CN104062746A - Large numerical aperture catadioptric submerged projection optical system - Google Patents
Large numerical aperture catadioptric submerged projection optical system Download PDFInfo
- Publication number
- CN104062746A CN104062746A CN201410283831.4A CN201410283831A CN104062746A CN 104062746 A CN104062746 A CN 104062746A CN 201410283831 A CN201410283831 A CN 201410283831A CN 104062746 A CN104062746 A CN 104062746A
- Authority
- CN
- China
- Prior art keywords
- lens
- optical system
- positive meniscus
- projection optical
- catadioptric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Lenses (AREA)
Abstract
The invention relates to a large numerical aperture catadioptric submerged projection optical system. The large numerical aperture catadioptric submerged projection optical system is formed by a plurality of lenses and four reflection mirrors. The optical system comprises four lens groups in sequence from an object side to an image side. The firsts lens group has positive focal power and has a certain-distance shifting along the radial direction with respect to the other lens groups, thereby facilitating follow-up light path compressing and reducing the aperture of the lenses and the reflection mirrors in the follow-up light path. The projection optical system is large in numerical aperture and small in aberration; and compared with other projection objectives, the largest advantage of the projection optical system is that the large numerical aperture is achieved and at the same time the apertures of the lenses and the reflection mirrors in the system are relatively small, thereby reducing the dimensional requirement of the optical materials, reducing production cost, and reducing the lens processing and detection difficulty.
Description
Technical field
The present invention relates to a kind of projection optical system that works in ultraviolet band, particularly the catadioptric submergence projection optical system of a kind of large-numerical aperture (numerical aperture can reach 1.35).
Background technology
Optical lithography is the main production method of modern VLSI (very large scale integrated circuit).Along with the development of needs, optical projection lithography technology is the most effectual way that current large-scale low-cost is produced large scale integrated circuit, and this technology production efficiency is high, and technology maturation is stable, is widely used in the semiconductor industry such as flat pannel display, semiconductor lighting.Along with the development of VLSI (very large scale integrated circuit) (VLSI), its integrated level is more and more higher, and it is more and more less that its critical size also becomes, and main flow electronic product critical size is all at 28nm now, and forward 22nm large-scale low-costization develops.This optical property to exposure system of photo-etching machine is had higher requirement.
Reduce the critical size of electronic product, only have two kinds of approach.One is to reduce wavelength, uses the shorter ultraviolet light of wavelength; Another approach is exactly the image space numerical aperture that increases photoetching projection objective lens.Present stage is mainly the ArF ultraviolet light that uses 193nm.In the situation that wavelength is constant, in order to reduce the critical size of electronic product, only has the image space numerical aperture that increases photoetching projection objective lens.For dry type exposure, the image space numerical aperture of photoetching projection objective lens is after reaching 0.93, and cannot continue increases.In order to increase image space numerical aperture, only have and increase the refractive index of the last lens material of projection objective between the refractive index or the last one side of increase and the image planes that use wavelength.Relatively changing lens material, between the last a slice lens of projection objective and image planes, be filled with the liquid that refractive index is higher, is a kind of relatively easy realization and lower-cost method.
For optical system with high NA, owing to there is very large the hereby watt curvature of field, this will cause the curvature of the image of optical system serious, and for exposure semiconductor silicon chip, it similarly is very important obtaining flat field.In order to obtain flat field picture, the method of one of them solution is designed to refraction-reflection type projection optical system by projection optical system exactly, in this refraction and reflection projection optical system, comprise refracting element and reflecting element, because concave mirror has the positive lens of being similar to focal power but has the negative lens curvature of field, be beneficial to the rectification curvature of field.Therefore, in refraction and reflection projection optical system owing to there being one or more concave mirrors.Thereby the corrective system curvature of field well.For structural needs, the general paired appearance of concave mirror, the number of mirrors in system is even number.
Along with the increase of projection objective image space numerical aperture, in optical system, lens and aperture of a mirror also sharply increase, and this size to optical material proposes requirements at the higher level, bring exceptional hardship to the optical element of producing, process large caliber and high quality.Also to detecting, requirements at the higher level are proposed simultaneously.
