ATE266602T1 - Pyrogen hergestelltes siliciumdioxid - Google Patents

Pyrogen hergestelltes siliciumdioxid

Info

Publication number
ATE266602T1
ATE266602T1 AT01710041T AT01710041T ATE266602T1 AT E266602 T1 ATE266602 T1 AT E266602T1 AT 01710041 T AT01710041 T AT 01710041T AT 01710041 T AT01710041 T AT 01710041T AT E266602 T1 ATE266602 T1 AT E266602T1
Authority
AT
Austria
Prior art keywords
sub
silicon dioxide
eta
rpm
pyrogenely
Prior art date
Application number
AT01710041T
Other languages
English (en)
Inventor
Monika Oswald
Gerrit Schneider
Klaus Deller
Original Assignee
Degussa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP00117922.5A external-priority patent/EP1182167A1/de
Application filed by Degussa filed Critical Degussa
Application granted granted Critical
Publication of ATE266602T1 publication Critical patent/ATE266602T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/901—Liquid phase reaction process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Silicon Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Paints Or Removers (AREA)
  • Dental Preparations (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
AT01710041T 2000-08-21 2001-08-20 Pyrogen hergestelltes siliciumdioxid ATE266602T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00117922.5A EP1182167A1 (de) 2000-08-21 Pyrogen hergestelltes Siliciumdioxid
EP01115613.0A EP1186573A1 (de) 2000-08-23 2001-07-03 Pyrogen hergestelltes Siliciumdioxid

Publications (1)

Publication Number Publication Date
ATE266602T1 true ATE266602T1 (de) 2004-05-15

Family

ID=26071309

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01710041T ATE266602T1 (de) 2000-08-21 2001-08-20 Pyrogen hergestelltes siliciumdioxid

Country Status (4)

Country Link
US (2) US6679945B2 (de)
JP (1) JP3919482B2 (de)
AT (1) ATE266602T1 (de)
DE (1) DE50102242D1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19936478A1 (de) * 1999-08-03 2001-02-15 Degussa Sinterwerkstoffe
DE10258857A1 (de) * 2002-12-17 2004-07-08 Degussa Ag Pyrogen hergestelltes Siliciumdioxid und Dispersion hiervon
DE10312970A1 (de) * 2003-03-24 2004-10-14 Degussa Ag Pyrogenes Siliciumdioxidpulver und Dispersion hiervon
DE10337198A1 (de) * 2003-08-13 2005-03-17 Degussa Ag Träger auf Basis von Granulaten, die aus pyrogen hergestelltem Siliciumdioxiden hergestellt sind
DE102004010755A1 (de) * 2004-03-05 2005-09-22 Degussa Ag Silikonkautschuk
JP5460961B2 (ja) * 2004-09-30 2014-04-02 キャボット コーポレイション シリカの製造方法
EP1700824A1 (de) * 2005-03-09 2006-09-13 Degussa AG Granulate basierend auf pyrogen hergestelles silicon dioxid, sowie Verfahren zu deren Herstellung und Verwendung dergleichen
US7811846B2 (en) * 2005-03-21 2010-10-12 Agency For Science, Technology And Research Semiconductor devices grown in spherical cavity arrays and its preparation method
DE102006046619A1 (de) * 2006-09-29 2008-04-03 Heraeus Quarzglas Gmbh & Co. Kg Streichfähiger SiO2-Schlicker für die Herstellung von Quarzglas, Verfahren zur Herstellung von Quarzglas unter Einsatz des Schlickers
EP2014622B1 (de) * 2007-07-06 2017-01-18 Evonik Degussa GmbH Verfahren zur Herstellung eines Kieselglasgranulats
EP3696139A1 (de) 2010-04-23 2020-08-19 Pixelligent Technologies, LLC Synthese, abdeckung und dispergierung von nanokristallen
WO2012058271A2 (en) 2010-10-27 2012-05-03 Pixelligent Technologies, Llc Synthesis, capping and dispersion of nanocrystals
US9359689B2 (en) 2011-10-26 2016-06-07 Pixelligent Technologies, Llc Synthesis, capping and dispersion of nanocrystals
TWI794149B (zh) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 石英玻璃粉粒、不透明成型體及彼等之製備方法
JP6940236B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 溶融炉内での露点監視による石英ガラス体の調製
EP3390290B1 (de) 2015-12-18 2023-03-15 Heraeus Quarzglas GmbH & Co. KG Herstellung eines opaken quarzglaskörpers
JP7048053B2 (ja) 2015-12-18 2022-04-05 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー マルチチャンバ炉内での石英ガラス体の調製
TWI808933B (zh) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
CN108698888A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
US11492285B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies from silicon dioxide granulate
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
KR20180095614A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 낮은 OH, Cl, 및 Al 함량을 갖는 석영 유리로 제조된 유리 섬유 및 프리폼
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass
CN107416849A (zh) * 2017-09-06 2017-12-01 青岛科技大学 一种制备单分散纳米二氧化硅粒子的方法
CN110698224A (zh) * 2019-11-11 2020-01-17 浙江大学台州研究院 一种用于海洋工程钢筋混凝土结构表面的渗透型防护剂

Family Cites Families (19)

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US4248600A (en) * 1978-05-30 1981-02-03 J. M. Huber Corporation High solids aqueous silica dispersion
DE2844052A1 (de) * 1978-10-10 1980-04-30 Degussa Waessrige dispersion einer hydrophoben kieselsaeure
WO1984002519A1 (en) * 1982-12-23 1984-07-05 Suwa Seikosha Kk Process for producing quartz glass
DE3803895C1 (de) * 1988-02-09 1989-04-13 Degussa Ag, 6000 Frankfurt, De
US5207814A (en) * 1989-02-10 1993-05-04 Enichem S.P.A. Process for preparing monoliths of aerogels of metal oxides
US5116535A (en) 1989-03-21 1992-05-26 Cabot Corporation Aqueous colloidal dispersion of fumed silica without a stabilizer
US5063179A (en) * 1990-03-02 1991-11-05 Cabot Corporation Process for making non-porous micron-sized high purity silica
US5240488A (en) * 1992-08-14 1993-08-31 At&T Bell Laboratories Manufacture of vitreous silica product via a sol-gel process using a polymer additive
IT1256359B (it) 1992-09-01 1995-12-01 Enichem Spa Procedimento per la preparazione di componenti e dispositivi ottici indimensioni finali o quasi finali, e prodotti cosi' ottenuti
WO1994018277A1 (en) * 1993-02-12 1994-08-18 Cabot Corporation Surfactant modified silica
US6193795B1 (en) * 1993-08-02 2001-02-27 Degussa Corporation Low structure pyrogenic hydrophilic and hydrophobic metallic oxides, production and use
IT1270628B (it) 1994-10-06 1997-05-07 Enichem Spa Manufatti in ossido di silicio e/o altri ossidi metallici misti e procedimento per la loro preparazione in dimensioni finali o quasi finali
ES2154748T3 (es) * 1995-02-04 2001-04-16 Degussa Granulados a base de dioxido de silicio preparado por via pirogena, procedimiento para su preparacion y su empleo.
US5827363A (en) * 1995-12-19 1998-10-27 Degussa Corporation Structure precipitated silicates and silicas, production and use in ink jet printing
US6207610B1 (en) * 1996-05-17 2001-03-27 Degussa-Huls Ag Compacts based on pyrogenically produced silicon dioxide
DE19756840A1 (de) 1997-01-23 1998-07-30 Degussa Pyrogene Oxide und Verfahren zu ihrer Herstellung
KR100238191B1 (ko) * 1998-02-16 2000-02-01 윤종용 실리카 글래스의 제조방법
DE19943103A1 (de) * 1999-09-09 2001-03-15 Wacker Chemie Gmbh Hochgefüllte SiO2-Dispersion, Verfahren zu ihrer Herstellung und Verwendung
IT1318617B1 (it) * 2000-07-10 2003-08-27 Novara Technology Srl Processo sol-gel per la produzione di geli secchi di grandidimensioni e vetri derivati.

Also Published As

Publication number Publication date
US20020044903A1 (en) 2002-04-18
JP2002145610A (ja) 2002-05-22
US6679945B2 (en) 2004-01-20
US6890873B2 (en) 2005-05-10
US20040116270A1 (en) 2004-06-17
JP3919482B2 (ja) 2007-05-23
DE50102242D1 (de) 2004-06-17

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