BR112012007963A2 - molde e método de produção para o mesmo, e filme anti-reflexão - Google Patents

molde e método de produção para o mesmo, e filme anti-reflexão

Info

Publication number
BR112012007963A2
BR112012007963A2 BR112012007963A BR112012007963A BR112012007963A2 BR 112012007963 A2 BR112012007963 A2 BR 112012007963A2 BR 112012007963 A BR112012007963 A BR 112012007963A BR 112012007963 A BR112012007963 A BR 112012007963A BR 112012007963 A2 BR112012007963 A2 BR 112012007963A2
Authority
BR
Brazil
Prior art keywords
mold
same
production method
reflection film
reflection
Prior art date
Application number
BR112012007963A
Other languages
English (en)
Inventor
Akinobu Isurugi
Kiyoshi Minoura
Takao Imaoku
Original Assignee
Sharp Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kk filed Critical Sharp Kk
Publication of BR112012007963A2 publication Critical patent/BR112012007963A2/pt

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/12—Anodising more than once, e.g. in different baths
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
BR112012007963A 2009-10-09 2010-10-08 molde e método de produção para o mesmo, e filme anti-reflexão BR112012007963A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009235746 2009-10-09
PCT/JP2010/067753 WO2011043464A1 (ja) 2009-10-09 2010-10-08 型および型の製造方法ならびに反射防止膜

Publications (1)

Publication Number Publication Date
BR112012007963A2 true BR112012007963A2 (pt) 2016-03-29

Family

ID=43856913

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112012007963A BR112012007963A2 (pt) 2009-10-09 2010-10-08 molde e método de produção para o mesmo, e filme anti-reflexão

Country Status (7)

Country Link
US (1) US9127371B2 (pt)
EP (1) EP2487279B1 (pt)
JP (1) JP4796217B2 (pt)
CN (1) CN102575372B (pt)
BR (1) BR112012007963A2 (pt)
RU (1) RU2012118394A (pt)
WO (1) WO2011043464A1 (pt)

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JP5877006B2 (ja) * 2011-08-02 2016-03-02 三菱レイヨン株式会社 モールドの製造方法、および微細凹凸構造を表面に有する成形体の製造方法
JP2013112892A (ja) * 2011-12-01 2013-06-10 Dnp Fine Chemicals Co Ltd ナノ構造体作製用型体の製造方法、製造装置、ナノ構造体作製用型体及びナノ構造体
JP2013119636A (ja) * 2011-12-06 2013-06-17 Dainippon Printing Co Ltd 型の製造方法および型
JP2013137446A (ja) * 2011-12-28 2013-07-11 Asahi Kasei E-Materials Corp 反射防止膜製造用モールド及びその製造方法
JP5622118B2 (ja) * 2012-01-11 2014-11-12 大日本印刷株式会社 反射防止フィルム、反射防止フィルムの作製に用いられる型、および、型の製造方法
JP5561284B2 (ja) * 2012-01-11 2014-07-30 大日本印刷株式会社 反射防止フィルムの作製に用いられる型の製造方法
TWI602954B (zh) * 2012-12-10 2017-10-21 三菱化學股份有限公司 陽極氧化多孔氧化鋁的製造方法、模具以及表面具有微細凹凸結構的成形體
JP2014164102A (ja) * 2013-02-25 2014-09-08 Dainippon Printing Co Ltd 反射防止物品及び画像表示装置
JP5644974B2 (ja) * 2013-03-28 2014-12-24 大日本印刷株式会社 反射防止物品、画像表示装置、反射防止物品の製造用金型及び反射防止物品の製造用金型の製造方法
JP5641161B2 (ja) * 2013-03-29 2014-12-17 大日本印刷株式会社 反射防止物品、画像表示装置及び反射防止物品の製造用金型
JP5641162B2 (ja) * 2013-03-29 2014-12-17 大日本印刷株式会社 反射防止物品、画像表示装置、反射防止物品の製造用金型
CN105451966B (zh) * 2013-08-14 2017-03-15 三菱丽阳株式会社 圆柱状纳米压印用模具的制造方法，和纳米压印用再生模具的制造方法
JP6343937B2 (ja) * 2014-01-10 2018-06-20 デクセリアルズ株式会社 反射防止構造体及びその設計方法
KR101700240B1 (ko) * 2015-05-14 2017-02-13 한국과학기술원 양극 산화 공정을 이용한 광 포획 구조체의 제조방법과 광 포획 구조체
JP6784487B2 (ja) * 2015-10-30 2020-11-11 デクセリアルズ株式会社 光学体、および表示装置
CN106480484B (zh) * 2016-10-12 2018-06-26 中山大学 一种反射型图像器件的制备及应用方法
TWI616697B (zh) * 2016-10-13 2018-03-01 大立光電股份有限公司 環形光學元件、成像鏡組、成像裝置及電子裝置
WO2018165820A1 (en) * 2017-03-13 2018-09-20 Boe Technology Group Co., Ltd. Anti-reflective coating, touch substrate, display apparatus, and method of fabricating anti-reflective coating
KR102184876B1 (ko) * 2019-02-11 2020-12-01 동의대학교 산학협력단 환자 또는 신체장애자를 위한 기구의 부재 또는 부품용 소재
KR102184877B1 (ko) * 2019-02-11 2020-12-01 동의대학교 산학협력단 발전기 또는 운송수단의 알루미늄 합금 외판 또는 부품의 표면 개질 방법
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BRPI1011897A2 (pt) 2009-04-30 2016-04-12 Sharp Kk "molde e método de fabricação do mesmo"
EP2474650B1 (en) 2009-09-04 2017-10-04 Sharp Kabushiki Kaisha Method for forming anodized layer, method for producing mold, method for producing antireflective film, and mold and antireflective film

Also Published As

Publication number Publication date
EP2487279A4 (en) 2015-08-05
EP2487279A1 (en) 2012-08-15
EP2487279B1 (en) 2017-09-20
WO2011043464A1 (ja) 2011-04-14
JP4796217B2 (ja) 2011-10-19
US9127371B2 (en) 2015-09-08
US20120196090A1 (en) 2012-08-02
RU2012118394A (ru) 2013-11-20
CN102575372A (zh) 2012-07-11
CN102575372B (zh) 2014-05-28
JPWO2011043464A1 (ja) 2013-03-04

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Legal Events

Date Code Title Description
B08F Application fees: dismissal - article 86 of industrial property law
B08K Lapse as no evidence of payment of the annual fee has been furnished to inpi (acc. art. 87)