BR8103762A - Material copiador fotossensivel e proecesso para o revestimento de um suporte de camada com uma camada copiadora fotossensivel - Google Patents

Material copiador fotossensivel e proecesso para o revestimento de um suporte de camada com uma camada copiadora fotossensivel

Info

Publication number
BR8103762A
BR8103762A BR8103762A BR8103762A BR8103762A BR 8103762 A BR8103762 A BR 8103762A BR 8103762 A BR8103762 A BR 8103762A BR 8103762 A BR8103762 A BR 8103762A BR 8103762 A BR8103762 A BR 8103762A
Authority
BR
Brazil
Prior art keywords
photosensitive
copier
layer
coating
support
Prior art date
Application number
BR8103762A
Other languages
English (en)
Inventor
P Lehmann
D Mohr
K Reiss
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8103762A publication Critical patent/BR8103762A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Printing Plates And Materials Therefor (AREA)
BR8103762A 1980-06-14 1981-06-12 Material copiador fotossensivel e proecesso para o revestimento de um suporte de camada com uma camada copiadora fotossensivel BR8103762A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803022362 DE3022362A1 (de) 1980-06-14 1980-06-14 Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung

Publications (1)

Publication Number Publication Date
BR8103762A true BR8103762A (pt) 1982-03-02

Family

ID=6104625

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8103762A BR8103762A (pt) 1980-06-14 1981-06-12 Material copiador fotossensivel e proecesso para o revestimento de um suporte de camada com uma camada copiadora fotossensivel

Country Status (9)

Country Link
US (1) US4487823A (pt)
EP (1) EP0042105B1 (pt)
JP (1) JPS5740249A (pt)
AT (1) ATE21177T1 (pt)
AU (1) AU541512B2 (pt)
BR (1) BR8103762A (pt)
CA (1) CA1170888A (pt)
DE (2) DE3022362A1 (pt)
ZA (1) ZA813970B (pt)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
JPS59137943A (ja) * 1983-01-28 1984-08-08 W R Gureesu:Kk 感光性樹脂組成物
JPS59138454A (ja) * 1983-01-28 1984-08-08 W R Gureesu:Kk 樹脂版用表面処理剤
JPS59155836A (ja) * 1983-02-24 1984-09-05 Tokyo Ohka Kogyo Co Ltd 感光性組成物
US4661436A (en) * 1983-06-17 1987-04-28 Petrarch System, Inc. Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant
JPS6074621A (ja) * 1983-09-30 1985-04-26 Fujitsu Ltd 半導体装置の製造方法
JPS60125841A (ja) * 1983-12-12 1985-07-05 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
DE3582697D1 (de) * 1984-06-07 1991-06-06 Hoechst Ag Positiv arbeitende strahlungsempfindliche beschichtungsloesung.
DE3421448A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
JPS61226746A (ja) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd 半導体集積回路製造用のスピンコート用レジスト組成物
JPS61226745A (ja) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd 半導体集積回路製造用のスピンコート用レジスト組成物
JPH081517B2 (ja) * 1985-04-25 1996-01-10 富士写真フイルム株式会社 感光性平版印刷版
JPH0721626B2 (ja) * 1985-08-10 1995-03-08 日本合成ゴム株式会社 半導体微細加工用レジスト組成物
JPH083630B2 (ja) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 感光性組成物
US4845008A (en) * 1986-02-20 1989-07-04 Fuji Photo Film Co., Ltd. Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent
JPH06105351B2 (ja) * 1986-03-27 1994-12-21 富士写真フイルム株式会社 感光性組成物
JPH0762761B2 (ja) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 画像形成材料
JPH0743501B2 (ja) * 1986-04-24 1995-05-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
US4869982A (en) * 1987-04-30 1989-09-26 X-Solve, Inc. Electrophotographic photoreceptor containing a toner release material
JPH06105350B2 (ja) * 1987-07-13 1994-12-21 富士写真フイルム株式会社 平版印刷版用感光性組成物
US5079122A (en) * 1990-07-03 1992-01-07 Xerox Corporation Toner compositions with charge enhancing additives
JP2828572B2 (ja) * 1993-02-08 1998-11-25 信越化学工業株式会社 ジフェノール酸第三級ブチルエステル誘導体及びそれを含有するポジ型レジスト材料
JPH0728230A (ja) * 1993-07-07 1995-01-31 Japan Synthetic Rubber Co Ltd 感放射線性レジスト組成物
US5403437A (en) * 1993-11-05 1995-04-04 Texas Instruments Incorporated Fluorosurfactant in photoresist for amorphous "Teflon" patterning
US6147010A (en) * 1996-11-14 2000-11-14 Micron Technology, Inc. Solvent prewet and method to dispense the solvent prewet
CN102977359B (zh) * 2012-11-19 2014-08-06 京东方科技集团股份有限公司 含氟聚合物、制备方法及其用途、颜料分散液及制备方法
CN111308866B (zh) * 2020-04-01 2023-08-22 烟台核晶陶瓷新材料有限公司 一种用于坩埚检测的显影溶液及其制备方法和使用方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1215861A (en) * 1967-02-09 1970-12-16 Minnesota Mining & Mfg Cleanable stain-resistant fabrics or fibers and polymers therefor
US3759711A (en) * 1970-09-16 1973-09-18 Eastman Kodak Co Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
US3779768A (en) * 1971-08-26 1973-12-18 Xidex Corp Fluorocarbon surfactants for vesicular films
US3868254A (en) * 1972-11-29 1975-02-25 Gaf Corp Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants
GB1436961A (en) * 1973-01-05 1976-05-26 Ici Ltd Photographic assemblies
US4225663A (en) * 1974-08-26 1980-09-30 Minnesota Mining And Manufacturing Company Driographic printing plate
GB1523762A (en) * 1975-02-25 1978-09-06 Oce Van Der Grinten Nv Photocopying materials
DE2805680C2 (de) * 1977-03-01 1982-05-27 Bexford Ltd., London Aufzeichnungsmaterialien für das Vesikularverfahren und Verfahren zur Erhöhung der Lichtempfindlichkeit solcher Aufzeichnungsmaterialien
US4125650A (en) * 1977-08-08 1978-11-14 International Business Machines Corporation Resist image hardening process
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
US4228232A (en) * 1979-02-27 1980-10-14 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing ethylenically unsaturated oligomers
US4339525A (en) * 1979-06-18 1982-07-13 E. I. Du Pont De Nemours And Company Color proofing system using dot-etchable photopolymerizable elements

Also Published As

Publication number Publication date
DE3175028D1 (en) 1986-09-04
DE3022362A1 (de) 1981-12-24
CA1170888A (en) 1984-07-17
ZA813970B (en) 1982-06-30
EP0042105B1 (de) 1986-07-30
ATE21177T1 (de) 1986-08-15
EP0042105A1 (de) 1981-12-23
JPS5740249A (en) 1982-03-05
AU541512B2 (en) 1985-01-10
US4487823A (en) 1984-12-11
JPH038532B2 (pt) 1991-02-06
AU7162781A (en) 1981-12-24

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Legal Events

Date Code Title Description
MM Lapse due to non-payment of fees (art. 50)