion layer between gold and dielectric layer, uses stripping technology to form Meta Materials and inhales
The resonance structure of ripple body top layer;
(9). the 5th photoetching and with photoresist and aluminum collectively as mask, etch silicon nitride, form the dielectric layer in the middle of Meta Materials wave-absorber, deformation
Another Rotating fields of supporting leg and supporting leg is thermally isolated;
(10). oxygen plasma isotropic etching polyimide sacrificial layer, form unsettled Meta Materials wave-absorber, prepare electromagnetic radiation detector.
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Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1970430A (en) * | 2006-12-01 | 2007-05-30 | 中国科学技术大学 | Glass substrate optical display infra-red sensor |
CN101561319A (en) * | 2009-06-02 | 2009-10-21 | 北京大学 | Capacitive MEMS non-refrigerated infrared detector and preparation method thereof |
CN101995295A (en) * | 2009-08-19 | 2011-03-30 | 北京大学 | Non-refrigerating infrared focal plane array as well as preparation method and application thereof |
CN102509728A (en) * | 2011-11-01 | 2012-06-20 | 北京大学 | Design and preparation method of non-refrigeration infrared detector |
CN103259097A (en) * | 2013-04-19 | 2013-08-21 | 电子科技大学 | Terahertz metamaterial unit structure and preparation, adjusting and control method thereof |
US8604897B1 (en) * | 2007-07-26 | 2013-12-10 | Hewlett-Packard Development Company, L.P. | Metamaterial-based devices and methods for fabricating the same |
CN103575403A (en) * | 2012-07-18 | 2014-02-12 | 北京大学 | Terahertz focal plane array based on MEMS technology |
CN103575407A (en) * | 2012-07-18 | 2014-02-12 | 北京大学 | Terahertz radiation detector |
WO2014083326A1 (en) * | 2012-11-27 | 2014-06-05 | The University Court Of The University Of Glasgow | Terahertz radiation detector, focal plane array incorporating terahertz detector, multispectral metamaterial absorber, and combined optical filter and terahertz absorber |
-
2014
- 2014-12-25 CN CN201410816760.XA patent/CN105891609B/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1970430A (en) * | 2006-12-01 | 2007-05-30 | 中国科学技术大学 | Glass substrate optical display infra-red sensor |
US8604897B1 (en) * | 2007-07-26 | 2013-12-10 | Hewlett-Packard Development Company, L.P. | Metamaterial-based devices and methods for fabricating the same |
CN101561319A (en) * | 2009-06-02 | 2009-10-21 | 北京大学 | Capacitive MEMS non-refrigerated infrared detector and preparation method thereof |
CN101995295A (en) * | 2009-08-19 | 2011-03-30 | 北京大学 | Non-refrigerating infrared focal plane array as well as preparation method and application thereof |
CN102509728A (en) * | 2011-11-01 | 2012-06-20 | 北京大学 | Design and preparation method of non-refrigeration infrared detector |
CN103575403A (en) * | 2012-07-18 | 2014-02-12 | 北京大学 | Terahertz focal plane array based on MEMS technology |
CN103575407A (en) * | 2012-07-18 | 2014-02-12 | 北京大学 | Terahertz radiation detector |
WO2014083326A1 (en) * | 2012-11-27 | 2014-06-05 | The University Court Of The University Of Glasgow | Terahertz radiation detector, focal plane array incorporating terahertz detector, multispectral metamaterial absorber, and combined optical filter and terahertz absorber |
CN103259097A (en) * | 2013-04-19 | 2013-08-21 | 电子科技大学 | Terahertz metamaterial unit structure and preparation, adjusting and control method thereof |
Non-Patent Citations (1)
Title |
---|
张明习: "《超材料概率》", 30 September 2014, 国防工业出版社 * |
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