CN102096537B - Machining method of capacitive touch screen - Google Patents
Machining method of capacitive touch screen Download PDFInfo
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- CN102096537B CN102096537B CN 201110066869 CN201110066869A CN102096537B CN 102096537 B CN102096537 B CN 102096537B CN 201110066869 CN201110066869 CN 201110066869 CN 201110066869 A CN201110066869 A CN 201110066869A CN 102096537 B CN102096537 B CN 102096537B
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Abstract
The invention discloses a machining method of a capacitive touch screen. A water-soluble shielding film is formed at an electrode outer end region where an indium-tin oxide (ITO) electrode layer and a metal lead electrode layer are connected with a flexible circuit board, a silicon dioxide film is coated, and the shielding film and the silicon dioxide film covered on the shielding film are washed by washing liquor, so that the aim of locally covering the silicon dioxide film is fulfilled. The method is easy to operate. Compared with the conventional method for shielding by using a metal cover, the method has the advantages that: relative displacement of the metal cover and a substrate due to temperature change is avoided in a vacuum sputtering coating process, so that the substrate is prevented from being scratched, pattern accuracy is enhanced, and machining operation is convenient.
Description
[technical field]
The present invention relates to a kind of job operation of capacitive touch screen.
[background technology
Capacitive touch screen is widely used in various information as a kind of emerging input information mode and shows product, such as touch-screen mobile phone, GPS navigation system etc.
The chief component of conventional condenser touch-screen is the metal lead electrode tunic that deposits on the ito transparent electrode film that deposits on substrate, the substrate, the substrate, the silicon dioxide film that covers ito transparent electrode and metal lead electrode layer and the transparent resin film that covers silicon dioxide film.Ito transparent electrode consists of capacitive transducer, metal lead wire couples together directions X ito transparent electrode and flexible circuit board, the ITO electrode tip couples together Y-direction ito transparent electrode and flexible circuit board, and silicon dioxide and resin molding are reliability and the permanance that strengthens touch screen device.Silicon dioxide film will cover protected ito transparent electrode and metal lead electrode layer; the ITO electrode layer is connected the electrode outer end region because being connected with flexible circuit board with the metal lead electrode layer; can not be covered by silicon dioxide film, need to stop by some way in order to avoid covered by silicon dioxide film.
Traditional method is to adopt the local plated film of metal shadowing plate, adding metal before the vacuum sputtering applying silicon oxide covers on the substrate, adopt the sheet metal of hollow out as metal cap, the metal cap contraposition is clung on the substrate, cover zone, metal lead electrode layer outer end, open wide the zone that needs applying silicon oxide.In this method, the thermal expansivity of metal cap and substrate is different, and temperature can change in the vacuum sputtering coating process, just has relative displacement between metal cap and the substrate, thereby can scratch substrate, reduces the pattern precision.
[summary of the invention]
Based on this, be necessary to provide a kind of job operation of avoiding scratching and guaranteeing the condenser type touch screen substrate of pattern precision.
A kind of job operation of capacitive touch screen comprises the steps:
Step 1, provide the substrate that deposits ITO electrode rete and metal lead electrode rete;
Step 2, will cover the electrode outer end region that is connected with flexible circuit board that liquid is uniformly coated on ITO electrode layer and the metal lead electrode layer of described substrate, form water miscible shielding film after the oven dry;
Step 3, the substrate surface formation silicon dioxide film that uses vacuum splashing and plating to obtain in step 2;
Step 4, the substrate that step 3 is obtained use washing lotion to soak or spray, remove described shielding film and cover silicon dioxide film on the described shielding film.
Preferably, in the step 2, the described liquid that covers comprises aqueous solvent, is dissolvable in water water and is used to form the first solute of described shielding film and improves described the second solute that covers the liquid character of surface;
The number percent that the gross mass of described the first solute and described the second solute accounts for solution quality is 5～30%;
Described the first solute and described the second solute mass ratio are 1: 0.1～1: 1.
Preferably, described the first solute is soluble ester or water-soluble sugar.
Preferably, described the first solute is gallicin, alpha-lactose or beta lactose.
Preferably, described the second solute is anionic surface active agent or non-ionics.
