CN103442509A - Reciprocating type multi-ionization-cavity atmospheric-pressure unbalance plasma reactor - Google Patents

Reciprocating type multi-ionization-cavity atmospheric-pressure unbalance plasma reactor Download PDF

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CN103442509A
CN103442509A CN2013103764686A CN201310376468A CN103442509A CN 103442509 A CN103442509 A CN 103442509A CN 2013103764686 A CN2013103764686 A CN 2013103764686A CN 201310376468 A CN201310376468 A CN 201310376468A CN 103442509 A CN103442509 A CN 103442509A
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ionization
plasma
chamber
ionization chamber
reaction gas
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张芝涛
俞哲
徐书婧
李日红
杨海东
杜还
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Dalian Maritime University
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Dalian Maritime University
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Abstract

Provided is a reciprocating type multi-ionization-cavity atmospheric-pressure unbalance plasma reactor. A plurality of unbalance plasma ionization cavities are formed between a plate ground electrode and an alpha-A12O3 dielectric medium layer covering the surface of a plate high-voltage electrode, the plate ground electrode is provided with cooling liquid cavities, and reaction gas cooling cavities are further arranged between the cooling liquid cavities of the plate ground electrode. When the atmospheric-pressure unbalance plasma reactor works, after entering the reactor uniformly, raw material gas alternately passes through the unbalance plasma ionization cavities and the reaction gas cooling cavities, and is output through reaction gas outlets finally, electricity can be supplied to the unbalance plasma ionization cavities by adopting the same excitation power supply, and each ionization cavity can also utilize an independent excitation power supply. According to the reciprocating type multi-ionization-cavity atmospheric-pressure unbalance plasma reactor, plasma chemical reaction is conducted more sufficiently, the effect of the plasma chemical reaction is improved, so that discharging performance of each ionization cavity is optimized, and the progress of the plasma chemical reaction can be regulated and controlled more conveniently.

Description

A kind of reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor
Technical field
The invention belongs to gas discharge and applied technical field, relate to a kind of gas discharge reaction of low temperature plasma device, especially a kind of reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor.
Background technology
Atmospheric non-equilibrium plasma is widely used in that the preparation of high-efficiency activated oxygen radical, ozone are synthetic, material surface processing, plasma demonstration, ultraviolet source, high power CO 2the fields such as laser, realized the unapproachable treatment effect of conventional method, has important using value.With traditional low pressure nonequilibrium plasma generation technique, compare, atmospheric non-equilibrium plasma has higher energy utilization efficiency, and do not need the vacuum system of bulky complex and the vacuum cavity of strict sealing, therefore be particularly suitable for applying on industrial consecutive production.At present, corona discharge, microwave discharge and dielectric barrier discharge are the major ways that obtains atmospheric non-equilibrium plasma, and wherein the most representative is atmospheric dielectric barrier discharge, its advantage be simple in structure, easily obtain the large space nonequilibrium plasma.
Atmospheric dielectric barrier discharge is a kind of mode that obtains atmospheric non-equilibrium plasma the most frequently used in current industry, particularly in the synthetic field of the industrial ozone history of existing more than 100 years.In the atmospheric dielectric barrier discharge system, utilize the ballast effect of dielectric layer can produce at the same driving voltage of same discharge space the micro discharge that quantity is huge, structure dimension is close, characteristic is identical in the cycle, in most cases this micro discharge shows as the discharge mode that miniflow is annotated, this discharge mode be main, the most common, also be the discharge mode of the most easily realizing.The micro discharge life-span only had for tens to tens nanoseconds, the discharge channel radius only has 0.1~0.2mm, it is therefore this that with the naked eye to seem uniform discharge mode in fact extremely inhomogeneous, duty ratio on discharge time and discharge space is all very little, and result causes the part plasma chemical reaction fully not carry out.Therefore, need to impel fully carrying out of plasma chemical reaction by increasing the RT of reacting gas in ionization chamber.
Extending plasma reactor ionization chamber length is one of effective ways that increase reacting gas RT in ionization chamber, but is subject to high-purity large tracts of land Al 2o 3the restriction of dielectric layer making and flat narrow gap atmospheric non-equilibrium plasma reactor process technology, directly extending at present plasma reactor ionization chamber length also has difficulties, and can cause the atmospheric non-equilibrium plasma reactor volume excessive, cost improves, and reliability reduces.If the long ionization chamber of atmospheric non-equilibrium plasma reactor that will be longer is decomposed into 2 to 5 shorter ionization chambers, and the parallel stack of these ionization chambers is placed, simultaneously by the atmospheric non-equilibrium plasma reactor, flow-guiding structure being set, make reacting gas separate cavity by each successively, extend the RT of reacting gas in ionization chamber with this, promote the usefulness of plasma chemical reaction.In addition, added again the gas cooled structure at each between shorter ionization chamber, reacting gas temperature before entering next ionization cavity is reduced, solved plasma chemical reaction target product Yin Wendu and raise and the problem of decomposition, promoted the effect of plasma chemical reaction.Simultaneously, different ionization chambers both can adopt same excitation power supply power supply, also can adopt the powering mode of independent actuation, while adopting the powering mode of independent actuation, can make the discharge performance of each ionization chamber be optimized, also can regulate and control more easily the plasma chemical reaction process, realize different application demands.
Summary of the invention
The present invention has overcome the deficiency had now for the atmospheric non-equilibrium plasma reactor of plasma chemical reaction, and a kind of reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor is provided.The present invention is on conventional atmospheric dielectric barrier discharge nonequilibrium plasma reactor basis, by changing the composition structure of ionization chamber and cooling chamber, improve the reciprocating atmospheric non-equilibrium plasma generator that the method such as dielectric material property forms multiple ionization chamber and multistage gas cooled chamber, what the plasma chemical reaction of reacting gas was carried out is more abundant, promotes the generation usefulness of plasma chemical reaction target product.
Technical scheme of the present invention is:
A kind of reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor, comprise planar high voltage electrode, α-Al 2o 3dielectric layer, board joint ground electrode, unstrpped gas entrance, reaction gas outlet, sealed end assembly, cooling sap cavity, at least secondary nonequilibrium plasma ionization chamber and at least one order reaction gas cooled chamber.One-level nonequilibrium plasma ionization chamber and secondary nonequilibrium plasma ionization chamber be arranged in parallel, set up first order reaction gas cooled chamber between two ionization chambers, two ionization chambers and the cooling chamber two ends of parallel placement are equipped with the sealed end assembly, enter secondary nonequilibrium plasma ionization chamber by one-level nonequilibrium plasma ionization chamber via first order reaction gas cooled chamber for directing reaction gas, reciprocating flow of realization response gas in the atmospheric non-equilibrium plasma reactor.
Be positioned at two α-Al 2o 3the two sides of the planar high voltage electrode in the middle of dielectric layer covers respectively and α-Al 2o 3the contact-making surface of dielectric layer, wherein α-Al 2o 3dielectric layer purity is 96%~99%, and relative dielectric constant is 9~10, and thickness is 0.25~1.00mm, α-Al 2o 3the metal A g that the contact-making surface plating painting 0.05mm of dielectric layer and planar high voltage electrode is thick or the coating of Au, this coating edge is apart from α-Al 2o 3the dielectric layer edge leaves the insulation distance of 8~10mm, and metal A g or Au coating are connected well with the planar high voltage electrode; Board joint ground electrode and the α-Al that covers the planar high voltage electrode surface 2o 3form one-level nonequilibrium plasma ionization chamber and secondary nonequilibrium plasma ionization chamber between dielectric layer, ionization chamber discharging gap distance is controlled at 0.25~1.00mm, and error is no more than ± and 1%; Board joint ground electrode inside is provided with cooling sap cavity, and the cooling fluid operating temperature range is-10~5 ℃; Also be provided with first order reaction gas cooled chamber on the board joint ground electrode between cooling sap cavity, for implementing cooling to reacting gas, reacting gas cooling chamber gap is 0.25~1.00mm, at same plasma reactor reaction gases cooling chamber clearance distance, will be equal to or greater than ionization chamber discharging gap distance; During reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor work, unstrpped gas evenly enters one-level nonequilibrium plasma ionization chamber by the unstrpped gas entrance, enter first order reaction gas cooled chamber after plasma chemical reaction in one-level nonequilibrium plasma ionization chamber, enter secondary nonequilibrium plasma ionization chamber through supercooling is laggard, in secondary nonequilibrium plasma ionization chamber again after plasma chemical reaction, through reaction gas outlet export target product; One-level nonequilibrium plasma ionization chamber and secondary nonequilibrium plasma ionization chamber both can adopt same excitation power supply power supply, also can adopt independently excitation power supply by each ionization chamber, the output voltage range of excitation power supply is 2~10kV, and frequency range is 4~10kHz; Reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor operating air pressure is controlled at 90~110kPa; The main material that board joint ground electrode and housing adopt is aluminium or stainless steel.
