CN115845766A - Microchannel gas-liquid two-phase discharge nitrogen fixation device - Google Patents

Microchannel gas-liquid two-phase discharge nitrogen fixation device Download PDF

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Publication number
CN115845766A
CN115845766A CN202211482380.8A CN202211482380A CN115845766A CN 115845766 A CN115845766 A CN 115845766A CN 202211482380 A CN202211482380 A CN 202211482380A CN 115845766 A CN115845766 A CN 115845766A
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liquid
gas
channel
micro
supply system
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陈仙辉
朱敏琛
夏维东
施丽蓉
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University of Science and Technology of China USTC
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University of Science and Technology of China USTC
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Abstract

The invention provides a micro-channel gas-liquid two-phase discharge nitrogen fixation device, which comprises a gas supply system, a liquid supply system, a micro-fluid chip and a dielectric barrier discharge system, wherein the micro-fluid chip comprises a planar substrate, a transverse channel and a longitudinal channel which are communicated with the planar substrate and are respectively connected with the gas supply system and the liquid supply system, the gas-liquid two phases form a two-phase area in the longitudinal channel, and the dielectric barrier discharge system comprises an anode and a cathode which are overlapped with the micro-fluid chip along the two-phase area to form an electric field. According to the invention, the micro-channel discharge greatly improves the DBD discharge energy density and promotes the nitrogen dissociation; the micro-channel generates a stable gas-liquid two-phase flow pattern, the interface reaction and the material transfer of the plasma bubble clusters and the liquid phase are enhanced, and the reaction balance is promoted to move towards the nitrogen fixation direction, so that the nitrogen fixation energy efficiency of the plasma is improved.

Description

Microchannel gas-liquid two-phase discharge nitrogen fixation device
Technical Field
The invention relates to the technical field of nitrogen fixation, in particular to a micro-channel gas-liquid two-phase discharge nitrogen fixation device.
Background
Nitrogen fixation industrial product-ammonia (NH) 3 ) Is an indispensable synthetic raw material for fertilizers and other chemicals. Ammonia has received much attention as a non-carbon carrier in energy storage and conversion. The Haber-Bosch ammonia nitrogen fixation process has been close to the theoretical energy consumption (0.48 MJ/mol) after more than 100 years of improvement, but still accounts for 2 percent of the global energy consumption and emits 1 percent of the global greenhouse gases. Therefore, it is of great importance to find alternative pathways for sustainable ammonia synthesis. The non-thermal plasma (NTP) nitrogen fixation theory energy consumption is as low as 0.20MJ/mol, and the plasma is combined with solar energy with increasingly lower cost, so that near zero emission can be realized, and the method has a great prospect. The nitrogen fixation method of Dielectric Barrier Discharge (DBD) does not need high temperature and high pressure, and high-energy electrons generated by atmospheric pressure discharge can promote nitrogen fixation reaction. Currently, the reported maximum energy efficiency of DBD nitrogen fixation without catalyst assistance is less than 5.0g-NH 3 /kWh, but 200g-NH energy efficiency from decentralized ammonia synthesis 3 There is still a large gap in/kWh. The reasons for the low nitrogen fixation energy efficiency of the DBD include the following aspects: firstly, the energy density of DBD discharge is low, the threshold of electron collision dissociation energy of nitrogen molecules is as high as 9.75eV, and the dissociation of nitrogen becomes a speed limiting step of nitrogen fixation reaction; secondly, the plasma reaction is a free radical process, which results in poor product selectivity, and meanwhile, the synthesized products (ammonia gas and nitrogen oxides) are easy to generate reverse reaction of decomposition under the condition of high electron energy.
Disclosure of Invention
According to the invention, the DBD discharge energy density is greatly improved through micro-channel discharge, and the nitrogen dissociation is promoted; the micro-channel generates a stable flow pattern, the interface reaction and the material transfer of the plasma bubble groups and the liquid phase are enhanced, and the reaction balance is promoted to move towards the nitrogen fixation direction, so that the improvement of the nitrogen fixation energy efficiency of the plasma is realized.
In order to solve the technical problems, the invention adopts the following technical scheme:
a micro-channel gas-liquid two-phase discharge nitrogen fixation device comprises a gas supply system, a liquid supply system, a micro-fluid chip and a dielectric barrier discharge system, wherein the micro-fluid chip comprises a planar substrate, a transverse channel and a longitudinal channel which are communicated with the planar substrate and connected with the gas supply system and the liquid supply system respectively, two phases of gas and liquid form a two-phase area in the longitudinal channel, and the dielectric barrier discharge system comprises a positive electrode and a negative electrode which are overlapped along the two-phase area to form an electric field.
Preferably, the transverse channels and the longitudinal channels are arranged on the planar substrate in orthogonal communication.
Preferably, the positive electrode, the microfluidic chip and the negative electrode are stacked, and a dielectric layer is stacked between the positive electrode and the microfluidic chip and between the negative electrode and the microfluidic chip.
Preferably, the transverse channel and the longitudinal channel are arranged in a cross-shaped orthogonal mode, two ends of the transverse channel are connected with the liquid supply system, the longitudinal channel is connected with the gas supply system, gas enters from one end of the longitudinal channel, and the gas is discharged from the other end of the longitudinal channel.
Preferably, the anode and the cathode are relatively embedded at two sides of the longitudinal channel of the microfluidic chip, and a dielectric layer is arranged at one side of the anode and the cathode away from the microfluidic chip.
Preferably, the transverse channel and the longitudinal channel are arranged in a T-shaped orthogonal mode, the transverse channel is connected with the gas supply system, the longitudinal channel is connected with the liquid supply system, liquid enters from one end of the longitudinal channel, and the liquid is discharged from the other end of the longitudinal channel.
Preferably, the dielectric barrier discharge system further comprises a power supply connected with the anode, the power supply is a high-voltage sine alternating current power supply or a pulse type output power supply, the peak voltage of the output is 0.5-10 kV, and the frequency is adjusted to 1-20 kV.
Preferably, the gas supply system and the liquid supply system are both conveyed by adopting an injection pump or a peristaltic pump, and the gas supply components of the gas supply system are nitrogen, air, a mixed gas of nitrogen and hydrogen or a mixed gas of nitrogen and methane; the liquid supply component of the liquid supply system is water, acid solution or salt solution.
Preferably, the microfluid chip is made of an insulating medium, the dielectric constant of the microfluid chip is 2-5, the light transmittance is more than 80%, and the microfluid chip is made of polydimethylsiloxane, ultraviolet optical curing adhesive, organic glass or quartz glass.
Preferably, the positive electrode and the negative electrode are cadmium, tin, lead, indium tin oxide or nano silver conductive films.
According to the technical scheme, the invention has the following beneficial effects: in the invention, the gas supply system and the liquid supply system are stably conveyed by adopting the injection pump, the supplied gas and liquid respectively flow along the transverse channel and the longitudinal channel, and form a two-phase flow channel in the longitudinal channel, the dielectric barrier discharge system discharges in a gas phase region to generate products such as ammonia, nitrogen oxide and the like, and the products are absorbed by a liquid phase and discharge in a gas-liquid two-phase region to strengthen the nitrogen fixation reaction. The sizes of the transverse channel and the longitudinal channel of the microfluid structure are 50-500 mu m, the micro-gap and the super-large specific surface can strengthen the reaction and the transmission of plasma discharge energy and gas-liquid two-phase, the problems of low energy density and low product selectivity of a conventional dielectric barrier discharge nitrogen fixation route are solved, and the energy efficiency of plasma nitrogen fixation is improved.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic diagram of an embodiment of the connection between a microfluidic chip and a dielectric barrier discharge system according to the present invention;
FIG. 3 isbase:Sub>A schematic view of section A-A of FIG. 2;
FIG. 4 is a schematic diagram of another embodiment of the connection of the microfluidic chip of the present invention to a dielectric barrier discharge system;
FIG. 5 is a schematic view of section B-B of FIG. 4;
FIG. 6 is a schematic diagram of nitrogen fixation energy efficiency of the nitrogen fixation device of the present invention at different discharge voltages.
In the figure: 10. an air supply system; 20. a liquid supply system; 30. a microfluidic chip; 310. a transverse channel; 320. a longitudinal channel; 410. a positive electrode; 420. a negative electrode; 50. a dielectric layer.
Detailed Description
Preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings.
Referring to fig. 1, a microchannel gas-liquid two-phase discharge nitrogen fixation device includes a gas supply system 10, a liquid supply system 20, a microfluidic chip 30 and a dielectric barrier discharge system, the microfluidic chip includes a planar substrate and a microfluidic channel structure, the microfluidic channel structure includes a transverse channel 310 and a longitudinal channel 320 which are arranged along the planar substrate and connected with the gas supply system and the liquid supply system, respectively, wherein the gas-liquid two-phase forms a two-phase region in the longitudinal channel, the dielectric barrier discharge system includes an anode 410 and a cathode 420 which are stacked along the two-phase region microfluidic chip to form an electric field, when in use, the gas supply system and the liquid supply system are both stably conveyed by using an injection pump, the supplied gas and liquid respectively flow along the transverse channel and the longitudinal channel and form a two-phase flow channel in the longitudinal channel, the dielectric barrier discharge system discharges in the gas-phase region to generate products such as ammonia and nitrogen oxides, which are absorbed by the liquid phase, and discharges in the two-phase region to strengthen the gas-liquid nitrogen fixation reaction. The sizes of the transverse channel and the longitudinal channel of the microfluid structure are 50-500 mu m, the micro-gap and the super-large specific surface can strengthen the reaction and the transmission of plasma discharge energy and gas-liquid two-phase, the problems of low energy density and low product selectivity of a conventional dielectric barrier discharge nitrogen fixation route are solved, and the energy efficiency of plasma nitrogen fixation is improved.
The nitrogen fixation device has the advantages of simple structure, easy parallel amplification, realization of distributed nitrogen fixation production, quick start and stop, high efficiency and capability of realizing the functions of energy storage and electricity regulation by combining with green electricity.
As a preferred technical solution of the present invention, the transverse channel 310 and the longitudinal channel 320 are orthogonally arranged on a planar substrate, that is, the transverse channel and the longitudinal channel are vertically distributed along the planar substrate, the gas phase and the liquid phase enter the microfluidic chip through respective channels, and the gas phase and the liquid phase can be converged in the longitudinal channel to form a gas-liquid two-phase flow channel, so that ammonia and nitrogen oxides are generated by discharging in a gas phase region, and the nitrogen fixation reaction is enhanced by discharging in a gas-liquid two-phase region.
Further, as shown in fig. 2, the transverse channel and the longitudinal channel are arranged in a cross-orthogonal manner, two ends of the transverse channel are connected with the liquid supply system, the longitudinal channel is connected with the gas supply system, gas enters from one end of the longitudinal channel, and is discharged from the other end of the longitudinal channel, the anode, the microfluidic chip and the cathode are arranged in a stacked manner to form a sandwich structure, a dielectric layer 50 is stacked between the anode and the microfluidic chip, between the cathode and the microfluidic chip, and between the anode and the microfluidic chip, and between the cathode and the microfluidic chip, and the anode and the cathode are in tight contact with the dielectric layer, the dielectric layer can inhibit the development of discharge current, and the formed plasma has high electron temperature, so that the gas temperature is close to room temperature.
Further, as shown in fig. 4, the transverse channel and the vertical channel are not limited to the cross arrangement, but may be orthogonally arranged on a planar substrate in a T shape, the transverse channel is connected to the gas supply system, the vertical channel is connected to the liquid supply system, liquid enters from one end of the vertical channel, and is discharged from the other end, meanwhile, the anode and the cathode are relatively embedded at two sides of the vertical channel of the microfluidic chip, and a dielectric layer is arranged at one side of the anode and the cathode away from the microfluidic chip, the anode and the cathode are clamped between the microfluidic chip, plasma bubble clusters are subjected to interface reaction and substance transfer among the microfluidic chip, the anode and the cathode, and the dielectric layer is arranged between the microfluidic chip and the electrode.
As a preferred technical scheme of the invention, the dielectric barrier discharge system further comprises a power supply connected with the anode, specifically, the power supply is a high-voltage sine alternating current power supply or a pulse type output power supply, the output peak voltage of the power supply is 0.5-10 kV, the frequency of the power supply is adjusted to 1-20 kV, when the transverse channel and the longitudinal channel are in cross orthogonal distribution, and the anode, the micro-fluid chip and the cathode are stacked, the positive and negative terminals of the power supply are respectively connected with the positive and negative electrodes of the outermost layer; when the transverse channel and the vertical channel are in T-shaped orthogonal distribution, and the positive electrode and the negative electrode are relatively embedded into two sides of the longitudinal channel of the microfluid chip, the positive terminal and the negative terminal of the power supply are respectively connected with the positive electrode and the negative electrode on the inner side of the microfluid chip, so that the plasma bubble clusters are subjected to interface reaction and material transfer in the channels.
As a preferred technical solution of the present invention, the gas supply system and the liquid supply system are both delivered by using injection pumps, specifically, the gas supply component of the gas supply system is nitrogen, air, a mixed gas of nitrogen and hydrogen, or a mixed gas of nitrogen and methane, and the liquid supply component of the liquid supply system is water, an acid solution, or a salt solution.
Furthermore, the microfluid chip is made of an insulating material, the dielectric constant of the microfluid chip is 2-5, the light transmittance is more than 80%, and the microfluid chip is Polydimethylsiloxane (PDMS), ultraviolet optical curing adhesive (NOA 81), organic glass (PMMA) or quartz glass.
Furthermore, the electrode material of the positive electrode and the negative electrode is low-melting metal cadmium, tin, lead, indium Tin Oxide (ITO) or nano silver conductive film.
The invention also provides a micro-channel gas-liquid two-phase discharge nitrogen fixation method, which comprises the following steps:
s1: adjusting the speed of gas and liquid in the flow regulating channel of the injection pump to generate a stable flow pattern;
s2: the discharge voltage and the discharge frequency are adjusted to generate stable dielectric barrier discharge in a gas or gas-liquid two-phase region, and nitrogen fixation reaction occurs in the gas-liquid two-phase region.
S3: sampling at regular time after continuous reaction, and detecting the concentration of ammonium ions and nitrate ions of the product by adopting an ultraviolet-visible spectrophotometer method.
The nitrogen fixation device of the present invention will be described in detail below by way of specific embodiments, respectively.
Example 1:
referring to fig. 3, a microchannel gas-liquid two-phase discharge nitrogen fixation device includes a gas supply system 10, a liquid supply system 20, a microfluidic chip 30 and a dielectric barrier discharge system, the microfluidic chip includes a planar substrate and a microfluidic channel structure, the microfluidic channel structure includes a transverse channel and a longitudinal channel which are arranged along the planar substrate and connected with the gas supply system and the liquid supply system respectively, wherein, the gas-liquid two-phase forms a two-phase region in the longitudinal channel, the dielectric barrier discharge system includes a positive electrode and a negative electrode which are stacked along the two-phase region to form an electric field. The gas supply system 10 and the liquid supply system 20 are both stably conveyed by injection pumps with the measuring range of 10-1000 mL/h, wherein the gas supply component is air, and the liquid supply component is deionized water.
The transverse channel and the longitudinal channel are arranged in a cross-shaped orthogonal mode, two ends of the transverse channel are connected with the liquid supply system, the longitudinal channel is connected with the gas supply system, gas enters from one end of the longitudinal channel, the other end of the longitudinal channel is discharged, the anode, the microfluid chip and the cathode are arranged in a stacked mode like a sandwich structure, and the electrodes respectively cover a gas phase area and a gas-liquid two-phase area of the microfluid chip.
The microfluid chip is made of PDMS material and is prepared by standard photoetching and pouring methods, the length of a cross channel formed by a transverse channel and a longitudinal channel is 40mm in the horizontal direction and the vertical direction, an oval discharge area with a long axis of 10mm and a short axis of 6mm is expanded in the longitudinal channel, the distance between the center of the oval and a cross intersection point is 10mm, and the cross section of the channel is a rectangle with the diameter of 0.1mm multiplied by 0.2 mm.
The positive electrode and the negative electrode of the dielectric barrier discharge system adopt transparent ITO glass with the thickness of 0.3mm, the glass is used as a dielectric layer with the thickness of 0.2mm, a power supply of the dielectric barrier discharge system is a high-voltage sine alternating current power supply or a pulse type output power supply, the output peak voltage is 0.5-10 kV, and the frequency is adjusted to 1-20 kHz.
Example 2:
referring to fig. 5, a microchannel gas-liquid two-phase discharge nitrogen fixation device includes a gas supply system 10, a liquid supply system 20, a microfluidic chip 30 and a dielectric barrier discharge system, the microfluidic chip includes a planar substrate and a microfluidic channel structure, the microfluidic channel structure includes a transverse channel and a longitudinal channel which are arranged along the planar substrate in a communication manner and are respectively connected with the gas supply system and the liquid supply system, wherein, gas-liquid two phases form a two-phase region in the longitudinal channel, and the dielectric barrier discharge system includes a positive electrode and a negative electrode which are stacked along the two-phase region to form an electric field. The gas supply system 10 and the liquid supply system 20 are both stably conveyed by injection pumps with the range of 10-1000 mL/h, wherein the gas supply component is air, and the liquid supply component is deionized water.
The transverse channel and the longitudinal channel are orthogonally arranged on the plane substrate in a T shape, the transverse channel is connected with the gas supply system at the moment, the longitudinal channel is connected with the liquid supply system, liquid enters from one end of the longitudinal channel, the liquid is discharged from the other end of the longitudinal channel, meanwhile, the anode and the cathode are arranged in parallel to the micro-fluid channel structure, specifically, the anode and the cathode are embedded into two sides of the longitudinal channel of the micro-fluid chip relatively, and the electrodes at the moment are only distributed on two sides of a gas-liquid two-phase area.
The microfluid chip adopts organic glass (PMMA) material, through machining for T style of calligraphy structure, the horizontal channel length of T style of calligraphy structure is 40mm, and longitudinal channel length is 40mm, and its cross-section of passage is 0.3mm 0.6mm rectangle.
The positive electrode and the negative electrode of the dielectric barrier discharge system adopt copper electrodes, the positive electrode and the negative electrode are parallelly distributed at the position 0.2mm away from the two sides of the transverse channel, the length of the positive electrode and the negative electrode is 60mm, glass is used as a dielectric layer, the thickness of the glass is 0.2mm, a power supply of the dielectric barrier discharge system is a high-voltage sine alternating current power supply or a pulse type output power supply, the output peak voltage is 0.5-10 kV, and the frequency is adjusted to 1-20 kHz.
Referring to fig. 6, the nitrogen fixation yield and energy efficiency of the nitrogen fixation device under different discharge voltages are shown, and it can be seen from fig. 6 that at a discharge voltage of 200V, the nitrogen fixation yield and energy efficiency are the highest, i.e. the nitrogen fixation energy efficiency is the highest, and can reach 12gN/kWh at the highest, because the discharge voltage is increased to accelerate the nitrogen fixation rate of the product and reduce the energy consumption, but the voltage is further increased, the DBD discharge is converted from filament discharge to arc discharge, the discharge is not uniform, and part of the energy is converted into heat energy to reduce the synthesis efficiency.
The above-described embodiments are only intended to describe the preferred embodiments of the present invention, and not to limit the scope of the present invention, and various modifications and improvements made to the technical solution of the present invention by those skilled in the art without departing from the spirit of the present invention should fall within the protection scope defined by the claims of the present invention.

Claims (10)

1. The micro-channel gas-liquid two-phase discharge nitrogen fixation device comprises a gas supply system (10), a liquid supply system (20) and is characterized by further comprising a micro-fluid chip (30) and a dielectric barrier discharge system, wherein the micro-fluid chip comprises a planar substrate, a transverse channel and a longitudinal channel which are communicated with the planar substrate and connected with the gas supply system and the liquid supply system respectively, the gas-liquid two phases form a two-phase area in the longitudinal channel, and the dielectric barrier discharge system comprises an anode and a cathode which are overlapped along the two-phase area to form an electric field.
2. The microchannel gas-liquid two-phase discharge nitrogen fixation device according to claim 1, wherein the transverse channel and the longitudinal channel are orthogonally communicated and arranged on a planar substrate.
3. The microchannel gas-liquid two-phase discharge nitrogen fixation device according to claim 2, wherein the anode, the microfluidic chip and the cathode are stacked, and a dielectric layer (50) is stacked between the anode and the microfluidic chip and between the cathode and the microfluidic chip.
4. The micro-channel gas-liquid two-phase discharge nitrogen fixation device as claimed in claim 3, wherein the transverse channel is arranged orthogonally to the longitudinal channel, both ends of the transverse channel are connected with the liquid supply system, the longitudinal channel is connected with the gas supply system, and gas enters from one end of the longitudinal channel and is discharged from the other end of the longitudinal channel.
5. The micro-channel gas-liquid two-phase discharge nitrogen fixation device as recited in claim 2, wherein the anode and the cathode are embedded in two sides of the longitudinal channel of the micro-fluidic chip, and a dielectric layer (50) is disposed on one side of the anode and the cathode away from the micro-fluidic chip.
6. The micro-channel gas-liquid two-phase discharge nitrogen fixation device as claimed in claim 5, wherein the transverse channel and the longitudinal channel are arranged in a T-shape and are orthogonal, the transverse channel is connected with a gas supply system, the longitudinal channel is connected with a liquid supply system, and liquid enters from one end of the longitudinal channel and is discharged from the other end of the longitudinal channel.
7. The micro-channel gas-liquid two-phase discharge nitrogen fixation device according to claim 4 or 6, wherein the dielectric barrier discharge system further comprises a power supply connected with the anode, the power supply is a high-voltage sine alternating current power supply or a pulse output power supply, the peak voltage of the output is 0.5-10 kV, and the frequency is adjusted to be 1-20 kV.
8. The micro-channel gas-liquid two-phase discharge nitrogen fixation device according to claim 7, wherein the gas supply system and the liquid supply system are both delivered by a syringe pump or a peristaltic pump, and the gas supply component of the gas supply system is nitrogen, air, a mixed gas of nitrogen and hydrogen, or a mixed gas of nitrogen and methane; the liquid supply component of the liquid supply system is water, acid solution or salt solution.
9. The micro-channel gas-liquid two-phase discharge nitrogen fixation device as claimed in claim 7, wherein the micro-fluidic chip is made of an insulating medium, has a dielectric constant of 2-5 and a light transmittance of more than 80%, and is made of polydimethylsiloxane, ultraviolet optical curing glue, organic glass or quartz glass.
10. The microchannel gas-liquid two-phase discharge nitrogen fixation device according to claim 7, wherein the positive electrode and the negative electrode are cadmium, tin, lead, indium tin oxide or nano silver conductive films.
CN202211482380.8A 2022-11-24 2022-11-24 Microchannel gas-liquid two-phase discharge nitrogen fixation device Pending CN115845766A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116121779A (en) * 2023-04-04 2023-05-16 北京化工大学 Plasma-assisted electrocatalytic ammonia synthesis device and synthesis method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116121779A (en) * 2023-04-04 2023-05-16 北京化工大学 Plasma-assisted electrocatalytic ammonia synthesis device and synthesis method thereof

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