TWI829685B - 具有自定心特徵的兩件式快門盤組件 - Google Patents
具有自定心特徵的兩件式快門盤組件 Download PDFInfo
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Abstract
此處提供使用於處理腔室中的兩件式快門盤組件。在一些實施例中,使用於處理腔室中的快門盤組件包含:上盤構件,該上盤構件具有頂部表面及底部表面,其中在底部表面的中心中形成中心對齊凹部;及下載具構件,該下載具構件具有:固體基底,該固體基底具有上支撐表面,其中上支撐表面包含第一中心自定心特徵,該第一中心自定心特徵設置於在底部表面的中心中形成的凹部中;及環狀外對齊特徵,該環狀外對齊特徵自下載具的頂部表面向上突出且形成口袋部,其中上盤構件設置於口袋部中。
Description
本揭示案的實施例一般相關於基板處理腔室的領域。
在有能力於受控制處理環境中處理基板(例如,半導體晶圓)的一個或更多個處理腔室中常執行傳統半導體元件形成。為了維持處理均勻性且確保處理腔室的最佳效能,週期性地執行多種調理操作。例如,在物理氣相沉積(PVD)處理腔室中,一個常使用的調理操作為「預燒(burn-in)」處理,其中設置於PVD處理腔室中的目標被電漿離子轟擊以在執行基板處理之前自目標移除氧化物或其他污染。另一常使用的調理操作為「黏合」處理,其中在沉積於處理腔室表面上的材料上應用塗佈以防止後續處理期間材料自處理腔室表面剝離及污染基板。另一操作為「預清理」操作。在預清理腔室中使用預清理處理原地移除有機殘留物及原生氧化物確保了促進低接觸阻抗及優秀附著性的清理表面。
在所有前述調理/預清理操作中,可經由在處理腔室中設置的基板支撐頂部上的傳送機械手來放置快門盤,以防止任何材料沉積於基板支撐上。快門盤典型地包括一材料,該材料具有機械剛性,足以對抗導因於所沉積材料的額外重量的變形。例如,快門盤常包括金屬合金,例如不鏽鋼,或陶瓷,例如碳化矽。
然而,發明人已觀察到:在調理及預清理處理期間,快門盤升溫。由於熱梯度及/或盤上的沉積,快門盤可發展出來自快門盤頂部及底部表面之間熱不匹配的應力,例如,造成快門盤變形(例如,末端處向上彎曲)。此翹曲/變形產生空隙,導致電漿經由該空隙曝露至基板支撐。基板支撐上的金屬沉積可導致基板晶圓電弧、基板晶圓黏附及/或斷裂、靜電夾力減低(若基板支撐為靜電夾具)等。
此外,快門盤通常存放在處理區域之外,且在使用期間由緩衝腔室機械手移動進入所需位置。為了使機械手能夠處理盤,必須最小化快門盤的重量及厚度。此等較輕重量/較低厚度的快門盤在黏合及預燒處理期間變形較多。
已嘗試了多種解決方案來解決上述問題。例如,已嘗試使用較低的RF功率、較長的冷卻週期,及向快門盤的背側添加冷卻氣體。然而,發明人已觀察到:此等解決方案中沒有一種足以保護基板支撐免於所不欲的材料沉積。
據此,此處提供改良的兩件式快門盤組件。
此處提供使用於處理腔室中的兩件式快門盤組件。在一些實施例中,使用於處理腔室中的快門盤組件包含:上盤構件,該上盤構件具有頂部表面及底部表面,其中在底部表面的中心中形成中心對齊凹部;及下載具構件,該下載具構件具有:固體基底,該固體基底具有上支撐表面,其中上支撐表面包含第一中心自定心特徵,該第一中心自定心特徵設置於在底部表面的中心中形成的凹部中;及環狀外對齊特徵,該環狀外對齊特徵自下載具的頂部表面向上突出且形成口袋部,其中上盤構件設置於口袋部中。
在一些實施例中,處理腔室包含:腔室主體,該腔室主體界定具有目標的內容積,該目標包括待噴濺的材料;基板支撐,該基板支撐設置於腔室主體內,以支撐基板;使用於處理腔室中的快門盤組件,包括:上盤構件,該上盤構件具有頂部表面及底部表面,其中在底部表面的中心中形成中心對齊凹部;及下載具構件,該下載具構件具有:固體基底,該固體基底具有上支撐表面,其中上支撐表面包含第一中心自定心特徵,該第一中心自定心特徵設置於在上盤構件的底部表面的中心中形成的凹部中;及外環狀對齊特徵,該外環狀對齊特徵自下載具的頂部表面向上突出且形成口袋部,其中上盤構件設置於口袋部中;及傳送機械手,該傳送機械手可移動地耦合至腔室主體,以傳送快門盤組件至基板支撐或自基板支撐傳送快門盤組件。
在一些實施例中,使用於處理腔室中的快門盤組件以保護設置於快門盤組件下方的基板支撐,該快門盤組件包含:上盤構件,該上盤構件具有頂部表面及底部表面,其中在底部表面的中心中形成中心對齊凹部;及下載具構件,該下載具構件具有:固體基底,該固體基底具有上支撐表面,其中上支撐表面包含第一中心自定心特徵,該第一中心自定心特徵設置於在上盤構件的底部表面的中心中形成的凹部中;及外環狀對齊特徵,該外環狀對齊特徵自下載具的頂部表面向上突出且形成口袋部,其中上盤構件設置於口袋部中;其中上盤構件為經配置以使用於黏合處理的處理腔室目標;及其中下載具構件以及外環狀對齊特徵形成繞著上盤構件目標的電性絕緣障礙,經配置以防止黏合處理期間的電弧。
下方更詳細揭露本揭示案的其他實施例及變化。
本揭示案的實施例一般相關於在基板處理腔室中使用的快門盤組件,如,例如半導體製造處理腔室,及相關於併入該等快門盤組件的基板處理腔室。在一些實施例中,發明的設備包含使用於處理腔室的調理及預清理操作的快門盤組件。發明的設備可優勢地提供快門盤組件,在使用期間管理由於加熱引起的盤膨脹,減少或消除了設置有快門盤組件的基板支撐的曝露,因而保護設置於快門盤組件下方的基板支撐免於所不欲的材料沉積。
圖1為使用以連接本揭示案的一些實施例的示範性處理腔室100的示意圖。在一些實施例中,處理腔室100可為組合以形成多腔室處理系統(例如,群集工具)的複數個腔室中之一者。或者,處理腔室100可為獨立運作的處理腔室。在一些實施例中,處理腔室100可為沉積腔室,例如,物理氣相沉積(PVD)腔室。或者,處理腔室100可為任何合適的處理腔室,其中可使用快門盤組件以保護基板支撐免於腔室清理及/或陳化處理期間的損壞。
處理腔室100包含腔室主體102及界定可排空處理容積106的蓋組件104。腔室主體102一般包含一個或更多個側壁108及底部110。一個或更多個側壁108可為單一圓形側壁或在具有非圓形配置的處理腔室中為多個側壁。側壁一般含有快門盤組件埠112。在一些實施例中,位於處理腔室100外部的快門存放區113可儲存快門盤組件140且移動快門盤組件140經由處理腔室100中的快門盤組件埠112進入處理腔室100。外殼116一般覆蓋快門盤組件埠112以維持處理容積106內的真空的完整性。可在側壁中提供額外的埠,例如可密封存取埠,以提供基板自處理腔室100的入口及出口。可在側壁及/或腔室主體102的底部中提供抽吸埠,且該抽吸埠耦合至抽吸系統以排空及控制處理容積106內的壓力。
腔室主體102的蓋組件104一般支撐環狀屏蔽118,環狀屏蔽118支撐遮蔽環120。遮蔽環120一般經配置以侷限沉積至基板114經由遮蔽環120的中心曝露的部分。蓋組件104一般包括目標122及磁控管124。
目標122提供沉積處理期間沉積於基板114上的材料,同時磁控管124增強處理期間目標材料的均勻消耗。目標122及基板支撐126相對於彼此藉由功率來源128來偏壓。自氣體來源130供應惰性氣體(例如,氬)至處理容積106。在基板114及目標122之間自氣體形成電漿。電漿內的離子被加速朝向目標122且造成材料變得自目標122去除。去除的目標材料被吸引朝向基板114且沉積材料的薄膜於基板114上。
基板支撐126一般設置於腔室主體102的底部110上且在處理期間支撐基板114。快門盤組件機構132一般設置接近基板支撐126。快門盤組件機構132一般包含支撐快門盤組件140的機械手快門臂134,及藉由軸件138耦合至機械手快門臂134的致動器136,以控制機械手快門臂134的位置。機械手快門臂134可在收縮(或圖1中所展示的空出位置)及第二位置之間移動,該第二位置將快門盤組件140直接放置在基板支撐126上且與基板支撐126實質同心。致動器136可為任何裝置,該裝置可適用以經由一角度旋轉軸件138以在空出及第二位置之間移動機械手快門臂134。
圖2A根據本揭示案的一些實施例描繪示範性快門盤組件140的橫截面側視圖。圖2B為根據本揭示案的一些實施例的圖2A的示範性快門盤組件的頂部視圖。圖2C描繪機械手快門臂134上的示範性快門盤組件的橫截面透視視圖。圖2D描繪快門盤組件140的自定心特徵的橫截面。圖3根據本揭示案的一些實施例描繪示範性下載具構件的橫截面側視圖。為了最佳地理解本揭示案,讀者應同時參考圖2A至圖2D及圖3。
示範性的快門盤組件140一般包括上盤構件202及下載具構件210。雖然此處所述為兩件式組件,快門盤組件可包含額外的部件。此外,雖然此處所述為盤,快門盤組件及其部件可視需求具有任何合適的幾何形狀,以用於保護特定處理腔室內的基板支撐。
下載具構件210及上盤構件202可移動地設置或相對於彼此耦合,使得下載具構件210及上盤構件202可相對於彼此移動,例如,以允許部件獨立的熱膨脹及收縮。在一些實施例中,上盤構件202僅可安置於下載具構件210上。
下載具構件210支撐上盤構件202。在一些實施例中,下載具構件210為固體盤基底,包含支撐表面212以支撐上盤構件202,使得上盤構件202的底部側面206設置於下載具構件210的支撐表面212上。如圖2A、圖2C及圖3中所展示,下載具構件210為固體且沒有通過盤的開口。
載具構件210也可包含第一中心自定心特徵232,以輔助定位上盤構件202且保持上盤構件202一般於原地(例如,以免滑離位置),同時仍允許上盤構件202移動或變形,例如,導因於熱膨脹及收縮。例如,在一些實施例中,第一中心自定心特徵232(也稱為自對齊特徵)可為自載具構件向上延伸的突出部,切合在上盤構件202的底部表面中形成的凹部230。進一步地,第一中心自定心特徵232在載具構件210的底部表面中形成孔穴234。在一些實施例中,圖2D中所展示的對齊插栓250設置於機械手快門臂134中,切合在載具構件210的底部表面中形成的孔穴234,以在機械手快門臂134上自對齊整個快門盤組件140。對齊插栓250可為圓錐形(如所展示),或可具有其他幾何形狀以便於對齊。在一些實施例中,對齊插栓250包含穿過對齊插栓250中心形成的開口252以用於減低重量或減低對齊插栓250移動時的慣性。在一些實施例中,對齊插栓250可被形成為機械手快門臂134的部分,或圖2D中所展示的分開的工件。在一些實施例中,對齊插栓250由與機械手快門臂134相同的材料製成,或可由電性絕緣材料製成,或使用電性絕緣材料塗佈。如圖2A及圖2D中所展示,中心自對齊組件218對齊了上盤構件202、載具構件210及機械手快門臂134,機械手快門臂134在每一對齊特徵之間包含空隙,以允許上盤構件202相對於下載具構件210徑向地移動或變形,及允許下載具構件210相對於機械手快門臂134移動,例如導因於熱膨脹及收縮。
載具構件210也可包含環狀外對齊特徵216,以輔助定位上盤構件202且保持上盤構件202一般於原地(例如,以免滑離位置),同時仍允許上盤構件202移動或變形,例如,導因於熱膨脹及收縮。例如,在一些實施例中,環狀外對齊特徵216可為自下載具構件210的支撐表面向上延伸的突出部或唇部,以形成上盤構件202可設置於其中的口袋部。形成的口袋部的內直徑較上盤構件202的外直徑大,使得上盤構件202及下載具構件210之間形成空隙。空隙允許上盤構件202相對於下載具構件210徑向地移動或變形,例如導因於熱膨脹及收縮。
下載具構件210可包括熱穩定材料以最小化下載具構件210的熱變形。例如,下載具構件210可包括以下至少一者:陶瓷、塗佈石墨的碳化矽、固體碳化矽、固體燒結的碳化矽,或使用無金屬燒結劑製造的固體燒結的碳化矽(例如PUREBETA®,可由Bridgestone取得)等。在一些實施例中,下載具構件210可包括具有約5.6E-6 m/m K至約22.2E-6 m/m K的熱膨脹係數的材料。在一些實施例中,下載具構件210可包括熱傳導材料。在一些實施例中,下載具構件210可包括電性絕緣材料。在上述任何實施例中,可由具有機械剛性的合適材料來建構下載具構件210,該機械剛性足以實質對抗導因於上盤構件202及可在使用期間沉積於上盤構件202頂上的材料的額外重量的變形。在一些實施例中,材料也可為輕量,以便允許快門盤組件140容易被傳送機械手操縱。在一些實施例中,由於下載具構件210及上盤構件202之間的熱變形,可以便於容易移動的方式將彼此接觸的下載具構件210及/或上盤構件202的一個或更多個表面完工。
在一些實施例中,底部表面214(下載具構件210的底部表面)可為實質平面。在其他實施例中,下載具構件210的底部表面214可包括特徵以與快門盤組件機構132的部件交界,以便於穩定及精確的移動。
上盤構件202的頂部表面204一般為平面且具有實質垂直於快門盤組件140的中心線224的定向。底部表面206一般也為平面且具有實質垂直於快門盤組件140的中心線224的定向。
可由具有機械剛性的合適材料來建構上盤構件202,該機械剛性足以實質對抗導因於上盤構件202頂上可沉積的材料的額外重量的變形。在一些實施例中,材料也可為輕量,以便允許快門盤組件140容易被傳送機械手操縱。在一些實施例中,上盤構件202可由以下所建構:金屬合金(例如,不鏽鋼)、金屬複合物(例如,矽化鋁(AlSi)),或陶瓷(例如,碳化矽)。可經由任何適於形成所需形狀的方法來製造上盤構件202,例如鑄模、鑄造、噴灑鑄造、噴灑沉積等。在一些實施例中,上盤構件202包括與用於沉積/蝕刻基板的處理腔室中所使用相同的材料。
在一些實施例中,上盤構件202的上表面204可不為平面,而是可包含嶺部或其他適於處理腔室黏合處理的特徵。
在一些實施例中,上盤構件202可為目標本身,且使用於黏合處理。下載具構件210以及外環狀對齊特徵216形成繞著上盤構件202目標的電性絕緣障礙。此允許將上盤構件202使用作為目標以用於黏合處理,同時防止電弧至基板支撐。
此外,兩件式快門盤組件的其中一個優勢為:防止電弧。因此,快門盤組件140的底部表面(亦即,下載具構件210的底部表面)為絕緣的。在一些實施例中,使用電性絕緣塗佈來塗佈下載具構件210。在其他實施例中,整個下載具構件210係由電性絕緣材料製成。而在其他實施例中,僅使用電性絕緣塗佈來塗佈下載具構件210的底部表面。
在一些實施例中,快門盤組件140具有約6至約12吋的外直徑220,例如約6、8或11.85吋。在一些實施例中,自上盤構件202的頂部表面204至下支撐載具210的底部表面的厚度可為約0.1至約0.25吋,例如約0.15吋。可使用其他大小,取決於基板支撐的配置及大小。在一些實施例中,快門盤組件140具有等於基板114直徑的外直徑220,公差為+/-50mm。在一些實施例中,下支撐載具210的內直徑(ID)(亦即,環狀對齊特徵216的ID)為11.00吋至約11.85吋。在一些實施例中,上盤構件202具有比環狀對齊特徵216的ID小約5吋至約1毫米的直徑。
雖然以直徑的角度來論述且參照一盤,快門盤組件140及上盤構件不限於圓形且可具有適合在處理腔室中使用的任何形狀,如此處所揭露。雖然以直徑的角度來論述且可使用用詞「盤」來描述快門盤組件及其部件,思量快門盤組件及該等部件的形狀不須為圓形且可具有任何形狀的周長及/或開口,包含但不限於長方形、多邊形、橢圓形等。
前述係本揭示案的實施例,可修改本揭示案的其他及進一步的實施例而不遠離其基本範圍,且該範圍由隨後的申請專利範圍所決定。
100‧‧‧處理腔室
102‧‧‧腔室主體
104‧‧‧蓋組件
106‧‧‧處理容積
108‧‧‧側壁
110‧‧‧底部
112‧‧‧快門盤組件埠
113‧‧‧快門存放區
114‧‧‧基板
116‧‧‧外殼
118‧‧‧環狀屏蔽
120‧‧‧遮蔽環
122‧‧‧目標
124‧‧‧磁控管
126‧‧‧基板支撐
128‧‧‧功率來源
130‧‧‧氣體來源
132‧‧‧快門盤組件機構
134‧‧‧機械手快門臂
136‧‧‧致動器
138‧‧‧軸件
140‧‧‧快門盤組件
202‧‧‧上盤構件
204‧‧‧頂部表面
206‧‧‧底部表面
210‧‧‧下載具構件
212‧‧‧支撐表面
214‧‧‧底部表面
216‧‧‧外環狀對齊特徵
218‧‧‧中心自對齊組件
220‧‧‧外直徑
224‧‧‧中心線
230‧‧‧凹部
232‧‧‧第一中心自定心特徵
234‧‧‧孔穴
250‧‧‧對齊插栓
252‧‧‧開口
可藉由參考描繪於所附圖式中的揭示案的圖式性實施例來理解本揭示案的實施例(簡短總結如上且將在下方更詳細論述)。然而,注意所附圖式僅圖示本揭示案典型的實施例,因此不考慮限制其範圍,因為本揭示案可允許其他等效實施例。
圖1為適用以連接本揭示案的一些實施例的示範性處理腔室的示意圖。
圖2A根據本揭示案的一些實施例描繪示範性兩件式快門盤組件的部分橫截面視圖。
圖2B為根據本揭示案的一些實施例的示範性兩件式快門盤組件的頂部視圖。
圖2C根據本揭示案的一些實施例描繪機械手臂機械葉片上的示範性快門盤組件的橫截面透視視圖。
圖2D根據本揭示案的一些實施例描繪快門盤組件的自定心特徵的橫截面。
圖3根據本揭示案的一些實施例描繪示範性下載具構件的橫截面側視圖。
為了便於理解,儘可能使用相同元件符號,以標示圖式中共用的相同元件。圖式未依比例繪製且可針對清晰而簡化。思量一個實施例的元件及特徵可有利地併入其他實施例,而無須進一步敘述。
國內寄存資訊 (請依寄存機構、日期、號碼順序註記)
無
國外寄存資訊 (請依寄存國家、機構、日期、號碼順序註記)
無
140‧‧‧快門盤組件
202‧‧‧上盤構件
204‧‧‧頂部表面
206‧‧‧底部表面
210‧‧‧下載具構件
212‧‧‧支撐表面
214‧‧‧底部表面
216‧‧‧外環狀對齊特徵
218‧‧‧中心自對齊組件
224‧‧‧中心線
230‧‧‧凹部
232‧‧‧第一中心自定心特徵
234‧‧‧孔穴
Claims (18)
- 一種使用於一處理腔室中的快門盤組件,包括:一上盤構件,該上盤構件具有一頂部表面及一底部表面,其中在該底部表面的一中心中形成一第一中心對齊凹部;及一下載具構件,該下載具構件具有:一固體基底,該固體基底具有一上支撐表面,其中該上支撐表面包含一第二中心自定心特徵,其中該第二自定心特徵在該下載具構件的該底部表面中形成一第二凹部,該第二凹部配置成容納一第三自定心特徵,且其中該第二自定心特徵設置在該第一中心對齊凹部中,該第一中心對齊凹部形成於在該上盤構件的該底部表面的該中心中;及一外環狀對齊特徵,該外環狀對齊特徵自該下載具的一頂部表面向上突出且形成一口袋部,其中該上盤構件設置於該口袋部中。
- 如請求項1所述之快門盤組件,其中該下載具構件由電性絕緣材料形成,或使用一電性絕緣塗佈來塗佈。
- 如請求項2所述之快門盤組件,其中該下載具構件的該基底及該外環狀對齊特徵形成繞著該上盤 構件的一電性絕緣障礙。
- 如請求項1所述之快門盤組件,其中該下載具構件及該上盤構件相對於彼此可移動地設置或耦合。
- 如請求項1所述之快門盤組件,其中該下載具構件及該上盤構件經配置以相對於彼此獨立地熱膨脹及收縮。
- 如請求項1所述之快門盤組件,其中該上盤構件由該下載具構件的該固體基底的該上支撐表面來支撐。
- 如請求項1至6之任一項所述之快門盤組件,其中該下載具構件沒有通過該下載具構件的開口。
- 如請求項1至6之任一項所述之快門盤組件,其中該下載具構件包括一熱穩定材料,以最小化該下載具構件的熱變形。
- 如請求項1至6之任一項所述之快門盤組件,其中該下載具構件包括以下至少一者:陶瓷、塗佈石墨的碳化矽、固體碳化矽、固體燒結的碳化矽,或使用無金屬燒結劑製造的固體燒結的碳化矽。
- 如請求項1至6之任一項所述之快門盤組件,其中該下載具構件包括具有約5.6E-6m/m K至約22.2E-6m/m K的一熱膨脹係數的一材料。
- 如請求項1至6之任一項所述之快門盤組件,其中該上盤構件由以下至少一者所建構:一金屬合金、一金屬複合物,或一陶瓷。
- 如請求項1至6之任一項所述之快門盤組件,其中該上盤構件為經配置以使用於黏合處理的一處理腔室目標。
- 如請求項1所述之快門盤組件,其中該上盤構件具有比該環狀對齊特徵的一內直徑(ID)小約5吋至約1毫米的一直徑。
- 如請求項1至6之任一項所述之快門盤組件,其中該快門盤組件具有約6至約12吋的一外直徑,其中該上盤構件的該頂部表面至該下支撐載具的該底部表面的一厚度為約0.1至約0.25吋。
- 如請求項1至6之任一項所述之快門盤組件,其中該下支撐載具的該環狀對齊特徵的一內直徑(ID)為約11.00吋至約11.85吋。
- 一種處理腔室,包括:一腔室主體,該腔室主體界定具有一目標的一內容積,該目標包括待噴濺的材料;一基板支撐,該基板支撐設置於該腔室主體內,以支撐該基板;使用於一處理腔室中的一快門盤組件,包括: 一上盤構件,該上盤構件具有一頂部表面及一底部表面,其中在該底部表面的一中心中形成一第一中心對齊凹部;及一下載具構件,該下載具構件具有:一固體基底,該固體基底具有一上支撐表面,其中該上支撐表面包含一第一中心自定心特徵,其中該第一中心自定心特徵形成一第二凹部,該第二凹部在該下載具構件的該底部表面中且經配置以容納另一自定心特徵,且其中該第一中心自定心特徵設置於在該上盤構件的該底部表面的該中心中形成的該第一中心對齊凹部中;及一外環狀對齊特徵,該外環狀對齊特徵自該下載具的一頂部表面向上突出且形成一口袋部,其中該上盤構件設置於該口袋部中;及一傳送機械手,該傳送機械手可移動地耦合至該腔室主體,以傳送該快門盤組件至該基板支撐或自該基板支撐傳送該快門盤組件。
- 如請求項16所述之處理腔室,其中該傳送機械手包含一機械手快門臂,該機械手快門臂具有一對齊插栓,該對齊插栓設置進入一孔穴,該孔穴形成在該下載具構件的該底部表面中,以在該機械手快門臂上自對齊整個該快門盤組件。
- 一種使用於一處理腔室中的快門盤組件,用以保護設置於該快門盤組件下方的一基板支撐,該快門盤組件包括:一上盤構件,該上盤構件具有一頂部表面及一底部表面,其中在該底部表面的一中心中形成一第一中心對齊凹部;及一下載具構件,該下載具構件具有:一固體基底,該固體基底具有一上支撐表面,其中該上支撐表面包含一第二自定心特徵,其中該第二自定心特徵在該下載具構件的該底部表面中形成一第二凹部,該第二凹部經配置以接收一第三自定心特徵,其中該第二自定心特徵設置於在該上盤構件的該底部表面的該中心中形成的該凹部中;及其中該下載具構件包括一外環狀對齊特徵,該外環狀對齊特徵自該下載具的一頂部表面向上突出且形成一口袋部,且其中該上盤構件設置於該口袋部中;其中該上盤構件為經配置以使用於黏合處理的一處理腔室目標;及其中該下載具構件以及該外環狀對齊特徵形成繞著該上盤構件目標的一電性絕緣障礙,經配置以防止黏合處理期間的電弧。
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