WO2015037839A1 - Système d'alimentation en eau électrolysée - Google Patents

Système d'alimentation en eau électrolysée Download PDF

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Publication number
WO2015037839A1
WO2015037839A1 PCT/KR2014/007886 KR2014007886W WO2015037839A1 WO 2015037839 A1 WO2015037839 A1 WO 2015037839A1 KR 2014007886 W KR2014007886 W KR 2014007886W WO 2015037839 A1 WO2015037839 A1 WO 2015037839A1
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WO
WIPO (PCT)
Prior art keywords
water
electrolytic
acidic
electrolytic cell
supply system
Prior art date
Application number
PCT/KR2014/007886
Other languages
English (en)
Korean (ko)
Inventor
안종호
김복수
박성환
배정완
Original Assignee
솔브레인나노텍 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 솔브레인나노텍 주식회사 filed Critical 솔브레인나노텍 주식회사
Priority claimed from KR20140110658A external-priority patent/KR20150029543A/ko
Publication of WO2015037839A1 publication Critical patent/WO2015037839A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
    • C02F2001/46185—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water only anodic or acidic water, e.g. for oxidizing or sterilizing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
    • C02F2001/4619—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water only cathodic or alkaline water, e.g. for reducing

Definitions

  • the present invention relates to an electrolytic water supply system, and more particularly to an electrolytic water supply system used for supplying electrolytic water to a semiconductor process.
  • cleaning of the surface of the substrate is required to remove particles, which are contaminants on the substrate, and to highly clean the surface of the substrate. I'm using.
  • the electrolyzed water electrolyzes pure water to generate alkaline water or acidic water.
  • Pure water is composed of ions of H + and OH-, and when electrolyzed, alkaline ions are generated at the negative electrode (-) and acidic ions at the positive electrode (+). do.
  • ORP Oxidation Reduction Potential
  • the ORP may be referred to as a reference value for determining whether water is oxidized water or reduced water. If the ORP value is a positive value, the oxidation water is.
  • a conventional electrolytic cell used to generate electrolyzed water is filled with a cathode electrode and a cathode electrode in a cathode chamber and an anode chamber divided into ion permeable diaphragms therein, and an electric current is added to both electrodes with pure water in the electrolytic cell.
  • the membrane is electrolyzed with the diaphragm interposed therebetween, the water in the cathode chamber becomes an alkaline water due to a high pH value, and the water in the anode chamber becomes a pH value to form an acidic water.
  • the amount of current varies depending on the water pressure, the current flows less in the high pressure part, and more current flows in the low water part.
  • the electrolytic efficiency is high but there is a problem of overelectrolysis.
  • Korean Patent No. 10-1130795 electrolytic device having a multi-step electrode
  • the above-described problem is solved by forming an electrode installed in the electrolytic cell in multiple stages and performing series connection. That is, a plurality of electrodes, such as a first cathode electrode, a second cathode electrode, and a third cathode electrode, are formed in series at predetermined intervals from the lower part of the electrolytic cell, and the first anode electrode, the second anode electrode, the third anode electrode, and the like are also formed. It is formed in series at predetermined intervals.
  • the first anode electrode and the second cathode electrode, the second anode electrode and the third cathode electrode, the third anode electrode and the fourth cathode electrode are finally formed to apply a DC voltage.
  • the lowest electrolyzer in which the first anode electrode and the second cathode electrode are connected has high water pressure, but the current is constant to increase the electrolytic efficiency, and thus the third anode electrode and the fourth cathode.
  • the uppermost electrolytic cell to which the electrode is connected has a low water pressure, but the current is constant, so that the electrolytic efficiency can be increased constantly. Therefore, when forming the multi-stage electrode as described above, a constant current flows regardless of the height, it is possible to stably improve the electrolytic efficiency without being affected by the hydraulic pressure.
  • the applicant of the present invention has invented a simpler and more efficient electrolytic water supply system by using an electrolytic cell having a multi-stage electrode as described above.
  • Embodiments of the present invention to solve the problems described above, to provide an electrolytic water supply system that can be installed in a simpler configuration for supplying electrolytic water to the semiconductor process.
  • an electrolytic cell for generating acidic or alkaline water using pure water, and an electrolytic water supply system for supplying the acidic or alkaline water generated in the electrolytic cell on a semiconductor process, the plurality of partition walls and An electrolytic cell including a plurality of alkaline water generating chambers and a plurality of acidic water generating chambers in which a flow path is formed by a passage; A supply line for directly supplying alkaline water generated in the alkaline water generating chamber and acidic water generated in the acidic water generating chamber to a semiconductor process; And an flow rate adjusting means installed on each of the alkaline water generating chamber, the acidic water generating chamber, and the fluid line connecting the supply line, respectively, to the electrolytic cell.
