CN105555729A - 带低反射膜的强化玻璃板及其制造方法 - Google Patents

带低反射膜的强化玻璃板及其制造方法 Download PDF

Info

Publication number
CN105555729A
CN105555729A CN201480051585.8A CN201480051585A CN105555729A CN 105555729 A CN105555729 A CN 105555729A CN 201480051585 A CN201480051585 A CN 201480051585A CN 105555729 A CN105555729 A CN 105555729A
Authority
CN
China
Prior art keywords
reflection film
low
silica
glass plate
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201480051585.8A
Other languages
English (en)
Chinese (zh)
Inventor
神户美花
本谷敏
大谷义美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of CN105555729A publication Critical patent/CN105555729A/zh
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/001Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
    • C03C21/002Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/048Encapsulation of modules
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/40Coatings comprising at least one inhomogeneous layer
    • C03C2217/43Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/40Coatings comprising at least one inhomogeneous layer
    • C03C2217/43Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475Inorganic materials
    • C03C2217/478Silica
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/73Anti-reflective coatings with specific characteristics
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Composite Materials (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Glass Compositions (AREA)
CN201480051585.8A 2013-09-18 2014-09-17 带低反射膜的强化玻璃板及其制造方法 Pending CN105555729A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013-193515 2013-09-18
JP2013193515 2013-09-18
PCT/JP2014/074588 WO2015041257A1 (ja) 2013-09-18 2014-09-17 低反射膜付き強化ガラス板およびその製造方法

Publications (1)

Publication Number Publication Date
CN105555729A true CN105555729A (zh) 2016-05-04

Family

ID=52688904

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480051585.8A Pending CN105555729A (zh) 2013-09-18 2014-09-17 带低反射膜的强化玻璃板及其制造方法

Country Status (4)

Country Link
JP (1) JPWO2015041257A1 (ja)
CN (1) CN105555729A (ja)
TW (1) TW201527087A (ja)
WO (1) WO2015041257A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114436543A (zh) * 2022-01-07 2022-05-06 常州亚玛顿股份有限公司 一种光伏组件用镀膜玻璃及其制备方法
US20220149213A1 (en) * 2020-11-09 2022-05-12 Exasun B.V. Photovoltaic devices
CN113195971B (zh) * 2018-12-18 2024-03-08 松下知识产权经营株式会社 波长转换构件、光学装置及投影器

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6376607B2 (ja) 2012-11-30 2018-08-22 コーニング インコーポレイテッド 反射低減ガラス物品ならびにその製造方法および使用方法
US9366784B2 (en) 2013-05-07 2016-06-14 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9359261B2 (en) 2013-05-07 2016-06-07 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9684097B2 (en) 2013-05-07 2017-06-20 Corning Incorporated Scratch-resistant articles with retained optical properties
US9110230B2 (en) 2013-05-07 2015-08-18 Corning Incorporated Scratch-resistant articles with retained optical properties
US9703011B2 (en) 2013-05-07 2017-07-11 Corning Incorporated Scratch-resistant articles with a gradient layer
US9335444B2 (en) 2014-05-12 2016-05-10 Corning Incorporated Durable and scratch-resistant anti-reflective articles
US11267973B2 (en) 2014-05-12 2022-03-08 Corning Incorporated Durable anti-reflective articles
US9790593B2 (en) 2014-08-01 2017-10-17 Corning Incorporated Scratch-resistant materials and articles including the same
JP6604781B2 (ja) 2014-12-26 2019-11-13 日東電工株式会社 積層フィルムロールおよびその製造方法
JP6599699B2 (ja) 2014-12-26 2019-10-30 日東電工株式会社 触媒作用を介して結合した空隙構造フィルムおよびその製造方法
WO2016204003A1 (ja) * 2015-06-18 2016-12-22 旭硝子株式会社 ガラス物品およびその製造方法
JP6713871B2 (ja) 2015-07-31 2020-06-24 日東電工株式会社 光学積層体、光学積層体の製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法
JP6713872B2 (ja) 2015-07-31 2020-06-24 日東電工株式会社 積層フィルム、積層フィルムの製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法
JP6892744B2 (ja) 2015-08-24 2021-06-23 日東電工株式会社 積層光学フィルム、積層光学フィルムの製造方法、光学部材、および画像表示装置
JP7152130B2 (ja) 2015-09-07 2022-10-12 日東電工株式会社 低屈折率層、積層フィルム、低屈折率層の製造方法、積層フィルムの製造方法、光学部材および画像表示装置
JP2018536177A (ja) 2015-09-14 2018-12-06 コーニング インコーポレイテッド 高光線透過性かつ耐擦傷性反射防止物品
JP6870348B2 (ja) * 2016-02-04 2021-05-12 Agc株式会社 カバーガラス及びガラス積層体
US11286201B2 (en) 2017-01-31 2022-03-29 AGC Inc. Cover glass and glass laminate
US11584674B2 (en) 2017-04-24 2023-02-21 Lg Electronics Inc. Curved glass manufacturing method
KR20230146673A (ko) 2018-08-17 2023-10-19 코닝 인코포레이티드 얇고, 내구성 있는 반사-방지 구조를 갖는 무기산화물 물품

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101939266A (zh) * 2008-02-05 2011-01-05 康宁股份有限公司 用作电子装置中的盖板的耐破损玻璃制品
TW201245080A (en) * 2011-03-17 2012-11-16 Asahi Glass Co Ltd Glass for chemical strengthening
CN103260870A (zh) * 2010-12-24 2013-08-21 旭硝子株式会社 具有低反射膜的物品

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002234754A (ja) * 2001-02-02 2002-08-23 Nippon Sheet Glass Co Ltd 強化された機能性膜被覆ガラス物品の製造方法
JP2008254955A (ja) * 2007-04-03 2008-10-23 Lintec Corp 低反射ガラス板、その製造方法及び表示媒体
JP5433372B2 (ja) * 2009-10-20 2014-03-05 フクビ化学工業株式会社 反射防止強化ガラスの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101939266A (zh) * 2008-02-05 2011-01-05 康宁股份有限公司 用作电子装置中的盖板的耐破损玻璃制品
CN103260870A (zh) * 2010-12-24 2013-08-21 旭硝子株式会社 具有低反射膜的物品
TW201245080A (en) * 2011-03-17 2012-11-16 Asahi Glass Co Ltd Glass for chemical strengthening

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113195971B (zh) * 2018-12-18 2024-03-08 松下知识产权经营株式会社 波长转换构件、光学装置及投影器
US20220149213A1 (en) * 2020-11-09 2022-05-12 Exasun B.V. Photovoltaic devices
CN114436543A (zh) * 2022-01-07 2022-05-06 常州亚玛顿股份有限公司 一种光伏组件用镀膜玻璃及其制备方法
CN114436543B (zh) * 2022-01-07 2023-06-02 常州亚玛顿股份有限公司 一种光伏组件用镀膜玻璃及其制备方法

Also Published As

Publication number Publication date
WO2015041257A1 (ja) 2015-03-26
TW201527087A (zh) 2015-07-16
JPWO2015041257A1 (ja) 2017-03-02

Similar Documents

Publication Publication Date Title
CN105555729A (zh) 带低反射膜的强化玻璃板及其制造方法
WO2011027827A1 (ja) 基材の表面に低反射膜を有する物品
TWI509048B (zh) 太陽能電池之防反射膜用組成物、太陽能電池之防反射膜、太陽能電池之防反射膜的製造方法、及太陽能電池
WO2015186753A1 (ja) 機能膜付き化学強化ガラス板、その製造方法および物品
WO2013051620A1 (ja) 低反射膜付き物品の製造方法
CN103476726B (zh) 附有低反射膜的玻璃板
EP2128091B1 (en) Hollow microparticle, method for production thereof, coating composition, and article having coating film formed thereon
JP6586897B2 (ja) 防眩膜付き基材、膜形成用塗布液およびその製造方法
JP2016018068A (ja) 防眩膜付き基材および物品
US20110135941A1 (en) Coating composition and article having coating film formed thereon
WO2014061606A1 (ja) 防汚性反射防止膜、物品およびその製造方法
JP6599666B2 (ja) 光散乱性被膜を有する透明スクリーン及び光散乱性被膜形成用塗布液
JP2015049319A (ja) 透明基材と防汚性反射防止膜とを備える物品およびその製造方法
EP2128090B1 (en) Hollow microparticle, method for production thereof, coating composition, and article having coating film formed thereon
JP2016041481A (ja) 防眩性反射防止膜付き透明基材および物品
JP2009297626A (ja) シリカ系被膜形成法及び塗布液
JP2010075775A (ja) 波長選択型遮蔽膜および波長選択型遮蔽体
JP6206418B2 (ja) アルカリバリア層形成用コート液及び物品
JP2013160799A (ja) 低反射膜付き物品の製造方法
JP6164120B2 (ja) 反射防止膜付き基材および物品
JP2009046609A (ja) 熱線・紫外線遮蔽膜形成用塗布液および熱線・紫外線遮蔽膜、並びに、熱線・紫外線遮蔽基材
JP2002188054A (ja) 着色膜形成用塗布液
JP2002338302A (ja) 着色膜形成用塗布液およびその作製方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20160504