ATE478132T1 - Siliziumoxidteilchen - Google Patents
SiliziumoxidteilchenInfo
- Publication number
- ATE478132T1 ATE478132T1 AT99924420T AT99924420T ATE478132T1 AT E478132 T1 ATE478132 T1 AT E478132T1 AT 99924420 T AT99924420 T AT 99924420T AT 99924420 T AT99924420 T AT 99924420T AT E478132 T1 ATE478132 T1 AT E478132T1
- Authority
- AT
- Austria
- Prior art keywords
- silicon oxide
- oxide nanoparticles
- oxide particles
- collection
- average diameter
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B19/00—Layered products comprising a layer of natural mineral fibres or particles, e.g. asbestos, mica
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/12—Water-insoluble compounds
- C11D3/124—Silicon containing, e.g. silica, silex, quartz or glass beads
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
- C11D7/14—Silicates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Silicon Compounds (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Glass Compositions (AREA)
- Conductive Materials (AREA)
- Polysaccharides And Polysaccharide Derivatives (AREA)
- Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/085,514 US6726990B1 (en) | 1998-05-27 | 1998-05-27 | Silicon oxide particles |
PCT/US1999/011257 WO1999061244A1 (en) | 1998-05-27 | 1999-05-20 | Silicon oxide particles |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE478132T1 true ATE478132T1 (de) | 2010-09-15 |
Family
ID=22192117
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT99924420T ATE478132T1 (de) | 1998-05-27 | 1999-05-20 | Siliziumoxidteilchen |
Country Status (9)
Country | Link |
---|---|
US (1) | US6726990B1 (de) |
EP (1) | EP1082405B1 (de) |
JP (1) | JP2002516351A (de) |
KR (1) | KR100597057B1 (de) |
CN (1) | CN1155469C (de) |
AT (1) | ATE478132T1 (de) |
CA (1) | CA2333259A1 (de) |
DE (1) | DE69942687D1 (de) |
WO (1) | WO1999061244A1 (de) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060147369A1 (en) * | 1997-07-21 | 2006-07-06 | Neophotonics Corporation | Nanoparticle production and corresponding structures |
US20090255189A1 (en) * | 1998-08-19 | 2009-10-15 | Nanogram Corporation | Aluminum oxide particles |
US20090075083A1 (en) * | 1997-07-21 | 2009-03-19 | Nanogram Corporation | Nanoparticle production and corresponding structures |
US6849334B2 (en) * | 2001-08-17 | 2005-02-01 | Neophotonics Corporation | Optical materials and optical devices |
US6788866B2 (en) | 2001-08-17 | 2004-09-07 | Nanogram Corporation | Layer materials and planar optical devices |
US7575784B1 (en) | 2000-10-17 | 2009-08-18 | Nanogram Corporation | Coating formation by reactive deposition |
US6482374B1 (en) * | 1999-06-16 | 2002-11-19 | Nanogram Corporation | Methods for producing lithium metal oxide particles |
US6952504B2 (en) | 2001-12-21 | 2005-10-04 | Neophotonics Corporation | Three dimensional engineering of planar optical structures |
US6599631B2 (en) * | 2001-01-26 | 2003-07-29 | Nanogram Corporation | Polymer-inorganic particle composites |
US7384680B2 (en) * | 1997-07-21 | 2008-06-10 | Nanogram Corporation | Nanoparticle-based power coatings and corresponding structures |
US6447693B1 (en) | 1998-10-21 | 2002-09-10 | W. R. Grace & Co.-Conn. | Slurries of abrasive inorganic oxide particles and method for polishing copper containing surfaces |
JP2002527599A (ja) | 1998-10-21 | 2002-08-27 | ダブリュ・アール・グレイス・アンド・カンパニー・コネテイカット | 研摩材無機酸化物粒子のスラリおよび該粒子の研磨性を調節する方法 |
US6974367B1 (en) * | 1999-09-02 | 2005-12-13 | Micron Technology, Inc. | Chemical mechanical polishing process |
DE19952383A1 (de) * | 1999-10-30 | 2001-05-17 | Henkel Kgaa | Wasch- und Reinigungsmittel |
JP2001226665A (ja) * | 2000-02-16 | 2001-08-21 | Maruo Calcium Co Ltd | 艶出し剤用研磨剤及びそれを含有してなる艶出し剤組成物 |
DE10042806A1 (de) * | 2000-08-30 | 2002-03-28 | Wap Reinigungssysteme | Reinigungsmittel für die Hoch- und Niederdruckreinigung |
KR20040012671A (ko) | 2000-10-17 | 2004-02-11 | 네오포토닉스 코포레이션 | 반응성 증착에 의한 코팅 형성 |
KR100890981B1 (ko) | 2000-10-26 | 2009-03-27 | 네오포토닉스 코포레이션 | 모놀리식 광학 구조체, 이 모놀리식 광학 구조체의 형성 방법, 가요성 광섬유, 광섬유 형성 방법, 및 광섬유 예비 성형체 |
EP1886802A3 (de) | 2001-08-03 | 2008-07-30 | NanoGram Corporation | Strukturen mit anorganischen Polymerpartikelmischungen |
US6917511B1 (en) | 2001-08-14 | 2005-07-12 | Neophotonics Corporation | Reactive deposition for the formation of chip capacitors |
US6723435B1 (en) | 2001-08-28 | 2004-04-20 | Nanogram Corporation | Optical fiber preforms |
JP3804009B2 (ja) * | 2001-10-01 | 2006-08-02 | 触媒化成工業株式会社 | 研磨用シリカ粒子分散液、その製造方法および研磨材 |
JP4044762B2 (ja) * | 2002-01-10 | 2008-02-06 | 電気化学工業株式会社 | 高純度・超微粉SiOx粉及びその製造方法 |
KR100401335B1 (en) * | 2003-03-08 | 2003-10-10 | Mijitech Co Ltd | Metal nanoparticle surface-coated with silicon oxides and preparation thereof |
US8865271B2 (en) | 2003-06-06 | 2014-10-21 | Neophotonics Corporation | High rate deposition for the formation of high quality optical coatings |
US7521097B2 (en) | 2003-06-06 | 2009-04-21 | Nanogram Corporation | Reactive deposition for electrochemical cell production |
US20050022456A1 (en) * | 2003-07-30 | 2005-02-03 | Babu S. V. | Polishing slurry and method for chemical-mechanical polishing of copper |
US7186653B2 (en) * | 2003-07-30 | 2007-03-06 | Climax Engineered Materials, Llc | Polishing slurries and methods for chemical mechanical polishing |
US7491431B2 (en) | 2004-12-20 | 2009-02-17 | Nanogram Corporation | Dense coating formation by reactive deposition |
US20070003694A1 (en) * | 2005-05-23 | 2007-01-04 | Shivkumar Chiruvolu | In-flight modification of inorganic particles within a reaction product flow |
US7972691B2 (en) * | 2006-12-22 | 2011-07-05 | Nanogram Corporation | Composites of polymers and metal/metalloid oxide nanoparticles and methods for forming these composites |
KR101556873B1 (ko) | 2007-01-03 | 2015-10-02 | 나노그램 코포레이션 | 규소/게르마늄을 기초로 하는 나노입자 잉크, 도핑된 입자, 반도체를 위한 인쇄 및 공정 |
WO2008100568A1 (en) * | 2007-02-17 | 2008-08-21 | Nanogram Corporation | Functional composites, functional inks and applications thereof |
FR2916193B1 (fr) * | 2007-05-18 | 2009-08-07 | Commissariat Energie Atomique | Synthese par pyrolyse laser de nanocristaux de silicium. |
US20090020411A1 (en) * | 2007-07-20 | 2009-01-22 | Holunga Dean M | Laser pyrolysis with in-flight particle manipulation for powder engineering |
CN101815771A (zh) * | 2007-10-05 | 2010-08-25 | 圣戈本陶瓷及塑料股份有限公司 | 改进的碳化硅颗粒及其制造方法和使用方法 |
WO2009046296A1 (en) * | 2007-10-05 | 2009-04-09 | Saint-Gobain Ceramics & Plastics, Inc. | Polishing of sapphire with composite slurries |
CN102036999A (zh) * | 2008-03-21 | 2011-04-27 | 内诺格雷姆公司 | 金属硅氮化物或金属硅氧氮化物亚微米荧光粉颗粒及合成这些荧光粉的方法 |
CN104072993A (zh) | 2009-01-08 | 2014-10-01 | 纳克公司 | 聚硅氧烷聚合物与无机纳米颗粒的复合物及其形成方法 |
JP5370055B2 (ja) * | 2009-10-06 | 2013-12-18 | 住友大阪セメント株式会社 | ケイ素低級酸化物粒子の製造方法及び該粒子の分散液 |
JP5613422B2 (ja) * | 2010-02-12 | 2014-10-22 | 花王株式会社 | 磁気ディスク基板用研磨液組成物 |
US8944789B2 (en) | 2010-12-10 | 2015-02-03 | National Oilwell Varco, L.P. | Enhanced elastomeric stator insert via reinforcing agent distribution and orientation |
JP5942897B2 (ja) * | 2012-03-22 | 2016-06-29 | 信越化学工業株式会社 | 酸化珪素析出体の連続製造方法及び製造装置 |
CN103311511B (zh) * | 2013-05-23 | 2015-05-27 | 刘国钧 | 一种壳核结构纳米硅复合材料的制备方法 |
BR112016019261B1 (pt) | 2014-02-18 | 2022-06-14 | Reme Technologies, Llc | Seção de energia de cavidade progressiva |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE790704A (fr) | 1971-10-28 | 1973-02-15 | Degussa | Procede pour la fabrication d'oxydes finement |
US4011099A (en) | 1975-11-07 | 1977-03-08 | Monsanto Company | Preparation of damage-free surface on alpha-alumina |
US4048290A (en) | 1976-01-28 | 1977-09-13 | Cabot Corporation | Process for the production of finely-divided metal and metalloid oxides |
US4356107A (en) * | 1979-11-26 | 1982-10-26 | Nalco Chemical Company | Process for preparing silica sols |
JPS58110414A (ja) * | 1981-12-23 | 1983-07-01 | Tokuyama Soda Co Ltd | 無機酸化物及びその製造方法 |
JPS59206042A (ja) | 1983-05-07 | 1984-11-21 | Sumitomo Electric Ind Ltd | 微粉末の製造方法及び製造装置 |
EP0151490B1 (de) | 1984-02-09 | 1991-01-16 | Toyota Jidosha Kabushiki Kaisha | Verfahren zur Herstellung von ultrafeinen Keramikpartikeln |
US4548798A (en) * | 1984-04-16 | 1985-10-22 | Exxon Research And Engineering Co. | Laser synthesis of refractory oxide powders |
US4558017A (en) | 1984-05-14 | 1985-12-10 | Allied Corporation | Light induced production of ultrafine powders comprising metal silicide powder and silicon |
US4536252A (en) | 1985-02-07 | 1985-08-20 | The United States Of America As Represented By The Secretary Of The Army | Laser-induced production of nitrosyl fluoride for etching of semiconductor surfaces |
DE3616133A1 (de) * | 1985-09-25 | 1987-11-19 | Merck Patent Gmbh | Kugelfoermige sio(pfeil abwaerts)2(pfeil abwaerts)-partikel |
JPS6374911A (ja) | 1986-09-19 | 1988-04-05 | Shin Etsu Chem Co Ltd | 微細球状シリカの製造法 |
US4956313A (en) | 1987-08-17 | 1990-09-11 | International Business Machines Corporation | Via-filling and planarization technique |
DE3884778T2 (de) * | 1987-12-29 | 1994-05-11 | Du Pont | Feine Polierzusammensetzung für Plaketten. |
US4910155A (en) | 1988-10-28 | 1990-03-20 | International Business Machines Corporation | Wafer flood polishing |
US5352277A (en) * | 1988-12-12 | 1994-10-04 | E. I. Du Pont De Nemours & Company | Final polishing composition |
US5062936A (en) | 1989-07-12 | 1991-11-05 | Thermo Electron Technologies Corporation | Method and apparatus for manufacturing ultrafine particles |
US4959113C1 (en) * | 1989-07-31 | 2001-03-13 | Rodel Inc | Method and composition for polishing metal surfaces |
DE3939953A1 (de) | 1989-12-02 | 1991-06-06 | Bayer Ag | Verfahren zur herstellung feinteiliger keramischer oxid-pulver aus vorlaeuferverbindungen |
US5128081A (en) * | 1989-12-05 | 1992-07-07 | Arch Development Corporation | Method of making nanocrystalline alpha alumina |
JP3047110B2 (ja) * | 1990-06-15 | 2000-05-29 | 株式会社東北テクノアーチ | 金属酸化物微粒子の製造方法 |
JPH075306B2 (ja) * | 1990-10-08 | 1995-01-25 | 信越化学工業株式会社 | 希土オキシ硫化物の精製方法 |
US5228886A (en) | 1990-10-09 | 1993-07-20 | Buehler, Ltd. | Mechanochemical polishing abrasive |
US5447708A (en) * | 1993-01-21 | 1995-09-05 | Physical Sciences, Inc. | Apparatus for producing nanoscale ceramic powders |
US5626715A (en) * | 1993-02-05 | 1997-05-06 | Lsi Logic Corporation | Methods of polishing semiconductor substrates |
US5376449A (en) * | 1993-07-09 | 1994-12-27 | Martin Marietta Energy Systems, Inc. | Silica powders for powder evacuated thermal insulating panel and method |
WO1995024054A1 (en) * | 1994-03-01 | 1995-09-08 | Rodel, Inc. | Improved compositions and methods for polishing |
EP0770121B1 (de) * | 1994-07-04 | 1999-05-06 | Unilever N.V. | Verfahren zum waschen und zusammensetzung |
US5527423A (en) | 1994-10-06 | 1996-06-18 | Cabot Corporation | Chemical mechanical polishing slurry for metal layers |
US5580655A (en) * | 1995-03-03 | 1996-12-03 | Dow Corning Corporation | Silica nanoparticles |
US5876683A (en) * | 1995-11-02 | 1999-03-02 | Glumac; Nicholas | Combustion flame synthesis of nanophase materials |
US5605569A (en) * | 1995-11-08 | 1997-02-25 | Ppg Industries, Inc. | Precipitated silica having high sodium sulfate content |
US5645736A (en) * | 1995-12-29 | 1997-07-08 | Symbios Logic Inc. | Method for polishing a wafer |
DE69723347T2 (de) * | 1996-04-22 | 2004-04-15 | Merck Patent Gmbh | Beschichtete SiO2-Teilchen |
US5876490A (en) * | 1996-12-09 | 1999-03-02 | International Business Machines Corporatin | Polish process and slurry for planarization |
FR2763258B1 (fr) * | 1997-05-15 | 1999-06-25 | Commissariat Energie Atomique | Procede de fabrication d'oxydes metalliques, simples ou mixtes, ou d'oxyde de silicium |
US5871872A (en) * | 1997-05-30 | 1999-02-16 | Shipley Company, Ll.C. | Dye incorporated pigments and products made from same |
US5770022A (en) * | 1997-06-05 | 1998-06-23 | Dow Corning Corporation | Method of making silica nanoparticles |
US5891205A (en) * | 1997-08-14 | 1999-04-06 | Ekc Technology, Inc. | Chemical mechanical polishing composition |
US5801092A (en) * | 1997-09-04 | 1998-09-01 | Ayers; Michael R. | Method of making two-component nanospheres and their use as a low dielectric constant material for semiconductor devices |
-
1998
- 1998-05-27 US US09/085,514 patent/US6726990B1/en not_active Expired - Lifetime
-
1999
- 1999-05-20 AT AT99924420T patent/ATE478132T1/de not_active IP Right Cessation
- 1999-05-20 CA CA002333259A patent/CA2333259A1/en not_active Abandoned
- 1999-05-20 DE DE69942687T patent/DE69942687D1/de not_active Expired - Lifetime
- 1999-05-20 KR KR1020007013321A patent/KR100597057B1/ko not_active IP Right Cessation
- 1999-05-20 EP EP99924420A patent/EP1082405B1/de not_active Expired - Lifetime
- 1999-05-20 JP JP2000550680A patent/JP2002516351A/ja active Pending
- 1999-05-20 WO PCT/US1999/011257 patent/WO1999061244A1/en active IP Right Grant
- 1999-05-20 CN CNB998073466A patent/CN1155469C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2002516351A (ja) | 2002-06-04 |
CN1155469C (zh) | 2004-06-30 |
DE69942687D1 (de) | 2010-09-30 |
KR100597057B1 (ko) | 2006-07-06 |
CA2333259A1 (en) | 1999-12-02 |
EP1082405B1 (de) | 2010-08-18 |
EP1082405A4 (de) | 2005-09-21 |
KR20010043853A (ko) | 2001-05-25 |
WO1999061244A1 (en) | 1999-12-02 |
US6726990B1 (en) | 2004-04-27 |
EP1082405A1 (de) | 2001-03-14 |
WO1999061244A8 (en) | 2000-03-09 |
CN1305411A (zh) | 2001-07-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |