WO2014122700A1 - 成膜装置 - Google Patents
成膜装置 Download PDFInfo
- Publication number
- WO2014122700A1 WO2014122700A1 PCT/JP2013/005136 JP2013005136W WO2014122700A1 WO 2014122700 A1 WO2014122700 A1 WO 2014122700A1 JP 2013005136 W JP2013005136 W JP 2013005136W WO 2014122700 A1 WO2014122700 A1 WO 2014122700A1
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- Prior art keywords
- target
- film
- gettering
- shutter
- shutter plate
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32853—Hygiene
- H01J37/32871—Means for trapping or directing unwanted particles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32899—Multiple chambers, e.g. cluster tools
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
- H01J37/3429—Plural materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3447—Collimators, shutters, apertures
Definitions
- the present invention relates to a film forming apparatus, and more particularly to a film forming apparatus for a magnetoresistive effect element used for a magnetic random access memory (MRAM), a sensor of a magnetic head, or the like.
- MRAM magnetic random access memory
- Devices using the magnetoresistive effect are used for sensors of MRAM (magnetic random access memory) and magnetic heads. These devices are known to deteriorate in performance such as TMR characteristics due to impurities in the device. Therefore, an ultrahigh vacuum of 10 ⁇ 7 Pa to 10 ⁇ 8 Pa is required as a vacuum environment in the sputtering apparatus for manufacturing the MRAM device. In such a degree of vacuum, hydrogen and water constitute most of the impurities. In order to remove this, it is known to use a pump that adsorbs (traps) impurities by attaching a film of an active getter material (for example, titanium or tantalum) to the wall surface of the sputtering apparatus in a vacuum environment. (For example, refer to Patent Document 1).
- an active getter material for example, titanium or tantalum
- Patent Document 1 The technique of Patent Document 1 is to form a thin film such as titanium on an inner wall or a part of a shutter in a film forming apparatus for forming a device and obtain a gettering effect for removing impurities.
- a sputtering source for forming a thin film such as titanium a target mounting portion to which titanium or the like is attached is used.
- Patent Document 1 is an MRAM device that requires a very large number of laminated films, and if the material mounted on the cathode is limited to titanium, tantalum or the like having a gettering effect, it is necessary to further increase the number of cathodes. is there. In addition, increasing the number of cathodes leads to an increase in the size of the vacuum vessel and an increase in the number of vacuum vessels, which may hinder cost reduction of the film forming apparatus.
- the present invention has been made in view of the above problems, and an object of the present invention is to provide a film forming apparatus capable of forming a material having a gettering effect in the apparatus without affecting the size and number of vacuum vessels.
- a film forming apparatus includes a plurality of first target electrodes including a first mounting portion to which a film forming target can be attached, and a substrate holder that holds a substrate at a position facing the plurality of first target electrodes. And a target electrode for gettering, and a second target electrode having a second attachment portion smaller than the first attachment portion.
- a small target electrode on which titanium or tantalum having a high gettering effect is mounted as a target G is provided in a gap at a mounting position of a target electrode used for film formation. Therefore, the gettering material can be sputtered from the target G to the space (film formation chamber) for manufacturing the MRAM device or the back side of the shield plate, and an ultrahigh vacuum can be obtained by the gettering effect.
- the small target electrode mounted as the target G is adjusted to a size provided in a gap between a plurality of target electrodes for film formation, the size of the vacuum container can be increased or the number of vacuum containers can be increased. The footprint of the film forming apparatus can be suppressed.
- FIG. 3 is a sectional view taken along line XX in FIG. 2. It is a perspective view of each member which comprises the shutter apparatus which concerns on the 1st Embodiment of this invention.
- FIG. 1 shows a typical configuration of a film forming apparatus according to the first embodiment of the present invention, and is a plan view shown to such an extent that a schematic configuration of an internal mechanism can be found.
- This film forming apparatus 10 is a cluster type and includes a plurality of film forming chambers.
- a transfer chamber 12 provided with a robot transfer device 11 is installed at a central position.
- the robot transport device 11 can mount a substrate by a hand 14 provided on an extendable arm.
- the base end portion of the arm is rotatably attached to the central portion of the transfer chamber 12.
- the transfer chamber 12 of the film forming apparatus 10 is provided with load / unload chambers 15 and 16.
- load / unload chamber 15 By the load / unload chamber 15, a substrate as a material to be processed is carried into the film forming apparatus 10 from the outside, and the substrate after the multilayer film forming process is carried out to the outside of the film forming apparatus 10.
- the load / unload chamber 16 has the same function, and the substrate loaded via the load / unload chamber 16 is unloaded from the chamber.
- film forming chambers 17A to 17E are provided around the transfer chamber 12. Between two adjacent chambers, there is provided a gate valve 20 that isolates both chambers and can be opened and closed.
- Each of the film formation chambers 17A to 17E is a film formation chamber for continuously forming different types of films in the same chamber.
- the multilayer film deposited on the substrate is divided into a plurality of groups, and a plurality of films belonging to each group are formed in any one of the predetermined deposition chambers.
- a magnetic film is deposited by a PVD (Physical Vapor Deposition) method using sputtering.
- PVD Physical Vapor Deposition
- the substrate 34 carried inside through the load / unload chambers 15, 16 is transferred to each of the film forming chambers 17 A to 17 E by the robot transfer apparatus 11 according to the multilayer device to be manufactured. They are introduced in a predetermined order, and a predetermined film forming process is performed in each chamber.
- the multilayer device to be manufactured include LED, MRAM, TMR head, advanced (improved) GMR, and the like.
- the evacuation device 18 for bringing the inside of the film forming chambers 17A to 17E into a required vacuum state
- the power supply device for supplying the power applied to the target electrodes 35 to 38, the target electrodes 35 to
- An apparatus for generating plasma such as a target attached to each of 38 and a process gas introduction mechanism is not shown.
- the oxide film deposition chamber is a chamber in which a surface chemical reaction for oxidizing a metal layer is performed, and plasma oxidation, natural oxidation, ozone oxidation, ultraviolet-ozone oxidation, radical oxygen, or the like is used for the surface chemical reaction.
- the cleaning chamber is a chamber in which surface planarization is performed by an ion beam etching mechanism or an RF sputter etching mechanism.
- the film forming chambers 17A to 17E of the present embodiment have the same configuration, but the type of target mounted on the target electrode of each film forming chamber is also changed according to the film configuration of the multilayer device to be manufactured. Of course.
- FIGS. 2 is a schematic view of the film forming chamber 17A as viewed from above, so that the positional relationship between the target electrodes 35 to 38 (first target electrode) and the target electrode 41 for gettering (second target electrode) can be understood. It is.
- FIG. 3 is a longitudinal sectional view of the film forming chamber 17A. 2 and 3, elements that are substantially the same as those described in FIG. 1 are denoted by the same reference numerals.
- the target electrodes 35 to 38 are known cathodes having an attachment portion (first attachment portion) to which a target to which a film-forming material is bonded can be attached to face the substrate.
- a substrate holder 33 is rotatably provided at the center of the bottom surface of the film forming chamber 17A.
- the substrate holder 33 can hold the substrate 34 in a rotating state during sputtering film formation on the substrate 34.
- Targets A to D can be disposed on the respective attachment portions of the target electrodes 35 to 38 provided in an inclined manner so as to face the upper surface of the substrate 34 disposed horizontally below.
- Each of the targets A to D is bonded with a film forming material used for the film forming process.
- the state where the targets A to D and the substrate 34 face each other means that the target electrodes 35 to 38 (more precisely, the attachment portions of the target electrodes 35 to 38) are arranged toward the periphery of the substrate. 3 and includes a state in which the sputtering surfaces of the targets A to D are inclined and directed toward the substrate 34 as shown in FIG.
- the target electrode 41 for gettering includes an attachment portion (second attachment portion) for attaching a target G for gettering that is smaller than the targets A to D for film formation. Therefore, the target electrode 41 is smaller in size than the target electrodes 35 to 38.
- the attachment portion of the target electrode 41 is smaller than that of the target electrodes 35 to 38, the target G attached to the target electrode 41 is also smaller than the targets A to D for film formation. Therefore, the target electrode 41 can be attached to the gap between the attachment positions of the target electrodes 35 to 38.
- the second target electrode of the target electrode 41 can be attached between any two adjacent target electrodes among the first target electrodes of the target electrodes 35 to 38.
- the target electrode 41 is attached between the target electrode 36 and the target electrode 38, but may be attached between other target electrodes. That is, even if the target electrode 41 is provided, it is not necessary to change the arrangement of the target electrodes 35 to 38, so that it is not necessary to change the size of the vacuum vessel. Of course, it is not necessary to increase the number of vacuum vessels by providing the target electrode 41.
- the attachment portion of the target electrode 41 (second attachment portion) is smaller than the attachment portions (first attachment portion) of the target electrodes 35 to 38, specifically, the area of the portion of the attachment portion to which the target is attached. Is small.
- a rotary shutter device 54 is disposed between the targets A to D and G and the substrate 34.
- the rotary shutter device 54 has a double shutter plate. By the operation of the rotary shutter device 54, the target electrode on which the targets A to D and G used for the sputter film formation are selected is selected from the target electrodes 35 to 38 and 41.
- a rotary shutter device 54 is provided between the targets A to D and G and the substrate holder 33.
- the rotary shutter device 54 will be described later.
- a substrate shutter 19 is provided between the rotary shutter device 54 and the substrate holder 33.
- the substrate shutter 19 is a metal plate-like member configured to be able to move on the substrate holder 33, and is connected to a motor that moves the substrate shutter 19.
- the motor is connected to the control device.
- the substrate holder 33 is covered with the substrate shutter 19 because sputtering is performed without the substrate 34 on the substrate holder 33.
- the substrate shutter 19 can be moved away from the substrate placed on the substrate holder 33.
- the rotary shutter device 54 will be described with reference to FIGS.
- FIG. 4 is a perspective view of each member constituting the rotary shutter device 54.
- the rotary shutter device 54 includes a target electrode holder 61, an upper shield plate (shield member) 63, a first shutter plate (first shutter member) 65, and a second shutter plate (second shutter member) 67.
- the first shutter plate 65 and the second shutter plate 67 are configured as a shutter plate of a double rotation shutter.
- the upper shield plate 63, the first shutter plate 65, and the second shutter plate 67 are all curved upwards so as to be substantially parallel.
- the target electrode holder 61 is a member provided with four support portions 61 a for holding the target electrodes 35 to 38 and a support portion 61 b for the target electrode 41, and is provided on the upper portion of the container 51.
- the target electrode holder 61 of this embodiment also has a function as a lid of the container 51, but a support part 61 a and a support part 61 b may be provided on a part of the container 51.
- the target electrodes 35 to 38 held by the support 61a can hold the targets A to D bonded with an arbitrary film forming material used for the film forming process in the direction of the substrate 34.
- a target G bonded with titanium can be held in the direction of the substrate holder 33 on the target electrode 41 supported by the support portion 61b. Note that portions of the target electrodes 35 to 38 and 41 that hold the targets A to D and G are set as target mounting surfaces.
- titanium (Ti) will be described as an example of the material of the target G, any film forming material used for gettering can be used. For example, other than titanium, Ta, Zr, Cr, Mg, etc. can be considered.
- the upper shield plate (shield member) 63 is a stainless steel shield shield plate provided on the substrate holder 33 side of the target electrode holder 61, and atoms sputtered from the targets A to D adhere to the target electrode holder 61. Is prevented.
- the upper shield plate 63 has openings 63a and 63b formed in regions facing the target mounting surfaces (mounting surfaces) of the target electrodes 35 to 38 and 41. Since a total of five target electrodes 35 to 38 and 41 are held in the target electrode holder 61, openings are formed at positions on the upper shield plate 63 facing the target mounting surfaces of the target electrodes 35 to 38 and 41, respectively. Has been.
- the first shutter plate (first shutter member) 65 is a stainless steel shutter plate rotatably provided on the substrate holder 33 side of the upper shield plate 63, and controls the rotation angle by rotating the rotation shaft 65b. be able to.
- the first shutter plate 65 has an opening 65a in each of the regions facing the target mounting portion of the two film forming target electrodes, and an opening 65c in the region facing the target mounting portion of the target electrode 41 for gettering. Is formed.
- the two openings 65a formed in the first shutter plate 65 are formed at symmetrical positions with respect to the rotation shaft 65b.
- the opening 65c of this embodiment is formed at a position adjacent to any of the openings 65a.
- the first shutter plate 65 can be rotated to a predetermined position to shield the attachment portions of the target electrodes 35 to 38 and the attachment portion of the target electrode 41, and any one or a plurality of attachment portions can be placed on the substrate 34 side. Can be exposed.
- the second shutter plate (second shutter member) 67 is a stainless steel shutter plate rotatably provided on the substrate holder 33 side of the first shutter plate 65, and controls the rotation angle by rotating the rotation shaft 67b. can do.
- the rotation shaft 65b and the rotation shaft 67b are configured to be able to independently control rotation.
- an opening 67a is formed in each of the regions facing the target mounting surface of the two film forming target electrodes, and an opening 67c is formed in the region facing the target mounting surface of the target electrode 41 for gettering.
- the two openings 67 a formed in the second shutter plate 67 are formed so as to be opposed to the two openings 65 a formed in the first shutter plate 65.
- the second shutter plate 67 can be rotated together with the first shutter plate 65 to a predetermined position so as to shield the attachment portions of the target electrodes 35 to 38 and the attachment portion of the target electrode 41, and any one or a plurality of attachment portions can be attached. Part can be exposed to the substrate 34 side.
- 5A to 5c in FIG. 5 and 6a to 6e in FIG. 6 will be used to describe the movement of the rotary shutter device 54 when a gettering film is formed at a predetermined location.
- 5a to 5c in FIG. 5 are explanatory diagrams regarding the timing of using the targets A to D and G and the arrangement of the shutter plates when a shutter device suitable for simultaneous sputtering (Co-sputtering) is used.
- FIG. 5 are schematic views of the upper shield plate 63, the first shutter plate 65, and the second shutter plate 67 as viewed from above among the members constituting the rotary shutter device.
- the rotary shutter device 54 rotates the first shutter plate 65 and the second shutter plate 67 so that the target used for film formation is exposed to the substrate through the openings 65a and 67a when the sputter film is formed on the substrate 34. Used.
- the film forming apparatus according to the present invention can form a gettering film at a predetermined location by a target G for gettering mounted on the target electrode 41 before performing sputter film formation on the substrate 34. Examples of the place where the gettering film is formed include the first shutter plate 65, the second shutter plate 67, the horizontal shutter plate, the inner wall of the vacuum vessel, and the shield plate.
- FIG. 5a in FIG. 5 is an arrangement for forming a Ti film for gettering from the target electrode 41 on the second shutter plate 67.
- FIG. The first shutter plate 65 is stopped after rotating so that the opening 65c is positioned in front of the target G for gettering, and the second shutter plate 67 is stopped so that the opening 67c is not positioned in front of the target G. Yes.
- Ti sputtered from the target G attached to the attachment portion passes through the opening 65 c and is formed in the region 67 d on the upper surface of the second shutter plate 67.
- the gettering material deposited in the region 67d serves as a vacuum pump and exhausts the inside of the vacuum vessel. Impurities in the gap between the first shutter plate 65 and the second shutter plate 67 can be effectively removed. Since the first shutter plate 65 is located between the target G and the second shutter plate 67, there is no contamination from the target G to the targets A to D. If the sputtering is performed from the targets A and D without performing the sputtering from the target G with the arrangement of the first shutter plate 65 and the second shutter plate 67 shown in FIG. Simultaneous sputtering can be performed.
- FIG. 5 a the embodiment in which the gettering film is formed while the rotation of the second shutter plate 67 is stopped is described.
- the film may be formed while the second shutter plate 67 is rotated.
- the region 67d has a ring shape, and a gettering film can be formed in a wider range than the embodiment of FIG. 5a.
- FIG. 5b in FIG. 5 is an arrangement for forming a Ti film for gettering from the target electrode 41 on the first shutter plate 65.
- FIG. The first shutter plate 65 is stopped after being rotated to an arrangement where the opening 65c is not located in front of the target G for gettering.
- Ti sputtered from the target G is formed in the region 65 d on the upper surface of the first shutter plate 65.
- the gettering material deposited in the region 65d serves as a vacuum pump and exhausts the inside of the vacuum vessel.
- the first shutter plate 65 and the second shutter plate 67 shown in 5b of FIG. 5 if sputtering is performed from the targets B and C without performing sputtering from the target G, the targets B and C can be simultaneously used. Sputtering can be performed.
- the embodiment in which the gettering film is formed while the rotation of the first shutter plate 65 is stopped is described.
- the film may be formed while the first shutter plate 65 is rotated.
- the region 65d has a ring shape, and a gettering film can be formed in a wider range than the embodiment of FIG. 5b.
