CN101889339A - Substrate transfer apparatus, substrate transfer method and vacuum processing apparatus - Google Patents
Substrate transfer apparatus, substrate transfer method and vacuum processing apparatus Download PDFInfo
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- CN101889339A CN101889339A CN2008801206771A CN200880120677A CN101889339A CN 101889339 A CN101889339 A CN 101889339A CN 2008801206771 A CN2008801206771 A CN 2008801206771A CN 200880120677 A CN200880120677 A CN 200880120677A CN 101889339 A CN101889339 A CN 101889339A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
- B65G49/064—Transporting devices for sheet glass in a horizontal position
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/068—Stacking or destacking devices; Means for preventing damage to stacked sheets, e.g. spaces
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68771—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting more than one semiconductor substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/02—Controlled or contamination-free environments or clean space conditions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/04—Arrangements of vacuum systems or suction cups
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/04—Arrangements of vacuum systems or suction cups
- B65G2249/045—Details of suction cups suction cups
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Provided is a substrate transfer apparatus wherein a carrier for transferring a substrate in the vertical state is reduced in weight. A substrate transfer apparatus (11) for transferring a flat-plate-like substrate (W) to a carrier (23) which transfers the substrate (W) in the vertical state is provided with a placing mechanism (22). The placing mechanism (22) includes a frame (37), which has a rectangular frame body and turns about a turning axis (L) extending in the horizontal direction; a plurality of suction pads (46) arranged on the frame for sucking the substrate (W); and a driving section (35) which turns the frame in a state between the horizontal state and the vertical state. The placing mechanism (22) sucks the substrate (W) in the horizontal state by the suction pads on the frame in the horizontal state, turns the frame from the horizontal state to the vertical state by holding the substrate on the frame, and the substrate (W) in the vertical state is transferred to the carrier (23).
Description
Technical field
The vacuum treatment installation that the present invention relates to base plate transfer device, substrate convey method and possess described base plate transfer device.
Background technology
In the past, have a kind of vacuum treatment installation, it is handled as form the film equal vacuum by the cathode vacuum spraying plating the large-size glass substrate embodiment that is used for flat-panel screens such as LCD.In recent years, as such vacuum treatment installation, many can the employing transmitted substrate and processed continuously, so-called streamline vacuum treatment installation one by one to a plurality of vacuum processing chambers in order to enhance productivity.In addition, for example disclose the carriage that possesses each vacuum processing chamber and rectangular frame-like in patent documentation 1, this carriage is sent to each vacuum processing chamber with substrate with the state that stands vertically.Like this, because carriage is sent to vacuum processing chamber with substrate with the state that stands vertically, even, can also dispose a plurality of carriages simultaneously, thereby enhance productivity so under the situation that substrate is maximized, also can suppress the increase that the space is set of vacuum treatment installation.
Yet in above-mentioned patent documentation 1, in carriage handing-over substrate, autotransmitter will be stored in the preceding substrate of processing in precalculated position and fetch, and it is on the carriage of horizontal state (level) that substrate is placed on down.Then, after remaining on substrate on the carriage, make described carriage turns and upright by rotating mechanism, substrate becomes the state that is maintained on the carriage under the state that stands vertically (plumbness) thus.That is to say that in above-mentioned formation in the past, carriage rotates between level and plumbness.Therefore,, improve its rigidity, will occur the problem of the weight increase of carriage like this thereby the parts that constitute carriage need be thickeied in order to reduce the bending of carriage when rotating.Following problem has appearred in the result: when promptly the manufacturing cost of each carriage increases, because needed electric power increases the problem that causes the substrate production cost increase when rotating bracket or when vacuum processing chamber transmits substrate.
Patent documentation 1: TOHKEMY 2006-114675 communique
Summary of the invention
The invention provides and to make the light-weighted base plate transfer device of carriage, substrate convey method and the vacuum treatment installation that substrate is transmitted with plumbness.
The 1st form of the present invention is a base plate transfer device.Base plate transfer device joins described substrate to the carriage that transmits flat substrate with plumbness, and this base plate transfer device comprises: framework, and it has the framework of rectangle, and the rotation axis that can extend with along continuous straight runs be that rotate at the center; A plurality of suction pads, it is arranged on the described framework, adsorbs described substrate; And drive division, it rotates described framework between level and plumbness, described transfer device is in the described substrate that is in level under the situation of level by described a plurality of suction pads absorption at described framework, under the constant situation of state on the described framework that described substrate is remained on, described framework is rotated to plumbness from level, and the described substrate delivery/reception that will be in plumbness is to described carriage.
The 2nd form of the present invention is a substrate convey method.Join the substrate convey method of described substrate from base plate transfer device to the carriage that transmits flat substrate with plumbness, may further comprise the steps: the framework that will have a plurality of suction pads in described base plate transfer device maintains level, is in the described substrate that is in level under the situation of level with described a plurality of suction pads absorption at described framework; Under the constant situation of state on the described framework that described substrate is remained on, described framework is rotated to plumbness from level; The described substrate delivery/reception that will be in plumbness is to described carriage.
The 3rd form of the present invention is a vacuum treatment installation.Vacuum treatment installation comprises: vacuum processing chamber, and it carries out vacuum treatment to flat substrate; Carriage, it transmits with plumbness described substrate to described vacuum processing chamber; And base plate transfer device, it joins described substrate to described carriage, described base plate transfer device comprises: transfer device and control device, and it comprises transfer device: rotation axis framework, that can extend with along continuous straight runs with rectangle is the framework that rotate at the center; Be arranged on the described framework, adsorb a plurality of suction pads of described substrate; And the drive division that described framework is rotated between level and plumbness, control device is controlled described drive division and described a plurality of suction pad, described transfer device is in the described substrate absorption that will be in level under the situation of level by described a plurality of suction pads at described framework, under the constant situation of state on the described framework that described substrate is remained on, described framework is rotated to plumbness from level, and the described substrate delivery/reception that will be in plumbness is to described carriage.
Description of drawings
Fig. 1 is the summary pie graph of vacuum treatment installation.
Fig. 2 is the summary pie graph of base plate transfer device.
Fig. 3 is the right hand view that shows the summary formation of transfer device.
