PL2180088T5 - Sposób galwanicznego nakładania warstwy twardego chromu - Google Patents
Sposób galwanicznego nakładania warstwy twardego chromuInfo
- Publication number
- PL2180088T5 PL2180088T5 PL08018462T PL08018462T PL2180088T5 PL 2180088 T5 PL2180088 T5 PL 2180088T5 PL 08018462 T PL08018462 T PL 08018462T PL 08018462 T PL08018462 T PL 08018462T PL 2180088 T5 PL2180088 T5 PL 2180088T5
- Authority
- PL
- Poland
- Prior art keywords
- hard chrome
- chrome layers
- electroplating hard
- electroplating
- layers
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/04—Removal of gases or vapours ; Gas or pressure control
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/003—Electroplating using gases, e.g. pressure influence
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/10—Bearings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08018462.5A EP2180088B2 (de) | 2008-10-22 | 2008-10-22 | Verfahren zur galvanischen Abscheidung von Hartchromschichten |
Publications (2)
Publication Number | Publication Date |
---|---|
PL2180088T3 PL2180088T3 (pl) | 2011-09-30 |
PL2180088T5 true PL2180088T5 (pl) | 2020-11-16 |
Family
ID=40427109
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL08018462T PL2180088T5 (pl) | 2008-10-22 | 2008-10-22 | Sposób galwanicznego nakładania warstwy twardego chromu |
Country Status (9)
Country | Link |
---|---|
US (1) | US20110198226A1 (pl) |
EP (1) | EP2180088B2 (pl) |
JP (1) | JP5739341B2 (pl) |
KR (1) | KR101658254B1 (pl) |
CN (1) | CN102257184B (pl) |
BR (1) | BRPI0920600B1 (pl) |
ES (1) | ES2363566T5 (pl) |
PL (1) | PL2180088T5 (pl) |
WO (1) | WO2010048404A1 (pl) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2766775T3 (es) * | 2013-09-05 | 2020-06-15 | Macdermid Enthone Inc | Composición acuosa de electrolito que tiene una emisión aérea reducida |
HUE043557T2 (hu) * | 2014-12-19 | 2019-08-28 | Weber Hydraulik Gmbh | Eljárás kerek termék optikai feliratozására és/vagy jelölésére |
US11566679B2 (en) * | 2020-11-03 | 2023-01-31 | DRiV Automotive Inc. | Bumper cap for damper |
CN114703516A (zh) * | 2021-12-14 | 2022-07-05 | 西安昆仑工业(集团)有限责任公司 | 一种火炮身管快速镀铬工艺方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE494578A (pl) | 1949-03-18 | |||
FI53841C (fi) | 1975-05-07 | 1978-08-10 | Teuvo Tapio Korpi | Elektrolytisk ytbelaeggningsanordning |
FR2462490A1 (fr) * | 1979-08-03 | 1981-02-13 | Centre Techn Ind Mecanique | Dispositif de revetement electrolytique |
US4261086A (en) | 1979-09-04 | 1981-04-14 | Ford Motor Company | Method for manufacturing variable capacitance pressure transducers |
JPS62263991A (ja) * | 1986-05-07 | 1987-11-16 | Adachi Shin Sangyo Kk | 鍍金物製造法 |
JPH02217429A (ja) * | 1989-02-17 | 1990-08-30 | Fujitsu Ltd | メッキ方法および装置 |
US5277785A (en) | 1992-07-16 | 1994-01-11 | Anglen Erik S Van | Method and apparatus for depositing hard chrome coatings by brush plating |
US20010054557A1 (en) | 1997-06-09 | 2001-12-27 | E. Jennings Taylor | Electroplating of metals using pulsed reverse current for control of hydrogen evolution |
JP3918142B2 (ja) † | 1998-11-06 | 2007-05-23 | 株式会社日立製作所 | クロムめっき部品、クロムめっき方法およびクロムめっき部品の製造方法 |
USRE40386E1 (en) * | 1998-11-06 | 2008-06-17 | Hitachi Ltd. | Chrome plated parts and chrome plating method |
JP2002047595A (ja) * | 2000-07-31 | 2002-02-15 | Tokico Ltd | クロムめっき方法およびクロムめっき装置 |
JP3423702B2 (ja) | 2000-08-29 | 2003-07-07 | 創輝株式会社 | 金属めっき方法 |
JP2007077494A (ja) * | 2005-08-08 | 2007-03-29 | Nanofilm Technologies Internatl Pte Ltd | 金属コーティング |
-
2008
- 2008-10-22 EP EP08018462.5A patent/EP2180088B2/de active Active
- 2008-10-22 PL PL08018462T patent/PL2180088T5/pl unknown
- 2008-10-22 ES ES08018462T patent/ES2363566T5/es active Active
-
2009
- 2009-10-22 JP JP2011533333A patent/JP5739341B2/ja active Active
- 2009-10-22 KR KR1020117011605A patent/KR101658254B1/ko active IP Right Grant
- 2009-10-22 CN CN200980151479.6A patent/CN102257184B/zh active Active
- 2009-10-22 BR BRPI0920600-0A patent/BRPI0920600B1/pt active IP Right Grant
- 2009-10-22 US US13/125,622 patent/US20110198226A1/en not_active Abandoned
- 2009-10-22 WO PCT/US2009/061683 patent/WO2010048404A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
EP2180088B2 (de) | 2019-06-12 |
BRPI0920600B1 (pt) | 2019-05-28 |
EP2180088A1 (de) | 2010-04-28 |
KR20110075028A (ko) | 2011-07-05 |
KR101658254B1 (ko) | 2016-09-20 |
US20110198226A1 (en) | 2011-08-18 |
CN102257184A (zh) | 2011-11-23 |
JP2012506496A (ja) | 2012-03-15 |
CN102257184B (zh) | 2014-01-15 |
EP2180088B1 (de) | 2011-05-11 |
JP5739341B2 (ja) | 2015-06-24 |
PL2180088T3 (pl) | 2011-09-30 |
BRPI0920600A2 (pt) | 2015-12-22 |
ES2363566T5 (es) | 2020-04-16 |
ES2363566T3 (es) | 2011-08-09 |
WO2010048404A1 (en) | 2010-04-29 |
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