CN104062746B - A kind of catadioptric submergence projection optical system of large-numerical aperture - Google Patents
A kind of catadioptric submergence projection optical system of large-numerical aperture Download PDFInfo
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- CN104062746B CN104062746B CN201410283831.4A CN201410283831A CN104062746B CN 104062746 B CN104062746 B CN 104062746B CN 201410283831 A CN201410283831 A CN 201410283831A CN 104062746 B CN104062746 B CN 104062746B
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Abstract
The present invention relates to the catadioptric submergence projection optical system of a kind of large-numerical aperture.In the present invention, the catadioptric submergence projection optical system of large-numerical aperture is made up of multiple lens and four speculums.Four mirror groups can be divided into successively from object plane to image planes.Wherein, the first set of lenses has positive light coke, and radially has certain distance to offset relative to other mirror groups, is conducive to compressing subsequent optical path, thus reduces lens and aperture of a mirror in subsequent optical path.Projection optical system numerical aperture in the present invention is big, aberration is little.Relative to other projection objectives, while its sharpest edges are to reach larger data aperture, in system, lens and aperture of a mirror are less, thus reduce the dimensional requirement to optical material, reduce manufacturing cost, reduce the processing of eyeglass, detection difficulty.
Description
Technical field
The present invention relates to a kind of projection optical system working in ultraviolet band, particularly to a kind of large-numerical aperture (number
Value aperture up to 1.35) catadioptric submergence projection optical system.
Background technology
Optical lithography is the main production method of modern super large-scale integration.Along with the development needed, optics is thrown
Shadow photoetching technique is the most effectual way that current large-scale low-cost produces large scale integrated circuit, and this technology production efficiency is high,
Technology maturation is stable, is widely used in the semiconductor industry such as FPD, semiconductor lighting.Along with super large-scale integration
(VLSI) development, its integrated level is more and more higher, and its critical size also becomes more and more less, present mainstream electronic product key chi
Very little all at 28nm, forward 22nm large-scale low-costization develops.The optical property of exposure system of photo-etching machine is proposed higher by this
Requirement.
The critical size of electronic product to be reduced, only two kinds approach.One is to reduce wavelength, uses the purple that wavelength is shorter
Outer light；Another approach is just to increase the image-side numerical aperture of photoetching projection objective lens.Present stage mainly uses the ArF of 193nm
Ultraviolet light.In the case of wavelength is constant, in order to reduce the critical size of electronic product, only increase the picture of photoetching projection objective lens
Side numerical aperture.Exposing for dry type, the image-side numerical aperture of photoetching projection objective lens, after reaching 0.93, cannot continue to increase
Add.In order to increase image-side numerical aperture, only increase the last lens material of projection objective use wavelength refractive index or
Increase the refractive index between last one side and image planes.Relatively change lens material, in the last a piece of lens of projection objective and image planes
Between be filled with the liquid that refractive index is higher, then be a kind of relatively easy realization and lower-cost method.
For optical system with high NA, owing to there is the biggest the hereby watt curvature of field, this will cause optical system
Curvature of the image serious, and for exposure semiconductor silicon chip, it is thus achieved that flat field seems critically important.In order to obtain flat field picture,
Projection optical system is designed as refraction-reflection type projection optical system by one of them method solved exactly, this refraction and reflection projection
Comprise refracting element and reflecting element in optical system, be similar to positive lens focal power owing to concave mirror has but have negative
The lens curvature of field, is beneficial to correct the curvature of field.Therefore, owing to there being one or more concave mirror in refraction and reflection projection optical system.From
And the system curvature of field can be corrected well.For the needs in structure, concave mirror occurs the most in pairs, i.e. reflection in system
Mirror quantity is even number.
Along with the increase of projection objective image-side numerical aperture, in optical system, lens and aperture of a mirror the most drastically increase
Greatly, this proposes requirements at the higher level to the size of optical material, brings to the optical element producing, processing large caliber and high quality serious tired
Difficult.The most also requirements at the higher level are proposed in detection.