Fig. 4 is the plane graph that shows the summary formation of transfer device.Fig. 5 is the front elevation that shows the summary formation of transfer device.
Fig. 6 is the front elevation that shows the summary formation of carriage.
Fig. 7 shows the schematic diagram that is formed on the binding domain on the framework.
Fig. 8 is the sectional view that reality is inhaled the summary formation of pad.
Fig. 9 (a)-(e) is the action specification figure that shows to the action of carriage handing-over substrate.
Figure 10 (a)-(d) shows the action specification figure that accepts the action of substrate from carriage.
Embodiment
Below, describe with reference to the vacuum treatment installation 1 of accompanying drawing an execution mode.As an example, this vacuum treatment installation 1 is embodied in substrate is sent to a plurality of vacuum processing chambers and vacuum treatment installation processed continuously, so-called streamline one by one.
1 pair of vacuum treatment installation as shown in Figure 1 is used for the large-size glass substrate (for example on one side more than 2m) of flat-panel screens such as LCD, implements by processing such as cathode vacuum spraying plating formation films.
Fig. 2 shows the summary pie graph of base plate transfer device 11.Base plate transfer device 11 possesses from conveyer 21 accepts transfer device 22 substrate, loading usefulness, the substrate of conveyer 21 before glass substrate is made the upstream side transmission processing of streamline.Transfer device 22 and transmit road 12 relative configurations joins substrate on carriage 23.And upstream side conveyer 21 is made of the roller type conveyer.In addition, base board delivery device 11 possesses the transfer device 25 of illusory box 24 and unloading usefulness, illusory box 24 disposes and accommodates test base side by side along transmitting road 12 and transfer device 22, and transfer device 25 disposes side by side with illusory box 24 and has and the unloading transfer device 25 that loads with transfer device 22 identical formations along transmitting road 12.And illusory box 24 possesses the roller type connecting gear that transmits test base between transfer device 22,25.Disposing downstream side connecting gear 26 across opposition side transfer device 25, that transmit road 12, the substrate after this connecting gear 26 is accepted to handle from transfer device 25, the downstream side of making streamline at glass substrate transmits this substrate.That is to say that vacuum treatment installation 1 constitutes in the present embodiment, substrate delivery/reception is given carriage 23 and accepted vacuum treatment installation substrate, a through type of what is called by the transfer device 25 of unloading usefulness from carriage 23 by the transfer device 22 that loads usefulness.Upstream side conveyer 21, transfer device 22, carriage 23, illusory box 24, transfer device 25 and downstream conveyer 26 are connected on the control device 18, and its action is controlled by this control device.And downstream conveyer 26 is made of the roller type conveyer.In addition, being housed in test base in the illusory box 24 is used for confirming whether to have formed desirable film under the situation of the membrance casting condition that changes vacuum processing chamber 15-17 or during the startup at device.
Fig. 3 has shown that the transfer device 22 of loading usefulness and the summary of carriage 23 constitute.And, in Fig. 3, only shown the part of transfer device 22 for the ease of understanding.In addition, because the transfer device 25 of unloading usefulness has the formation same with the transfer device 22 that loads usefulness, so omit its explanation.Transfer device 22 possesses housing 31, and this housing 31 has tetragonal base plate 32.On negative 32, stand and be provided with a plurality of cramp bars 33, be provided with flat top board 34 in the upper end of this cramp bar 33.That is to say that housing 31 forms the rectangular-shaped of lateral opening.On the drive division 35 that is disposed on the base plate 32, be provided with framework 37 by support unit 36, this framework 37 is positioned at the top of top board 34.By drive division 35, support unit 36 and framework 37 can fall to horizontal state (hereinafter referred to as level) and rotation between erecting to vertical state (hereinafter referred to as plumbness) around the rotation axis L that along continuous straight runs (direction vertical with paper) extends.In addition, support unit 36 and framework 37 are driven portion's 35 supportings, can move forward and backward for carriage 23 along continuous straight runs (being left and right directions in Fig. 3) hereinafter referred to as the y direction, and can be vertically (in Fig. 3, being above-below direction) hereinafter referred to as the z direction move up and down.Rotation axis L is configured on the support unit 36.Support unit 36 with rotation axis L be the center words that are driven portion 35 and rotate, framework 37 just and support unit 36 rotate together.Drive division 35 is connected on the control device 18, and the rotation mobile and rotation axis L of framework 37 on y direction and z direction controlled by this control device.And drive division 35 constitutes the ball screw framework etc. of ball-screw moving linearly by for example rotating quill shaft by motor.
As shown in Figure 4, framework 37 has framework, and this framework is by the last side frame 41 that is arranged in upside with plumbness, be arranged in the right frame 43 (is the right side at Fig. 4) of a client link of the following side frame 42 of downside, the end that will go up side frame 41 and following side frame 42 and will go up the other end of side frame 41 and left frame 44 (be the left side at Fig. 4) formation that the other end of following side frame 42 connects with plumbness.In addition, in the present embodiment, framework 37 is configuration abreast between right frame 43 and left frame 44, possesses many (being 4 in the present embodiment) the bar portions 45 of going up side frame 41 and following side frame 42 that connect.So framework 37 forms lattice-shaped.Last side frame 41, down side frame 42, right frame 43, and left frame 44 on be provided with a plurality of suction pads 46.Inhale pad 46 and be connected on the control device 18, have the function that holds substrate W.
In transfer device 22, the substrate W that supplies with from upstream side conveyer 21 is transmitted by the last side frame 41 downward side frames 42 (being to downside from upside among Fig. 4) from framework 37.In addition, the test base of supplying with from illusory box 24 is by from left frame 44 side frame 43 (be from the left side to the right among Fig. 4) transmission to the right.Carry out and send into operating under the situation that framework 37 is in level of substrate (and send substrate from framework 37) to framework 37.Inboard in the framework of framework 37 is provided with a plurality of the 1st transport units 47 and a plurality of the 2nd transport unit 48, the 1st transport unit 47 will be supplied with the substrate W that comes from upstream side conveyer 21 and transmit above framework 37, and the 2nd transport unit 48 will be supplied with the test base that comes from illusory box 24 and transmit above framework 37.The the 1st and the 2nd transport unit 47,48 also can be respectively one.In the present embodiment, delivery unit is made of the 1st and the 2nd transport unit 47,48.On each the 1st transport unit 47, on the y direction, dispose a plurality of rollers, these rollers can rotate along y direction (being above-below direction in Fig. 4).That is, the 1st transport unit 47 is by substrate being constituted along the roller type conveyer that the y direction transmits.The 1st transport unit 47 between right frame 43 and the bar portion 45, and bar portion 45 and left frame 44 between, equally spaced dispose along x direction (be left and right directions in Fig. 4) is approximate.On the other hand, on each the 2nd transport unit 48, dispose along the rotary a plurality of rotors of x direction along the x direction.That is, the 2nd transport unit 48 is by substrate being constituted along the roller type conveyer that the x direction transmits.The 2nd transport unit 48 is between last side frame 41 and following side frame 42, along the approximate equally spaced configuration of y direction.
As shown in Figure 5, in the present embodiment, the base 49 that supports each the 1st transport unit 47 is fixed on the top board 34 of housing 31, and thus, each the 1st transport unit 47 is set as irremovable form on the z direction.Connect mutually with the 1st driver 50 on the top board 34 that is fixed in housing 31 and support the base 51 of each the 2nd transport unit 48.So each the 2nd transport unit 48 is set as the form that can be moved by the 1st driver 50 on the z direction.The 1st transport unit the 47, the 2nd transport unit 48 and the 1st driver 50 are connected on the control device 18, and its action is controlled by this control device.And in the present embodiment, when the 1st transport unit 47 was supported by the upright column support unit of being located on the base 49 of quilt, the 2nd transport unit 48 was by being supported by the upright column support unit that is located on the base 51.Base 51 forms lattice-shaped so that each the 2nd transport unit 48 is connect, and is disposed between the support unit of supporting the 1st transport unit 47.So base 51 can move in the situation lower edge z direction of not interfering with the 1st transport unit 47.The 1st driver 50 is the same with drive division 35, is made of motor, ball-screw etc.
In addition, as shown in Figure 4, in the inboard of the framework of framework 37, be provided with the dipping needle 52 of a plurality of needle-likes, the substrate W that these dipping needles 52 will be sent on the framework 37 lifts.A plurality of dipping needles 52 are configured to lattice-shaped, and being spaced apart of adjacent dipping needle 52 is similar to uniformly-spaced.As shown in Figure 5, support the base 54 of each dipping needle 52 and connect mutually with the 2nd driver 53 on the top board 34 that is fixed on housing 31, each dipping needle 52 can move on the z direction simultaneously thus.In addition, in the outside of framework 37 and in the outer peripheral edges of top board 34, be provided with a plurality of (each 2 on every in the present embodiment limit) adjusting needle 56 (with reference to Fig. 4) by the 3rd driver 55.Each the 3rd driver 55 constitutes and alignment pins 56 can be moved on the z direction, can also move on x direction and y direction.Specifically, the alignment pins 56 that is located at the side frame 41 and following side frame 42 outsides is set as the form that can move on z direction and y direction, and the alignment pins 56 that is located at the outside of right frame 43 and left frame 44 is set as the form that can move on z direction and x direction.In addition, the 2nd and the 3rd driver 55 is connected on the control device 18, and its action is by these control device 18 controls.And in the present embodiment, base 54 forms lattice-shaped so that each dipping needle 52 is connect, and it is configured between the support unit that supports the 1st transport unit 47, reaches between the support unit of supporting the 2nd transport unit 48.So base 54 (being each dipping needle 52) can move on the z direction under the situation of not interfering with the 1st and the 2nd transport unit 47,48.A plurality of alignment pins 56 can move independently of each other.The the 2nd and the 3rd driver 53,55 is the same with drive division 35, is made of motor, ball-screw etc.
As shown in Figure 3, carriage 23 moves on transmission road 12 under plumbness.As shown in Figure 6, carriage 23 forms rectangular box-like, and the wall ratio outer peripheral edges 62 of its inner peripheral 61 are thinner.In addition, on the opposite face (being the substrate supporting face) of, carriage 23 37 that face mutually, be formed with the recess 63 of four frame shapes with the framework of the transfer device 22 that turns to plumbness.Be fixed with substrate receiving portion 64 in this recess 63, this substrate receiving portion 64 has 2 side portion (left lateral, the right portion) and following portion, and forms the width form littler than the width of inner peripheral 61.This substrate receiving portion 64 can with substrate W mounting under the state of the upper surface of substrate receiving portion 64 following portions (mounting surface 65), W accommodates with this substrate.That is, substrate W is positioned on the mounting surface 65 and is housed in the carriage 23.Substrate receiving portion 64 is formed by Vespel resin materials such as (registered trade marks).
On carriage 23, be provided with a plurality of anchor clamps 66, this anchor clamps 66 be positioned on the mounting surface 65 substrate W card and, thereby substrate W can be remained on the carriage 23.Specifically, the base end part of each anchor clamps 66 is installed on the outer peripheral edges 62 on each limit that is positioned at carriage 23, and its top ends is more outstanding to the inside than the interior Zhou Duangeng of substrate receiving portion 64.Each anchor clamps 66 are set as and can are falling to the state parallel with carriage 23 and uprightly rotate between for the state vertical with carriage 23.Further, be formed with jut 67 in the bottom of carriage 23.Jut 67 is clamped in when being located at the fixture (diagram is slightly) that transmits on the road 12, carriage 23 just on the x direction on transmission road 12 with the aligned in position of transfer device 22.
As shown in Figure 3, be provided with photoelectric sensor 68 between transfer device 22 and carriage 23, this photoelectric sensor 68 detects the position of mounting surface 65 on the z direction.As photoelectric sensor 68 controlled devices 18 controls of position transducer, the position of mounting surface 65 is exported to this control device 18.And photoelectric sensor 68 is made of for example multi-beam photoelectric sensor, and this multi-beam photoelectric sensor is included in the single unit light-projecting component/receipts optical element many.Many light-projecting component/receipts optical element is configured to row in multi-beam photoelectric sensor, makes a plurality of optical axises arrange with linearity.Launch and received by the receipts optical element of correspondence from each light-projecting component by the light of carriage 23 and 64 reflections of substrate receiving portion.Control device 18 detects the change in location of substrate receiving portion 64 on the z direction by detecting each variation of receiving the receipts light quantity of optical element.
As shown in Figure 7, under side frame on the framework 37 41 reaches, be respectively equipped with 12 on the side frame 42 and inhale pad 46, fill up 46 and on right frame 43 and left frame 44, be respectively equipped with 5 suctions.So, on the framework of the rectangle of framework 37, be equipped with 34 and inhale pad 46.In the present embodiment, on framework 37, be set with a plurality of binding domains (for example 4 regional 71-74) for substrate W.At least contain 1 at each binding domain and inhale pad 46.In the case, the suction pad 46 that is contained in identical binding domain is supplied with identical negative pressure by (simultaneously), and the negative pressure of each binding domain can be controlled independently of each other.
Specifically, dividing on framework 37 has, and is set in upside master binding domain 71 on the part (top portion) of side frame 41, is set in down downside master binding domain 72 on the part (following portion) of side frame 42, is set in the auxiliary binding domain 73 in right side on the part (the right portion) of right frame 43 and is set in the auxiliary binding domain 74 in left side on the part (left lateral) of left frame 44.Preferably, upside master binding domain 71 position is in the central cut apart, thereby is made of the 1st upside master binding domain 75 and the 2nd upside master binding domain 76 as cut zone respectively.In the case, on each zone 75,76, dispose 1 at least respectively and inhale pad 46 (in Fig. 7, for example disposing 6 respectively in each zone 75,75).In addition, preferably, downside master binding domain 72 also in the central the position cut apart, thereby constitute by the 1st downside master binding domain 77 and the 2nd downside master binding domain 78 as cut zone respectively.In the case, on each zone 77,78, also dispose 1 at least and inhale pad 46 (in Fig. 7, in each zone 75,76, for example disposing 6 respectively).So, in the present embodiment, on framework 37, be set with 6 binding domain 73-78 that contain 4 cut zone 75-78.In addition, 6 pipeline 79a-79f in framework 37, have been extended, these pipelines 79a-79f is used for supplying with negative pressure to the suction pad 46 that is included in each binding domain 73-78, and is connected on the common negative pressure source 81 by being provided in framework 37 6 outer valve 80a-80f respectively.Thus, the independent mutually control of the negative pressure of binding domain 73-78 can both hold substrate W on each binding domain.In addition, on pipeline 79a-79f, be respectively equipped with vacuum transducer 82a-82f and measure the interior pressure of each pipeline 79a-79f.Valve 80a-80f, negative pressure source 81 and vacuum transducer 82a-82f are connected on the control device 18, and its action is by these control device 18 controls.
And in the present embodiment, substrate W by any one situation about holding in any one and the 1st downside master binding domain 77 and the 2nd downside master binding domain 78 in the 1st upside master binding domain 75 and the 2nd upside master binding domain 76 under, substrate W can be held and can not fall from framework 37.
As shown in Figure 8, inhale efferent duct 91 that pad 46 possesses the negative pressure of being supplied to, be installed in the top of efferent duct 91 and be the pad portion 92 of accordion-like and be installed in the top (in Fig. 8, being the lower end) of pad portion 92 and have attachment members 93 with the abutting part of substrate W butt.Attachment members 93 is formed by resin material, and this resin material is for example by PEEK (polyether-ether-ketone; Polyl Ether Ether Ketone) formation such as.In the present embodiment, inhale pad 46 and constitute, efferent duct 91 can suction pad axially that move, that have so-called buffer.Specifically, efferent duct 91 have the 1st 94 of hollow form and be inserted in the 1st 94 in the 2nd 95 of hollow form, the direction of principal axis middle position at the 1st 94 inner peripheral surface has extended flange part 96 to radially inner side.In addition, in the 1st 94, between flange part 96 and the 2nd 95, be situated between helical spring 97 is housed.Constitute based on this, inhale pad 46 and can move to the direction vertical with the substrate supporting face of framework 37.And encapsulant (diagram is slightly) is housed owing between the 1st 94 and the 2nd 95, be situated between, the air-tightness in the efferent duct 91 are held, and make the 2nd 95 and can not fly out from the 1st 94.
Then, the substrate W that will send from upstream side with reference to Fig. 9 explanation is by from the action when carriage 23 handing-over of the transfer device 22 that loads usefulness.
With substrate W before carriage 23 handing-over, the jut 67 of carriage 23 is transmitted fixture (diagram the is slightly) clamping on road 12.As a result, the aligned in position of the carriage 23 that does not keep substrate W and the transfer device 22 that loads usefulness and stopping.At this moment, in transfer device 22, dipping needle 52 and alignment pins 56 are positioned at the position of more leaning on the below than the 1st transport unit 47.And owing to the 2nd transport unit 48 will not used when carriage 23 joins by the substrate W that transmits from upstream side conveyer 21, and be in the invariant position that more leans on the below than the 1st transport unit 47, so in Fig. 9, omit the 2nd transport unit 48.
Shown in Fig. 9 (a), the alignment pins 56 (being the left side among the figure) that only is located at down side frame 42 outsides is more outstanding than the 1st conveying unit 47, under this state, supply with the substrate W that comes from upstream side conveyer 21 and be sent to the position of more leaning on the top than framework 37 by the 1st transport unit 47.The substrate W that is transmitted by the 1st transport unit 47 stops by alignment pins 56 butts with the outside that is located at down side frame 42.
Then, shown in Fig. 9 (b), thereby dipping needle 52 rises to the position supporting substrates W that more leans on the top than the 1st transport unit 47, and meanwhile, the alignment pins 56 that is located at side frame 41, right frame 43 and left frame 44 outsides respectively rises.And in Fig. 9 (b), only shown the alignment pins 56 (being the right side among the figure) in the outside of last side frame 41 and the alignment pins 56 (being the left side among the figure) in following side frame 42 outsides.Then, on x direction or y direction, move, carry out the relative position alignment of framework 37 and substrate W by each alignment pins 56.
After finishing the relative position alignment of framework 37 and substrate W, then shown in Fig. 9 (c), framework 37 rises and holds substrate W by inhaling pad 46, and dipping needle 52 and alignment pins 56 descend.
Beginning to hold substrate W through after the scheduled time from inhaling pad 46, whether control device 18 becomes below the predetermined value the pressure of each pipeline 79a-79f, promptly the absorption affinity that is included in the suction pad 46 among each binding domain 73-78 is judged.At this moment, if exist pressure not become the following pipeline of predetermined value, control device 18 cuts out the valve corresponding with this pipeline, stops to be included in the absorption action of the suction pad 46 in the corresponding binding domain.Then, control device 18 only holds substrate W by being connected the suction pad 46 that pressure becomes in the binding domain on the pipeline below the predetermined value.At this moment, substrate W by the situation of any 1 absorption in any 1 and the 1st downside master binding domain 77 and the 2nd downside master binding domain 78 in the 1st upside master binding domain 75 and the 2nd upside master binding domain 76 under, control device 18 is judged as and can keeps substrate W and carry out next one action.On the contrary, owing to reasons such as breaking of substrate W, make that control device 18 is judged as and can not keeps substrate W and change substrate W under the situation that substrate W only holds by the auxiliary binding domain 74 in for example left side.
Then, shown in Fig. 9 (d), framework 37 is that the center turns to plumbness from level with the rotation axis L of support unit 36.Further, framework 37 keeps plumbness to move to z direction and y direction according to the height by photoelectric sensor 68 detected mounting surfaces 65, with under the mounting surface 65 contacted states W is not moved in the recess 63 of carriage 23 in the lower end that makes substrate W.And in the present embodiment, framework 37 moves to substrate W the position that exceeds preset distance H (being 2mm in the present embodiment) than mounting surface 65.
Then, anchor clamps 66 fall down to the state parallel with carriage 23 and with substrate W card and after, be disengaged based on the vacuum suction of inhaling pad 46.So, shown in Fig. 9 (e), substrate W falls naturally and is positioned on the mounting surface 65 of substrate receiving portion 64, and substrate W is handed off in the substrate receiving portion 64 of carriage 23.
And substrate was sent to situation on the transfer device 22 from illusory box 24 under, the 2nd transport unit 48 was positioned at than the 1st transport unit 47 more by the position of top, moved to than the 2nd transport unit 48 more by the position of top than right frame 43 alignment pins 56 more in the outer part.Under this state, test base by the 2nd transport unit 48 from left frame 44 to the right side frame 43 transmit.Afterwards, the registration process of framework 37 and the relative position of test base, and identical to the processing (Fig. 9 (b)-Fig. 9 (e)) that substrate W is carried out of the processing of carriage 23 handing-over test bases and above explanation from framework 37.
Then, will be by the action of the substrate W of vacuum treatment with reference to Figure 10 explanation from carriage 23 acceptance by the transfer device 25 of unloading usefulness.And on the transfer device 25 of unloading usefulness shown in Figure 10, pay with identical symbol for the component part identical with the transfer device 22 that loads usefulness.
In transfer device 25, before the substrate W that accepts from carriage 23, the jut 67 of carriage 23 is transmitted fixture (diagram slightly) clamping on road 12.Thus, transmission is stopped with the aligned in position of the transfer device 25 of unloading usefulness by the carriage 23 of the substrate W of vacuum treatment.At this moment, in transfer device 25, dipping needle 52 and alignment pins 56 are positioned at the position of more leaning on the below than the 1st transport unit 47.And because the 2nd transport unit 48 is not used when sending substrate W by carriage 23 downward right side conveyers 26, more can lean on the state of position of below constant and remain in than the 1st transport unit 47, so in Figure 10 omission the 2nd transport unit 48.
Under this state, shown in Figure 10 (a), framework 37 erects and is plumbness, with inhaling the adsorption plane Wa that pad 46 holds the substrate W that remains plumbness in carriage 23.At this moment, rotation axis L than framework 37 on the position of carriage 23, be positioned at than the mounting surface 65 of substrate receiving portion 64 more by the position of downside.In order to realize this position relation, for example support unit 36 can be formed section as shown in figure 10 and be the L font.Then, anchor clamps 66 turn to vertical state from the state parallel with respect to the substrate supporting face of carriage 23, remove the maintenance to substrate W.Then, framework 37 is that fulcrum turns to level from plumbness with rotation axis L.As a result, substrate W is supported with level by framework 37 being in to be inhaled under the constant situation of states that pad 46 keeps.
When substrate W being inhaled on suction pad 46, begin to adsorb substrate W through after the scheduled time from inhaling pad 46, control device 18 will cut out with the corresponding valve of pipeline in pipeline 79a-79f, that pressure does not become below the predetermined value, only hold substrate W by being connected the suction pad 46 that pressure becomes on the pipeline below the predetermined value.
In addition, as mentioned above, when framework 37 absorption is maintained at substrate W carriage 23 in, rotation axis L than framework 37 on the position of carriage 23, and be positioned at the position of more leaning on downside than the mounting surface 6 of substrate receiving portion 64.Therefore, behind absorption substrate W, only by the rotation of framework 37, the non-adsorption plane Wb of substrate W just moves from the state that is supported by carriage 23, makes the upper end of substrate W and lower end respectively along arrow Y1, and the form shown in the Y2 moves.So, framework 37 from plumbness when level is rotated, even do not make framework 37 move up and down and move horizontally, can prevent that also substrate W from touching carriage 23 (for example mounting surface 65 etc.) and damage.
Then, shown in Figure 10 (b), under the state of maintenance substrate W above the 1st transport unit 47, be disengaged based on the absorption of inhaling pad 46 at the framework 37 that turns to level.Then, shown in Figure 10 (c), when dipping needle 52 rose to the top of framework 37 and supporting substrates W, each alignment pins 56 rose to its outside with what do not contact with substrate W in form.Then, each alignment pins 56 is carried out the relative position alignment of framework 37 and substrate W by moving on x direction or y direction.
Then, shown in Figure 10 (d), framework 37, dipping needle 52 and alignment pins 56 drop to the position of more leaning on the below than the 1st transport unit 47, and substrate W is positioned on the 1st transport unit 47.Then, by the driving of the 1st transport unit 47, substrate W is sent to downstream conveyer 26 from transfer device 25.
So,,, can realize the lightweight of carriage 23 like this so improve its rigidity with regard to not needing to constitute the parts thickening of carriage 23 owing to can not make carriage 23 between level and plumbness, rotate (that is, it is constant that carriage 23 is maintained at plumbness).
The base plate transfer device 11 of present embodiment has the following advantages.
(1) base plate transfer device 11 possesses the control device 18 of transfer device 22 and control transfer device 22, transfer device 22 comprise framework with rectangle and with rotating form is extended by along continuous straight runs and the rotation axis L parallel with framework supported framework 37; Be configured on the framework 37 and adsorb a plurality of suction pads 46 of substrate W; And the drive division 35 that framework 37 is rotated between level and plumbness.Transfer device 22 is adsorbed on substrate W on the framework 37, and makes framework 37 turn to plumbness, and the substrate W that will be in plumbness is handover to carriage 23.This carriage 23 transmits substrate W with plumbness.So,, do not improve its rigidity so do not need to constitute the parts thickening of carriage 23, thereby can realize the lightweight of carriage 23 owing to when substrate W is handover to substrate W, carriage 23 is not rotated between level and plumbness.As a result, when can make the manufacturing cost reduction of each carriage 23, can also be reduced in needed electric power when transmitting carriage 23.So, can reduce the production cost of substrate W.In addition, owing to substrate W is rotated by 37 of frameworks, so the situation of the carriage turns that keeps substrate W was compared, can reduce needed electric power when level becomes plumbness effectively, thereby can reduce the production cost of substrate W substrate W.
(2) transfer device 22 will be remained on plumbness after substrate W on the carriage 23 is adsorbed on the framework 37 that is in plumbness, framework 37 be rotated be level.So,, do not improve its rigidity so do not need to constitute the material thickening of carriage 23 owing to when carriage 23 is accepted substrate W, carriage 23 is not being rotated between level and plumbness.So can be with carriage 23 lightweights.
(3) transfer device 22 possesses the framework inboard that the 1st transport unit 47, the 1 transport units 47 are configured in the framework 37 of level, will transmit at framework 37 from the substrate W that upstream side conveyer 21 is supplied with level.Therefore, be taken into and compare, do not need to dispose the space of autotransmitter, can save the space in the situation of framework 37 transmission with substrate W before like that autotransmitter will be handled from outside connecting gear in the past.
(4) if inhaling pad 46 begins to adsorb after the substrate W, the pressure in the pipeline 79a-79f does not become below the predetermined value in the given time, and the valve 80a-80f that control device 18 will be located on this pipeline closes.So,, inhale pad 46 by each and still can adsorb substrate W with the binding domain that substrate W connects airtight even the binding domain of the suction pad 46 that can not connect airtight with substrate occurs comprising because of substrate W crooked or damaged.Therefore, can reduce, under situation such as the bending of substrate W is bigger, make the situation on the framework 37 of substrate W integral body can not being remained on owing to the part that can not adsorb substrate W.
(5) since inhale pad 46 on framework 37, be configured to rectangular box-like, so the outer peripheral edges of substrate W be adsorbed, thereby can reduce the degree of crook of this substrate W.As a result, for example compare with the situation that lattice-shaped is provided with suction pad 46, can reduce the quantity of inhaling pad 46 with inboard at framework 37.In the case, framework 37 1 becomes plumbness, most of weight of substrate W just acts on side frame 41 and the following side frame 42, and the suction pad 46 that substrate W is arranged on side frame 41 and the following side frame 42 (upside master binding domain 71 and downside master binding domain 72) holds and is maintained on the framework 37.Therefore, if, just be difficult to substrate W is remained on the framework 37 for example being located at upside master binding domain 71 and downside master binding domain 72 can not hold substrate W because the degree of crook of substrate W makes more greatly.About this point, in the present embodiment, inhale pad 46 and be arranged on the framework 37, on framework 37, be formed with a plurality of binding domains that constitute by upside master binding domain 71, downside master binding domain 72, the auxiliary binding domain 73 in right side, the auxiliary binding domain 74 in left side.Further, when upside master binding domain 71 was made of the 1st upside master binding domain 75 and the 2nd upside master binding domain 76, downside master binding domain 72 was made of the 1st downside master binding domain 77 and the 2nd downside master binding domain 78.Therefore, promptly use the 1st upside master binding domain 75 can not hold substrate W,, just substrate W can be remained on the framework 37 holding under the situation of substrate W by the 2nd upside master binding domain 76.Therefore, when can cut down the number of inhaling pad 46, can also reduce under the situations such as degree of crook at substrate W is bigger, owing to the part that can not hold substrate W makes the situation on the framework 37 of substrate W integral body can not being remained on.
(6) transfer device 25 is when framework 37 is under the situation of plumbness the substrate W that holds and accept by a plurality of suction pads 46 to remain on plumbness on the carriage 23, rotation axis L than framework 37 further from carriage 23, and than the mounting surface 65 of carriage 23 more by downside.Therefore, when framework 37 is rotated, when framework 37 moves to than mounting surface 65 more by the top, move to the direction of leaving carriage 23.So, do not need framework 37 is moved vertically to than mounting surface 65 more by the top, or it moved horizontally to the direction of leaving carriage 23.As a result, as long as framework 37 is rotated, just can be in damaged preventing substrate W contact mounting surface 65 grades, the hold mode of substrate W is become level from plumbness.
(7) framework 37 can keep under the constant situation of plumbness, and is mobile on z direction and y direction according to the position of the mounting surface 65 that is detected by photoelectric sensor 68.So can control framework 37 move so that remain on the lower end of the substrate W on the framework 37 of plumbness when not contacting with mounting surface 65 accommodated substrate W in the recess 63 of carriage 23.Therefore,, make under the situation that the height of mounting surface 65 changes, also can be under the situation that does not make substrate W breakage it be handover to carriage 23 thereby make carriage 23 that thermal expansions take place even at heated substrates W in order to form uniform film.
And above-mentioned execution mode also can be implemented by following form.
For example also can be not with the 1st transport unit 47, the 2nd transport unit 48 and dipping needle 52 are configured in the inboard of framework 37, and be configured to the outside of framework 37 according to these members of big young pathbreaker of substrate W, can also also dispose these members except framework 37 inboards are configured in the outside of framework 37.Thus, even under the size of the substrate W situation bigger, also can send it to reliably on the framework 37 than framework 37.
As long as the 2nd transport unit 48 can move, the 2nd transport unit 48 can be set in any way on the z direction under the situation of not interfering with the 1st transport unit 47.For example also can by different drivers each the 2nd transport unit 48 be moved on the z direction respectively.Similarly, not dipping needle 52 must be bearing on the base 54.As long as can under the situation of not interfering with the 1st and the 2nd transport unit 47,48, on the z direction, move, can dipping needle 52 be set with arbitrary form.
Also can be without the roller type conveyer, and constitute the 1st and the 2nd transport unit 47,48 with for example belt conveyer.
Also can adopt the formation that Electrostatic Absorption substrate W was filled up and passed through in the static suction is set on framework 37, replace by also passing through the formation of vacuum suction substrate W to inhaling pad 46 supply negative pressure.
Can pipeline 79a-79f be connected on the common negative pressure source 81 yet, but each pipeline 79a-79f is connected respectively on the different negative pressure sources.
Can be not yet with a plurality of suction pads 46 with on the rectangular box-like framework that is configured in framework 37, and it is configured in the bar portion 45 with lattice-shaped, perhaps except a plurality of suction pads 46, also in bar portion 45, inhaling pad 46 with rectangular box-like configuration on the framework of framework 37 with the lattice-shaped configuration.
Also can adopt the line of a plurality of PEEK of executing coatings to replace connecting the last side frame 41 of framework 37 and many bar portions 45 of following side frame 42.Thus, and compare, can make the framework lightweight with the situation of bar portion 45.
Not that framework 37 height according to the mounting surface 65 that is detected by photoelectric sensor 68 under plumbness is moved on the z direction.For example also can when carrying out the aligned in position of framework 37 and substrate W, carry out aligned in position according to mounting surface 65 height that detect by photoelectric sensor 68 by alignment pins 56 in advance.
Also can be without photoelectric sensor 68, and infer the position of the mounting surface 65 of expanded by heating influence according to the temperature of the carriage 23 that detects by temperature sensor.
On framework 37, be formed with 6 binding domains that constitute by the 1st upside master binding domain the 75, the 2nd upside master binding domain the 76, the 1st downside master binding domain the 77, the 2nd downside master binding domain 78, the auxiliary binding domain 74 of auxiliary binding domain 73 in right side and left side, but be not limited in this, binding domain can be formed with arbitrary form.
Base plate transfer device 11 also can not possess illusory box 24.
Claims (15)
1. base plate transfer device joins described substrate to the carriage that transmits flat substrate with plumbness, it is characterized in that, comprising:
Framework, it has the framework of rectangle, and the rotation axis that can extend with along continuous straight runs is that rotate at the center;
A plurality of suction pads, it is arranged on the described framework, adsorbs described substrate;
And drive division, it rotates described framework between level and plumbness,
Described transfer device is in the described substrate that is in level under the situation of level by described a plurality of suction pads absorption at described framework, under the constant situation of state on the described framework that described substrate is remained on, described framework is rotated to plumbness from level, and the described substrate delivery/reception that will be in plumbness is to described carriage.
2. base plate transfer device according to claim 1 is characterized in that,
Described transfer device is at described framework and will be remained on the substrate absorption of described carriage with plumbness by a plurality of suction pads under the situation of plumbness and accept, under the constant situation of state on the described framework that described substrate is remained on, described framework is rotated to level from plumbness.
3. according to claim 1 or 2 described base plate transfer devices, it is characterized in that,
It is inboard and comprise transport unit that described transfer device is configured in the framework of described framework, and this transport unit is at described framework under the situation of level and transmits described substrate,
Described drive division supports described framework with the form that can vertically move up and down,
Described transfer device moves to described framework than described transport unit and more transmits described substrate by the position of below and by described transport unit, under the state above described substrate is positioned at described framework described framework is moved to the position above more leaning on than described transport unit and adsorbs described substrate.
4. according to any described base plate transfer device among the claim 1-3, it is characterized in that,
Be set with a plurality of binding domains at described framework for described substrate, in described each binding domain, contain 1 at least and inhale pad, the suction pad that is included in the identical binding domain is supplied to identical negative pressure, and the negative pressure of described each binding domain can be controlled independently of each other.
5. base plate transfer device according to claim 4 is characterized in that,
Described base plate transfer device further possesses:
A plurality of pipelines, it is corresponding with described a plurality of binding domains and be provided with, and supplies with negative pressure to each corresponding described suction pad;
Be connected the common negative pressure source on described a plurality of pipeline;
A plurality of valves, it is connected on described a plurality of pipeline, each corresponding described pipeline of switch;
And vacuum transducer, it is configured in respectively on described a plurality of pipeline, measures the pressure in each corresponding described pipeline,
If there is scheduled time internal pressure after described a plurality of suction pads begin to adsorb described substrate not become pipeline below the predetermined value, described base plate transfer device is closed this pipeline.
6. according to claim 4 or 5 described base plate transfer devices, it is characterized in that,
Described a plurality of suction pad is arranged as rectangle on the framework of described framework,
The framework of described framework is made of top portion, following portion, the right portion, left lateral,
Described a plurality of binding domain comprises: the upside master binding domain that is set in described top portion; Be set in the downside master binding domain of following portion; Be set in the auxiliary binding domain in right side of the right portion; With the auxiliary binding domain in the left side that is set in left lateral,
Each described upside master binding domain and downside master binding domain contain the cut zone more than at least 2 respectively.
7. base plate transfer device according to claim 2 is characterized in that,
Described carriage has mounting surface, and its supporting is in the lower end of the described substrate of plumbness,
Described transfer device is under the situation of plumbness at described framework, to remain on the substrate absorption on the described carriage and when accepting with plumbness by described a plurality of suction pads, described rotation axis be positioned at than described framework further from described carriage and than the mounting surface of described carriage more by the position of downside.
8. according to any described base plate transfer device among the claim 1-7, it is characterized in that,
Described drive division supports described framework, makes described framework vertically to move up and down, and can move forward and backward with respect to described carriage along continuous straight runs.
9. according to any described base plate transfer device among the claim 1-8, it is characterized in that,
Described carriage has mounting surface, and its supporting is in the lower end of the described substrate of plumbness,
Described base plate transfer device further possesses position transducer, and it detects the height of the described mounting surface of described carriage,
Described drive division supports described framework can vertically move up and down it,
Described transfer device is at the described substrate that will be in plumbness during to the handing-over of described carriage, according to the result that detects of described position transducer described framework moved up and down, and makes the lower end of described substrate not contact described mounting surface.
10. substrate convey method joins described substrate from base plate transfer device to the carriage that transmits flat substrate with plumbness,
It is characterized in that, may further comprise the steps:
The framework that will have a plurality of suction pads in described base plate transfer device maintains level, is in the described substrate that is in level under the situation of level with described a plurality of suction pads absorption at described framework;
Under the constant situation of state on the described framework that described substrate is remained on, described framework is rotated to plumbness from level;
The described substrate delivery/reception that will be in plumbness is to described carriage.
11. substrate convey method according to claim 10 is characterized in that, further may further comprise the steps:
Be at described framework under the situation of plumbness, will adsorb and acceptance with the substrate that plumbness remains on the described carriage with described a plurality of suction pads;
Under the constant situation of state on the described framework that described substrate is remained on, described framework is rotated to level from plumbness.
12. according to claim 10 or 11 described substrate convey methods, it is characterized in that,
Described a plurality of suction pad is assigned to a plurality of binding domains on described framework, these binding domains comprise at least 1 respectively and inhale pad,
Described substrate convey method further may further comprise the steps:
Rise through after the scheduled time beginning to adsorb described substrate with described a plurality of suction pads, the absorption affinity of described a plurality of suction pads is judged at each described binding domain;
In each described binding domain,, judge whether to continue to drive described a plurality of suction pads based on the judged result of described absorption affinity;
13. substrate convey method according to claim 11 is characterized in that,
Remain on substrate on the described carriage when described framework is under the situation of plumbness by described a plurality of suction pads absorption with plumbness, the rotating shaft of described framework be positioned at than described framework further from described carriage and than the mounting surface of described carriage more by the position of downside.
14. any described substrate convey method according among the claim 10-13 is characterized in that,
Described carriage has mounting surface, and this mounting surface supporting is in the lower end of the described substrate of plumbness,
The described substrate delivery/reception that will be in described plumbness to the described step of described carriage may further comprise the steps:
Detect the height of the described mounting surface of described carriage by position transducer;
The form that does not contact with described mounting surface with the lower end of the described substrate that is in described plumbness vertically moves up and down described framework based on the result that detects of described position transducer.
15. a vacuum treatment installation is characterized in that, comprising:
Vacuum processing chamber, it carries out vacuum treatment to flat substrate;
Carriage, it transmits with plumbness described substrate to described vacuum processing chamber;
And base plate transfer device, it joins described substrate to described carriage,
Described base plate transfer device comprises transfer device and control device,
Described transfer device comprises: rotation axis framework, that can extend with along continuous straight runs with rectangle is the framework that rotate at the center; Be arranged on the described framework, adsorb a plurality of suction pads of described substrate; And the drive division that described framework is rotated between level and plumbness,
Described control device is controlled described drive division and described a plurality of suction pad,
Described transfer device is in the described substrate absorption that will be in level under the situation of level by described a plurality of suction pads at described framework, under the constant situation of state on the described framework that described substrate is remained on, described framework is rotated to plumbness from level, and the described substrate delivery/reception that will be in plumbness is to described carriage.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007319573A JP2009146932A (en) | 2007-12-11 | 2007-12-11 | Substrate transfer apparatus, substrate transfer method, and vacuum processing apparatus |
| JP2007-319573 | 2007-12-11 | ||
| PCT/JP2008/072323 WO2009075261A1 (en) | 2007-12-11 | 2008-12-09 | Substrate transfer apparatus, substrate transfer method and vacuum processing apparatus |
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| Publication Number | Publication Date |
|---|---|
| CN101889339A true CN101889339A (en) | 2010-11-17 |
| CN101889339B CN101889339B (en) | 2012-09-05 |
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| CN2008801206771A Active CN101889339B (en) | 2007-12-11 | 2008-12-09 | Vacuum processing apparatus |
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| JP (1) | JP2009146932A (en) |
| KR (1) | KR20100085128A (en) |
| CN (1) | CN101889339B (en) |
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| CN105097605A (en) * | 2014-05-09 | 2015-11-25 | 深圳莱宝高科技股份有限公司 | Substrate processing system and processing method thereof |
| CN106783705A (en) * | 2016-11-30 | 2017-05-31 | 上海华力微电子有限公司 | A kind of wafer transfer approach for optimizing defects of wafer edge |
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| JPH0356141U (en) * | 1989-05-31 | 1991-05-30 | ||
| JPH1076491A (en) * | 1996-09-03 | 1998-03-24 | Nikon Corp | Plate delivery system |
| JPH1086085A (en) * | 1996-09-19 | 1998-04-07 | Dainippon Screen Mfg Co Ltd | Substrate adsorption device and method |
| JP3806272B2 (en) * | 1999-09-13 | 2006-08-09 | 三菱重工業株式会社 | Multi-chamber vacuum processing system and substrate transfer apparatus |
| JP2003245884A (en) * | 2002-02-22 | 2003-09-02 | Dainippon Screen Mfg Co Ltd | Apparatus and method for suction fixing |
| JP2006182502A (en) * | 2004-12-27 | 2006-07-13 | Murata Mach Ltd | Tray carrying system |
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2008
- 2008-12-09 KR KR1020107011326A patent/KR20100085128A/en not_active Application Discontinuation
- 2008-12-09 CN CN2008801206771A patent/CN101889339B/en active Active
- 2008-12-09 WO PCT/JP2008/072323 patent/WO2009075261A1/en active Application Filing
- 2008-12-11 TW TW97148248A patent/TW200935547A/en unknown
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Also Published As
| Publication number | Publication date |
|---|---|
| TW200935547A (en) | 2009-08-16 |
| CN101889339B (en) | 2012-09-05 |
| JP2009146932A (en) | 2009-07-02 |
| WO2009075261A1 (en) | 2009-06-18 |
| KR20100085128A (en) | 2010-07-28 |
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