WO2021016859A1 - 显示面板、显示装置及显示面板的制作方法 - Google Patents

显示面板、显示装置及显示面板的制作方法 Download PDF

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Publication number
WO2021016859A1
WO2021016859A1 PCT/CN2019/098360 CN2019098360W WO2021016859A1 WO 2021016859 A1 WO2021016859 A1 WO 2021016859A1 CN 2019098360 W CN2019098360 W CN 2019098360W WO 2021016859 A1 WO2021016859 A1 WO 2021016859A1
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Prior art keywords
layer
display panel
support structure
emitting layer
substrate
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PCT/CN2019/098360
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English (en)
French (fr)
Inventor
周扬川
文达
Original Assignee
深圳市柔宇科技有限公司
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Application filed by 深圳市柔宇科技有限公司 filed Critical 深圳市柔宇科技有限公司
Priority to CN201980090109.XA priority Critical patent/CN113424333A/zh
Priority to PCT/CN2019/098360 priority patent/WO2021016859A1/zh
Publication of WO2021016859A1 publication Critical patent/WO2021016859A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/871—Self-supporting sealing arrangements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details

Definitions

  • This application relates to the field of display technology, and in particular to a display panel, a display device, and a manufacturing method of the display panel.
  • the existing display screens are equipped with a layer of support structure (Photo Space, PS), whose purpose is to support the metal mask plate and the back cover substrate attached to it during the production process.
  • a layer of support structure Photo Space, PS
  • the metal mask will affect the support structure or the deposition on the
  • the material layer on the support structure is damaged (such as scratched or squeezed deformation), which causes an abnormal film layer at the support structure and affects the display effect of the display panel.
  • the larger the contact area between the support structure and the metal mask the greater the damage area to the support structure or the material layer deposited on the support structure.
  • the embodiment of the present application discloses a display panel, a display device, and a manufacturing method of the display panel to solve the above technical problems.
  • an embodiment of the present application discloses a display panel, including:
  • the first electrode layer is arranged on the substrate
  • Pixel defining layers are arranged on the first electrode layer at intervals;
  • the organic light emitting layer is disposed on the first electrode layer and located between adjacent pixel definition layers;
  • the second electrode layer is disposed on the organic light-emitting layer and extends to cover the supporting structure;
  • At least one groove is opened on the side of the support structure away from the pixel definition layer, and the width of the groove gradually decreases along the direction from the support structure to the pixel definition layer.
  • the present application also discloses a display device including the display panel described in the first aspect.
  • an embodiment of the present application also discloses a manufacturing method of a display panel, including:
  • Laser irradiation is used to repair the damaged location.
  • the extra film layer of the support structure due to scratches or extrusion deformation can be transferred laterally, thereby ensuring that the excess film layer does not protrude too high from the normal film layer, making subsequent film packaging
  • the supporting structure can be covered with a certain thickness to ensure the effective reliability of the package.
  • the damage location of the support structure is determined by optical detection, and the damage location is repaired by laser irradiation, so that the damage location is thermally decomposed, thereby achieving the effect of repairing the damage location, and further improving the follow-up
  • the reliability of the package further improves the display effect of the display panel.
  • FIG. 1A is a schematic plan view of a display panel in an embodiment of the application.
  • FIG. 1B is a schematic plan view of a display panel in another embodiment of the application.
  • FIG. 2 is a cross-sectional view of the display panel in FIG. 1A along the direction II-II.
  • FIG. 3 is a schematic cross-sectional structure diagram of a display panel in another embodiment of the application.
  • FIG. 4 is a schematic diagram of placing the mask during the manufacturing process of the display panel in an embodiment of the application.
  • Fig. 5 is a partial enlarged schematic diagram of A in Fig. 4.
  • FIG. 6 is a schematic diagram of the auxiliary light-emitting layer being squeezed by foreign matter on the mask plate in FIG. 5.
  • FIG. 7A is a schematic plan view of a supporting structure in an embodiment of the application.
  • FIG. 7B is a schematic plan view of the supporting structure in another embodiment of the application.
  • FIG. 7C is a schematic plan view of the supporting structure in another embodiment of the application.
  • FIG. 8 is a schematic block diagram of a display device in an embodiment of the application.
  • FIG. 9 is a flowchart of a method for manufacturing a display panel in an embodiment of the application.
  • first and second are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the indicated technical features quantity. Therefore, the features defined with “first” and “second” may explicitly or implicitly include one or more of the features.
  • “plurality” means two or more, unless otherwise specifically defined.
  • connection should be understood in a broad sense, for example, it may be a fixed connection or It is a detachable connection, or an integral connection; it can be a mechanical connection, it can be an electrical connection, or it can communicate with each other; it can be a direct connection or an indirect connection through an intermediate medium, and it can be the internal communication of two components or two components The interaction relationship.
  • connection should be understood in a broad sense, for example, it may be a fixed connection or It is a detachable connection, or an integral connection; it can be a mechanical connection, it can be an electrical connection, or it can communicate with each other; it can be a direct connection or an indirect connection through an intermediate medium, and it can be the internal communication of two components or two components The interaction relationship.
  • connection should be understood in a broad sense, for example, it may be a fixed connection or It is a detachable connection, or an integral connection; it can be a mechanical connection, it can be an electrical connection, or it can communicate with each other; it can be a direct connection
  • FIG. 1A is a schematic plan view of a display panel 100 in an embodiment of the application.
  • the display panel 100 includes, but is not limited to, products or components with display functions such as Organic Light-Emitting Diode (OLED) display panels, Quantum Dot Light Emitting Diodes (QLED) panels, touch panels (Touch panels), and the like.
  • OLED Organic Light-Emitting Diode
  • QLED Quantum Dot Light Emitting Diodes
  • touch panels Touch panels
  • the display area of the display panel 100 includes a plurality of pixel units 101, and each pixel unit 101 includes a plurality of sub-pixel units 102.
  • a supporting structure 103 is provided between the multiple sub-pixel units 102 in each pixel unit 101.
  • the plurality of pixel units 101 are distributed in a matrix in the display area.
  • the multiple sub-pixel units 102 in each pixel unit 101 are arranged in rows or columns.
  • the plurality of pixel units 101 may also be distributed in the display area in an irregular manner.
  • the multiple sub-pixel units 102 in each pixel unit 101 are also arranged in an irregular manner, which is not limited herein.
  • the location of the support structure 103 is not limited, as long as it is located between adjacent sub-pixel units 102.
  • the display panel 100 may further include a non-display area surrounding the display area.
  • the area of the non-display area included in the display panel 100 will become smaller and smaller, and even the display panel 100 may not include the non-display area.
  • the display panel 100 includes a substrate 10, a first electrode layer 20, a pixel defining layer 30, a supporting structure 103, an auxiliary light emitting layer 40, an organic light emitting layer 50 and a second electrode layer 60 stacked in sequence.
  • the substrate 10 is a flexible substrate, that is, the substrate 10 is made of a flexible material.
  • the flexible material is, for example, but not limited to flexible transparent plastic, flexible glass or metal foil.
  • the substrate 10 is used to support the entire display panel 100.
  • the substrate 10 may also be a rigid substrate, such as a glass substrate.
  • the first electrode layer 20 is disposed on the substrate 10.
  • the first electrode layer 20 may be a transparent ITO (Indium Tin Oxide, indium tin oxide) electrode or a metal electrode.
  • the metal electrode may be composed of metal, alloy, conductive metal oxide, conductive polymer, and the like.
  • the first electrode layer 20 is an anode and a transparent ITO electrode layer.
  • the pixel defining layers 30 are arranged on the first electrode layer 20 at intervals.
  • the pixel definition layer 30 is also called an insulating layer, which may be an organic material layer.
  • the pixel definition layer 30 includes at least one of organic materials such as polyimide, polyamide, styrene-acrylic cyclobutene, acrylic resin, silicone, polymethyl methacrylate (PMMA), or phenol resin.
  • the support structure 103 is disposed on the pixel definition layer 30, and is mainly used to support the mask 200 (see FIG. 4) used for depositing other film layers (such as the organic light-emitting layer) on the substrate 10, namely As long as the mask 200 needs to be used when depositing other film layers, the mask 200 can be supported by the support structure 103.
  • the support structure 103 can be made of a resin material such as polyimide through a patterning process.
  • the patterning process includes the process steps of material coating, exposure, and development.
  • the patterning process is a traditional and relatively mature manufacturing process, and the details are no longer Repeat.
  • the auxiliary light-emitting layer 40 is disposed on the supporting structure 103 and covers the supporting structure 103 and the pixel defining layer 30, that is, the pixel defining layer 30 and the supporting structure 103 are disposed on the auxiliary light-emitting In the layer 40, it is arranged on the side close to the substrate 10.
  • the organic light emitting layer 50 is disposed on the auxiliary light emitting layer 40 and is located between adjacent pixel definition layers 30.
  • the second electrode layer 60 is disposed on the organic light-emitting material layer 50 and extends to cover the auxiliary light-emitting layer 40.
  • the second electrode layer 60 may be a transparent ITO (Indium Tin Oxide, indium tin oxide) electrode or a metal electrode.
  • the metal electrode may be made of at least one of metal, alloy, conductive metal oxide, or conductive polymer.
  • the second electrode layer 60 is a cathode and a metal electrode.
  • the organic light emitting layer 50 when the first electrode layer 20 and the second electrode layer 60 apply a voltage to the organic light emitting layer 50, the organic light emitting layer 50 emits light.
  • the auxiliary light-emitting layer 40 is used to assist the organic light-emitting layer 50 to emit light, so that the organic light-emitting layer 50 can be applied to the first electrode layer 20 and the second electrode layer 60 when a small driving voltage is applied. That is, it emits light, and the luminous efficiency of the organic light-emitting layer 50 can be improved.
  • the auxiliary light-emitting layer 40 may also be omitted.
  • the display panel 100 further includes an organic protective layer 70.
  • the organic protection layer 70 is disposed on the second electrode layer 60.
  • the material of the organic protective layer 70 is a transparent organic insulating material.
  • the organic insulating material is a polyimide series material. It is understandable that the polyimide series material may be polyimide and its derivatives. It is understandable that the polyimide series materials have excellent heat resistance, abrasion resistance, elasticity, flexibility, and low molding shrinkage, so that stress can be relieved to prevent the flexible display panel 100 from overheating. Folding and impacting to avoid mechanical damage.
  • the organic insulating material may also include other resins or rubber compounds with good stress properties.
  • the resin or rubber compounds are, for example, but not limited to photoresist, styrene-acrylic cyclobutene, Polymethyl methacrylate, polyethylene (PE), or polyethylene terephthalate (PET).
  • the organic protective layer 70 is a polyimide film.
  • the organic light-emitting layer 50 is deposited on the auxiliary light-emitting layer 40, and the mask 200 is used to The organic light emitting layer 50 is vapor-deposited.
  • at least one groove 104 is formed on the side of the support structure 103 facing away from the pixel definition layer 30, and the width W of the groove is along the width W of the support structure 103. The direction to the pixel definition layer 30 gradually decreases.
  • the width W of the groove 104 gradually decreases along the direction from the support structure 103 to the pixel definition layer 30, the angle between the bottom of the groove 104 and the sidewall is ⁇ is an obtuse angle, so that when the auxiliary light-emitting layer 40 is deposited, the auxiliary light-emitting layer 40 can smoothly transition at the corner of the groove 104, and will not break due to the turning at the corner, ensuring the auxiliary The film quality of the light-emitting layer 40.
  • the foreign object 201 protruding from the surface of the mask 200 will squeeze the auxiliary light-emitting layer 40 so that the surface of the auxiliary light-emitting layer 40
  • the contact area between the support structure 103 and the mask 200 is reduced. Therefore, the damage of the mask 200 to the auxiliary light emitting layer 40 is reduced.
  • the extra film layer of the auxiliary light-emitting layer 40 due to scratches or squeezing deformation can be transferred laterally, that is, into the groove 104, thereby ensuring that the extra film layer does not protrude from The normal film layer is too high to ensure the subsequent film packaging effect, thereby ensuring the effective reliability of the packaging.
  • the depth H of the groove 104 is greater than half D/2 of the thickness D of the support structure 103 and less than the thickness D of the support structure 103, that is, D/2 ⁇ H ⁇ D. In this way, it can be ensured that the excess film layer can enter the groove 104.
  • the supporting structure 103 is provided with a plurality of grooves 104, and the plurality of grooves 104 are spaced apart and arranged in parallel.
  • the plurality of grooves 104 may also be intersected. Specifically, the plurality of grooves 104 intersect and are arranged vertically.
  • the arrangement of the plurality of grooves 104 is not limited to this, and can be determined according to specific design conditions.
  • FIG. 8 is a block diagram of a display device 300 according to an embodiment of the present invention.
  • the display device 300 includes the display panel 100 described in the foregoing embodiment.
  • the display device 300 may be a flexible display device or an inflexible display device.
  • the display device 300 is a flexible display device, and the flexible display device is, for example, a product or component with a display function such as a mobile phone and a tablet computer.
  • an embodiment of the present application also provides a manufacturing method of a display panel.
  • the manufacturing method of the display panel includes the following steps.
  • step S101 a substrate 10 is provided, and a first electrode layer 20, a pixel definition layer 30, and a supporting structure 103 are sequentially deposited on the substrate 10. Wherein, at least one groove 104 is opened on the side of the supporting structure 103 facing away from the pixel defining layer 30.
  • the depth H of the groove 104 is greater than half D/2 of the thickness D of the support structure 103 and less than the thickness D of the support structure 103, that is, D/2 ⁇ H ⁇ D. In this way, it can be ensured that the excess film layer can enter the groove 104.
  • the supporting structure 103 is provided with a plurality of grooves 104, and the plurality of grooves 104 are spaced apart and arranged in parallel. In other embodiments, the plurality of grooves 104 may also be intersected. Specifically, the plurality of grooves 104 intersect and are arranged vertically.
  • step S102 an organic light-emitting layer 50 is deposited between the pixel defining layers 30, and the organic light-emitting layer 50 is vapor-deposited using a mask 200.
  • step S103 optical inspection is performed on the evaporated substrate 10 to determine the damage position of the support structure 103.
  • Step S104 using laser irradiation to repair the damaged location.
  • using laser irradiation to repair the damaged location includes: using a laser with a specific energy to irradiate the damaged location from one side of the substrate 10, so that the damaged location is thermally decomposed, and then reaches the The effect of repairing the damaged location.
  • the support structure 103 is provided with at least one groove 104 on the side facing away from the pixel definition layer 30, the contact between the support structure 103 and the mask 200 is reduced. Area, thereby reducing the damage of the mask 200 to the support structure.
  • the extra film layer of the support structure 103 due to scratches or extrusion deformation can be transferred laterally, thereby ensuring that the excess film layer does not protrude too high from the normal film layer, making subsequent
  • the film package can cover the support structure 103 with a certain thickness, thereby ensuring the effective reliability of the package.
  • optical detection is also used to determine the damage location of the support structure 103, and laser irradiation is used to repair the damage location, so that the damage location is thermally decomposed, and the effect of repairing the damage location is further improved.
  • the reliability of subsequent packaging further improves the display effect of the display panel 100.

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Abstract

一种显示面板(100)，包括基板(10)，设置于基板(10)上的第一电极层(20)，设置于像素定义层(30)上的支撑结构(103)，设置于第一电极层(20)上并位于相邻的像素定义层(30)之间的有机发光层(50)及设置于有机发光层(50)上并延伸覆盖支撑结构(103)的第二电极层(60)。其中，支撑结构(103)背向像素定义层(30)的一侧开设有至少一个凹槽(104)，且凹槽(104)的宽度沿支撑结构(103)至像素定义层(30)的方向逐渐减小。还提供一种显示装置(300)及显示面板(100)的制作方法。能够减少显示面板(100)制程中对支撑结构(103)的损伤，提高显示面板(100)封装的可靠性，从而提高了显示面板(100)的显示效果。

Description

显示面板、显示装置及显示面板的制作方法 技术领域
本申请涉及显示技术领域，尤其涉及一种显示面板、显示装置及显示面板的制作方法。
背景技术
现有显示屏均设置一层支撑结构(Photo Space，PS)，其目的是用于生产制程过程中支撑与之贴附的金属掩膜板和后盖基板。然而，由于金属掩膜板自身平坦度的问题，即金属掩膜板的表面存在颗粒状的异物，以及受蒸镀腔体工艺过程的影响，导致金属掩膜板会对支撑结构或者对沉积在该支撑结构上的材料层损坏(如刮伤或者挤压变形)，从而导致支撑结构处出现膜层异常而影响显示面板的显示效果。其中，支撑结构与金属掩膜板的接触面积越大，对支撑结构或者对沉积在该支撑结构上的材料层的损坏面积越大。
发明内容
本申请实施例公开一种显示面板、显示装置及显示面板的制作方法以解决上述技术问题。
第一方面，本申请实施例公开一种显示面板，包括：
基板；
第一电极层，设置于所述基板上；
像素定义层，相互间隔设置于所述第一电极层上；
支撑结构，设置于所述像素定义层上；
有机发光层，设置于所述第一电极层上并位于相邻的像素定义层之间；以及
第二电极层，设置于所述有机发光层上并延伸覆盖所述支撑结构；
其中，所述支撑结构背向所述像素定义层的一侧开设有至少一个凹槽，且所述凹槽的宽度沿所述支撑结构至所述像素定义层的方向逐渐减小。
第二方面，本申请还公开一种显示装置，包括第一方面所述的显示面板。
第三方面，本申请实施例还公开一种显示面板的制作方法，包括：
提供一基板并依次在所述基板上沉积第一电极层、像素定义层以及支撑结构；其中，所述支撑结构背向所述像素定义层的一侧开设有至少一个凹槽；
在所述像素定义层之间沉积有机发光层，并采用掩膜板对所述有机发光层进行蒸镀；
对蒸镀后的所述基板进行光学检测以确定所述支撑结构的损伤位置；
采用激光照射对所述损伤位置进行修复。
本申请公开的显示面板、显示装置及显示面板的制作方法，本申请实施例所提供的显示面板制作方法，由于所述支撑结构在背向所述像素定义层的一侧开设有至少一个凹槽，减少了支撑结构与掩膜板的接触面积，进而减少了掩膜板对支撑结构的损伤。此外，由于凹槽的存在，使得支撑结构因刮伤或者挤压变形而多出的膜层可以侧向转移，进而保证了多余膜层不会突出于正常膜层太高，使得后续的薄膜封装就可以以一定的厚度覆盖支撑结构，从而保证封了装有效可靠性。
进一步地，通过光学检测来确定支撑结构的损伤位置，并采用激光照射对所述损伤位置进行修复，使得所述损伤位置受热分解，进而达到对所述损伤位置进行修复的效果，进一步提高了后续封装的可靠性，从而进一步提高了显示面板的显示效果。
附图说明
为了更清楚地说明本申请实施例中的技术方案，下面将对实施例中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1A为本申请一实施例中的显示面板的平面示意图。
图1B为本申请另一实施例中的显示面板的平面示意图。
图2为图1A中的显示面板沿II-II方向的剖视图。
图3为本申请另一实施例中的显示面板的剖面结构示意图。
图4为本申请一实施例中的显示面板在制作过程中放置掩膜板的示意图。
图5为图4中A处的局部放大示意图。
图6为图5中的掩膜板上的异物对辅助发光层挤压的示意图。
图7A为本申请一实施例中的支撑结构的平面示意图。
图7B为本申请另一实施例中的支撑结构的平面示意图。
图7C为本申请再一实施例中的支撑结构的平面示意图。
图8为本申请一实施例中的显示装置的方框示意图。
图9为本申请一实施例中的显示面板制作方法的流程图。
具体实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
在本发明的实施方式的描述中，需要理解的是，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本发明的实施方式的描述中，“多个”的含义是两个或两个以上，除非另有明确具体的限定。
在本发明的实施方式的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“连接”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接或可以相互通讯；可以是直接连接，也可以通过中间媒介间接连接，可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本发明的实施方式中的具体含义。
请参阅图1A，其为本申请一实施例中的显示面板100的平面示意图。显示面板100包括但不限于有机发光二极管(Organic Light-Emitting Diode，OLED)显示面板、量子点显示(Quantum Dot Light Emitting Diodes,QLED)面板、触摸屏(Touch panel)等具有显示功能的产品或部件。在本实施方式中，所述显示面板100为OLED显示面板。
如图1A所示，所述显示面板100的显示区域包括多个像素单元101，每个像素单元101包括多个子像素单元102。其中，每个像素单元101中的多个子像素单元102之间设置有支撑结构103。在本实施方式中，所述多个像素单元101呈矩阵式分布于所述显示区域。每个所述像素单元101中的多个子像素单元102呈行或者呈列排列。请参阅图1B，在其他实施方式中，所述多个像素单元101也可以呈不规则的方式分布于所述显示区域。每个所述像素单元101中的多个子像素单元102也以不规则的方式排列，在此不做限定。当每个所述像素单元101中的多个子像素单元102以不规则的方式排列时，支撑结构103的设置位置也不做限定，只要位于相邻的子像素单元102之间即可。
可以理解，所述显示面板100还可以包括围绕所述显示区周围的非显示区。然而，随着全面屏技术的发展，所述显示面板100所包括的非显示区域的面积会越来越小，甚至所述显示面板100还可以不包括非显示区域。
请参阅图2，所述显示面板100包括依次层叠的基板10、第一电极层20、像素定义层30、支撑结构103、辅助发光层40、有机发光层50以及第二电极层60。在本实施方式中，所述基板10为柔性基板，也即所述基板10由柔性材料制成。所述柔性材料例如是，但不局限于柔性透明塑料、柔性玻璃或金属箔。所述基板10用于支撑整个所述显示面板100。在其他实施方式中，所述基板10还可以是硬质基板，例如玻璃基板。
所述第一电极层20设置于所述基板10上。所述第一电极层20可以为透明ITO(Indium Tin Oxide，氧化铟锡)电极或者金属电极。其中，金属电极可以由金属、合金、导电金属氧化物、导电聚合物等构成。在本实施方式中，所述第一电极层20为阳极，且为透明ITO电极层。
所述像素定义层30相互间隔设置于所述第一电极层20上。所述像素定义层30也称绝缘层，其可为有机材料层。例如，像素定义层30包含有聚酰亚胺、聚酰胺、苯丙环丁烯、亚克力树脂、有机硅、聚甲基丙烯酸甲酯(PMMA)或酚醛树脂等有机材料中的至少一种。
所述支撑结构103设置于所述像素定义层30上，主要用于对沉积所述基板10上的其他膜层(如有机发光层)所使用的掩模板200(参图4)进行支撑，即只要在沉积其他膜层时需要采用掩模板200，即可通过支撑结构103对该掩 模板200进行支撑。其中，支撑结构103可以采用树脂材料如聚酰亚胺通过构图工艺制成，该构图工艺包括材料涂敷、曝光和显影的工艺步骤，该构图工艺为传统的比较成熟的制备工艺，具体不再赘述。
所述辅助发光层40设置于所述支撑结构103上并包覆所述支撑结构103和所述像素定义层30，也即所述像素定义层30和所述支撑结构103设置于所述辅助发光层40中，且靠近所述基板10的一侧设置。
所述有机发光层50设置于所述辅助发光层40上，并位于相邻的像素定义层30之间。
所述第二电极层60设置于所述有机发光材料层50上并延伸覆盖所述辅助发光层40。所述第二电极层60可以为透明ITO(Indium Tin Oxide，氧化铟锡)电极或者金属电极。其中，金属电极可以由金属、合金、导电金属氧化物或导电聚合物中的至少一种。在本实施方式中，所述第二电极层60为阴极，且为金属电极。
需要说明的是，在本申请实施例中，当所述第一电极层20和所述第二电极层60对所述有机发光层50施加电压时，所述有机发光层50会发光。其中，所述辅助发光层40用于辅助所述有机发光层50发光，可使得所述有机发光层50在所述第一电极层20和所述第二电极层60施加较小的驱动电压时即可发光，并可提高所述有机发光层50的发光效率。可以理解，在其他实施例中，所述辅助发光层40还可以省略。
请参阅图3，在一实施例中，所述显示面板100还包括有机保护层70。所述有机保护层70设置于所述第二电极层60上。其中，所述有机保护层70的材料为透明的有机绝缘材料。在本实施例中，所述有机绝缘材料为聚酰亚胺系列材料。可以理解的，所述聚酰亚胺系列材料可以是聚酰亚胺及其衍生物。可以理解的，所述聚酰亚胺系列材料具有优良的耐热性、耐磨性、弹性、柔韧性、及成型收缩率小等，从而可释放应力，以避免所述柔性显示面板100经多次折叠、冲撞而免受机械磨损损伤。
在其他实施例中，所述有机绝缘材料还可以包含其他具有良好应力性能的树脂或橡胶类化合物，所述树脂或橡胶类化合物例如是，但不局限于光刻胶、苯丙环丁烯、聚甲基丙烯酸甲酯、聚乙烯(polyethylene，PE)、或聚对苯二甲 酸乙二醇酯(Polyethylene terephthalate，PET)。
可选的，在一实施例中，所述有机保护层70为聚酰亚胺薄膜。
请参阅图4，在制作所述显示面板100的过程中，在辅助发光层40制作完成之后会在所述辅助发光层40生沉积所述有机发光层50，并采用掩膜板200对所述有机发光层50进行蒸镀。请结合参阅图5，在本申请实施例中，所述支持结构103背向所述像素定义层30的一侧开设有至少一个凹槽104，所述凹槽的宽度W沿所述支撑结构103至所述像素定义层30的方向逐渐减小。本申请实施例中，由于所述凹槽104的宽度W沿所述支撑结构103至所述像素定义层30的方向逐渐减小，使得所述凹槽104的底部与侧壁之间的夹角θ为钝角，进而可以使得在沉积所述辅助发光层40时，所述辅助发光层40在所述凹槽104的拐角处可以平滑过渡，不会因拐角处的转折而发生断裂，保证了辅助发光层40的膜层质量。
请参阅图6，若所述掩膜板200存在异物201，凸出于掩膜板200表面的异物201则会对所述辅助发光层40进行挤压，而使得所述辅助发光层40的表面不平整，然而，在本申请实施例中，由于所述支撑结构103背向所述像素定义层30的一侧开设有至少一个凹槽104，减少了支撑结构103与掩膜板200的接触面积，进而减少了掩膜板200对辅助发光层40的损伤。此外，由于凹槽104的存在，使得辅助发光层40因刮伤或者挤压变形而多出的膜层可以侧向转移，即进入到凹槽104内，进而保证了多余膜层不会突出于正常膜层太高，可以保证后续的薄膜封装效果，从而保证封装有效可靠性。
请再次参阅图5，在一实施方式中，所述凹槽104的深度H大于所述支撑结构103的厚度D的一半D/2且小于所述支撑结构103的厚度D，即D/2<H<D。如此，可以保证多余膜层可以进入所述凹槽104。
请参阅图7A，在一些实施方式中，所述支撑结构103开设有多个凹槽104，且所述多个凹槽104相互间隔且平行设置。
在一些实施方式中，如图7B和图7C所示，所述多个凹槽104还可以相交设置。具体的，所述多个凹槽104相交且垂直设置。当然，所述多个凹槽104的设置方式并不限于此，可以依据具体的设计情况而定。
请参看图8，为本发明实施例提供的一种显示装置300方框示意图。所述 显示装置300包括前述实施例所述显示面板100。
所述显示装置300可以是柔性显示装置或非柔性显示装置。优选的，所述显示装置300为柔性显示装置，所述柔性显示装置例如是，手机、平板电脑等具有显示功能的产品或部件。
请参阅图9，本申请实施例还提供一种显示面板的制作方法。所述显示面板的制作方法包括如下步骤。
步骤S101，提供一基板10并依次在所述基板10上沉积第一电极层20、像素定义层30以及支撑结构103。其中，所述支撑结构103背向所述像素定义层30的一侧开设有至少一个凹槽104。
在一实施方式中，所述凹槽104的深度H大于所述支撑结构103的厚度D的一半D/2且小于所述支撑结构103的厚度D，即D/2<H<D。如此，可以保证多余膜层可以进入所述凹槽104。
在一些实施方式中，所述支撑结构103开设有多个凹槽104，且所述多个凹槽104相互间隔且平行设置。在另一些实施方式中，所述多个凹槽104还可以相交设置。具体的，所述多个凹槽104相交且垂直设置。
步骤S102，在所述像素定义层30之间沉积有机发光层50，并采用掩膜板200对所述有机发光层50进行蒸镀。
步骤S103，对蒸镀后的所述基板10进行光学检测以确定所述支撑结构103的损伤位置。
步骤S104，采用激光照射对所述损伤位置进行修复。
具体地，采用激光照射对所述损伤位置进行修复，包括：运用特定能量的激光从所述基板10的一侧对所述损伤位置进行照射，使得所述损伤位置受热分解，进而到达对所述损伤位置进行修复的效果。
本申请实施例所提供的显示面板制作方法，由于所述支撑结构103在背向所述像素定义层30的一侧开设有至少一个凹槽104，减少了支撑结构103与掩膜板200的接触面积，进而减少了掩膜板200对支撑结构的损伤。此外，由于凹槽104的存在，使得支撑结构103因刮伤或者挤压变形而多出的膜层可以侧向转移，进而保证了多余膜层不会突出于正常膜层太高，使得后续的薄膜封装就可以以一定的厚度覆盖支撑结构103，从而保证封了装有效可靠性。
进一步地，还光学检测来确定支撑结构103的损伤位置，并采用激光照射对所述损伤位置进行修复，使得所述损伤位置受热分解，进而到达对所述损伤位置进行修复的效果，进一步提高了后续封装的可靠性，从而进一步提高了显示面板100的显示效果。
以上对本申请实施例进行了详细介绍，本文中应用了具体个例对本申请的原理及实施例进行了阐述，以上实施例的说明只是用于帮助理解本申请的方法及其核心思想；同时，对于本领域的一般技术人员，依据本申请的思想，在具体实施例及应用范围上均会有改变之处，综上，本说明书内容不应理解为对本申请的限制。

Claims (9)

  1. 一种显示面板，其特征在于，包括：
    基板；
    第一电极层，设置于所述基板上；
    像素定义层，相互间隔设置于所述第一电极层上；
    支撑结构，设置于所述像素定义层上；
    有机发光层，设置于所述第一电极层上并位于相邻的像素定义层之间；以及
    第二电极层，设置于所述有机发光层上并延伸覆盖所述支撑结构；
    其中，所述支撑结构背向所述像素定义层的一侧开设有至少一个凹槽，且所述凹槽的宽度沿所述支撑结构至所述像素定义层的方向逐渐减小。
  2. 如权利要求1所述的显示面板，其特征在于，所述凹槽的深度大于所述支撑结构的厚度的一半且小于所述支撑结构的厚度。
  3. 如权利要求1或2所述的显示面板，其特征在于，所述支撑结构开设有多个凹槽，所述多个凹槽相互间隔且平行设置，或者所述多个凹槽相交设置。
  4. 如权利要求1所述的显示面板，其特征在于，所述显示面板还包括辅助发光层；所述辅助发光层设置于所述支撑结构上并包覆所述支撑结构和所述像素定义层；所述有机发光层设置于所述辅助发光层上，并位于相邻的所述像素定义层之间。
  5. 如权利要求1所述的显示面板，其特征在于，所述第一电极层为阳极，且所述第一电极层为透明ITO电极；所述第二电极层为阴极，且所述第二电极层为金属电极。
  6. 如权利要求1所述的显示面板，其特征在于，所述显示面板还包括置于所述第二电极层上的有机保护层；所述有机保护层由透明的有机绝缘材料制成。
  7. 一种显示装置，其特征在于，包括权利要求1-6任一项所述的显示面板。
  8. 一种显示面板的制作方法，其特征在于，包括：
    提供一基板并依次在所述基板上沉积第一电极层、像素定义层以及支撑结构；其中，所述支撑结构背向所述像素定义层的一侧开设有至少一个凹槽；
    在所述像素定义层之间沉积有机发光层，并采用掩膜板对所述有机发光层进行蒸镀；
    对蒸镀后的所述基板进行光学检测以确定所述支撑结构的损伤位置；
    采用激光照射对所述损伤位置进行修复。
  9. 如权利要求8所述的制作方法，其特征在于，所述采用激光照射对所述损伤位置进行修复，包括：运用特定能量的激光从所述基板的一侧对所述损伤位置进行照射。
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CN114388721B (zh) * 2021-12-31 2023-12-12 昆山梦显电子科技有限公司 一种硅基oled显示基板
WO2024088348A1 (zh) * 2022-10-28 2024-05-02 华为技术有限公司 Led显示面板、显示屏和电子设备

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