CN105321794A - Damascus integrated etching machine cavity and substrate part - Google Patents
Damascus integrated etching machine cavity and substrate part Download PDFInfo
- Publication number
- CN105321794A CN105321794A CN201510680502.8A CN201510680502A CN105321794A CN 105321794 A CN105321794 A CN 105321794A CN 201510680502 A CN201510680502 A CN 201510680502A CN 105321794 A CN105321794 A CN 105321794A
- Authority
- CN
- China
- Prior art keywords
- cavity body
- damascus
- cavity
- substrate
- etching machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
- H01J37/32495—Means for protecting the vessel against plasma
Abstract
The invention discloses a Damascus integrated etching machine cavity. The Damascus integrated etching machine cavity comprises a cavity body, process components arranged in the cavity body and a substrate part arranged in the cavity body and matched with the cavity body. The invention also provides the substrate part mounted in the cavity body of the Damascus integrated etching machine cavity and matched with the cavity body. By additionally arranging the substrate part in the cavity body, the inner wall and the bottom of the cavity body can be protected to avoid products from adhering to the inner wall and the bottom of the cavity body, so that multiple workers for removing the products that are adhered to the side wall and the bottom for many hours are not required.
Description
Technical field
The present invention relates to IC manufacturing field, particularly a kind of Damascus integration etching machine cavity and substrate parts.
Background technology
TELVigus board is the state-of-the-art Damascus integration in world etching machine, its processing procedure (perforate-remove photoresist-cutting) with three road complexity completes in same reaction cavity, the product produced is complicated, especially TiN, be difficult to discharge cavity completely by molecular pump, major part can stick to cavity wall and corner containing the product of TiN.
When each PM (periodic maintenance), in order to thoroughly remove product residual in cavity, current industry is all root out the product sticking to sidewall and bottom manually, especially TiN, and viscosity is strong, roots out difficulty; And due to the area of cavity own large, the degree of depth is dark, and each thoroughly cleaning is clean needs two manpowers, about 2 man-hours; In addition, long-time oppose side wall and cavity bottom carry out rooting out action, and meeting oppose side wall and base coat have damage, for technique accurate as the integration of Damascus, have potential risks.
Summary of the invention
The invention provides a kind of Damascus integration etching machine cavity and substrate parts, to solve the above-mentioned technical problem existed in prior art.
For solving the problems of the technologies described above, the invention provides a kind of Damascus integration etching machine cavity, comprising: cavity body, be arranged on described cavity body inside technique component and to be arranged in described cavity body and the substrate parts matched with described cavity body.
As preferably, substrate parts adopts metal to make.
As preferably, described substrate parts to comprise bottom substrate and with described substrate bottom the substrate sidepiece that arranges of integral type.
As preferably, described substrate sidepiece is provided with opening of digging a hole.
As preferably, described substrate parts and described cavity body matched in clearance.
The present invention also provides a kind of substrate parts, is installed in the cavity body of Damascus integration etching machine cavity, and mates with cavity body.
As preferably, described substrate parts is for adopting metal barrel-like structure.
As preferably, described substrate parts to comprise bottom substrate and with described substrate bottom the substrate sidepiece that arranges of integral type.
As preferably, described substrate sidepiece is provided with opening of digging a hole.
As preferably, described substrate parts and described cavity body matched in clearance.
Compared with prior art, the invention provides a kind of Damascus integration etching machine cavity, comprising: cavity body, be arranged on described cavity body inside technique component and to be arranged in described cavity body and the substrate parts matched with described cavity body.The present invention also provides a kind of substrate parts, is installed in the cavity body of Damascus integration etching machine cavity, and mates with cavity body.The present invention, by setting up substrate parts in cavity body, can protect cavity body inwall and bottom, avoid product to stick to cavity body inwall and bottom, spends multiple man-hour without the need to multiple manpower.
Namely; the present invention is in order to save manpower; improve PM efficiency, shorten and answer a pager's call the time, and protect the process conditions of cavity body inside; design a kind of metal substrate parts being installed in Damascus integration etching machine cavity body inwall; can stop that product sticks to cavity body sidewall and bottom, when each PM, only need take out these parts and carry out sending cleaning outside; save manpower and answering a pager's call the time, and can available protecting cavity injury-free.
Accompanying drawing explanation
Fig. 1 is the structural representation (with substrate parts) of Damascus integration etching machine cavity in the embodiment of the invention;
Fig. 2 is the structural representation (product sticks in substrate parts) of Damascus integration etching machine cavity in the embodiment of the invention;
Fig. 3 is the structural representation (taking off the substrate parts with product) of Damascus integration etching machine cavity in the embodiment of the invention;
Fig. 4 is the structural representation of the substrate parts of Damascus integration etching machine cavity in the embodiment of the invention;
Fig. 5 is the end view of the substrate parts of Damascus integration etching machine cavity in the embodiment of the invention.
Shown in figure: 10-cavity body, 20-substrate parts, 30-product;
Bottom 210-substrate, 220-substrate sidepiece, 230-dig a hole opening.
