CN102691080B - 铝制品 - Google Patents

铝制品 Download PDF

Info

Publication number
CN102691080B
CN102691080B CN201110072038.6A CN201110072038A CN102691080B CN 102691080 B CN102691080 B CN 102691080B CN 201110072038 A CN201110072038 A CN 201110072038A CN 102691080 B CN102691080 B CN 102691080B
Authority
CN
China
Prior art keywords
aluminum
color layers
porous surface
aluminum substrate
oxide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201110072038.6A
Other languages
English (en)
Other versions
CN102691080A (zh
Inventor
吕炳桂
吕远洋
林佳
吕远治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangdong Guangyun New Material Technology Co Ltd
Original Assignee
Guangdong Guangyun New Material Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Guangyun New Material Technology Co Ltd filed Critical Guangdong Guangyun New Material Technology Co Ltd
Priority to CN201110072038.6A priority Critical patent/CN102691080B/zh
Priority to TW100111741A priority patent/TW201239141A/zh
Priority to US13/268,173 priority patent/US20120241324A1/en
Publication of CN102691080A publication Critical patent/CN102691080A/zh
Application granted granted Critical
Publication of CN102691080B publication Critical patent/CN102691080B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/16—Pretreatment, e.g. desmutting
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • C25D11/243—Chemical after-treatment using organic dyestuffs
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/04—Etching of light metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

本发明提供一种铝制品，包括铝基体、依次形成于该铝基体上的阳极氧化膜及颜色层，该铝基体包括经电化学蚀刻形成的多孔表面，该多孔表面分布有多个纳米孔，该纳米孔的孔径为8‑20nm；该阳极氧化膜及颜色层依次形成于该多孔表面上，该颜色层通过真空镀膜的方式形成。本发明还提供一种上述铝制品的制备方法。

