FR2364490A1 - Matiere a copier photosensible - Google Patents
Matiere a copier photosensibleInfo
- Publication number
- FR2364490A1 FR2364490A1 FR7727436A FR7727436A FR2364490A1 FR 2364490 A1 FR2364490 A1 FR 2364490A1 FR 7727436 A FR7727436 A FR 7727436A FR 7727436 A FR7727436 A FR 7727436A FR 2364490 A1 FR2364490 A1 FR 2364490A1
- Authority
- FR
- France
- Prior art keywords
- photosensitive
- weight
- copy material
- halogen
- compound containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Abstract
L'invention est relative à une matière à copier photosensible contenant un ester ou un amide d'un acide o-naphtoquinonediazide sulfonique ou o-naphtoquinonediazide carboxylique et, par rapport à la quantité de ce composé, de 1 à 50 % en poids d'un colorant organique capable de former un sel et de 5 à 75 % en poids d'un composé diazoïque contenant de l'halogène, photosensible, éliminant de l'acide lors de l'exposition, caractérisée en ce que le composé diazoïque contenant de l'halogène est un sel de diazonium de formule générale :
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19762641099 DE2641099A1 (de) | 1976-09-13 | 1976-09-13 | Lichtempfindliche kopierschicht |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2364490A1 true FR2364490A1 (fr) | 1978-04-07 |
FR2364490B1 FR2364490B1 (fr) | 1981-10-16 |
Family
ID=5987763
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7727436A Granted FR2364490A1 (fr) | 1976-09-13 | 1977-09-12 | Matiere a copier photosensible |
Country Status (13)
Country | Link |
---|---|
US (1) | US4163672A (fr) |
JP (1) | JPS6039214B2 (fr) |
AT (1) | AT356148B (fr) |
AU (1) | AU518225B2 (fr) |
BE (1) | BE858620A (fr) |
BR (1) | BR7706067A (fr) |
CA (1) | CA1097124A (fr) |
CH (1) | CH629313A5 (fr) |
DE (1) | DE2641099A1 (fr) |
FR (1) | FR2364490A1 (fr) |
GB (1) | GB1591109A (fr) |
NL (1) | NL7709935A (fr) |
SE (1) | SE417758B (fr) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1604652A (en) * | 1977-04-12 | 1981-12-16 | Vickers Ltd | Radiation sensitive materials |
JPS542720A (en) * | 1977-06-08 | 1979-01-10 | Konishiroku Photo Ind Co Ltd | Forming method of photopolymerized image |
JPS5734201Y2 (fr) * | 1978-11-06 | 1982-07-28 | ||
US4308368A (en) * | 1979-03-16 | 1981-12-29 | Daicel Chemical Industries Ltd. | Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide |
JPS57163234A (en) * | 1981-04-01 | 1982-10-07 | Fuji Photo Film Co Ltd | Photosensitive composition |
US4348471A (en) * | 1981-06-15 | 1982-09-07 | Polychrome Corporation | Positive acting composition yielding pre-development high visibility image after radiation exposure comprising acid free novolak, diazo oxide and acid sensitive dyestuff |
DE3144480A1 (de) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial |
JPS5979248A (ja) * | 1982-10-29 | 1984-05-08 | Tokyo Ohka Kogyo Co Ltd | 感光性組成物 |
GB2139369B (en) * | 1983-05-06 | 1987-01-21 | Sericol Group Ltd | Photosensitive systems showing visible indication of exposure |
JPS61141442A (ja) * | 1984-12-14 | 1986-06-28 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
JPS61235832A (ja) * | 1985-04-10 | 1986-10-21 | Konishiroku Photo Ind Co Ltd | 感光性組成物及び感光性平版印刷版 |
JPH0213389Y2 (fr) * | 1985-04-15 | 1990-04-13 | ||
JPH07113773B2 (ja) * | 1986-07-04 | 1995-12-06 | 株式会社日立製作所 | パタ−ン形成方法 |
JP2623309B2 (ja) * | 1988-02-22 | 1997-06-25 | ユーシービー ソシエテ アノニム | レジストパターンを得る方法 |
JPH0680462B2 (ja) * | 1989-03-13 | 1994-10-12 | 株式会社きもと | 感光性フィルム及びその現像方法 |
IT1248758B (it) * | 1990-06-07 | 1995-01-27 | Plurimetal Srl | Miscele fotosensibili |
GB2277382A (en) * | 1993-04-19 | 1994-10-26 | Pan Graphics Ind Limited | Photoresist composition |
DE4414897A1 (de) * | 1994-04-28 | 1995-11-02 | Hoechst Ag | Aromatische Diazoniumsalze und deren Verwendung in strahlungsempfindlichen Gemischen |
TW439016B (en) * | 1996-09-20 | 2001-06-07 | Sumitomo Chemical Co | Positive resist composition |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE510563A (fr) * | 1949-07-23 | |||
BE508664A (fr) * | 1951-02-02 | |||
BE613039A (fr) * | 1961-01-25 | |||
GB1347759A (en) * | 1971-06-17 | 1974-02-27 | Howson Algraphy Ltd | Light sensitive materials |
BE789196A (fr) * | 1971-09-25 | 1973-03-22 | Kalle Ag | Matiere a copier photosensible |
DE2331377C2 (de) * | 1973-06-20 | 1982-10-14 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Kopiermaterial |
-
1976
- 1976-09-13 DE DE19762641099 patent/DE2641099A1/de active Granted
-
1977
- 1977-09-08 CH CH1103277A patent/CH629313A5/de not_active IP Right Cessation
- 1977-09-09 SE SE7710117A patent/SE417758B/xx unknown
- 1977-09-09 NL NL7709935A patent/NL7709935A/xx not_active Application Discontinuation
- 1977-09-09 AU AU28685/77A patent/AU518225B2/en not_active Expired
- 1977-09-09 US US05/831,819 patent/US4163672A/en not_active Expired - Lifetime
- 1977-09-09 CA CA286,369A patent/CA1097124A/fr not_active Expired
- 1977-09-12 JP JP52109778A patent/JPS6039214B2/ja not_active Expired
- 1977-09-12 FR FR7727436A patent/FR2364490A1/fr active Granted
- 1977-09-12 GB GB37896/77A patent/GB1591109A/en not_active Expired
- 1977-09-12 BR BR7706067A patent/BR7706067A/pt unknown
- 1977-09-12 BE BE180843A patent/BE858620A/fr not_active IP Right Cessation
- 1977-09-12 AT AT656377A patent/AT356148B/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
NL7709935A (nl) | 1978-03-15 |
CH629313A5 (de) | 1982-04-15 |
GB1591109A (en) | 1981-06-17 |
AU2868577A (en) | 1979-03-15 |
SE417758B (sv) | 1981-04-06 |
AU518225B2 (en) | 1981-09-17 |
CA1097124A (fr) | 1981-03-10 |
US4163672A (en) | 1979-08-07 |
DE2641099C2 (fr) | 1988-10-20 |
BE858620A (fr) | 1978-03-13 |
SE7710117L (sv) | 1978-03-14 |
DE2641099A1 (de) | 1978-03-16 |
JPS5336222A (en) | 1978-04-04 |
FR2364490B1 (fr) | 1981-10-16 |
JPS6039214B2 (ja) | 1985-09-05 |
ATA656377A (de) | 1979-09-15 |
BR7706067A (pt) | 1978-07-04 |
AT356148B (de) | 1980-04-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |