CN100587996C - 固定薄膜溅射用衬底的装置及用此装置来固定衬底的方法 - Google Patents
固定薄膜溅射用衬底的装置及用此装置来固定衬底的方法 Download PDFInfo
- Publication number
- CN100587996C CN100587996C CN03142457A CN03142457A CN100587996C CN 100587996 C CN100587996 C CN 100587996C CN 03142457 A CN03142457 A CN 03142457A CN 03142457 A CN03142457 A CN 03142457A CN 100587996 C CN100587996 C CN 100587996C
- Authority
- CN
- China
- Prior art keywords
- substrate
- mask
- pressing plate
- magnet
- towards
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 153
- 238000000034 method Methods 0.000 title claims description 21
- 238000004544 sputter deposition Methods 0.000 title description 8
- 238000003825 pressing Methods 0.000 claims abstract description 48
- 230000005291 magnetic effect Effects 0.000 claims abstract description 40
- 238000005266 casting Methods 0.000 claims description 20
- 230000000694 effects Effects 0.000 claims description 5
- 239000010409 thin film Substances 0.000 abstract description 6
- 238000005401 electroluminescence Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 239000011368 organic material Substances 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 230000027756 respiratory electron transport chain Effects 0.000 description 2
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (12)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR30613/02 | 2002-05-31 | ||
KR1020020030613A KR100838065B1 (ko) | 2002-05-31 | 2002-05-31 | 박막증착기용 고정장치와 이를 이용한 고정방법 |
KR30613/2002 | 2002-05-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1462160A CN1462160A (zh) | 2003-12-17 |
CN100587996C true CN100587996C (zh) | 2010-02-03 |
Family
ID=36969574
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN03142457A Expired - Lifetime CN100587996C (zh) | 2002-05-31 | 2003-06-02 | 固定薄膜溅射用衬底的装置及用此装置来固定衬底的方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US7097750B2 (zh) |
JP (1) | JP4545393B2 (zh) |
KR (1) | KR100838065B1 (zh) |
CN (1) | CN100587996C (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108060388A (zh) * | 2017-12-18 | 2018-05-22 | 信利(惠州)智能显示有限公司 | 一种基板和掩膜板的对位方法 |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005206939A (ja) * | 2003-12-26 | 2005-08-04 | Seiko Epson Corp | 薄膜形成方法、薄膜形成装置、有機エレクトロルミネッセンス装置の製造方法、有機エレクトロルミネッセンス装置、及び電子機器 |
JP4734508B2 (ja) * | 2004-06-21 | 2011-07-27 | 京セラ株式会社 | Elディスプレイおよびその製造方法 |
KR100692049B1 (ko) * | 2004-12-01 | 2007-03-12 | 엘지전자 주식회사 | 유기 전계발광표시소자의 제조장치 및 방법 |
KR100583522B1 (ko) * | 2005-01-05 | 2006-05-25 | 삼성에스디아이 주식회사 | 기판 고정 트레이, 이를 이용한 기판 정렬 시스템 및 그방법 |
JP2006199998A (ja) * | 2005-01-20 | 2006-08-03 | Seiko Epson Corp | 成膜装置、成膜方法 |
JP4609754B2 (ja) * | 2005-02-23 | 2011-01-12 | 三井造船株式会社 | マスククランプの移動機構および成膜装置 |
KR100696554B1 (ko) * | 2005-12-16 | 2007-03-19 | 삼성에스디아이 주식회사 | 증착 장치 |
KR100721056B1 (ko) * | 2006-01-06 | 2007-05-25 | 한국원자력연구원 | 자성체가 적용되는 물리적 구조물을 이용하여 임의의금속막 패턴을 소재 표면에 형성하는 장치 및 방법 |
US8039052B2 (en) * | 2007-09-06 | 2011-10-18 | Intermolecular, Inc. | Multi-region processing system and heads |
JP5297046B2 (ja) * | 2008-01-16 | 2013-09-25 | キヤノントッキ株式会社 | 成膜装置 |
KR101517020B1 (ko) * | 2008-05-15 | 2015-05-04 | 삼성디스플레이 주식회사 | 유기전계발광표시장치의 제조장치 및 제조방법 |
DE102008037387A1 (de) * | 2008-09-24 | 2010-03-25 | Aixtron Ag | Verfahren sowie Vorrichtung zum Abscheiden lateral strukturierter Schichten mittels einer magnetisch auf einem Substrathalter gehaltenen Schattenmaske |
KR101049804B1 (ko) * | 2009-02-19 | 2011-07-15 | 삼성모바일디스플레이주식회사 | 증착 장치용 마스크 밀착 수단 및 이를 이용한 증착 장치 |
JP2011233510A (ja) * | 2010-04-05 | 2011-11-17 | Canon Inc | 蒸着装置 |
KR102104688B1 (ko) * | 2012-04-19 | 2020-05-29 | 인테벡, 인코포레이티드 | 태양 전지 제조를 위한 이중 마스크 장치 |
MY170824A (en) | 2012-04-26 | 2019-09-04 | Intevac Inc | System architecture for vacuum processing |
US10062600B2 (en) | 2012-04-26 | 2018-08-28 | Intevac, Inc. | System and method for bi-facial processing of substrates |
KR102112751B1 (ko) * | 2013-02-01 | 2020-05-19 | 삼성디스플레이 주식회사 | 레이저 빔을 이용한 마스크 제조 방법 및 마스크 제조 장치 |
KR102103176B1 (ko) * | 2013-07-17 | 2020-04-22 | 주식회사 선익시스템 | 기판 탈부착 장치 |
KR102270080B1 (ko) * | 2013-10-30 | 2021-06-29 | 삼성디스플레이 주식회사 | 박막 증착 장치 |
KR102218644B1 (ko) * | 2013-12-19 | 2021-02-23 | 삼성디스플레이 주식회사 | 증착 장치 |
MY183097A (en) | 2014-08-05 | 2021-02-13 | Intevac Inc | Implant masking and alignment system with rollers |
SG11201710300SA (en) * | 2015-06-12 | 2018-01-30 | Ulvac Inc | Substrate holding device, film deposition device, and substrate holding method |
CN104993070A (zh) * | 2015-07-02 | 2015-10-21 | 深圳市华星光电技术有限公司 | 一种制作柔性oled显示器件的方法 |
CN106337164A (zh) * | 2015-07-08 | 2017-01-18 | 上海和辉光电有限公司 | 一种蒸镀装置 |
KR102396758B1 (ko) * | 2015-08-07 | 2022-05-13 | (주)선익시스템 | 마스크를 이용하는 공정챔버용 처킹시스템 |
KR102339616B1 (ko) * | 2015-08-17 | 2021-12-17 | (주)선익시스템 | 마스크를 이용하는 공정챔버용 처킹시스템 |
CN105154830B (zh) * | 2015-09-06 | 2017-04-19 | 京东方科技集团股份有限公司 | 一种固定方法和蒸镀方法 |
JP6298138B2 (ja) * | 2015-11-25 | 2018-03-20 | キヤノントッキ株式会社 | 成膜システム、磁性体部及び膜の製造方法 |
KR101702785B1 (ko) * | 2015-12-02 | 2017-02-07 | 에스엔유 프리시젼 주식회사 | 박막 증착장치 |
JP6309048B2 (ja) * | 2016-07-01 | 2018-04-11 | キヤノントッキ株式会社 | マスク吸着装置 |
CN106756779B (zh) * | 2017-01-03 | 2019-09-06 | 京东方科技集团股份有限公司 | 一种磁控溅射台以及磁控溅射装置 |
JP6785171B2 (ja) * | 2017-03-08 | 2020-11-18 | 株式会社日本製鋼所 | 成膜方法および電子装置の製造方法並びにプラズマ原子層成長装置 |
JP6857522B2 (ja) * | 2017-03-17 | 2021-04-14 | 株式会社日本製鋼所 | 成膜方法および電子装置の製造方法並びにマスク保持体 |
KR102411538B1 (ko) * | 2017-09-04 | 2022-06-22 | 삼성디스플레이 주식회사 | 표시 장치의 제조장치 및 표시 장치의 제조방법 |
KR102489336B1 (ko) * | 2017-12-26 | 2023-01-19 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 표시 장치의 제조 방법 |
KR101963982B1 (ko) * | 2017-12-27 | 2019-03-29 | 캐논 톡키 가부시키가이샤 | 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법 |
KR102036523B1 (ko) * | 2017-12-29 | 2019-10-25 | 주식회사 에스에프에이 | 기판 증착장치 |
KR102020766B1 (ko) * | 2017-12-29 | 2019-09-11 | 주식회사 에스에프에이 | 기판 증착장치 |
CN108110092A (zh) * | 2018-02-28 | 2018-06-01 | 北京创昱科技有限公司 | 一种基片装夹装置 |
KR102591646B1 (ko) * | 2018-06-29 | 2023-10-20 | 삼성디스플레이 주식회사 | 증착 장치 및 증착 장치의 마그넷 플레이트 얼라인 방법 |
CN110004407B (zh) * | 2019-05-21 | 2021-03-02 | 京东方科技集团股份有限公司 | 掩膜版组件及其制备方法 |
US11613802B2 (en) * | 2020-04-17 | 2023-03-28 | Rockwell Collins, Inc. | Additively manufactured shadow masks for material deposition control |
US11326246B2 (en) * | 2020-07-27 | 2022-05-10 | Rockwell Collins, Inc. | Controlled warping of shadow mask tooling for improved reliability and miniturization via thin film deposition |
CN112853273B (zh) * | 2020-12-31 | 2022-12-16 | 南京深光科技有限公司 | 一种柔性amoled掩模版表面镀膜设备 |
CN114112573B (zh) * | 2021-11-15 | 2022-06-10 | 哈尔滨工业大学(威海) | 用于介观尺度拉伸试样力学性能测试的磁控溅射成形装置 |
CN114112574B (zh) * | 2021-11-15 | 2022-06-24 | 哈尔滨工业大学(威海) | 用于介观尺度弯曲试样力学性能测试的磁控溅射成形装置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4011143A (en) * | 1973-06-25 | 1977-03-08 | Honeywell Inc. | Material deposition masking for microcircuit structures |
US4599970A (en) * | 1985-03-11 | 1986-07-15 | Rca Corporation | Apparatus for coating a selected area of the surface of an object |
US4915057A (en) * | 1985-10-23 | 1990-04-10 | Gte Products Corporation | Apparatus and method for registration of shadow masked thin-film patterns |
US5833823A (en) * | 1993-10-13 | 1998-11-10 | Balzers Aktiengesellschaft | Sputter source with a target arrangement and a holding device |
US6132575A (en) * | 1998-09-28 | 2000-10-17 | Alcatel | Magnetron reactor for providing a high density, inductively coupled plasma source for sputtering metal and dielectric films |
US6143143A (en) * | 1993-08-18 | 2000-11-07 | Applied Vision Limited | Masking means and cleaning techniques for surfaces of substrates |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US625123A (en) * | 1899-05-16 | romans | ||
JP2950338B2 (ja) | 1990-09-03 | 1999-09-20 | 富士通株式会社 | メタルマスク位置合わせ装置 |
JPH08297869A (ja) | 1995-04-24 | 1996-11-12 | Shin Etsu Chem Co Ltd | 基板ホルダー保持装置 |
JP4058149B2 (ja) * | 1997-12-01 | 2008-03-05 | キヤノンアネルバ株式会社 | 真空成膜装置のマスク位置合わせ方法 |
US6251233B1 (en) | 1998-08-03 | 2001-06-26 | The Coca-Cola Company | Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation |
JP2002075638A (ja) * | 2000-08-29 | 2002-03-15 | Nec Corp | マスク蒸着方法及び蒸着装置 |
EP1202329A3 (en) * | 2000-10-31 | 2006-04-12 | The Boc Group, Inc. | Mask Restraining method and apparatus |
-
2002
- 2002-05-31 KR KR1020020030613A patent/KR100838065B1/ko active IP Right Grant
-
2003
- 2003-05-30 US US10/448,141 patent/US7097750B2/en not_active Expired - Lifetime
- 2003-06-02 CN CN03142457A patent/CN100587996C/zh not_active Expired - Lifetime
- 2003-06-02 JP JP2003156776A patent/JP4545393B2/ja not_active Expired - Lifetime
-
2006
- 2006-05-17 US US11/434,722 patent/US7695596B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4011143A (en) * | 1973-06-25 | 1977-03-08 | Honeywell Inc. | Material deposition masking for microcircuit structures |
US4599970A (en) * | 1985-03-11 | 1986-07-15 | Rca Corporation | Apparatus for coating a selected area of the surface of an object |
US4915057A (en) * | 1985-10-23 | 1990-04-10 | Gte Products Corporation | Apparatus and method for registration of shadow masked thin-film patterns |
US6143143A (en) * | 1993-08-18 | 2000-11-07 | Applied Vision Limited | Masking means and cleaning techniques for surfaces of substrates |
US5833823A (en) * | 1993-10-13 | 1998-11-10 | Balzers Aktiengesellschaft | Sputter source with a target arrangement and a holding device |
US6132575A (en) * | 1998-09-28 | 2000-10-17 | Alcatel | Magnetron reactor for providing a high density, inductively coupled plasma source for sputtering metal and dielectric films |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108060388A (zh) * | 2017-12-18 | 2018-05-22 | 信利(惠州)智能显示有限公司 | 一种基板和掩膜板的对位方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20030092789A (ko) | 2003-12-06 |
JP4545393B2 (ja) | 2010-09-15 |
US20030224109A1 (en) | 2003-12-04 |
JP2004003030A (ja) | 2004-01-08 |
US7695596B2 (en) | 2010-04-13 |
KR100838065B1 (ko) | 2008-06-16 |
CN1462160A (zh) | 2003-12-17 |
US20060201618A1 (en) | 2006-09-14 |
US7097750B2 (en) | 2006-08-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100587996C (zh) | 固定薄膜溅射用衬底的装置及用此装置来固定衬底的方法 | |
US7771789B2 (en) | Method of forming mask and mask | |
KR102520693B1 (ko) | 유기발광소자의 증착장치 | |
KR100484023B1 (ko) | 마스크 및 그 제조 방법, 및 일렉트로루미네선스 장치의 제조 방법 | |
KR100811730B1 (ko) | 마스크막형성방법 및 마스크막형성장치 | |
KR20050051551A (ko) | 유기 일렉트로루미네선스 패널의 제조 방법, 유기일렉트로루미네선스 패널의 제조 장치 및 유기일렉트로루미네선스 패널 | |
JP2020122222A (ja) | 成膜装置及びそれを用いた有機el表示装置の製造方法 | |
KR101108012B1 (ko) | 대면적 기판용 기판정렬장치 | |
JP2008240088A (ja) | 蒸着装置、蒸着方法、電気光学装置及び電子機器 | |
US7407559B2 (en) | Method of producing liquid crystal display devices | |
JP2008198500A (ja) | 有機elディスプレイの製造方法および製造装置 | |
KR20140115484A (ko) | Oled 증착을 위한 기판 정렬장치 | |
KR102371101B1 (ko) | 증착 장치 | |
JP4478472B2 (ja) | 有機薄膜蒸着方法 | |
CN109957753B (zh) | 沉积装置 | |
KR20170101504A (ko) | 정전척을 이용한 기판 얼라인 방법 | |
KR20210083843A (ko) | 새도우 마스크 제조 방법 및 새도우 마스크 핸들링 장치 | |
CN114807842B (zh) | 真空蒸镀装置及显示面板的制备方法 | |
JP4235823B2 (ja) | マスクの製造方法 | |
KR100931602B1 (ko) | 기판합착장치 | |
JP2004335486A (ja) | マスク及びその製造方法、エレクトロルミネッセンス装置及びその製造方法並びに電子機器 | |
CN116779517A (zh) | 一种巨量转移装置 | |
JP2003168361A (ja) | 基板封着装置 | |
KR20100013766A (ko) | 유기전계발광표시장치의 제조장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: SAMSUNG SDI CO., LTD. Free format text: FORMER OWNER: SAMSUNG OLED CO., LTD. Effective date: 20050603 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20050603 Address after: Gyeonggi Do Korea Suwon Applicant after: Samsung SDI Co.,Ltd. Address before: Ulsan, South Korea Applicant before: Samsung OLED Co.,Ltd. |
|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20090116 Address after: Gyeonggi Do Korea Suwon Applicant after: Samsung Mobile Display Co.,Ltd. Address before: Gyeonggi Do Korea Suwon Applicant before: Samsung SDI Co.,Ltd. |
|
ASS | Succession or assignment of patent right |
Owner name: SAMSUNG MOBILE DISPLAY CO., LTD. Free format text: FORMER OWNER: SAMSUNG SDI CO., LTD. Effective date: 20090116 |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SAMSUNG DISPLAY CO., LTD. Free format text: FORMER OWNER: SAMSUNG MOBILE DISPLAY CO., LTD. Effective date: 20121122 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20121122 Address after: South Korea Gyeonggi Do Yongin Patentee after: SAMSUNG DISPLAY Co.,Ltd. Address before: Gyeonggi Do Korea Suwon Patentee before: Samsung Mobile Display Co.,Ltd. |
|
CX01 | Expiry of patent term |
Granted publication date: 20100203 |
|
CX01 | Expiry of patent term |