  • the plurality of alkaline water generating chambers and the plurality of acidic water generating chambers in the electrolytic cell can be formed in a zigzag manner by a flow path by the plurality of partition walls and passages.
  • the flow regulating means may use a flow regulating valve or orifice, and a three-way valve may be installed on the fluid line connecting the flow regulating valve or orifice and the supply line, respectively.
  • the discharge line is connected to the three-way valve, and discharges the fluid to the outside.
  • the size of the passage formed in the alkaline water generating chamber and the acidic water generating chamber in the electrolytic cell can be formed such that the internal pressure load in the electrolytic cell is 0.01 MPa or less.
  • a degassing filter may be installed on the supply line to remove bubbles contained in acidic or alkaline water.
  • the electrolyzer is vertically separated from the bottom of the electrolyzer at a position corresponding to each of the plurality of anode electrodes formed as multi-stage electrodes in series so as to be separated from each other in a vertical direction from the bottom, and the plurality of anode electrodes formed as the multi-stage electrodes in series. It may be configured to include a plurality of cathode electrodes formed as a multi-step electrode in series in a form separated from each other in the direction, the anode electrode can be formed of a boron doped diamond electrode (BDD, Boron Doped Diamond electrode).
  • BDD Boron Doped Diamond electrode
  • the electrolytic water supply system uses a electrolytic cell having a multi-stage electrode so that a constant current flows regardless of the height, so that the electrolytic water can be stably improved without affecting the water pressure.
  • the pure water flows inside the electrolytic cell, by forming a passage in the chamber long, it is characterized in that the internal pressure load inside the electrolytic cell hardly occurs. Through this, it is possible to avoid the use of the storage tank and the pump for storing the electrolytic water.
  • the electrolytic water supply system is characterized in that the degassing filter for removing bubbles on the electrolytic water supply line.
  • FIG. 1 illustrates an electrolytic water supply system for supplying electrolytic water onto a semiconductor process using an electrolytic cell according to an embodiment of the present invention.
  • FIG 2 shows an electrolytic water supply system according to an embodiment of the present invention.
  • FIG 3 shows an electrolytic water supply system according to another embodiment of the present invention.
  • the "semiconductor process” described in the detailed description of the present invention is a cleaning process in the semiconductor or LED process, such as deposition (CVD), diffusion (Diffusion), exposure (Develop), etching (Etch) ), And polishing (CMP), and in the scrubbing process to include MEGASONIC, Brushing, Jet.
  • semiconductor process includes FPD Cleaning, LCD Cleaning, and Photo Mask Cleaning.
  • Applicant of the present invention is to produce the electrolytic water using the electrolytic cell having a multi-stage electrode as described in the prior art in the system for supplying the electrolyzed water to the cleaning process in the semiconductor process bar, more specific drawings thereof Is shown.
  • the electrolytic water supply system 100 is connected to the electrolytic cell 110 and the front end of the electrolytic cell 110 by the filter unit 10 and the inlet line 20, the electrolytic water discharged from the electrolytic cell 110
  • a flow rate control valve 61 which is a flow rate control means, is configured to be discharged through the configured discharge line 60, and the discharge line 60 has a supply line 30 and a discharge line 40 by the three-way valve 50. It is configured to be connected.
  • a storage tank 31 for storing electrolytic water is installed on the supply line 30, and the electrolytic water stored in the storage tank 31 is configured to be supplied to the semiconductor process at a predetermined pressure through a pump 70. have.
  • the pure water flows into the electrolytic cell 110 through the pure water inlets 121 and 131 and the electrolyte solution inlet 161 formed at the lower end of the electrolytic cell 110. It is configured to be.
  • the pure water introduced in this way is generated to be alkaline water while passing through the alkaline water generating chamber 120 and is discharged through the alkaline water outlet 122, and is generated as acidic water while passing through the acidic water generating chamber 130 to acidic water outlet 132. It may be formed to be discharged through).
  • the pure water introduced through the electrolyte solution inlet 161 flows through the partition wall 160, which is formed to be discharged through the electrolyte solution outlet 162.
  • a flow control valve 61 may be installed, respectively, the flow control valve ( 61) it is possible to adjust the water pressure of the alkaline water generating chamber 120 and the acidic water generating chamber 130 by adjusting, through this, the dissolved oxygen, dissolved hydrogen, ORP of the appropriate to the alkaline or acidic water It is possible to have.
  • the internal pressure of the electrolytic cell 110 is high, it is also possible to use an orifice without using the flow control valve 61.
  • the alkaline or acidic water discharged through the electrolytic cell 110 is stored in the storage tank 31 through the supply line 30 or the discharge line 40 through the control of the three-way valve 50 according to the purpose It may be configured to be discharged to the outside through.
  • the three-way valve 50-1 connected to the alkaline water outlet 122 is opened to store the alkaline water in the storage tank 31, and the other three-way valve.
  • 50-2 and 50-3 may be configured to discharge the treated water discharged through the acidic water and the electrolyte solution outlet 162 in the closed state to the outside. In this way, it is possible to selectively use alkaline water or acidic water as the cleaning liquid in the semiconductor process.
  • the electrolyzer 110 shown in FIG. 1 is composed of an alkali water generation chamber 120 and an acidic water generation chamber 130 based on a partition wall 160 formed by an ion exchange resin therein, and each alkali water generation chamber ( 120, the acid water generating chamber 130 is formed by a plurality of partition walls (124, 134) up and down a plurality of chambers (C1, C2, etc., A1, A2, etc.), the plurality of chambers (C1, The cathode electrode 140 and the anode electrode 150 are formed in series in multiple stages in C2, A1, A2, etc.), respectively. Meanwhile, in the case of the present invention, the anode electrode 150 may be formed of a boron doped diamond electrode (BDD).
  • BDD boron doped diamond electrode
  • Boron doped diamond electrode has the advantages of high anode stability and excellent durability and very low precipitation.
  • Pure water flowing into the pure water inlets 121 and 131 is formed by forming passages 123 and 133 in the partition walls 124 and 134 formed in the alkali water generating chamber 120 and the acidic water generating chamber 130, respectively. It is formed to move along. Meanwhile, as shown in FIG. 1, the passages 123 and 133 are formed very small in the center of the plurality of partition walls 124 and 134.
  • the applicant of the present invention has been devised to adjust the flow path inside the electrolytic cell 110 in another embodiment so that the pressure load inside the electrolytic cell 110 is hardly generated. More specifically, as shown in FIG. 2, the partition walls 124 ′ and 134 ′ in the alkaline water generating chamber 120 and the acidic water generating chamber 130 are zigzag-shaped to form the entire flow path longer. Also, by forming the passage 123'133 'formed by the partition walls 124' and 134 'to be larger, the pressure load inside the electrolytic cell 110' is hardly generated. can do.
  • the passages 123'133 ' which form a larger space in the alkali water generating chamber 120 and the acidic water generating chamber 130, and are formed by the partition walls 124' and 134 '.
  • the passages 123'133 'formed by the partition walls 124' and 134 ' may be formed in various sizes, and the pressure load inside the electrolytic cell 110 may be reduced to 0.01 MPa or less. If so, it is possible to vary the size.
  • the electrolytic water supply system 100 ′ when the electrolytic water supply system 100 ′ according to the present invention is configured as shown in FIG. 2, since the pressure load in the electrolytic cell 100 ′ is formed at 0.01 MPa or less, the electrolytic water supply system 100 ′ is shown in the drawing.
  • the inflow water pressure of the pure water flowing through the pure water inlets 121 and 131 is about 0.2 MPa
  • the discharge water pressure of the acidic or alkaline water discharged through the electrolytic cell 110 ' is about 0.19 MPa. Is the water pressure of the grade which can be supplied directly on the said semiconductor process. Accordingly, the acidic or alkaline water passing through the electrolytic cell 110 'can be directly supplied to the semiconductor process through the supply line 30' without using an additional pump.
  • the electrolytic water supply system 100 ′ is directly connected to a semiconductor process without using an additional storage tank 31 and a pump 70.
  • the technical advantage that can be formed simply, the configuration.
  • an embodiment of the present invention has been described with reference to an electrolytic cell having a multistage electrode, the technical features of the present invention are not limited thereto, and the present invention may be applied even when a single electrode is used.
  • FIG. 3 illustrates an electrolytic water supply system 100 ′′ according to another embodiment of the present invention, wherein the system 100 ′′ is formed at the bottom of the inflow line 20 and the electrolyzer 110 ′.
  • the booster pump 80 is a component generally used as a means for pressurizing water.
  • a degassing filter 90 may be installed on the supply line 30 ′ to remove bubbles contained in the acidic or alkaline water supplied on the semiconductor process.
  • the electrolytic water supply system according to the present invention may be configured in a simpler configuration by not using a storage tank and a pump for storing electrolytic water, and it is possible to supply electrolytic water with improved electrolytic efficiency.
  • degassing filter 100 electrolytic water supply system

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

Selon un aspect, l'invention concerne une cuve d'électrolyse qui utilise de l'eau pure pour produire de l'eau acide ou de l'eau alcaline, et un système d'alimentation en eau alimentant la cuve d'électrolyse en eau acide ou eau alcaline produite par un procédé de production de semi-conducteurs. Le système d'alimentation en eau électrolysée comprend : une cuve d'électrolyse conçue pour contenir une chambre de production d'eau alcaline et une chambre de production d'eau acide comprenant des chemins d'écoulement formés au moyen d'une pluralité de parois de séparation et de passages ; une ligne d'alimentation pour fournir directement l'eau alcaline produite dans la chambre de production d'eau alcaline et l'eau acide produite dans la chambre de production d'eau acide à un procédé de production de semi-conducteurs ; et des moyens de réglage d'écoulement installés respectivement sur les lignes d'alimentation raccordant respectivement les unes aux autres la chambre de production d'eau alcaline, la chambre de production d'eau acide de la cuve d'électrolyse et les lignes d'alimentation.
PCT/KR2014/007886 2013-09-10 2014-08-25 Système d'alimentation en eau électrolysée WO2015037839A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2013-0108633 2013-09-10
KR20130108633 2013-09-10
KR10-2014-0110658 2014-08-25
KR20140110658A KR20150029543A (ko) 2013-09-10 2014-08-25 전해수 공급시스템

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WO2015037839A1 true WO2015037839A1 (fr) 2015-03-19

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980081448A (ko) * 1997-04-16 1998-11-25 요코야마시게미츠 산성수 및 알칼리수 생산용 전해조
KR100210884B1 (ko) * 1994-03-25 1999-07-15 가네꼬 히사시 전해수 생성 방법 및 이를 위한 장치
KR100276766B1 (ko) * 1997-02-06 2001-04-02 이시다 아키라 기판세정장치및기판세정방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100210884B1 (ko) * 1994-03-25 1999-07-15 가네꼬 히사시 전해수 생성 방법 및 이를 위한 장치
KR100276766B1 (ko) * 1997-02-06 2001-04-02 이시다 아키라 기판세정장치및기판세정방법
KR19980081448A (ko) * 1997-04-16 1998-11-25 요코야마시게미츠 산성수 및 알칼리수 생산용 전해조

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