The projection optical system related in the present invention, while realizing the large-numerical aperture of system well, solves well
Determine the curvature of the image brought by the large-numerical aperture of system and the excessive problem of optical element dimension.It addition, with pure refraction be
System is compared, and the system in the present invention preferably solves the problem that the component size brought by large-numerical aperture is excessive.Work as projection
When object lens image-side numerical aperture reaches 1.35, the full-size of optical element is about at 300mm, the most greatly.In this patent
The projection objective related to is when image-side numerical aperture reaches 1.35, and the size of optical element all controls within 240mm.Optics unit
The bore of part reduces 20%.
The method have the characteristics that and realizing system large-numerical aperture and the high image quality of the system that ensure that and compact
System architecture while, efficiently reduce the bore of optical element in projection objective, thus reduce manufacturing cost, reduce unit
The processing of part and the difficulty of detection.
Summary of the invention
The technical problem to be solved in the present invention is to provide the catadioptric submergence projection optical system of a kind of large-numerical aperture, carries
High exposure resolution ratio, reduces system dimension.The present invention proposes and is applicable to DUV wavelength illumination and numerical aperture reaches
The submergence projection optical system of 1.35, this optical system structure is compact, visual field big, good imaging quality, and has less size
With less material consumption.
The technical solution used in the present invention is: the catadioptric submergence projection optical system of a kind of large-numerical aperture, described greatly
Numerical aperture projection optical system includes the first set of lenses G1, the second reflection and transmission mirror group G2, the 3rd reflection along its optical axis direction
Mirror group G3 and the 4th set of lenses G4.First set of lenses G1 of the large-numerical aperture catadioptric submergence projection objective in the present invention has
Positive light coke, the second reflection and transmission mirror group G2 has negative power, and the 3rd set of lenses G3 has positive light coke, the 4th set of lenses G4
Having positive light coke, the projection optical system of described large-numerical aperture contains 24 lens and four speculums, and bag
Containing multiple aspherical.
First set of lenses G1 of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention comprises four
Individual lens, wherein first lens are parallel flat 1, and second lens is biconvex lens 2, and the 3rd lens are positive meniscus lens
3, the 4th lens are positive meniscus lens 4.
Double in first set of lenses G1 of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention
Convex lens 2, positive meniscus lens 3, positive meniscus lens 4 lens have deviation along the direction being perpendicular to systematic optical axis.
Second reflection and transmission mirror group G2 of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention,
3rd set of lenses G3, the 4th set of lenses G4 along be perpendicular to systematic optical axis direction without departing from.
Second reflection and transmission mirror group G2 of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention
Comprise six-element lens and four speculums.Wherein the 5th is recessed speculum 5, and the 6th is recessed speculum 6, and the 7th is biconvex
Lens 7, the 8th is positive meniscus lens 8, and the 9th is positive meniscus lens 9, and the tenth is positive meniscus lens 10, and the tenth a piece of is
Recessed speculum the 11, the 12nd is positive meniscus lens 12, and the 13rd is recessed speculum 13, and the 14th is positive meniscus lens
14。
Second reflection and transmission mirror group G2 of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention
In the 5th recessed speculum 5, the 6th recessed speculum 6,9 first, the tenth positive meniscus lens of the 9th positive meniscus lens
10 first, the tenth a piece of recessed speculum 11,12 first, the 13rd recessed speculum 13 of the 12nd positive meniscus lens,
14 positive meniscus lens 14 first are aspherical.
3rd set of lenses G3 of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention comprises nine
Sheet lens.Wherein the 15th is biconvex lens 15, and the 16th is diverging meniscus lens 16, and the 17th is diverging meniscus lens
17, the 18th is positive meniscus lens 18, and the 19th is positive meniscus lens 19, and the 20th is negative lens 20, the 21st
Sheet is biconvex lens 21, and the 22nd is positive meniscus lens 22, and the 23rd is biconvex lens 23.
In 3rd set of lenses G3 of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention
Second, the 17th diverging meniscus lens 17 of second, the 16th diverging meniscus lens 16 of 15 biconvex lens 15
First of first, the 20th negative lens 20 of second, the 19th positive meniscus lens 19, the 20th a piece of lenticular
First of first, the 23rd biconvex lens 23 of mirror 21 is aspherical.
4th set of lenses G4 of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention comprises five
Sheet lens.Wherein the 25th is positive meniscus lens 25, and the 26th is positive meniscus lens 26, and the 27th is the most curved
The moon, the 27, the 28th, lens were positive meniscus lens 28, and the 29th is positive meniscus lens 29.
In 4th set of lenses G4 of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention
Second of second, the 27th positive meniscus lens 27 of 25 positive meniscus lens 25, the 28th positive bent moon
Second of lens 28 is aspherical.
Between last one side and the image planes of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention
Medium be high refractive index liquid, include but not limited to deionized water.
3rd set of lenses G3 and the 4th of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention
System aperture diaphragm 24 is set between set of lenses G4.
The catadioptric submergence projection optical system of the large-numerical aperture related in the present invention is doubly telecentric system.
The catadioptric submergence projection optical system of the large-numerical aperture related in the present invention is applicable to deep ultraviolet lighting source,
Include but not limited to the light source that wavelength is 157nm, 193.3nm or 248nm.
The present invention compared with prior art has a following advantage:
1. first set of lenses G1 of catadioptric submergence projection optical system of the large-numerical aperture related in the present invention, second
The focal power of reflection and transmission mirror group G2, the 3rd set of lenses G3 and the 4th set of lenses G4 is the most positive and negative, just and just, this structure
Can well correct system aberration.
2. the first diaphotoscope group G1 of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention
First lens are parallel flat 1, can be replaced the most on demand.
3. the first speculum group G1 tool of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention
There is positive light coke, and along being perpendicular to optical axis direction, there is certain deviation.Light path can be compressed, reduce the chi of subsequent optical element
Very little.
4. the second reflection and transmission mirror group of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention
G2 comprises four concave mirrors, has in the correction system curvature of field, improves image quality.
5. the second reflection and transmission mirror group of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention
G2 comprises four concave mirrors can be with folding system light path so that system architecture is compact.
6. 17 of the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention are aspherical is concave surface,
Only 1 aspherical convex surface, has in reducing processing and detection difficulty.
7. the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention is doubly telecentric system, thing side and
Image space is all telecentric beam path.Therefore, it can relative reduction object plane (mask plane) and the site error of image planes 30 (silicon chip face).Even if
When its physical location has less deviation relative to design attitude, do not result in significantly reducing of projection objective optical property yet.
8. the image-side numerical aperture in the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention reaches
To 1.35.
9. the optical element in the catadioptric submergence projection optical system of the large-numerical aperture related in the present invention all has
Less bore, and the maximum caliber of optical element is not more than 240mm.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of the catadioptric submergence projection optical system of the large-numerical aperture of the present invention.
Fig. 2 is that the visual field of the catadioptric submergence projection optical system of the large-numerical aperture of the present invention arranges schematic diagram.In figure
The rectangle indicated with oblique line is system visual field.
Fig. 3 is that the catadioptric submergence projection optical system of the large-numerical aperture of present invention optical modulation in the range of the whole audience passes
Delivery function；The English MTF meaning in figure is modulation transfer function；The English DIFFRACTION LIMT meaning in figure is diffraction pole
Limit；The DEFOCUSING meaning is out of focus.The tee meaning in figure is the modulation degree in meridian plane；The English R meaning in figure is arc
Modulation degree in sagittal plane, the English FIELD meaning in figure is visual field；The English Mar meaning in figure is March.
Fig. 4 is that the catadioptric submergence projection optical system of the large-numerical aperture of the present invention is at astigmatism and distortion aberration curve.
In figure, the FOCUS meaning is focus point；In figure, the MILLIMETERS meaning is millimeter；In figure, the DISTORTION meaning is relative distortion.
Label declaration: 1-the first parallel flat, 2-biconvex lens, 3-positive meniscus lens, 4-positive meniscus lens, 5-
The recessed speculum of recessed speculum, 6-, 7-biconvex lens, 8-positive meniscus lens, 9-positive meniscus lens, 10-positive meniscus lens,
The recessed speculum of 11-, 12-positive meniscus lens, the recessed speculum of 13-, 14-positive meniscus lens, 15-biconvex lens, 16-bear curved
Month lens, 17-diverging meniscus lens, 18-positive meniscus lens, 19-positive meniscus lens, 20-negative lens, 21-biconvex lens,
22-positive meniscus lens, 23-biconvex lens, 24-aperture diaphragm, 25-positive meniscus lens, 26-positive meniscus lens, 27-are just
Meniscus lens, 28-positive meniscus lens, 29-positive meniscus lens, 30-image planes.Label 9 ' and label 9 " lens that indicated with
The lens that label 9 is indicated are with a piece of lens.The lens that the lens that label 10 ' is indicated and label 10 are indicated are with a piece of
Lens.The lens that the lens that label 12 ' is indicated and label 12 are indicated are with a piece of lens.
Detailed description of the invention
With detailed description of the invention, the present invention is described in further detail below in conjunction with the accompanying drawings.
Fig. 1 is the catadioptric submergence projection optical system schematic diagram of large-numerical aperture, employ altogether 24 lens and
Four speculums, include the first set of lenses G1, the second reflection and transmission mirror group G2, the 3rd speculum group successively from light beam incident direction
G3 and the 4th set of lenses G4.First set of lenses G1 has positive light coke；Second reflection and transmission mirror group G2 has negative power；3rd
Set of lenses G3 has positive light coke；4th set of lenses G4 has positive light coke.Image planes 33 are silicon chip face.
The first set of lenses G1 edge that the present invention is comprised is perpendicular to optical axis direction and has certain bias.Second reflection and transmission
20 lens and four speculums coaxial (systematic optical axis), i.e. edges in mirror group G2, the 3rd set of lenses G3 and the 4th set of lenses G4
Be perpendicular to optical axis direction without departing from.
The first set of lenses G1 that the present invention is comprised comprises four lens, and first is parallel flat 1, and second lens is
Biconvex lens 2, the 3rd lens are positive meniscus lens 3, and the 4th lens are positive meniscus lens 4.
The first lens of the first set of lenses G1 that the present invention is comprised are parallel flat 1, as whole projection objective
Protection glass and sealed window, can be replaced the most on demand.
The first set of lenses G1 that the present invention is comprised has positive light coke, and has certain deviation along being perpendicular to optical axis direction
Amount.Its Main Function is the light wire compression launched by the object point on object plane, as shown in fig. 1, by each visual field point upper in Fig. 1
Light turns down, and is upwards turned back by the lower light of each visual field point in Fig. 1, thus reduces the mouth of optical element in subsequent optical path
Footpath.
The second reflection and transmission mirror group G2 that the present invention is comprised comprises six-element lens and four speculums, they respectively:
5th is recessed speculum 5, and the 6th is recessed speculum 6, and the 7th is biconvex lens 7, and the 8th is positive meniscus lens 8, the
Nine is positive meniscus lens 9, and the tenth is positive meniscus lens 10, and the tenth is a piece of for recessed speculum 11, and the 12nd is positive bent moon
Lens 12, the 13rd is recessed speculum 13, the 14th positive meniscus lens 14.Wherein the 5th speculum 5 and the 13rd
The middle and upper part of 13 use speculums of speculum is divided, the 6th speculum 6 and the tenth a piece of speculum 11, a use speculum
Lower middle portion.
5th recessed speculum 5 of the second reflection and transmission mirror group G2 that the present invention is comprised, the 6th recessed speculum 6 and
Seven biconvex lens 7 Main Functions are that the light from the first set of lenses outgoing becomes real image in the 7th biconvex lens 7 and the 8th
In airspace between sheet positive meniscus lens 8, and prevent intermediate image plane from " falling into " lens interior.8th positive meniscus lens 8,
9th positive meniscus lens 9, the tenth positive meniscus lens the 10, the 11st the 11, the 12nd positive meniscus lens 12 of anti-recessed speculum,
13rd recessed speculum 13 and the 14th positive meniscus lens 14 Main Function are that a real image surface imaging is in the 14th
In airspace between positive meniscus lens 14 and the 15th biconvex lens 15, and prevent intermediate image plane from " falling into " in lens
Portion.Second reflection and transmission mirror group G2 has negative power, and comprises multiple concave mirror, for aberration correction, and especially field
Song has great role.
The 3rd set of lenses G3 that the present invention is comprised comprises nine lens.Wherein the 15th is biconvex lens 15, the tenth
Six is diverging meniscus lens 16, and the 17th is diverging meniscus lens 17, and the 18th is positive meniscus lens 18, and the 19th is just
Meniscus lens 19, the 20th is negative lens 20, and the 20th is a piece of for biconvex lens 21, and the 22nd is positive meniscus lens
22, the 23rd is biconvex lens 23.3rd diaphotoscope group G3 has positive light coke, for class double gauss structure.It is for being
The correction of system image space telecentricity and other metrical aberrations (such as spherical aberration, distortion etc.) has great role.
The 4th set of lenses G4 that the present invention is comprised comprises five lens.Wherein the 25th is positive meniscus lens 25,
26th is positive meniscus lens 26, and the 27th is positive meniscus lens 27, and the 28th is positive meniscus lens 28, the
29 is positive meniscus lens 29.4th diaphotoscope group G4 has positive light coke, is ultimately imaged in image planes by object point, and protects
Card system image-side numerical aperture reaches to design requirement.Also certain effect is had for system image space telecentricity, aberration balancing.
The object plane of the catadioptric submergence projection optical system of large-numerical aperture involved in the present invention is position, mask face, as
Face 30 is position, silicon chip face.Vertical axle magnifying power between object plane and image planes 30 is-0.25.Negative sign represents the side of object plane and image planes 30
To being contrary.
The catadioptric submergence projection optical system of large-numerical aperture involved in the present invention is doubly telecentric system.So-called double remote
Feel concerned about system and refer to that, in the light cone that on object plane, each point sends, its chief ray in meridian plane is parallel with optical axis, and this light exists
Also incide in image planes being parallel to the direction of optical axis in meridian plane.Aforesaid chief ray refers to the process that the point on object plane is launched
The light at diaphragm center.The catadioptric submergence projection optical system of large-numerical aperture involved in the present invention is doubly telecentric system,
Can be with relative reduction object plane (mask plane) and the site error of image planes 30 (silicon chip face).Even if its physical location is relative to design position
When being equipped with less deviation, do not result in significantly reducing of projection objective optical property yet.
Between the 3rd set of lenses G3 and the 4th set of lenses G4 that the present invention is comprised, system aperture diaphragm 24 is set.This aperture
Diaphragm 24 can be iris diaphgram, to regulate the size in system value aperture.
The catadioptric submergence projection optical system of large-numerical aperture involved in the present invention is applicable to deep ultraviolet lighting source,
It is the light source of 193.3nm at wavelength, there is good picture element.May naturally be used for wavelength is 248nm and 157nm.
Table 1 gives the basic ginseng of the catadioptric submergence projection optical system of the large-numerical aperture in the embodiment of the present invention
Number.Design parameter refer to table 1.
