ATE400838T1 - Lichtaushärtbare und hitzehärtbare harzzusammensetzung - Google Patents

Lichtaushärtbare und hitzehärtbare harzzusammensetzung

Info

Publication number
ATE400838T1
ATE400838T1 AT01999859T AT01999859T ATE400838T1 AT E400838 T1 ATE400838 T1 AT E400838T1 AT 01999859 T AT01999859 T AT 01999859T AT 01999859 T AT01999859 T AT 01999859T AT E400838 T1 ATE400838 T1 AT E400838T1
Authority
AT
Austria
Prior art keywords
curing
group
resin composition
heat
light
Prior art date
Application number
AT01999859T
Other languages
English (en)
Inventor
Tadatomi Nishikubo
Atsushi Kameyama
Masaki Sasaki
Masatoshi Kusama
Original Assignee
Univ Kanagawa
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Kanagawa, Taiyo Ink Mfg Co Ltd filed Critical Univ Kanagawa
Application granted granted Critical
Publication of ATE400838T1 publication Critical patent/ATE400838T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/061—Polyesters; Polycarbonates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/16—Cyclic ethers having four or more ring atoms
    • C08G65/18—Oxetanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/331—Polymers modified by chemical after-treatment with organic compounds containing oxygen
    • C08G65/332—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Indole Compounds (AREA)
  • Paints Or Removers (AREA)
AT01999859T 2000-12-04 2001-11-27 Lichtaushärtbare und hitzehärtbare harzzusammensetzung ATE400838T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000368536A JP4382978B2 (ja) 2000-12-04 2000-12-04 光硬化性・熱硬化性樹脂組成物

Publications (1)

Publication Number Publication Date
ATE400838T1 true ATE400838T1 (de) 2008-07-15

Family

ID=18838748

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01999859T ATE400838T1 (de) 2000-12-04 2001-11-27 Lichtaushärtbare und hitzehärtbare harzzusammensetzung

Country Status (9)

Country Link
US (1) US6867282B2 (de)
EP (1) EP1341039B1 (de)
JP (1) JP4382978B2 (de)
KR (1) KR100830019B1 (de)
CN (1) CN1217233C (de)
AT (1) ATE400838T1 (de)
DE (1) DE60134774D1 (de)
TW (1) TWI278497B (de)
WO (1) WO2002046840A1 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1259349C (zh) * 2000-03-29 2006-06-14 学校法人神奈川大学 活性能量线固化性树脂、其制造方法及光固化性、热固化性树脂组合物
WO2002064662A1 (fr) * 2001-02-15 2002-08-22 Kanagawa University Compose de polyester insature, resine durcissable aux radiations actiniques, procedes de production de ces derniers et composition durcissable
KR100855168B1 (ko) * 2001-10-22 2008-08-29 다이요 잉키 세이조 가부시키가이샤 광 경화성·열 경화성 수지 조성물
US7495035B2 (en) * 2003-08-12 2009-02-24 Mitsui Chemicals, Inc. Photo-curable resin composition and sealing agent for flat panel display using the same
EP1698644B1 (de) * 2003-11-21 2013-02-27 DIC Corporation Fluorhaltige photohärtende zusammensetzung
KR100845657B1 (ko) * 2004-07-07 2008-07-10 다이요 잉키 세이조 가부시키가이샤 광 경화성·열 경화성 수지 조성물과 그것을 사용한 건식필름, 및 그의 경화물
KR100842168B1 (ko) * 2005-01-21 2008-06-30 주식회사 엘지화학 감광성 수지 조성물 및 이를 이용한 액정 표시 장치
JP4621036B2 (ja) * 2005-02-08 2011-01-26 太陽ホールディングス株式会社 感光性樹脂組成物、及びその硬化物並びに該硬化物からなる表示パネル用スペーサー
TW200710570A (en) * 2005-05-31 2007-03-16 Taiyo Ink Mfg Co Ltd Composition for forming adhesive pattern, multilayer structure obtained by using same, and method for producing such multilayer structure
JP4470835B2 (ja) 2005-08-08 2010-06-02 ソニー株式会社 液体吐出型記録ヘッド及び液体吐出装置
US7935471B2 (en) * 2005-10-20 2011-05-03 Hewlett-Packard Development Company, L.P. NIR/IR curable coatings for light directed imaging
JP5256645B2 (ja) * 2006-05-31 2013-08-07 三菱化学株式会社 保護膜用熱硬化性組成物、硬化物、及び液晶表示装置
KR20090098837A (ko) * 2006-11-29 2009-09-17 도요 보세키 가부시키가이샤 옥세탄 함유 수지, 이를 사용한 접착제 및 레지스트제
TWI421632B (zh) 2007-04-24 2014-01-01 Mitsui Chemicals Inc 感光性樹脂組成物、乾膜、以及其加工品
WO2015200189A1 (en) 2014-06-23 2015-12-30 Carbon3D, Inc. Three-dimensional objects produced from materials having multiple mechanisms of hardening
TWI559082B (zh) 2014-07-07 2016-11-21 財團法人工業技術研究院 生質材料與其形成方法與印刷電路板
KR20160053750A (ko) * 2014-10-29 2016-05-13 삼성에스디아이 주식회사 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치
JP6731930B2 (ja) 2015-02-05 2020-07-29 カーボン，インコーポレイテッド 断続的曝露による付加製造方法
US10391711B2 (en) 2015-03-05 2019-08-27 Carbon, Inc. Fabrication of three dimensional objects with multiple operating modes
JP6362272B2 (ja) * 2015-03-13 2018-07-25 日本化薬株式会社 カルボキシル基含有反応性化合物、それを用いた硬化型樹脂組成物、およびその用途。
US10106643B2 (en) * 2015-03-31 2018-10-23 3M Innovative Properties Company Dual-cure nanostructure transfer film
JP7069006B2 (ja) 2015-09-04 2022-05-17 カーボン，インコーポレイテッド 積層造形用シアネートエステル二重硬化樹脂
CN108291011B (zh) * 2015-09-09 2021-03-02 卡本有限公司 用于增材制造的环氧双重固化树脂
US10647873B2 (en) 2015-10-30 2020-05-12 Carbon, Inc. Dual cure article of manufacture with portions of differing solubility
US11891485B2 (en) 2015-11-05 2024-02-06 Carbon, Inc. Silicone dual cure resins for additive manufacturing
US10538031B2 (en) 2015-12-22 2020-01-21 Carbon, Inc. Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products
US10343331B2 (en) 2015-12-22 2019-07-09 Carbon, Inc. Wash liquids for use in additive manufacturing with dual cure resins
US10501572B2 (en) 2015-12-22 2019-12-10 Carbon, Inc. Cyclic ester dual cure resins for additive manufacturing
WO2017112682A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Fabrication of compound products from multiple intermediates by additive manufacturing with dual cure resins
EP3341792A1 (de) 2015-12-22 2018-07-04 Carbon, Inc. Doppelvorläufer-harzsysteme zur generativen fertigung mit doppelhärtungsharzen
WO2017112751A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Blocked silicone dual cure resins for additive manufacturing
US10647054B2 (en) 2015-12-22 2020-05-12 Carbon, Inc. Accelerants for additive manufacturing with dual cure resins
US10500786B2 (en) 2016-06-22 2019-12-10 Carbon, Inc. Dual cure resins containing microwave absorbing materials and methods of using the same
CN110023056B (zh) 2016-11-21 2021-08-24 卡本有限公司 通过递送反应性组分用于后续固化来制造三维物体的方法
WO2018165090A1 (en) 2017-03-09 2018-09-13 Carbon, Inc. Tough, high temperature polymers produced by stereolithography
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
JP6894015B2 (ja) 2017-06-21 2021-06-23 カーボン，インコーポレイテッド 積層造形の方法
US11504903B2 (en) 2018-08-28 2022-11-22 Carbon, Inc. 1K alcohol dual cure resins for additive manufacturing

Family Cites Families (7)

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Publication number Priority date Publication date Assignee Title
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
US5853957A (en) * 1995-05-08 1998-12-29 Tamura Kaken Co., Ltd Photosensitive resin compositions, cured films thereof, and circuit boards
JP3851366B2 (ja) 1995-10-30 2006-11-29 ナショナル スターチ アンド ケミカル インベストメント ホールディング コーポレイション 感光性樹脂組成物
JP3933322B2 (ja) * 1998-09-01 2007-06-20 学校法人神奈川大学 硬化性組成物
JP4218851B2 (ja) 1999-02-25 2009-02-04 大日本印刷株式会社 カラーフィルタ保護膜形成用感光性樹脂組成物
US6410206B1 (en) * 1999-02-25 2002-06-25 Dai Nippon Printing Co., Ltd. Photosensitive resin composition, color filter, and copolymer resin useful for them
CN1259349C (zh) * 2000-03-29 2006-06-14 学校法人神奈川大学 活性能量线固化性树脂、其制造方法及光固化性、热固化性树脂组合物

Also Published As

Publication number Publication date
DE60134774D1 (de) 2008-08-21
US6867282B2 (en) 2005-03-15
JP4382978B2 (ja) 2009-12-16
EP1341039A4 (de) 2006-09-20
EP1341039A1 (de) 2003-09-03
EP1341039B1 (de) 2008-07-09
JP2002169279A (ja) 2002-06-14
WO2002046840A1 (fr) 2002-06-13
CN1478219A (zh) 2004-02-25
KR20040024533A (ko) 2004-03-20
US20030216514A1 (en) 2003-11-20
CN1217233C (zh) 2005-08-31
KR100830019B1 (ko) 2008-05-15
TWI278497B (en) 2007-04-11

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