CN103237771A - 在玻璃中形成高密度孔阵列的方法 - Google Patents
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Abstract
提供了一种在玻璃中制造高密度孔阵列的方法,该方法包括以下步骤:提供具有前表面的玻璃片,然后用UV激光束照射玻璃片的前表面,照射的焦点在玻璃片前表面的+/-100μm内,最优选在玻璃片前表面的+/-50μm内。对于厚度在0.3-0.63mm之间的玻璃,聚焦激光的透镜的数值孔径优选在0.1-0.4的范围内,更优选在0.1-0.15的范围内,甚至更优选在0.12-0.13的范围内,从而产生从玻璃片的前表面102延伸进入玻璃片100的开孔,所述开孔的直径在5-15μm的范围内,长宽比至少为20:1。对于在0.1-0.3mm范围内的更薄的玻璃,数值孔径优选为0.25-0.4,更优选为0.25-0.3,并且激光束优选聚焦在玻璃前表面+/-30μm内。优选以小于或等于约15kHz的重复频率运行激光。然后可以通过蚀刻来扩大所产生的孔阵列。如果需要的话,可以在蚀刻之前对前表面进行抛光。
Description
优先权
本申请要求2010年11月30日提交的美国申请序列第61/418,152号的优先权。
技术领域
本发明涉及在玻璃中制造高密度孔阵列的方法,具体是高密度通孔阵列,更具体是高长宽比孔的高密度阵列。
背景和概述
美国专利第6,754,429号揭示了一种先前已经证实的用于在玻璃中制造此类密集孔阵列的方法。所揭示的方法涉及使玻璃与飞秒激光接触,然后进行酸蚀刻。该方法依赖于选择性蚀刻,在选择性蚀刻中,被激光破坏的玻璃的蚀刻速率明显高于余下玻璃的蚀刻速率。虽然该技术上来看是合理的,但是该方法采用昂贵且需要不断维护的飞秒激光技术,并且激光作用过程较为缓慢。
根据美国专利公开第20030150839号,可以用激光烧蚀然后用酸蚀刻去除表面缺陷和碎屑来制造直径为120-130μm的渐缩孔(圆锥形孔)。所揭示的方法在激光照射之前需要一个离子交换步骤。并未揭示除了激光斑尺寸和能量密度之外的照射条件。
美国专利公开第20090013724号描述了在各种组成的玻璃中用激光照射和酸蚀刻来形成孔。使用波长为355nm和266nm的激光。推荐的(数值)束孔径是NA<0.7,还揭示了玻璃内或者背表面后面的焦距。并未具体指出孔轮廓和定位精确性。
需要的是一种成本较低并且可靠的方法,用于以较紧密的最小间距形成较小的孔,并且该方法具有良好的定位精确性和整个深度上相当小的直径变化。
根据本发明的一个方面是在玻璃中制造高密度孔阵列,该方法包括以下步骤:提供具有前表面的玻璃片,然后用UV激光束照射玻璃片的前表面,照射的焦点在玻璃片前表面的+/-100μm内,最优选在玻璃片前表面的+/-50μm内。对于厚度在0.3-0.63mm之间的玻璃,聚焦激光的透镜的数值孔径优选在0.1-0.4的范围内,更优选在0.1-0.15的范围内,甚至更优选在0.12-0.13的范围内,从而产生从玻璃片的前表面102延伸进入玻璃片100的开孔,所述开孔的直径在5-15μm的范围内,长宽比至少为20:1。对于在0.1-0.3mm范围内的更薄的玻璃,数值孔径优选为0.25-0.4,更优选为0.25-0.3,并且激光束优选聚焦在玻璃前表面+/-30μm内。优选以小于或等于约15kHz的重复频率运行激光,并且通常具有足够的照射持续时间以形成刚好延伸达到玻璃片背表面的开孔。然后可以通过蚀刻来扩大所产生的孔阵列。如果需要的话,可以在蚀刻之前对前表面进行抛光。
在下文参考附图描述了本发明方法的变化形式,紧接下来对所述附图作简要描述。
附图简要说明
当结合以下附图阅读下面对本发明的具体实施方式的详细描述时,可对其形成最好的理解,附图中相同的结构用相同的附图标记表示,其中:
图1是代表本发明目前优选方法的基本步骤的流程图;
图2是用于本文所揭示方法的激光照射设备的示意透视图;
图3是用于本文所揭示方法的蚀刻设备的截面示意图;
图4是根据本发明方法生产的玻璃片中的孔的图像;
图5是破碎玻璃的图像,破碎是为了显示根据本发明方法生产的孔的部分截面图;
图6是根据本发明方法生产的玻璃片中的孔在蚀刻步骤之后的图像;
图7是根据本发明方法生产的玻璃片中的孔从玻璃片前表面观察的俯视图;
图8是根据本发明方法生产的玻璃片中的孔从玻璃片背表面观察的俯视图;
图9是根据对比方法生产的玻璃片中的孔的图像;
图10是根据对比方法生产的玻璃片中的孔的图像;
图11是根据对比方法生产的玻璃片中的孔在蚀刻步骤之后的图像;
图12是显示了其他类型的孔120的玻璃板100的截面示意图;以及
图13是显示了其他类型孔形状的孔120的玻璃板100的俯视示意图。
发明详述
根据本发明的一个方面,在厚度优选小于0.8mm,更优选厚度在0.1-0.63mm范围内的玻璃薄板中形成孔,所述孔的直径小于或等于200μm,最小间距不大于300μm,直径变化限制在小于或等于10μm,优选小于或等于5μm,并且(孔中心)定位的位置变化限制在小于或等于8μm,优选小于或等于4μm。孔的最薄直径或者“腰”直径不小于表面开口处的直径的65%,优选不小于表面开口处的直径的80%。
下面概括性地参考附图1-3,对这些结果以及可通过本发明方法获得的其他有益结果进行描述。根据在玻璃中制造高密度孔阵列的方法的一个实施方式,所述方法包括提供具有前表面102的玻璃片100,然后在图1表示的照射步骤20中,用UV激光束24照射玻璃片100的前表面。用透镜26聚焦激光束24,使得焦点优选在玻璃片100的前表面102的+/-100μm内,最优选在前表面102的+/-50μm内。对于厚度在0.3-0.63mm之间的玻璃,透镜26的数值孔径优选在0.1-0.4的范围内,更优选在0.1-0.15的范围内,甚至更优选在0.12-0.13的范围内,从而产生从玻璃片的前表面102延伸进入玻璃片100的开孔,所述开孔的直径在5-15μm的范围内,长宽比至少为20:1。对于在0.1-0.3mm范围内的更薄的玻璃,数值孔径优选为0.25-0.4,最优选为0.25-0.3,并且激光束优选聚焦在玻璃前表面+/-30μm内。优选以小于或等于约15kHz的重复频率运行激光,并且通常具有足够的照射持续时间以形成刚好延伸达到玻璃片背表面的开孔。
用UV激光束24,如上文所述优选用波长范围为200-400nm,更优选用波长范围为300-400nm的激光束24,最优选用Nd:KGW(钕掺杂的钨酸钾钆)或者其他Nd掺杂的激光22,以355nm的波长运行,或者以355+/-20nm的波长,优选以355+/-5nm的波长运行,来进行图1的照射步骤20。激光22优选在5-50kHz的重复频率范围内,更优选在10-20kHz的范围内,最优选在12-18kHz的范围内运行。
在图1的照射步骤20中,为了在厚度为0.63mm的EagleXG玻璃中产生通孔,优选包括用UV激光束24照射玻璃片100的前表面102,照射的持续时间范围为8-150毫秒/孔,更优选为60-120毫秒/孔,最优选为80-100毫秒/孔。对于厚度为0.1mm的玻璃,优选约为10毫秒,对于厚度为0.15mm的玻璃,优选为25毫秒,对于厚度为0.3mm的玻璃,优选为30毫秒。较厚的玻璃需要较长时间的接触(较高的脉冲计数)。作为一个可选的实施方式,可以通过实验或计算或其组合来选择优选的持续时间,该持续时间会导致所得到的孔刚好延伸达到玻璃片100的背表面104。这使得本发明的方法可用于在UV激光照射下具有不同性能的各种玻璃。
在照射之后,优选可在蚀刻步骤(图1的步骤40)中,在HF+HNO3溶液中对所得高长宽比的开孔进行蚀刻。本发明的工作显示,相对于其他一些蚀刻剂溶液,HF+HF+HNO3实现了对整个基材的均匀蚀刻,所述基材具有数千个以最小间距最低至200μm间隔开的孔。优选的浓度是20%HF+10%HNO3溶液。
作为可任选的步骤,在照射步骤20之后并且在蚀刻步骤40之前,可以对玻璃片100的前表面102进行抛光步骤60。
图2和3分别示意性地表示用于本发明方法的激光接触设备和蚀刻工位。
如图2所示,优选可将玻璃片100放在机动化XYZ台上,该机动化XYZ台的精确性和可重复性等于或优于1μm。用透镜26将激光束24聚焦到玻璃100的前表面102上。透镜的数值孔径应该理想地约大于NA=0.1。本发明的激光束24采用孔径NA=0.125的透镜26,产生具有明显边界的破损。
目前优选的激光条件是:15kHz的重复频率,1.5W的平均功率以及90ms的持续时间。在更高的重复频率,破损不具有明显的边界,如图9所示,图9是重复频率为100kHz的对照工艺的图像。该破损不会导致准圆柱孔轮廓,而最好是圆锥形的。低于约1.5W的功率不能产生足够的破损,而高于1.5W的功率会导致前表面的明显破损,而这还会导致漏斗类型的孔轮廓。在康宁公司厚度为0.63mm的EAGLE XG玻璃中,选择90-ms的15-kHz脉冲串/段进行接触,优化脉冲段的持续时间,使得破损从玻璃的一侧延伸到另一侧。更长的脉冲段导致强烈的背面破损,而更短的脉冲段导致破损长度下降。
如图4中的图像所示,这些激光条件在玻璃中产生直径仅为7-10μm的开口或者空心微通道。相比例如如图9所示的对照工艺所产生的具有微裂缝的激光破损,图4的微通道对蚀刻孔轮廓的控制好得多。
激光束24的聚焦位置对于破损的形成起了非常重要的作用。当激光束聚焦在玻璃前表面+/-100μm内时,可以实现如同图4所示的破损。为了获得更好的一致性,该范围应该降低至+/-50μm。如果激光束聚焦更靠近背表面或者在背表面的后面,则破损看上去不同,如图10的图像所示,并且变得几乎无法对孔进行蚀刻而不产生腰部,如图11的图像所示。
在优选的蚀刻条件下(20体积%HF+10体积%HNO3的水溶液,10-12分钟,约35C°的超声浴),所得到的孔120是准圆柱形的,如图6的图像所示,并且基本符合如上所述的要求。向酸中加入表面活性剂,例如Capstone FS-10,可有助于从玻璃冲洗蚀刻产物。图7和8所示的顶视图和底视图,以及图6所示的侧视图是采用了可任选的前侧抛光步骤60所得到的孔。在这些图像所示的样品中,在蚀刻步骤之前,对前表面抛光约80μm,从而去除前表面破损。如果没有此类抛光,则孔的前侧开口会是较不规则的形状。
图3是用于蚀刻步骤40的酸蚀刻工作台42的示意图。在图3中,工作台42包含其中装有声能传输流体46,例如水的外桶44。流体46支撑了酸桶48,酸桶48中含有酸或者酸掺混物50。将经过照射和退火的玻璃板100浸泡在酸或者酸掺混物50中。在蚀刻过程中,通过换能器52向外桶44施加声能,并通过介于其间的桶和流体传输到玻璃板100。
蚀刻决定了经过蚀刻的孔120的直径及其形状。例如,如果采用低浓度的酸(1体积%HF+1体积%HC1的水溶液)蚀刻1小时,则孔120小得多。底部直径为19μm,顶部直径为65μm。在该条件下,玻璃厚度从0.63mm下降10μm至0.62mm。采用较高的酸浓度产生直径约100μm的孔,如图6-8所示。影响所得到的孔的尺寸的蚀刻参数包括:酸浓度、蚀刻剂配方(或者酸的选择)、蚀刻持续时间以及溶液温度。酸掺混物可仅包含HF(1-30体积%)或者它与HC1(1-50%)、H2SO4(1-20体积%)、HNO3(1-40体积%)以及H3PO4(1-40体积%)的混合物。酸温度的优选范围为25-60℃。对于微孔中的溶液对流以及腰区域的更快蚀刻,优选为超声处理或者其他类型的搅动(例如,喷雾蚀刻)。
所提出的方法还能够形成有角度的孔。如果以一定的角度将激光束导向玻璃样品,则破损和蚀刻的孔也会与表面呈一定的角度。可以如下方式设计激光设备的配置:该方式能够实现制造具有垂直于玻璃表面的孔以及具有一定角度的孔的阵列,例如如图12中的玻璃板100的示意性截面图所示的孔120。
如果需要的话,还可以使用激光束整形作为改变孔形状的手段,例如将孔形状改变成如图13中的玻璃板100上的孔120中示意性所示的各种形状。用椭圆形激光束照射产生椭圆形孔,并且还可以通过孔径和成像、重叠激光束和/或其他技术以及这些技术的组合来进行激光束成形,产生其他形状的孔。
除了能够制造上文所述的通孔之外,降低接触持续时间还能够制造盲孔,如果需要的话,包括在同一基材上的两种孔类型,同样如图12所示。例如,如果激光脉冲段持续时间从90ms下降到约10-20ms,则会产生盲孔。所得到的破损类似于上文所述的7-10μm的微通道,从玻璃前表面开始并延伸到玻璃内部的部分长度,该长度与缩短的持续时间和完整的持续时间之间的比值有关。对此类轨迹进行蚀刻会产生盲孔。在同一孔阵列中不同深度的通孔和盲孔的组合。
对玻璃表面施涂耐酸性膜/涂层甚至可以进步一改善孔形状。所述涂层可具有如下数种功能:(a)保护表面,以免产生激光烧蚀的碎片;(b)减少对接触激光的区域周围的玻璃表面的机械破坏;(c)防止玻璃在蚀刻过程中变薄,从而改善孔的长宽比。此类涂层/膜可以是可去除的,或者如果它不妨碍进一步加工的话,可以将其留在玻璃上。
应当指出,本文所用的诸如“优选”、“常用”和“通常”之类的词语不是用来限制本发明要求保护的范围,也不表示某些特征对本发明要求保护的结构或者功能来说是重要的、关键的或者甚至是必不可少的。相反地,这些词语仅仅用来表明本发明实施方式的特定方面,或者强调可以用于或者可以不用于本发明特定实施方式的可选或附加的特征。
以上结合具体实施方式详细描述了本发明的主题内容,显而易见的是,在不背离所附权利要求书限定的本发明范围的前提下可以有一些改良和变化。更具体来说,尽管本发明的一些方面在本文中被认为是优选的或者特别有益的,但应考虑到本发明不一定限于这些方面。
应注意,以下权利要求书中的一项或多项权利要求使用术语“其特征在于”作为过渡语。出于限定本发明的目的,应当指出,在权利要求中用该术语作为开放式过渡短语来引出对一系列结构特征的描述,应当对其作出与更常用的开放式引导语“包含”类似的解释。
Claims (20)
1.一种在玻璃中制造高密度孔阵列的方法,该方法包括:
提供具有前表面的玻璃片;
用UV激光束照射所述玻璃片的前表面,用透镜将所述激光束聚焦在玻璃片前表面的+/-100μm内,所述透镜的数值孔径在0.1-0.4的范围内,从而产生从玻璃片的前表面延伸进入玻璃片中的开孔,所述开孔的直径在5-15μm的范围内,长宽比至少为20:1。
2.如权利要求1所述的方法,其特征在于,所述照射包括使用200-400nm波长范围的激光束。
3.如权利要求1所述的方法,其特征在于,所述照射包括使用300-400nm波长范围的激光束。
4.如权利要求3所述的方法,其特征在于,照射步骤中所使用的近-UV激光的运行波长为355+/-5μm。
5.如权利要求1-4中任一项所述的方法,其特征在于,对于厚度范围为0.3-0.63mm的玻璃,照射步骤中所采用的透镜的数值孔径在0.1-0.15的范围内。
6.如权利要求5所述的方法,其特征在于,对于厚度范围为0.1-0.3mm的玻璃,透镜的数值孔径在0.25-0.4的范围内。
7.如权利要求1-6中任一项所述的方法,其特征在于,在照射步骤过程中,以5-50kHz的重复频率运行激光。
8.如权利要求7所述的方法,其特征在于,在照射步骤过程中,以10-20kHz的重复频率运行激光。
9.如权利要求8所述的方法,其特征在于,在照射步骤过程中,以12-18kHz的重复频率运行激光。
10.如权利要求1-9中任一项所述的方法,其特征在于,照射步骤包括用UV激光束照射玻璃片的前表面,照射的持续时间为8-150毫秒/孔。
11.如权利要求1-9中任一项所述的方法,其特征在于,对于厚度约为0.1mm的玻璃,照射步骤包括用UV激光束照射玻璃片的前表面,照射的持续时间约为10毫秒/孔。
12.如权利要求1-9中任一项所述的方法,其特征在于,照射步骤包括用UV激光束照射玻璃片的前表面,照射的持续时间约为10毫秒每1/10mm的玻璃厚度。
13.如权利要求1-9中任一项所述的方法,其特征在于,所述玻璃片是玻璃板,所述照射步骤包括用UV激光束照射玻璃板的前表面,照射的持续时间由实验或计算决定,使得该持续时间会导致所产生的孔刚好延伸到达玻璃板的背表面。
14.如权利要求1-9中任一项所述的方法,其特征在于,所述照射步骤包括用UV激光束照射玻璃片的前表面,照射的持续时间由实验或计算决定,使得该持续时间会导致所产生的孔延伸到达玻璃片内的某一位置。
15.如权利要求1-14中任一项所述的方法,其特征在于,所述照射步骤包括用具有除了圆形形状之外的形状的激光束进行照射。
16.如权利要求1-15中任一项所述的方法,其特征在于,所述照射步骤包括用激光束进行照射,该激光束的朝向与玻璃片前表面呈除了90度之外的角度。
17.如权利要求1-16中任一项所述的方法,其特征在于,该方法还包括在酸中蚀刻玻璃片。
18.如权利要求17所述的方法,其特征在于,在酸中蚀刻的步骤还包括用酸掺混物进行蚀刻。
19.如权利要求18所述的方法,其特征在于,所述酸掺混物包含20%HF+10%HNO3的溶液。
20.如权利要求1-19中任一项所述的方法,其特征在于,所述方法还包括在照射之后且在蚀刻之前,对玻璃片的前表面进行抛光。
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CN112894146A (zh) * | 2019-12-04 | 2021-06-04 | 大族激光科技产业集团股份有限公司 | 玻璃基板通孔的激光加工方法和装置 |
CN113292236A (zh) * | 2021-05-21 | 2021-08-24 | 江西沃格光电股份有限公司 | 一种Mini-LED基板通孔的形成方法及电子设备 |
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KR20130135873A (ko) | 2013-12-11 |
CN106425129A (zh) | 2017-02-22 |
US9278886B2 (en) | 2016-03-08 |
US20160102009A1 (en) | 2016-04-14 |
US9802855B2 (en) | 2017-10-31 |
WO2012075072A2 (en) | 2012-06-07 |
WO2012075072A3 (en) | 2012-10-18 |
TW201235145A (en) | 2012-09-01 |
CN103237771B (zh) | 2016-10-19 |
JP2014501686A (ja) | 2014-01-23 |
EP2646384B1 (en) | 2019-03-27 |
KR101917401B1 (ko) | 2018-11-09 |
US20130247615A1 (en) | 2013-09-26 |
CN106425129B (zh) | 2018-07-17 |
EP2646384A2 (en) | 2013-10-09 |
TWI599429B (zh) | 2017-09-21 |
JP5905899B2 (ja) | 2016-04-20 |
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