Preferably, described the second solute is lauryl sodium sulfate, neopelex, NPE, polysorbas20, polysorbate40 or polysorbate60.
Preferably, to account for the number percent of solution quality be 10～20% to the gross mass of described the first solute and described the second solute;
Described the first solute and described the second solute mass ratio are 1: 0.2～1: 0.8.
Preferably, adopt the mode of serigraphy, letterpress or inkjet printing that the described liquid that covers evenly is coated with in the step 2.
Preferably, in the step 2, described drying condition is 100～150 ℃ to be descended 10～20 minutes.
Preferably, in the step 4, described washing lotion is water or weakly alkaline solution.
The job operation of this capacitive touch screen forms water miscible shielding film by the electrode outer end region that is connected with flexible circuit board at ITO electrode layer and metal lead electrode layer, applying silica film more afterwards, again with washing lotion flush away shielding film and cover silicon dioxide film on the shielding film, to reach the local purpose that covers silicon dioxide film.This method is simple to operate, method with respect to tradition adopts metal cap to cover can not produce relative displacement owing to temperature variation makes between metal cap and the substrate, thereby avoid scratching substrate in the vacuum sputtering coating process, improve the pattern precision, make things convenient for process operation.
[description of drawings]
Fig. 1 is the process flow diagram of job operation of the capacitive touch screen of an embodiment;
Fig. 2 is the synoptic diagram that Fig. 1 shows the capacitive touch screen that process steps S10 obtains.
[embodiment]
Be further described below in conjunction with the job operation of drawings and Examples to capacitive touch screen.
The job operation of capacitive touch screen as shown in Figure 1 comprises the steps:
S10, provide the substrate that deposits ITO electrode rete and metal lead electrode rete
In conjunction with Fig. 2, ITO electrode layer 200 comprises directions X ITO electrode 210, Y-direction ITO electrode 220 and the first electrode outer end 230 that is connected with flexible circuit board; The metal lead electrode layer comprises the link 310 that links to each other with directions X ITO electrode layer 210 and the second electrode outer end 320 that is connected with flexible circuit board.The first electrode outer end 230 and the 320 common electrode outer ends that form, the second electrode outer end.
Wherein, the first electrode outer end 230 and the second electrode outer end 320 can not be covered by silicon dioxide film.
S20, will cover the electrode outer end region that liquid is uniformly coated on described substrate behind S10, form water miscible shielding film after the oven dry
Liquid is covered in preparation, adopts the mode of serigraphy, letterpress or inkjet printing to make to cover liquid to be uniformly coated on 230 zone and 320 zones, the second electrode outer end, the first electrode outer end, forms water miscible shielding film after the oven dry.
Cover liquid and comprise aqueous solvent, be dissolvable in water water and be used to form the first solute of described shielding film and improve described the second solute that covers the liquid character of surface, the number percent that the gross mass of described the first solute and described the second solute accounts for solution quality is 5～30%.
In a preferred embodiment, the number percent that the gross mass of described the first solute and described the second solute accounts for solution quality is 10～20%, and the screening effect of the shielding film that form this moment is better, and conservation.
In the present embodiment, the number percent that the gross mass of described the first solute and described the second solute accounts for solution quality is 15%.
The first solute and the second solute mass ratio can be 1: 0.1～1: 1.
In a preferred embodiment, the first solute and the second solute mass ratio are 1: 0.2～1: 0.8, and the shielding film dispersion effect that form this moment is best.
In the present embodiment, the first solute and the second solute mass ratio are 1: 0.2.
The first solute is used to form and covers rete, the first solute can be after the solvent evaporation, in room temperature to 200 ℃, form even, stable solid rete, can select the organism such as soluble ester or water-soluble sugar, concrete can enumerating such as gallicin, alpha-lactose, beta lactose etc.
In the present embodiment, the first solute is beta lactose.
The first solute adopts water soluble organic substance, and environmental protection is reliable.
The second solute plays to improve and covers the effect of liquid character of surface so that cover liquid can uniform fold at the capacitance touch screen surfaces.
The second solute is typically chosen in anionic surface active agent or non-ionics, concrete can enumerating such as lauryl sodium sulfate, neopelex, NPE, polysorbas20, polysorbate40, polysorbate60 etc.
In the present embodiment, the second solute is lauryl sodium sulfate.
Oven dry is 100～150 ℃ of lower oven dry 10～20 minutes, makes the solvent evaporation of covering in the liquid, and the preliminary crystallization of the first solute also forms even, stable solid rete.
In the present embodiment, oven dry is 120 ℃ of lower oven dry 20 minutes.
S30, usefulness vacuum splashing and plating method form silicon dioxide film at described substrate surface behind S20
In the vacuum splashing and plating process, touch screen base material can vacuumize first and preheat, thereby makes the further crystallization of the first solute and film forming, and film surface has micron-sized micro-crack and roughness.Again at touch screen surface sputter silicon dioxide, the silicon dioxide on shielding film was discontinuous and tomography was arranged do not have the silicon dioxide on the shielding film zone then to form continuous, fine and close rete this moment subsequently.
General, the thickness of silicon dioxide film is 35～65nm; In the present embodiment, the thickness of silicon dioxide film is 50nm.
S40, remove shielding film and cover silicon dioxide film on the shielding film
The preparation washing lotion, the base material that S30 is obtained soaks or spray with washing lotion, silicon dioxide film on the shielding film is discontinuous and tomography arranged, make washing lotion can infiltrate and dissolve shielding film, thereby remove shielding film and cover silicon dioxide film on the shielding film, thereby do not have the silicon dioxide in shielding film zone owing to be that continuous and fine and close rete then can dissolvedly not remain.
Washing lotion can be dissolved the first solute, thereby can dissolve shielding film.
After using washing lotion with the shielding film dissolving, the silicon dioxide film that covers on the shielding film comes off, the silicon dioxide film that directly overlays on directions X ITO electrode 210, Y-direction ITO electrode 220 and the metal lead electrode layer 310 then can not come off, and reaches the local purpose that covers silicon dioxide film.
Washing lotion is water or weakly alkaline solution, and weakly alkaline solution generally can be selected NaHCO
3Solution, Na
2CO
3Solution, KOH solution etc.
In the present embodiment, washing lotion is 0.3% KOH solution.
The job operation of this capacitive touch screen is by forming water miscible shielding film in the electrode outer end, and applying silica film more afterwards is again with washing lotion flush away shielding film and cover silicon dioxide film on the shielding film, to reach the local purpose that covers silicon dioxide film.
This method is simple to operate, method with respect to tradition adopts metal cap to cover can not produce relative displacement owing to temperature variation makes between metal cap and the substrate, thereby avoid scratching substrate in the vacuum sputtering coating process, improve the pattern precision, make things convenient for process operation.
The above embodiment has only expressed one or more embodiments of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (9)
1. the job operation of a capacitive touch screen is characterized in that, comprises the steps:
Step 1, provide the substrate that deposits ITO electrode layer and metal lead electrode layer;
Step 2, will cover the electrode outer end region that is connected with flexible circuit board that liquid is uniformly coated on ITO electrode layer and the metal lead electrode layer of described substrate, form water miscible shielding film after the oven dry; The described liquid that covers comprises aqueous solvent, is dissolvable in water first solute that is used to form described shielding film of water and improves described the second solute that covers the liquid character of surface; The number percent that the gross mass of described the first solute and described the second solute accounts for solution quality is 5～30%; Described the first solute and described the second solute mass ratio are 1:0.1～1:1;
Step 3, the substrate surface formation silicon dioxide film that uses vacuum splashing and plating to obtain in step 2;
Step 4, the substrate that step 3 is obtained use washing lotion to soak or spray, remove described shielding film and cover silicon dioxide film on the described shielding film.
2. the job operation of capacitive touch screen as claimed in claim 1 is characterized in that, described the first solute is soluble ester or water-soluble sugar.
3. the job operation of capacitive touch screen as claimed in claim 2 is characterized in that, described the first solute is gallicin, alpha-lactose or beta lactose.
4. the job operation of capacitive touch screen as claimed in claim 1 is characterized in that, described the second solute is anionic surface active agent or non-ionics.
5. the job operation of capacitive touch screen as claimed in claim 4 is characterized in that, described the second solute is lauryl sodium sulfate, neopelex, NPE, polysorbas20, polysorbate40 or polysorbate60.
