CN105716751A - Diffused silicon pressure sensor - Google Patents

Diffused silicon pressure sensor Download PDF

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Publication number
CN105716751A
CN105716751A CN201610056234.7A CN201610056234A CN105716751A CN 105716751 A CN105716751 A CN 105716751A CN 201610056234 A CN201610056234 A CN 201610056234A CN 105716751 A CN105716751 A CN 105716751A
Authority
CN
China
Prior art keywords
electrode
silicon ring
silicon
out wire
pressure sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610056234.7A
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Chinese (zh)
Inventor
张忍
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suzhou Chengting Automatic Equipment Co Ltd
Original Assignee
Suzhou Chengting Automatic Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suzhou Chengting Automatic Equipment Co Ltd filed Critical Suzhou Chengting Automatic Equipment Co Ltd
Priority to CN201610056234.7A priority Critical patent/CN105716751A/en
Publication of CN105716751A publication Critical patent/CN105716751A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00Measuring force or stress, in general
    • G01L1/18Measuring force or stress, in general using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measuring Fluid Pressure (AREA)

Abstract

A diffused silicon pressure sensor comprises an electrode a, a leading-out wire a, a diffused type resistor, a leading-out wire b, an electrode b, a monocrystalline silicone diagram and a silicon ring, wherein the silicon ring surrounds the monocrystalline silicone diagram, the electrode a and the electrode b are connected to the upper two sides of the silicon ring respectively, the electrode a and the electrode b are also connected with the diffused type resistor which is placed on the silicon ring, the leading out wire a is connected onto the electrode a, and the leading out wire b is connected onto the electrode b; and a ceramic substrate is arranged under the silicon ring and connected to the silicon ring via a ceramic bonding agent. The ceramic substrate is characterized by high elasticity and resistance to corrosion, wearing, impact and vibration, so that the temperature and time stabilities are improved, and the service life of products is prolonged.

Description

A kind of diffusion silicon pressure sensor
Technical field
The present invention relates to a kind of diffusion silicon pressure sensor.
Background technology
Pressure transducer is a kind of sensor the most commonly used in industrial practice, it is widely used in various industry automatic control environment, relate to numerous industries such as water conservancy and hydropower, railway traffic, intelligent building, production automatic control, Aero-Space, military project, petrochemical industry, oil well, electric power, boats and ships, lathe, pipeline, just simply introduce some sensors principle and application thereof below.Separately there is medical pressure sensor.
Pressure transducer, based on the device of frame for movement type, indicates pressure with the deformation of flexible member, but this physical dimension is big, quality weight, it is impossible to provide electricity output.Along with the development of semiconductor technology, semiconductor pressure sensor also arises at the historic moment.It is characterized in that volume is little, light weight, accuracy high, good temp characteristic.Particular with the development of MEMS technology, semiconductor transducer is towards miniaturization, and its power consumption is little, reliability is high.
The pressure of diffusion silicon pressure sensor measured medium directly acts on (rustless steel or pottery) on the diaphragm of sensor, diaphragm is made to produce the micrometric displacement being directly proportional to pressure medium, the resistance value making sensor changes, detect this change with electronic circuit, and change the output one the canonical measure signal corresponding to this pressure.
Summary of the invention
It is an object of the invention to: provide a kind of simple in construction convenient, the diffusion silicon pressure sensor of long service life.
Present invention provide the technical scheme that
A kind of diffusion silicon pressure sensor, including electrode a, lead-out wire a, diffusion type resistance, lead-out wire b, electrode b, monocrystal silicon diaphragm and silicon ring, described silicon ring is surrounded on monocrystal silicon diaphragm surrounding, above described silicon ring, both sides are connected to electrode a and electrode b, described electrode a and electrode b is connected to diffusion type resistance and is positioned at above silicon ring, described electrode a is connected to lead-out wire a, described electrode b is connected to lead-out wire b, it is connected to ceramic substrate below described silicon ring, and silicon ring is connected by ceramic bonding agent with ceramic substrate.
The medicine have the advantages that
By ceramic substrate high resiliency, anticorrosive, resistance to wear, the characteristic of shock resistance and vibration, improve temperature stability and time stability, extend the life-span of product.
Accompanying drawing explanation
Fig. 1 is the structural representation of the present invention.
Wherein: 1, electrode a, 2, lead-out wire a, 3, diffusion type resistance, 4, lead-out wire b, 5, electrode b, 6, monocrystal silicon diaphragm, 7, silicon ring, 8, ceramic bonding agent, 9, ceramic substrate.
Detailed description of the invention
A kind of diffusion silicon pressure sensor, including electrode 1a, lead-out wire 2a, diffusion type resistance 3, lead-out wire 4b, electrode 5b, monocrystal silicon diaphragm 6 and silicon ring 7, silicon ring 7 is surrounded on monocrystal silicon diaphragm 6 surrounding, above silicon ring 7, both sides are connected to electrode 1a and electrode 5b, it is connected to diffusion type resistance 3 between electricity 1 pole a and electrode 4b and is positioned at above silicon ring 7, electrode 1a is connected to lead-out wire 2a, electrode 5b is connected to lead-out wire 4b, it is connected to ceramic substrate 9 below silicon ring, and silicon ring 7 is connected by ceramic bonding agent 8 with ceramic substrate 9.By ceramic substrate high resiliency, anticorrosive, resistance to wear, the characteristic of shock resistance and vibration, improve temperature stability and time stability, extend the life-span of product, it is easy to promote.

Claims (1)

1. a diffusion silicon pressure sensor, including electrode a, lead-out wire a, diffusion type resistance, lead-out wire b, electrode b, monocrystal silicon diaphragm and silicon ring, described silicon ring is surrounded on monocrystal silicon diaphragm surrounding, above described silicon ring, both sides are connected to electrode a and electrode b, described electrode a and electrode b is connected to diffusion type resistance and is positioned at above silicon ring, described electrode a is connected to lead-out wire a, described electrode b is connected to lead-out wire b, it is characterized in that: below described silicon ring, be connected to ceramic substrate, and silicon ring is connected by ceramic bonding agent with ceramic substrate.
CN201610056234.7A 2016-01-27 2016-01-27 Diffused silicon pressure sensor Pending CN105716751A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610056234.7A CN105716751A (en) 2016-01-27 2016-01-27 Diffused silicon pressure sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610056234.7A CN105716751A (en) 2016-01-27 2016-01-27 Diffused silicon pressure sensor

Publications (1)

Publication Number Publication Date
CN105716751A true CN105716751A (en) 2016-06-29

Family

ID=56155105

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610056234.7A Pending CN105716751A (en) 2016-01-27 2016-01-27 Diffused silicon pressure sensor

Country Status (1)

Country Link
CN (1) CN105716751A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060137456A1 (en) * 2004-12-27 2006-06-29 Samhita Dasgupta Static and dynamic pressure sensor
CN200989838Y (en) * 2006-03-03 2007-12-12 *** Pressure sensor
CN102401715A (en) * 2010-08-23 2012-04-04 霍尼韦尔国际公司 Pressure sensor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060137456A1 (en) * 2004-12-27 2006-06-29 Samhita Dasgupta Static and dynamic pressure sensor
CN200989838Y (en) * 2006-03-03 2007-12-12 *** Pressure sensor
CN102401715A (en) * 2010-08-23 2012-04-04 霍尼韦尔国际公司 Pressure sensor

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
森村正直等: "《传感器工程学》", 31 August 1988, 大连工学院出版社 *
王雅芳等: "《传感器原理与实用技术》", 31 July 2014, 机械工业出版社 *

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PB01 Publication
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RJ01 Rejection of invention patent application after publication

Application publication date: 20160629

RJ01 Rejection of invention patent application after publication