CN105223786A - For preventing method and the device of camera lens atomized inside - Google Patents
For preventing method and the device of camera lens atomized inside Download PDFInfo
- Publication number
- CN105223786A CN105223786A CN201510729487.1A CN201510729487A CN105223786A CN 105223786 A CN105223786 A CN 105223786A CN 201510729487 A CN201510729487 A CN 201510729487A CN 105223786 A CN105223786 A CN 105223786A
- Authority
- CN
- China
- Prior art keywords
- camera lens
- gas
- preventing
- cage
- atomization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
The invention discloses a kind of for preventing the method for camera lens atomized inside and a kind of for preventing the device of camera lens atomized inside.The method comprises the atomization position determining camera lens inside; Clean gas is passed into get rid of the foreign gas of the atomization position of camera lens in atomization position.Transparency for preventing the method for camera lens atomized inside from effectively improve camera lens of the present invention, make camera lens without the need to often changing and cleaning, improve the production capacity in lithographic process process on the one hand, the serviceable life of camera lens can be extended on the other hand, greatly reduce production cost.
Description
Technical field
The invention belongs to technical field of liquid crystal display, being specifically related to method and device for preventing camera lens atomized inside.
Background technology
In recent years, the liquid crystal display development of small-medium size is swift and violent, need in the production run of array layer through multiple tracks lithographic process, and the camera lens of exposure machine is used for sending ultraviolet light, image information on film or other saturating bodies is transferred to and is scribbled on the array base palte of photoactive substance by this ultraviolet light, thus completes the multiple tracks lithographic process of array layer.
But, owing to usually containing organism (VOC) particle and ammonium root positive ion (NH4 in the TFTLCD environment of plant
+) particle, the environment that exposure machine camera lens is preserved need lower than 200ppb to the requirement of VOC concentration, and the VOC concentration of the G8.5 generation TFTLCD factory of general application is at present greater than 1000ppb usually, at this concentration, particle packing can be formed on exposure machine camera lens in long production run, cause glass transparent degree to reduce, namely camera lens atomization occurs.There is atomization and lamp source service life can be caused to reduce on the one hand in the camera lens of exposure machine, causes capacity loss; On the other hand the replacing in lamp source and cleaning cost are increased greatly.
For above-mentioned technology Problems existing, wish to seek a kind of for preventing the method for camera lens atomized inside and a kind of for preventing the device of camera lens atomized inside in the art, to solve weak point of the prior art.
Summary of the invention
The present invention is directed to the deficiencies in the prior art part, providing a kind of for preventing the method for camera lens atomized inside and a kind of for preventing the device of camera lens atomized inside.
According to provided by the invention a kind of for preventing the method for camera lens atomized inside, comprising:
Determine the atomization position of camera lens inside;
Clean gas is passed into get rid of the foreign gas of the atomization position of camera lens in atomization position.
In the prior art, because camera lens inside causes internal operating temperature to raise gradually with the increase of working time, now need to use refrigerating gas to lower the temperature to camera lens inside, and the refrigerating gas applied at present be generally be positioned at inside, industrial building containing organism (VOC) particle and ammonium root positive ion (NH4
+) gas that particulate component is higher, entering of this component gas can cause camera lens inside to be atomized, thus the light transmission rate of reduction camera lens.Of the present invention for preventing in the method for camera lens atomized inside, first the atomization position of camera lens inside is determined, clean gas is passed into get rid of the foreign gas of atomization position subsequently in atomization position, namely use clean gas drive away be positioned at atomization position foreign gas, thus make foreign gas can not atomization position react precipitation and cause the light transmission rate of camera lens to decline.Transparency for preventing the method for camera lens atomized inside from effectively improve camera lens of the present invention, make camera lens without the need to often changing and cleaning, improve the production capacity in lithographic process process on the one hand, the serviceable life of camera lens can be extended on the other hand, greatly reduce production cost.
In some embodiments, the atomization position of camera lens inside is tested by the light transmission rate of each several part to camera lens and obtains.Tested the concrete atomization position determining camera lens inside by the light transmission rate of each several part to camera lens, foreign gas is targetedly carried out to the atomization position determined and discharges, effectively can prevent the atomization of camera lens.
In some embodiments, clean gas is the gas that can not make camera lens that atomization occurs.It should be noted that the clean gas in the present invention is mainly used in getting rid of the foreign gas making atomization position, as long as therefore can ensure that this clean gas can not make atomization position be atomized.Preferably, this clean gas can be the gas that can not make camera lens that atomization reaction occurs, and such as inert gas etc. also can be the air that impurity particle concentration is lower.
In some embodiments, foreign gas comprises organic particle and ammonium root positive ion particle.The principal ingredient that can make camera lens that the foreign gas of atomization occurs is machine composition granule and ammonium root positive ion particle, carries out getting rid of the generation that greatly can reduce camera lens atomization reaction to these particles.
In some embodiments, clean gas continues to pass into atomization position.The program is used for the foreign gas continuing to get rid of atomization position, thus effectively ensures the clean of atomization position.
In some embodiments, also comprise: in the atomization position of despumation gas, cage is set, cage comprises air intake opening and gas outlet, and clean gas is entered in cage by air intake opening, and the foreign gas in cage is continued through gas outlet discharge.In this scenario; in the atomization position eliminating foreign gas, cage is set; cage can be protected atomization position; after setting cage; continue to pass into clean gas to air intake opening; thus discharge the foreign gas that may exist in cage further, to avoid impurity particle on the impact of atomization position.
In some embodiments, air intake opening is towards the edge of the atomization position of camera lens inside.The edge that air intake opening is arranged on atomization position by the program can make the foreign gas of atomization position discharge cage more fully.When the density of the clean gas passed into is larger, gas outlet can relative set in the top of air intake opening, now clean gas in cage from the bottom to top, and upwards to be flowed by the edge of atomization position, thus discharge the foreign gas in cage completely; When the density of the clean gas passed into is less, gas outlet can relative set in the below of air intake opening, now clean gas in cage from top to bottom, and to be flowed downward by the edge of atomization position, thus discharge the foreign gas in cage completely.
According to provided by the invention a kind of for preventing the device of camera lens atomized inside, comprise the cage of the atomization position being arranged on camera lens inside.Cage is mainly used in isolating atomization position and other parts of camera lens inside, thus prevents foreign gas in camera lens internal environment on the impact of atomization position.
In some embodiments, cage comprises air intake opening, and air intake opening place is provided with filtrator.In cage, pass into by the air intake opening of cage the foreign gas that clean gas can discharge atomization position further further, this clean gas such as can be through the cold air of frit.And the filtrator in the program can filter out the gas that can make atomization position that atomization reaction occurs on the one hand, the gas through it can be lowered the temperature on the other hand, thus form refrigerating gas to lower the temperature to camera lens inside.
In some embodiments, cage also comprises:
Gas outlet, gas outlet place is extended with escape pipe,
Be arranged on the adjustment damping part at escape pipe place,
Wherein, regulate damping part to comprise the spring hose socket-connected with escape pipe, spring hose one end is connected with cage, and the other end is connected with the outer cover of camera lens, and the minimum compressed length of spring hose is greater than the length of escape pipe.In this scenario, regulate damping part to be used on the one hand playing fixation to cage, its spring hose is used for playing cushioning effect to cage on the other hand.Escape pipe is socketed in spring hose, and the minimum compressed length of spring hose is greater than the length of escape pipe, and the gas that escape pipe is discharged is discharged by the gap of spring hose.
Compared with prior art, transparency for preventing the method for camera lens atomized inside from effectively improve camera lens of the present invention, make camera lens without the need to often changing and cleaning, improve the production capacity in lithographic process process on the one hand, the serviceable life of camera lens can be extended on the other hand, greatly reduce production cost.
Accompanying drawing explanation
Also will be described in more detail the present invention with reference to accompanying drawing based on embodiment hereinafter.Wherein:
Fig. 1 is for preventing the process flow diagram of the method for camera lens atomized inside according to of the present invention;
Fig. 2 is the gas circulation schematic diagram of camera lens inside;
Fig. 3 is for preventing the schematic top plan view of the structure of the device of camera lens atomized inside according to of the present invention;
Fig. 4 is the structural representation of the cage shown in Fig. 3.
In the accompanying drawings, identical parts use identical Reference numeral.Accompanying drawing is not according to the scale of reality.
Embodiment
Below in conjunction with accompanying drawing, the invention will be further described.
Details described here is exemplary, and is only used for carrying out illustrative discussion to embodiments of the invention, and their existence is to provide the most useful and the most intelligible description be considered to principle of the present invention and concept aspect.About this point, here do not attempt introduction CONSTRUCTED SPECIFICATION of the present invention being exceeded to basic comprehension degree required for the present invention, those skilled in the art can be expressly understood by instructions and accompanying drawing thereof and implement several form of the present invention how in practice.
Fig. 1 shows according to provided by the invention for preventing the process flow diagram of the method for camera lens 10 atomized inside.As shown in Figure 1, the method comprises the following steps:
Step S100: the atomization position determining camera lens 10 inside;
Step S200: pass into clean gas b to get rid of the foreign gas of the atomization position of camera lens 10 in atomization position.
Shown in composition graphs 2, in the prior art, light source S is luminous towards camera lens 10 by its institute position shown in the figure, because camera lens 10 inside causes internal operating temperature to raise gradually with the increase of working time, now need to use refrigerating gas a to lower the temperature to camera lens inside, and the refrigerating gas a applied at present be generally be positioned at inside, industrial building containing organism (VOC) particle and ammonium root positive ion (NH4
+) gas that particulate component is higher, entering of this component gas can cause camera lens 10 inside to be atomized, thus the light transmission rate of reduction camera lens 10.Of the present invention for preventing in the method for camera lens 10 atomized inside, first the atomization position of camera lens 10 inside is determined, clean gas is passed into get rid of the foreign gas of atomization position subsequently in atomization position, namely use clean gas drive away be positioned at atomization position foreign gas, thus make foreign gas can not atomization position react precipitation and cause the light transmission rate of camera lens 10 to decline.Transparency for preventing the method for camera lens 10 atomized inside from effectively improve camera lens 10 of the present invention, make camera lens without the need to often changing and cleaning, improve the production capacity in lithographic process process on the one hand, the serviceable life of camera lens can be extended on the other hand, greatly reduce production cost.
Provided by the invention for preventing in the method for camera lens 10 atomized inside, the atomization position of camera lens 10 inside is tested by the light transmission rate of each several part to camera lens 10 and obtains.Tested the concrete atomization position determining camera lens 10 inside by the light transmission rate of each several part to camera lens 10, foreign gas is targetedly carried out to the atomization position determined and discharges, effectively can prevent the atomization of camera lens 10.Obtain through experimental data test, there is the atomization position of atomization usually on the side of the close light source S of camera lens 10 in camera lens 10, is specially the edge of the side of the close light source S of camera lens 10.
According to the present invention, clean gas b is the gas that can not make camera lens 10 that atomization occurs.It should be noted that the clean gas b in the present invention is mainly used in getting rid of the foreign gas making atomization position, as long as therefore can ensure that this clean gas b can not make atomization position be atomized.Preferably, this clean gas b can be the gas that can not make camera lens that atomization reaction occurs, and such as inert gas etc. also can be the air that impurity particle concentration is lower.Preferably, this clean gas b can be the gas c of the further cleaning obtained after being filtered by filtrator 40.
In addition, foreign gas comprises organic particle and ammonium root positive ion particle.The principal ingredient that can make camera lens 10 that the foreign gas of atomization occurs is machine composition granule and ammonium root positive ion particle, carries out getting rid of greatly can reduce the generation that camera lens 10 is atomized reaction to these particles.
In one preferably embodiment, clean gas b continues to pass into atomization position.The program is used for the foreign gas continuing to get rid of atomization position, thus effectively ensures the clean of atomization position.
According to the present invention, as shown in Figure 3, of the present invention for preventing the method for camera lens 10 atomized inside from also comprising: in the atomization position of despumation gas, cage 20 is set, cage 20 comprises air intake opening 21 (as shown in Figure 2) and gas outlet 22, clean gas b is entered in cage 20 by air intake opening 21, and the foreign gas in cage 20 is continued through gas outlet 22 discharges.In this scenario; in the atomization position eliminating foreign gas, cage 20 is set; cage 20 can be protected atomization position; after setting cage 20; continue to pass into clean gas to air intake opening 21; thus discharge the foreign gas that may exist in cage 22 further, to avoid impurity particle on the impact of atomization position.
Preferably, air intake opening 21 is arranged to towards the edge of the atomization position of camera lens 10 inside.The edge that air intake opening 21 is arranged on atomization position by the program can make the foreign gas of atomization position discharge cage 20 more fully.When the density of the clean gas b passed into is larger, gas outlet 22 can relative set in the top of air intake opening 21, now clean gas b in cage 20 from the bottom to top, and upwards to be flowed by the edge of atomization position, thus discharge the foreign gas in cage 20 completely; When the density of the clean gas b passed into is less, gas outlet 22 can relative set in the below of air intake opening 21, now clean gas b in cage 20 from top to bottom, and to be flowed downward by the edge of atomization position, thus discharge the foreign gas in cage 20 completely.
Fig. 3 shows according to provided by the invention a kind of for preventing the structural representation of the device 100 of camera lens 10 atomized inside.This device 100 comprises the cage 20 of the atomization position being arranged on camera lens 10 inside.Cage 20 is mainly used in isolating atomization position and other parts of camera lens 10 inside, thus prevents foreign gas in camera lens 10 internal environment on the impact of atomization position.
According to the present invention, as shown in Figure 4, cage 20 comprises air intake opening 21 (as shown in Figure 2), and air intake opening 21 place is provided with filtrator 40.In cage 20, pass into by the air intake opening 21 of cage 20 foreign gas that clean gas b can discharge atomization position further further, this clean gas b such as can be through the cold air of frit 40.And filtrator 40 1 aspect in the program can filter out the gas that can make atomization position that atomization reaction occurs, the gas through it can be lowered the temperature on the other hand, thus form refrigerating gas to lower the temperature to camera lens 10 inside.
As shown in Figure 4, cage 20 also comprises gas outlet 22, and gas outlet 22 place is extended with escape pipe 221, is arranged on the adjustment damping part 23 at escape pipe 221 place.Wherein, damping part 23 is regulated to comprise the spring hose (not shown) socket-connected with escape pipe 221, here can by spring hose when making adjustments damping part 23, spring hose one end is connected with cage 20, the other end is connected with the outer cover of camera lens 10, and the minimum compressed length of spring hose is greater than the length of escape pipe 221.In this scenario, regulate damping part 23 1 aspect to be used for cage 20 fixations, its spring hose is used for cage 20 cushioning effects on the other hand.Escape pipe 221 is socketed in spring hose, and the minimum compressed length of spring hose is greater than the length of escape pipe 221, and the gas that escape pipe 221 is discharged is discharged by the gap of spring hose.
Compared with prior art, transparency for preventing the method for camera lens 10 atomized inside from effectively improve camera lens 10 of the present invention, make camera lens 10 without the need to often changing and cleaning, improve the production capacity in lithographic process process on the one hand, the serviceable life of camera lens 10 can be extended on the other hand, greatly reduce production cost.
It should be noted, foregoing example only to be interpreted as object, and can not be thought to limit the present invention.Although invention has been described according to exemplary embodiment, but should be appreciated that used herein is descriptive and illustrative language, instead of restrictive language.Current described with in the scope of the claims of amendment, not departing from the scope of the present invention in the scope with spirit, can change the present invention.Although according to specific mode, material and embodiment, invention has been described here, the present invention is not limited in details disclosed herein; On the contrary, the present invention extends to structure, the methods and applications of such as all identical functions within the scope of the appended claims.
Claims (10)
1., for preventing a method for camera lens atomized inside, comprising:
Determine the atomization position of camera lens inside;
Clean gas is passed into get rid of the foreign gas of the atomization position of described camera lens in described atomization position.
2. according to claim 1ly it is characterized in that for preventing the method for camera lens atomized inside, the atomization position of described camera lens inside is tested by the light transmission rate of each several part to described camera lens and obtains.
3. according to claim 1 and 2ly it is characterized in that for preventing the method for camera lens atomized inside, described clean gas is the gas that can not make described camera lens that atomization occurs.
4. according to claim 1 and 2ly it is characterized in that for preventing the method for camera lens atomized inside, described foreign gas comprises organic particle and ammonium root positive ion particle.
5. according to claim 1 and 2ly it is characterized in that for preventing the method for camera lens atomized inside, described clean gas continues to pass into described atomization position.
6. according to claim 1 and 2 for preventing the method for camera lens atomized inside, it is characterized in that, also comprise: in the atomization position getting rid of described foreign gas, cage is set, described cage comprises air intake opening and gas outlet, described clean gas is entered in described cage by described air intake opening, and the foreign gas in described cage is continued through the discharge of described gas outlet.
7. according to claim 6ly it is characterized in that for preventing the method for camera lens atomized inside, described air intake opening is towards the edge of the atomization position of described camera lens inside.
8., by the device for preventing camera lens atomized inside for preventing the method for camera lens atomized inside from making such as according to any one of claim 1 to 7, comprise the cage of the atomization position being arranged on described camera lens inside.
9. according to claim 8ly it is characterized in that for preventing the device of camera lens atomized inside, described cage comprises air intake opening, and described air intake opening place is provided with filtrator.
10. the device for preventing camera lens atomized inside according to claim 8 or claim 9, it is characterized in that, described cage also comprises:
Gas outlet, described gas outlet place is extended with escape pipe,
Be arranged on the adjustment damping part at described escape pipe place,
Wherein, described adjustment damping part comprises the spring hose socket-connected with described escape pipe, described spring hose one end is connected with described cage, and the other end is connected with the outer cover of described camera lens, and the minimum compressed length of described spring hose is greater than the length of described escape pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510729487.1A CN105223786B (en) | 2015-10-30 | 2015-10-30 | Method and device for preventing camera lens atomized inside |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510729487.1A CN105223786B (en) | 2015-10-30 | 2015-10-30 | Method and device for preventing camera lens atomized inside |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105223786A true CN105223786A (en) | 2016-01-06 |
| CN105223786B CN105223786B (en) | 2017-11-07 |
Family
ID=54992825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510729487.1A Active CN105223786B (en) | 2015-10-30 | 2015-10-30 | Method and device for preventing camera lens atomized inside |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105223786B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108828904A (en) * | 2018-06-27 | 2018-11-16 | 深圳市华星光电半导体显示技术有限公司 | purification device and exposure machine |
| CN111490442A (en) * | 2020-04-13 | 2020-08-04 | 吴翰 | High-efficient fiber laser collimator cooling structure |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000124121A (en) * | 1998-10-16 | 2000-04-28 | Canon Inc | Optical device, aligner, lens-barrel, connecting device, case and lens-barrel end shield |
| JP2001284214A (en) * | 2000-03-30 | 2001-10-12 | Canon Inc | Exposure system, method of manufacturing device, maintenance method for semiconductor manufacturing plant and exposure system |
| US6341006B1 (en) * | 1995-04-07 | 2002-01-22 | Nikon Corporation | Projection exposure apparatus |
| CN201134420Y (en) * | 2007-08-10 | 2008-10-15 | 廖莉雯 | System for keeping light shield clean |
| CN104281012A (en) * | 2014-09-18 | 2015-01-14 | 合肥芯硕半导体有限公司 | Gas shielded lens |
-
2015
- 2015-10-30 CN CN201510729487.1A patent/CN105223786B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6341006B1 (en) * | 1995-04-07 | 2002-01-22 | Nikon Corporation | Projection exposure apparatus |
| JP2000124121A (en) * | 1998-10-16 | 2000-04-28 | Canon Inc | Optical device, aligner, lens-barrel, connecting device, case and lens-barrel end shield |
| JP2001284214A (en) * | 2000-03-30 | 2001-10-12 | Canon Inc | Exposure system, method of manufacturing device, maintenance method for semiconductor manufacturing plant and exposure system |
| CN201134420Y (en) * | 2007-08-10 | 2008-10-15 | 廖莉雯 | System for keeping light shield clean |
| CN104281012A (en) * | 2014-09-18 | 2015-01-14 | 合肥芯硕半导体有限公司 | Gas shielded lens |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108828904A (en) * | 2018-06-27 | 2018-11-16 | 深圳市华星光电半导体显示技术有限公司 | purification device and exposure machine |
| CN111490442A (en) * | 2020-04-13 | 2020-08-04 | 吴翰 | High-efficient fiber laser collimator cooling structure |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105223786B (en) | 2017-11-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105223786A (en) | For preventing method and the device of camera lens atomized inside | |
| CN101075095A (en) | Infiltration photo-etching system, infiltration photo-etching method for patterned semiconductor integrate circuit | |
| Wu et al. | Association between traffic-related air pollution and hospital readmissions for rheumatoid arthritis in Hefei, China: A time-series study | |
| Alam et al. | Air pollutants and their possible health effects at different locations in Dhaka City | |
| CN207262544U (en) | A kind of band cleans the air-conditioning of strainer and internal disinfecting and sterilizing functions automatically | |
| FR2910138B1 (en) | ELECTRO-CONTROLLABLE DEVICE ELECTROLYTE MATERIAL, MANUFACTURING METHOD THEREOF, ELECTRO-CONTROLLABLE DEVICE COMPRISING SAME, AND METHOD OF MANUFACTURING THE SAME | |
| CN109643942A (en) | Purge ring | |
| KR101960747B1 (en) | Method for prevention condensation on clean room | |
| CN209325970U (en) | A kind of air cleaning unit of novel cleaning clean room | |
| CN104502541B (en) | The gas cell device of a kind of gas analyzer | |
| CN103311163A (en) | Inverted valve for semiconductor storage device | |
| CN102402090A (en) | Array substrate and manufacturing method thereof, and liquid crystal display device | |
| CN104826437A (en) | Device for purifying waste anesthetic gas | |
| CN205128519U (en) | A baking equipment for getting rid of micro - organic pollutant in ray apparatus component surface | |
| CN203790788U (en) | Haze and dust-haze treatment device | |
| CN202606169U (en) | Test box with cleaning and sterilizing functions | |
| Munters et al. | Precursor dataset CNk2 | |
| CN110173772A (en) | A kind of device purifying air | |
| Wei et al. | Research Progress of HP Characteristics, Hazards, Control Technologies, and Measures in China after 2013 | |
| TWI795672B (en) | Air pollution source analysis device | |
| CN203866108U (en) | Biotrickling filtration device | |
| Singh et al. | Impact of Weather on COVID-19 Pandemic in Various Locations of Jammu Division of Jammu Kashmir Union Territory, India | |
| CN211217837U (en) | Dust collector is used in electronic product production | |
| CN213514253U (en) | Ventilation system is used in integrated circuit production | |
| CN203893316U (en) | Device for conducting ecological treatment on polluted air |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |