WO2015129446A1 - 走査電子顕微鏡および画像生成方法 - Google Patents
走査電子顕微鏡および画像生成方法 Download PDFInfo
- Publication number
- WO2015129446A1 WO2015129446A1 PCT/JP2015/053598 JP2015053598W WO2015129446A1 WO 2015129446 A1 WO2015129446 A1 WO 2015129446A1 JP 2015053598 W JP2015053598 W JP 2015053598W WO 2015129446 A1 WO2015129446 A1 WO 2015129446A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- sample
- diaphragm
- housing
- charged particle
- vacuum
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/16—Vessels; Containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0203—Protection arrangements
- H01J2237/0213—Avoiding deleterious effects due to interactions between particles and tube elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/16—Vessels
- H01J2237/164—Particle-permeable windows
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/18—Vacuum control means
- H01J2237/182—Obtaining or maintaining desired pressure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2602—Details
- H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
Definitions
- the present invention relates to a charged particle beam apparatus that can be observed in a predetermined gas atmosphere at atmospheric pressure or atmospheric pressure.
- a scanning electron microscope (SEM), a transmission electron microscope (TEM), or the like is used.
- SEM scanning electron microscope
- TEM transmission electron microscope
- a housing for placing a sample is evacuated and the sample atmosphere is evacuated to image the sample. Since the electron beam is scattered by gas molecules such as the atmosphere, it has been considered preferable to make the electron beam passage path vacuum.
- biochemical samples, liquid samples, and the like are damaged or changed in state by vacuum.
- an SEM apparatus capable of observing a sample to be observed under atmospheric pressure has been developed.
- Patent Document 1 describes an SEM apparatus that can be observed under atmospheric pressure.
- this device is provided with a diaphragm capable of transmitting an electron beam between the electron optical system and the sample to partition the vacuum state and the atmospheric state, and the sample is brought close to the diaphragm for observation in a non-contact state. This is different from the observation method of environmental cells.
- the path immediately before the electron beam reaches the diaphragm by the diaphragm is maintained in a high vacuum state to prevent scattering of the electron beam, and the region where the electron beam scattering occurs is located between the diaphragm and the sample. Observation is possible by limiting to a short distance.
- Non-Patent Document 1 describes a method of processing diamond by irradiating an electron beam in a low vacuum atmosphere. A method for removing nanopillars on the diamond substrate is also mentioned.
- a diaphragm that transmits the charged particle beam is used to isolate the atmospheric pressure space in which the sample is placed from the vacuum space on the charged particle optical system side.
- the thickness of the diaphragm is set to be very thin due to the requirement to transmit the charged particle beam, and it is often damaged by contact with the sample.
- the present inventors have found that the damage of the diaphragm caused by charged particle beam irradiation is caused by contamination generated on the diaphragm by charged particle beam irradiation.
- contamination adheres to the diaphragm, it has been found that there is an increased possibility that the diaphragm will be destroyed due to stress concentration at the boundary of the contamination adhesion part or thermal stress due to the difference in thermal expansion coefficient between the diaphragm and the contamination part. .
- An object of the present invention is to provide a convenient charged particle beam apparatus that reduces the frequency of breakage of the diaphragm by reducing the contamination generated on the diaphragm, thereby reducing the running cost.
- the scanning electron microscope of the present invention is directly connected to an electron optical column that irradiates a sample with a primary electron beam and the inside of the electron optical column, and at least during the irradiation of the primary electron beam
- a diaphragm that isolates a housing that is in a low vacuum state from the inside of the electron optical column, a space in an atmospheric atmosphere in which a sample is placed, and a housing in a low vacuum state and transmits the primary charged particle beam And.
- the contamination attached to the diaphragm can be decomposed when the internal space of the housing in contact with the vacuum side surface of the diaphragm is left in a low vacuum, that is, in a state where gas remains.
- This phenomenon is considered to be caused by the gas molecules inside the housing being irradiated with the primary electron beam, and thereby the plasma gas molecules decompose the contamination adhered to the diaphragm.
- the present invention in a scanning electron microscope that can be observed under atmospheric pressure, contamination adhered to the diaphragm can be decomposed or removed, and the probability of damage to the diaphragm can be reduced. Accordingly, it is possible to provide a convenient scanning electron microscope that reduces the frequency of diaphragm replacement and suppresses running costs.
- FIG. 1 is an overall configuration diagram of a charged particle microscope according to Embodiment 1.
- FIG. 5 is an overall configuration diagram of a charged particle microscope according to a third embodiment.
- FIG. 6 is an overall configuration diagram of a charged particle microscope according to a fourth embodiment.
- FIG. 6 is an overall configuration diagram of a charged particle microscope of Example 5.
- FIG. 10 is an overall configuration diagram of a charged particle microscope according to a sixth embodiment.
- FIG. 10 is an overall configuration diagram of a charged particle microscope of Example 7.
- FIG. 10 is an overall configuration diagram of a modified example of the charged particle microscope according to the seventh embodiment.
- a charged particle beam microscope will be described as an example of a charged particle beam apparatus.
- this is merely an example of the present invention, and the present invention is not limited to the embodiments described below.
- the present invention can also be applied to a scanning electron microscope, a scanning ion microscope, a scanning transmission electron microscope, a combined device of these and a sample processing device, or an analysis / inspection device to which these are applied.
- atmospheric pressure means an atmospheric atmosphere or a predetermined gas atmosphere, and means a pressure environment of atmospheric pressure or a slight negative pressure state. Specifically, the pressure is about 10 5 Pa (atmospheric pressure) to 10 3 Pa. In addition, this pressure range is sometimes referred to as “non-vacuum”.
- FIG. 1 shows an overall configuration diagram of the charged particle microscope of the present embodiment.
- a following example intends and demonstrates a scanning electron microscope, as above-mentioned, this invention is not limited to this.
- the charged particle microscope shown in FIG. 1 mainly includes a charged particle optical column 2, a casing (vacuum chamber) 7 connected to and supporting the charged particle optical column 2, and a sample stage 5 arranged in an atmospheric atmosphere. And a control system for controlling them.
- the inside of the charged particle optical column 2 and the housing 7 is evacuated by the vacuum pump 4.
- the start / stop operation of the vacuum pump 4 is also controlled by the control system.
- only one vacuum pump 4 is shown in the figure, two or more vacuum pumps may be provided. It is assumed that the charged particle optical column 2 and the housing 7 are supported by a base 270 such as a column (not shown).
- the charged particle optical column 2 includes an element such as a charged particle source 8 that generates a charged particle beam, an optical lens 1 that focuses the generated charged particle beam and guides it to the lower part of the column and scans the sample 6 as a primary charged particle beam. Consists of. Due to problems such as the lifetime of the charged particle source, the atmosphere around the charged particle source is generally an atmospheric pressure of 10 ⁇ 1 Pa or less (hereinafter referred to as a high vacuum).
- the charged particle optical column 2 is installed so as to protrude into the housing 7 and is fixed to the housing 7 via a vacuum sealing member 123.
- a detector 3 for detecting secondary charged particles (secondary electrons or reflected electrons) obtained by irradiation with the primary charged particle beam is disposed at the end of the charged particle optical column 2. An image of the sample is acquired based on the signal obtained by the detector 3.
- the detector 3 may be outside or inside the charged particle optical column 2.
- the charged particle optical column may include other lenses, electrodes, and detectors, or some of them may be different from the above, and the configuration of the charged particle optical system included in the charged particle optical column Is not limited to this.
- the charged particle microscope of the present embodiment has a control system such as a computer 35 used by the user of the apparatus, a host controller 36 connected to the computer 35 for communication, and a vacuum pumping system and a charge according to a command transmitted from the host controller 36.
- a lower control unit 37 that controls the particle optical system and the like is provided.
- the computer 35 includes a monitor on which an operation screen (GUI) of the apparatus is displayed, and input means for an operation screen such as a keyboard and a mouse.
- GUI operation screen
- the upper control unit 36, the lower control unit 37, and the computer 35 are connected by communication lines 43 and 44, respectively.
- the lower control unit 37 is a part that transmits and receives control signals for controlling the vacuum pump 4, the charged particle source 8, the optical lens 1, and the like, and further converts the output signal of the detector 3 into a digital image signal to perform higher control. It transmits to the part 36.
- the output signal from the detector 3 is connected to the lower control unit 37 via an amplifier 154 such as a preamplifier. If an amplifier is not necessary, it may not be necessary.
- the upper control unit 36 and the lower control unit 37 may include a mixture of analog circuits, digital circuits, etc., and the upper control unit 36 and the lower control unit 37 may be unified.
- the charged particle microscope may include a control unit that controls the operation of each part.
- the upper control unit 36 and the lower control unit 37 may be configured as hardware by a dedicated circuit board, or may be configured by software executed by the computer 35. When configured by hardware, it can be realized by integrating a plurality of arithmetic units for executing processing on a wiring board or in a semiconductor chip or package. When configured by software, it can be realized by mounting a high-speed general-purpose CPU on a computer and executing a program for executing desired arithmetic processing.
- control system shown in FIG. 1 is merely an example, and modifications of the control unit, valve, vacuum pump, communication wiring, and the like can be applied to the SEM of this embodiment as long as the functions intended in this embodiment are satisfied. It belongs to the category of charged particle beam equipment.
- the housing 7 is connected to a vacuum pipe 16 having one end connected to the vacuum pump 4 so that the inside can be maintained in a vacuum state.
- a leak valve 14 for opening the inside of the housing to the atmosphere is provided, and the inside of the housing 7 can be opened to the atmosphere during maintenance.
- the leak valve 14 may not be provided, and may be two or more.
- the arrangement location of the leak valve 14 in the housing 7 is not limited to the location shown in FIG. 1, and may be arranged at another position on the housing 7. With these configurations, the degree of vacuum inside the housing 7 can be freely adjusted. However, as described above, the atmosphere around the charged particle source 8 needs to be kept at a high vacuum.
- an orifice 62 is provided for maintaining a pressure difference between the inside of the charged particle optical column 2 and the inside of the housing 7.
- the orifice 62 is provided inside or just below the charged particle optical column 2.
- a flow rate adjusting means for adjusting the exhaust flow rate may be provided in the vacuum pipe 16.
- the flow rate adjusting means is, for example, an orifice or a needle valve. As an example, in the drawing, a configuration is shown in which an orifice 62 is provided immediately below the charged particle optical column 2 and a needle valve 63 is provided in the vacuum pipe 16.
- FIG. 2 shows an example in which the charged particle optical column 2 is evacuated by a vacuum pump 4 and the inside of the housing 7 is evacuated by another second vacuum pump 4a.
- the second vacuum pump 4 a may have a two-stage exhaust configuration by connecting not only to the housing 7 but also to the exhaust section of the vacuum pump 4. In this case, the inside of the charged particle optical column 2 can be efficiently exhausted.
- the charged particle optical column 2 and the housing 7 may be set to different degrees of vacuum with a single pump such as a split flow system.
- the inside of the charged particle optical column 2 and the inside of the housing 7 are separately evacuated or the exhaust flow rate is restricted, so that the degree of vacuum of the charged particle optical column 2 is higher than the inside of the housing 7.
- the surroundings of the diaphragm 10 inside the housing 7 can be set to a low vacuum while the apparatus performance such as resolution can be improved.
- a diaphragm 10 is provided on the lower surface of the housing at a position directly below the charged particle optical column 2.
- the diaphragm 10 can transmit or pass the primary charged particle beam emitted from the lower end of the charged particle optical column 2, and the primary charged particle beam finally passes through the diaphragm 10 and finally reaches the sample stage 52.
- the sample 6 mounted is reached.
- a closed space that is, the inside of the charged particle optical column 2 and the housing 7) configured to be isolated from the sample mounting space by the diaphragm 10 can be evacuated.
- the charged particle optical column 2 can be maintained in a vacuum state and the atmosphere around the sample 6 is maintained at atmospheric pressure for observation. Can do.
- the space in which the sample is installed is an air atmosphere or communicates with the space in the air atmosphere, so that the sample 6 can be freely exchanged during observation.
- the diaphragm 10 is formed or deposited on the base 9.
- the diaphragm 10 is a carbon material, an organic material, a metal material, silicon nitride, silicon carbide, silicon oxide, or the like.
- the base 9 is a member such as silicon or a metal member. Multiple portions of the diaphragm 10 may be arranged.
- the thickness of the diaphragm capable of transmitting or passing the primary charged particle beam is about several nm to several ⁇ m.
- the diaphragm must not break under the differential pressure to separate atmospheric pressure and vacuum. Therefore, the area of the diaphragm 10 is about several tens ⁇ m to at most several mm.
- the base 9 that supports the diaphragm 10 is provided on the diaphragm holding member 155. Although not shown, it is assumed that the base 9 and the diaphragm holding member 155 are bonded by an O-ring, packing, adhesive, double-sided tape or the like that can be vacuum-sealed.
- the diaphragm holding member 155 is detachably fixed to the lower surface side of the housing 7 via a vacuum sealing member 124.
- the diaphragm 10 is very thin with a thickness of about several nanometers to several micrometers or less because of the requirement for transmission of charged particle beams. Moreover, since the diaphragm 10 and the base 9 which supports it are small, it is very difficult to handle directly.
- the diaphragm 10 and the base 9 are integrated with the diaphragm holding member 155 so that the base 9 can be handled not via the direct but via the diaphragm holding member 155. Handling (especially exchange) becomes very easy. That is, when the diaphragm 10 is damaged, the diaphragm holding member 155 may be replaced. Even if the diaphragm 10 has to be replaced directly, the diaphragm holding member 155 can be taken out of the apparatus, and the base 9 integrated with the diaphragm 10 can be replaced outside the apparatus.
- an optical microscope capable of observing the sample may be disposed immediately below or near the sample 6.
- the diaphragm 10 is on the upper side of the sample, and the optical microscope is observed from the lower side of the sample. Therefore, in this case, the sample stage 52 needs to be transparent to the light of the optical microscope.
- the transparent member include transparent glass, transparent plastic, and transparent crystal.
- a transparent sample table such as a slide glass (or a preparation) or a dish (or a petri dish).
- a temperature heater or a voltage application unit that can generate an electric field in the sample may be provided. In this case, it is possible to observe how the sample is heated or cooled and how the electric field is applied to the sample.
- two or more diaphragms may be arranged.
- a second diaphragm may be provided below the first diaphragm that separates the vacuum and the atmosphere, and a sample may be included between the second diaphragm and the sample stage.
- an environmental cell that can be introduced into the vacuum apparatus in a state where the entire sample is contained may be used as the sample.
- the present invention which will be described later, can be applied to a case where a sample height adjusting mechanism is provided inside the environmental cell and the sample is brought close to a diaphragm for separating the vacuum and the atmosphere.
- the present invention belongs to the category of SEM or charged particle beam apparatus of this embodiment as long as the function intended by this embodiment is satisfied, regardless of the number and type of diaphragms.
- the diaphragm 10 when contamination adheres to the diaphragm 10, the diaphragm is destroyed due to stress concentration at the boundary of the contamination adhesion portion or thermal stress due to a difference in thermal expansion coefficient between the diaphragm and the contamination portion. Contamination occurs on the diaphragm 10, or the diaphragm 10 is damaged due to the occurrence of the contamination. Therefore, the diaphragm 10 needs to be replaced every certain period of time in which observation is performed in an atmospheric pressure atmosphere. Thereby, the problem of the complexity of the diaphragm 10 replacement
- the present inventors have found that the above-described contamination can be reduced by the degree of vacuum in the space where the diaphragm is in contact. Therefore, in the charged particle beam apparatus of the present embodiment, the inside of the housing 7 is evacuated to a low vacuum. That is, while maintaining the inside of the charged particle optical column 2 at a high vacuum, the inside of the housing 7 is set to a low vacuum, and the space where the sample is placed is set to atmospheric pressure.
- “low vacuum” means an atmospheric pressure or a predetermined gas atmosphere and a pressure range of about 0.1 Pa to about 1000 Pa.
- the inside of the housing 7 is less than about 0.1 Pa, residual gas molecules are not converted into plasma by charged particle beam irradiation, so that the contamination is hardly decomposed, and the contamination deposition speed increases as described above from the decomposition of the contamination. Not practical. Further, when the inside of the housing 7 becomes larger than about 1000 Pa, the primary charged particle beam is scattered inside the housing 7, so that it is difficult to reach the sample, and the resolution is extremely lowered. Therefore, in the present embodiment, the inside of the housing 7 is set to the above range as an atmospheric pressure region where the contamination can be efficiently decomposed.
- the space in the atmospheric pressure atmosphere and the vacuum space inside the charged particle optical column are separated by a diaphragm. Since the charged particle beam is scattered by the gas molecules in the diaphragm and the atmospheric pressure atmosphere, the image quality is deteriorated as compared with the case where the sample is observed under a high vacuum. In order to improve the image quality as much as possible, it has been desired that the primary charged particle beam is not scattered as much as possible in the path to reach the diaphragm. Therefore, conventionally, it has not been assumed that the degree of vacuum of the path until the primary charged particle beam reaches the diaphragm is deteriorated.
- the primary charged particle beam that has passed through the objective lens is expected to reach the sample without any influence thereafter. In this sense as well, it is not assumed in the conventional apparatus that the primary charged particle beam is scattered on the path after passing through the objective lens.
- the inside of the housing 7 that is the space between the objective lens and the diaphragm is placed in a low vacuum state with a vacuum degree in the above range to irradiate the primary charged particle beam. Contamination adhered to the surface in contact with the inside of the housing 7 can be disassembled.
- the inside of the charged particle optical column 2 is generally in a high vacuum, it is necessary to maintain the differential pressure between the inside of the housing 7 and the charged particle optical column. Therefore, according to another expression, “low vacuum” can be a state in which the atmospheric pressure is higher than the inside of the charged particle optical column.
- the room with the lowest degree of vacuum among those rooms generally, the side where the primary charged particle beam is emitted
- the inside of the housing 7 is set to a lower vacuum.
- the housing 7 can also be referred to as a low vacuum chamber provided between a high vacuum charged particle optical column and an atmospheric pressure sample chamber.
- the primary charged particle beam generated by the charged particle source passes through the inside of the high vacuum charged particle optical column, further passes through the inside of the low vacuum state housing 7, and finally passes through the diaphragm.
- the sample below is irradiated.
- This low vacuum chamber is provided in order to make the pressure of the surface in contact with one side of the diaphragm a low vacuum, and the size of its internal space is not limited.
- the housing 7 is provided with an introduction port 60 for introducing air or an arbitrary gas into the housing 7.
- a needle valve 61 is connected to the introduction port 60 to adjust the flow rate for introducing the atmosphere or an arbitrary gas.
- a filter or an orifice having a large inflow resistance may be provided instead of the needle valve 61.
- the flow rate of gas introduction is appropriately limited by these flow rate adjusting means.
- the gas introduced from the introduction port 60 can increase the pressure inside the housing 7.
- the gas molecules When the inside of the housing 7 is brought into a low vacuum state, that is, a gas is left by the gas introduced from the introduction port 60, the gas molecules are irradiated with a primary electron beam or a secondary electron beam, and gas molecules are formed by electron and gas molecules. Ionizes and turns into plasma. At this time, it is considered that hydrocarbon-based contamination is decomposed by sputtering with ionized gas molecules. That is, contamination can be decomposed by electron beam irradiation.
- the rate of decomposition depends on the amount of surrounding gas molecules, that is, the degree of vacuum. In a certain degree of vacuum, since the rate at which contamination is decomposed is faster than the rate at which residual gas molecules polymerize or crosslink and adhere as contamination on the diaphragm as described above, the occurrence of contamination is suppressed. Can do.
- the low vacuum around the diaphragm 10 reduces the contamination.
- the low vacuum around the diaphragm 10 reduces the pressure difference from the atmospheric pressure and reduces the pressure applied to the diaphragm. Decreasing effect is also expected. Thereby, the stress which arises in the diaphragm 10 by atmospheric pressure becomes small, and the frequency of a diaphragm breakage can be reduced more.
- the pressure applied to the diaphragm by the atmospheric pressure 100 kPa
- the effect of preventing the diaphragm damage by reducing the differential pressure is small.
- the effect of reducing contamination on the diaphragm 10 is more effective in preventing damage to the diaphragm 10 than the effect of reducing the differential pressure by making the vacuum around the diaphragm 10 itself. Therefore, it is important to decompose the contamination by irradiating the diaphragm with a charged particle beam in a low vacuum atmosphere as described above.
- the introduction port 60 may be provided with a valve 64 that can be opened and closed.
- the atmosphere inside the housing 7 can be switched to an arbitrary degree of vacuum between high vacuum and low vacuum.
- the degree of vacuum inside the housing 7 can be switched as appropriate.
- control units 36 and 37 control the flow rate adjusting means such as the needle valve 61 to adjust the degree of vacuum inside the housing 7.
- the control units 36 and 37 control the flow rate adjusting means such as the needle valve 61 to adjust the degree of vacuum inside the housing 7.
- the user may adjust the degree of vacuum inside the housing 7 by directly adjusting the flow rate adjusting means without going through the computer 35 or the control unit.
- a means for monitoring the contamination of the diaphragm 10 may be provided, and thereby the timing for decomposing the contamination may be determined.
- the occurrence of contamination may be monitored by image recognition or the like, the time until the contamination is deposited on the diaphragm 10 is determined by various conditions such as acceleration voltage and degree of vacuum, and is almost constant for each charged particle beam apparatus. It becomes. Therefore, the occurrence of contamination can be estimated indirectly from the accumulation of observation time under atmospheric pressure, and this may be used as the contamination decomposition timing.
- the time until contamination is accumulated in the diaphragm 10 and obstructs the observation or the time until the diaphragm 10 is damaged is stored in advance, and a constant period is set by a timer provided in the computer 35 or the like.
- the control units 36 and 37 control the flow rate adjusting means such as the needle valve 61 to adjust the degree of vacuum inside the housing 7 to a low vacuum.
- an interface that can be provided with an observation mode and a cleaning mode and that allows the user to instruct to select these modes may be displayed on the display of the computer 35.
- the control units 36 and 37 control the flow rate adjusting means such as the needle valve 61 to adjust the degree of vacuum inside the housing 7.
- the user may adjust the degree of vacuum inside the housing 7 by directly adjusting the flow rate adjusting means without going through the computer 35 or the control unit.
- the inside of the housing 7 is observed with a high vacuum, and when the contamination of the diaphragm 10 increases, the inside of the housing 7 is subjected to an electron beam irradiation with a low vacuum, and the contamination on the diaphragm 10 is decomposed. can do.
- the degree of vacuum inside the housing 7 it is possible to perform appropriate operations according to the situation, such as suppression of contamination, acquisition of an optimal SEM image, and decomposition of contamination.
- the configuration in which the degree of vacuum is reduced to a low vacuum has been described as one means for reducing contamination.
- the contamination can be removed also by using other means for reducing contamination.
- problems which are not practical compared to the above-described reduction of contamination by irradiation with charged particle beams under a low vacuum.
- the diaphragm 10 is very thin and has a large surface area with respect to the volume, even if the periphery of the diaphragm is heated, heat is radiated from the diaphragm, and it is difficult to sufficiently heat the center of the diaphragm. Or when the member used as a heat source is formed on a diaphragm, the raise of the running cost by the raise of the price of the diaphragm which is a consumable item becomes a subject.
- the cooling member that can be cooled from the outside with liquid nitrogen or the like in the housing 7 as a cold trap, it is possible to reduce contamination to the diaphragm by adsorbing a hydrocarbon-based gas to the cooled cooling member.
- the distance between the diaphragm 10 and the charged particle optical column 2 is increased, the distance between the sample 6 and the charged particle optical column 2 is increased, and problems such as a reduction in image resolution occur.
- the observation field of view is limited by the opening area of the diaphragm 10. That is, the diaphragm 10 is very thin due to the requirement of transmitting an electron beam, but the area of the diaphragm 10 needs to be very small in order to seal the vacuum with the sufficiently thin diaphragm.
- the area of the diaphragm 10 is 250 ⁇ m square, and the area of the diaphragm 10 is set sufficiently small to withstand atmospheric pressure. Thereby, observation is performed within the range of the opening area. Therefore, in order to observe a specific location on the sample 6, the movement of the visual field is repeated to search for a site to be observed. This operation is very complicated and greatly impairs the convenience of the charged particle beam microscope that can be observed under atmospheric pressure.
- the present embodiment improves the convenience of a charged particle beam microscope that can be observed in an atmospheric pressure atmosphere by utilizing an optical microscope or the like for searching a visual field when observing with a charged particle beam microscope.
- An example will be described.
- the apparatus configuration and usage method will be described below. Description of parts similar to those in the first embodiment is omitted for simplicity.
- FIG. 4 shows a configuration in which an optical microscope is used for searching a visual field when observing with a charged particle beam microscope.
- an apparatus capable of observing at a lower magnification in an atmospheric pressure atmosphere such as an optical microscope or a high-magnification camera is used.
- a configuration using the optical microscope 160 will be described below.
- the optical microscope 160 includes a sample mounting table 161 capable of holding the sample table 52 in a fixed positional relationship with respect to the optical microscope optical axis 160a (FIG. 4A).
- the sample stage 5 of the charged particle microscope 53 is also provided with a sample mounting table 163 (FIG. 4B).
- the sample setting table 163 can hold the sample table 52 in a fixed positional relationship with respect to the charged particle beam optical axis 54 when the sample stage 5 is set to a predetermined coordinate position.
- the positional relationship is assumed to match.
- the sample mounting table 161 has a positioning structure 162 that is paired with the sample table 52, such as a pin and a hole, and the sample table 52 is fitted to the center 52a of the sample table 52 and the optical axis 160a of the optical microscope. Can be held consistent with each other. Also in the sample stage 5 of the charged particle beam microscope 53, the positioning structure 164 has the same shape as the positioning structure 162. Thereby, the sample stage 52 is held so that the center axis 52a and the optical axis 54 of the electron beam coincide with each other when the sample stage 5 is set to a predetermined position.
- the positioning structures 162 and 164 are holes, and the sample stage 52 is provided with the pins 52b. However, other structures such as grooves and protrusions may be used.
- the observation visual field when the sample stage 52 is observed with the optical microscope 160 and the observation visual field when the sample stage 52 is observed with the charged particle beam microscope 53 come to coincide. That is, in this configuration, since the common sample stage 52 corresponds to the positioning structure 162 in the optical microscope 160 and the positioning structure 164 in the charged particle beam microscope 53, the optical microscope 160 and the charged particle beam microscope 53 observations of the same field of view are possible. Hereinafter, the effect of this configuration will be described according to the observation procedure.
- the sample stage 52 is set on the sample setting stage 161 of the optical microscope 160, and the observation target part 6a of the sample 6 is adjusted with a hand or tweezers so that the observation target part 6a becomes the center of the visual field while observing with the optical microscope 160.
- the sample 6 is placed or fixed on the sample stage 52 (FIG. 4C).
- the sample table 52 is removed from the sample setting table 161 of the optical microscope 160, and the sample table 52 is set on the sample setting table 163 of the charged particle beam microscope 53. Then, when the observation is started after the sample stage 5 is moved to a predetermined position, the periphery of the observation target portion 6a of the sample 6 can be observed (FIG. 4D).
- the charged particle beam microscope 53 is charged with the charged particle beam in the atmospheric pressure atmosphere without a complicated field finding operation. It can be observed with a microscope. This improves the convenience of the visual field search operation with a charged particle beam microscope that can be observed in an atmospheric pressure atmosphere.
- the optical axis 160a of the optical microscope and the central axis 52a of the sample stand 52 are the sample. Needless to say, the same effect can be obtained if the installation table 161 can be held in a certain positional relationship.
- FIG. 5 shows a configuration in which the sample stage 52 is provided with a moving mechanism.
- the sample stage in FIG. 5 includes a moving mechanism 165 that can move the sample to a plane perpendicular to the optical axis 160a direction of the optical microscope (hereinafter referred to as an XY plane).
- the moving mechanism 165 includes knobs 165a and 165b, and can move freely in the X and Y directions. By operating the knobs 165a and 165b and operating the moving mechanism 165, an arbitrary part on the sample 6 can be observed under the observation of the optical microscope 160, and the observation target part 6a can be searched and moved to the center of the visual field.
- the observation target part 6a After the observation target part 6a is aligned with the center of the visual field of the optical microscope, the observation target part can be observed by mounting on the charged particle beam microscope 53 and placing the sample stage 5 at a predetermined position as described above. That is, even if the moving mechanism 165 above the sample stage 52 is moved in the X and Y directions, the positional relationship between the optical microscope optical axis 160a and the center axis 52a of the sample stage is not changed by the positioning structure 162. This makes it possible to more easily determine and adjust the sample observation site under the optical microscope 160, and greatly improve the operability of visual field search in a charged particle beam microscope that can be observed under an atmospheric pressure atmosphere. It is possible to improve convenience.
- FIG. 6 the whole block diagram of the charged particle microscope of a present Example is shown. Similar to the first embodiment, the charged particle microscope of the present embodiment also includes a charged particle optical column 2, a casing (vacuum chamber) 7 that supports the charged particle optical column 2 with respect to the apparatus installation surface, a sample stage 5, and the like. Consists of. Since the operations and functions of these elements or additional elements added to the elements are substantially the same as those in the first embodiment, detailed description thereof is omitted.
- the charged particle microscope shown in FIG. 6 includes a second casing (attachment) 121 used by being inserted into a casing 7 (hereinafter referred to as a first casing).
- the second casing 121 includes a rectangular parallelepiped body portion 131 and a mating portion 132.
- at least one side surface of the rectangular parallelepiped side surface of the main body 131 is an open surface 15.
- the surface other than the surface on which the diaphragm holding member 155 is installed may be configured by the wall of the second casing 121, or the second casing 121 itself has no wall and is the first.
- FIG. 1 You may be comprised by the side wall of the 1st housing 7 in the state integrated in the 1 housing 7.
- FIG. The position of the second housing 121 is fixed to the side surface or inner wall surface of the first housing 7 or the charged particle optical lens barrel.
- the main body 131 has a function of storing the sample 6 to be observed, and is inserted into the first housing 7 through the opening.
- the mating portion 132 forms a mating surface with the outer wall surface on the side surface side where the opening of the first housing 7 is provided, and is fixed to the outer wall surface on the side surface side via the vacuum sealing member 126.
- the entire second housing 121 is fitted into the first housing 7.
- the opening is most easily manufactured using the opening for loading and unloading the sample originally provided in the vacuum sample chamber of the charged particle microscope. That is, if the second casing 121 is manufactured according to the size of the hole that is originally open and the vacuum sealing member 126 is attached around the hole, the modification of the apparatus is minimized.
- the second housing 121 can
- the side surface of the second housing 121 is an open surface 15 that communicates with the atmospheric space with a surface that is at least large enough to allow the sample to be taken in and out.
- the inside of the second housing 121 (right side from the dotted line in the figure; The sample 6 stored in the space is placed in an atmospheric pressure state during observation. 6 is a cross-sectional view of the apparatus in the direction parallel to the optical axis, so that only one open surface 15 is shown, but it is vacuum-sealed by the side surface of the first casing in the back direction and the near side in FIG. If so, the open surface 15 of the second casing 121 is not limited to one surface. It is sufficient that at least one open surface is provided in a state where the second housing 121 is incorporated in the first housing 7.
- a vacuum pump 4 is connected to the first housing 7, and a closed space (hereinafter referred to as a first space) constituted by the inner wall surface of the first housing 7, the outer wall surface of the second housing and the diaphragm 10.
- a first space constituted by the inner wall surface of the first housing 7, the outer wall surface of the second housing and the diaphragm 10.
- the second space can be isolated in pressure in this embodiment. That is, the first space 11 is maintained in a vacuum state by the diaphragm 10, while the second space 12 is maintained in a gas atmosphere at atmospheric pressure or a pressure almost equal to atmospheric pressure.
- the particle optical column 2 and the detector 3 can be maintained in a vacuum state, and the sample 6 can be maintained at atmospheric pressure. Further, since the second casing 121 has an open surface, the sample 6 can be freely exchanged during observation.
- the diaphragm 10 On the upper surface side of the second casing 121, the diaphragm 10 is provided at a position directly below the charged particle optical column 2 when the entire second casing 121 is fitted into the first casing 7.
- the diaphragm 10 can transmit or pass the primary charged particle beam emitted from the lower end of the charged particle optical column 2, and the primary charged particle beam finally reaches the sample 6 through the diaphragm 10. To do.
- the sample stage 5 and the like are disposed inside the second housing 121, and the sample 6 can be moved freely.
- This apparatus also has an introduction port 60 for making the inside of the casing 7 (that is, the first space 11) low vacuum, as in the first embodiment. Since the configuration related to the introduction port 60 is the same as that of the first embodiment, detailed description thereof is omitted.
- FIG. 7 shows an overall configuration diagram of the charged particle microscope of this example. This embodiment is a modification of the third embodiment. Detailed description of the same parts as those in the first and third embodiments will be omitted.
- the open surface that forms at least one side surface of the second housing 121 can be covered with the lid member 122, and various functions can be realized. This will be described below.
- the charged particle microscope of the present embodiment includes a sample stage 5 as a means for moving the observation field of view by changing the sample position on the lid member 122.
- the sample stage 5 includes an XY drive mechanism in the in-plane direction and a Z-axis drive mechanism in the height direction.
- a support plate 107 serving as a bottom plate for supporting the sample stage 5 is attached to the lid member 122, and the sample stage 5 is fixed to the support plate 107.
- the support plate 107 is attached so as to extend toward the inside of the second casing 121 toward the surface of the lid member 122 facing the second casing 121.
- Support shafts extend from the Z-axis drive mechanism and the XY drive mechanism, respectively, and are connected to the operation knob 108 and the operation knob 109 of the lid member 122, respectively.
- the apparatus user adjusts the position of the sample 6 in the second housing 121 by operating these operation knobs 108 and 109.
- the charged particle microscope of the present embodiment has a function of supplying a replacement gas into the second casing or a function of forming a pressure state different from the first space 11 and the outside air outside the apparatus.
- the charged particle beam emitted from the lower end of the charged particle optical column 2 passes through the diaphragm 10 through the first space maintained at a high vacuum, and the sample 6 is irradiated with the charged particle beam.
- charged particle beams are scattered by gas molecules, so the mean free path is shortened. That is, when the distance between the diaphragm 10 and the sample 6 is large, secondary electrons, reflected electrons, transmitted electrons, etc.
- the scattering probability of charged particle beams is proportional to the mass number and density of gas molecules. Therefore, if the second space is replaced with gas molecules having a lighter mass number than the atmosphere, or if the vacuum is slightly evacuated, the scattering probability of the charged particle beam decreases and the charged particle beam can reach the sample. become. Even if not the entire second space, it is sufficient that at least the passage of the charged particle beam in the second space, that is, the atmosphere in the space between the diaphragm 10 and the sample 6 can be replaced or evacuated.
- the lid member 122 is provided with an attachment portion (gas introduction portion) for the gas supply pipe 100.
- the gas supply pipe 100 is connected to the gas cylinder 103 by the connecting portion 102, whereby the replacement gas is introduced into the second space 12.
- a gas control valve 101 is arranged in the middle of the gas supply pipe 100, and the flow rate of the replacement gas flowing through the pipe can be controlled.
- a signal line extends from the gas control valve 101 to the lower control unit 37, and the apparatus user can control the flow rate of the replacement gas on the operation screen displayed on the monitor of the computer 35.
- the gas control valve 101 may be manually opened and closed.
- the gas is lighter than the atmosphere, such as nitrogen or water vapor, the effect of improving the image S / N can be seen, but helium gas or hydrogen gas having a lighter mass has a better image S / N. Great improvement effect.
- an opening that communicates the inside and outside of the second space is provided below the attachment position of the gas supply pipe 100 by the lid member 122.
- an opening is provided at the attachment position of the pressure adjustment valve 104.
- a pressure regulating valve 104 may be provided instead of the opening described above.
- the pressure regulating valve 104 has a function of automatically opening the valve when the internal pressure of the second housing 121 becomes 1 atm or more. By providing a pressure regulating valve with such a function, when light element gas is introduced, it automatically opens when the internal pressure reaches 1 atm or more and discharges atmospheric gas components such as nitrogen and oxygen to the outside of the device.
- the element gas can be filled in the apparatus.
- the illustrated gas cylinder or vacuum pump 103 may be provided in a charged particle microscope, or may be attached later by an apparatus user.
- the gas cylinder 103 may be a vacuum pump. Then, by slightly evacuating, the inside of the second housing can be brought into an extremely low vacuum state (that is, an atmosphere having a pressure close to atmospheric pressure). That is, the space between the diaphragm 10 and the sample 6 can be brought into an extremely low vacuum state.
- a vacuum exhaust port is provided in the second casing 121 or the lid member 122, and the inside of the second casing 121 is slightly evacuated. Thereafter, a replacement gas may be introduced.
- the vacuum evacuation in this case does not require high vacuum evacuation because the atmospheric gas component remaining in the second housing 121 may be reduced to a certain amount or less, and rough evacuation is sufficient.
- the space in which the sample is placed can be controlled to an arbitrary degree of vacuum from atmospheric pressure (about 10 5 Pa) to about 10 3 Pa.
- atmospheric pressure about 10 5 Pa
- the electron beam column and the sample chamber are in communication. Therefore, it is difficult to control the sample chamber to a pressure of atmospheric pressure (about 10 5 Pa) to 10 3 Pa.
- the sample chamber can be controlled to a pressure of atmospheric pressure (about 10 5 Pa) to 10 3 Pa, which has been difficult to control until now. Furthermore, not only the observation at atmospheric pressure (about 10 5 Pa) but also the state of the sample can be observed by continuously changing the pressure in the vicinity thereof.
- the cylinder 103 may be a complex gas control unit or the like in which a gas cylinder and a vacuum pump are combined.
- the configuration according to the present embodiment is characterized in that the second space 12 inside the second casing is closed as compared with the configuration described above. Therefore, it is possible to provide a charged particle beam apparatus capable of introducing gas between the diaphragm 10 and the sample 6 or evacuating it.
- an introduction port 60 for making the inside of the housing 7 into a low vacuum there is an introduction port 60 for making the inside of the housing 7 into a low vacuum. From the viewpoint of reducing contamination adhering to the diaphragm, it is important to make the inside of the housing 7 a low vacuum, and the pressure inside the housing 7 may be constant regardless of the pressure in the second space 12.
- the diaphragm 10 by removing the diaphragm 10, it can be used as a so-called general SEM for observing not only in an atmospheric pressure atmosphere but also in a vacuum environment.
- the inside of the first space is set to a low vacuum so that observation in an atmospheric pressure atmosphere is possible while reducing contamination to the diaphragm 10, and when the diaphragm 10 is removed
- observation with higher resolution or higher magnification can be performed.
- the sample stage 5 and its operation knobs 108 and 109, the gas supply pipe 100, and the pressure adjustment valve 104 are all attached to the lid member 122. Therefore, the user of the apparatus can operate the operation knobs 108 and 109, replace the sample, or operate the gas supply pipe 100 and the pressure adjustment valve 104 on the same surface of the first housing. Therefore, the operability is greatly improved as compared with the charged particle microscope in which the above-described components are separately attached to the other surfaces of the sample chamber.
- a contact monitor that detects the contact state between the second housing 121 and the lid member 122 may be provided to monitor whether the second space is closed or open.
- an X-ray detector and a photodetector may be provided so that EDS analysis and fluorescent light detection can be performed.
- the X-ray detector or the photodetector it may be arranged in either the first space 11 or the second space 12.
- the replacement gas can be introduced from the atmospheric pressure in addition to the effects of the first and second embodiments.
- the sample can be observed in the same vacuum state as the first space. Is realized.
- the charged particle microscope of the present embodiment also includes a charged particle optical column 2, a housing (vacuum chamber) 7 that supports the charged particle optical column 2 with respect to the apparatus installation surface, a sample stage 5 or the like. Since the operations and functions of these elements or additional elements added to the elements are substantially the same as those in the first to third embodiments, detailed description thereof is omitted.
- FIG. 8 shows a state in which the sample storage container is arranged inside the charged particle microscope apparatus.
- the sample storage container mainly includes a storage container 200, a lid 201, a sample stage 203 having a drive mechanism for changing the position of the sample 6, a plurality of operation units 204 for moving the sample stage 203 from the outside of the sample storage container, and charging.
- a diaphragm 10 that passes or permeates particle beams and a base 9 that holds the diaphragm 10 are configured.
- the sample 6 is placed on the sample table and stored together with the sample table in the storage container 200 which is a closed space.
- a vacuum sealing member 206 such as an O-ring or packing is provided between the lid 201 and the storage container 200 in order to keep the gas type and pressure state inside and outside the sample storage container separated. It is assumed that the lower surface of the sample stage 203 and the bottom surface of the storage container 200 are fixed with screws or the like (not shown).
- the sample 6 and the diaphragm 10 are not in contact with each other and the sample can be moved independently of the diaphragm 10 in a direction parallel to the diaphragm 10, the sample in a very wide range (at least larger than the area of the diaphragm) can be obtained. Observation becomes possible. Further, since the sample and the diaphragm are not in contact with each other, it is not necessary to exchange the diaphragm every time the sample is replaced.
- the lower part (bottom face side) of the sample storage container has a mating part (not shown) for placement on a sample stage inside the charged particle beam apparatus described later.
- the mating portion may be convex or concave, or may have another shape.
- the mating portion 209 engages with a corresponding portion of the sample stage, thereby fixing the sample storage container on the sample stage.
- the stage 5 of the charged particle beam microscope includes an XY drive mechanism in the in-plane direction and a Z-axis drive mechanism in the height direction.
- the support plate 107 is attached so as to extend toward the inside of the housing 7 toward the facing surface of the lid member 122.
- Support shafts extend from the Z-axis drive mechanism and the XY drive mechanism, respectively, and are connected to the operation knob 108 and the operation knob 109 of the lid member 122, respectively.
- the apparatus user can adjust the position of the sample storage container with respect to the charged particle optical column by operating these operation knobs.
- a position adjusting mechanism is also provided inside the sample storage container, and the position adjusting mechanism and the stage are independently movable.
- the position adjustment mechanism inside the sample storage container is used for alignment between the sample and the diaphragm, and the stage is used for alignment between the charged particle beam optical column and the sample storage container.
- the diaphragm has a very small area because of the requirement that the diaphragm must be maintained at a differential pressure between atmospheric pressure and vacuum.
- the sample can be freely moved independently of the diaphragm while confirming the position of the sample with an optical microscope. be able to.
- this visual field search operation can be performed while maintaining the local atmosphere, so that the convenience for the user is greatly improved.
- This apparatus also has an introduction port 60 for making the inside of the housing 7 into a low vacuum as in the first embodiment.
- the inside of the sample storage container is locally non-vacuum, and the inside of the housing 7 that is the sample chamber is in a vacuum environment.
- this embodiment does not include a special housing for setting the surface of the diaphragm on the charged particle source side to a low vacuum environment. Therefore, when the sample storage container is introduced into the housing 7 for observation, the inside of the housing 7 is maintained at a low vacuum.
- the inside of the housing 7 is set to a low vacuum environment by the needle valve 61 to suppress contamination to the diaphragm 10, and when the sample storage container is not used, the inside of the housing 7 is a needle valve as a normal SEM. 61 to switch from low vacuum to high vacuum.
- the degree of vacuum inside the housing 7 of the present embodiment can be freely controlled within a range from low vacuum to high vacuum. In a general low-vacuum scanning electron microscope, the degree of vacuum in the sample chamber can be controlled to an arbitrary pressure from low vacuum to high vacuum.
- the space in contact with the vacuum side surface of the diaphragm can be brought into a low vacuum state.
- a sample storage container mode in which the inside of the housing 7 is set to a low vacuum and an SEM mode in which the inside of the housing 7 is set to a high vacuum, and an interface through which the user can instruct to select these modes is provided.
- the control units 36 and 37 control the flow rate adjusting means such as the needle valve 61 to adjust the degree of vacuum inside the housing 7.
- the user may adjust the degree of vacuum inside the housing 7 by directly adjusting the flow rate adjusting means without going through the computer 35 or the control unit.
- FIG. 9 shows a configuration diagram of the charged particle microscope of the present embodiment.
- a vacuum pump and a control system are not shown in the figure.
- the housing 7 and the charged particle optical column 2 that are vacuum chambers are supported by columns, supports, and the like on the apparatus installation surface. Since the operation / function of each element or additional elements added to each element are substantially the same as those in the above-described embodiment, detailed description thereof is omitted.
- the apparatus is provided with a sample stage 5 for bringing the sample 6 close to the diaphragm 10.
- the sample surface below the sample 6 in the figure is observed.
- the upper part of the apparatus is opened as an atmospheric pressure space. In this case, the distance between the diaphragm and the sample can be adjusted by the sample stage 5.
- the sample 6 may be directly mounted on the diaphragm 10 side (arrow in the figure).
- the sample stage 5 is not necessarily required.
- a contact prevention member 56 such as a thin film formed with a predetermined thickness between the diaphragm 10 and the sample 6 and a removable foil material is used.
- the contact preventing member 56 corresponds to a distance adjusting mechanism that adjusts the distance between the diaphragm and the sample.
- the contact preventing member 56 having a thickness of t1 is disposed on the base 9.
- the sample 6 is mounted. Thereafter, the sample is observed, and if necessary, replaced with a contact prevention member having a thickness t2 smaller than t1. Thereby, it becomes possible to carry out observation without bringing the diaphragm 10 and the sample 6 into contact with each other and damaging them.
- This apparatus also has an introduction port 60 for lowering the inside of the housing 7 and a needle valve 61 as a flow rate adjusting means as in the first embodiment. Since the configuration related to the introduction port 60 and the needle valve 61 is the same as that of the first embodiment, detailed description thereof is omitted.
- the apparatus and method for observing a charged particle microscope in which the diaphragm 10 and the sample 6 are arranged in the non-contact state in the atmosphere have been described.
- an apparatus for microscopic observation of a sample placed in an atmospheric atmosphere with the diaphragm in contact with the sample will be described.
- FIG. 10 shows the charged particle device in this example. It is assumed that the charged particle optical column 2 and the housing 7 are supported by a pillar or a base (not shown). Further, as shown in FIG. 9, the charged particle optical column may be disposed below the diaphragm 10. In this configuration, the configuration is the same as that of the first embodiment except that the sample 6 is in contact with the diaphragm 10. The case where the sample is brought into contact with the diaphragm in an apparatus configuration in which an attachment is attached to a general charged particle microscope apparatus as shown in FIGS. 6 and 7 described in the second and third embodiments is also included in the present embodiment.
- the diaphragm holding member 155 is brought into contact with the housing 7 and the first space 11 is evacuated, and then charged particle microscope observation can be performed. is there. At this time, the first space 11 inside the housing 7 is set to a low vacuum.
- the housing 7 is provided in the lower part of the charged particle optical column 2 to form a low vacuum chamber.
- the interior of the charged particle optical column 2 is divided into a plurality of rooms, and the atmospheric pressure is maintained in each part. If possible, the chamber closest to the sample is brought into a low vacuum state, and the diaphragm 10 holding the sample directly or the diaphragm holding member for holding the sample at the primary electron beam exit of the charged particle optical column 2 155 may be arranged.
- the surface opposite to the surface on which the sample of the diaphragm contacts is in contact with the low-vacuum atmosphere, and as described in Example 1, it is possible to reduce the adhesion of contamination to the diaphragm.
- the position of the diaphragm holding member 155 is often finely adjusted in order to shift the observation position, and the diaphragm is damaged by vibration and impact at that time. Cheap.
- the sample may be scattered inside the charged particle optical column and the charged particle beam device itself may break down. Therefore, it is particularly important to reduce contamination as described above so as not to cause stress concentration on the diaphragm.
- FIG. 11 describes another charged particle microscope apparatus that observes a diaphragm and a sample in contact with each other.
- a container 250 capable of containing the sample 6 in the atmosphere or in a predetermined gas atmosphere is disposed on the sample stage 5 of the charged particle device.
- the sample 6 is in contact with the diaphragm 10.
- the sample 6 is mounted on the diaphragm 10 provided on the lid 251 of the container 250 outside the charged particle microscope apparatus, and the lid 251 and the container 250 are fixed with screws or the like (not shown).
- the container 250 containing the sample is introduced into the load current microscope apparatus, and observation with a charged particle microscope is performed.
- the charged particle beam emitted from the charged particle source 8 passes through the vacuum space 11 after passing through several optical lenses 1, and reaches the sample 6 via the diaphragm 10.