Table 2 gives the catadioptric submergence every eyeglass of projection optical system of the large-numerical aperture in the embodiment of the present invention
Design parameter.Wherein, " the surface sequence number " in table 2 is to count along the light direction of propagation, as only flat in the first set of lenses G1
The beam incident surface of row flat board 1 is sequence number S1, and beam exit face is sequence number S2, and other minute surface sequence number is by that analogy；In table 2
" radius " represents the radius of curvature in this face.It is positive and negative concludes that principle is: using this vertex of surface as starting point, terminal is the curvature in this face
Center.If line direction is identical with the light direction of propagation, just it is, otherwise is negative.If this face is plane, this curvature radius is
Infinity, depending on specifically arranging optometry design software, it is also possible to replaces with a numerical value the biggest, such as 1E20；In table 2
" thickness " gives adjacent two faces distance on optical axis.Its positive and negative decision principle is: using when forward apex is as starting point, under
One vertex of surface is as terminal.If line direction is identical with the light direction of propagation, just it is, otherwise is negative.If the material between two faces
Material is for glass, then this thickness represents lens thickness, if not having material between two faces, then it represents that two lens (or lens
And speculum) between airspace." half bore " in table 2 is projection objective image-side numerical aperture each optics when being 1.35
Half bore value of element.If adjusting numerical aperture numerical value, then optical element half bore value also can change." material " in table 2
For the optical material of each lens, default place is air.
All length unit in table 2 is mm.
Table 2A is supplementing of table 2, which gives each aspheric asphericity coefficient.
Table 1 projection objective basic parameter
| Operation wavelength | 193.368nm |
| Image-side numerical aperture | 1.35 |
| Enlargement ratio | -0.25 |
| Image space | 26mm×9mm |
| Image distance | 1300mm |
| Thing side's working distance | 31.59mm |
| Image space working distance | 3.1mm |
| SIO2 refractive index | 1.560219 |
| Immersion liquid refractive index | 1.432040 |
Table 2 projection objective design parameter
Table 2A projection objective asphericity coefficient
Claims (12)
1. a catadioptric submergence projection optical system for large-numerical aperture, projects to as flat for will be located in the pattern of object plane
On face, the catadioptric submergence projection optical system of described large-numerical aperture includes the first set of lenses (G1), the second reflection and transmission mirror
Group (G2), the 3rd set of lenses (G3), the 4th set of lenses (G4), it is characterised in that: from the first set of lenses of light beam incident direction
(G1) having positive light coke, the second reflection and transmission mirror group (G2) has negative power, and the 3rd set of lenses (G3) has positive light coke,
4th set of lenses (G4) has positive light coke, and the catadioptric submergence projection optical system of described large-numerical aperture contains 24
Sheet lens and four speculums, and comprise multiple aspherical；
Described the first set of lenses (G1) comprises four lens, and wherein first lens are parallel flat (1), and second lens is
Biconvex lens (2), the 3rd lens are positive meniscus lens (3), and the 4th lens are positive meniscus lens (4)；
Between the 3rd set of lenses (G3) and the 4th set of lenses (G4), system aperture diaphragm (24) is set.
2. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, it is characterised in that: described the
Biconvex lens (2) in one set of lenses (G1), positive meniscus lens (3), positive meniscus lens (4) radially, relative to systematic optical axis
There is deviation.
3. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, it is characterised in that: described the
Two reflection and transmissions mirror group (G2), the 3rd set of lenses (G3), the 4th set of lenses (G4) with optical axis vertical direction without departing from.
4. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, it is characterised in that: described the
Two reflection and transmissions mirror group (G2) comprise six-element lens and four speculums, and wherein the 5th is recessed speculum (5), and the 6th is recessed
Speculum (6), the 7th is biconvex lens (7), and the 8th is positive meniscus lens (8), and the 9th is positive meniscus lens (9), the
Ten is positive meniscus lens (10), and the tenth is a piece of for recessed speculum (11), and the 12nd is positive meniscus lens (12), the 13rd
For recessed speculum (13), the 14th is positive meniscus lens (14).
5. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 4, it is characterised in that: described the
The 5th recessed speculum (5) in two reflection and transmissions mirror group (G2), the 6th recessed speculum (6), the 9th positive meniscus lens (9)
First, the tenth positive meniscus lens (10) first, the tenth a piece of recessed speculum (11), the 12nd positive meniscus lens (12)
First, the 13rd recessed speculum (13), the 14th positive meniscus lens (14) first be aspherical.
6. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, it is characterised in that: described the
Three set of lenses (G3) comprise nine lens, and wherein the 15th is biconvex lens (15), and the 16th is diverging meniscus lens (16),
17th is diverging meniscus lens (17), and the 18th is positive meniscus lens (18), and the 19th is positive meniscus lens (19), the
20 is negative lens (20), and the 20th is a piece of for biconvex lens (21), and the 22nd is positive meniscus lens (22), the 20th
Three is biconvex lens (23).
7. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 6, it is characterised in that: described the
Second of second, the 16th diverging meniscus lens (16) of the 15th biconvex lens (15) in three set of lenses (G3),
First of second, the 19th positive meniscus lens (19) of 17th diverging meniscus lens (17), the 20th negative lens
(20) first, first of first, the 23rd biconvex lens (23) of the 20th a piece of biconvex lens (21) is
Aspherical.
8. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, it is characterised in that: described the
Four set of lenses (G4) comprise five lens, and wherein the 25th is positive meniscus lens (25), and the 26th is that positive bent moon is saturating
Mirror (26), the 27th is positive meniscus lens (27), and the 28th is positive meniscus lens (28), and the 29th is the most curved
Moon lens (29).
9. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 8, it is characterised in that: described the
Of second of the 25th positive meniscus lens (25), the 27th positive meniscus lens (27) in four set of lenses (G4)
Second of two, the 28th positive meniscus lens (28) is aspherical.
10. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, it is characterised in that: in system
Medium between rear one side and image planes is high-index fluid, includes but not limited to deionized water.
The catadioptric submergence projection optical system of 11. large-numerical apertures as claimed in claim 1, it is characterised in that: described greatly
The catadioptric submergence projection optical system of numerical aperture is doubly telecentric system.
The catadioptric submergence projection optical system of 12. large-numerical apertures as claimed in claim 1, it is characterised in that: described greatly
The catadioptric submergence projection optical system of numerical aperture is applicable to deep ultraviolet lighting source, wavelength be 157nm, 193.3nm or
The light source of 248nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410283831.4A CN104062746B (en) | 2014-06-23 | 2014-06-23 | A kind of catadioptric submergence projection optical system of large-numerical aperture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410283831.4A CN104062746B (en) | 2014-06-23 | 2014-06-23 | A kind of catadioptric submergence projection optical system of large-numerical aperture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104062746A CN104062746A (en) | 2014-09-24 |
| CN104062746B true CN104062746B (en) | 2016-08-24 |
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| CN201410283831.4A Expired - Fee Related CN104062746B (en) | 2014-06-23 | 2014-06-23 | A kind of catadioptric submergence projection optical system of large-numerical aperture |
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| CN105807410B (en) * | 2014-12-31 | 2018-11-09 | 上海微电子装备（集团）股份有限公司 | A kind of refraction-reflection projection objective based on high-NA |
| CN110045492B (en) * | 2019-04-26 | 2024-03-15 | 中国科学院长春光学精密机械与物理研究所 | Wide-spectrum large-numerical aperture ultrahigh-flux micro-objective optical system |
| JP7240261B2 (en) * | 2019-06-05 | 2023-03-15 | キヤノン株式会社 | IMAGING DEVICE AND CONTROL METHOD THEREOF, PROGRAM, STORAGE MEDIUM |
| CN111929806B (en) * | 2019-08-15 | 2021-12-14 | 上海微电子装备（集团）股份有限公司 | Photoetching projection objective and photoetching machine |
| CN113835209B (en) * | 2021-11-19 | 2024-04-26 | 中导光电设备股份有限公司 | Large-view-field DUV objective lens |
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| JP4245286B2 (en) * | 2000-10-23 | 2009-03-25 | 株式会社ニコン | Catadioptric optical system and exposure apparatus provided with the optical system |
| US7085075B2 (en) * | 2003-08-12 | 2006-08-01 | Carl Zeiss Smt Ag | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
| WO2005098504A1 (en) * | 2004-04-08 | 2005-10-20 | Carl Zeiss Smt Ag | Imaging system with mirror group |
| JP2009025737A (en) * | 2007-07-23 | 2009-02-05 | Canon Inc | Catadioptric type projection optical system, exposure device and device manufacturing method |
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