- 5c in FIG. 5 is an arrangement for forming a Ti film for gettering in a film formation space where the substrate is arranged. Both the opening 65c and the opening 67c are located on the front surface of the target G for gettering. At this time, when power is applied to the target electrode 41, Ti sputtered from the target G passes through the openings 65c and 67c and is formed in the film formation chamber. Specifically, a Ti film having a gettering effect is formed on the upper surface of the substrate shutter 19 or the inner shield plate 21 provided along the inner wall of the container 51. Note that since the opening 67c is formed to have a size larger than that of the opening 65c, Ti sputtered from the target G is released into the film formation chamber while spreading. Therefore, a gettering film can be formed over a wide range in the deposition chamber.
- the film forming apparatus of the present embodiment is configured such that a gettering film can be formed on the upper surface of the substrate shutter 19 and the shield plate 21 with the target G facing the substrate.
- the target G may be deflected from the substrate 34 so that many gettering films are formed inside the shield plate 21.
- 6a to 6e in FIG. 6 are explanatory diagrams for the timing of using the targets A to D and G and the arrangement of the shutter plates when using the shutter device of the film forming apparatus according to another embodiment.
- This shutter device has a configuration suitable for single sputtering.
- symbol is attached
- 6 a of FIG. 6 is an arrangement for forming a Ti film for gettering from the target electrode 41 on the second shutter plate 87.
- the opening 65c of the first shutter plate 85 is positioned in front of the target G for gettering, and the opening 67c of the second shutter plate 87 is not positioned. At this time, when power is applied to the target electrode 41, Ti sputtered from the target G passes through the opening 65 c and is formed in the region 67 d on the upper surface of the second shutter plate 87.
- the gettering material deposited in the region 67d serves as a vacuum pump and exhausts the inside of the vacuum vessel. Since the first shutter plate 85 is located between the target G and the second shutter plate 87, there is no contamination from the target G to the targets A to D. Note that, by the arrangement of the first shutter plate 85 and the second shutter plate 87 shown in FIG. 6A, sputter film formation from the target A can be performed instead of the target G.
- FIG. 6 is an arrangement for forming a Ti film for gettering from the target electrode 41 in the region 67e of the second shutter plate 87.
- the opening 65c of the first shutter plate 85 is positioned in front of the target G for gettering, and the opening 67c of the second shutter plate 87 is not positioned.
- the positions of the area 67e and the area 67d are different.
- the gettering material deposited in the region 67e functions as a vacuum pump while exhausting the vacuum container while suppressing contamination from the target G to the targets A to D. Note that, with the arrangement of the first shutter plate 85 and the second shutter plate 87 shown in 6b of FIG.
- FIG. 6 is an arrangement for forming a Ti film for gettering from the target electrode 41 in the region 65d of the first shutter plate 85.
- the region 65d of the first shutter plate 85 is disposed in front of the target G for gettering.
- the gettering material deposited in the region 65d serves as a vacuum pump and exhausts the inside of the vacuum vessel. Note that, with the arrangement of the first shutter plate 85 and the second shutter plate 87 shown in FIG. 6 c, sputter film formation from the target C can be performed instead of the target G.
- 6d in FIG. 6 is an arrangement for forming a Ti film for gettering from the target electrode 41 in the region 65d of the first shutter plate 85, similarly to 6c in FIG.
- the region 65d of the first shutter plate 85 is disposed in front of the target G for gettering.
- sputter film formation from the target D can be performed instead of the target G.
- FIG. 6 is an arrangement for forming a Ti film for gettering in the film formation space in which the substrate is arranged, and the same effect as 5c in FIG. 5 can be expected.
- Both the opening 65c and the opening 67c are located on the front surface of the target G for gettering.
- Ti sputtered from the target G passes through the openings 65c and 67c, and the Ti film has a gettering effect on the upper surface of the substrate shutter 19 and the inner shield plate 21 in the film forming chamber. Is formed.
- the film forming apparatus using one gettering target G is described, but the number of targets G is not limited.
- the configuration may include two targets G.
- FIG. 7 shows the change in the degree of vacuum when the gettering film is formed in the deposition chamber.
- 0 to 600 seconds are the gas analysis results in the film formation chamber before the formation of the gettering film, and the gettering film was formed in the film formation chamber after 600 seconds.
- the gettering film Before the formation of the gettering film, it was in a vacuum container (film formation chamber) in which evacuation was continued by the vacuum evacuation device 18 for 46 hours after baking. Met. After 600 seconds, the gettering film was formed in the vacuum container (film formation chamber) by performing 0.5 kWh sputtering of the target G bonded with Ti. The measured value in the film formation chamber by the ionization vacuum gauge after the formation of the gettering film was 2.5 ⁇ 10 ⁇ 7 Pa.
- a small target electrode 41 on which titanium or tantalum having a high gettering effect is mounted as a target G is provided in the gap between the attachment positions of the target electrodes 35 to 38 used for film formation.
- the module size is not affected and the number of modules does not need to be increased, so that the footprint of the film forming apparatus can be suppressed.
- a gettering material is sputtered from the target G to the space (film formation chamber) for manufacturing the MRAM device or the back side of the shield plate, and an ultrahigh vacuum can be obtained by the gettering effect.
- a rotary shutter device is configured so that there is no contamination from the target G to other target materials. Since the target G can also be sputtered on the rotary shutter, the sputtering area of titanium serving as a pump can be increased. In the target G, a sufficient gettering effect can be obtained by sputtering for several minutes to 60 minutes at a power density higher than that of the targets A to D.
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Abstract
Description
(第1の実施形態)
図1は本発明の第1の実施形態に係る成膜装置の代表的な構成を示し、内部機構の概略構成が判明する程度に示された平面図である。この成膜装置10はクラスタ型であり、複数の成膜チャンバを備えている。ロボット搬送装置11が備えられた搬送チャンバ12が中央位置に設置されている。ロボット搬送装置11は、伸縮自在なアームに設けられたハンド14によって基板を搭載することができる。アームの基端部は搬送チャンバ12の中心部に回転自在に取り付けられている。
Claims (6)
- 成膜用のターゲットを取り付け可能な第1取り付け部を備える複数の第1ターゲット電極と、
前記複数の第1ターゲット電極に対向する位置で基板を保持する基板ホルダーと、
ゲッタリング用のターゲットを取り付け可能で、前記第1取り付け部よりも小さい第2取り付け部を備える第2ターゲット電極と、
を備えることを特徴とする成膜装置。 - 前記第1ターゲット電極と前記基板ホルダーとの間に設けられ、前記第1取り付け部及び前記第2取り付け部を遮蔽可能な第1シャッタ部材をさらに備えることを特徴とする請求項1に記載の成膜装置。
- 前記第1シャッタ部材は、前記第1ターゲット電極と前記基板ホルダーとの間に回転可能に設けられ、回転した際に、前記第1取り付け部に対向する開口及び前記第2取り付け部に対向する開口を有することを特徴とする請求項2に記載の成膜装置。
- 前記第1シャッタ部材と前記基板ホルダーとの間に回転可能に設けられ、回転した際に、前記第1取り付け部に対向する開口及び前記第2取り付け部に対向する開口を有する第2シャッタ部材をさらに備えることを特徴とする請求項3に記載の成膜装置。
- 前記第2シャッタ部材の前記第2取り付け部に対向する開口は、前記第1シャッタ部材の前記第2取り付け部に対向する開口よりも寸法が大きいことを特徴とする請求項4に記載の成膜装置。
- 前記第2ターゲット電極は、前記複数の第1ターゲット電極のうち、隣接する任意の2つの第1ターゲット電極の間に設けられることを特徴とする請求項1乃至5のいずれか1項に記載の成膜装置。
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JPWO2016047013A1 (ja) * | 2014-09-24 | 2017-07-27 | 株式会社アルバック | スパッタリング装置 |
JP2021533274A (ja) * | 2018-08-13 | 2021-12-02 | 中▲興▼通▲訊▼股▲ふぇん▼有限公司Zte Corporation | 真空コーティング装置、方法およびフィルターキャビティ膜層の製造方法 |
KR20240013481A (ko) | 2022-07-22 | 2024-01-30 | 캐논 톡키 가부시키가이샤 | 성막 장치 |
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JP6529129B2 (ja) * | 2015-11-30 | 2019-06-12 | 株式会社フィルテック | 成膜装置 |
JP7257807B2 (ja) * | 2019-02-12 | 2023-04-14 | 東京エレクトロン株式会社 | スパッタ装置 |
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JP5731085B2 (ja) | 2015-06-10 |
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