The projection optical system relating in the present invention, in realizing well the large-numerical aperture of system, has solved curvature of the image and the excessive problem of optical element dimension brought by the large-numerical aperture of system well.In addition, compared with pure dioptric system, the system in the present invention has solved the excessive problem of component size of being brought by large-numerical aperture better.In the time that projection objective image space numerical aperture reaches 1.35, the full-size of optical element is greatly about 300mm, even larger.The projection objective relating in this patent reaches at 1.35 o'clock in image space numerical aperture, and the size of optical element is all controlled in 240mm.The bore of optical element reduces 20%.
Feature of the present invention be realize system large-numerical aperture and ensured image quality that system is high and compact system architecture in, effectively reduce the bore of optical element in projection objective, thereby reduce manufacturing cost, reduce the processing of element and the difficulty of detection.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of catadioptric submergence projection optical system of large-numerical aperture, improves exposure resolution ratio, reduces system dimension.The present invention proposes and be applicable to deep UV (ultraviolet light) wavelength illumination and numerical aperture reaches 1.35 submergence projection optical system, this optical system structure compactness, visual field are large, good imaging quality, and have less size and less material consumption.
The technical solution used in the present invention is: a kind of catadioptric submergence projection optical system of large-numerical aperture, described large-numerical aperture projection optical system comprises first lens group G1, the second reflection and transmission mirror group G2, the 3rd catoptron group G3 and the 4th lens combination G4 along its optical axis direction.The first lens group G1 of the large-numerical aperture catadioptric submergence projection objective in the present invention has positive light coke, the second reflection and transmission mirror group G2 has negative power, the 3rd lens combination G3 has positive light coke, the 4th lens combination G4 has positive light coke, the projection optical system of described large-numerical aperture has comprised 24 lens and four catoptrons, and comprises multiple aspheric surfaces.
The first lens group G1 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention comprises four lens, wherein first lens are parallel flat 1, second lens is that 2, the three lens of biconvex lens are that 3, the four lens of positive meniscus lens are positive meniscus lens 4.
Biconvex lens 2 in the first lens group G1 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention, positive meniscus lens 3, positive meniscus lens 4 lens edges have and depart from perpendicular to the direction of systematic optical axis.
Does not depart from perpendicular to systematic optical axis direction on the second reflection and transmission mirror group G2, the 3rd lens combination G3, the 4th lens combination G4 edge of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention.
The second reflection and transmission mirror group G2 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention comprises six-element lens and four catoptrons.Wherein the 5th is recessed catoptron 5, the 6th is recessed catoptron 6, the 7th is biconvex lens 7, the 8th is that 8, the nine of positive meniscus lenss are that 9, the ten of positive meniscus lenss are positive meniscus lens 10, the tenth a slice is recessed catoptron 11, the 12 is that 13 of positive meniscus lenss 12, the are that 14 of recessed catoptrons 13, the are positive meniscus lens 14.
The recessed catoptron of the recessed catoptron of in the second reflection and transmission mirror group G2 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention the 5th 5, the 6th 6, the 9th positive meniscus lens 9 first surfaces, the tenth positive meniscus lens 10 first surface, the 11, the 12 positive meniscus lens 12 first surfaces of the recessed catoptron of the tenth a slice, the 13, the 14 positive meniscus lens 14 first surfaces of the 13 recessed catoptron are aspheric surface.
The 3rd lens combination G3 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention comprises nine lens.Wherein the 15 is biconvex lens 15, the 16 is diverging meniscus lens 16, the 17 is diverging meniscus lens 17, the 18 is positive meniscus lens 18, the 19 is that 20 of positive meniscus lenss 19, the are that negative lens 20, the 20 a slices are biconvex lens 21, the 22 is that 23 of positive meniscus lenss 22, the are biconvex lens 23.
The first surface of second, the 19 positive meniscus lens 19 of second, the 17 diverging meniscus lens 17 of second, the 16 diverging meniscus lens 16 of the 15 biconvex lens 15 in the 3rd lens combination G3 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention, the first surface of the 20 negative lens 20, the first surface of the 20 a slice biconvex lens 21, the first surface of the 23 biconvex lens 23 are aspheric surface.
The 4th lens combination G4 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention comprises five lens.Wherein the 25 is that 26 of positive meniscus lenss 25, the are that 27 of positive meniscus lenss 26, the are that 28 of positive meniscus lenss 27, the are that 29 of positive meniscus lenss 28, the are positive meniscus lens 29.
Second of second, the 28 positive meniscus lens 28 of second, the 27 positive meniscus lens 27 of the 25 positive meniscus lens 25 in the 4th lens combination G4 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention is aspheric surface.
Medium between last one side and the image planes of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention is high refractive index liquid, includes but not limited to deionized water.
Between the 3rd lens combination G3 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention and the 4th lens combination G4, system aperture diaphragm 24 is set.
The catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention is two telecentric systems.
The catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention is applicable to deep ultraviolet lighting source, includes but not limited to that wavelength is the light source of 157nm, 193.3nm or 248nm.
The present invention compared with prior art has following advantage:
1. that the focal power of first lens group G1, the second reflection and transmission mirror group G2, the 3rd lens combination G3 and the 4th lens combination G4 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention is respectively is positive and negative, just and just, this structure is corrective system aberration well.
2. the first lens of the first diaphotoscope group G1 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention are parallel flat 1, can in use change on demand.
3. the first catoptron group G1 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention has positive light coke, and along having necessarily and depart from perpendicular to optical axis direction.Can compress light path, reduce the size of subsequent optical element.
4. the second reflection and transmission mirror group G2 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention comprises four concave mirrors, has in the corrective system curvature of field, improves image quality.
5. the second reflection and transmission mirror group G2 of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention comprises four concave mirrors can folding system light path, makes system architecture compactness.
6. 17 aspheric surfaces of the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention are concave surfaces, only have 1 aspheric surface convex surface, have in reducing processing and detection difficulty.
7. the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention is two telecentric systems, and object space and image space are all telecentric beam paths.Therefore, can relatively reduce the site error of object plane (mask face) and image planes 30 (silicon chip face).Even when its physical location has less deviation with respect to design attitude, can not cause the remarkable reduction of projection objective optical property yet.
8. the image space numerical aperture in the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention reaches 1.35.
9. the optical element in the catadioptric submergence projection optical system of the large-numerical aperture relating in the present invention all has less bore, and the maximum caliber of optical element is not more than 240mm.
Brief description of the drawings
Fig. 1 is the schematic diagram of the catadioptric submergence projection optical system of large-numerical aperture of the present invention.
Fig. 2 is that the visual field of the catadioptric submergence projection optical system of large-numerical aperture of the present invention arranges schematic diagram.The rectangle indicating with oblique line in figure is system visual field.
Fig. 3 is catadioptric submergence projection optical system optical-modulation transfer function within the scope of the whole audience of large-numerical aperture of the present invention; The English MTF meaning in figure is modulation transfer function; The English DIFFRACTION LIMT meaning in figure is diffraction limit; The DEFOCUSING meaning is out of focus.The tee meaning in figure is the degree of modulation in meridian ellipse; The English R meaning in figure is the degree of modulation in sagittal surface, and the English FIELD meaning in figure is visual field; The English Mar meaning in figure is March.
Fig. 4 be large-numerical aperture of the present invention catadioptric submergence projection optical system astigmatism and distortion aberration curve.In figure, the FOCUS meaning is focus point; In figure, the MILLIMETERS meaning is millimeter; In figure, the DISTORTION meaning is distortion relatively.
Label declaration: 1-the first parallel flat, 2-biconvex lens, 3-positive meniscus lens, 4-positive meniscus lens, the recessed catoptron of 5-, the recessed catoptron of 6-, 7-biconvex lens, 8-positive meniscus lens, 9-positive meniscus lens, 10-positive meniscus lens, the recessed catoptron of 11-, 12-positive meniscus lens, the recessed catoptron of 13-, 14-positive meniscus lens, 15-biconvex lens, 16-diverging meniscus lens, 17-diverging meniscus lens, 18-positive meniscus lens, 19-positive meniscus lens, 20-negative lens, 21-biconvex lens, 22-positive meniscus lens, 23-biconvex lens, 24-aperture diaphragm, 25-positive meniscus lens, 26-positive meniscus lens, 27-positive meniscus lens, 28-positive meniscus lens, 29-positive meniscus lens, 30-image planes.Label 9 ' and label 9 " lens that indicate of the lens that indicate and label 9 are same a slice lens.The lens that the lens that label 10 ' indicates and label 10 indicate are same a slice lens.The lens that the lens that label 12 ' indicates and label 12 indicate are same a slice lens.
Embodiment
Below in conjunction with the drawings and specific embodiments, the present invention is described in further detail.
Fig. 1 is the catadioptric submergence projection optical system schematic diagram of large-numerical aperture, use altogether 24 lens and four catoptrons, comprised successively first lens group G1, the second reflection and transmission mirror group G2, the 3rd catoptron group G3 and the 4th lens combination G4 from light beam incident direction.First lens group G1 has positive light coke; The second reflection and transmission mirror group G2 has negative power; The 3rd lens combination G3 has positive light coke; The 4th lens combination G4 has positive light coke.Image planes 33 are silicon chip face.
The first lens group G1 that the present invention comprises is along having certain bias perpendicular to optical axis direction.20 lens and four catoptrons coaxial (systematic optical axis) in the second reflection and transmission mirror group G2, the 3rd lens combination G3 and the 4th lens combination G4, along not departing from perpendicular to optical axis direction.
The first lens group G1 that the present invention comprises comprises four lens, and first is that 1, the second lens of parallel flat are that 2, the three lens of biconvex lens are that 3, the four lens of positive meniscus lens are positive meniscus lens 4.
The first lens of the first lens group G1 that the present invention comprises are parallel flat 1, as cover glass and the sealed window of whole projection objective, can in use change on demand.
The first lens group G1 that the present invention comprises has positive light coke, and along thering is certain bias perpendicular to optical axis direction.Its Main Function is, by the light compression of the object point transmitting on object plane, as shown in fig. 1, the glazed thread of each visual field point in Fig. 1 to be turned down, and the lower light of each visual field point in Fig. 1 is upwards turned back, thereby reduce the bore of optical element in subsequent optical path.
The second reflection and transmission mirror group G2 that the present invention comprises comprises six-element lens and four catoptrons, they are respectively: the 5th is recessed catoptron 5, the 6th is that 6, the seven of recessed catoptrons are that 7, the eight of biconvex lens are positive meniscus lens 8, the 9th is positive meniscus lens 9, the tenth is that positive meniscus lens 10, the ten a slices are that 12 of recessed catoptrons 11, the are positive meniscus lens 12, the 13 is 14 positive meniscus lenss 14 of recessed catoptron 13, the.Wherein the middle and upper part of the 5 and the 13 13 use catoptrons of catoptron of the 5th catoptron is divided, and the 6th catoptron 6 and the tenth a slice catoptron 11 only use the lower middle portion of catoptron.
The recessed catoptron of the 5th of the second reflection and transmission mirror group G2 that the present invention comprises 5, the 6th recessed catoptron 6 and the 7th biconvex lens 7 Main Functions are by the airspace that becomes real image from the light of first lens group outgoing between the 7th biconvex lens 7 and the 8th positive meniscus lens 8, and prevent that intermediate image plane from " falling into " lens inside.The 8th positive meniscus lens 8, the 9th positive meniscus lens 9, the 13 and the 14 positive meniscus lens 14 Main Functions of the tenth anti-recessed catoptron the 12, the 13 recessed catoptron of the 11, the 12 positive meniscus lens of positive meniscus lens the 10, the 11 are in real image surface imaging airspace between the 14 and the 15 biconvex lens 15 of the 14 positive meniscus lens, and prevent that intermediate image plane from " falling into " lens inside.The second reflection and transmission mirror group G2 has negative power, and comprises multiple concave mirrors, and for aberration correction, especially the curvature of field has great role.
The 3rd lens combination G3 that the present invention comprises comprises nine lens.Wherein the 15 is biconvex lens 15, the 16 is diverging meniscus lens 16, the 17 is diverging meniscus lens 17, the 18 is positive meniscus lens 18, the 19 is that 20 of positive meniscus lenss 19, the are that negative lens 20, the 20 a slices are biconvex lens 21, the 22 is that 23 of positive meniscus lenss 22, the are biconvex lens 23.The 3rd diaphotoscope group G3 has positive light coke, is class double gauss structure.It has great role for the correction of system image space heart degree far away and other symmetrical aberrations (as spherical aberration, distortion etc.).
The 4th lens combination G4 that the present invention comprises comprises five lens.Wherein the 25 is that 26 of positive meniscus lenss 25, the are that 27 of positive meniscus lenss 26, the are that 28 of positive meniscus lenss 27, the are that 29 of positive meniscus lenss 28, the are positive meniscus lens 29.The 4th diaphotoscope group G4 has positive light coke, object point is finally imaged in image planes, and ensure that system image space numerical aperture reaches designing requirement.Also there is certain effect for system image space heart degree far away, aberration balancing.
The object plane of the catadioptric submergence projection optical system of large-numerical aperture involved in the present invention is mask face position, and image planes 30 are silicon chip face position.Vertical axle magnification between object plane and image planes 30 is-0.25.Negative sign represents that object plane is contrary with the direction of image planes 30.
The catadioptric submergence projection optical system of large-numerical aperture involved in the present invention is two telecentric systems.So-called two telecentric system refers to that, in the light cone that on object plane, each point sends, its chief ray in meridian ellipse is parallel with optical axis, and this light also incides in image planes with the direction that is parallel to optical axis in meridian ellipse.Aforesaid chief ray refers to the light through diaphragm center of the some transmitting on object plane.The catadioptric submergence projection optical system of large-numerical aperture involved in the present invention is two telecentric systems, can relatively reduce the site error of object plane (mask face) and image planes 30 (silicon chip face).Even when its physical location has less deviation with respect to design attitude, can not cause the remarkable reduction of projection objective optical property yet.
Between the 3rd lens combination G3 that the present invention comprises and the 4th lens combination G4, system aperture diaphragm 24 is set.This aperture diaphragm 24 can be iris, with the size of regulating system numerical aperture.
The catadioptric submergence projection optical system of large-numerical aperture involved in the present invention is applicable to deep ultraviolet lighting source, and the light source that is 193.3nm at wavelength, has good picture element.Can certainly be used for wavelength is 248nm and 157nm.
Table 1 has provided the basic parameter of the catadioptric submergence projection optical system of the large-numerical aperture in the embodiment of the present invention.Design parameter please refer to table 1.
Table 2 has provided the design parameter of the every eyeglass of catadioptric submergence projection optical system of the large-numerical aperture in the embodiment of the present invention.Wherein, " the surperficial sequence number " in table 2 is that if the beam incident surface of only parallel flat 1 in first lens group G1 is sequence number S1, light beam exit facet is sequence number S2 along light transmition direction counting, and other minute surface sequence number by that analogy; " radius " in table 2 represents the radius-of-curvature of this face.It is positive and negative concludes that principle is: using this vertex of surface as starting point, and the center of curvature that terminal is this face.If line direction is identical with light transmition direction for just, otherwise for negative.If this face is plane, this face curvature radius is infinitely great, optometry design software is specifically set and determine, also can be with a very large numerical value replacement, as 1E20; " thickness " in table 2 has provided the distance of adjacent two faces on optical axis.Its positive and negative decision principle is: to work as forward apex as starting point, next vertex of surface is as terminal.If line direction is identical with light transmition direction for just, otherwise for negative.If the material between two faces is glass, this thickness represents lens thickness, if there is no a material between two faces, represents the airspace between two lens (or lens and catoptron)." half bore " in table 2 is that projection objective image space numerical aperture is half bore value of 1.35 o'clock each optical elements.If adjust numerical aperture numerical value, optical element half bore value also can change.The optical material that " material " in table 2 is each lens, default place is air.
All length unit in table 2 is mm.
What table 2A was table 2 supplements, and it has provided each aspheric asphericity coefficient.
Table 1 projection objective basic parameter
| Operation wavelength | 193.368nm |
| Image space numerical aperture | 1.35 |
| Enlargement ratio | -0.25 |
| Image space | 26mm×9mm |
| Object image distance from | 1300mm |
| Object space working distance | 31.59mm |
| Image space working distance | 3.1mm |
| SIO2 refractive index | 1.560219 |
| Immersion liquid refractive index | 1.432040 |
Table 2 projection objective design parameter
Table 2A projection objective asphericity coefficient
Claims (14)
1. the catadioptric submergence projection optical system of a large-numerical aperture, for the pattern that is positioned at object plane being projected to picture plane, the catadioptric submergence projection optical system of described large-numerical aperture comprises first lens group (G1), the second reflection and transmission mirror group (G2), the 3rd lens combination (G3), the 4th lens combination (G4), it is characterized in that: there is positive light coke from the first lens group (G1) of light beam incident direction, the second reflection and transmission mirror group (G2) has negative power, the 3rd lens combination (G3) has positive light coke, the 4th lens combination (G4) has positive light coke, the catadioptric submergence projection optical system of described large-numerical aperture has comprised 24 lens and four catoptrons, and comprise multiple aspheric surfaces.
2. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, it is characterized in that: described first lens group (G1) comprises four lens, wherein first lens are parallel flat (1), second lens is biconvex lens (2), the 3rd lens are positive meniscus lens (3), and the 4th lens are positive meniscus lens (4).
3. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, it is characterized in that: biconvex lens (2) in described first lens group (G1), positive meniscus lens (3), positive meniscus lens (4) radially, have and depart from respect to systematic optical axis.
4. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, is characterized in that: described the second reflection and transmission mirror group (G2), the 3rd lens combination (G3), the 4th lens combination (G4) are not departing from optical axis vertical direction.
5. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, it is characterized in that: the second described reflection and transmission mirror group (G2) comprises six-element lens and four catoptrons, wherein the 5th is recessed catoptron (5), the 6th is recessed catoptron (6), the 7th is biconvex lens (7), the 8th is positive meniscus lens (8), the 9th is positive meniscus lens (9), the tenth is positive meniscus lens (10), the tenth a slice is recessed catoptron (11), the 12 is positive meniscus lens (12), the 13 is recessed catoptron (13), the 14 is positive meniscus lens (14).
6. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 5, is characterized in that: the 5th recessed catoptron (5) in the second described reflection and transmission mirror group (G2), the 6th recessed catoptron (6), the 9th positive meniscus lens (9) first surface, the tenth positive meniscus lens (10) first surface, the recessed catoptron of the tenth a slice (11), the 12 positive meniscus lens (12) first surface, the 13 recessed catoptron (13), the 14 positive meniscus lens (14) first surface are aspheric surface.
7. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, it is characterized in that: the 3rd described lens combination (G3) comprises nine lens, wherein the 15 is biconvex lens (15), the 16 is diverging meniscus lens (16), the 17 is diverging meniscus lens (17), the 18 is positive meniscus lens (18), the 19 is positive meniscus lens (19), the 20 is negative lens (20), the 20 a slice is biconvex lens (21), the 22 is positive meniscus lens (22), the 23 is biconvex lens (23).
8. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 7, is characterized in that: second of the 15 biconvex lens (15) in the 3rd described lens combination (G3), second of the 16 diverging meniscus lens (16), second of the 17 diverging meniscus lens (17), the first surface of the 19 positive meniscus lens (19), the first surface of the 20 negative lens (20), the first surface of the 20 a slice biconvex lens (21), the first surface of the 23 biconvex lens (23) are aspheric surface.
9. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 1, it is characterized in that: the 4th described lens combination (G4) comprises five lens, wherein the 25 is positive meniscus lens (25), the 26 is positive meniscus lens (26), the 27 is positive meniscus lens (27), the 28 is positive meniscus lens (28), and the 29 is positive meniscus lens (29).