Description

铝制品
技术领域
本发明涉及一种铝制品。
背景技术
真空镀膜技术(PVD)是一个非常环保的成膜技术。以真空镀膜的方式所形成的膜层具有高硬度、高耐磨性、良好的化学稳定性、与基体结合牢固以及亮丽的金属外观等优点，因此真空镀膜在铝、铝合金及不锈钢等金属基材表面装饰性处理领域的应用越来越广。
然而，由于铝或铝合金的标准电极电位很低，且PVD装饰性涂层本身不可避免的会存在微小的孔隙，因此，直接于铝或铝合金基体表面镀覆诸如TiN层、TiNO层、TiCN层、CrN层、CrNO层、CrCN层或其他具有耐腐蚀性的PVD装饰性涂层，也不能有效防止所述铝或铝合金基体发生电化学腐蚀，同时该PVD装饰性涂层本身也会发生异色、脱落等现象。
发明内容
有鉴于此，有必要提供一种具有良好的耐腐蚀性及装饰性外观的铝制品。
一种铝制品，包括铝基体、依次形成于该铝基体上的阳极氧化膜及颜色层，该铝基体包括经电化学蚀刻形成的多孔表面，该多孔表面分布有多个纳米孔，该纳米孔的孔径为8-20nm；该阳极氧化膜及颜色层依次形成于该多孔表面上，该颜色层通过真空镀膜的方式形成。
所述铝制品先通过电化学蚀刻于铝基材上形成具有多个纳米孔的多孔表面，再于该多孔表面上依次形成阳极氧化膜及颜色层。所述多个纳米孔的形成可提高后续形成于铝基体的阳极氧化膜及颜色层的附着力。当所述铝制品处于腐蚀性介质中时，由于所述阳极氧化膜隔绝了铝基体与颜色层，使铝制品难以形成发生电化学腐蚀所需要的阴极与阳极，从而提高了铝制品的耐腐蚀性。所述铝制品耐腐蚀性及颜色层的附着力提高的同时，还可避免所述颜色层发生异色、脱落等失效现象，从而使该铝制品经长时间使用后仍具有较好的装饰性外观。
附图说明
图1为本发明较佳实施例在铝基体上形成纳米多孔后的剖视示意图；
图2为本发明较佳实施例的铝制品的剖视示意图。
主要元件符号说明
铝制品100
铝基体10
多孔表面12
纳米孔122
阳极氧化膜20
颜色层30
具体实施方式
请参阅图1及图2，本发明较佳实施例的铝制品100包括铝基体10及依次形成于铝基体10上的阳极氧化膜20及颜色层30。该铝制品100可以为3C电子产品的壳体，也可为眼镜边框、建筑用件及汽车等交通工具的零部件等。
所述铝基体10的材料为铝或铝合金。该铝基体10经电化学蚀刻形成有一多孔表面12，该多孔表面12上均匀分布有多个纳米孔122。所述纳米孔122的孔径为8-20nm，较佳为10-15nm。所述纳米孔122的深度远小于所述颜色层30的厚度。
所述阳极氧化膜20形成于铝基体10的多孔表面12上。该阳极氧化膜20通过阳极氧化处理得到。该阳极氧化膜的厚度为5-20μm，较佳为10-15μm。
所述颜色层30通过真空镀膜的方式形成于阳极氧化膜20的表面上。所述颜色层30的厚度为0.5～2μm。所述颜色层30可为TiN层、TiNO层、TiCN层、CrN层、CrNO层、CrCN层或其他具有耐腐蚀性的装饰性膜层。
上述铝制品100的制备方法，包括如下步骤：
首先，提供铝基体10，该铝基体10的材料为铝或铝合金。该铝基体10可以通过冲压成型得到。
对铝基体10进行除油处理，将铝基体10依次置于去离子水及纯度大于99.9％的丙酮中进行超声波清洗3-5min。清洗后将该铝基体10干燥备用。
对经上述处理后的铝基体10进行碱蚀处理，以去除铝基体10表面的氧化膜，同时使该铝基体10表面变得平整。该碱蚀处理的条件为：以含有30-50g/L的氢氧化钠和1-2g/L的葡萄糖酸钠的水溶液为碱蚀液，所述碱蚀液温度为40-60℃，碱蚀时间为1-5min。
对经碱蚀蚀刻的铝基体10进行电化学蚀刻。该电化学蚀刻的条件为：以含有250-350g/L的硫酸、20-30g/L的盐酸及5-10的g/L的氢氟酸的水溶液为蚀刻液，所述电化学蚀刻液的温度为常温，电化学蚀刻时间为5-10min，电流密度为6-10A/dm2。经上述电化学蚀刻后形成具有所述多个纳米孔122的多孔表面12。
对经电化学蚀刻后的铝基体10进行阳极氧化处理，以于该多孔表面12上形成阳极氧化膜20。该阳极氧化处理的条件为：以含有180-220g/L的硫酸水溶液为电解液，所述电解液温度为19-21℃，电解时间为20-40min，电流密度为1-1.5A/m2。
对该阳极氧化膜20进行封孔处理，以提高阳极氧化膜20的耐腐蚀性。该封孔处理的条件为：以5-10g/L醋酸镍为封孔液，该封孔液的温度为90-100℃，封孔时间为10-15min。
对经上述处理后的铝基体10进行真空镀膜处理，以在该阳极氧化膜20上形成颜色层30。该真空镀膜方法可采用溅镀、蒸镀或离子镀。该步骤具体工艺可采用相应方法的常规镀膜工艺，镀膜过程中通过控制镀膜时间来控制颜色层30的厚度在所述范围内，以保证使该颜色层30呈现出预定的色彩。
制备所述铝制品100的方法还包括在除油、碱蚀及电化学蚀刻后分别对铝基体10进行水洗的步骤。
本发明较佳实施方式的铝制品100的制造方法，通过电化学蚀刻的方法于铝基材10上形成具有多个纳米孔122的多孔表面12，再于该多孔表面12上依次形成阳极氧化膜20及颜色层30。所述多个纳米孔122的形成可提高后续形成于铝基体10的阳极氧化膜20及颜色层30的附着力。当所述铝制品100处于腐蚀性介质中时，由于所述阳极氧化膜20隔绝了铝基体10与颜色层30，使铝制品100难以形成发生电化学腐蚀所需要的阴极与阳极，从而提高了铝制品100的耐腐蚀性。所述铝制品100耐腐蚀性及颜色层30的附着力提高的同时，还可避免所述颜色层30发生异色、脱落等失效现象，从而使该铝制品100经长时间使用后仍具有较好的装饰性外观。

Claims (2)

1.一种铝制品，包括铝基体及形成于该铝基体上的颜色层，该颜色层通过真空镀膜的方式形成，其特征在于：该铝基体包括经电化学蚀刻形成的多孔表面，该多孔表面分布有多个纳米孔，该纳米孔的孔径为8-20nm；该铝制品还包括形成于基体与颜色层之间的阳极氧化膜，该阳极氧化膜及颜色层依次形成于该多孔表面上；其中所述多孔表面是通过以含有250-350g/L的硫酸、20-30g/L的盐酸及5-10的g/L的氢氟酸的水溶液为蚀刻液、蚀刻液温度为常温、蚀刻时间为5-10min、电流密度为6-10A/dm2的电化学蚀刻所形成。
2.如权利要求1所述的铝制品，其特征在于：所述阳极氧化膜的厚度为5-20μm。
CN201110072038.6A 2011-03-24 2011-03-24 铝制品 Active CN102691080B (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201110072038.6A CN102691080B (zh) 2011-03-24 2011-03-24 铝制品
TW100111741A TW201239141A (en) 2011-03-24 2011-04-06 Aluminium productor and method for making same
US13/268,173 US20120241324A1 (en) 2011-03-24 2011-10-07 Coated article and method for manufacturing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201110072038.6A CN102691080B (zh) 2011-03-24 2011-03-24 铝制品

Publications (2)

Publication Number Publication Date
CN102691080A CN102691080A (zh) 2012-09-26
CN102691080B true CN102691080B (zh) 2016-08-03

Family

ID=46856811

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201110072038.6A Active CN102691080B (zh) 2011-03-24 2011-03-24 铝制品

Country Status (3)

Country Link
US (1) US20120241324A1 (zh)
CN (1) CN102691080B (zh)
TW (1) TW201239141A (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102896431B (zh) * 2012-10-17 2014-10-15 山东电力集团公司电力科学研究院 一种避免夹渣的提高铝合金激光吸光率的激光焊接方法
CN102864478B (zh) * 2012-10-17 2015-02-25 马炳舵 一种铝制品表面处理工艺
CN104073800B (zh) * 2013-03-25 2017-11-28 联想(北京)有限公司 一种制造方法、壳体及电子设备
CN103276435B (zh) * 2013-05-21 2014-08-06 东莞劲胜精密组件股份有限公司 铝或铝合金表面微纳米加工方法及铝或铝合金结构
JP2015071826A (ja) * 2013-09-09 2015-04-16 日本ケミコン株式会社 アルミニウムの表面処理方法およびアルミニウム表面処理材
RU2569199C1 (ru) * 2014-06-10 2015-11-20 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт авиационных материалов" (ФГУП "ВИАМ") Способ осаждения износостойкого покрытия на алюминиевые сплавы с высоким содержанием кремния
US10151021B2 (en) 2015-09-30 2018-12-11 Apple Inc. Durable cosmetic finishes for titanium surfaces
CN106702198B (zh) * 2016-12-22 2018-05-15 东南大学 一种铝介孔材料及其制备方法
US20190062885A1 (en) * 2017-08-29 2019-02-28 Facebook, Inc. Aluminum alloy having visible grains and aluminum alloy colored by double anodization
CN108893739A (zh) * 2018-06-27 2018-11-27 歌尔股份有限公司 铝合金材料及其制备方法
CN111334749A (zh) * 2018-12-19 2020-06-26 富智康精密电子（廊坊）有限公司 铝合金件的表面处理方法及铝制品
CN109913924B (zh) * 2019-03-15 2020-06-26 安徽华淮新材料有限公司 一种高硅铝合金压铸件阳极氧化方法
CN112342603B (zh) * 2019-08-09 2022-08-02 富联裕展科技(深圳)有限公司 金属制品和金属复合体，及其制备方法
US10842035B1 (en) * 2019-09-05 2020-11-17 Apple Inc. Nitrided titanium surfaces with a natural titanium color
CN112389033A (zh) * 2020-10-10 2021-02-23 厦门大学 一种用于电池封装的彩色铝塑膜及其制备方法
CN115341169A (zh) * 2021-05-14 2022-11-15 北京小米移动软件有限公司 表面处理方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5104484A (en) * 1989-09-18 1992-04-14 Fuji Photo Film Co., Ltd. Method for manufacturing substrates for ps plates
CN101088131A (zh) * 2004-07-23 2007-12-12 桑德夫技术有限公司 具有高蓄能密度和低等效串联电阻的电容器
CN101210340A (zh) * 2006-12-30 2008-07-02 比亚迪股份有限公司 一种电化学蚀刻液及蚀刻方法
CN101676439A (zh) * 2008-09-18 2010-03-24 浙江帝龙新材料股份有限公司 铝带材连续阳极氧化自动生产线

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB453042A (en) * 1934-12-31 1936-09-03 Mallory Patents Holding Compan Improvements in and relating to the etching of metals
US4346128A (en) * 1980-03-31 1982-08-24 The Boeing Company Tank process for plating aluminum substrates including porous aluminum castings
JPS58122724A (ja) * 1982-01-18 1983-07-21 Toshiba Corp 半導体素子の製造方法
JPS591699A (ja) * 1982-06-26 1984-01-07 Mitsubishi Alum Co Ltd アルミニウム又はアルミニウム合金の皮膜生成法
DE59604113D1 (de) * 1996-04-18 2000-02-10 Alusuisse Lonza Services Ag Aluminiumoberfläche mit Interferenzfarben
DE10027932C2 (de) * 2000-05-31 2003-10-02 Infineon Technologies Ag Verfahren zur Bildung eines Kontaktlochs in einer Isolierschicht eines elektronischen oder mikroelektronischen Bauelements
DE20021660U1 (de) * 2000-12-20 2002-05-02 Alanod Al Veredlung Gmbh Verbundmaterial
DE20021657U1 (de) * 2000-12-20 2002-05-02 Alanod Al Veredlung Gmbh Abdeckteil für eine Lichtquelle
US6869671B1 (en) * 2002-06-03 2005-03-22 University Of Notre Dame Enabling nanostructured materials via multilayer thin film precursor and applications to biosensors
US6904935B2 (en) * 2002-12-18 2005-06-14 Masco Corporation Of Indiana Valve component with multiple surface layers
JP2005173120A (ja) * 2003-12-10 2005-06-30 Fuji Photo Film Co Ltd 低反射構造体および低反射構造体の作製方法
US7442491B2 (en) * 2005-03-17 2008-10-28 Fujifilm Corporation Aluminum alloy blank for lithographic printing plate and support for lithographic printing plate
US7575611B2 (en) * 2006-08-09 2009-08-18 Ultracell Corporation Fuel processor for use in a fuel cell system
JP2008126151A (ja) * 2006-11-21 2008-06-05 Alumite Shokubai Kenkyusho:Kk 陽極酸化アルミニウム皮膜を用いた触媒体
JP2008140904A (ja) * 2006-11-30 2008-06-19 Nichicon Corp 電解コンデンサ用アルミニウム電極箔の製造方法
JP2010271029A (ja) * 2009-04-23 2010-12-02 Sumitomo Heavy Ind Ltd 蓄冷式冷凍機、蓄冷式冷凍機用ロータリバルブの製造方法、および蓄冷式冷凍機の製造方法
JP5614960B2 (ja) * 2009-09-03 2014-10-29 東洋アルミニウム株式会社 折り曲げ強度が向上した多孔質アルミニウム材料及びその製造方法
KR101055501B1 (ko) * 2010-02-12 2011-08-08 삼성전기주식회사 인쇄회로기판 및 인쇄회로기판의 제조방법
KR101173060B1 (ko) * 2010-10-11 2012-08-13 현대자동차주식회사 연료전지용 금속분리판 및 그 표면처리방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5104484A (en) * 1989-09-18 1992-04-14 Fuji Photo Film Co., Ltd. Method for manufacturing substrates for ps plates
CN101088131A (zh) * 2004-07-23 2007-12-12 桑德夫技术有限公司 具有高蓄能密度和低等效串联电阻的电容器
CN101210340A (zh) * 2006-12-30 2008-07-02 比亚迪股份有限公司 一种电化学蚀刻液及蚀刻方法
CN101676439A (zh) * 2008-09-18 2010-03-24 浙江帝龙新材料股份有限公司 铝带材连续阳极氧化自动生产线

Also Published As

Publication number Publication date
TW201239141A (en) 2012-10-01
US20120241324A1 (en) 2012-09-27
CN102691080A (zh) 2012-09-26

Similar Documents

Publication Publication Date Title
CN102691080B (zh) 铝制品
CN101962792B (zh) 一种制备孔径可控、通孔阳极氧化铝膜的方法
US20090311516A1 (en) Ti-based composite material and method for making the same
TW201823522A (zh) 用於電鍍黏附之陽極氧化架構
JP2014129601A (ja) ステンレス鋼の表面処理方法及びその方法によって製造されたハウジング
CN103459680A (zh) 模具的制造方法
CN104195569A (zh) 一种镁合金微波组件盖板表面复合处理方法
WO2014158767A1 (en) High purity aluminum top coat on substrate
JP2003510466A5 (zh)
CN106065488A (zh) 一种利用正负脉冲阳极氧化法制备阳极铝箔的方法
CN103345958B (zh) 含反应等离子喷涂纳米TiN中间层的复合电极材料及其制备方法
JP5614671B2 (ja) 酸化被膜及びその形成方法
CN110714219A (zh) 镁合金微弧氧化表面电镀镍的方法
JP2009099853A (ja) 高耐食性ｒ−ｔ−ｂ系希土類磁石
CN110114517B (zh) 在轻合金上生成薄功能涂层的方法
TWI461552B (zh) 製備奈米柱之氧化鋁模板、氧化鋁模板之製備方法及奈米柱之製備方法
JP4248818B2 (ja) 表面処理アルミニウム材料の製造方法
TWI471431B (zh) 鋁製品及其製備方法
JP2003123782A (ja) 燃料電池用セパレータおよびその製造方法、ならびに燃料電池
TW201441427A (zh) 金屬基材之微弧氧化表面處理技術
RU2471020C1 (ru) Способ нанесения медного гальванического покрытия на детали из алюминия и его сплавов
JP4455192B2 (ja) 熱可塑性樹脂被覆アルミニウム板
KR101791506B1 (ko) 내균열성 양극 산화 피막 형성 방법
CN111172578B (zh) 金属制品及其制备方法
JP6352087B2 (ja) 表面処理アルミニウム材及びその製造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20150924

Address after: 518109 Guangdong province Shenzhen city Longhua District Dragon Road No. 83 wing group building 11 floor

Applicant after: SCIENBIZIP CONSULTING (SHEN ZHEN) CO., LTD.

Address before: 518109 Guangdong city of Shenzhen province Baoan District Longhua Town Industrial Zone tabulaeformis tenth East Ring Road No. 2 two

Applicant before: Hongfujin Precise Industry (Shenzhen) Co., Ltd.

Applicant before: Hon Hai Precision Industry Co., Ltd.

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20151130

Address after: 201424 Shanghai city Fengxian District Tuo Village barracks Lin Zhen No. 598 building ninth room 111

Applicant after: Shanghai Lirui Network Technology Co., Ltd.

Address before: 518109 Guangdong province Shenzhen city Longhua District Dragon Road No. 83 wing group building 11 floor

Applicant before: SCIENBIZIP CONSULTING (SHEN ZHEN) CO., LTD.

C41 Transfer of patent application or patent right or utility model
CB03 Change of inventor or designer information

Inventor after: Lv Binggui

Inventor after: Lv Yuanyang

Inventor after: Lin Jia

Inventor after: Lv Yuanzhi

Inventor before: Zhang Xinbei

Inventor before: Chen Wenrong

Inventor before: Jiang Huanwu

Inventor before: Chen Zhengshi

Inventor before: Zhang Chaoyong

COR Change of bibliographic data
TA01 Transfer of patent application right

Effective date of registration: 20160701

Address after: 527500 Guangdong city of Yunfu province Foshan District Yang Yun (Yunfu) industrial transfer Industrial Park No. 41

Applicant after: Guangdong Guangyun New Material Technology Co., Ltd.

Address before: 201424 Shanghai city Fengxian District Tuo Village barracks Lin Zhen No. 598 building ninth room 111

Applicant before: Shanghai Lirui Network Technology Co., Ltd.

C14 Grant of patent or utility model
GR01 Patent grant