- This apparatus also has an introduction port 60 for lowering the inside of the housing 7 as in the first embodiment, and the inside of the housing 7 is placed in a low vacuum state when observing the sample. Since the configuration related to the introduction port 60 is the same as that of the fifth embodiment, detailed description thereof is omitted.
- Example 5 in a general low-vacuum scanning electron microscope, the degree of vacuum in the sample chamber can be controlled from a low vacuum to an arbitrary pressure from high vacuum, so a new case is installed in this example. Without using the sample chamber of the conventional scanning electron microscope, the space in contact with the vacuum side surface of the diaphragm can be brought into a low vacuum state.
- this invention is not limited to the above-mentioned Example, Various modifications are included.
- the above-described embodiments have been described in detail for easy understanding of the present invention, and are not necessarily limited to those having all the configurations described.
- a part of the configuration of one embodiment can be replaced with the configuration of another embodiment, and the configuration of another embodiment can be added to the configuration of one embodiment.
- Each of the above-described configurations, functions, processing units, processing means, and the like may be realized by hardware by designing a part or all of them with, for example, an integrated circuit.
- Each of the above-described configurations, functions, and the like may be realized by software by interpreting and executing a program that realizes each function by the processor.
- Information such as programs, tables, and files for realizing each function can be stored in a recording device such as a memory, a hard disk, an SSD (Solid State Drive), or a recording medium such as an IC card, an SD card, or an optical disk.
- a recording device such as a memory, a hard disk, an SSD (Solid State Drive), or a recording medium such as an IC card, an SD card, or an optical disk.
- control lines and information lines indicate what is considered necessary for the explanation, and not all the control lines and information lines on the product are necessarily shown. Actually, it may be considered that almost all the components are connected to each other.
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
Abstract
Description
本実施例の荷電粒子顕微鏡は、試料位置を変更することで観察視野を移動する手段としての試料ステージ5を蓋部材122に備えている。試料ステージ5には、面内方向へのXY駆動機構および高さ方向へのZ軸駆動機構を備えている。蓋部材122には試料ステージ5を支持する底板となる支持板107が取り付けられており、試料ステージ5は支持板107に固定されている。支持板107は、蓋部材122の第2筐体121への対向面に向けて第2筐体121の内部に向かって延伸するよう取り付けられている。Z軸駆動機構およびXY駆動機構からはそれぞれ支軸が伸びており、各々蓋部材122が有する操作つまみ108および操作つまみ109と繋がっている。装置ユーザは、これらの操作つまみ108および109を操作することにより、試料6の第2筐体121内での位置を調整する。
本実施例の荷電粒子顕微鏡においては、第2筐体内に置換ガスを供給する機能または第一の空間11や装置外部である外気とは異なった気圧状態を形成可能な機能を備えている。荷電粒子光学鏡筒2の下端から放出された荷電粒子線は、高真空に維持された第1の空間を通って、隔膜10を通過し、試料6に荷電粒子線が照射される。大気空間では荷電粒子線は気体分子によって散乱されるため、平均自由行程は短くなる。つまり、隔膜10と試料6の距離が大きいと一次荷電粒子線または荷電粒子線照射により発生する二次電子、反射電子もしくは透過電子等が試料及び検出器3まで届かなくなる。一方、荷電粒子線の散乱確率は、気体分子の質量数や密度に比例する。従って、大気よりも質量数の軽いガス分子で第2の空間を置換するか、少しだけ真空引きすることを行えば、荷電粒子線の散乱確率が低下し、荷電粒子線が試料に到達できるようになる。また、第2の空間の全体ではなくても、少なくとも第2の空間中の荷電粒子線の通過経路、すなわち隔膜10と試料6との間の空間の大気をガス置換または真空引きできればよい。
以上説明したように、本実施例では、試料ステージ5およびその操作つまみ108、109、ガス供給管100、圧力調整弁104が全て蓋部材122に集約して取り付けられている。従って装置ユーザは、上記操作つまみ108、109の操作、試料の交換作業、またはガス供給管100、圧力調整弁104の操作を第1筐体の同じ面に対して行うことができる。よって、上記構成物が試料室の他の面にバラバラに取り付けられている構成の荷電粒子顕微鏡に比べて操作性が非常に向上している。
Claims (13)
- 大気圧雰囲気の空間内に載置された試料に電子線を照射することで前記試料から生じる信号に基づいて前記試料の画像を取得する走査電子顕微鏡において、
電子源を含み一次電子線を前記試料に照射する電子光学鏡筒と、
前記電子光学鏡筒内部と直結され、少なくとも前記一次電子線の照射中に、内部が前記電子光学鏡筒内部より低真空の状態にされる筺体と、
前記試料が載置される前記大気圧雰囲気の空間と前記筺体の内部とを隔離し、かつ前記一次電子線が透過する隔膜と、を備えることを特徴とする走査電子顕微鏡。 - 請求項1に記載の走査電子顕微鏡において、
前記筺体内部の気圧は、少なくとも前記一次電子線の照射中に、0.1Pa以上1000Pa以下にされることを特徴とする走査電子顕微鏡。 - 請求項1に記載の走査電子顕微鏡において、
前記一次電子線の前記隔膜への照射により、前記隔膜上のコンタミネーションを分解することを特徴とする走査電子顕微鏡。 - 請求項1に記載の走査電子顕微鏡において、
前記電子光学鏡筒内部の気圧を前記筺体の内部の気圧よりも低く保持するオリフィスを前記電子光学鏡筒の直下に有することを特徴とする走査電子顕微鏡。 - 請求項1に記載の走査電子顕微鏡において、
前記筺体は、前記筺体の内部に気体を導入するポートと、当該気体の流量を制御する流量調整部材と、を備えることを特徴とする走査電子顕微鏡。 - 請求項1に記載の走査電子顕微鏡において、
前記筺体の内部の気圧は変更可能であることを特徴とする走査電子顕微鏡。 - 請求項6に記載の走査電子顕微鏡において、
前記筺体の内部の気圧を、前記試料の観察対象位置を決定する視野探しモードのときは0.1Pa以上1000Pa以下とし、前記試料の画像取得モードのときには0.1Pa以下とするように制御する制御部を備えることを特徴とする走査電子顕微鏡。 - 大気圧雰囲気の空間内に載置された試料に一次電子線を照射することで前記試料から生じる信号に基づいて前記試料の画像を取得する画像生成方法において、
電子源から発生した一次電子線を電子光学鏡筒から出射し、
前記電子光学鏡筒から出射された前記一次電子線を前記電子光学鏡筒の内部より低真空の状態にされた筺体内部を通過させ、
前記筺体内部を通過した前記一次電子線を、前記試料が載置される前記大気圧雰囲気の空間と前記筺体の内部とを隔離する隔膜を透過させ、
前記隔膜を透過した前記一次電子線を前記試料に照射することを特徴とする画像生成方法。 - 請求項8に記載の画像生成方法において、
前記筺体内部の気圧は0.1Pa以上1000Pa以下であることを特徴とする画像生成方法。 - 請求項8に記載の画像生成方法において、
前記一次電子線の前記隔膜への照射により、前記隔膜上のコンタミネーションを分解することを特徴とする画像生成方法。 - 請求項8に記載の画像生成方法において、
前記電子光学鏡筒内部の気圧を、前記筺体の内部の気圧よりも低くすることを特徴とする画像生成方法。 - 請求項8に記載の画像生成方法において、
前記筺体の内部の気圧は変更可能であることを特徴とする画像生成方法。 - 請求項12に記載の画像生成方法において、
前記筺体の内部の気圧を0.1Pa以上1000Pa以下とした状態で前記試料の観察対象位置を決定する視野探しを行い、
その後前記筺体内部の気圧を0.1Pa以下とした状態で前記試料の画像を取得することを特徴とする画像生成方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201580005384.9A CN105940478B (zh) | 2014-02-27 | 2015-02-10 | 扫描电子显微镜及图像生成方法 |
KR1020167019382A KR101840232B1 (ko) | 2014-02-27 | 2015-02-10 | 주사 전자 현미경 및 화상 생성 방법 |
DE112015000280.4T DE112015000280B4 (de) | 2014-02-27 | 2015-02-10 | Rasterelektronenmikroskop und Bilderzeugungsverfahren |
US15/111,907 US9875877B2 (en) | 2014-02-27 | 2015-02-10 | Electron scanning microscope and image generation method |
US15/855,370 US10157724B2 (en) | 2014-02-27 | 2017-12-27 | Electron scanning microscope and image generation method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014-036137 | 2014-02-27 | ||
JP2014036137A JP6302702B2 (ja) | 2014-02-27 | 2014-02-27 | 走査電子顕微鏡および画像生成方法 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/111,907 A-371-Of-International US9875877B2 (en) | 2014-02-27 | 2015-02-10 | Electron scanning microscope and image generation method |
US15/855,370 Continuation US10157724B2 (en) | 2014-02-27 | 2017-12-27 | Electron scanning microscope and image generation method |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2015129446A1 true WO2015129446A1 (ja) | 2015-09-03 |
Family
ID=54008770
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2015/053598 WO2015129446A1 (ja) | 2014-02-27 | 2015-02-10 | 走査電子顕微鏡および画像生成方法 |
Country Status (6)
Country | Link |
---|---|
US (2) | US9875877B2 (ja) |
JP (1) | JP6302702B2 (ja) |
KR (1) | KR101840232B1 (ja) |
CN (1) | CN105940478B (ja) |
DE (1) | DE112015000280B4 (ja) |
WO (1) | WO2015129446A1 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10141157B2 (en) | 2015-06-29 | 2018-11-27 | Hitachi High-Technologies Corporation | Method for adjusting height of sample and observation system |
JP6464048B2 (ja) * | 2015-06-30 | 2019-02-06 | 日本電子株式会社 | 電子顕微鏡 |
US10431416B2 (en) * | 2015-08-21 | 2019-10-01 | Hitachi High-Technologies Corporation | Observation support unit for charged particle microscope and sample observation method using same |
KR101897460B1 (ko) * | 2016-11-16 | 2018-09-12 | 한국표준과학연구원 | 교환가능한 전자현미경용 전자총 및 이를 포함하는 전자현미경 |
CN106645250B (zh) * | 2016-11-21 | 2024-04-26 | 宁波聚瑞精密仪器有限公司 | 一种具备光学成像功能的扫描透射电子显微镜 |
WO2018146804A1 (ja) * | 2017-02-13 | 2018-08-16 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置 |
CN110622008B (zh) * | 2017-04-24 | 2023-01-13 | 分子前景公司 | 具有氦气氛的力显微镜 |
KR101954328B1 (ko) | 2017-05-16 | 2019-03-06 | (주)코셈 | 고분해능 주사전자현미경 |
CN110709960B (zh) * | 2017-06-02 | 2022-06-10 | 株式会社日立高新技术 | 带电粒子束装置 |
KR102027559B1 (ko) * | 2018-06-29 | 2019-10-01 | (주)코셈 | 고분해능 주사전자현미경 |
KR102344698B1 (ko) * | 2019-03-25 | 2021-12-29 | (주)코셈 | 주사 전자 현미경의 착탈 가능한 컬럼 유닛, 및 그 제공방법 |
AU2020326891A1 (en) * | 2019-08-06 | 2022-03-24 | The University Of Kansas | Electron microscope imaging adaptor |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006190578A (ja) * | 2005-01-06 | 2006-07-20 | National Institute For Materials Science | 低真空走査型電子顕微鏡を用いた炭素系材料の微細加工方法とその装置 |
JP2013175377A (ja) * | 2012-02-27 | 2013-09-05 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
JP2013225419A (ja) * | 2012-04-20 | 2013-10-31 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5949076A (en) * | 1996-02-26 | 1999-09-07 | Kabushiki Kaisha Toshiba | Charged beam applying apparatus |
AUPQ932200A0 (en) * | 2000-08-11 | 2000-08-31 | Danilatos, Gerasimos Daniel | Environmental scanning electron microscope |
JP2002289129A (ja) | 2001-03-26 | 2002-10-04 | Jeol Ltd | 低真空走査電子顕微鏡 |
EP1936363A3 (en) * | 2006-12-19 | 2010-12-08 | JEOL Ltd. | Sample inspection apparatus, sample inspection method, and sample inspection system |
WO2010001399A1 (en) * | 2008-07-03 | 2010-01-07 | B-Nano | A scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment |
US8947520B2 (en) | 2009-01-22 | 2015-02-03 | Hitachi High-Technologies Corporation | Electron microscope |
JP5352262B2 (ja) * | 2009-02-06 | 2013-11-27 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
JP2010230417A (ja) * | 2009-03-26 | 2010-10-14 | Jeol Ltd | 試料の検査装置及び検査方法 |
JP2011243483A (ja) * | 2010-05-20 | 2011-12-01 | Jeol Ltd | 試料保持体、検査装置、及び検査方法 |
JP5320418B2 (ja) * | 2011-01-31 | 2013-10-23 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
JP5699023B2 (ja) | 2011-04-11 | 2015-04-08 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
JP5825964B2 (ja) * | 2011-10-05 | 2015-12-02 | 株式会社日立ハイテクノロジーズ | 検査又は観察装置及び試料の検査又は観察方法 |
JP5923412B2 (ja) * | 2012-08-24 | 2016-05-24 | 株式会社日立ハイテクノロジーズ | 観察装置および光軸調整方法 |
JP5936497B2 (ja) * | 2012-09-14 | 2016-06-22 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び試料観察方法 |
-
2014
- 2014-02-27 JP JP2014036137A patent/JP6302702B2/ja active Active
-
2015
- 2015-02-10 WO PCT/JP2015/053598 patent/WO2015129446A1/ja active Application Filing
- 2015-02-10 CN CN201580005384.9A patent/CN105940478B/zh active Active
- 2015-02-10 US US15/111,907 patent/US9875877B2/en active Active
- 2015-02-10 DE DE112015000280.4T patent/DE112015000280B4/de active Active
- 2015-02-10 KR KR1020167019382A patent/KR101840232B1/ko active IP Right Grant
-
2017
- 2017-12-27 US US15/855,370 patent/US10157724B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006190578A (ja) * | 2005-01-06 | 2006-07-20 | National Institute For Materials Science | 低真空走査型電子顕微鏡を用いた炭素系材料の微細加工方法とその装置 |
JP2013175377A (ja) * | 2012-02-27 | 2013-09-05 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
JP2013225419A (ja) * | 2012-04-20 | 2013-10-31 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
Also Published As
Publication number | Publication date |
---|---|
KR101840232B1 (ko) | 2018-03-20 |
CN105940478B (zh) | 2018-10-19 |
US20180122617A1 (en) | 2018-05-03 |
DE112015000280B4 (de) | 2021-01-21 |
JP6302702B2 (ja) | 2018-03-28 |
US20160343538A1 (en) | 2016-11-24 |
US10157724B2 (en) | 2018-12-18 |
US9875877B2 (en) | 2018-01-23 |
JP2015162316A (ja) | 2015-09-07 |
CN105940478A (zh) | 2016-09-14 |
KR20160103034A (ko) | 2016-08-31 |
DE112015000280T5 (de) | 2016-09-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6302702B2 (ja) | 走査電子顕微鏡および画像生成方法 | |
JP5825964B2 (ja) | 検査又は観察装置及び試料の検査又は観察方法 | |
JP5936484B2 (ja) | 荷電粒子線装置及び試料観察方法 | |
JP6207824B2 (ja) | 荷電粒子線装置、隔膜の位置調整方法および隔膜位置調整ジグ | |
JP5909431B2 (ja) | 荷電粒子線装置 | |
JP2012221766A (ja) | 荷電粒子線装置 | |
JP6078637B2 (ja) | 荷電粒子線装置およびフィルタ部材 | |
US9466457B2 (en) | Observation apparatus and optical axis adjustment method | |
JP5936497B2 (ja) | 荷電粒子線装置及び試料観察方法 | |
WO2017002152A1 (ja) | 試料高さ調整方法及び観察システム | |
JP6118870B2 (ja) | 試料観察方法 | |
JP2015079765A (ja) | 荷電粒子線装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 15755761 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 15111907 Country of ref document: US Ref document number: 112015000280 Country of ref document: DE |
|
ENP | Entry into the national phase |
Ref document number: 20167019382 Country of ref document: KR Kind code of ref document: A |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 15755761 Country of ref document: EP Kind code of ref document: A1 |