CN100587544C - Refraction and reflection projection optical system - Google Patents
Refraction and reflection projection optical system Download PDFInfo
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- CN100587544C CN100587544C CN200710173571A CN200710173571A CN100587544C CN 100587544 C CN100587544 C CN 100587544C CN 200710173571 A CN200710173571 A CN 200710173571A CN 200710173571 A CN200710173571 A CN 200710173571A CN 100587544 C CN100587544 C CN 100587544C
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Abstract
The invention provides a diffractive-refractive projection optical system, which is used for projecting the image of a pattern disposed in an object plane into an image plane. The optical system sequentially comprises, along the optical axis direction, a front (rear) group and a concave-spherical reflector. The front and the rear groups share a common optical element group, which sequentially comprises, along the optical axis direction, a right-angled reflection prism, a first biconvex positive, a first meniscus thick lens, a second meniscus thick lens and a three-piece optical structure. An aperture diaphragm is arranged on the concave-spherical reflector to form a completely symmetrical structure with a -1 amplification rate of the projection optical system. Accordingly, the inventive diffractive-refractive projection optical system can effectively correct aberration and improve imaging quality; and can effectively shorten the total length of the projection optical system and achievelonger working distance.
Description
Technical field
The present invention relates to a kind of projection optical system, particularly a kind of refraction and reflection projection optical system that is used for association areas such as semiconductor lithography.
Background technology
Along with the development of projection lithography technology, the performance of projection optical system progressively improves, and goes for multiple fields such as integrated circuit manufacturing.Now the projection lithography technology is successfully applied to the submicron resolution integrated circuit and has made the field, simultaneously, in semiconductor packaging, the projection lithography technology is used for fields such as the golden projection/tin projection, silicon chip level chip scale package (WLCSP) technology of requirement low resolution (as several microns), big depth of focus, higher yields, and constantly proposes to improve the demand that improves performance for the low resolution projection objective system.
For satisfying the demand of above-mentioned projection optical system, U.S. Pat 6,879 discloses a kind of projection optical system in 383, adopts the catadioptric structure.It is a kind of traditional projection optical system, comprises two reflecting prisms from left to right, three simple lenses (be followed successively by plano-convex lens, bent moon negative lens, bent moon thick lens from left to right, all convex surfaces are towards concave spherical mirror), a concave spherical mirror.The aperture diaphragm of this system is positioned on the concave spherical mirror, and it and three simple lenses in front are formed coaxial spherical system.This system is that the axial aberration that can will hang down is zero as coma, distortion and ratio chromatism, from normal moveout correction to the input path of spherical reflector and-1 symmetrical fully magnification optical system of reflected light path.
Yet general projection exposure system therefor wishes that to projection optical system bigger operating distance is arranged, short optics length overall.But this patent provides among 5 embodiment of this optical system, and its operating distance only reaches 7.5mm～11mm scope, and its optics length overall but reaches more than 1150mm～1200mm.Thereby in the application of actual projection optical system, this operating distance will propose very harsh size restrictions to the design of work stage, especially mask platform, for example for the mask platform of using 0.25 inch (6.35mm) thick mask, its size design will be subjected to great restriction.In addition, this patent does not provide the image quality data yet.An embodiment who adopts 1 aspherical optical element design of this patent, operating distance only is increased to 11.872mm, the optics length overall reaches 1150mm simultaneously, and work such as the introducing of this aspherical optical element will be processed to optics, optical detection bring bigger difficulty.
Therefore, the projection optical system that how to provide a kind of image quality well to be guaranteed, and the operating distance that improves projection optical system is also compressed its optics length overall, for work stage and mask platform provide bigger design space, has become the technical matters that industry needs to be resolved hurrily.
Summary of the invention
The object of the present invention is to provide a kind of refraction and reflection projection optical system, effectively aberration correction, possess favorable imaging quality, and have bigger operating distance, less optics length overall, also having advantage concurrently aspect dress school and the cost.
