BRPI0920600B1 - Método para deposição galvânica de uma camada de cromo resistente sobre uma superfície de substrato - Google Patents

Método para deposição galvânica de uma camada de cromo resistente sobre uma superfície de substrato Download PDF

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Publication number
BRPI0920600B1
BRPI0920600B1 BRPI0920600-0A BRPI0920600A BRPI0920600B1 BR PI0920600 B1 BRPI0920600 B1 BR PI0920600B1 BR PI0920600 A BRPI0920600 A BR PI0920600A BR PI0920600 B1 BRPI0920600 B1 BR PI0920600B1
Authority
BR
Brazil
Prior art keywords
layer
deposition
substrate
electrolyte
chromium
Prior art date
Application number
BRPI0920600-0A
Other languages
English (en)
Portuguese (pt)
Inventor
Helmut Horsthemke
Original Assignee
Enthone Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=40427109&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BRPI0920600(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Enthone Inc. filed Critical Enthone Inc.
Publication of BRPI0920600A2 publication Critical patent/BRPI0920600A2/pt
Publication of BRPI0920600B1 publication Critical patent/BRPI0920600B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/04—Removal of gases or vapours ; Gas or pressure control
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/625—Discontinuous layers, e.g. microcracked layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/10—Bearings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
BRPI0920600-0A 2008-10-22 2009-10-22 Método para deposição galvânica de uma camada de cromo resistente sobre uma superfície de substrato BRPI0920600B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08018462.5 2008-10-22
EP08018462.5A EP2180088B2 (de) 2008-10-22 2008-10-22 Verfahren zur galvanischen Abscheidung von Hartchromschichten
PCT/US2009/061683 WO2010048404A1 (en) 2008-10-22 2009-10-22 Method for galvanic deposition of hard chrome layers

Publications (2)

Publication Number Publication Date
BRPI0920600A2 BRPI0920600A2 (pt) 2015-12-22
BRPI0920600B1 true BRPI0920600B1 (pt) 2019-05-28

Family

ID=40427109

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0920600-0A BRPI0920600B1 (pt) 2008-10-22 2009-10-22 Método para deposição galvânica de uma camada de cromo resistente sobre uma superfície de substrato

Country Status (9)

Country Link
US (1) US20110198226A1 (ko)
EP (1) EP2180088B2 (ko)
JP (1) JP5739341B2 (ko)
KR (1) KR101658254B1 (ko)
CN (1) CN102257184B (ko)
BR (1) BRPI0920600B1 (ko)
ES (1) ES2363566T5 (ko)
PL (1) PL2180088T5 (ko)
WO (1) WO2010048404A1 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2766775T3 (es) * 2013-09-05 2020-06-15 Macdermid Enthone Inc Composición acuosa de electrolito que tiene una emisión aérea reducida
HUE043557T2 (hu) * 2014-12-19 2019-08-28 Weber Hydraulik Gmbh Eljárás kerek termék optikai feliratozására és/vagy jelölésére
US11566679B2 (en) * 2020-11-03 2023-01-31 DRiV Automotive Inc. Bumper cap for damper
CN114703516A (zh) * 2021-12-14 2022-07-05 西安昆仑工业（集团）有限责任公司 一种火炮身管快速镀铬工艺方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE494578A (ko) 1949-03-18
FI53841C (fi) 1975-05-07 1978-08-10 Teuvo Tapio Korpi Elektrolytisk ytbelaeggningsanordning
FR2462490A1 (fr) * 1979-08-03 1981-02-13 Centre Techn Ind Mecanique Dispositif de revetement electrolytique
US4261086A (en) 1979-09-04 1981-04-14 Ford Motor Company Method for manufacturing variable capacitance pressure transducers
JPS62263991A (ja) * 1986-05-07 1987-11-16 Adachi Shin Sangyo Kk 鍍金物製造法
JPH02217429A (ja) * 1989-02-17 1990-08-30 Fujitsu Ltd メッキ方法および装置
US5277785A (en) 1992-07-16 1994-01-11 Anglen Erik S Van Method and apparatus for depositing hard chrome coatings by brush plating
US20010054557A1 (en) 1997-06-09 2001-12-27 E. Jennings Taylor Electroplating of metals using pulsed reverse current for control of hydrogen evolution
JP3918142B2 (ja) † 1998-11-06 2007-05-23 株式会社日立製作所 クロムめっき部品、クロムめっき方法およびクロムめっき部品の製造方法
USRE40386E1 (en) * 1998-11-06 2008-06-17 Hitachi Ltd. Chrome plated parts and chrome plating method
JP2002047595A (ja) * 2000-07-31 2002-02-15 Tokico Ltd クロムめっき方法およびクロムめっき装置
JP3423702B2 (ja) 2000-08-29 2003-07-07 創輝株式会社 金属めっき方法
JP2007077494A (ja) * 2005-08-08 2007-03-29 Nanofilm Technologies Internatl Pte Ltd 金属コーティング

Also Published As

Publication number Publication date
EP2180088B2 (de) 2019-06-12
EP2180088A1 (de) 2010-04-28
KR20110075028A (ko) 2011-07-05
KR101658254B1 (ko) 2016-09-20
US20110198226A1 (en) 2011-08-18
CN102257184A (zh) 2011-11-23
JP2012506496A (ja) 2012-03-15
CN102257184B (zh) 2014-01-15
EP2180088B1 (de) 2011-05-11
JP5739341B2 (ja) 2015-06-24
PL2180088T5 (pl) 2020-11-16
PL2180088T3 (pl) 2011-09-30
BRPI0920600A2 (pt) 2015-12-22
ES2363566T5 (es) 2020-04-16
ES2363566T3 (es) 2011-08-09
WO2010048404A1 (en) 2010-04-29

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B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06T Formal requirements before examination [chapter 6.20 patent gazette]

Free format text: O DEPOSITANTE DEVE RESPONDER A EXIGENCIA FORMULADA NESTE PARECER POR MEIO DO SERVICO DE CODIGO 206 EM ATE 60 (SESSENTA) DIAS, A PARTIR DA DATA DE PUBLICACAO NA RPI, SOB PENA DO ARQUIVAMENTO DO PEDIDO, DE ACORDO COM O ART. 34 DA LPI.PUBLIQUE-SE A EXIGENCIA (6.20).

B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 22/10/2009, OBSERVADAS AS CONDICOES LEGAIS. (CO) 20 (VINTE) ANOS CONTADOS A PARTIR DE 22/10/2009, OBSERVADAS AS CONDICOES LEGAIS

B25I Requirement for requested change of headquarter

Owner name: ENTHONE INC. (US)

Free format text: A FIM DE ATENDER A ALTERACAO DE ENDERECO REQUERIDA ATRAVES DA PETICAO 870190056622 DE 18/06/2019, E NECESSARIO O RECOLHIMENTO DE UMA GUIA 248, ALEM DA GUIA 207 DE CUMPRIMENTO DE EXIGENCIA, PARA A EXECUCAO DO SERVICO, POIS FORAM SOLICITADOS DOIS SERVICOS, UMA ALTERACAO DENOME E UMA ALTERACAO DE ENDERECO, E APENAS UMA GUIA 248 FOI RECOLHIDA.

B25L Entry of change of name and/or headquarter and transfer of application, patent and certificate of addition of invention: publication cancelled

Owner name: ENTHONE INC. (US)

Free format text: ANULADA A PUBLICACAO CODIGO 25.9 NA RPI NO 2543 DE 01/10/2019 POR TER SIDO INDEVIDA.

B25D Requested change of name of applicant approved

Owner name: MACDERMID ENTHONE INC. (US)

B25G Requested change of headquarter approved

Owner name: MACDERMID ENTHONE INC. (US)