CA1056190A - Photosensitive compositions containing syndiotactic 1,2 polybutadiene useful as flexographic plates - Google Patents

Photosensitive compositions containing syndiotactic 1,2 polybutadiene useful as flexographic plates

Info

Publication number
CA1056190A
CA1056190A CA257,185A CA257185A CA1056190A CA 1056190 A CA1056190 A CA 1056190A CA 257185 A CA257185 A CA 257185A CA 1056190 A CA1056190 A CA 1056190A
Authority
CA
Canada
Prior art keywords
photosensitive resin
resin compositions
compositions according
polybutadiene
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA257,185A
Other languages
English (en)
French (fr)
Inventor
Kiyomi Sakurai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP8790275A external-priority patent/JPS5212004A/ja
Priority claimed from JP13954175A external-priority patent/JPS5264301A/ja
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Application granted granted Critical
Publication of CA1056190A publication Critical patent/CA1056190A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
CA257,185A 1975-07-17 1976-07-16 Photosensitive compositions containing syndiotactic 1,2 polybutadiene useful as flexographic plates Expired CA1056190A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8790275A JPS5212004A (en) 1975-07-17 1975-07-17 Photoosensitive resin composition for flexo graphic plate
JP13954175A JPS5264301A (en) 1975-11-19 1975-11-19 Flexo graphic press plate

Publications (1)

Publication Number Publication Date
CA1056190A true CA1056190A (en) 1979-06-12

Family

ID=26429132

Family Applications (1)

Application Number Title Priority Date Filing Date
CA257,185A Expired CA1056190A (en) 1975-07-17 1976-07-16 Photosensitive compositions containing syndiotactic 1,2 polybutadiene useful as flexographic plates

Country Status (6)

Country Link
AU (1) AU500110B2 (de)
CA (1) CA1056190A (de)
DE (1) DE2631837C2 (de)
DK (1) DK146896C (de)
FR (1) FR2318441A1 (de)
GB (1) GB1552653A (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607261B2 (ja) * 1978-10-02 1985-02-23 旭化成株式会社 感光性エラストマ−組成物
JPS55135838A (en) * 1979-04-12 1980-10-23 Asahi Chem Ind Co Ltd Surface treating method for photosensitive elastomer printing plate
JPS57208556A (en) * 1981-06-18 1982-12-21 Nippon Paint Co Ltd Photosensitive printing plate material
US4394435A (en) * 1981-10-01 1983-07-19 Uniroyal, Inc. Syndiotactic polybutadiene composition for a photosensitive printing plate
WO1992015046A1 (fr) * 1991-02-15 1992-09-03 Asahi Kasei Kogyo Kabushiki Kaisha Composition elastomere photosensible
DE4202332A1 (de) * 1992-01-29 1993-08-05 Basf Lacke & Farben Lichtempfindliches gemisch zur herstellung von relief- und druckformen
JP3510393B2 (ja) 1994-08-10 2004-03-29 シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー 光硬化性エラストマー組成物から得られるフレキソグラフ印刷プレート
DE10118987A1 (de) 2001-04-18 2002-10-24 Basf Drucksysteme Gmbh Lasergravierbare Flexodruckelemente mit reliefbildenden elastomeren Schichten enthaltend syndiotaktisches 1,2,-Polybutadien

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
DE2250105B2 (de) * 1971-10-13 1977-04-14 Meisei Churchill Co. Ltd., Sakai, Osaka (Japan) Lichthaertende kunststoffmasse
DE2300371C3 (de) * 1973-01-05 1979-04-19 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare Druckplatte für den Flexodruck
DE2301175A1 (de) * 1973-01-11 1974-08-01 Basf Ag Verfahren zur herstellung von druckformen fuer den flexodruck und mehrschichtenplatten hierfuer
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
JPS5228041B2 (de) * 1973-04-06 1977-07-23

Also Published As

Publication number Publication date
AU1597976A (en) 1978-01-19
DK146896C (da) 1984-07-16
DK146896B (da) 1984-01-30
DE2631837A1 (de) 1977-02-03
FR2318441A1 (fr) 1977-02-11
AU500110B2 (en) 1979-05-10
GB1552653A (en) 1979-09-19
DK318476A (da) 1977-01-18
FR2318441B1 (de) 1981-10-09
DE2631837C2 (de) 1983-06-16

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