CN103839841A - Nesting tool and reaction chamber - Google Patents
Nesting tool and reaction chamber Download PDFInfo
- Publication number
- CN103839841A CN103839841A CN201410098490.3A CN201410098490A CN103839841A CN 103839841 A CN103839841 A CN 103839841A CN 201410098490 A CN201410098490 A CN 201410098490A CN 103839841 A CN103839841 A CN 103839841A
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- China
- Prior art keywords
- reaction chamber
- face
- cylinder
- instrument
- nested
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
Abstract
The invention provides a nesting tool and a reaction chamber. The nesting tool comprises a cylinder and an end face, the cylinder and the end face are fixed together, the cylinder of the nesting tool is embedded in a hole of the reaction chamber, the end face is located outside the hole, the nesting tool is fixed and can not fall into the hole, and the surface of the hole is protected. When the reaction chamber is cleaned and maintained, the nesting tool can be taken out for cleaning and maintaining, cleaning difficulty is lowered, the cleanliness of the whole reaction chamber is maintained, and the hole is prevented from being damaged.
Description
Technical field
The present invention relates to field of semiconductor manufacture, relate in particular to a kind of nested instrument and reaction chamber.
Background technology
In field of semiconductor manufacture, the techniques such as deposit film, etching are all carried out in reaction chamber (Chamber).Process environments when keeping reaction chamber internal-response, therefore, before carrying out technological reaction, conventionally can carry out cleaning activity (Clean process) at every turn, the inwall of whole reaction chamber is all formed to one deck protective finish (Coating) and carry out again afterwards corresponding technological reaction, after each technological reaction completes, because protective finish can be had damage, therefore need again to carry out cleaning activity, the protective finish sustaining damage is removed, again form new protective finish, to guarantee that follow-up technological reaction can carry out under satisfactory environment.
But, the coating that cleaning activity forms often can be gathered in some place of reaction chamber inside in the time removing, produce accumulations (Polymer), As time goes on, increasing of accumulations, while carrying out technological reaction, often accumulations can fall into the surface of wafer, form defect (Defect), when serious, can cause wafer loss.
Please refer to Fig. 1, Fig. 1 is the structural representation of reaction chamber in prior art, the sidewall of reaction chamber 10 is provided with bypass valve port 12 and gas flowmeter interface 12, wherein said bypass valve port 12 is for connecting a bypass valve (scheming not shown), conventionally before passing into reacting gas, first open described bypass valve, reduce pressure for the gas pumping in reaction chamber, after question response gas flow is stable, close again described bypass valve, and then carry out technological reaction; Described gas flowmeter interface 12 is for inflow gas, thereby obtained the flow information of gas by gas flowmeter.
But, carrying out after cleaning activity, tend in the time of described bypass valve port 12 and the interior formation accumulations of gas flowmeter interface 12 overheap, can stop up described bypass valve port 12 and gas flowmeter interface 12, technological reaction is affected greatly, on the other hand, accumulations also easily forms defect at crystal column surface, causes wafer loss.But due to described bypass valve port 12 and gas flowmeter interface 12 less, therefore, technical staff, in the time that described reaction chamber is carried out to periodic maintenance (PM), cannot clean out described bypass valve port 12 and gas flowmeter interface 12.Therefore, how avoiding accumulations to be deposited in described bypass valve port 12 and gas flowmeter interface 12, ensure that wafer carries out the environment of technological reaction good, is that those skilled in the art are badly in need of the technical problem solving.
Summary of the invention
The object of the present invention is to provide a kind of nested instrument and reaction chamber, can the opening of insertion reaction chamber inner wall in, be convenient to dismounting and cleaning.
To achieve these goals, the present invention proposes a kind of nested instrument, described instrument comprises cylinder and end face, and described end face is fixed on described cylinder, and described nested instrument is provided with through hole, and described through hole runs through described cylinder and end face.
Further, in described nested instrument, the surface of described cylinder and end face is all formed with protective finish.
Further, in described nested instrument, the material of described cylinder and end face is aluminium.
Further, in described nested instrument, described cylinder and end face are formed in one.
Further, in described nested instrument, the width of described end face cross section is greater than the diameter of described cylinder cross section.
Further, the invention allows for a kind of reaction chamber, comprise reaction cavity, described reaction cavity sidewall is provided with multiple perforates, described reaction chamber also comprises any one nested instrument as described above, and the cylinder dimensions of described nested instrument and the size of described perforate match.
Further, in described reaction chamber, described nested instrument is corresponding one by one with described perforate.
Compared with prior art; beneficial effect of the present invention is mainly reflected in: nested instrument comprises cylinder and end face; both are fixed together; the cylinder of nested instrument is embedded in the perforate of reaction chamber; end face is positioned at outside perforate; fixing nested instrument can not fall into perforate; therefore can protect the surface of perforate; reaction chamber being cleared up while safeguarding; can take out nested instrument clears up and safeguards; reduce cleaning difficulty, safeguarded the cleanliness factor of whole reaction chamber, can also protect perforate not to be damaged simultaneously.
Brief description of the drawings
Fig. 1 is the structural representation of reaction chamber in prior art;
Fig. 2 is the structural representation of nested instrument in one embodiment of the invention.
Embodiment
Below in conjunction with schematic diagram, nested instrument of the present invention and reaction chamber are described in more detail, the preferred embodiments of the present invention are wherein represented, should be appreciated that those skilled in the art can revise the present invention described here, and still realize advantageous effects of the present invention.Therefore, following description is appreciated that extensively knowing for those skilled in the art, and not as limitation of the present invention.
For clear, whole features of practical embodiments are not described.They in the following description, are not described in detail known function and structure, because can make the present invention chaotic due to unnecessary details.Will be understood that in the exploitation of any practical embodiments, must make a large amount of implementation details to realize developer's specific objective, for example, according to about system or about the restriction of business, change into another embodiment by an embodiment.In addition, will be understood that this development may be complicated and time-consuming, but be only routine work to those skilled in the art.
In the following passage, with way of example, the present invention is more specifically described with reference to accompanying drawing.According to the following describes and claims, advantages and features of the invention will be clearer.It should be noted that, accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the object of the aid illustration embodiment of the present invention lucidly.
Please refer to Fig. 2, in the present embodiment, proposed a kind of nested instrument, described instrument comprises cylinder 110 and end face 120, described end face 120 is fixed on described cylinder 110, and described nested instrument is provided with through hole 130, and described through hole 130 runs through described cylinder 110 and end face 120.
In the present embodiment, the surface of described cylinder 110 and end face 120 is all formed with protective finish, for the protection of described nested instrument, can not cause damage to reaction chamber inside simultaneously; Wherein, the material of described cylinder 110 and end face 120 is aluminium or aluminium alloy; Described cylinder 110 and end face 120 are formed in one; The width of described end face 120 cross sections is greater than the diameter of described cylinder 110 cross sections, adopts this design in cylinder 110 embeds perforate, can not fall in described perforate.
In the present embodiment; a kind of reaction chamber has also been proposed; comprise reaction cavity; described reaction cavity sidewall is provided with multiple perforates; cylinder 110 sizes of described nested instrument and the size of described perforate match; described cylinder 110 can be embedded in described perforate, thereby protect described perforate.
In the present embodiment, described nested instrument is corresponding one by one with described perforate, and the size of described nested instrument can decide according to the size of described perforate, can have sizes.
To sum up; in the nested instrument and reaction chamber providing in the embodiment of the present invention; nested instrument comprises cylinder and end face; both are fixed together; the cylinder of nested instrument is embedded in the perforate of reaction chamber; end face is positioned at outside perforate; fixing nested instrument can not fall into perforate; therefore can protect the surface of perforate; reaction chamber being cleared up while safeguarding, can take out nested instrument and clear up and safeguard, reduce cleaning difficulty; safeguard the cleanliness factor of whole reaction chamber, can also protect perforate not to be damaged simultaneously.
Above are only the preferred embodiments of the present invention, the present invention is not played to any restriction.Any person of ordinary skill in the field; not departing from the scope of technical scheme of the present invention; the technical scheme that the present invention is disclosed and technology contents make any type of variations such as replacement or amendment that are equal to; all belong to the content that does not depart from technical scheme of the present invention, within still belonging to protection scope of the present invention.
Claims (7)
1. a nested instrument, described instrument comprises cylinder and end face, and described end face is fixed on described cylinder, and described nested instrument is provided with through hole, and described through hole runs through described cylinder and end face.
2. nested instrument as claimed in claim 1, is characterized in that, the surface of described cylinder and end face is all formed with protective finish.
3. nested instrument as claimed in claim 2, is characterized in that, the material of described cylinder and end face is aluminium.
4. nested instrument as claimed in claim 3, is characterized in that, described cylinder and end face are formed in one.
5. nested instrument as claimed in claim 4, is characterized in that, the width of described end face cross section is greater than the diameter of described cylinder cross section.
6. a reaction chamber, comprise reaction cavity, described reaction cavity sidewall is provided with multiple perforates, it is characterized in that described reaction chamber also comprises any one the nested instrument described in claim 1 to 5, and the cylinder dimensions of described nested instrument and the size of described perforate match.
7. reaction chamber as claimed in claim 6, is characterized in that, described nested instrument is corresponding one by one with described perforate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410098490.3A CN103839841A (en) | 2014-03-17 | 2014-03-17 | Nesting tool and reaction chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410098490.3A CN103839841A (en) | 2014-03-17 | 2014-03-17 | Nesting tool and reaction chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103839841A true CN103839841A (en) | 2014-06-04 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410098490.3A Pending CN103839841A (en) | 2014-03-17 | 2014-03-17 | Nesting tool and reaction chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103839841A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105321794A (en) * | 2015-10-19 | 2016-02-10 | 上海华力微电子有限公司 | Damascus integrated etching machine cavity and substrate part |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1653587A (en) * | 2002-02-07 | 2005-08-10 | 应用材料有限公司 | Article for use in a semiconductor processing chamber and method of fabricating the same |
| CN1783415A (en) * | 1999-12-22 | 2006-06-07 | 兰姆研究公司 | Semiconductor processing equipment |
| CN101191200A (en) * | 2006-11-28 | 2008-06-04 | 应用材料股份有限公司 | Gas baffle and distributor for semiconductor processing chamber |
| US20100181221A1 (en) * | 2009-01-16 | 2010-07-22 | Rivers Jr William C | Outdoor smoking materials receptacle simulating a cigarette |
| CN102086509A (en) * | 2005-11-25 | 2011-06-08 | 应用材料股份有限公司 | Process kit component for sputtering chamber |
-
2014
- 2014-03-17 CN CN201410098490.3A patent/CN103839841A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1783415A (en) * | 1999-12-22 | 2006-06-07 | 兰姆研究公司 | Semiconductor processing equipment |
| CN1653587A (en) * | 2002-02-07 | 2005-08-10 | 应用材料有限公司 | Article for use in a semiconductor processing chamber and method of fabricating the same |
| CN102086509A (en) * | 2005-11-25 | 2011-06-08 | 应用材料股份有限公司 | Process kit component for sputtering chamber |
| CN101191200A (en) * | 2006-11-28 | 2008-06-04 | 应用材料股份有限公司 | Gas baffle and distributor for semiconductor processing chamber |
| US20100181221A1 (en) * | 2009-01-16 | 2010-07-22 | Rivers Jr William C | Outdoor smoking materials receptacle simulating a cigarette |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105321794A (en) * | 2015-10-19 | 2016-02-10 | 上海华力微电子有限公司 | Damascus integrated etching machine cavity and substrate part |
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Application publication date: 20140604 |
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| RJ01 | Rejection of invention patent application after publication |