ATE503265T1 - Teilchenoptische anordnung mit teilchenoptischer komponente - Google Patents

Teilchenoptische anordnung mit teilchenoptischer komponente

Info

Publication number
ATE503265T1
ATE503265T1 AT06805659T AT06805659T ATE503265T1 AT E503265 T1 ATE503265 T1 AT E503265T1 AT 06805659 T AT06805659 T AT 06805659T AT 06805659 T AT06805659 T AT 06805659T AT E503265 T1 ATE503265 T1 AT E503265T1
Authority
AT
Austria
Prior art keywords
aperture plate
particle optical
arrangement
optical arrangement
particle
Prior art date
Application number
AT06805659T
Other languages
English (en)
Inventor
Antonio Casares
Rainer Knippelmeyer
Thomas Kemen
Thomas Bayer
Georg Fritz
Johann Greschner
Samuel Kalt
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Application granted granted Critical
Publication of ATE503265T1 publication Critical patent/ATE503265T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/045Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/145Combinations of electrostatic and magnetic lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177Multi-beam, e.g. fly's eye, comb probe
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/043Beam blanking
    • H01J2237/0435Multi-aperture
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/045Diaphragms
    • H01J2237/0451Diaphragms with fixed aperture
    • H01J2237/0453Diaphragms with fixed aperture multiple apertures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/049Focusing means
    • H01J2237/0492Lens systems
    • H01J2237/04922Lens systems electromagnetic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/049Focusing means
    • H01J2237/0492Lens systems
    • H01J2237/04924Lens systems electrostatic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/049Focusing means
    • H01J2237/0492Lens systems
    • H01J2237/04926Lens systems combined
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15Means for deflecting or directing discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/2446Position sensitive detectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/2448Secondary particle detectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25Tubes for localised analysis using electron or ion beams
    • H01J2237/2505Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2555Microprobes, i.e. particle-induced X-ray spectrometry
    • H01J2237/2561Microprobes, i.e. particle-induced X-ray spectrometry electron
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/28Scanning microscopes
    • H01J2237/2813Scanning microscopes characterised by the application
    • H01J2237/2817Pattern inspection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/3175Lithography
    • H01J2237/31774Multi-beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Disintegrating Or Milling (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
AT06805659T 2005-09-06 2006-09-06 Teilchenoptische anordnung mit teilchenoptischer komponente ATE503265T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71455605P 2005-09-06 2005-09-06
PCT/EP2006/008693 WO2007028595A2 (en) 2005-09-06 2006-09-06 Particle -optical component

Publications (1)

Publication Number Publication Date
ATE503265T1 true ATE503265T1 (de) 2011-04-15

Family

ID=37311941

Family Applications (2)

Application Number Title Priority Date Filing Date
AT06791877T ATE545147T1 (de) 2005-09-06 2006-09-06 Untersuchungsverfahren und system für geladene teilchen
AT06805659T ATE503265T1 (de) 2005-09-06 2006-09-06 Teilchenoptische anordnung mit teilchenoptischer komponente

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AT06791877T ATE545147T1 (de) 2005-09-06 2006-09-06 Untersuchungsverfahren und system für geladene teilchen

Country Status (6)

Country Link
US (4) US8039813B2 (de)
EP (6) EP2270833A3 (de)
JP (3) JP5663717B2 (de)
AT (2) ATE545147T1 (de)
DE (1) DE602006020899D1 (de)
WO (2) WO2007028596A1 (de)

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EP2270834B9 (de) 2013-07-10
US20090256075A1 (en) 2009-10-15
WO2007028596A1 (en) 2007-03-15
EP2267752A3 (de) 2012-04-04
EP2270834A2 (de) 2011-01-05
DE602006020899D1 (de) 2011-05-05
WO2007028595A2 (en) 2007-03-15
JP5728660B2 (ja) 2015-06-03
JP2012234827A (ja) 2012-11-29
US20160240344A1 (en) 2016-08-18
EP2270834B1 (de) 2013-01-23
JP5663717B2 (ja) 2015-02-04
JP2009507352A (ja) 2009-02-19
US9324537B2 (en) 2016-04-26
EP2267752A2 (de) 2010-12-29
US20090114818A1 (en) 2009-05-07
EP1941528A2 (de) 2008-07-09
EP1943661B1 (de) 2012-02-08
JP5222142B2 (ja) 2013-06-26
EP2270834A3 (de) 2011-01-26
US10354831B2 (en) 2019-07-16
EP1941528B1 (de) 2011-03-23
EP2270833A3 (de) 2011-01-26
EP2270833A2 (de) 2011-01-05
EP1941528B9 (de) 2011-09-28
WO2007028595A3 (en) 2007-05-24
EP2267751A3 (de) 2011-01-05
US20150008331A1 (en) 2015-01-08
ATE545147T1 (de) 2012-02-15
EP2267751A2 (de) 2010-12-29
EP1943661A1 (de) 2008-07-16
JP2009507351A (ja) 2009-02-19

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