Embodiment
For enabling above-mentioned purpose of the present invention, feature and advantage become apparent more, are described in detail the specific embodiment of the present invention below in conjunction with accompanying drawing.It should be noted that, accompanying drawing of the present invention all adopts the form of simplification and all uses non-ratio accurately, only in order to object that is convenient, the aid illustration embodiment of the present invention lucidly.
As shown in Figures 1 to 5, the invention provides a kind of Damascus integration etching machine cavity, comprising: cavity body 10, be arranged on described cavity body 10 inside technique component and to be arranged in described cavity body 10 and the substrate parts 20 matched with described cavity body 10.Described technique component is used for carrying out Damascus integration etching technics, namely in cavity body 10, performs perforate--cutting step of removing photoresist successively.
As preferably, substrate parts 20 adopts metal barrel-like structure, and namely the inwall of cavity body 10 and sidewall shelter from by it simultaneously, avoids product directly to stick on the inwall of cavity body 10.
Please emphasis with reference to Figure 4 and 5, described substrate parts 20 to comprise bottom substrate 210 and with described substrate bottom the substrate sidepiece 220 that arranges of 210 integral types.Bottom substrate, 210 for blocking the bottom of cavity body 10, and described substrate sidepiece 220 is for blocking the sidewall of cavity body 10.
As preferably, described substrate sidepiece 220 is provided with opening 230 of digging a hole, described in opening 230 of digging a hole corresponding with the exhaust port in cavity body 10, its role is to: in conjunction with the exhaust port that cavity body 10 is original, realize tail gas and discharge.
As preferably, described substrate parts 20 and described cavity body 10 matched in clearance, facilitate and follow-up the substrate parts 20 with product 30 to be taken out, the substrate parts 20 of taking out directly can send cleaning outside, further, described substrate parts 20 can arrange many groups, and the mode adopting wash cycles to change carries out management and control, can extend the life-span of Damascus integration etching machine cavity further.
Please emphasis with reference to Fig. 4 and Fig. 5, the present invention also provides a kind of substrate parts 20, is installed in the cavity body 10 of Damascus integration etching machine cavity, and mates with cavity body 10.The structure of described substrate parts 20 is simple, and can effectively block product 30 when being placed in cavity body 10, avoids the product 30 being difficult to clean to be deposited in cavity body 10.
As preferably, described substrate parts 20 is for adopting metal barrel-like structure.
As preferably, described substrate parts 20 to comprise bottom substrate 210 and with described substrate bottom the substrate sidepiece 220 that arranges of 210 integral types.
As preferably, described substrate sidepiece 220 is provided with opening 230 of digging a hole.
As preferably, described substrate parts 20 and described cavity body 10 matched in clearance, facilitate and follow-up the substrate parts 20 with product 30 to be taken out, the substrate parts 20 of taking out directly can send cleaning outside, further, described substrate parts 20 can arrange many groups, and the mode adopting wash cycles to change carries out management and control, can extend the life-span of Damascus integration etching machine cavity further.
In sum, the invention provides a kind of Damascus integration etching machine cavity, comprising: cavity body 10, be arranged on described cavity body 10 inside technique component and be arranged at the substrate parts 20 that described cavity body 10 matches.The present invention also provides a kind of substrate parts 20, is installed in the cavity body 10 of Damascus integration etching machine cavity, and mates with cavity body 10.The present invention by setting up substrate parts 20 in cavity body 10; cavity body 10 inwall and bottom can be protected; avoid product 30 to stick to cavity body 10 inwall and bottom, root out the product sticking to sidewall and bottom multiple man-hour without the need to multiple manpower cost.
Namely; the present invention is in order to save manpower; improve PM efficiency, shorten and answer a pager's call the time, and protect the process conditions of cavity body 10 inside; design a kind of substrate parts 20 being installed in the preparation of metals of Damascus integration etching machine cavity inner wall; can stop that product 30 sticks to sidewall and the bottom of cavity body 10, when each PM, only need take out these parts and carry out sending cleaning outside; save manpower and answering a pager's call the time, and can available protecting cavity injury-free.
Obviously, those skilled in the art can carry out various change and modification to invention and not depart from the spirit and scope of the present invention.Like this, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.
Claims (10)
1. Damascus integration etching machine cavity, is characterized in that, comprising: cavity body, be arranged on described cavity body inside technique component and to be arranged in described cavity body and the substrate parts matched with described cavity body.
2. Damascus integration etching machine cavity as claimed in claim 1, it is characterized in that, described substrate parts adopts metal to make.
3. Damascus integration etching machine cavity as claimed in claim 1, is characterized in that, described substrate parts to comprise bottom substrate and with described substrate bottom the substrate sidepiece that arranges of integral type.
4. Damascus integration etching machine cavity as claimed in claim 3, it is characterized in that, described substrate sidepiece is provided with opening of digging a hole.
5. Damascus integration etching machine cavity as claimed in claim 1, is characterized in that, described substrate parts and described cavity body matched in clearance.
6. a substrate parts, is characterized in that, is installed in the cavity body of Damascus integration etching machine cavity, and mates with cavity body.
7. substrate parts as claimed in claim 6, is characterized in that, described substrate parts is for adopting metal barrel-like structure.
8. substrate parts as claimed in claim 6, is characterized in that, described substrate parts to comprise bottom substrate and with described substrate bottom the substrate sidepiece that arranges of integral type.
9. substrate parts as claimed in claim 8, it is characterized in that, described substrate sidepiece is provided with opening of digging a hole.
10. substrate parts as claimed in claim 6, is characterized in that, described substrate parts and described cavity body matched in clearance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510680502.8A CN105321794A (en) | 2015-10-19 | 2015-10-19 | Damascus integrated etching machine cavity and substrate part |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510680502.8A CN105321794A (en) | 2015-10-19 | 2015-10-19 | Damascus integrated etching machine cavity and substrate part |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105321794A true CN105321794A (en) | 2016-02-10 |
Family
ID=55248945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510680502.8A Pending CN105321794A (en) | 2015-10-19 | 2015-10-19 | Damascus integrated etching machine cavity and substrate part |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105321794A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6277237B1 (en) * | 1998-09-30 | 2001-08-21 | Lam Research Corporation | Chamber liner for semiconductor process chambers |
| CN102376604A (en) * | 2010-08-19 | 2012-03-14 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Vacuum processing equipment and temperature control method thereof, and semiconductor device processing method |
| CN103346058A (en) * | 2013-06-08 | 2013-10-09 | 天通吉成机器技术有限公司 | Cavity lining of plasma etching equipment |
| CN103839841A (en) * | 2014-03-17 | 2014-06-04 | 上海华虹宏力半导体制造有限公司 | Nesting tool and reaction chamber |
| CN104409393A (en) * | 2014-11-17 | 2015-03-11 | 上海华力微电子有限公司 | Wafer purification device, etching machine and Damascus etching method |
-
2015
- 2015-10-19 CN CN201510680502.8A patent/CN105321794A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6277237B1 (en) * | 1998-09-30 | 2001-08-21 | Lam Research Corporation | Chamber liner for semiconductor process chambers |
| CN102376604A (en) * | 2010-08-19 | 2012-03-14 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Vacuum processing equipment and temperature control method thereof, and semiconductor device processing method |
| CN103346058A (en) * | 2013-06-08 | 2013-10-09 | 天通吉成机器技术有限公司 | Cavity lining of plasma etching equipment |
| CN103839841A (en) * | 2014-03-17 | 2014-06-04 | 上海华虹宏力半导体制造有限公司 | Nesting tool and reaction chamber |
| CN104409393A (en) * | 2014-11-17 | 2015-03-11 | 上海华力微电子有限公司 | Wafer purification device, etching machine and Damascus etching method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| SG162757A1 (en) | Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition | |
| MY143763A (en) | Method and system for using a two-phases substrate cleaning compound | |
| TW200738868A (en) | Method and system for using a two-phases substrate cleaning compound | |
| TW200610592A (en) | Methods for wet cleaning quartz surfaces of components for plasma processing chambers | |
| WO2007005437A3 (en) | Out-of-band change detection | |
| TW200700812A (en) | Coating apparatus and operating method thereof | |
| WO2016095965A3 (en) | Experience-based roadmap for a robotic cleaning device | |
| CN106449366A (en) | Method for solving particle pollution on surface of electrostatic chuck in etching cavity | |
| DK1575833T3 (en) | Process for manufacturing and / or handling an ultra-clean object | |
| CN105321794A (en) | Damascus integrated etching machine cavity and substrate part | |
| CN108191255A (en) | 3D glass product painting methods | |
| CN103676034A (en) | Dispensing process of optical communication transceiver | |
| CN109642316A (en) | The temperature sensor of end point determination is used for during pecvd process chamber cleaning | |
| CN204134829U (en) | The glue dispensing valve that a kind of effective anti-adhesive agent becomes dry | |
| CN105728668A (en) | Flow coating machine with mesh screen | |
| CN103869599A (en) | Optical proximity correction method for through hole | |
| CN206935947U (en) | Auto Electric Switches plastic part cleaning device | |
| ATE537227T1 (en) | TWO-STEP OR MULTI-STEP PAINT REMOVAL PROCESS | |
| CN103721977A (en) | Electron component cleaning method | |
| CN207587702U (en) | Semiconductor equipment | |
| CN208555334U (en) | A kind of automatic on-line vacuum plasma cleaning machine | |
| CN204639075U (en) | A kind of stream Tu machine with mesh screen | |
| KR100926259B1 (en) | Cutting method for protecting optical glass surface | |
| CN205752214U (en) | A kind of uniform etching device of photovoltaic silicon wafer | |
| CN205816350U (en) | A kind of viscosity pipet cleaning machine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160210 |