10. the catadioptric submergence projection optical system of large-numerical aperture as claimed in claim 9, is characterized in that: second of the 25 positive meniscus lens (25) in the 4th described lens combination (G4), second of the 27 positive meniscus lens (27), second of the 28 positive meniscus lens (28) is aspheric surface.
The catadioptric submergence projection optical system of 11. large-numerical apertures as claimed in claim 1, is characterized in that: the medium after in system between one side and image planes is high-index fluid, includes but not limited to deionized water.
The catadioptric submergence projection optical system of 12. large-numerical apertures as claimed in claim 1, is characterized in that: between the 3rd lens combination (G3) and the 4th lens combination (G4), system aperture diaphragm (24) is set.
The catadioptric submergence projection optical system of 13. large-numerical apertures as claimed in claim 1, is characterized in that: the catadioptric submergence projection optical system of described large-numerical aperture is two telecentric systems.
The catadioptric submergence projection optical system of 14. large-numerical apertures as claimed in claim 1, it is characterized in that: the catadioptric submergence projection optical system of described large-numerical aperture is applicable to deep ultraviolet lighting source, and wavelength is the light source of 157nm, 193.3nm or 248nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410283831.4A CN104062746B (en) | 2014-06-23 | 2014-06-23 | A kind of catadioptric submergence projection optical system of large-numerical aperture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410283831.4A CN104062746B (en) | 2014-06-23 | 2014-06-23 | A kind of catadioptric submergence projection optical system of large-numerical aperture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104062746A true CN104062746A (en) | 2014-09-24 |
| CN104062746B CN104062746B (en) | 2016-08-24 |
Family
ID=51550538
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410283831.4A Expired - Fee Related CN104062746B (en) | 2014-06-23 | 2014-06-23 | A kind of catadioptric submergence projection optical system of large-numerical aperture |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104062746B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105807410A (en) * | 2014-12-31 | 2016-07-27 | 上海微电子装备有限公司 | Catadioptric projection objective lens based on high numerical aperture |
| CN110045492A (en) * | 2019-04-26 | 2019-07-23 | 中国科学院长春光学精密机械与物理研究所 | The microcobjective optical system of wide spectrum large-numerical aperture ultra-high throughput |
| CN111929806A (en) * | 2019-08-15 | 2020-11-13 | 上海微电子装备（集团）股份有限公司 | Photoetching projection objective and photoetching machine |
| WO2020246346A1 (en) * | 2019-06-05 | 2020-12-10 | キヤノン株式会社 | Image capturing device and control method, program, and storage medium therefor |
| CN113835209A (en) * | 2021-11-19 | 2021-12-24 | 中导光电设备股份有限公司 | Large-view-field DUV objective lens |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1535392A (en) * | 2000-10-23 | 2004-10-06 | 株式会社尼康 | Catadioptric systema and exposure device having this system |
| US20050036213A1 (en) * | 2003-08-12 | 2005-02-17 | Hans-Jurgen Mann | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
| CN1965259A (en) * | 2004-04-08 | 2007-05-16 | 卡尔蔡司Smt股份公司 | Catadioptric projection objective |
| JP2009025737A (en) * | 2007-07-23 | 2009-02-05 | Canon Inc | Catadioptric type projection optical system, exposure device and device manufacturing method |
-
2014
- 2014-06-23 CN CN201410283831.4A patent/CN104062746B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1535392A (en) * | 2000-10-23 | 2004-10-06 | 株式会社尼康 | Catadioptric systema and exposure device having this system |
| US20050036213A1 (en) * | 2003-08-12 | 2005-02-17 | Hans-Jurgen Mann | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
| CN1965259A (en) * | 2004-04-08 | 2007-05-16 | 卡尔蔡司Smt股份公司 | Catadioptric projection objective |
| JP2009025737A (en) * | 2007-07-23 | 2009-02-05 | Canon Inc | Catadioptric type projection optical system, exposure device and device manufacturing method |