The object of the present invention is achieved like this: a kind of refraction and reflection projection optical system, be used for to place the pattern imaging in its object plane to arrive it as in the plane, this refraction and reflection projection optical system comprises preceding group, concave spherical mirror successively along its optical axis direction, wherein, under the light reflex of this concave spherical mirror, should before group optical element as back group shared optical element, be above-mentioned preceding group and the shared same group of optical element of above-mentioned back group, this same group of optical element comprises successively along optical axis direction:
Right-angle reflecting prism, for group before described, the plane of incidence of this right-angle reflecting prism is the plane, and towards the object plane of described projection optical system, its plane of incidence is 30 millimeters to the axial distance of object plane, for described back group, the exit facet of this right-angle reflecting prism is the plane, and towards the picture plane of described projection optical system;
The first biconvex positive lens, the axial spacing of itself and right-angle reflecting prism is 1 millimeter;
The first bent moon thick lens, the axial spacing of itself and the first biconvex positive lens is 1.05 millimeters, and with the common high-order spherical aberration of proofreading and correct above-mentioned projection optical system of the above-mentioned first biconvex positive lens;
The second bent moon thick lens, the axial spacing of itself and the first bent moon thick lens is 3.195 millimeters, and with the common curvature of the image of proofreading and correct above-mentioned projection optical system of the above-mentioned first bent moon thick lens; And
The three-chip type optical texture is used to compress the length overall of this projection optical system, realizes long operating distance simultaneously, and it comprises successively along optical axis direction:
The second biconvex positive lens, the axial spacing of itself and the above-mentioned second bent moon thick lens is 169.923 millimeters;
Double-concave negative lens produces positive spherical aberration and also does the axial chromatic aberration compensation, and the axial spacing of itself and the second biconvex positive lens is 93.086 millimeters; And
The bent moon positive lens, the axial spacing of itself and double-concave negative lens is 5.489 millimeters, and with the high-order spherical aberration and the senior astigmatism of the above-mentioned projection optical system of the common compensation of this second biconvex positive lens;
The axial spacing of this concave spherical mirror and above-mentioned bent moon positive lens is 203.505 millimeters, it is provided with aperture diaphragm, make described projection optical system form enlargement ratio and be-1 times complete symmetrical structure, and described projection optical system is object space and picture side pair telecentric beam paths;
The convex surface of above-mentioned first, second bent moon thick lens is all towards above-mentioned aperture diaphragm;
The convex surface of above-mentioned bent moon positive lens is towards above-mentioned aperture diaphragm.
Wherein, the above-mentioned first bent moon thick lens adopts the flint glass of high index of refraction, high abbe number, high permeability, such as F2HT glass.
The above-mentioned first biconvex positive lens, the second bent moon thick lens and the second biconvex positive lens adopt the crown glass of low-refraction, low abbe number, high permeability, such as FK5HT glass.
Above-mentioned double-concave negative lens adopts the crown glass of low-refraction, low abbe number, high permeability, such as BK7HT glass.
Above-mentioned refraction and reflection projection optical system, wherein, above-mentioned right-angle reflecting prism and bent moon positive lens adopt the fused quartz glass of low-refraction, low abbe number.
The present invention makes it compared with prior art owing to adopted above-mentioned technical scheme, has following advantage and good effect:
1. projection optical system of the present invention adopts the catadioptric structure of symmetrical expression, and aberration correction improves image quality effectively;
2. therefore projection optical system of the present invention has the advantage of long reach owing to adopt the three-chip type optical texture;
3. it is the lens on sphere or plane that projection optical system of the present invention only adopts surface type, does not introduce non-spherical lens, thereby has reduced processing, test and the dress school difficulty of lens.
4. the shared same group of optical module of group after preceding group of projection optical system of the present invention adopts catoptron with folded optical path, saves a semi-permeable mirror, helps reducing the cost of this projection optical system.
Description of drawings
The concrete structure of refraction and reflection projection optical system of the present invention is provided by following embodiment and accompanying drawing.
Fig. 1 is the structure and the light path synoptic diagram of refraction and reflection projection optical system of the present invention.
Fig. 2 is the modulation transfer function MTF of refraction and reflection projection optical system of the present invention.
Fig. 3 is the true field of refraction and reflection projection optical system of the present invention and the dimensional drawing of visual field, picture side.
Embodiment
Below will be described in further detail refraction and reflection projection optical system of the present invention.
As shown in Figure 1, the invention provides a kind of refraction and reflection projection optical system, this projection optical system is the catadioptric symmetrical structure, and the concave spherical mirror M of aperture diaphragm is organized, is provided with in (back) before promptly comprising in turn from object plane one side.Wherein, under the light reflex of this concave spherical mirror M, each lens subassembly of group before this, each common components for this back group, (back) organizes the optical texture symmetrical fully (surface radius, interval equate the optical material unanimity) of shared optical element before promptly being somebody's turn to do, and enlargement ratio is-1.Multiplying power is according to the primary aberration theory its vertical axial aberration for-1 symmetrical structure advantage: coma, distortion, ratio chromatism, are zero from normal moveout correction.The surface of all lens subassemblies of described refraction and reflection projection optical system is sphere or plane, and shared same optical axis.
Refraction and reflection projection optical system of the present invention, it has preceding group of positive light coke and comprises successively along its optical axis direction: right-angle reflecting prism L1, L1*, the first biconvex positive lens L2, convex surface are towards the first bent moon thick lens L3 of aperture diaphragm and the second bent moon thick lens L4, the second biconvex positive lens L5, double-concave negative lens L6, the convex surface bent moon positive lens L7 towards aperture diaphragm.
In the group, the plane of incidence and the exit facet of above-mentioned right-angle reflecting prism L1, L1* are the plane, are launched into parallel flat and carry out optical design before this, and the spherical aberration that is produced, astigmatism, the curvature of field, axial chromatic aberration are used for compensating design with the corresponding aberration of back lens.In addition, this design can guarantee true field and be respectively by the reflecting prism both sides of described projection optical system optical axis that are placed in as square visual field, and be parallel to each other.
Keep the high-order spherical aberration of less axial spacing between above-mentioned first biconvex positive lens L2 and the above-mentioned first bent moon thick lens L3 with corrective system.
The above-mentioned first bent moon thick lens L3 adopts the optical material of high index of refraction and high abbe number, and its effect is the axial chromatic aberration that is used for proofreading and correct this optical system on the one hand, proofreaies and correct the curvature of the image of this optical system jointly with the above-mentioned second bent moon thick lens L4 on the other hand.
The above-mentioned second biconvex positive lens L5, double-concave negative lens L6, bent moon positive lens L7 constitute the three-chip type optical texture together, can compress the length overall of this optical system effectively, realize than long operating distance simultaneously, and can compress the clear aperture of above-mentioned concave spherical mirror M.Above-mentioned this double-concave negative lens L6 produces positive spherical aberration on the one hand and looses in order to negative spherical aberration and the negative-appearing image that compensates above-mentioned first, second biconvex positive lens L2, L5, does the axial chromatic aberration compensation on the other hand.Because the numerical aperture of projection optical system of the present invention is bigger, so compensate high-order spherical aberration and senior astigmatism by this second biconvex positive lens L5 and this bent moon positive lens L7.
In preferred embodiment of the present invention, above-mentioned right-angle reflecting prism L1, L1* and bent moon positive lens L7 adopt the fused quartz glass of low-refraction, low abbe number.The above-mentioned first biconvex positive lens L2, the second bent moon thick lens L4 and the second biconvex positive lens L5 adopt the crown glass of low-refraction, low abbe number, high permeability, such as FK5HT glass.The above-mentioned first bent moon thick lens L3 adopts the flint glass of high index of refraction, high abbe number, high permeability, such as F2HT glass.Above-mentioned double-concave negative lens L6 adopts the crown glass of low-refraction, low abbe number, high permeability, such as BK7HT glass.
Thereby lens L1 (the L1*)～L7 of group before this projection optical system can spherical aberration corrector, the curvature of field, astigmatism, chromatism of position, and axial aberration is proofreaied and correct preferably.
The positive curvature of field that concave spherical surface produced of this concave spherical mirror M can be offset the negative curvature of field that above-mentioned positive lens groups (above-mentioned first, second biconvex positive lens L2, L5 and bent moon positive lens L7) produces.The reflex of this concave spherical mirror M makes twice process of imaging beam should precedingly organize (back is organized), transmission optical component will participate in imaging twice like this, the quantity that is equivalent to optical element has reduced one times, can reduce the total optical element number of this projection optical system, and the energy folded optical path reduces the total optical length of this projection optical system.
This aperture diaphragm is positioned on this concave spherical mirror M, should before group and should back organize each shared optical element be the plane of symmetry with this aperture diaphragm, form complete symmetrical structure, obtain-1 times optical system, thereby hang down axial aberration: coma, distortion, ratio chromatism, are zero from normal moveout correction.
Simultaneously, design guarantees the lens subassembly of this preceding group, and its back focus is positioned at this aperture diaphragm center, makes that the imaging light cone of object space and image space all is axis of symmetry with the chief ray, the chief ray that is object space and image space is parallel to optical axis, just forms the projection optical system of two core structures far away.Like this, even object plane and image planes are in the out of focus position, the height of thing and picture does not still change on perpendicular to optical axial plane, and promptly enlargement ratio does not change, thereby guarantees that enlargement ratio does not change along moving of optical axis direction with object plane and image planes.
As shown in Figure 2, be the transport function MTF of the refraction and reflection projection optical system of present embodiment, reflected the image quality of this refraction and reflection projection optical system.When operation wavelength is 436nm, 405nm, 365nm, according to the analytical calculation of professional optical design software CODE_V as can be known: (wave aberration RMS value is 7.7nm in the visual field can to obtain high imaging quality effectively, heart angle error far away is less than 0.18 °=3.1mrad, the maximal value 0.6nm of distortion, transport function MTF is near diffraction limit), simultaneously can realize bigger object space and visual field, picture side, the optics length overall is 884.588mm, object space and be 30mm as side working distance.
As shown in Figure 3, be the refraction and reflection projection optical system true field of present embodiment and the dimensional drawing of visual field, picture side.Wherein, visual field, picture side of the present invention and true field radius all can reach 70mm, the visual field, square picture side of 44.5mm * 44.5mm can be provided, be enough to satisfy the technical requirement that projection (Bumping) encapsulation litho machine is used for 44mm * 44mm field size Chip Packaging.
As shown in table 1, be the modular design data of the preferred embodiment of this refraction and reflection projection optical system.It reaches 0.20 as number formulary value aperture; Operation wavelength is 436nm, 405nm, 365nm, the g line that promptly defines on the optical field, h line, i line; The true field radius is 70mm, and the square visual field of 44.5mm * 44.5mm can be provided, and effect is that the graphic projection with object plane is imaged on the image planes; As square visual field radius is 70mm; Owing to be symmetrical structure, object space and the work of picture side are apart from being 30mm, and enlargement ratio is-1 times; Optics length overall (promptly from the object plane to the catoptron) is 884.588mm.
Table 1
| Operation wavelength | 436nm、405nm、365nm |
| Picture number formulary value aperture | 0.20 |
| Visual field, picture side (radius) | 70mm |
| Enlargement ratio | -1 |
| Optics length overall (object plane is to catoptron) | 884.588mm |
| Object space work distance | 30mm |
| Picture side's work distance | 30mm |
As shown in table 2, be the concrete parameter value of each optical element of the preferred embodiment of this refraction and reflection projection optical system, wherein, each surperficial pairing optical element between " affiliated object " hurdle has been indicated from the object plane to image planes; " radius " hurdle has provided each surperficial pairing spherical radius; " thickness/spacing " hurdle has provided the axial distance between adjacent two surfaces, if this two surface belongs to same optical element, the thickness of this optical element of numeric representation of " thickness/spacing " then, otherwise expression object plane/image planes are to the distance of optical element or the spacing of adjacent optical elements." optical material " hurdle indicated the material of corresponding optical element, " semiaperture " hurdle indicated 1/2 aperture value on corresponding surface.
With optical element L1 and L2 is example, and the spherical radius of the front surface 1 of L1 is 1e+018, is the plane, and the front surface 1 of L1 is 30mm to the spacing of object plane, and its optical material is SIO2, and the semiaperture of L1 front surface 1 is 76.219mm; The spherical radius of the rear surface 2 of L1 is 1e+018, the rear surface 2 of the front surface 1 to L1 of L1, and promptly the center thickness of optical element L1 is 88mm, and the semiaperture of the rear surface 2 of L1 is 88.450mm, and promptly optical element L1 is a parallel flat.The spherical radius and the semiaperture of the front surface 3 of L2 are respectively 6873.292421mm and 88.777mm, and the spacing of the rear surface 2 of the front surface 3 to L1 of L2 is 1.000mm, and the optical material of lens L2 is FK5HT; The spherical radius and the semiaperture of the rear surface 4 of L2 is respectively-151.056352mm and 89.968mm, and the center thickness of lens L2 is 39.338mm, and promptly L2 is the biconvex positive lens.Except representing the radius of visual field, picture side the semiaperture of image planes (surperficial Image) that all the other each surperficial parameter value implications are analogized according to L1, L2.
This refraction and reflection projection optical system also is provided with concave spherical mirror M, and its spherical radius and semiaperture are respectively-869.879223mm and 103.066mm, and the change of its 1/2 aperture size will influence the imaging effect of this projection optical system.
Table 2
Table 2 (continuing)
In sum, projection optical system of the present invention can realize bigger object space and visual field, picture side, and its optics length overall is 884.588mm, object space and be 30mm as side working distance, for the work stage of projection (Bumping) litho machine and the structural design of mask platform provide enough motion headspaces, adopt motion positions, transmission structure design that big operating distance is mask and silicon chip etc. to bring great convenience, and dwindled the volume of whole projection optical system.
The numerical aperture maximum of projection optical system of the present invention reaches 0.20, thereby the highest optical resolution of this projection optical system can reach 0.5 μ m (for the semiperiod length of 1: 1 Periodic Object of dutycycle), and indexs such as image quality and two hearts far away all reach requirement of actual application.The surface type of all optical modules of refraction and reflection projection optical system of the present invention is sphere or plane, without any aspheric surface, therefore can not introduce the difficult problem of aspects such as optics processing, optical detection and cost.Group shared same group of optical module in group back adopts catoptron with folded optical path before above-mentioned, saves a semi-permeable mirror, helps reducing the cost of this projection optical system.
Claims (5)
1, a kind of refraction and reflection projection optical system, be used for to place the pattern imaging in its object plane to arrive it as in the plane, it is characterized in that, this refraction and reflection projection optical system comprises preceding group, concave spherical mirror successively along its optical axis direction, wherein, under the light reflex of this concave spherical mirror, before this optical element of group as the back group shared optical element, be described preceding group and the shared same group of optical element of described back group, this same group of optical element comprises successively along optical axis direction:
Right-angle reflecting prism, for group before described, the plane of incidence of this right-angle reflecting prism is the plane, and towards the object plane of described projection optical system, its plane of incidence is 30 millimeters to the distance of object plane, for described back group, the exit facet of this right-angle reflecting prism is the plane, and towards the picture plane of described projection optical system;
The first biconvex positive lens, the axial spacing of itself and right-angle reflecting prism is 1 millimeter;
The first bent moon thick lens, the axial spacing of itself and the first biconvex positive lens is 1.05 millimeters, and with the common high-order spherical aberration of proofreading and correct described projection optical system of the described first biconvex positive lens;
The second bent moon thick lens, the axial spacing of itself and the first bent moon thick lens is 3.195 millimeters, and proofreaies and correct the curvature of the image of this projection optical system jointly with the described first bent moon thick lens; And
The three-chip type optical texture is used to compress the length overall of this projection optical system, realizes long operating distance simultaneously, and it comprises successively along optical axis direction: the second biconvex positive lens, and the axial spacing of itself and the above-mentioned second bent moon thick lens is 169.923 millimeters; Double-concave negative lens produces positive spherical aberration and also does the axial chromatic aberration compensation, and the axial spacing of itself and the second biconvex positive lens is 93.086 millimeters; The bent moon positive lens, the axial spacing of itself and double-concave negative lens is 5.489 millimeters, and with the high-order spherical aberration and the senior astigmatism of the described projection optical system of the common compensation of the second biconvex positive lens;
The axial spacing of this concave spherical mirror and above-mentioned bent moon positive lens is 203.505 millimeters, it is provided with aperture diaphragm, make described projection optical system form enlargement ratio and be-1 times complete symmetrical structure, and described projection optical system is object space and picture side pair telecentric beam paths;
The convex surface of described first, second bent moon thick lens is all towards described aperture diaphragm;
The convex surface of described bent moon positive lens is towards described aperture diaphragm.
2, refraction and reflection projection optical system as claimed in claim 1 is characterized in that: described right-angle reflecting prism and bent moon positive lens adopt the fused quartz glass of low-refraction, low abbe number.
3, refraction and reflection projection optical system as claimed in claim 1 is characterized in that: the described first bent moon thick lens adopts the flint glass of high index of refraction, high abbe number, high permeability.
4, refraction and reflection projection optical system as claimed in claim 1 is characterized in that: the described first biconvex positive lens, the second bent moon thick lens and the second biconvex positive lens adopt the crown glass of low-refraction, low abbe number, high permeability.
5, refraction and reflection projection optical system as claimed in claim 1 is characterized in that: described double-concave negative lens adopts the crown glass of low-refraction, low abbe number, high permeability.
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| CN200710173571A CN100587544C (en) | 2007-12-28 | 2007-12-28 | Refraction and reflection projection optical system |
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| CN103339492B (en) * | 2010-12-01 | 2017-03-15 | 皇家飞利浦电子股份有限公司 | There is the sensor device of double telecentric optical system |
| CN103403601B (en) * | 2011-02-24 | 2015-07-15 | 柯尼卡美能达株式会社 | Imaging lens, imaging device, and portable terminal |
| CN102768397B (en) * | 2011-05-05 | 2014-11-12 | 上海微电子装备有限公司 | Projection photoetching object lens |
| CN103033915B (en) * | 2011-10-10 | 2016-02-03 | 上海微电子装备有限公司 | A kind of symmetrical expression catadioptric optical system |
| CN103576303B (en) * | 2012-08-07 | 2016-04-06 | 堤维西交通工业股份有限公司 | Automobile-used composite reflection and refraction multiple imaging device |
| JP7005207B2 (en) | 2017-07-26 | 2022-01-21 | キヤノン株式会社 | Optical system, imaging device and projection device equipped with it |
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