6. such as the job operation of each described capacitive touch screen in the claim 1～5, it is characterized in that,
The number percent that the gross mass of described the first solute and described the second solute accounts for solution quality is 10～20%;
Described the first solute and described the second solute mass ratio are 1:0.2～1:0.8.
7. the job operation of capacitive touch screen as claimed in claim 1 is characterized in that, adopts the mode of serigraphy, letterpress or inkjet printing that the described liquid that covers evenly is coated with in the step 2.
8. the job operation of capacitive touch screen as claimed in claim 1 is characterized in that, in the step 2, described drying condition is 100～150 ℃ to be descended 10～20 minutes.
9. the job operation of capacitive touch screen as claimed in claim 1 is characterized in that, in the step 4, described washing lotion is water or weakly alkaline solution.
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| CN 201110066869 CN102096537B (en) | 2011-03-18 | 2011-03-18 | Machining method of capacitive touch screen |
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| CN 201110066869 CN102096537B (en) | 2011-03-18 | 2011-03-18 | Machining method of capacitive touch screen |
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| CN102096537A CN102096537A (en) | 2011-06-15 |
| CN102096537B true CN102096537B (en) | 2013-04-10 |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102253781B (en) * | 2011-08-16 | 2013-09-11 | 深圳市宝明科技股份有限公司 | Metal-bridge integrated capacitive touch screen and manufacturing method |
| CN102289334B (en) * | 2011-08-16 | 2013-01-23 | 深圳市宝明科技股份有限公司 | Indium tin oxide (ITO) through hole capacitance touch screen and method for manufacturing same |
| CN102236492B (en) * | 2011-08-16 | 2012-07-18 | 深圳市宝明科技股份有限公司 | ITO (Indium Tin Oxide) bridge crossing capacitive touch screen and manufacturing method thereof |
| CN102566846B (en) * | 2012-01-19 | 2015-04-22 | 深圳秋田微电子有限公司 | Protection type metal wire of capacitance touch screen |
| CN102662547A (en) * | 2012-04-09 | 2012-09-12 | 天津美泰真空技术有限公司 | Production method for capacitive touch screen glass cover plate without metal wires in view area |
| CN103294309B (en) * | 2013-05-09 | 2017-09-26 | 晟光科技股份有限公司 | A kind of preparation method of OGS touch screen dark border |
| CN107329637A (en) * | 2017-06-14 | 2017-11-07 | 合肥市惠科精密模具有限公司 | A kind of AMOLE method for processing display screen |
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|---|---|---|---|---|
| CN101410779A (en) * | 2006-06-12 | 2009-04-15 | 夏普株式会社 | Touch panel, display device and touch panel manufacturing method |
| CN101464761A (en) * | 2009-01-05 | 2009-06-24 | 中国南玻集团股份有限公司 | Condenser type touch screen |
| CN101853114A (en) * | 2010-05-18 | 2010-10-06 | 程抒一 | Capacitive touch screen with electrodes and manufacturing method thereof |
| CN201654748U (en) * | 2010-04-23 | 2010-11-24 | 新应材股份有限公司 | Capacitor type touch panel |
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2011
- 2011-03-18 CN CN 201110066869 patent/CN102096537B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101410779A (en) * | 2006-06-12 | 2009-04-15 | 夏普株式会社 | Touch panel, display device and touch panel manufacturing method |
| CN101464761A (en) * | 2009-01-05 | 2009-06-24 | 中国南玻集团股份有限公司 | Condenser type touch screen |
| CN201654748U (en) * | 2010-04-23 | 2010-11-24 | 新应材股份有限公司 | Capacitor type touch panel |
| CN101853114A (en) * | 2010-05-18 | 2010-10-06 | 程抒一 | Capacitive touch screen with electrodes and manufacturing method thereof |
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Effective date of registration: 20210707 Address after: 518000 Shekou Industrial six road, Nanshan District, Shenzhen, Guangdong Patentee after: SHENZHEN CSG APPLIED TECHNOLOGY Co.,Ltd. Address before: 518000 south glass industrial building, No.33, Yanshan Road, Shekou, Nanshan District, Shenzhen City, Guangdong Province Patentee before: SHENZHEN CSG DISPLAY TECHNOLOGY Co.,Ltd. |
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