Non-Patent Citations (2)
| Title |
|---|
| 杜伟峰: "深紫外浸没光刻投影物镜涉及", 《中国优秀硕士学位论文全文数据库 信息科技辑》 * |
| 许伟才: "投影光刻物镜的光学设计与像质补偿", 《中国博士学位论文全文数据库 信息科技辑》 * |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105807410A (en) * | 2014-12-31 | 2016-07-27 | 上海微电子装备有限公司 | Catadioptric projection objective lens based on high numerical aperture |
| CN105807410B (en) * | 2014-12-31 | 2018-11-09 | 上海微电子装备（集团）股份有限公司 | A kind of refraction-reflection projection objective based on high-NA |
| CN110045492A (en) * | 2019-04-26 | 2019-07-23 | 中国科学院长春光学精密机械与物理研究所 | The microcobjective optical system of wide spectrum large-numerical aperture ultra-high throughput |
| CN110045492B (en) * | 2019-04-26 | 2024-03-15 | 中国科学院长春光学精密机械与物理研究所 | Wide-spectrum large-numerical aperture ultrahigh-flux micro-objective optical system |
| WO2020246346A1 (en) * | 2019-06-05 | 2020-12-10 | キヤノン株式会社 | Image capturing device and control method, program, and storage medium therefor |
| JP2020197685A (en) * | 2019-06-05 | 2020-12-10 | キヤノン株式会社 | Image capturing device, control method therefor, program, and storage medium |
| JP7240261B2 (en) | 2019-06-05 | 2023-03-15 | キヤノン株式会社 | IMAGING DEVICE AND CONTROL METHOD THEREOF, PROGRAM, STORAGE MEDIUM |
| US11825195B2 (en) | 2019-06-05 | 2023-11-21 | Canon Kabushiki Kaisha | Image capturing apparatus using information relating to a shape of the reflective optical system, method of controlling the same, and storage medium |
| CN111929806A (en) * | 2019-08-15 | 2020-11-13 | 上海微电子装备（集团）股份有限公司 | Photoetching projection objective and photoetching machine |
| CN113835209A (en) * | 2021-11-19 | 2021-12-24 | 中导光电设备股份有限公司 | Large-view-field DUV objective lens |
| CN113835209B (en) * | 2021-11-19 | 2024-04-26 | 中导光电设备股份有限公司 | Large-view-field DUV objective lens |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104062746B (en) | 2016-08-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103499877B (en) | A kind of projection optical system of large-numerical aperture | |
| CN103777314B (en) | Wide angle projection lens | |
| CN100388056C (en) | Projection objective lens optical system | |
| US20030174408A1 (en) | Refractive projection objective for immersion lithography | |
| CN104062746A (en) | Large numerical aperture catadioptric submerged projection optical system | |
| CN103926683B (en) | A kind of varifocal optical system | |
| CN103499876B (en) | A kind of pure refractive projection optics system of large-numerical aperture | |
| CN102621668A (en) | Projection optical system | |
| CN111596532B (en) | Double telecentric lens and digital projection lithography system | |
| CN102662307B (en) | High-resolution projection optical system | |
| CN100587544C (en) | Refraction and reflection projection optical system | |
| CN104035187B (en) | Pure reflecting dry type projection optical system with large numerical aperture | |
| CN102645730B (en) | Experimental immersed projective lithography objective lens | |
| CN103713379B (en) | A kind of catadioptric dry type projection optical system of large-numerical aperture | |
| TW201807452A (en) | An optical lens | |
| CN100538524C (en) | Projection optical system | |
| WO2015149427A1 (en) | Catadioptric photolithographic illumination relay lens group | |
| KR20010007381A (en) | Projection optical system and projection exposure apparatus with the same, and device manufacturing method | |
| CN104950427B (en) | A kind of big visual field high-NA whole world face projection lens of lithography machine | |
| CN109375480B (en) | Photoetching projection objective and photoetching machine | |
| CN104111518B (en) | A kind of projection objective lens optical system of large-numerical aperture | |
| CN101320122B (en) | Projection optical system | |
| CN103105666A (en) | Exposure projection objective lens | |
| CN102608737B (en) | Extreme-ultraviolet-projection photoetching objective lens | |
| CN100587539C (en) | Projection optical system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160824 Termination date: 20210623 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |