CN114040558B - Plasma generator - Google Patents
Plasma generator Download PDFInfo
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- CN114040558B CN114040558B CN202111322560.5A CN202111322560A CN114040558B CN 114040558 B CN114040558 B CN 114040558B CN 202111322560 A CN202111322560 A CN 202111322560A CN 114040558 B CN114040558 B CN 114040558B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
Abstract
The present invention provides a plasma generating apparatus, comprising: the liquid passing pipeline, the shell and the ionization mechanism; the liquid inlet pipeline is used for introducing liquid to be ionized; the liquid passing pipeline is arranged in the shell, a cavity is formed between the outer side wall of the liquid passing pipeline and the inner side wall of the shell, and the cavity is used for introducing gas to be ionized; the liquid passing pipeline can be selectively communicated with or blocked from the chamber; wherein, the chamber is also used for placing the object to be processed; the ionization mechanism is used for ionizing the liquid to be ionized and/or the gas to be ionized to obtain plasma, and the plasma is used for acting on the liquid to be ionized and/or the object to be treated. The invention improves the utilization rate of the plasma by fully utilizing the properties of the charged ions with different electric properties in the plasma.
Description
Technical Field
The invention relates to the technical field of plasmas, in particular to a plasma generating device.
Background
The plasma is an ionized gas substance consisting of positive ions, negative ions and the like, is electrically neutral as a whole, and can generate a series of chemical reactions and physical reactions when the plasma is contacted with an object to be treated, so that the plasma can be widely applied to a plurality of fields of metal smelting, etching, low-temperature sterilization, pollution treatment and the like.
The conventional plasma is mainly obtained in an ionization mode, a large number of positive and negative ions and other components are generated in the ionization process, different components have different attributes, and in a specific application field, the plasma components playing main roles are different aiming at different processing objects, namely only part of the components in the plasma can play roles, so that the overall utilization rate of each component in the plasma is not high.
Disclosure of Invention
The invention provides a plasma generating device, which is used for solving or improving the problem that the overall utilization rate of plasma is not high because the plasma obtained by ionization cannot be fully utilized in the process of applying the existing plasma to sewage treatment.
The present invention provides a plasma generating apparatus, comprising: the liquid introducing pipeline is used for introducing liquid to be ionized; the liquid passing pipeline is arranged in the shell, a cavity is formed between the outer side wall of the liquid passing pipeline and the inner side wall of the shell, and the cavity is used for introducing gas to be ionized; the liquid passing pipeline can be selectively communicated with or blocked from the chamber; wherein, the chamber is also used for placing the object to be processed; the ionization mechanism is used for ionizing the liquid to be ionized and/or the gas to be ionized to obtain plasma, and the plasma is used for acting on the liquid to be ionized and/or the object to be treated.
According to the plasma generating device provided by the invention, the liquid passing pipeline comprises an insulating water tank and an insulating cover plate; the insulating cover plate is covered on the notch of the insulating water tank, and at least one through hole is formed in the insulating cover plate and can be selectively opened or closed; the insulating water tank is internally used for introducing the liquid to be ionized, and one side of the insulating cover plate, which is far away from the insulating water tank, is used for placing the object to be treated.
According to the plasma generating device provided by the invention, a stirring device is arranged in the insulating water tank and is used for stirring the liquid to be ionized.
According to the plasma generating device provided by the invention, the ionization mechanism comprises a first electrode and a second electrode; the first electrode and the second electrode are oppositely arranged in the cavity at intervals, the first electrode is connected with the shell, the second electrode is movably connected with the shell, and the insulating water tank is arranged between the first electrode and the second electrode; the first electrode is used for being grounded, and the second electrode is used for being electrically connected with power supply equipment.
According to the plasma generating device provided by the invention, the ionization mechanism further comprises a telescopic adjusting device; the fixed end of the telescopic adjusting device is connected with the shell, and the telescopic end of the telescopic adjusting device is connected with the second electrode; or the fixed end of the telescopic adjusting device is connected with the second electrode, and the telescopic end of the telescopic adjusting device is connected with the shell.
According to the present invention, there is provided a plasma generating apparatus, further comprising: a gas supply device; one end of the liquid passing pipeline is provided with a gas inlet, the other end of the liquid passing pipeline is provided with a gas outlet, the gas inlet is communicated with the gas supply device, and the gas outlet is communicated with the atmospheric environment; and the gas supply device is used for conveying the gas to be ionized into the liquid through pipeline.
According to the present invention, there is provided a plasma generating apparatus, further comprising: a liquid circulation device; the liquid circulation device is communicated with the liquid passing pipeline and is used for conveying the liquid to be ionized into the liquid passing pipeline.
According to the present invention, there is provided a plasma generating apparatus, said liquid circulating apparatus comprising: the system comprises a first water tank, a first water pump, a second water tank, a second water pump and a control valve; a liquid inlet is formed in one end of the liquid flowing pipeline, and a liquid outlet is formed in the other end of the liquid flowing pipeline; the water outlet of the first water tank is communicated with the water inlet of the first water pump, the water outlet of the first water pump is communicated with the liquid inlet, the liquid outlet is communicated with the water inlet of the second water tank, the water outlet of the second water tank is communicated with the water inlet of the second water pump, and the water outlet of the second water pump is communicated with the water inlet of the first water tank; the control valve is arranged at the liquid outlet and is used for controlling the liquid flow of the liquid outlet.
According to the present invention, there is provided a plasma generating apparatus, further comprising: a detection device; the detection device comprises a liquid level sensor, a flow sensor, a temperature sensor, a PH value sensor and an ozone concentration sensor; the liquid level sensor is arranged in the first water tank, the flow sensor is arranged on the liquid inlet, the temperature sensor and the PH value sensor are arranged in the second water tank, and the ozone concentration sensor is arranged on the air outlet.
According to the present invention, there is provided a plasma generating apparatus, further comprising: a control device; the detection device is in communication connection with the control device, and the control device is in communication connection with the gas supply device, the liquid circulation device and the ionization mechanism respectively.
The plasma generating device provided by the invention is provided with the ionization mechanism, the ionization mechanism can singly ionize the liquid to be ionized or the gas to be ionized, and the ionization mechanism can also ionize the liquid to be ionized and the gas to be ionized simultaneously.
When the liquid to be ionized is singly ionized, the liquid to be ionized is introduced into the liquid passing pipeline, the ionization mechanism carries out ionization operation on the liquid to be ionized, so that plasma is obtained, the liquid passing pipeline is communicated with the cavity, charged ions with different electric properties in the plasma can act on the liquid to be ionized and can also act on an object to be processed, wherein the object to be processed is solid, the process that the plasma acts on the liquid to be ionized can be regarded as wet processing, and the process that the plasma acts on the object to be processed can be regarded as dry processing.
When the gas to be ionized is ionized independently, the gas to be ionized is introduced into the cavity, the gas to be ionized is ionized by the ionization mechanism 3, and therefore plasma is obtained, at the moment, the plasma only acts on the object to be processed, and the plasma is equivalent to only dry processing.
When the liquid to be ionized and the gas to be ionized are ionized simultaneously, the liquid to be ionized is introduced into the liquid introduction pipeline, the gas to be ionized is introduced into the chamber, the ionization mechanism carries out ionization operation on the liquid to be ionized and the gas to be ionized, and therefore plasma is obtained; the liquid passing pipeline can be blocked from the cavity, so that the plasma obtained from the liquid to be ionized can only act on the liquid to be ionized, the plasma obtained from the gas to be ionized can only act on the object to be treated, and the dry treatment and the wet treatment are not interfered with each other.
The embodiment improves the overall utilization rate of the plasma obtained by ionization by acting the plasma on the liquid to be ionized and the object to be treated so as to fully utilize the properties of charged ions with different electric properties in the plasma.
Drawings
In order to more clearly illustrate the technical solutions of the present invention or the prior art, the drawings needed for the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and those skilled in the art can also obtain other drawings according to the drawings without creative efforts.
FIG. 1 is a schematic structural diagram of a plasma generator according to the present invention;
FIG. 2 is a block diagram of a control structure of the control device according to the present invention;
FIG. 3 is a schematic control flow diagram of the control device provided by the present invention;
reference numerals:
1: a liquid pipeline; 11: an insulating water tank; 111: a stirring device;
12: an insulating cover plate; 121: a through hole; 2: a housing;
3: an ionization mechanism; 31: a first electrode; 32: a second electrode;
321: an insulating medium; 33: a telescopic adjusting device; 34: a power supply device;
4: a fan; 5: a liquid circulation device; 51: a first water tank;
52: a first water pump; 53: a second water tank; 54: a second water pump;
55: a control valve; 6: a detection device; 61: a liquid level sensor;
62: a flow sensor; 63: a temperature sensor; 64: a pH value sensor;
65: an ozone concentration sensor; 71: a main controller; 72: a touch display screen;
8: and a frequency converter.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings, and it is obvious that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the embodiments of the present invention, it should be noted that the terms "central", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the embodiments of the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the embodiments of the present invention, it should be noted that the terms "connected" and "connected" are to be interpreted broadly, and may be, for example, a fixed connection, a detachable connection, or an integral connection, unless explicitly stated or limited otherwise; can be mechanically or electrically connected; may be directly connected or indirectly connected through an intermediate. Specific meanings of the above terms in the embodiments of the present invention may be understood as specific cases by those of ordinary skill in the art.
A plasma generation device provided by the present invention is described below with reference to fig. 1 to 3.
As shown in fig. 1, a plasma generating apparatus according to the present embodiment includes: liquid flowing pipeline 1, shell 2 and ionization mechanism 3.
The liquid inlet pipeline 1 is used for introducing liquid to be ionized; the liquid passing pipeline 1 is arranged in the shell 2, a cavity is formed between the outer side wall of the liquid passing pipeline 1 and the inner side wall of the shell 2, and the cavity is used for introducing gas to be ionized; the liquid through pipeline 1 can be selectively communicated with or blocked from the chamber; wherein, the chamber is also used for placing the object to be processed; the ionization mechanism 3 is used for ionizing the liquid to be ionized and/or the gas to be ionized to obtain plasma, and the plasma is used for acting on the liquid to be ionized and/or the object to be treated.
Specifically, in the plasma generating apparatus shown in this embodiment, by providing the ionization mechanism 3, the ionization mechanism 3 can ionize the liquid to be ionized or the gas to be ionized separately, and the ionization mechanism 3 can also ionize the liquid to be ionized and the gas to be ionized simultaneously.
When the liquid to be ionized is singly ionized, the liquid to be ionized is introduced into the liquid passing pipeline 1, the ionization operation is carried out on the liquid to be ionized by the ionization mechanism 3, so that plasma is obtained, the liquid passing pipeline 1 is communicated with the cavity, charged ions with different electric properties in the plasma can act on the liquid to be ionized and can also act on an object to be processed, wherein the object to be processed is solid, the process that the plasma acts on the liquid to be ionized can be regarded as wet processing, and the process that the plasma acts on the object to be processed can be regarded as dry processing.
When the gas to be ionized is ionized independently, the gas to be ionized is introduced into the cavity, the gas to be ionized is ionized by the ionization mechanism 3, and therefore plasma is obtained, at the moment, the plasma only acts on the object to be processed, which is equivalent to only dry processing.
When the liquid to be ionized and the gas to be ionized are ionized simultaneously, the liquid to be ionized is introduced into the liquid introducing pipeline 1, the gas to be ionized is introduced into the chamber, the ionization mechanism 3 carries out ionization operation on the liquid to be ionized and the gas to be ionized, and therefore plasma is obtained, the liquid introducing pipeline 1 can be communicated with the chamber in the ionization process, and the plasma can act on the liquid to be ionized and the object to be processed simultaneously; and the liquid passing pipeline can be blocked from the cavity, so that the plasma obtained from the liquid to be ionized can only act on the liquid to be ionized, and the plasma obtained from the gas to be ionized can only act on the object to be treated, thereby realizing that dry treatment and wet treatment are not interfered with each other.
The embodiment improves the overall utilization rate of the ionized plasma by acting the plasma on the liquid to be ionized and the object to be treated so as to fully utilize the properties of charged ions with different electric properties in the plasma.
It should be noted that the liquid to be ionized shown in this embodiment may be sewage, the gas to be ionized may be air, and the object to be treated may be seeds or fruits and vegetables; when the sewage and the air are ionized, various positive ions, negative ions and neutral ions can be obtained, and ions with different electric properties have different properties, for example, ozone obtained by ionization has oxidability, and when the ozone acts on the sewage, the ozone can oxidize organic matters in the sewage, so that the sewage can be sterilized; ozone and hydrogen peroxide obtained by ionizing sewage can enter the cavity and act on the surfaces of seeds or fruits and vegetables, so that the surfaces of the seeds or fruits and vegetables are sterilized, and oxygen generated by decomposing the ozone and the hydrogen peroxide can be used for the seeds or fruits and vegetables to breathe; hydroxyl ions obtained by ionization can be combined with hydrogen ions in the sewage, so that the acidity of the sewage is neutralized; active oxygen, active nitrogen and other active particles generated by ionizing sewage and air can keep fruits and vegetables fresh and activate aged seeds, and in the process of activating the seeds, electric arcs generated by an ionization mechanism are used for breaking the epidermis of the seeds, so that the combination of the active particles and the seeds is promoted. The plasma obtained by ionization in the embodiment can be used for treating sewage, can also be used for carrying out fresh-keeping and sterilization treatment on fruits and vegetables, and can also be used for promoting the activation and germination of seeds.
The ionization principle of the ionization mechanism 3 is that high-voltage electricity is acted on the liquid to be ionized or the gas to be ionized, and the product obtained when the high-voltage electricity breaks down the liquid to be ionized or the gas to be ionized is plasma.
Preferably, as shown in fig. 1, the liquid passing pipe 1 shown in the present embodiment includes an insulating water tank 11 and an insulating cover plate 12; the insulating cover plate 12 is covered on the notch of the insulating water tank 11, at least one through hole 121 is formed in the insulating cover plate 12, and the through hole 121 can be selectively opened or closed; the insulating water tank 11 is used for introducing liquid to be ionized, and one side of the insulating cover plate 12, which is far away from the insulating water tank 11, is used for placing objects to be treated.
Specifically, the insulating cover plate 12 shown in this embodiment closes the opening of the insulating water tank 11, so that the inside of the insulating water tank 11 and the cavity are two relatively independent spaces, when the through hole on the insulating cover plate 12 is opened, the insulating water tank 11 is communicated with the cavity, and plasma obtained by ionizing sewage can enter the cavity through the through hole 121 and act on seeds or fruits; when the through holes 121 on the insulating cover 12 are closed, the plasma obtained by ionization of the contaminated water only acts on the contaminated water, and the plasma obtained by ionization of the air only acts on the seeds or fruits.
The insulating cover plate 12 and the insulating water tank 11 are made of quartz.
Preferably, as shown in fig. 1, a stirring device 111 is disposed in the insulating water tank 11 shown in this embodiment, and the stirring device 111 is used for stirring the liquid to be ionized.
Specifically, because contain various particulate matters in the sewage, thereby for preventing that the particulate matter from deposiing the tank bottom of insulating basin 11 influences the ionization of sewage and the effect of treating pollution of plasma, through setting up agitating unit 111, sewage is under agitating unit 111's stirring effect for sewage fully ionizes, and can fully contact with plasma, has promoted the treatment effeciency of sewage.
It should be noted that the stirring device 111 shown in the present embodiment includes a stirring blade and a motor, the motor drives the stirring blade to rotate, and the stirring blade can repeatedly stir the sewage in the rotating process.
Preferably, as shown in fig. 1, the ionization mechanism 3 shown in this embodiment includes a first electrode 31 and a second electrode 32; the first electrode 31 and the second electrode 32 are oppositely arranged in the cavity at intervals, the first electrode 31 is connected with the shell 2, the second electrode 32 is movably connected with the shell 2, and the insulating water tank 11 is arranged between the first electrode 31 and the second electrode 32; the first electrode 31 is used for grounding, and the second electrode 32 is used for electrically connecting with the power supply device 34.
Specifically, when the second electrode 32 shown in this embodiment is connected with high voltage, an arc is formed between the first electrode 31 and the second electrode 32, and the arc can break down air in the chamber and sewage in the insulating water tank 11; meanwhile, the second electrode 32 can be moved, so that the distance between the second electrode 32 and the first electrode 31 can be adjusted to adapt to ionization scenes under different voltage conditions, and the safety of operators near the shell 2 is ensured by grounding the first electrode 31. The material of the housing 2 may be insulating plastic or insulating rubber.
It should be noted that the movable connection manner of the second electrode 32 and the housing 2 includes that the housing 2 is provided with a sliding slot, and the second electrode 32 can slide in the sliding slot; alternatively, a telescopic rod is provided between the second electrode 32 and the housing 2, and the extension and retraction of the telescopic rod realizes the movement of the second electrode 32.
Further, as shown in fig. 1, the ionization mechanism 3 of the present embodiment further includes a telescopic adjustment device 33; the fixed end of the telescopic adjusting device 33 is connected with the shell 2, and the telescopic end of the telescopic adjusting device 33 is connected with the second electrode 32; alternatively, the fixed end of the telescopic adjusting device 33 is connected to the second electrode 32, and the telescopic end of the telescopic adjusting device 33 is connected to the housing 2.
Specifically, the telescopic adjustment device 33 shown in the present embodiment may be a telescopic rod, and the adjustment of the distance between the first electrode 31 and the second electrode 32 can be realized by controlling the extension and retraction of the telescopic rod.
As shown in fig. 1, an insulating medium 321 is further disposed on the second electrode 32 shown in this embodiment, and the insulating medium 321 is disposed on a side of the second electrode 32 close to the first electrode 31.
Preferably, as shown in fig. 1, the plasma generation device shown in the present embodiment further includes: a gas supply device; one end of the liquid passing pipeline 1 is provided with an air inlet, the other end of the liquid passing pipeline 1 is provided with an air outlet, the air inlet is communicated with an air supply device, and the air outlet is communicated with the atmospheric environment; the gas supply device is used for conveying gas to be ionized into the liquid flowing pipeline 1.
Specifically, the air feeder that this embodiment shows can be fan 4, and fan 4 sends into the liquid pipeline with certain speed with the air in, and the solubility of plasma in sewage can be improved in the flow of air to make plasma and sewage fully contact, and then promote the treatment effeciency of sewage. Wherein, under the condition of leading to liquid pipeline 1 and cavity intercommunication, fan 4 can also be for the cavity transport air through leading to the liquid pipeline to guarantee to have sufficient air in the cavity to be used for carrying out the ionization operation.
Preferably, as shown in fig. 1, the plasma generation device shown in the present embodiment further includes a liquid circulation device 5; the liquid circulation device 5 is communicated with the liquid passing pipeline 1, and the liquid circulation device 5 is used for circularly conveying the liquid to be ionized into the liquid passing pipeline 1.
Specifically, the liquid circulation device 5 shown in the present embodiment is used for circularly conveying sewage into the liquid through pipe 1, so that sewage can be repeatedly and circularly treated, and the treatment effect of sewage treatment is ensured.
In a preferred embodiment, as shown in fig. 1, the liquid circulation device 5 of the present embodiment includes: a first water tank 51, a first water pump 52, a second water tank 53, a second water pump 54, and a control valve 55; one end of the liquid pipeline 1 is provided with a liquid inlet, and the other end of the liquid pipeline 1 is provided with a liquid outlet; the water outlet of the first water tank 51 is communicated with the water inlet of the first water pump 52, the water outlet of the first water pump 52 is communicated with the liquid inlet, the liquid outlet is communicated with the water inlet of the second water tank 53, the water outlet of the second water tank 53 is communicated with the water inlet of the second water pump 54, and the water outlet of the second water pump 54 is communicated with the water inlet of the first water tank 51; the control valve 55 is disposed at the liquid outlet, and the control valve 55 is used for controlling the liquid flow of the liquid outlet.
Specifically, the first water pump 52 pumps the sewage in the first water tank 51 into the liquid passing pipeline 1, the treated sewage flows into the second water tank 53 through the control valve 55, the sewage in the second water tank 53 can be returned to the first water tank 51 again under the pumping action of the second water pump 54, and the sewage is circulated by the first water pump and the second water pump, so that the sewage is repeatedly circulated and treated, and the treatment effect of sewage treatment is ensured. Meanwhile, the opening degree of the liquid outlet is controlled through the control valve 55 to realize the control of the liquid flow of the liquid outlet, so that the liquid level of the sewage in the liquid pipeline 1 can be kept in a constant state, the sewage in the first water tank 51 and the sewage in the second water tank 53 are always kept in dynamic balance, and the running stability of the liquid circulating device 5 is improved.
Preferably, as shown in fig. 1, the plasma generating device shown in the present embodiment further comprises a detecting device 6; the detection device 6 comprises a liquid level sensor 61, a flow sensor 62, a temperature sensor 63, a PH value sensor 64 and an ozone concentration sensor 65; the liquid level sensor 61 is arranged in the first water tank 51, the flow sensor 62 is arranged in the liquid inlet, the temperature sensor 63 and the PH value sensor 64 are arranged in the second water tank 53, and the ozone concentration sensor 65 is arranged in the air outlet.
Specifically, the liquid level sensor 61 shown in the present embodiment is used to detect the liquid level of the sewage in the first water tank 51; the flow sensor 62 is used for detecting the liquid flow at the liquid inlet; the temperature sensor 63 is used for detecting the temperature of the treated sewage in the second water tank 53, and the PH sensor 64 is used for detecting the PH of the treated sewage in the second water tank 53; the ozone concentration sensor 65 detects the ozone concentration at the air outlet.
Preferably, the plasma generating apparatus shown in this embodiment further comprises a control device; the detection device 6 is in communication connection with the control device, and the control device is in communication connection with the gas supply device and the liquid circulation device 5 respectively.
Specifically, the liquid level sensor 61, the flow sensor 62, the temperature sensor 63, the PH sensor 64 and the ozone concentration sensor 65 shown in this embodiment are respectively in communication connection with the control device, the liquid level sensor 61, the flow sensor 62, the temperature sensor 63, the PH sensor 64 and the ozone concentration sensor 65 send detected parameters to the control device, and the control device correspondingly controls the operation state of the first water pump 52, the operation state of the second water pump 54, the operation state of the control valve 55, the operation state of the fan 4 and the operation state of the ionization mechanism 3.
Preferably, as shown in fig. 2, the control device of the present embodiment includes a main controller 71 and a touch display screen 72, the touch display screen 72 is used for displaying the parameters detected by the detecting device 6, the operating parameters of the gas supply device, the operating parameters of the liquid circulation device 5 and the operating parameters of the ionization mechanism 3, and an operator can manually input the operating parameters of the gas supply device, the operating parameters of the liquid circulation device 5 and the operating parameters of the ionization mechanism 3 on the touch display screen 72.
Specifically, the main controller 71 is in serial communication with the detection device 6 and the touch display screen 72 respectively, the main controller 71 can control the first water pump 52 and the second water pump 54 to operate at power frequency through a relay, and the main controller 71 can also control the first water pump 52 and the second water pump 54 to operate at variable frequency through the frequency converter 8; the main controller 71 can control the gas supply device to operate in a variable frequency mode through the frequency converter 8; the main controller 71 can control the operation of the ionization mechanism 3 through a relay, an operator can adjust the control frequency of the frequency converter 8 on the touch display screen 72, and under the condition that the parameters detected by the sensors do not meet the requirements, the main controller 71 can also control the early warning device to give an alarm to the operator for reminding.
It should be noted that the main controller 71 shown in the present embodiment may be a single chip microcomputer or a PLC controller, etc. known in the art.
Firstly, an operator sets the operation time of the whole set of plasma generating device on the touch display screen 72, detects the liquid level height of the sewage in the first water tank 51 through the liquid level sensor 61, and can select whether the frequency converter 8 is started to control the first water pump 52 or not under the condition that the liquid level height of the sewage in the first water tank 51 meets the requirement, and the main controller 71 controls the first water pump 52 to operate in a frequency conversion mode through the frequency converter 8 in combination with the detection parameters of the flow sensor under the condition that the frequency converter 8 is started; under the condition that the frequency converter 8 is not started, the main controller 71 controls the first water pump 52 to operate at power frequency through the relay.
After a time interval, the liquid pipeline 1 is filled with sewage, and the main controller 71 controls the fan 4 to operate in a frequency conversion mode through the frequency converter 8.
After a time interval, the chamber is filled with air, at which time the main controller 71 controls the operation of the ionization mechanism 3 through a relay.
After a time interval, the air and the sewage are fully ionized, at this time, whether the frequency converter 8 is started to control the second water pump 54 can be selected, and under the condition that the frequency converter 8 is started, the main controller 71 controls the second water pump 54 to operate in a frequency conversion mode through the frequency converter 8; under the condition that the frequency converter 8 is not started, the main controller 71 controls the second water pump 54 to run at power frequency through a relay.
In the whole control process, the detection parameters of the detection device 6 are fed back to the main controller 71 in real time, and the main controller 71 realizes feedback control.
Specifically, the overall feedback control method is that when the liquid level sensor 61 detects that the liquid level in the first water tank 51 is low, the main controller 71 controls the first water pump 52 to be turned off and controls the second water pump 54 to be turned on; when the level sensor 61 detects that the liquid level in the first water tank 51 reaches a predetermined liquid level, the main controller 71 controls the first water pump 52 to be turned on and controls the second water pump 54 to be turned off.
When the flow sensor 62 detects that the liquid flow at the liquid inlet is small, the main controller 71 controls to increase the power of the first water pump 52; when the flow sensor 62 detects that the liquid flow at the liquid inlet is large, the main controller 71 controls to reduce the power of the first water pump.
When the temperature sensor 63 detects that the temperature in the second water tank 53 is not within the preset range, the main controller 71 controls the air supply device, the liquid circulation device 5, and the ionization mechanism 3 to stop operating.
When the PH sensor 64 detects that the PH of the sewage in the second water tank 53 is not within the range of 4 to 10, the main controller 71 controls the air supply device, the liquid circulation device 5, and the ionization mechanism 3 to stop operating.
When the ozone concentration sensor 65 detects that the ozone concentration at the air outlet is not within the preset range, the main controller 71 controls the air supply device, the liquid circulation device 5 and the ionization mechanism 3 to stop operating.
When the parameters detected by the sensors meet preset values, the main controller 71 controls the early warning device to send an alarm prompt to an operator, and also sends the unsatisfied parameters to the touch display screen 72, so that the operator can clearly determine the abnormal position of the plasma generating device.
Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (6)
1. A plasma generating apparatus, comprising:
the liquid flowing pipeline is used for introducing liquid to be ionized;
the liquid passing pipeline is arranged in the shell, a cavity is formed between the outer side wall of the liquid passing pipeline and the inner side wall of the shell, and the cavity is used for introducing gas to be ionized; the liquid passing pipeline can be selectively communicated with or blocked from the chamber; wherein, the chamber is also used for placing an object to be processed;
an ionization mechanism for ionizing the liquid to be ionized and/or the gas to be ionized to obtain a plasma, wherein the plasma is used for acting on the liquid to be ionized and/or the object to be treated;
the liquid passing pipeline comprises an insulating water tank and an insulating cover plate;
the insulating cover plate is covered on the notch of the insulating water tank, and is provided with at least one through hole which can be selectively opened or closed; the insulating water tank is internally used for introducing the liquid to be ionized, and one side of the insulating cover plate, which is far away from the insulating water tank, is used for placing the object to be treated;
the ionization mechanism comprises a first electrode and a second electrode;
the first electrode and the second electrode are oppositely arranged in the cavity at intervals, the first electrode is connected with the shell, the second electrode is movably connected with the shell, and the insulating water tank is arranged between the first electrode and the second electrode;
the first electrode is used for grounding, and the second electrode is used for being electrically connected with power supply equipment;
further comprising: a gas supply device;
one end of the liquid passing pipeline is provided with a gas inlet, the other end of the liquid passing pipeline is provided with a gas outlet, the gas inlet is communicated with the gas supply device, and the gas outlet is communicated with the atmospheric environment;
the gas supply device is used for conveying the gas to be ionized into the liquid-passing pipeline;
further comprising: a liquid circulation device;
the liquid circulation device is communicated with the liquid passing pipeline and is used for circularly conveying the liquid to be ionized to the liquid passing pipeline.
2. The plasma generating apparatus according to claim 1,
and a stirring device is arranged in the insulating water tank and is used for stirring the liquid to be ionized.
3. The plasma generating apparatus according to claim 1,
the ionization mechanism further comprises a telescopic adjusting device;
the fixed end of the telescopic adjusting device is connected with the shell, and the telescopic end of the telescopic adjusting device is connected with the second electrode; or the fixed end of the telescopic adjusting device is connected with the second electrode, and the telescopic end of the telescopic adjusting device is connected with the shell.
4. The plasma generating apparatus according to claim 1,
the liquid circulation device includes: the system comprises a first water tank, a first water pump, a second water tank, a second water pump and a control valve;
a liquid inlet is formed at one end of the liquid passing pipeline, and a liquid outlet is formed at the other end of the liquid passing pipeline; the water outlet of the first water tank is communicated with the water inlet of the first water pump, the water outlet of the first water pump is communicated with the liquid inlet, the liquid outlet is communicated with the water inlet of the second water tank, the water outlet of the second water tank is communicated with the water inlet of the second water pump, and the water outlet of the second water pump is communicated with the water inlet of the first water tank;
the control valve is arranged at the liquid outlet and is used for controlling the liquid flow of the liquid outlet.
5. The plasma generating apparatus according to claim 4,
further comprising: a detection device;
the detection device comprises a liquid level sensor, a flow sensor, a temperature sensor, a PH value sensor and an ozone concentration sensor;
the liquid level sensor is arranged in the first water tank, the flow sensor is arranged on the liquid inlet, the temperature sensor and the PH value sensor are arranged in the second water tank, and the ozone concentration sensor is arranged on the gas outlet.
6. The plasma generating apparatus according to claim 5,
further comprising: a control device;
the detection device is in communication connection with the control device, and the control device is in communication connection with the gas supply device, the liquid circulation device and the ionization mechanism respectively.
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