In order to improve the concentration of target product, reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor also can be designed to the structural shape of 3-5 ionization chamber, a 2-4 cooling chamber.Reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor for three grades of ionization chambers and second order reaction gas cooled chamber are set, comprise planar high voltage electrode, α-Al 2o 3dielectric layer, board joint ground electrode, unstrpped gas entrance, reaction gas outlet, sealed end assembly, cooling sap cavity, one-level nonequilibrium plasma ionization chamber, secondary nonequilibrium plasma ionization chamber, three grades of nonequilibrium plasma ionization chambers, first order reaction gas cooled chamber, second order reaction gas cooled chamber.It is characterized in that: planar high voltage electrode two sides covers respectively α-Al 2o 3dielectric layer, wherein α-Al 2o 3dielectric layer purity is 96%~99%, and relative dielectric constant is 9~10, and thickness is 0.25~1.00mm, α-Al 2o 3the one side plating of dielectric layer and planar high voltage electrode contact is coated with thick metal A g or the Au of 0.05mm, and the coating edge is apart from α-Al 2o 3the dielectric layer edge leaves the insulation distance of 8~10mm, and metal A g or Au coating are connected well with the planar high voltage electrode, board joint ground electrode and the α-Al that covers the planar high voltage electrode surface 2o 3form one-level nonequilibrium plasma ionization chamber, secondary nonequilibrium plasma ionization chamber and three grades of nonequilibrium plasma ionization chambers between dielectric layer, ionization chamber discharging gap distance is 0.25~1.00mm, error is no more than ± and 1%, be provided with cooling sap cavity on the board joint ground electrode, the coolant temperature scope is-10~5 ℃, also be provided with first order reaction gas cooled chamber and second order reaction gas cooled chamber on the board joint ground electrode between cooling sap cavity, for implementing cooling to reacting gas, reacting gas cooling chamber gap is 0.25~1.00mm, at same plasma reactor reaction gases cooling chamber clearance distance, will be equal to or greater than ionization chamber discharging gap distance, during reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor work, unstrpped gas evenly enters one-level nonequilibrium plasma ionization chamber by the unstrpped gas entrance, enter first order reaction gas cooled chamber after plasma chemical reaction in one-level nonequilibrium plasma ionization chamber, enter secondary nonequilibrium plasma ionization chamber through supercooling is laggard, again after plasma chemical reaction, enter second order reaction gas cooled chamber in secondary nonequilibrium plasma ionization chamber, enter three grades of nonequilibrium plasma ionization chambers after cooling, after reacting in three grades of nonequilibrium plasma ionization chambers, target product through reaction gas outlet output high concentration, one-level nonequilibrium plasma ionization chamber, secondary nonequilibrium plasma ionization chamber and three grades of nonequilibrium plasma ionization chambers both can adopt same excitation power supply power supply, also can adopt independently excitation power supply by each ionization chamber, the output voltage range of excitation power supply is 2~10kV, and frequency range is 4~10kHz, reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor operating air pressure is controlled at 90~110kPa, the main material that board joint ground electrode and housing adopt is aluminium or stainless steel.
Reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor does not limit the unstrpped gas composition for the plasma chemical reaction purpose and composition, but can not have solid-state and liquid product to occur in the plasma chemistry product that requires to generate.Using oxygen or air during as unstrpped gas, and this reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor can be used as high concentration active oxygen radical generator and uses.
Effect of the present invention and benefit are due to the shuttle nonequilibrium plasma structure of reactor that replaces that adopts multiple ionization chamber, multistage cooling chamber, extended the RT of reacting gas in ionization chamber by multiple ionization on the one hand, what make plasma chemical reaction carry out is more abundant; Simultaneously, before adding the reacting gas cooling chamber to make reacting gas enter next ionization cavity between nonequilibrium plasma ionization chambers at different levels, temperature reduces, solve plasma chemical reaction target product Yin Wendu and raise and the problem of decomposition, promoted the effect of plasma chemical reaction; In addition, different ionization chambers both can adopt same excitation power supply power supply, also can adopt independently excitation power supply by each ionization chamber, while adopting the powering mode of independent actuation, can make the discharge performance of each ionization chamber be optimized, also can regulate and control more easily the plasma chemical reaction process, increase use flexibility and the control of atmospheric non-equilibrium plasma reactor, thereby meet the demand of different commercial Application.
The accompanying drawing explanation
Fig. 1 is the reciprocating many ionization chambers atmospheric non-equilibrium plasma structure of reactor schematic diagram that has two-stage ionization chamber and one-level cooling cavity structure.
Fig. 2 is the reciprocating many ionization chambers atmospheric non-equilibrium plasma structure of reactor schematic diagram that has three grades of ionization chambers and two-stage cooling cavity structure.
Fig. 3 be the reactor that only has the ionization chamber of one-level, the ionization chamber that has two-stage and one-level cooling cavity structure reactor and the cooling cavity structure that has the ionization chamber of three grades and two-stage reactor as the effect of oxygen plasma reactor relatively.
In figure: 1 planar high voltage electrode; 2 α-Al 2o 3dielectric layer; 3 board joint ground electrodes; 4 excitation power supplies; 5 unstrpped gas entrances; 6 reaction gas outlet; 7 sealed end assemblies; 8 cooling sap cavities; 9 one-level nonequilibrium plasma ionization chambers; 10 secondary nonequilibrium plasma ionization chambers; 11 3 grades of nonequilibrium plasma ionization chambers; 12 first order reaction gas cooled chambeies; 13 second order reaction gas cooled chambeies.
Embodiment
Describe the specific embodiment of the present invention in detail below in conjunction with technical scheme and accompanying drawing.
The first structural representation of reciprocating multi-electrode atmospheric non-equilibrium plasma reactor of the present invention as shown in Figure 1, this is the structural representation that has the reciprocating multi-electrode atmospheric non-equilibrium plasma reactor in two-stage nonequilibrium plasma ionization chamber and one-level gas cooled chamber, comprises planar high voltage electrode 1, α-Al 2o 3dielectric layer 2, board joint ground electrode 3, excitation power supply 4, unstrpped gas entrance 5, reaction gas outlet 6, sealed end assembly 7, cooling sap cavity 8, one-level nonequilibrium plasma ionization chamber 9, secondary nonequilibrium plasma ionization chamber 10, first order reaction gas cooled chamber 12.Structurally, one-level nonequilibrium plasma ionization chamber 9 and secondary nonequilibrium plasma ionization chamber 10 be arranged in parallel, set up first order reaction gas cooled chamber 12 between two ionization chambers, two ionization chambers and the cooling chamber two ends of parallel placement are equipped with sealed end assembly 7, enter secondary nonequilibrium plasma ionization chamber 10 by one-level nonequilibrium plasma ionization chamber 9 via first order reaction gas cooled chamber 12 for directing reaction gas, reciprocating flow of realization response gas in the atmospheric non-equilibrium plasma reactor.Planar high voltage electrode 1 two sides in this plasma reactor covers respectively α-Al 2o 3dielectric layer 2, wherein α-Al 2o 3dielectric layer 2 purity are 96%~99%, and relative dielectric constant is 9~10, and thickness is 0.25~1.00mm, α-Al 2o 3the one side plating that dielectric layer 2 contacts with planar high voltage electrode 1 is coated with thick metal A g or the Au of 0.05mm, and the coating edge is apart from α-Al 2o 3the dielectric layer edge leaves the insulation distance of 8~10mm, and metal A g or Au coating are connected well with the planar high voltage electrode; Board joint ground electrode 3 and the α-Al that covers planar high voltage electrode 1 surface 2o 3form one-level nonequilibrium plasma ionization chamber 9 and secondary nonequilibrium plasma ionization chamber 10 between dielectric layer 2, ionization chamber gap optimization distance is 0.25~1.00mm, error is no more than ± and 1%; Be provided with cooling sap cavity 8 on board joint ground electrode 3, the cooling fluid operating temperature range is-10~5 ℃; Also be provided with first order reaction gas cooled chamber 12 on board joint ground electrode 3 between cooling sap cavity 8, cooling for reacting gas is implemented, reacting gas cooling chamber gap is 0.25~1.00mm; During the work of the reciprocating multi-electrode atmospheric non-equilibrium plasma of this structure reactor, unstrpped gas evenly enters one-level nonequilibrium plasma ionization chamber 9 by unstrpped gas entrance 5, carry out the nonequilibrium plasma chemical reaction in ionization chamber after, enter first order reaction gas cooled chamber 12 at sealed end assembly 7 place's water conservancy diversion, through after cooling, by sealed end assembly 7 water conservancy diversion, entering secondary nonequilibrium plasma ionization chamber 10 again after plasma chemical reaction, through reaction gas outlet 6 export target products.The running parameter of described reciprocating multi-electrode atmospheric non-equilibrium plasma reactor is actuation voltage range 2~10kV, driving frequency 4~10kHz, operating air pressure 90~110kPa; Board joint ground electrode 3 adopts the 316L stainless steel.
The second structural representation of reciprocating multi-electrode atmospheric non-equilibrium plasma reactor of the present invention as shown in Figure 2, this is the structural representation that has the reciprocating multi-electrode atmospheric non-equilibrium plasma reactor of three grades of nonequilibrium plasma ionization chambers and two-stage gas cooling chamber, comprises planar high voltage electrode 1, α-Al 2o 3dielectric layer 2, board joint ground electrode 3, excitation power supply 4, unstrpped gas entrance 5, reaction gas outlet 6, sealed end assembly 7, cooling sap cavity 8, one-level nonequilibrium plasma ionization chamber 9, secondary nonequilibrium plasma ionization chamber 10, three grades of nonequilibrium plasma ionization chambers 11, first order reaction gas cooled chamber 12, second order reaction gas cooled chamber 13.Structurally, one-level nonequilibrium plasma ionization chamber 9, secondary nonequilibrium plasma ionization chamber 10 and three grades of nonequilibrium plasma ionization chambers 11 be arranged in parallel, set up first order reaction gas cooled chamber 12 and second order reaction gas cooled chamber 13 between three ionization chambers, three ionization chambers of parallel placement and two cooling chamber two ends are equipped with sealed end assembly 7, enter secondary nonequilibrium plasma ionization chamber 10 by one-level nonequilibrium plasma ionization chamber 9 via first order reaction gas cooled chamber 12 for directing reaction gas, enter three grades of nonequilibrium plasma ionization chambers 11 via second order reaction gas cooled chamber 13 again, reciprocating flow of realization response gas in the atmospheric non-equilibrium plasma reactor.Planar high voltage electrode 1 two sides in this plasma reactor covers respectively α-Al 2o 3dielectric layer 2, wherein α-Al 2o 3dielectric layer 2 purity are 96%~99%, and relative dielectric constant is 9~10, and thickness is 0.25~1.00mm, α-Al 2o 3the one side plating that dielectric layer 2 contacts with planar high voltage electrode 1 is coated with thick metal A g or the Au of 0.05mm, and the coating edge is apart from α-Al 2o 3the dielectric layer edge leaves the insulation distance of 8~10mm, and metal A g or Au coating are connected well with the planar high voltage electrode, board joint ground electrode 3 and the α-Al that covers planar high voltage electrode 1 surface 2o 3form one-level nonequilibrium plasma ionization chamber 9, secondary nonequilibrium plasma ionization chamber 10 and three grades of nonequilibrium plasma ionization chambers 11 between dielectric layer 2, ionization chamber gap optimization is apart from being 0.25~1.00mm, error is no more than ± and 1%, be provided with cooling sap cavity 8 on board joint ground electrode 3, the cooling fluid operating temperature range is-10~5 ℃, also be provided with first order reaction gas cooled chamber 12 and second order reaction gas cooled chamber 13 on board joint ground electrode 3 between cooling sap cavity 8, cooling for reacting gas is implemented, reacting gas cooling chamber gap is 0.25~1.00mm, during the work of the reciprocating multi-electrode atmospheric non-equilibrium plasma of this structure reactor, unstrpped gas evenly enters one-level nonequilibrium plasma ionization chamber 9 by unstrpped gas entrance 5, carry out the nonequilibrium plasma chemical reaction in ionization chamber after, enter first order reaction gas cooled chamber 12 at sealed end assembly 7 place's water conservancy diversion, enter secondary nonequilibrium plasma ionization chamber 10 by sealed end assembly 7 water conservancy diversion after cooling, again after plasma chemical reaction, by sealed end assembly 7 water conservancy diversion, enter second order reaction gas cooled chamber 13, finally enter three grades of nonequilibrium plasma ionization chambers 11 by sealed end assembly 7 water conservancy diversion again and carry out plasma chemical reaction for the third time, finally by reaction gas outlet 6 export target products, the running parameter of described reciprocating multi-electrode atmospheric non-equilibrium plasma reactor is actuation voltage range 2~10kV, driving frequency 4~10kHz, and operating air pressure 90~110kPa, board joint ground electrode 3 adopts the 316L stainless steel.
Accompanying drawing 3 be the reactor that only has the ionization chamber of one-level, the ionization chamber that has two-stage and one-level cooling cavity structure reactor and the cooling cavity structure that has the ionization chamber of three grades and two-stage reactor as the effect of oxygen plasma reactor relatively.Relatively, unstrpped gas is oxygen, and when flow is 3L/min, than the reactor that has the first stage ionization chamber, the reactor that has the cooling cavity structure of the ionization chamber of two-stage and one-level is produced O 3concentration has increased by 42.2%, and the reactor that has the cooling cavity structure of the ionization chamber of three grades and two-stage is produced O 3concentration has increased by 55.4%; When flow is 9L/min, than the reactor that has the first stage ionization chamber, the reactor that has the cooling cavity structure of the ionization chamber of two-stage and one-level is produced O 3concentration has increased by 69.4%, and the reactor that has the cooling cavity structure of the ionization chamber of three grades and two-stage is produced O 3concentration has increased by 115.7%.
The present invention adopts the atmospheric non-equilibrium plasma reactor project organization of multiple ionization chamber, multistage cooling chamber, through nonequilibrium plasma chemical reaction repeatedly with gas-cooledly replace reciprocating operation, what plasma chemical reaction was carried out is more abundant, and make the unstrpped gas temperature be unlikely to too high and affect the effect of plasma chemical reaction, solve plasma chemical reaction target product Yin Wendu and raise and the problem of decomposition, effectively raised the chemical reactivity of atmospheric non-equilibrium plasma reactor; In addition, different ionization chambers both can adopt same excitation power supply power supply, also can adopt independently excitation power supply by each ionization chamber, adopt independently excitation power supply can regulate more easily the plasma chemical reaction process, increase use flexibility and the control of atmospheric non-equilibrium plasma reactor, thereby met the demand of different commercial Application.

Claims (4)

1. reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor, comprise planar high voltage electrode (1), α-Al 2o 3dielectric layer (2), board joint ground electrode (3), unstrpped gas entrance (5), reaction gas outlet (6), sealed end assembly (7), cooling sap cavity (8), at least secondary nonequilibrium plasma ionization chamber, at least one order reaction gas cooled chamber (12) is characterized in that:
Unstrpped gas entrance (5) connects one-level nonequilibrium plasma ionization chamber (9), one-level nonequilibrium plasma ionization chamber and secondary nonequilibrium plasma ionization chamber be arranged in parallel, set up first order reaction gas cooled sap cavity (12) between two ionization chambers, two ionization chambers of parallel placement and cooling sap cavity (8) two ends are equipped with sealed end assembly (7), for directing reaction gas, by one-level nonequilibrium plasma ionization chamber, via first order reaction gas cooled chamber, enter secondary nonequilibrium plasma ionization chamber (10);
Planar high voltage electrode (1) two sides covers respectively α-Al 2o 3dielectric layer (2), α-Al 2o 3the one side plating that dielectric layer (2) contacts with planar high voltage electrode (1) is coated with thick metal A g or the Au of 0.05mm, and the coating edge is apart from α-Al 2o 3dielectric layer (2) edge leaves the insulation distance of 8~10mm, and metal A g or Au coating are connected with planar high voltage electrode (1) conduction; Board joint ground electrode (3) and the α-Al that covers planar high voltage electrode (1) surface 2o 3form one-level nonequilibrium plasma ionization chamber (9) and secondary nonequilibrium plasma ionization chamber (10) between dielectric layer (2); Be provided with cooling sap cavity (8) on board joint ground electrode (3); The upper first order reaction gas cooled chamber (12) that also is provided with between cooling sap cavity (8) of board joint ground electrode (3), gap, first order reaction gas cooled chamber (12) is 0.25~1.00mm, at same plasma reactor reaction gases cooling chamber clearance distance, is equal to or greater than ionization chamber discharging gap distance;
For the excitation power supply of one-level nonequilibrium plasma ionization chamber (9) and secondary nonequilibrium plasma ionization chamber (10), its output voltage range is 2~10kV, and frequency range is 4~10kHz; Reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor operating air pressure is controlled at 90~110kPa.
2. a kind of reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor according to claim 1, it is characterized in that: described α-Al2O3 dielectric layer (2) purity is 96%~99%, relative dielectric constant is 9~10, and thickness is 0.25~1.00mm.
3. a kind of reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor according to claim 1 and 2 is characterized in that: described ionization chamber discharging gap distance is 0.25~1.00mm.
4. reciprocating many ionization chambers atmospheric non-equilibrium plasma reactor is characterized in that: the material that board joint ground electrode (3) and housing adopt is aluminium or stainless steel.
CN2013103764686A 2013-08-24 2013-08-24 Reciprocating type multi-ionization-cavity atmospheric-pressure unbalance plasma reactor Pending CN103442509A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104202897A (en) * 2014-09-02 2014-12-10 中国工程物理研究院流体物理研究所 DBD (Dielectric Barrier Discharge) low temperature plasma generating device and polymer film surface treatment method
CN105066271A (en) * 2015-08-12 2015-11-18 无锡伦宝环保科技有限公司 Multi-ion-field indoor air purifier
CN107001033A (en) * 2014-09-30 2017-08-01 普拉斯科转换技术有限公司 A kind of nonequilibrium plasma system and method for refining synthesis gas
CN107267957A (en) * 2017-06-28 2017-10-20 武汉华星光电技术有限公司 A kind of device and chemical gaseous phase depositing process for chemical vapor deposition
CN109351300A (en) * 2018-11-14 2019-02-19 中国人民解放军空军工程大学 A kind of series plasma cracking flow reactor and its operating method
CN110708851A (en) * 2019-09-29 2020-01-17 上海交通大学 Large-gap uniform dielectric barrier discharge plasma surface treatment device under atmospheric pressure
CN114040558A (en) * 2021-11-09 2022-02-11 中国农业大学 Plasma generator

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2521868Y (en) * 2001-11-02 2002-11-20 朱益民 Multiple micro-discharge cooperative intergrated discharging apparatus
US20030007907A1 (en) * 2001-04-02 2003-01-09 Nelson David Emil Non-thermal plasma reactor substrate design-E-shape with low loss electrode pattern
GB2424379A (en) * 2005-02-04 2006-09-27 Accentus Plc Gas reactor electrode connections
WO2009069204A1 (en) * 2007-11-28 2009-06-04 Toshiba Mitsubishi-Electric Industrial Systems Corporation Dielectric barrier discharging device
CN101573467A (en) * 2006-07-31 2009-11-04 泰克纳等离子***公司 Plasma surface treatment using dielectric barrier discharges
US20100068104A1 (en) * 2006-05-04 2010-03-18 Seock Joon Kim Flat-Type Non-Thermal Plasma Reactor
CN102149247A (en) * 2011-04-08 2011-08-10 东南大学 Device and method for generating low-energy high-density plasma by multi-level ionization
CN102333411A (en) * 2011-09-19 2012-01-25 大连海事大学 Partitioned energizing atmospheric-pressure non-equilibrium plasma generator
WO2012044875A1 (en) * 2010-10-01 2012-04-05 Old Dominion University Research Foundation Method for scaling plasma reactors for gas treatment and devices therefrom
CN102427653A (en) * 2011-09-19 2012-04-25 大连海事大学 Atmospheric non-equilibrium plasma source for introducing mini-glow discharge mode

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030007907A1 (en) * 2001-04-02 2003-01-09 Nelson David Emil Non-thermal plasma reactor substrate design-E-shape with low loss electrode pattern
CN2521868Y (en) * 2001-11-02 2002-11-20 朱益民 Multiple micro-discharge cooperative intergrated discharging apparatus
GB2424379A (en) * 2005-02-04 2006-09-27 Accentus Plc Gas reactor electrode connections
US20100068104A1 (en) * 2006-05-04 2010-03-18 Seock Joon Kim Flat-Type Non-Thermal Plasma Reactor
CN101573467A (en) * 2006-07-31 2009-11-04 泰克纳等离子***公司 Plasma surface treatment using dielectric barrier discharges
WO2009069204A1 (en) * 2007-11-28 2009-06-04 Toshiba Mitsubishi-Electric Industrial Systems Corporation Dielectric barrier discharging device
WO2012044875A1 (en) * 2010-10-01 2012-04-05 Old Dominion University Research Foundation Method for scaling plasma reactors for gas treatment and devices therefrom
CN102149247A (en) * 2011-04-08 2011-08-10 东南大学 Device and method for generating low-energy high-density plasma by multi-level ionization
CN102333411A (en) * 2011-09-19 2012-01-25 大连海事大学 Partitioned energizing atmospheric-pressure non-equilibrium plasma generator
CN102427653A (en) * 2011-09-19 2012-04-25 大连海事大学 Atmospheric non-equilibrium plasma source for introducing mini-glow discharge mode

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104202897A (en) * 2014-09-02 2014-12-10 中国工程物理研究院流体物理研究所 DBD (Dielectric Barrier Discharge) low temperature plasma generating device and polymer film surface treatment method
CN104202897B (en) * 2014-09-02 2017-01-11 中国工程物理研究院流体物理研究所 DBD (Dielectric Barrier Discharge) low temperature plasma generating device and polymer film surface treatment method
CN107001033A (en) * 2014-09-30 2017-08-01 普拉斯科转换技术有限公司 A kind of nonequilibrium plasma system and method for refining synthesis gas
CN107001033B (en) * 2014-09-30 2020-07-10 普拉斯科转换技术有限公司 Non-equilibrium plasma system and method for refining synthesis gas
CN105066271A (en) * 2015-08-12 2015-11-18 无锡伦宝环保科技有限公司 Multi-ion-field indoor air purifier
CN107267957A (en) * 2017-06-28 2017-10-20 武汉华星光电技术有限公司 A kind of device and chemical gaseous phase depositing process for chemical vapor deposition
CN109351300A (en) * 2018-11-14 2019-02-19 中国人民解放军空军工程大学 A kind of series plasma cracking flow reactor and its operating method
CN110708851A (en) * 2019-09-29 2020-01-17 上海交通大学 Large-gap uniform dielectric barrier discharge plasma surface treatment device under atmospheric pressure
CN114040558A (en) * 2021-11-09 2022-02-11 中国农业大学 Plasma generator
CN114040558B (en) * 2021-11-09 2023-03-14 中国农业大学 Plasma generator

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Application publication date: 20131211