JP6343937B2 - 反射防止構造体及びその設計方法 - Google Patents
反射防止構造体及びその設計方法 Download PDFInfo
- Publication number
- JP6343937B2 JP6343937B2 JP2014003483A JP2014003483A JP6343937B2 JP 6343937 B2 JP6343937 B2 JP 6343937B2 JP 2014003483 A JP2014003483 A JP 2014003483A JP 2014003483 A JP2014003483 A JP 2014003483A JP 6343937 B2 JP6343937 B2 JP 6343937B2
- Authority
- JP
- Japan
- Prior art keywords
- nanostructure
- saturation
- nanostructures
- filling rate
- antireflection structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 18
- 239000002086 nanomaterial Substances 0.000 claims description 123
- 239000000758 substrate Substances 0.000 claims description 19
- 238000010586 diagram Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000012769 display material Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Optical Elements Other Than Lenses (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Laminated Bodies (AREA)
Description
また観察物とは別に、発光素子の表面やレンズなどの光学素子の表面に設ける使われ方も行われている。
ここで、充填率は、単位格子の面積に対するナノ構造体3の底面の面積の比率であり、図1Bに示す菱形の面積S1に対する、この菱形に含まれる4つのナノ構造体の扇形の面積S2の比率(%)として次式により算出することができる。
充填率(%)=(S2/S1)×100
2 基体
3 ナノ構造体
Dp 配置ピッチ
H 高さ
Tp トラックピッチ
T1、T2、T3 トラック
Claims (3)
- 基体表面の凸部により形成されたナノ構造体が、可視光波長以下の間隔で多数設けられている反射防止構造体の設計方法であって、ナノ構造体の基体表面平坦部からの高さの平均を180nm以上290nm以下、反射防止構造体の平面視における基体表面の面積に対するナノ構造体の底面の面積の比率であるナノ構造体の充填率を、該充填率と反射防止構造体の白色光に対する反射光の彩度√(a*2+b*2) の関係において、該彩度が極小値をとる充填率の±5%の範囲とする方法。
- ナノ構造体が可視光波長以下のピッチで配列しており、ナノ構造体の充填率が、ナノ構造体の配列の単位格子における、該単位格子の面積に対するナノ構造体の底面の面積の比率で算出される請求項1記載の方法。
- ナノ構造体の充填率を、該充填率と反射防止構造体の白色光に対する反射光の彩度√(a*2+b*2)の関係において、ナノ構造体の配列、ナノ構造体の形状、及びナノ構造体を構成する基体の屈折率のいずれかを変化させることにより白色光に対する反射光の彩度√(a*2+b*2)が2以下となる値とする請求項1又は2記載の設計方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014003483A JP6343937B2 (ja) | 2014-01-10 | 2014-01-10 | 反射防止構造体及びその設計方法 |
PCT/JP2015/050049 WO2015105071A1 (ja) | 2014-01-10 | 2015-01-05 | 反射防止構造体及びその設計方法 |
EP15735604.9A EP3093692A4 (en) | 2014-01-10 | 2015-01-05 | Anti-reflective structure and method for designing same |
US15/104,456 US10139524B2 (en) | 2014-01-10 | 2015-01-05 | Anti-reflective structure and method for designing same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014003483A JP6343937B2 (ja) | 2014-01-10 | 2014-01-10 | 反射防止構造体及びその設計方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018096842A Division JP6683214B2 (ja) | 2018-05-21 | 2018-05-21 | 反射防止構造体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015132689A JP2015132689A (ja) | 2015-07-23 |
JP6343937B2 true JP6343937B2 (ja) | 2018-06-20 |
Family
ID=53523898
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014003483A Active JP6343937B2 (ja) | 2014-01-10 | 2014-01-10 | 反射防止構造体及びその設計方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US10139524B2 (ja) |
EP (1) | EP3093692A4 (ja) |
JP (1) | JP6343937B2 (ja) |
WO (1) | WO2015105071A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6343937B2 (ja) * | 2014-01-10 | 2018-06-20 | デクセリアルズ株式会社 | 反射防止構造体及びその設計方法 |
JP6953109B2 (ja) * | 2015-09-24 | 2021-10-27 | ウシオ電機株式会社 | 基板上構造体の製造方法 |
TWI694133B (zh) * | 2016-02-12 | 2020-05-21 | 美商萬騰榮公司 | 藉由使用表面奈米結構來強化光泵磷光體的輸出 |
WO2018151097A1 (ja) * | 2017-02-15 | 2018-08-23 | ナルックス株式会社 | 拡散素子 |
CN107976728A (zh) * | 2017-12-28 | 2018-05-01 | 武汉华星光电技术有限公司 | 微结构、显示装置及其显示面板 |
US20220216352A1 (en) * | 2021-01-04 | 2022-07-07 | Saudi Arabian Oil Company | Nanostructures to reduce optical losses |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3070942B2 (ja) * | 1990-10-18 | 2000-07-31 | サカタインクス株式会社 | 着色剤の調整方法 |
TWI230002B (en) * | 2000-10-17 | 2005-03-21 | Nissha Printing | Antireflective molded product and its manufacture method, mold for antireflective molded product |
JP5187495B2 (ja) * | 2007-12-10 | 2013-04-24 | 株式会社豊田中央研究所 | 反射防止膜、反射防止膜の製造方法、反射防止膜用鋳型、反射防止膜用鋳型を用いて得られた反射防止膜及びレプリカ膜を用いて得られた反射防止 |
JP2011053495A (ja) * | 2009-09-02 | 2011-03-17 | Sony Corp | 光学素子、およびその製造方法 |
JP5075234B2 (ja) | 2009-09-02 | 2012-11-21 | ソニー株式会社 | 光学素子、および表示装置 |
JP4626721B1 (ja) * | 2009-09-02 | 2011-02-09 | ソニー株式会社 | 透明導電性電極、タッチパネル、情報入力装置、および表示装置 |
JP2011053496A (ja) * | 2009-09-02 | 2011-03-17 | Sony Corp | 光学素子およびその製造方法、ならびに原盤の製造方法 |
CN102575372B (zh) * | 2009-10-09 | 2014-05-28 | 夏普株式会社 | 模具和模具的制造方法以及防反射膜 |
US8747683B2 (en) * | 2009-11-27 | 2014-06-10 | Sharp Kabushiki Kaisha | Die for moth-eye, and method for producing die for moth-eye and moth-eye structure |
US20120070572A1 (en) * | 2010-09-08 | 2012-03-22 | Molecular Imprints, Inc. | Vapor Delivery System For Use in Imprint Lithography |
JP5782719B2 (ja) * | 2011-01-19 | 2015-09-24 | デクセリアルズ株式会社 | 透明導電性素子、入力装置、および表示装置 |
JO3415B1 (ar) | 2011-03-30 | 2019-10-20 | Crystal Lagoons Tech Inc | نظام لمعالجة الماء المستخدم لأغراض صناعية |
JPWO2012133943A1 (ja) * | 2011-03-31 | 2014-07-28 | ソニー株式会社 | 印刷物および印画物 |
JP2013142821A (ja) * | 2012-01-11 | 2013-07-22 | Dainippon Printing Co Ltd | 反射防止フィルム |
CN105451967B (zh) * | 2013-08-14 | 2017-11-10 | 三菱化学株式会社 | 纳米压印用模具的制造方法以及防反射物品 |
JP6343937B2 (ja) * | 2014-01-10 | 2018-06-20 | デクセリアルズ株式会社 | 反射防止構造体及びその設計方法 |
-
2014
- 2014-01-10 JP JP2014003483A patent/JP6343937B2/ja active Active
-
2015
- 2015-01-05 EP EP15735604.9A patent/EP3093692A4/en active Pending
- 2015-01-05 WO PCT/JP2015/050049 patent/WO2015105071A1/ja active Application Filing
- 2015-01-05 US US15/104,456 patent/US10139524B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2015132689A (ja) | 2015-07-23 |
EP3093692A4 (en) | 2017-09-13 |
US20160313474A1 (en) | 2016-10-27 |
US10139524B2 (en) | 2018-11-27 |
EP3093692A1 (en) | 2016-11-16 |
WO2015105071A1 (ja) | 2015-07-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6343937B2 (ja) | 反射防止構造体及びその設計方法 | |
US20150177420A1 (en) | Antireflection structure and display device | |
JP6105577B2 (ja) | 反射防止構造体及び表示装置 | |
CN102004272B (zh) | 光学器件及其制造方法和母板的制造方法 | |
JP2020184088A (ja) | スパークル低減面を備えた多色画素化ディスプレイ | |
EP2207050A3 (en) | Optical element and method for making the same, master and method for making the same, and display apparatus | |
RU2010121893A (ru) | Оптический элемент, оптический компонент с антиотражающей функцией и исходная пресс-форма | |
CN102004271A (zh) | 光学元件和制造光学元件的方法 | |
CN102804110A (zh) | 透明导电元件、输入装置以及显示装置 | |
JP2011169961A (ja) | 親水性反射防止構造及びその製造方法 | |
JP2017001437A (ja) | タイヤ | |
US20210188018A1 (en) | Tire | |
TW201622974A (zh) | 光學元件、光學複合元件及附保護膜之光學複合元件 | |
JP6683214B2 (ja) | 反射防止構造体 | |
WO2011108208A1 (ja) | 光学素子及び光学素子の製造方法 | |
CN106716184A (zh) | 防反射部件 | |
JPWO2016006651A1 (ja) | 光学部材およびその製造方法 | |
WO2017126673A1 (ja) | 機能構造体 | |
TWI490831B (zh) | 顯示裝置、抗反射基板及其製造方法 | |
JP2015187637A (ja) | 反射防止物品、画像表示装置、反射防止物品の製造方法、反射防止物品の賦型用金型、及び賦型用金型の製造方法 | |
JP2012243578A (ja) | 光学素子及び有機el装置 | |
JP2007199671A5 (ja) | ||
JP2009175481A (ja) | 反射防止光学部材および光モジュール | |
WO2012099373A3 (en) | Optical film with partially coated structure array and manufacturing method thereof | |
KR101492503B1 (ko) | 가시광 영역에서 낮은 반사율을 갖는 양면 나노 구조체 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160805 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170801 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20170928 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20171128 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180424 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180507 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6343937 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |