WO2014069592A1 - パーフルオロ(ポリ)エーテル基含有シラン化合物 - Google Patents
パーフルオロ(ポリ)エーテル基含有シラン化合物 Download PDFInfo
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- WO2014069592A1 WO2014069592A1 PCT/JP2013/079608 JP2013079608W WO2014069592A1 WO 2014069592 A1 WO2014069592 A1 WO 2014069592A1 JP 2013079608 W JP2013079608 W JP 2013079608W WO 2014069592 A1 WO2014069592 A1 WO 2014069592A1
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- -1 Silane compound Chemical class 0.000 title claims abstract description 187
- 229910000077 silane Inorganic materials 0.000 title claims abstract description 84
- 125000001033 ether group Chemical group 0.000 title claims abstract description 47
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 35
- 125000000962 organic group Chemical group 0.000 claims abstract description 34
- 125000004429 atom Chemical group 0.000 claims abstract description 28
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 26
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 25
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 15
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 3
- 150000001875 compounds Chemical class 0.000 claims description 235
- 239000012756 surface treatment agent Substances 0.000 claims description 84
- 239000000758 substrate Substances 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 32
- 229910052731 fluorine Inorganic materials 0.000 claims description 30
- 239000003795 chemical substances by application Substances 0.000 claims description 25
- 125000005843 halogen group Chemical group 0.000 claims description 23
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 22
- 239000003054 catalyst Substances 0.000 claims description 22
- 239000011737 fluorine Substances 0.000 claims description 22
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 18
- 239000002904 solvent Substances 0.000 claims description 18
- 125000004432 carbon atom Chemical group C* 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 17
- 230000003287 optical effect Effects 0.000 claims description 17
- 229920002545 silicone oil Polymers 0.000 claims description 16
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 15
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 13
- 229910052802 copper Inorganic materials 0.000 claims description 12
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 claims description 10
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 claims description 10
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 229910052727 yttrium Inorganic materials 0.000 claims description 10
- 229910052725 zinc Inorganic materials 0.000 claims description 10
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 claims description 9
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 9
- 230000003373 anti-fouling effect Effects 0.000 claims description 9
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- 238000007740 vapor deposition Methods 0.000 claims description 9
- 125000002947 alkylene group Chemical group 0.000 claims description 8
- 229910052749 magnesium Inorganic materials 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 229910052744 lithium Inorganic materials 0.000 claims description 5
- 229910052708 sodium Inorganic materials 0.000 claims description 5
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 claims description 4
- 239000008188 pellet Substances 0.000 claims description 3
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000000304 alkynyl group Chemical group 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 24
- 239000010702 perfluoropolyether Substances 0.000 description 69
- 239000002335 surface treatment layer Substances 0.000 description 65
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 48
- 239000010408 film Substances 0.000 description 37
- 238000003786 synthesis reaction Methods 0.000 description 36
- 239000000203 mixture Substances 0.000 description 35
- 239000005052 trichlorosilane Substances 0.000 description 33
- 238000006243 chemical reaction Methods 0.000 description 31
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 30
- 239000000463 material Substances 0.000 description 28
- 239000010410 layer Substances 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 22
- 238000000576 coating method Methods 0.000 description 20
- 239000003921 oil Substances 0.000 description 20
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 20
- 150000002430 hydrocarbons Chemical group 0.000 description 15
- 229910052757 nitrogen Inorganic materials 0.000 description 15
- 239000012071 phase Substances 0.000 description 15
- 239000002243 precursor Substances 0.000 description 15
- 238000010992 reflux Methods 0.000 description 14
- 238000012360 testing method Methods 0.000 description 13
- XXZOEDQFGXTEAD-UHFFFAOYSA-N 1,2-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1C(F)(F)F XXZOEDQFGXTEAD-UHFFFAOYSA-N 0.000 description 11
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 11
- 239000005345 chemically strengthened glass Substances 0.000 description 11
- 229960004624 perflexane Drugs 0.000 description 11
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 239000012298 atmosphere Substances 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 238000001771 vacuum deposition Methods 0.000 description 9
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 description 8
- 229940125904 compound 1 Drugs 0.000 description 8
- 229940126214 compound 3 Drugs 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- PYOKUURKVVELLB-UHFFFAOYSA-N trimethyl orthoformate Chemical compound COC(OC)OC PYOKUURKVVELLB-UHFFFAOYSA-N 0.000 description 8
- 239000011701 zinc Substances 0.000 description 8
- DFUYAWQUODQGFF-UHFFFAOYSA-N 1-ethoxy-1,1,2,2,3,3,4,4,4-nonafluorobutane Chemical compound CCOC(F)(F)C(F)(F)C(F)(F)C(F)(F)F DFUYAWQUODQGFF-UHFFFAOYSA-N 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 150000001735 carboxylic acids Chemical class 0.000 description 7
- 238000006460 hydrolysis reaction Methods 0.000 description 7
- 150000004756 silanes Chemical class 0.000 description 7
- 230000003068 static effect Effects 0.000 description 7
- 239000010959 steel Substances 0.000 description 7
- 210000002268 wool Anatomy 0.000 description 7
- KSOCRXJMFBYSFA-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4,5,6,6,6-tridecafluoro-5-(1,1,1,2,3,3,4,4,5,5,6,6,6-tridecafluorohexan-2-yloxy)hexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(C(F)(F)F)OC(F)(C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F KSOCRXJMFBYSFA-UHFFFAOYSA-N 0.000 description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 6
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 6
- 230000007062 hydrolysis Effects 0.000 description 6
- 239000003112 inhibitor Substances 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000008096 xylene Substances 0.000 description 6
- BRWBDEIUJSDQGV-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluoro-6-methoxyhexane Chemical compound COC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F BRWBDEIUJSDQGV-UHFFFAOYSA-N 0.000 description 5
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
- 230000005494 condensation Effects 0.000 description 5
- 229930195733 hydrocarbon Natural products 0.000 description 5
- 125000005647 linker group Chemical group 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 5
- 229920006395 saturated elastomer Polymers 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 description 4
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000002411 adverse Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- DQEUYIQDSMINEY-UHFFFAOYSA-M magnesium;prop-1-ene;bromide Chemical compound [Mg+2].[Br-].[CH2-]C=C DQEUYIQDSMINEY-UHFFFAOYSA-M 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- 239000012074 organic phase Substances 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 description 3
- 125000003601 C2-C6 alkynyl group Chemical group 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 235000011054 acetic acid Nutrition 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- PGISRKZDCUNMRX-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4-nonafluoro-4-(trifluoromethoxy)butane Chemical compound FC(F)(F)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)F PGISRKZDCUNMRX-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 241000282575 Gorilla Species 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- HHLFWLYXYJOTON-UHFFFAOYSA-N glyoxylic acid Chemical compound OC(=O)C=O HHLFWLYXYJOTON-UHFFFAOYSA-N 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 150000002763 monocarboxylic acids Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000008707 rearrangement Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000005341 toughened glass Substances 0.000 description 2
- XNZCXBDQNBUKST-UHFFFAOYSA-N (2-nitrophenyl)methyl propanoate Chemical compound CCC(=O)OCC1=CC=CC=C1[N+]([O-])=O XNZCXBDQNBUKST-UHFFFAOYSA-N 0.000 description 1
- 125000003161 (C1-C6) alkylene group Chemical group 0.000 description 1
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- NOPJRYAFUXTDLX-UHFFFAOYSA-N 1,1,1,2,2,3,3-heptafluoro-3-methoxypropane Chemical compound COC(F)(F)C(F)(F)C(F)(F)F NOPJRYAFUXTDLX-UHFFFAOYSA-N 0.000 description 1
- QIROQPWSJUXOJC-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6-undecafluoro-6-(trifluoromethyl)cyclohexane Chemical compound FC(F)(F)C1(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)F QIROQPWSJUXOJC-UHFFFAOYSA-N 0.000 description 1
- JGYMYUNVVYNXSW-UHFFFAOYSA-N 1,1,2,2,3,4,4-heptafluorocyclopentane Chemical compound FC1C(F)(F)CC(F)(F)C1(F)F JGYMYUNVVYNXSW-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- JDMMZVAKMAONFU-UHFFFAOYSA-N 2-trimethylsilylacetic acid Chemical compound C[Si](C)(C)CC(O)=O JDMMZVAKMAONFU-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- XRHGYUZYPHTUJZ-UHFFFAOYSA-N 4-chlorobenzoic acid Chemical compound OC(=O)C1=CC=C(Cl)C=C1 XRHGYUZYPHTUJZ-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-N Acetoacetic acid Natural products CC(=O)CC(O)=O WDJHALXBUFZDSR-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 125000001313 C5-C10 heteroaryl group Chemical group 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N Caprylic acid Natural products CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- 239000007818 Grignard reagent Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229910007933 Si-M Inorganic materials 0.000 description 1
- 229910008318 Si—M Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- RQVFGTYFBUVGOP-UHFFFAOYSA-N [acetyloxy(dimethyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(C)OC(C)=O RQVFGTYFBUVGOP-UHFFFAOYSA-N 0.000 description 1
- CNOSLBKTVBFPBB-UHFFFAOYSA-N [acetyloxy(diphenyl)silyl] acetate Chemical compound C=1C=CC=CC=1[Si](OC(C)=O)(OC(=O)C)C1=CC=CC=C1 CNOSLBKTVBFPBB-UHFFFAOYSA-N 0.000 description 1
- OPARTXXEFXPWJL-UHFFFAOYSA-N [acetyloxy-bis[(2-methylpropan-2-yl)oxy]silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)(C)C)OC(C)(C)C OPARTXXEFXPWJL-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- KXJLGCBCRCSXQF-UHFFFAOYSA-N [diacetyloxy(ethyl)silyl] acetate Chemical compound CC(=O)O[Si](CC)(OC(C)=O)OC(C)=O KXJLGCBCRCSXQF-UHFFFAOYSA-N 0.000 description 1
- LVAMVZXECCXUGI-UHFFFAOYSA-N acetic acid;thallium Chemical compound [Tl].CC(O)=O LVAMVZXECCXUGI-UHFFFAOYSA-N 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 1
- 239000012346 acetyl chloride Substances 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- 125000005336 allyloxy group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 235000001014 amino acid Nutrition 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- CHIHQLCVLOXUJW-UHFFFAOYSA-N benzoic anhydride Chemical compound C=1C=CC=CC=1C(=O)OC(=O)C1=CC=CC=C1 CHIHQLCVLOXUJW-UHFFFAOYSA-N 0.000 description 1
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 1
- GONOPSZTUGRENK-UHFFFAOYSA-N benzyl(trichloro)silane Chemical compound Cl[Si](Cl)(Cl)CC1=CC=CC=C1 GONOPSZTUGRENK-UHFFFAOYSA-N 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- DVECBJCOGJRVPX-UHFFFAOYSA-N butyryl chloride Chemical compound CCCC(Cl)=O DVECBJCOGJRVPX-UHFFFAOYSA-N 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- WOWBFOBYOAGEEA-UHFFFAOYSA-N diafenthiuron Chemical compound CC(C)C1=C(NC(=S)NC(C)(C)C)C(C(C)C)=CC(OC=2C=CC=CC=2)=C1 WOWBFOBYOAGEEA-UHFFFAOYSA-N 0.000 description 1
- 229960005215 dichloroacetic acid Drugs 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000000313 electron-beam-induced deposition Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000004795 grignard reagents Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 150000004715 keto acids Chemical class 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012567 medical material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- XZWYZXLIPXDOLR-UHFFFAOYSA-N metformin Chemical compound CN(C)C(=N)NC(N)=N XZWYZXLIPXDOLR-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N n-hexanoic acid Natural products CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000006551 perfluoro alkylene group Chemical group 0.000 description 1
- LOQGSOTUHASIHI-UHFFFAOYSA-N perfluoro-1,3-dimethylcyclohexane Chemical compound FC(F)(F)C1(F)C(F)(F)C(F)(F)C(F)(F)C(F)(C(F)(F)F)C1(F)F LOQGSOTUHASIHI-UHFFFAOYSA-N 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920003216 poly(methylphenylsiloxane) Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- ZMKCPQNROFSGKH-UHFFFAOYSA-J silicon(4+);tetrabenzoate Chemical compound [Si+4].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 ZMKCPQNROFSGKH-UHFFFAOYSA-J 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- ANELUDATZNYOPH-UHFFFAOYSA-N triethylsilyl propanoate Chemical compound CCC(=O)O[Si](CC)(CC)CC ANELUDATZNYOPH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- VIYXXANHGYSBLY-UHFFFAOYSA-N trimethylsilyl 2,2,2-trifluoroacetate Chemical compound C[Si](C)(C)OC(=O)C(F)(F)F VIYXXANHGYSBLY-UHFFFAOYSA-N 0.000 description 1
- QHUNJMXHQHHWQP-UHFFFAOYSA-N trimethylsilyl acetate Chemical compound CC(=O)O[Si](C)(C)C QHUNJMXHQHHWQP-UHFFFAOYSA-N 0.000 description 1
- VFFKJOXNCSJSAQ-UHFFFAOYSA-N trimethylsilyl benzoate Chemical compound C[Si](C)(C)OC(=O)C1=CC=CC=C1 VFFKJOXNCSJSAQ-UHFFFAOYSA-N 0.000 description 1
- KBPSATXXRVXAAJ-UHFFFAOYSA-N trimethylsilyl formate Chemical compound C[Si](C)(C)OC=O KBPSATXXRVXAAJ-UHFFFAOYSA-N 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1606—Antifouling paints; Underwater paints characterised by the anti-fouling agent
- C09D5/1612—Non-macromolecular compounds
- C09D5/1625—Non-macromolecular compounds organic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/0825—Preparations of compounds not comprising Si-Si or Si-cyano linkages
- C07F7/0827—Syntheses with formation of a Si-C bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/122—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/188—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-O linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
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- C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
- C09D171/02—Polyalkylene oxides
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1687—Use of special additives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/754—Self-cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2383/00—Polysiloxanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
- B32B27/283—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polysiloxanes
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1606—Antifouling paints; Underwater paints characterised by the anti-fouling agent
- C09D5/1637—Macromolecular compounds
- C09D5/165—Macromolecular compounds containing hydrolysable groups
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1656—Antifouling paints; Underwater paints characterised by the film-forming substance
- C09D5/1662—Synthetic film-forming substance
- C09D5/1675—Polyorganosiloxane-containing compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Definitions
- the present invention relates to a perfluoro (poly) ether group-containing silane compound.
- the present invention also relates to a method for producing such a perfluoro (poly) ether group-containing silane compound, a surface treatment agent containing the same, and the like.
- fluorine-containing silane compounds can provide excellent water repellency, oil repellency, antifouling properties and the like when used for surface treatment of a substrate.
- a layer obtained from a surface treatment agent containing a fluorine-containing silane compound (hereinafter also referred to as “surface treatment layer”) is applied as a so-called functional thin film to various substrates such as glass, plastic, fiber, and building materials. ing.
- Patent Document 1 describes a fluorine-containing silane compound in which a molecular main chain having a perfluoropolyether group and a Si atom having a hydrolyzable group are linked via a linker part containing a siloxane bond. ing.
- Patent Document 2 has an amide at the end of a molecular main chain having a perfluoropolyether group, and two Si atoms having a hydrolyzable group via a linker at the N atom of the amide. Bound fluorine-containing silane compounds are described. Further, Patent Document 3 describes a fluorine-containing silane compound having a Si atom having a plurality of hydrolyzable groups at the end of a molecular main chain having a perfluoropolyether group.
- the surface treatment layer is required to have high durability so as to provide a desired function to the base material over a long period of time. Since the layer obtained from the surface treatment agent containing a perfluoropolyether group-containing silane compound can exhibit the above-described functions even in a thin film, it is suitable for optical members such as glasses and touch panels that require optical transparency or transparency. In particular, these applications are required to further improve the friction durability.
- the layer obtained from the surface treatment agent containing the conventional perfluoropolyether group-containing silane compound as described above is no longer necessarily sufficient to meet the increasing demand for improved friction durability.
- An object of the present invention is to provide a novel perfluoro (poly) ether group-containing silane compound capable of forming a layer having water repellency, oil repellency and antifouling properties and high friction durability. And Another object of the present invention is to provide a method for producing such a perfluoro (poly) ether group-containing silane compound, a surface treatment agent containing the same, and the like. Furthermore, an object of the present invention is to provide an intermediate in the production of the perfluoro (poly) ether group-containing silane compound and a method for producing such an intermediate.
- a perfluoro (poly) ether group-containing silane compound has a Si atom at the end of the molecular main chain having a perfluoro (poly) ether group
- a compound in which at least one other Si atom is bonded through a linker, and a hydroxyl group or a hydrolyzable group is bonded to any one of the other Si atoms is water repellency, oil repellency and antifouling
- the formula (1a) or the formula (1b) wherein A represents a C 1-16 alkyl group optionally substituted by one or more fluorine atoms, Rf represents — (OC 4 F 8 ) a — (OC 3 F 6 ) b — (OC 2 F 4 ) c — (OCF 2 ) d —, wherein a, b, c and d are each independently And the sum of a, b, c and d is at least 1, and the order of presence of each repeating unit in parentheses with a, b, c or d is
- X represents a divalent organic group
- Y represents, independently at each occurrence, a hydroxyl group, a hydrolyzable group, or a hydrocarbon group
- Q represents, independently at each occurrence, -Z-SiR 1 n R 2 3-n
- Z represents a divalent organic group independently at each occurrence; provided that Z forms a
- Step (1) Formula (1a-1) or Formula (1b-1): (In the formula, A and Rf are as defined above, and X ′ represents a divalent organic group.) Is reacted with HSiM 3 (wherein M is each independently a halogen atom or a C 1-6 alkoxy group) to give a compound represented by formula (1a-2) or (1b-2 ): (In the formula, A, Rf, X ′ and M are as defined above.) Obtaining a compound represented by: Step (2): a compound represented by the above formula (1a-2) or (1b-2) Formula: Hal—J—Z′—CH ⁇ CH 2 (wherein Z ′ represents a bond or a divalent organic group, J represents Mg, Cu, Pd or Zn, and Hal represents a hal
- R 1 i L ′ (wherein R 1 is as defined above, L ′ represents a group capable of binding to R 1, and i is an integer of 1 to 3).
- X represents a divalent organic group
- Y represents, independently at each occurrence, a hydroxyl group, a hydrolyzable group, or a hydrocarbon group
- Z ′ is a bond or a divalent organic group.
- a compound represented by Formula: Hal—J—Z′—CH ⁇ CH 2 (wherein Z ′ has the same meaning as above, J represents Mg, Cu, Pd or Zn, and Hal represents a halogen atom.)
- a compound represented by formula: Y h L (wherein Y is as defined above, L represents a group capable of bonding to Y, and h is an integer of 1 to 3).
- a method comprising the step of reacting with a compound represented by:
- a surface treating agent containing at least one perfluoro (poly) ether group-containing silane compound represented by the above formula (1a) and / or formula (1b).
- the substrate and the perfluoro (poly) ether group-containing silane compound represented by the above formula (1a) and / or the formula (1b) on the surface of the substrate or the above Articles comprising a layer formed from a surface treatment agent are provided.
- a novel perfluoro (poly) ether group-containing silane compound is provided. Furthermore, the surface treating agent obtained using the perfluoro (poly) ether group containing silane compound of this invention is provided. By using these, it is possible to form a surface treatment layer having water repellency, oil repellency, antifouling properties and excellent friction durability.
- divalent organic group means a divalent group containing carbon. Such a divalent organic group is not particularly limited, and examples thereof include a divalent group obtained by further removing one hydrogen atom from a hydrocarbon group.
- hydrocarbon group means a group containing carbon and hydrogen. Such hydrocarbon group is not particularly limited, but may be a hydrocarbon group having 1 to 20 carbon atoms which may be substituted by one or more substituents, such as an aliphatic hydrocarbon group, An aromatic hydrocarbon group etc. are mentioned.
- the “aliphatic hydrocarbon group” may be linear, branched or cyclic, and may be either saturated or unsaturated.
- the hydrocarbon group may also contain one or more ring structures.
- Such a hydrocarbon group may have one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy and the like at the terminal or molecular chain.
- the substituent of the “hydrocarbon group” is not particularly limited, but includes, for example, a halogen atom; C which may be substituted with one or more halogen atoms, 1-6 alkyl group, C 2-6 alkenyl group, C 2-6 alkynyl group, C 3-10 cycloalkyl group, C 3-10 unsaturated cycloalkyl group, 5-10 membered heterocyclyl group, 5-10 membered An unsaturated heterocyclyl group, a C 6-10 aryl group, a 5- to 10-membered heteroaryl group, and the like.
- a halogen atom C which may be substituted with one or more halogen atoms, 1-6 alkyl group, C 2-6 alkenyl group, C 2-6 alkynyl group, C 3-10 cycloalkyl group, C 3-10 unsaturated cycloalkyl group, 5-10 membered heterocyclyl group, 5-10 membered An unsaturated heterocyclyl group,
- (1a) or (1b) hereinafter referred to as “PFPE-containing silane compound of the present invention”.
- A represents a C 1-16 alkyl group which may be substituted with one or more fluorine atoms.
- A is preferably a C 1-16 alkyl group substituted by one or more fluorine atoms, more preferably a CF 2 H—C 1-15 perfluoroalkylene group, still more preferably A C 1-16 perfluoroalkyl group;
- the C 1-16 perfluoroalkyl group is a straight-chain or branched perfluoroalkyl group having 1 to 16 carbon atoms, preferably a straight-chain or branched chain carbon number of 1 to 6, particularly carbon number.
- 1 to 3 perfluoroalkyl groups more preferably linear perfluoroalkyl groups having 1 to 3 carbon atoms, specifically —CF 3 , —CF 2 CF 3 , or —CF 2 CF 2 CF 3. It is.
- Rf represents — (OC 4 F 8 ) a — (OC 3 F 6 ) b — (OC 2 F 4 ) c — (OCF 2 ) d —
- a, b, c and d are each independently an integer of 0 or 1 and are not particularly limited as long as the sum of a, b, c and d is at least 1.
- a, b, c and d are each independently an integer of 0 to 200, for example, an integer of 1 to 200, more preferably an integer of 0 to 100, for example, 1 An integer of 100 or less.
- the sum of a, b, c and d is 10 or more, preferably 20 or more, and 200 or less, preferably 100 or less. Further, the order of presence of each repeating unit with a, b, c, or d attached in parentheses is arbitrary in the formula.
- — (OC 4 F 8 ) — represents — (OCF 2 CF 2 CF 2 CF 2 ) —, — (OCF (CF 3 ) CF 2 CF 2 ) —, — (OCF 2 CF (CF 3 ) CF 2 )-,-(OCF 2 CF 2 CF (CF 3 ))-,-(OC (CF 3 ) 2 CF 2 )-,-(OCF 2 C (CF 3 ) 2 )-,-(OCF (CF 3 ) CF (CF 3 ))-,-(OCF (C 2 F 5 ) CF 2 )-and-(OCF 2 CF (C 2 F 5 ))-may be used, but preferably — (OCF 2 CF 2 CF 2 CF 2 ) —.
- -(OC 3 F 6 )- is any of-(OCF 2 CF 2 CF 2 )-,-(OCF (CF 3 ) CF 2 )-and-(OCF 2 CF (CF 3 ))- Preferably, it is — (OCF 2 CF 2 CF 2 ) —.
- — (OC 2 F 4 ) — may be any of — (OCF 2 CF 2 ) — and — (OCF (CF 3 )) —, preferably — (OCF 2 CF 2 ) —. is there.
- Rf is — (OC 3 F 6 ) b — (wherein b is an integer of 1 to 200, preferably 10 to 100), preferably — (OCF 2 CF 2 CF 2 ) b — (wherein b is as defined above).
- Rf is — (OC 4 F 8 ) a — (OC 3 F 6 ) b — (OC 2 F 4 ) c — (OCF 2 ) d — (wherein a and b are each independently And an integer of 0 or more and 30 or less, preferably 0 or more and 10 or less, and c and d are each independently an integer of 1 or more and 200 or less, preferably 10 or more and 100 or less. The sum of c and d is not less than 10, preferably not less than 20, and not more than 200, preferably not more than 100.
- Presence order of each repeating unit with subscript a, b, c or d and enclosed in parentheses Is optional in the formula), preferably — (OCF 2 CF 2 CF 2 CF 2 ) a — (OCF 2 CF 2 CF 2 ) b — (OCF 2 CF 2 ) c — (OCF 2 ) d -(Where a, b, c Fine d is a is) as defined above.
- X represents a divalent organic group.
- the X group is a perfluoropolyether part (A-Rf-part or -Rf-part) that mainly provides water repellency and surface slipperiness in the compounds represented by formula (1a) and formula (1b); It is understood as a linker that links a silane part (-SiQ k Y 3-k part) that hydrolyzes and provides a binding ability to a substrate. Therefore, the X group may be any divalent organic group as long as the compound represented by the formula (1a) and the formula (1b) can exist stably.
- Examples of X are not particularly limited.
- X 1 represents-(X 2 ) r- X 2 is independently at each occurrence —O—, —S—, o—, m- or p-phenylene, —C (O) O—, —CONR 5 —, —O—CONR 5.
- v represents a group, Each occurrence of R 3 independently represents a phenyl group or a C 1-6 alkyl group, preferably a C 1-6 alkyl group, more preferably a methyl group; Each occurrence of R 5 independently represents a hydrogen atom, a phenyl group or a C 1-6 alkyl group (preferably a methyl group); m is each independently an integer of 1 to 100, preferably an integer of 1 to 20, at each occurrence; v is independently an integer of 1 to 20, preferably an integer of 1 to 6, more preferably an integer of 1 to 3, at each occurrence.
- s is an integer of 1 to 20, preferably an integer of 1 to 6, more preferably an integer of 1 to 3, even more preferably 1 or 2
- t is an integer of 1 to 20, preferably an integer of 2 to 6, more preferably an integer of 2 to 3
- r is an integer of 1 to 10, preferably an integer of 1 to 5, more preferably an integer of 1 to 3
- p is 0 or 1
- q is 0 or 1.
- X is A C 1-20 alkylene group, -R 6 -X 3 -R 7 -, or -X 4 -R 7 - [Wherein, R 6 and R 7 are as defined above. ] It can be.
- the X is A C 1-20 alkylene group, — (CH 2 ) s —X 3 — (CH 2 ) t —, or —X 4 — (CH 2 ) t — [Wherein, s and t are as defined above. ] It is.
- X 3 is -O-, -S-, -C (O) O-, -CONR 5- , -O-CONR 5- , -Si (R 3 ) 2- , -(Si (R 3 ) 2 O) m -Si (R 3 ) 2- , —O— (CH 2 ) u — (Si (R 3 ) 2 O) m —Si (R 3 ) 2 —, —CONR 5 — (CH 2 ) u — (Si (R 3 ) 2 O) m —Si (R 3 ) 2 —, —CONR 5 — (CH 2 ) v —N (R 5 ) —, or —CONR 5 — (o-, m- or p-phenylene) -Si (R 3 ) 2 — [Wherein R 3 , R 5 , m and v are as defined above, u is an integer of 1 to 20,
- X 4 is -S-, -C (O) O-, -CONR 5- , —CONR 5 — (CH 2 ) u — (Si (R 3 ) 2 O) m —Si (R 3 ) 2 —, —CONR 5 — (CH 2 ) v —N (R 5 ) —, or —CONR 5 — (o-, m- or p-phenylene) -Si (R 3 ) 2 — Represents.
- the X is A C 1-20 alkylene group, — (CH 2 ) s —X 3 — (CH 2 ) t —, or —X 4 — (CH 2 ) t — [Wherein each symbol is as defined above. ] It can be.
- said X is A C 1-20 alkylene group, -(CH 2 ) s -O- (CH 2 ) t- , — (CH 2 ) s — (Si (R 3 ) 2 O) m —Si (R 3 ) 2 — (CH 2 ) t —, or — (CH 2 ) s —O— (CH 2 ) u — (Si (R 3 ) 2 O) m —Si (R 3 ) 2 — (CH 2 ) t —, [Wherein each symbol is as defined above. ] It is.
- the X group is substituted with one or more substituents selected from a fluorine atom, a C 1-3 alkyl group, and a C 1-3 fluoroalkyl group (preferably a C 1-3 perfluoroalkyl group). It may be.
- X include, for example: —CH 2 O (CH 2 ) 2 —, —CH 2 O (CH 2 ) 3 —, —CH 2 O (CH 2 ) 6 —, —CH 2 O (CH 2 ) 3 Si (CH 3 ) 2 OSi (CH 3 ) 2 (CH 2 ) 2 —, -CH 2 O (CH 2) 3 Si (CH 3) 2 OSi (CH 3) 2 OSi (CH 3) 2 (CH 2) 2 -, -CH 2 O (CH 2 ) 3 Si (CH 3 ) 2 O (Si (CH 3 ) 2 O) 2 Si (CH 3 ) 2 (CH 2 ) 2- , —CH 2 O (CH 2 ) 3 Si (CH 3 ) 2 O (Si (CH 3 ) 2 O) 3 Si (CH 3 ) 2 (CH 2 ) 2 —, —CH 2 O (CH 2 ) 3 Si (CH 3 ) 2 O (Si (CH 3 ) 2 O) 3 Si (CH 3 ) 2 (CH 2
- X group examples include the following groups: [Wherein D is —CH 2 O (CH 2 ) 2 —, —CH 2 O (CH 2 ) 3 —, —CF 2 O (CH 2 ) 3 —, -(CH 2 ) 2- , -(CH 2 ) 3- , - (CH 2) 4 -, -CONH- (CH 2 ) 3- , -CON (CH 3 )-(CH 2 ) 3- , —CON (Ph) — (CH 2 ) 3 — (wherein Ph represents phenyl), and A group selected from E is — (CH 2 ) n — (n is an integer of 2 to 6); D is bonded to A-Rf- of the molecular main chain of formula (1a) and formula (1b), and E is bonded to the Si atom of the molecular main chain of formula (1a) and formula (1b). ]
- any one of T is the following group bonded to A—Rf— of the molecular main chain of the formula (1a) and the formula (1b): —CH 2 O (CH 2 ) 2 —, —CH 2 O (CH 2 ) 3 —, —CF 2 O (CH 2 ) 3 —, -(CH 2 ) 2- , -(CH 2 ) 3- , - (CH 2) 4 -, -CONH- (CH 2 ) 3- , -CON (CH 3 )-(CH 2 ) 3- , —CON (Ph) — (CH 2 ) 3 — (wherein Ph represents phenyl), or And , Another arbitrary one is — (CH 2 ) n — (n is an integer of 2 to 6) bonded to the Si atom of the molecular main chain of formula (1a) and formula (1b), and the rest is Each independently represents a methyl group or a
- Y represents a hydroxyl group, a hydrolyzable group, or a hydrocarbon group.
- the hydroxyl group is not particularly limited, but may be a group produced by hydrolysis of a hydrolyzable group.
- hydrolyzable group as used herein means a group capable of leaving from the main skeleton of a compound by a hydrolysis reaction.
- Such hydrolyzable groups are not particularly limited, but are —OR 4 , —OCOR 4 , —O—N ⁇ C (R 4 ) 2 , —N (R 4 ) 2 , —NHR 4 , Halogen atoms (wherein R 4 independently represents a substituted or unsubstituted C 1-3 alkyl group at each occurrence).
- Y is preferably a hydroxyl group, —O (R 5 ) (wherein R 5 represents a C 1-12 alkyl group, preferably a C 1-6 alkyl group, more preferably a C 1-3 alkyl group).
- R 5 represents a C 1-12 alkyl group, preferably a C 1-6 alkyl group, more preferably a C 1-3 alkyl group.
- a C 1-12 alkyl group, a C 2-12 alkenyl group, a C 2-12 alkynyl group, or a phenyl group, and more preferably —OCH 3 , —OCH 2 CH 3 , —OCH (CH 3 ) 2 is there.
- These groups may be substituted with, for example, one or more substituents selected from a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. .
- Q represents —Z—SiR 1 n R 2 3-n .
- Z represents a divalent organic group independently at each occurrence.
- the above Z preferably does not include those that form a siloxane bond with the Si atom at the end of the molecular main chain in formula (1a) or formula (1b).
- Z is preferably a C 1-6 alkylene group, — (CH 2 ) s ′ —O— (CH 2 ) t ′ — (wherein s ′ is an integer of 1 to 6, and t ′ is Or an integer of 1 to 6) or -phenylene- (CH 2 ) u ' -(wherein u' is an integer of 0 to 6), more preferably a C 1-3 alkylene group. is there.
- These groups may be substituted with, for example, one or more substituents selected from a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. .
- R 1 represents a hydroxyl group or a hydrolyzable group independently at each occurrence.
- R 1 is —OR 6 (wherein R 6 represents a substituted or unsubstituted C 1-3 alkyl group, more preferably a methyl group).
- R 2 represents, independently at each occurrence, a C 1-22 alkyl group or Q ′.
- N is an integer independently selected from 0 to 3 in each Q and Q ', and the total sum of n is 1 or more.
- Si in Q or Q ′ does not have a hydroxyl group or a hydrolyzable group. Therefore, the total sum of n must be at least 1 or more.
- n is preferably 2, more preferably 3. is there.
- R 2 in Q When at least one of R 2 in Q is Q ′, there are two or more Si atoms linked in a straight chain via a Z group in Q.
- the maximum number of Si atoms connected in a straight chain via the Z group is five. Note that “the number of Si atoms linearly linked via a Z group in Q” is equal to the number of repeating —Z—Si— linearly linked in Q.
- Si atoms are linked via a Z group in Q is shown below.
- * means a site bonded to Si of the main chain, and ... means that a predetermined group other than ZSi is bonded, that is, all three bonds of Si atoms are ... In this case, it means the end point of ZSi repetition.
- the number on the right shoulder of Si means the number of appearances of Si connected in a straight line through the Z group counted from *. That is, the chain in which ZSi repetition is completed in Si 2 has “the number of Si atoms linearly linked via the Z group in Q” being two, and similarly, Si 3 , Si 4 and The chain in which the ZSi repeat is completed in Si 5 has “number of Si atoms connected in a straight chain via the Z group in Q” being 3, 4 and 5, respectively.
- there are a plurality of ZSi chains in Q are not necessarily the same length, and may be of any length.
- the number of Si atoms connected linearly via a Z group in Q is 1 (left formula) or 2 in all chains. (Right type).
- the number of Si atoms connected in a straight chain via a Z group in Q is 1 (that is, only 1 Si atom is present in Q) or 2, preferably 1, It is.
- k is an integer selected from 1 to 3, preferably 2 or more, more preferably 3.
- the PFPE-containing silane compound of the present invention is a compound represented by formula (1a) or (1b), wherein R 2 in Q is a C 1-22 alkyl group.
- the PFPE-containing silane compound of the present invention is a compound represented by the formula (1a) or the formula (1b) in which at least one of R 2 in Q is Q ′.
- the average molecular weight of the A-Rf- moiety is not particularly limited, but is 500 to 30,000, preferably 1,500. 30,000 to 30,000, more preferably 2,000 to 10,000.
- the PFPE-containing silane compound of the present invention represented by the above formula (1a) or (1b) is not particularly limited, but may have an average molecular weight of 5 ⁇ 10 2 to 1 ⁇ 10 5 . Among these ranges, an average molecular weight of 2,000 to 30,000, more preferably 2,500 to 12,000 is preferable from the viewpoint of friction durability.
- “average molecular weight” means number average molecular weight, and “average molecular weight” is a value measured by 19 F-NMR.
- the PFPE-containing silane compound represented by the formula (1a) or the formula (1b) has the following steps: Step (1): Formula (1a-1) or Formula (1b-1): (In the formula, A and Rf are as defined above, and X ′ represents a divalent organic group.) Is reacted with HSiM 3 (wherein M is each independently a halogen atom or a C 1-6 alkoxy group) to give a compound represented by formula (1a-2) or (1b-2 ): (In the formula, A, Rf, X ′ and M are as defined above.) Obtaining a compound represented by: Step (2): a compound represented by the above formula (1a-2) or (1b-2) Formula: Hal—J—Z′—CH ⁇ CH 2 (wherein Z ′ represents a bond or a divalent linker group, J represents Mg, Cu, Pd or Zn, and Hal represents a halogen atom).
- step (2) may be replaced with the following step (2 ′).
- Step (2 ′) The compound represented by the above formula (1a-2) or formula (1b-2) Formula: G—Z′—CH ⁇ CH 2 (wherein Z ′ represents a bond or a divalent organic group, and G represents Li, Na, or K) And optionally, the formula: Y h L (wherein Y is as defined in claim 1, L represents a group capable of binding to Y, and h represents 1 to 3) (It is an integer.) Is reacted with a compound represented by formula (1a-3) or formula (1b-3): (In the formula, A, Rf, X ′, Y and Z ′ are as defined above, and k ′ is an integer of 1 to 3) Obtaining a compound represented by: and
- step (1) formula (1a-1) or formula (1b-1): A compound represented by formula (1a-2) or formula (1b-2) is reacted with HSiM 3 : To obtain a compound represented by:
- X ′ represents a divalent organic group.
- X′—CH 2 CH 2 — corresponds to X in the above formulas (1a) and (1b).
- the compound represented by the formula (1a-1) or the formula (1b-1) is commercially available, or can be produced from a commercially available compound using a conventional technique in the technical field.
- each M is independently a halogen atom (for example, I, Br, Cl, F, etc.) or a C 1-6 alkoxy group, preferably a halogen atom. More preferably, it is Cl.
- the compound is commercially available or can be prepared from commercially available compounds using conventional techniques in the art.
- the amount of HSiM 3 is the terminal —CH ⁇ CH 2 group of the compound represented by the formula (1a-1) and / or the formula (1b-1) (the total when two or more compounds are used, The same applies to the following) It is preferably 1 mol or more per 1 mol.
- the reaction in step (1) is preferably performed in a suitable solvent in the presence of a suitable catalyst.
- Suitable catalysts are not particularly limited, and examples thereof include Pt, Pd, and Rh.
- Such a catalyst may be in any form, for example in the form of a complex.
- the suitable solvent is not particularly limited as long as it does not adversely affect the reaction.
- 1,3-bis (trifluoromethyl) benzene, perfluorobutyl ethyl ether, perfluorohexyl methyl ether, etc. Is mentioned.
- the reaction temperature in such a reaction is not particularly limited, but is usually 0 to 100 ° C., preferably 50 to 80 ° C., and the reaction time is not particularly limited, but is usually 60 to 600 minutes, preferably 120 to 240 minutes.
- the reaction pressure is not particularly limited, but is ⁇ 0.2 to 1 MPa (gauge pressure), and is simply a normal pressure.
- step (2) the compound represented by the formula (1a-2) or the formula (1b-2) obtained in the above step (1) is obtained.
- Hal-J-Z'-CH CH 2
- Hal represents a halogen atom (e.g., I, Br, Cl, F, etc.)
- J is, Mg, Cu
- Pd or Zn Z ′ represents a bond or a divalent organic group.
- the “divalent organic group” has the same meaning as the “divalent organic group” in Z in the above formulas (1a) and (1b).
- the Z′—CH 2 CH 2 — group corresponds to Z in the above formulas (1a) and (1b).
- the compound represented by the formula: Hal-JZ′—CH ⁇ CH 2 is preferably a compound in which J is Mg.
- This compound is known in the art as a Grignard reagent and is commercially available. Or can be prepared from commercially available compounds using conventional techniques in the art.
- a compound represented by used include, but are not limited to, the formula (1a-2) and / or formula (1b -2) is preferably at least 2 moles, more preferably 2-4 moles per mole of the terminal SiCl 3 group of the compound represented by -2). It will be understood that this amount can vary depending on the amount of the compound represented by Y h L described below.
- Y is as defined in the above formula (1a) and formula (1b), L represents a group capable of binding to Y, and h represents 1 to It is an integer of 3.
- group capable of binding to Y is not particularly limited as long as it can bind to Y and can be eliminated in the above reaction, and examples thereof include a hydrogen atom, lithium, sodium and the like.
- the group capable of bonding to Y may be a group having a plurality of Y groups, for example, ⁇ CH 2 , ⁇ CH.
- the compound represented by Y h L is represented by CH 2 Y 2 , CHY 3 .
- a person skilled in the art can select an appropriate group capable of bonding to Y according to the condition of the compound to be reacted, solvent, temperature and the like.
- the amount used thereof can be changed according to the amount of Y group to be introduced. It can be determined as appropriate.
- a compound represented by the formula: Hal-JZ′—CH ⁇ CH 2 and a compound represented by the formula: Y h L may be reacted at the same time, or one of the compounds may be reacted first. And then reacting the other compound in two steps.
- a person skilled in the art can appropriately select whether to react simultaneously or sequentially from which compound depending on the type of compound to be reacted, the target compound and the like.
- the reaction in the step (2) is preferably performed in a suitable solvent. Moreover, you may carry out in presence of a suitable catalyst.
- the suitable catalyst is not particularly limited, and examples thereof include Zn, Cu, and Fe.
- Such a catalyst may be in any form, for example in the form of a complex.
- the suitable solvent is not particularly limited as long as it does not adversely affect the reaction.
- 1,3-bis (trifluoromethyl) benzene, perfluorobutyl ethyl ether, perfluorohexyl methyl ether, etc. Is mentioned.
- the reaction temperature in such a reaction is not particularly limited, but is usually ⁇ 78 to 150 ° C., preferably ⁇ 20 to 30 ° C., and the reaction time is not particularly limited, but is usually 60 to 720 minutes, preferably 120 to
- the reaction pressure is 240 minutes, and the reaction pressure is not particularly limited, but is ⁇ 0.2 to 1 MPa (gauge pressure), and is simply normal pressure.
- step (2 ′) the compound represented by the above formula (1a-2) or (1b-2) Formula: GZ′—CH ⁇ CH 2 And optionally, the formula: Y h L Is reacted with a compound represented by formula (1a-3) or formula (1b-3): To obtain a compound represented by:
- Z ′ represents a bond or a divalent organic group
- G represents Li, Na, or K.
- the “divalent organic group” has the same meaning as the “divalent organic group” in Z in the above formulas (1a) and (1b).
- the Z′—CH 2 CH 2 — group corresponds to Z in the above formulas (1a) and (1b).
- the amount of the compound represented by GZ′—CH ⁇ CH 2 used in the step (2 ′) is not particularly limited, but the above formula (1a-2) and / or The amount is preferably 2 moles or more, more preferably 2 to 4 moles per mole of the terminal SiCl 3 group of the compound represented by 2). It will be understood that this amount can vary depending on the amount of the compound represented by Y h L described below.
- Y h L has the formula in step (2): are as defined Y h L.
- the amount used can be changed according to the amount of Y group to be introduced, and such amount can be determined by those skilled in the art. Can be determined as appropriate.
- the compound represented by the formula: GZ′—CH ⁇ CH 2 and the compound represented by the formula: Y h L may be reacted at the same time, or one of the compounds may be reacted first. And then reacting the other compound in two steps.
- a person skilled in the art can appropriately select whether to react simultaneously or sequentially from which compound depending on the type of compound to be reacted, the target compound and the like.
- the reaction in the step (2 ′) is preferably performed in an appropriate solvent in the presence of an appropriate catalyst.
- the suitable catalyst is not particularly limited, and examples thereof include Zn, Cu, and Fe.
- Such a catalyst may be in any form, for example in the form of a complex.
- the suitable solvent is not particularly limited as long as it does not adversely affect the reaction.
- 1,3-bis (trifluoromethyl) benzene, perfluorobutyl ethyl ether, perfluorohexyl methyl ether, etc. Is mentioned.
- the reaction temperature in such a reaction is not particularly limited, but is usually ⁇ 78 to 150 ° C., preferably ⁇ 20 to 30 ° C., and the reaction time is not particularly limited, but is usually 60 to 720 minutes, preferably 120 to
- the reaction pressure is 240 minutes, and the reaction pressure is not particularly limited, but is ⁇ 0.2 to 1 MPa (gauge pressure), and is simply normal pressure.
- step (3) the compound represented by formula (1a-3) or formula (1b-3) obtained in step (2) above is converted into HSiM 3 (wherein M is as defined above).
- a halogen atom more preferably Cl
- R 1 i L ′ in the step (3) R 1 has the same meaning as described in the formula (1a) and the formula (1b), and L ′ represents a group capable of binding to R 1.
- I is an integer of 1 to 3.
- R 2 ′ j L ′′ in the above step (3) R 2 ′ represents a C 1-22 alkyl group, L ′′ represents a group capable of binding to R 2 ′, and j is 1 to 3 Is an integer.
- the “group capable of binding to R 1 ” and the “group capable of binding to R 2 ′ ” represented by L ′ and L ′′, respectively, can be bonded to R 1 and R 2 ′ , respectively.
- R 1 and R 2 ′ can be eliminated, and for example, the same as L can be used.
- a person skilled in the art can select an appropriate group capable of binding to R 1 and a group capable of binding to R 2 ′ according to conditions such as the type of the compound to be reacted, solvent, temperature and the like.
- the amount of HSiM 3 used in the step (3) is 1 with respect to 1 mol of the terminal —CH ⁇ CH 2 group of the compound represented by the formula (1a-3) and / or the formula (1b-3). Although it should just be more than a mole, it is preferably 2 moles.
- the amount used can be changed depending on the amount of R 1 group to be introduced, and such an amount can be determined by those skilled in the art. If there is, it can be determined appropriately.
- the amount used can be changed depending on the amount of R 2 group to be introduced, and such amount can be determined by those skilled in the art. If so, it can be determined as appropriate.
- step (3) first, the terminal —CH ⁇ CH 2 group of the compound represented by the above formula (1a-3) and / or the formula (1b-3) and HSiM 3 are reacted to form a terminal Is converted to the —CH 2 CH 2 SiM 3 group.
- k ′ in the formula (1a-2) or the formula (1b-2) is the formula (1a) or the formula (1b ) In k).
- this terminal —CH 2 CH 2 SiM 3 group reacts with a compound represented by R 1 i L ′ and / or a compound represented by R 2 ′ j L ′′, so that M is R 1 or R 2.
- the compound represented by R 1 i L ′ and the compound represented by R 2 ′ j L ′′ may be reacted simultaneously or separately.
- HSiM 3 a compound represented by R 1 i L ′, and a compound represented by R 2 ′ j L ′′ are substituted with HSi (R 1 i ) (R 2 ′ j ) (In this case, i + j is 3)
- the compound represented by HSi (R 1 i ) (R 2 ′ j ) can be used by those skilled in the art. Can be produced using conventional techniques.
- the total amount of the compound represented by R 1 i L ′ and / or the compound represented by R 2 ′ j L ′′ in step (3) is calculated as the above formula (1a-3) and / or Alternatively, the amount is 3 mol or more per mol of the terminal —CH ⁇ CH 2 group of the compound represented by the formula (1b-3) According to such an embodiment, the terminal —CH 2 CH generated in the reaction of the step (3) is used.
- M in 2 SiM 3 can be substantially all substituted by R 1 or R 2 ′, ie, the number of Si atoms connected in a straight chain via a Z group in Q is one.
- a compound represented by formula (1a) or formula (1b) can be obtained.
- the total amount of the compound represented by R 1 i L ′ and / or the compound represented by R 2 ′ j L ′′ in the step (3) is represented by the above formula (1a-3) and / Or terminal of the compound represented by the formula (1b-3): 0 or more and less than 3 moles per mole of CH ⁇ CH 2 group
- the terminal end generated in the reaction of step (3) All or some of M in CH 2 CH 2 SiM 3 can remain without being replaced by R 1 or R 2 ′, and the remaining Si—M part can be used in the same manner as in the above step (2).
- Hal—J—Z′—CH ⁇ CH 2 (wherein Hal represents a halogen atom, J represents Mg, Cu or Zn, and Z ′ represents a bond or a divalent organic group).
- the terminal portion is again —CH Can be CH 2, it is possible to be subjected to the same reaction as in Step (3).
- Z Si atoms can be linked in a tree shape via a group.
- the reaction in the step (3) is preferably performed in an appropriate solvent in the presence of an appropriate catalyst.
- the suitable catalyst is not particularly limited, and examples thereof include Pt, Pd, and Rh.
- Such a catalyst may be in any form, for example in the form of a complex.
- the reaction in steps (1) and (3) is preferably performed in the presence of a suitable dislocation inhibitor.
- Suitable dislocation inhibitors are not particularly limited, and examples thereof include carboxylic acid compounds.
- the carboxylic acid compound may be (a) a carboxylic acid, (b) a carboxylic acid anhydride, (c) a silylated carboxylic acid, and / or (d) the carboxylic acid compound (i.e. (( Substances that produce a), (b) or (c)) may be included. These carboxylic acid compounds may be used alone or in combination of two or more.
- any carboxylic acid having a carboxyl group may be used.
- suitable carboxylic acids include, but are not limited to, saturated carboxylic acids, unsaturated carboxylic acids, monocarboxylic acids, and dicarboxylic acids.
- suitable carboxylic acids include, but are not limited to, saturated monocarboxylic acids such as formic acid, acetic acid, propionic acid, n-butyric acid, isobutyric acid, hexanoic acid, cyclohexane acid, lauric acid, and stearic acid.
- Acids saturated dicarboxylic acids such as oxalic acid and adipic acid; aromatic carboxylic acids such as benzoic acid and p-phthalic acid; these such as chloroacetic acid, dichloroacetic acid, trifluoroacetic acid, p-chlorobenzoic acid, and trimethylsilylacetic acid
- unsaturated fatty acids such as acrylic acid, methacrylic acid, and oleic acid
- Examples of the carboxylic acid anhydride include, but are not limited to, acetic acid anhydride, propionic acid anhydride, and benzoic acid anhydride.
- These carboxylic acid anhydrides may be produced in the reaction system of step (3), and include acetyl chloride, butyryl chloride, benzoyl chloride, and other carboxylic acid halides; carboxylic acids such as zinc acetate and thallium acetate. Metal salts; and carboxylic esters that are decomposed by light or heat, such as (2-nitrobenzyl) propionate.
- silylated carboxylic acids include, but are not limited to, trialkylsilylated carboxylic acids such as trimethylsilylformate, trimethylsilylacetate, triethylsilylpropionate, trimethylsilyl benzoate and trimethylsilyl trifluoroacetate. Acids; and di-, tri-, such as dimethyldiacetoxysilane, diphenyldiacetoxysilane, methyltriacetoxysilane, ethyltriacetoxysilane, vinyltriacetoxysilane, di-t-butoxydiacetoxysilane, and silicon tetrabenzoate -Or tetracarboxysilylate.
- trialkylsilylated carboxylic acids such as trimethylsilylformate, trimethylsilylacetate, triethylsilylpropionate, trimethylsilyl benzoate and trimethylsilyl trifluoroacetate. Acids; and di-, tri
- the dislocation inhibitor is not particularly limited, but is used in an amount of 0.001 to 20% by weight, such as 0.01 to 5% by weight, or 0.01 to 1% by weight.
- a person skilled in the art can appropriately select the amount of the rearrangement inhibitor to be used according to the compound to be reacted, the reagent, the solvent, and other conditions.
- Dislocation inhibitors are commercially available, for example, as DOW CORNING® ETS900 or XIAMETER® OFS-1579® Silane, commercially available from Dow Corning® Corporation (Midland, MI).
- the suitable solvent is not particularly limited as long as it does not adversely affect the reaction.
- 1,3-bis (trifluoromethyl) benzene, perfluorobutyl ethyl ether, perfluorohexyl methyl ether, etc. Is mentioned.
- the reaction temperature in such a reaction is not particularly limited, but is usually 0 to 100 ° C., preferably 50 to 80 ° C., and the reaction time is not particularly limited, but is usually 30 to 600 minutes, preferably 60 to 240 minutes.
- the reaction pressure is not particularly limited, but is ⁇ 0.2 to 1 MPa (gauge pressure), and is simply a normal pressure.
- the present invention provides the formula (1a-3 ′) or the formula (1b-3 ′): Wherein A represents a C 1-16 alkyl group optionally substituted by one or more fluorine atoms, Rf represents — (OC 4 F 8 ) a — (OC 3 F 6 ) b — (OC 2 F 4 ) c — (OCF 2 ) d —, wherein a, b, c and d are each independently And the sum of a, b, c and d is at least 1, and the order of presence of each repeating unit in parentheses with a, b, c or d is
- X represents a divalent organic group
- Y represents a hydroxyl group, a hydrolyzable group, or a hydrocarbon group
- Z ′ is a bond or a divalent organic group.
- the present invention provides a method for producing a compound represented by the above formula (1a-3 ′) or formula (1b-3 ′): Formula (1a-2 ′) or Formula (1b-2 ′): (In the formula, A, Rf, and X are as defined above, and M is a halogen atom or a C 1-6 alkoxy group.)
- a compound represented by Formula: Hal—J—Z′—CH ⁇ CH 2 (wherein Z ′ has the same meaning as above, J represents Mg, Cu, Pd or Zn, and Hal represents a halogen atom.)
- Y h L wherein Y is as defined above, L represents a group capable of binding to Y, and h is an integer of 1 to 3) .
- a method comprising the step of reacting with a compound represented by: This method corresponds to step (2) in the method for producing a PFPE-containing silane compound of the present invention.
- the surface treating agent of the present invention contains at least one perfluoro (poly) ether group-containing silane compound represented by the formula (1a) and / or the formula (1b).
- the surface treatment agent of the present invention can impart water repellency, oil repellency, antifouling property, and friction durability to a substrate, and is not particularly limited, but is suitable as an antifouling coating agent. Can be used.
- the surface treating agent of the present invention contains at least one compound represented by formula (1a) and / or formula (1b) in which k is 3.
- the surface treatment agent of the present invention is represented by the formula (1a) and / or the formula (1b) in which one or two Sis linearly linked through a Z group in Q are Containing at least one compound.
- the surface treating agent of the present invention contains at least one compound represented by formula (1a) and / or formula (1b), wherein A is a C 1-16 perfluoroalkyl group.
- the surface treating agent of the present invention contains at least one compound represented by formula (1a) and / or formula (1b), wherein R 2 in Q is a C 1-22 alkyl group.
- the surface treating agent of the present invention contains two or more perfluoro (poly) ether group-containing silane compounds represented by the formula (1a) and / or the formula (1b).
- the average value of all k of the compound may be 1 or more and 3 or less, for example, 2 or more and 3 or less, but is preferably 3.
- the surface treating agent of the present invention is represented by the formula (1a) and / or the formula (1b), wherein R 2 in Q is a C 1-22 alkyl group and k is 3.
- R 2 in Q is a C 1-22 alkyl group and k is 3.
- a perfluoro (poly) ether group-containing silane compound or a perfluoro (poly) ether group-containing silane compound.
- the perfluoro (poly) ether group-containing silane compound contained in the surface treatment agent of the present invention may be one or more compounds represented by the formula (1a).
- the average value of k is the k value of each PFPE-containing silane compound represented by formula (1a) and formula (1b) contained in the surface treatment agent (the compound represented by formula (1b) Means the average value of having k at the end, ie having 2 k).
- Such an average value can be measured using, for example, Si-NMR. It can also be measured using H-NMR. Such a measurement can be easily performed by those skilled in the art.
- the surface treatment agent may contain other components in addition to the compound represented by the formula (1a) and / or the formula (1b).
- Such other components are not particularly limited.
- fluorine oil perfluoro (poly) ether compounds
- silicone oil silicone oil
- catalysts and the like.
- R 21 represents an alkyl group having 1 to 16 carbon atoms (preferably a perfluoroalkyl group having 1 to 16 carbon atoms) which may be substituted with one or more fluorine atoms
- R 22 Represents an alkyl group having 1 to 16 carbon atoms (preferably a perfluoroalkyl group having 1 to 16 carbon atoms) which may be substituted with one or more fluorine atoms, a fluorine atom or a hydrogen atom
- R 21 and R 22 are more preferably each independently a perfluoroalkyl group having 1 to 3 carbon
- a ′, b ′, c ′ and d ′ each represent the number of four types of repeating units of perfluoro (poly) ether constituting the main skeleton of the polymer, and are each independently an integer of 0 to 300, , A ′, b ′, c ′ and d ′ are at least 1, preferably 1 to 300, more preferably 20 to 300.
- the order of presence of each repeating unit in parentheses with subscripts a ′, b ′, c ′ or d ′ is arbitrary in the formula.
- — (OC 4 F 8 ) — represents — (OCF 2 CF 2 CF 2 CF 2 ) —, — (OCF (CF 3 ) CF 2 CF 2 ) —, — (OCF 2 CF (CF 3 ) CF 2 )-,-(OCF 2 CF 2 CF (CF 3 ))-,-(OC (CF 3 ) 2 CF 2 )-,-(OCF 2 C (CF 3 ) 2 )-,-(OCF (CF 3 ) CF (CF 3 ))-,-(OCF (C 2 F 5 ) CF 2 )-and-(OCF 2 CF (C 2 F 5 ))-may be used, but preferably — (OCF 2 CF 2 CF 2 CF 2 ) —.
- — (OCF 2 CF 2 ) — is preferable.
- — (OC 2 F 4 ) — may be either — (OCF 2 CF 2 ) — or — (OCF (CF 3 )) —, but is preferably — (OCF 2 CF 2 ) —.
- a compound represented by any one of the following general formulas (3a) and (3b) may be used. May be included).
- R 21 and R 22 are as described above; in formula (3a), b ′′ is an integer of 1 to 100; in formula (3b), a ′′ and b ′′ are Each independently represents an integer of 1 to 30, and c ′′ and d ′′ are each independently an integer of 1 to 300.
- the order of existence of each repeating unit with subscripts a ′′, b ′′, c ′′, d ′′ and parentheses is arbitrary in the formula.
- the fluorine-containing oil may have an average molecular weight of 1,000 to 30,000. Thereby, high surface slipperiness can be obtained.
- the fluorine-containing oil is, for example, 0 to 500 with respect to a total of 100 parts by mass of the PFPE-containing silane compound of the present invention. It may be contained in an amount of, preferably 0 to 400 parts by weight, more preferably 25 to 400 parts by weight.
- the compound represented by the general formula (3a) and the compound represented by the general formula (3b) may be used alone or in combination. It is preferable to use the compound represented by the general formula (3b) rather than the compound represented by the general formula (3a) because higher surface slip properties can be obtained.
- the mass ratio of the compound represented by the general formula (3a) and the compound represented by the general formula (3b) is preferably 1: 1 to 1:30, and preferably 1: 1 to 1 : 10 is more preferable. According to such a mass ratio, a surface treatment layer having an excellent balance between surface slipperiness and friction durability can be obtained.
- the fluorine-containing oil contains one or more compounds represented by the general formula (3b).
- the mass ratio of the compound represented by formula (1a) or (1b) and the compound represented by formula (3b) in the surface treatment agent is 4: 1 to 1: 4. Is preferred.
- the surface treating agent of the present invention is represented by the formula (1a) or the formula (1b), wherein Rf is — (OCF 2 CF 2 CF 2 ) b — (b is an integer of 1 to 200). And a compound represented by the formula (3b).
- the surface treating agent of the present invention has an Rf of — (OC 4 F 8 ) a — (OC 3 F 6 ) b — (OC 2 F 4 ) c — (OCF 2 ) d — (formula Wherein a and b are each independently an integer of 0 to 30, preferably 0 to 10, c and d are each independently an integer of 1 to 200, and a, b, c And the sum of d is an integer of 10 to 200.
- the order of presence of each repeating unit in parentheses with the suffix a, b, c, or d is arbitrary in the formula
- a compound represented by the formula (3b) By using such a surface treatment agent to form a surface treatment layer by a wet coating method or a vacuum vapor deposition method, preferably vacuum vapor deposition, it is possible to obtain better friction durability and surface slipperiness.
- the average molecular weight of the compound represented by the formula (3a) is preferably 2,000 to 8,000.
- the average molecular weight of the compound represented by the formula (3b) is preferably 8,000 to 30,000 when the surface treatment layer is formed by a dry coating method such as a vacuum deposition method.
- the surface treatment layer is formed by a wet coating method such as spraying, it is preferably 2,000 to 10,000, particularly 3,000 to 5,000.
- the average molecular weight of the fluorine-containing oil may be larger than the average molecular weight of the compound represented by the formula (1a) or the formula (1b). .
- the average molecular weight of the compound represented by the formula (1a) or the formula (1b) and the fluorine-containing oil more excellent friction durability and surface slipperiness can be obtained.
- the fluorine-containing oil may be a compound represented by the general formula A′-F (wherein A ′ is a C 5-16 perfluoroalkyl group).
- A′-F is preferable in that high affinity is obtained with the compound represented by the above formula (1a) or (1b) in which A is a C 1-16 perfluoroalkyl group.
- Fluorine-containing oil contributes to improving the surface slipperiness of the surface treatment layer.
- the silicone oil for example, a linear or cyclic silicone oil having a siloxane bond of 2,000 or less can be used.
- the linear silicone oil may be so-called straight silicone oil and modified silicone oil.
- the straight silicone oil include dimethyl silicone oil, methylphenyl silicone oil, and methylhydrogen silicone oil.
- modified silicone oil include those obtained by modifying straight silicone oil with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, alcohol and the like.
- Examples of the cyclic silicone oil include cyclic dimethylsiloxane oil.
- the silicone oil is, for example, 0 to 300 with respect to 100 parts by mass in total of the PFPE-containing silane compound of the present invention (in the case of two or more types, these are also the same). It can be contained in parts by weight, preferably 50-200 parts by weight.
- Silicone oil contributes to improving the surface slipperiness of the surface treatment layer.
- the catalyst examples include acids (eg, acetic acid, trifluoroacetic acid, etc.), bases (eg, ammonia, triethylamine, diethylamine, etc.), transition metals (eg, Ti, Ni, Sn, etc.), and the like.
- acids eg, acetic acid, trifluoroacetic acid, etc.
- bases eg, ammonia, triethylamine, diethylamine, etc.
- transition metals eg, Ti, Ni, Sn, etc.
- the catalyst promotes the hydrolysis and dehydration condensation of the PFPE-containing silane compound of the present invention, and promotes the formation of the surface treatment layer.
- Other components include, for example, tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, methyltriacetoxysilane, and the like.
- the surface treatment agent of the present invention can be made into a pellet by impregnating a porous material such as a porous ceramic material or metal fiber such as steel wool hardened in a cotton form.
- the pellet can be used for, for example, vacuum deposition.
- the article of the present invention is formed from a base material and the surface of the base material from a PFPE-containing silane compound or a surface treatment agent of the present invention (hereinafter simply referred to as “the surface treatment agent of the present invention”).
- Layer surface treatment layer
- This article can be manufactured, for example, as follows.
- the substrate that can be used in the present invention is, for example, glass, resin (natural or synthetic resin, for example, a general plastic material, plate, film, or other forms), metal (aluminum, copper It may be a single metal such as iron or a composite such as an alloy), ceramics, semiconductor (silicon, germanium, etc.), fiber (woven fabric, non-woven fabric, etc.), fur, leather, wood, ceramics, stone, etc., building member, etc. Can be composed of any suitable material.
- the material constituting the surface of the substrate may be an optical member material such as glass or transparent plastic.
- some layer (or film) such as a hard coat layer or an antireflection layer may be formed on the surface (outermost layer) of the substrate.
- the antireflection layer either a single-layer antireflection layer or a multilayer antireflection layer may be used.
- inorganic materials that can be used for the antireflection layer include SiO 2 , SiO, ZrO 2 , TiO 2 , TiO, Ti 2 O 3 , Ti 2 O 5 , Al 2 O 3 , Ta 2 O 5 , CeO 2 , MgO.
- the article to be manufactured is an optical glass component for a touch panel, a thin film using a transparent electrode such as indium tin oxide (ITO) or indium zinc oxide is provided on a part of the surface of the substrate (glass). It may be.
- ITO indium tin oxide
- the base material is an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomized film layer, a hard coating film layer, a polarizing film, a phase difference film, And a liquid crystal display module or the like.
- the shape of the substrate is not particularly limited.
- the surface region of the base material on which the surface treatment layer is to be formed may be at least part of the surface of the base material, and can be appropriately determined according to the use and specific specifications of the article to be manufactured.
- a base material at least a surface portion thereof may be made of a material originally having a hydroxyl group.
- materials include glass, and metals (particularly base metals) on which a natural oxide film or a thermal oxide film is formed on the surface, ceramics, and semiconductors.
- it can be introduced to the surface of the substrate by applying some pretreatment to the substrate. Or increase it. Examples of such pretreatment include plasma treatment (for example, corona discharge) and ion beam irradiation.
- the plasma treatment can be preferably used for introducing or increasing hydroxyl groups on the surface of the base material and for cleaning the base material surface (removing foreign matter or the like).
- an interfacial adsorbent having a carbon-carbon unsaturated bond group is previously formed in the form of a monomolecular film on the substrate surface by the LB method (Langmuir-Blodgett method) or chemical adsorption method. And then cleaving the unsaturated bond in an atmosphere containing oxygen, nitrogen or the like.
- the substrate may be made of a material containing at least a surface portion of a silicone compound having one or more other reactive groups, for example, Si—H groups, or an alkoxysilane.
- a film of the above-described surface treatment agent of the present invention is formed on the surface of the substrate, and this film is post-treated as necessary, thereby forming a surface treatment layer from the surface treatment agent of the present invention. To do.
- the film formation of the surface treatment agent of the present invention can be carried out by applying the surface treatment agent to the surface of the substrate so as to cover the surface.
- the coating method is not particularly limited. For example, wet coating methods and dry coating methods can be used.
- wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating and similar methods.
- Examples of dry coating methods include vapor deposition (usually vacuum vapor deposition), sputtering, CVD, and similar methods.
- Specific examples of the vapor deposition method include resistance heating, high-frequency heating using an electron beam, microwave, and the like, an ion beam, and similar methods.
- Specific examples of the CVD method include plasma-CVD, optical CVD, thermal CVD, and similar methods.
- the surface treatment agent of the present invention can be applied to the substrate surface after being diluted with a solvent.
- the following solvents are preferably used: perfluoroaliphatic hydrocarbons having 5 to 12 carbon atoms (for example, perfluorohexane, perfluoromethylcyclohexane).
- HFE Hydrofluoroether
- hydrofluoroethers are preferred, perfluorobutyl methyl ether (C 4 F 9 OCH 3) And / or perfluorobutyl ethyl ether (C 4 F 9 OC 2 H 5 ) is particularly preferred.
- the surface treatment agent of the present invention may be directly subjected to the dry coating method, or may be diluted with the above-described solvent and then subjected to the dry coating method.
- the film formation is preferably carried out so that the surface treatment agent of the present invention is present together with a catalyst for hydrolysis and dehydration condensation in the film.
- the catalyst may be added to the diluted solution of the surface treatment agent of the present invention immediately after the surface treatment agent of the present invention is diluted with a solvent and applied to the substrate surface.
- the surface treatment agent of the present invention to which the catalyst is added is directly vapor-deposited (usually vacuum deposition), or the surface treatment agent of the present invention to which a catalyst is added to a metal porous body such as iron or copper. Vapor deposition (usually vacuum deposition) may be performed using a pellet-like material impregnated with.
- any suitable acid or base can be used for the catalyst.
- the acid catalyst for example, acetic acid, formic acid, trifluoroacetic acid and the like can be used.
- a base catalyst ammonia, organic amines, etc. can be used, for example.
- the membrane is post-treated as necessary.
- this post-processing is not specifically limited, For example, a water supply and drying heating may be implemented sequentially, and it may be implemented as follows in detail.
- the surface treatment agent of the present invention is formed on the substrate surface as described above, moisture is supplied to this film (hereinafter also referred to as “precursor film”).
- the method for supplying moisture is not particularly limited, and for example, methods such as dew condensation due to a temperature difference between the precursor film (and the substrate) and the surrounding atmosphere, or spraying of steam (steam) may be used.
- the water supply can be performed in an atmosphere of 0 to 500 ° C., preferably 100 ° C. or higher and 300 ° C. or lower, for example. By supplying moisture in such a temperature range, hydrolysis can be advanced. Although the pressure at this time is not specifically limited, it can be simply a normal pressure.
- the precursor film is heated on the surface of the substrate in a dry atmosphere exceeding 60 ° C.
- the drying heating method is not particularly limited, and the temperature of the precursor film together with the base material exceeds 60 ° C., preferably exceeds 100 ° C., for example, 500 ° C. or less, preferably 300 ° C. or less, and What is necessary is just to arrange
- the pressure at this time is not specifically limited, it can be simply a normal pressure.
- R 1 is all hydroxyl groups in the group represented by any one of the groups bonded to Si after hydrolysis (the compounds represented by the above formulas (1a) and (1b)) In the case of, it is the hydroxyl group.
- R 1 reacts rapidly between the group couple
- the reactive group is a hydroxyl group, dehydration condensation is performed. As a result, a bond is formed between the PFPE-containing silane compounds of the present invention, and a bond is formed between the compound and the substrate.
- the above water supply and drying heating may be continuously performed by using superheated steam.
- Superheated steam is a gas obtained by heating saturated steam to a temperature higher than the boiling point, and exceeds 100 ° C. under normal pressure, generally 500 ° C. or lower, for example, 300 ° C. or lower, and has a boiling point. It is a gas that has become an unsaturated water vapor pressure by heating to a temperature exceeding.
- dew condensation occurs on the surface of the precursor film due to the temperature difference between the superheated water vapor and the relatively low temperature precursor film. Moisture is supplied to the membrane.
- the moisture on the surface of the precursor film is vaporized in a dry atmosphere by the superheated steam, and the moisture content on the surface of the precursor film gradually decreases. While the amount of moisture on the surface of the precursor film is reduced, that is, while the precursor film is in a dry atmosphere, the precursor film on the surface of the substrate comes into contact with the superheated steam, thereby the temperature of the superheated steam ( It will be heated to a temperature exceeding 100 ° C. under normal pressure. Therefore, if superheated steam is used, moisture supply and drying heating can be carried out continuously only by exposing the substrate on which the precursor film is formed to superheated steam.
- Post-processing can be performed as described above. It should be noted that such post-treatment can be performed to further improve friction durability, but is not essential for producing the articles of the present invention. For example, after applying the surface treating agent of the present invention to the surface of the substrate, it may be left still as it is.
- the surface treatment layer derived from the film of the surface treatment agent of the present invention is formed on the surface of the substrate, and the article of the present invention is manufactured.
- the surface treatment layer obtained by this has both high surface slipperiness and high friction durability.
- this surface treatment layer has water repellency, oil repellency, antifouling properties (for example, preventing adhesion of dirt such as fingerprints), depending on the composition of the surface treatment agent used. It can have surface slipperiness (or lubricity, for example, wiping of dirt such as fingerprints, and excellent touch to fingers), and can be suitably used as a functional thin film.
- the present invention further relates to an optical material having the cured product as an outermost layer.
- optical material in addition to optical materials relating to displays and the like exemplified below, a wide variety of optical materials are preferably mentioned: for example, cathode ray tube (CRT; eg, TV, personal computer monitor), liquid crystal display, plasma display, Organic EL display, inorganic thin-film EL dot matrix display, rear projection display, fluorescent display tube (VFD), field emission display (FED), or a protective plate of such display, or reflection on the surface thereof Those with a protective film treatment.
- CTR cathode ray tube
- LCD organic EL display
- FED field emission display
- the article having the surface treatment layer obtained by the present invention is not particularly limited, but may be an optical member.
- optical members include: lenses such as eyeglasses; front protective plates, antireflection plates, polarizing plates, and antiglare plates for displays such as PDP and LCD; for devices such as mobile phones and portable information terminals.
- the article having the surface treatment layer obtained by the present invention may be a medical device or a medical material.
- the thickness of the surface treatment layer is not particularly limited.
- the thickness of the surface treatment layer is preferably in the range of 1 to 30 nm, preferably 1 to 15 nm, from the viewpoints of optical performance, surface slipperiness, friction durability, and antifouling properties.
- the articles obtained using the surface treating agent of the present invention have been described in detail.
- the use of the surface treating agent of the present invention, the usage method, the manufacturing method of the article, and the like are not limited to those exemplified above.
- the perfluoro (poly) ether group-containing silane compound, the production method thereof, and the surface treatment agent containing the perfluoro (poly) ether group of the present invention will be described more specifically through the following examples, but the present invention is limited to these examples. It is not a thing.
- four types of repeating units (CF 2 O), (CF 2 CF 2 O), (CF 2 CF 2 CF 2 O) and (CF 2 CF 2 CF 2 ) constituting the perfluoropolyether are used.
- the order of presence of CF 2 O) is arbitrary.
- Synthesis example 2 Perfluoropolyether group-containing trichlorosilane compound (A) 19 g, 1, 3 having trichlorosilane at the end synthesized in Synthesis Example 1 in a 100 mL four-necked flask equipped with a reflux condenser, a thermometer and a stirrer -20 g of bis (trifluoromethyl) benzene was charged and stirred at 5 ° C for 30 minutes in a nitrogen stream. Subsequently, 26.4 ml of a diethyl ether solution containing 0.7 mol / L of allylmagnesium bromide was added, the temperature was raised to room temperature, and the mixture was stirred at this temperature for 10 hours.
- the temperature was raised to room temperature and insoluble matter was filtered off.
- the non-volatile components are diluted with perfluorohexane and washed with methanol using a separatory funnel (more specifically, the fluoro compound is added to the perfluorohexane phase (fluorus phase)). And the methanol phase (organic phase) was separated and removed from the non-fluoro compound 3 times.
- Synthesis example 3 In a 100 mL four-necked flask equipped with a reflux condenser, a thermometer, and a stirrer, 15 g of a perfluoropolyether group-containing allyl compound (B) having an allyl group at the terminal synthesized in Synthesis Example 2 was obtained. Bis (trifluoromethyl) benzene (15 g), triacetoxymethylsilane (0.05 g), and trichlorosilane (3.15 g) were charged, and the mixture was stirred at 5 ° C. for 30 minutes in a nitrogen stream.
- Synthesis example 4 In a 100 mL four-necked flask equipped with a reflux condenser, a thermometer, and a stirrer, 16 g of a perfluoropolyether group-containing trichlorosilane compound (C) having trichlorosilane at the terminal synthesized in Synthesis Example 3, 1, 3 -15 g of bis (trifluoromethyl) benzene was added and stirred at 50 ° C. for 30 minutes under a nitrogen stream. Subsequently, after adding a mixed solution of 0.78 g of methanol and 36 g of trimethyl orthoformate, the mixture was heated to 65 ° C. and stirred at this temperature for 3 hours.
- C perfluoropolyether group-containing trichlorosilane compound having trichlorosilane at the terminal synthesized in Synthesis Example 3
- 1, 3 -15 g of bis (trifluoromethyl) benzene was added and stirred at 50 ° C.
- Synthesis example 5 In a 50 mL four-necked flask equipped with a reflux condenser, a thermometer, and a stirrer, 10 g of a perfluoropolyether group-containing trichlorosilane compound (A) having trichlorosilane at the end synthesized in Synthesis Example 1, 1, 3 -10 g of bis (trifluoromethyl) benzene was charged and stirred at 5 ° C for 30 minutes in a nitrogen stream. Subsequently, 7.06 ml of a diethyl ether solution containing 0.7 mol / L of allylmagnesium bromide was added, the temperature was raised to room temperature, and the mixture was stirred at this temperature for 10 hours.
- a perfluoropolyether group-containing trichlorosilane compound (A) having trichlorosilane at the end synthesized in Synthesis Example 1 1, 3 -10 g of bis (trifluoromethyl) benz
- the temperature was raised to room temperature and insoluble matter was filtered off. Subsequently, after distilling off the volatile components under reduced pressure, the non-volatile components are diluted with perfluorohexane and washed with methanol using a separatory funnel (more specifically, the fluoro compound is added to the perfluorohexane phase (fluorus phase)). And the methanol phase (organic phase) was separated and removed from the non-fluoro compound 3 times.
- Synthesis example 6 In a 50 mL four-necked flask equipped with a reflux condenser, a thermometer, and a stirrer, 5 g of a perfluoropolyether group-containing allyl compound (E) having an allyl group at the end synthesized in Synthesis Example 5, 1,3- 7 g of bis (trifluoromethyl) benzene, 0.02 g of triacetoxymethylsilane, and 1.30 g of trichlorosilane were charged, and the mixture was stirred at 5 ° C. for 30 minutes in a nitrogen stream.
- a perfluoropolyether group-containing allyl compound (E) having an allyl group at the end synthesized in Synthesis Example 5
- 1,3- 7 g of bis (trifluoromethyl) benzene, 0.02 g of triacetoxymethylsilane, and 1.30 g of trichlorosilane were charged, and the mixture was stirred at 5 °
- Synthesis example 7 In a 50 mL four-necked flask equipped with a reflux condenser, a thermometer, and a stirrer, 6 g of a perfluoropolyether group-containing triallyl compound (F) having an allyl group at the end synthesized in Synthesis Example 6, 1,3- 6 g of bis (trifluoromethyl) benzene was added and stirred at 50 ° C. for 30 minutes under a nitrogen stream. Subsequently, after adding a mixed solution of 0.21 g of methanol and 10 g of trimethyl orthoformate, the temperature was raised to 65 ° C., and the mixture was stirred at this temperature for 2 hours.
- Synthesis example 8 To a 50 mL three-necked flask equipped with a reflux condenser, a thermometer and a stirrer, 2.5 g of a perfluoropolyether group-containing trichlorosilane compound (C) having trichlorosilane at the end synthesized in Synthesis Example 3; , 3-bis (trifluoromethyl) benzene (3.0 g) was charged, and the mixture was stirred at 5 ° C. for 30 minutes in a nitrogen stream.
- C perfluoropolyether group-containing trichlorosilane compound having trichlorosilane at the end synthesized in Synthesis Example 3;
- Synthesis example 9 In a 50 mL three-necked flask equipped with a reflux condenser, a thermometer, and a stirrer, 2.2 g of a perfluoropolyether group-containing allyl compound (H) having an allyl group at the end synthesized in Synthesis Example 8 was added. 5.0 g of 3-bis (trifluoromethyl) benzene, 7.0 mg of triacetoxymethylsilane, and 1.5 g of trichlorosilane were charged, and the mixture was stirred at 5 ° C. for 30 minutes in a nitrogen stream.
- Synthesis example 10 In a 50 mL three-necked flask equipped with a reflux condenser, a thermometer, and a stirrer, 2.2 g of a perfluoropolyether group-containing trichlorosilane compound (I) having trichlorosilane at the end synthesized in Synthesis Example 9 was obtained. , 3-bis (trifluoromethyl) benzene (5.0 g) was added, and the mixture was stirred at 50 ° C. for 30 minutes under a nitrogen stream.
- Synthesis example 11 An average composition of CF 3 O (CF 2 CF 2 O) 15 (CF 2 O) 16 CF 2 CH 2 OH (however, in the mixture) Is a perfluoropolyether-modified alcohol compound represented by (CF 2 CF 2 CF 2 CF 2 O) and / or (CF 2 CF 2 CF 2 O). , 3-bis (trifluoromethyl) benzene (20 g) and NaOH (0.8 g) were charged, and the mixture was stirred at 65 ° C. for 4 hours. Subsequently, 2.4 g of allyl bromide was added, followed by stirring at 65 ° C. for 6 hours.
- Synthesis example 12 A 100 mL four-necked flask equipped with a reflux condenser, a thermometer, and a stirrer was charged with 20 g of a perfluoropolyether group-containing allyloxy compound (K) having an allyloxy group at the terminal synthesized in Synthesis Example 11, 1,3- 20 g of bis (trifluoromethyl) benzene, 0.06 g of triacetoxymethylsilane, and 1.80 g of trichlorosilane were charged, and the mixture was stirred at 5 ° C. for 30 minutes in a nitrogen stream.
- K perfluoropolyether group-containing allyloxy compound having an allyloxy group at the terminal synthesized in Synthesis Example 11
- 1,3- 20 g of bis (trifluoromethyl) benzene, 0.06 g of triacetoxymethylsilane, and 1.80 g of trichlorosilane were charged, and the mixture was stirred at 5 °
- Synthesis example 13 In a 100 mL four-necked flask equipped with a reflux condenser, a thermometer and a stirrer, 20 g of a perfluoropolyether group-containing trichlorosilane compound (L) having trichlorosilane at the terminal synthesized in Synthesis Example 12 was obtained. -20 g of bis (trifluoromethyl) benzene was charged and stirred at 5 ° C for 30 minutes under a nitrogen stream. Subsequently, 35.2 ml of a diethyl ether solution containing 0.7 mol / L of allylmagnesium bromide was added, the temperature was raised to room temperature, and the mixture was stirred at this temperature for 10 hours.
- the temperature was raised to room temperature and insoluble matter was filtered off.
- the non-volatile components are diluted with perfluorohexane and washed with methanol using a separatory funnel (more specifically, the fluoro compound is added to the perfluorohexane phase (fluorus phase)). And the methanol phase (organic phase) was separated and removed from the non-fluoro compound 3 times.
- Synthesis example 14 In a 100 mL four-necked flask equipped with a reflux condenser, a thermometer, and a stirrer, 15 g of a perfluoropolyether group-containing allyl compound (M) having an allyl group at the terminal synthesized in Synthesis Example 13 was obtained. Bis (trifluoromethyl) benzene (15 g), triacetoxymethylsilane (0.05 g), and trichlorosilane (4.2 g) were charged, and the mixture was stirred at 5 ° C. for 30 minutes in a nitrogen stream.
- Synthesis example 15 In a 100 mL four-necked flask equipped with a reflux condenser, a thermometer, and a stirrer, 16 g of a perfluoropolyether group-containing trichlorosilane compound (N) having trichlorosilane at the terminal synthesized in Synthesis Example 14 was obtained. -15 g of bis (trifluoromethyl) benzene was added and stirred at 50 ° C. for 30 minutes under a nitrogen stream. Subsequently, after adding a mixed solution of 1.04 g of methanol and 48 g of trimethyl orthoformate, the temperature was raised to 65 ° C., and the mixture was stirred at this temperature for 3 hours.
- perfluoro polyether group containing silane compound (O) which has a trimethylsilyl group at the terminal was obtained by distilling off a volatile matter under reduced pressure.
- -Perfluoropolyether group-containing silane compound (O) CF 3 O (CF 2 CF 2 O) 15 (CF 2 O) 16 CF 2 CH 2 OCH 2 CH 2 CH 2 Si [CH 2 CH 2 CH 2 Si (OCH 3 ) 3 ] 3 (Note that the average composition, but contained repeating units 0.18 units of (CF 2 CF 2 CF 2 CF 2 O repeating units 0.17 units and (CF 2 CF 2 CF 2 O) of) , Omitted because of the trace amount.)
- Example 1 Preparation of surface treatment agent and formation of surface treatment layer (vacuum deposition treatment)
- the compound (D) obtained in Synthesis Example 4 was dissolved in hydrofluoroether (manufactured by 3M, Novec HFE7200) so as to have a concentration of 20 wt% to prepare a surface treating agent 1.
- the surface treating agent 1 prepared above was vacuum-deposited on chemically strengthened glass (Corning, “Gorilla” glass, thickness 0.7 mm).
- the processing conditions for vacuum deposition were set at a pressure of 3.0 ⁇ 10 ⁇ 3 Pa.
- silicon dioxide was deposited on the surface of this chemically strengthened glass by an electron beam deposition method to a thickness of 7 nm to form a silicon dioxide film.
- Example 2 (Examples 2 to 4) Instead of using the compound (G) obtained in Synthesis Example 7, the compound (J) obtained in Synthesis Example 10 and the compound (O) obtained in Synthesis Example 15 in place of the compound (D), respectively. Prepared a surface treatment agent and formed a surface treatment layer in the same manner as in Example 1.
- Control compound 1 (In the formula, m is an integer of 1 to 6.)
- Control compound 4 (CH 3 O) 3 SiCH 2 CH 2 CH 2 OCH 2 CF 2 O (CF 2 CF 2 O) 28 (CF 2 O) 26 CF 2 CH 2 OCH 2 CH 2 CH 2 Si (OCH 3 ) 3
- Control compound 5 CF 3 CF 2 CF 2 O (CF 2 CF 2 CF 2 O) 20 CF 2 CF 2 CON [CH 2 CH 2 CH 2 CH 2 CH 2
- Test Example 1 Friction durability evaluation About the surface treatment layer formed in the base-material surface in said Example and comparative example, the static contact angle of water was measured.
- the static contact angle of water was measured with 1 ⁇ L of water using a contact angle measuring device (manufactured by Kyowa Interface Science Co., Ltd.).
- steel wool friction durability evaluation was carried out as friction durability evaluation. Specifically, the base material on which the surface treatment layer is formed is horizontally arranged, and steel wool (count # 0000, dimensions 5 mm ⁇ 10 mm ⁇ 10 mm) is brought into contact with the exposed upper surface of the surface treatment layer, and 1,000 gf of the steel wool is placed thereon. A load was applied, and then the steel wool was reciprocated at a speed of 140 mm / sec with the load applied. The static contact angle (degree) of water was measured every 1,000 reciprocations (the evaluation was stopped when the measured contact angle value was less than 100 degrees).
- Examples 1 to 4 using the perfluoropolyether group-containing silane compound of the present invention are comparative examples using conventional perfluoropolyether group-containing silane compounds. It was confirmed that the friction durability was remarkably improved as compared with 1-5.
- Example 5 A surface treatment layer was formed in the same manner as in Example 1 except that the amount of the surface treatment agent per chemically strengthened glass was 3 mg (that is, containing 0.6 mg of the compound (D)).
- Example 6 A surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Example 5 except that the compound (O) was used in place of the compound (D).
- Example 7 A surface treatment layer was formed in the same manner as in Example 1 except that the amount of the surface treatment agent per chemically strengthened glass was 1.5 mg (that is, 0.3 mg of compound (D) was contained).
- Example 8 A surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Example 7 except that the compound (O) was used instead of the compound (D).
- Test Example 2 Friction durability evaluation With respect to the surface treatment layers formed on the substrate surface in Examples 5 to 8 and Comparative Examples 6 to 9, the static contact angle of water was measured in the same manner as in Test Example 1 above. In Example 6, the steel wool was worn down when it was reciprocated 20,000 times, and the test could not be continued any further.
- the surface treatment agent using the perfluoropolyether group-containing silane compound of the present invention was used even when the treatment amount was increased to 3 mg (Examples 5 and 6). Even when reduced to 1.5 mg (Examples 7 and 8), it was shown to provide excellent friction durability.
- the surface treatment agent using the conventional perfluoropolyether group-containing silane compound is the same as in the case of 2 mg (Comparative Examples 1 and 3) when the treatment amount is increased to 3 mg (Comparative Examples 6 and 7).
- the friction durability was greatly inferior.
- Example 9 The compound (D) and the following perfluoropolyether compound (P) having an average molecular weight of about 25,000 (Solvay, FOMBLIN (product number) M60) at a mass ratio of 2: 1 (concentration 20 wt%) The total amount of (D) and compound (P)) was the same as in Example 1 except that the surface treatment agent was prepared by dissolving in hydrofluoroether (manufactured by 3M, Novec HFE7200) (ie, chemical The amount of surface treatment agent per tempered glass was 2 mg), and a surface treatment layer was formed.
- hydrofluoroether manufactured by 3M, Novec HFE7200
- Example 10 A surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Example 9 except that the compound (O) was used in place of the compound (D).
- Example 11 A surface treatment layer was formed in the same manner as in Example 9 except that the amount of the surface treatment agent per chemically strengthened glass was changed to 3 mg.
- Example 12 A surface treatment layer was formed in the same manner as in Example 11 except that the surface treatment agent was prepared with the ratio of the compound (D) and the compound (P) at a mass ratio of 1: 1.
- Example 13 A surface treatment layer was formed in the same manner as in Example 11 except that the surface treatment agent was prepared with the ratio of the compound (D) and the compound (P) at a mass ratio of 1: 2.
- Example 14 A surface treatment layer was formed in the same manner as in Example 10 except that the amount of the surface treatment agent per chemically strengthened glass was changed to 3 mg.
- Example 15 A surface treatment layer was formed in the same manner as in Example 14 except that the surface treatment agent was prepared with the ratio of the compound (O) and the compound (P) set to a mass ratio of 1: 1.
- Example 16 A surface treatment layer was formed in the same manner as in Example 14 except that the surface treatment agent was prepared with the ratio of the compound (O) and the compound (P) at a mass ratio of 1: 2.
- Test Example 3 Friction durability evaluation The static contact angle of water was measured in the same manner as in Test Example 1 for the surface treatment layer formed on the substrate surface in Examples 9 to 16 above. In Examples 10 to 12 and 14 to 16, the steel wool was worn away when reciprocating 20,000 times, and the test could not be continued any more.
- Example 13 the friction durability is 9,000 times, which is inferior to that of the compound (D) alone, but the ratio of the compound (D) to the compound (P) is 1: 2. It is considered that the amount of the compound (D) was substantially 1/3 and was too small. Further, the friction durability of Examples 14 to 16 in which the compound (O) and the compound (P) were mixed was 20,000 times or more as in Example 6 of the compound (O) alone, but the test was continued. Therefore, it is considered that the mixing effect of the compound (P) appears.
- Test Example 4 Evaluation of slipperiness The coefficient of dynamic friction was measured for the surface treatment layers formed on the substrate surface in Examples 1 to 16 and Comparative Examples 1 to 9 described above.
- the surface treatment agent using the perfluoropolyether group-containing silane compound of the present invention exhibits excellent slipperiness.
- the compound (O) is used (Examples 4, 6 and 8) and when mixed with the compound (P) which is a fluorine-containing oil (Examples 9 to 16), more excellent slipperiness It was confirmed that
- Example 17 Preparation of surface treatment agent and formation of surface treatment layer (spray treatment)
- the compound (D) obtained in Synthesis Example 4 was dissolved in hydrofluoroether (manufactured by 3M, Novec HFE7200) so as to have a concentration of 0.1 wt% to prepare a surface treating agent 2.
- the surface treatment agent 2 prepared above was set to a head speed of 70 mm / sec, chemically strengthened glass (Corning, “Gorilla” glass, thickness 0). .7 mm) was uniformly sprayed onto the surface.
- the chemically tempered glass surface was plasma treated using an atmospheric pressure plasma generator (Dyne-A-Mite IT, manufactured by Enercon Industries).
- the coating amount of the surface treatment agent was 0.2 ml of the surface treatment agent per chemically strengthened glass (55 mm ⁇ 100 mm).
- the chemically strengthened glass with a spray-treated film was allowed to stand for 48 hours in an atmosphere of a temperature of 20 ° C. and a humidity of 65%. Thereby, the spray treatment film was cured and a surface treatment layer was formed.
- Example 18 The compound (D) and the following perfluoropolyether compound (Q) having an average molecular weight of about 4,000 (manufactured by Solvay, FOMBLIN (product number) M03) at a mass ratio of 2: 1 and a concentration of 0.1 wt% In the same manner as in Example 17, except that a surface treatment agent was prepared by dissolving in hydrofluoroether (manufactured by 3M, Novec HFE7200) so as to be (total of compound (D) and compound (Q)). A treatment layer was formed. ⁇ Perfluoropolyether compounds (Q) CF 3 O (CF 2 CF 2 O) 20 (CF 2 O) 19 (CF 2 CF 2 CF 2 O) 1 (CF 2 CF 2 CF 2 CF 2 O) 1 CF 3
- Example 19 Compound (D) and perfluoropolyether compound (Q) having an average molecular weight of about 4,000 at a mass ratio of 1: 1, concentration of 0.1 wt% (total of compound (D) and compound (Q))
- a surface treatment layer was formed in the same manner as in Example 17 except that a surface treatment agent was prepared by dissolving in hydrofluoroether (manufactured by 3M, Novec HFE7200).
- Example 20 A surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Example 17 except that the compound (O) obtained in Synthesis Example 15 was used in place of the compound (D).
- Example 11 The concentration of the control compound 1 and the perfluoropolyether compound (Q) having an average molecular weight of about 4,000 at a mass ratio of 2: 1 is 0.1 wt% (the sum of the control compound 1 and the compound (Q)).
- the surface treatment layer was formed in the same manner as in Example 17 except that the surface treatment agent was prepared by dissolving in hydrofluoroether (manufactured by 3M, Novec HFE7200).
- Control compound 1 and perfluoropolyether compound (Q) having an average molecular weight of about 4,000 have a mass ratio of 1: 1 and a concentration of 0.1 wt% (the sum of control compound 1 and compound (Q)).
- the surface treatment layer was formed in the same manner as in Example 17 except that the surface treatment agent was prepared by dissolving in hydrofluoroether (manufactured by 3M, Novec HFE7200).
- the present invention can be suitably used for forming a surface treatment layer on the surface of a variety of substrates, particularly optical members that require transparency.
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Abstract
Description
Rfは、-(OC4F8)a-(OC3F6)b-(OC2F4)c-(OCF2)d-を表し、ここに、a、b、cおよびdはそれぞれ独立して0以上200以下の整数であって、a、b、cおよびdの和は少なくとも1であり、a、b、cまたはdを付して括弧でくくられた各繰り返し単位の存在順序は式中において任意であり、
Xは、2価の有機基を表し、
Yは、各出現において、それぞれ独立して、水酸基、加水分解可能な基、または炭化水素基を表し、
Qは、各出現において、それぞれ独立して、-Z-SiR1 nR2 3-nを表し、
Zは、各出現において、それぞれ独立して、2価の有機基を表し:ただし、Zは、式(1a)または式(1b)における分子主鎖の末端のSi原子とシロキサン結合を形成するものを除く、
R1は、各出現において、それぞれ独立して、水酸基または加水分解可能な基を表し、
R2は、各出現において、それぞれ独立して、C1-22アルキル基、またはQ’を表し、
Q’は、Qと同意義であり、
nは、各QおよびQ’において、それぞれ独立して、0~3から選択される整数であって、nの総和は1以上であり、
Q中、Z基を介して直鎖状に連結されるSiは最大で5個であり、
kは、それぞれ独立して、1~3から選択される整数である。)
で表されるパーフルオロ(ポリ)エーテル基含有シラン化合物が提供される。
工程(1):式(1a-1)または式(1b-1):
で表される化合物を、HSiM3(式中、Mは、それぞれ独立して、ハロゲン原子またはC1-6アルコキシ基である)と反応させて、式(1a-2)または式(1b-2):
で表される化合物を得る工程;
工程(2):上記式(1a-2)または式(1b-2)で表される化合物を、
式:Hal-J-Z’-CH=CH2(式中、Z’は結合または2価の有機基を表し、Jは、Mg、Cu、PdまたはZnを表し、Halはハロゲン原子を表す。)
で表される化合物、および、所望により
式:YhL(式中、Yは上記と同意義であり、Lは、Yと結合可能な基を表し、hは1~3の整数である。)
で表される化合物と反応させて、式(1a-3)または式(1b-3):
で表される化合物を得る工程;および
工程(3):式(1a-3)または式(1b-3)で表される化合物を、HSiM3(式中、Mは上記と同意義である)および/または
式:R1 iL’(式中、R1は上記と同意義であり、L’は、R1と結合可能な基を表し、iは1~3の整数である。)
で表される化合物、および所望により
式:R2’ jL”(式中、R2’は、C1-22アルキル基を表し、L”は、R2’と結合可能な基を表し、jは1~3の整数である。)
で表される化合物と反応させる工程、
を含む方法が提供される。
Rfは、-(OC4F8)a-(OC3F6)b-(OC2F4)c-(OCF2)d-を表し、ここに、a、b、cおよびdはそれぞれ独立して0以上200以下の整数であって、a、b、cおよびdの和は少なくとも1であり、a、b、cまたはdを付して括弧でくくられた各繰り返し単位の存在順序は式中において任意であり、
Xは、2価の有機基を表し、
Yは、各出現において、それぞれ独立して、水酸基、加水分解可能な基、または炭化水素基を表し、
Z’は、結合または2価の有機基である。)
で表される化合物が提供される。かかる化合物は、上記式(1a)または式(1b)で表されるパーフルオロ(ポリ)エーテル基含有シラン化合物の製造方法における中間体である。
式(1a-2’)または式(1b-2’):
で表される化合物を、
式:Hal-J-Z’-CH=CH2(式中、Z’は、上記と同意義であり、Jは、Mg、Cu、PdまたはZnを表し、Halはハロゲン原子を表す。)
で表される化合物、および、所望により
式:YhL(式中、Yは上記と同意義であり、Lは、Yと結合可能な基を表し、hは1~3の整数である。)
で表される化合物と反応させる工程を含む方法が提供される。
-(R6)p-(X1)q-R7-
[式中:
R6は、-(CH2)s-またはo-、m-もしくはp-フェニレン基を表し、好ましくは-(CH2)s-であり、
R7は、-(CH2)t-またはo-、m-もしくはp-フェニレン基を表し、好ましくは-(CH2)t-であり、
X1は、-(X2)r-を表し、
X2は、各出現において、それぞれ独立して、-O-、-S-、o-、m-もしくはp-フェニレン基、-C(O)O-、-CONR5-、-O-CONR5-、-NR5-、-Si(R3)2-、-(Si(R3)2O)m-Si(R3)2-および-(CH2)v-からなる群から選択される基を表し、
R3は、各出現において、それぞれ独立して、フェニル基またはC1-6アルキル基を表し、好ましくはC1-6アルキル基、より好ましくはメチル基であり、
R5は、各出現において、それぞれ独立して、水素原子、フェニル基またはC1-6アルキル基(好ましくはメチル基)を表し、
mは、各出現において、それぞれ独立して、1~100の整数、好ましくは1~20の整数であり、
vは、各出現において、それぞれ独立して、1~20の整数、好ましくは1~6の整数、より好ましくは1~3の整数であり、
sは、1~20の整数、好ましくは1~6の整数、より好ましくは1~3の整数、さらにより好ましくは1または2であり、
tは、1~20の整数、好ましくは2~6の整数、より好ましくは2~3の整数であり、
rは、1~10の整数、好ましくは1~5の整数、より好ましくは1~3の整数であり、
pは、0または1であり、
qは、0または1である。]
で表される基が挙げられる。
C1-20アルキレン基、
-R6-X3-R7-、または
-X4-R7-
[式中、R6およびR7は、上記と同意義である。]
であり得る。
C1-20アルキレン基、
-(CH2)s-X3-(CH2)t-、または
-X4-(CH2)t-
[式中、sおよびtは、上記と同意義である。]
である。
-O-、
-S-、
-C(O)O-、
-CONR5-、
-O-CONR5-、
-Si(R3)2-、
-(Si(R3)2O)m-Si(R3)2-、
-O-(CH2)u-(Si(R3)2O)m-Si(R3)2-、
-CONR5-(CH2)u-(Si(R3)2O)m-Si(R3)2-、
-CONR5-(CH2)v-N(R5)-、または
-CONR5-(o-、m-またはp-フェニレン)-Si(R3)2-
[式中、R3、R5、mおよびvは、上記と同意義であり、
uは1~20の整数、好ましくは2~6の整数、より好ましくは2~3の整数である。]を表す。X3は、好ましくは-O-である。
-S-、
-C(O)O-、
-CONR5-、
-CONR5-(CH2)u-(Si(R3)2O)m-Si(R3)2-、
-CONR5-(CH2)v-N(R5)-、または
-CONR5-(o-、m-またはp-フェニレン)-Si(R3)2-
を表す。
C1-20アルキレン基、
-(CH2)s-X3-(CH2)t-、または
-X4-(CH2)t-
[式中、各記号は、上記と同意義である。]
であり得る。
C1-20アルキレン基、
-(CH2)s-O-(CH2)t-、
-(CH2)s-(Si(R3)2O)m-Si(R3)2-(CH2)t-、または
-(CH2)s-O-(CH2)u-(Si(R3)2O)m-Si(R3)2-(CH2)t-、
[式中、各記号は、上記と同意義である。]
である。
-CH2O(CH2)2-、
-CH2O(CH2)3-、
-CH2O(CH2)6-、
-CH2O(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)2Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-、
-(CH2)2-、
-(CH2)3-、
-(CH2)4-、
-(CH2)6-、
-CONH-(CH2)3-、
-CON(CH3)-(CH2)3-、
-CON(Ph)-(CH2)3-(式中、Phはフェニルを意味する)、
-CONH-(CH2)6-、
-CON(CH3)-(CH2)6-、
-CON(Ph)-(CH2)6-(式中、Phはフェニルを意味する)、
-CONH-(CH2)2NH(CH2)3-、
-CONH-(CH2)6NH(CH2)3-、
-CH2O-CONH-(CH2)3-、
-CH2O-CONH-(CH2)6-、
-S-(CH2)3-、
-(CH2)2S(CH2)3-、
-CONH-(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-
-C(O)O-(CH2)3-、
-C(O)O-(CH2)6-、
などが挙げられる
-CH2O(CH2)2-、
-CH2O(CH2)3-、
-CF2O(CH2)3-、
-(CH2)2-、
-(CH2)3-、
-(CH2)4-、
-CONH-(CH2)3-、
-CON(CH3)-(CH2)3-、
-CON(Ph)-(CH2)3-(式中、Phはフェニルを意味する)、および
から選択される基であり、
Eは、-(CH2)n-(nは2~6の整数)であり、
Dは、式(1a)および式(1b)の分子主鎖のA-Rf-に結合し、Eは、式(1a)および式(1b)の分子主鎖のSi原子に結合する。]
-CH2O(CH2)2-、
-CH2O(CH2)3-、
-CF2O(CH2)3-、
-(CH2)2-、
-(CH2)3-、
-(CH2)4-、
-CONH-(CH2)3-、
-CON(CH3)-(CH2)3-、
-CON(Ph)-(CH2)3-(式中、Phはフェニルを意味する)、または
であり、
、別の任意の1つは、式(1a)および式(1b)の分子主鎖のSi原子に結合する-(CH2)n-(nは2~6の整数)であり、残りは、それぞれ独立して、メチル基またはフェニル基である。]
工程(1):式(1a-1)または式(1b-1):
で表される化合物を、HSiM3(式中、Mは、それぞれ独立して、ハロゲン原子またはC1-6アルコキシ基である)と反応させて、式(1a-2)または式(1b-2):
で表される化合物を得る工程;
工程(2):上記式(1a-2)または式(1b-2)で表される化合物を、
式:Hal-J-Z’-CH=CH2(式中、Z’は結合または2価のリンカー基を表し、Jは、Mg、Cu、PdまたはZnを表し、Halはハロゲン原子を表す。)
で表される化合物、および、所望により
式:YhL(式中、Yは上記と同意義であり、Lは、Yと結合可能な基を表し、hは1~3の整数である。)
で表される化合物と反応させて、式(1a-3)または式(1b-3):
で表される化合物を得る工程;および
工程(3):式(1a-3)または式(1b-3)で表される化合物を、HSiM3(式中、Mは、それぞれ独立して、ハロゲン原子またはC1-6アルコキシ基である)および、所望により
式:R1 iL’(式中、R1は上記と同意義であり、L’は、R1と結合可能な基を表し、iは1~3の整数である。)
で表される化合物、および/または
式:R2’ jL”(式中、R2’は、C1-22アルキル基を表し、L”は、R2’と結合可能な基を表し、jは1~3の整数である。)
で表される化合物と反応させる工程、
を含む方法により製造することができる。
工程(2’):
上記式(1a-2)または式(1b-2)で表される化合物を、
式:G-Z’-CH=CH2(式中、Z’は結合または2価の有機基を表し、Gは、Li、NaまたはKを表す。)
で表される化合物、および、所望により
式:YhL(式中、Yは請求項1の記載と同意義であり、Lは、Yと結合可能な基を表し、hは1~3の整数である。)
で表される化合物と反応させて、式(1a-3)または式(1b-3):
で表される化合物を得る工程;および
式:Hal-J-Z’-CH=CH2
で表される化合物、および、所望により
式:YhL
で表される化合物と反応させて、式(1a-3)または式(1b-3):
式:G-Z’-CH=CH2
で表される化合物、および、所望により
式:YhL
で表される化合物と反応させて、式(1a-3)または式(1b-3):
Rfは、-(OC4F8)a-(OC3F6)b-(OC2F4)c-(OCF2)d-を表し、ここに、a、b、cおよびdはそれぞれ独立して0以上200以下の整数であって、a、b、cおよびdの和は少なくとも1であり、a、b、cまたはdを付して括弧でくくられた各繰り返し単位の存在順序は式中において任意であり、
Xは、2価の有機基を表し、
Yは、水酸基、加水分解可能な基、または炭化水素基を表し、
Z’は、結合または2価の有機基である。)
で表される化合物、すなわち上記製造方法における中間体を提供する。
式(1a-2’)または式(1b-2’):
で表される化合物を、
式:Hal-J-Z’-CH=CH2(式中、Z’は、上記と同意義であり、Jは、Mg、Cu、PdまたはZnを表し、Halはハロゲン原子を表す。)
で表される化合物、および、所望により
式:YhL(式中、Yは、上記と同意義であり、Lは、Yと結合可能な基を表し、hは1~3の整数である。)
で表される化合物と反応させる工程を含む方法も提供する。かかる方法は、上記本発明のPFPE含有シラン化合物の製造方法における工程(2)に対応する。
A-Rf-CF2CF2CH2OCH2CH2CH2Si[CH2CH2CH2-Si(OCH3)3]k(OCH3)3-k
で表され、kが異なる複数の化合物が混合物として表面処理剤に含まれる場合、Si-NMRを用いて測定する場合、かかる混合物のSi-NMRスペクトルを取得し、Siのピーク面積の比を求めることにより、測定することができる。また、H-NMRを用いて測定する場合、かかる混合物のH-NMRスペクトルを取得し、CH2OCH2に結合した水素原子およびSi-CH2CH2CH2-Siに結合した水素原子のピーク面積の比を求めることにより、測定することができる。
R21-(OC4F8)a’-(OC3F6)b’-(OC2F4)c’-(OCF2)d’-R22 ・・・(3)
式中、R21は、1個またはそれ以上のフッ素原子により置換されていてもよい炭素数1~16のアルキル基(好ましくは、炭素数1~16のパーフルオロアルキル基)を表し、R22は、1個またはそれ以上のフッ素原子により置換されていてもよい炭素数1~16のアルキル基(好ましくは、炭素数1~16のパーフルオロアルキル基)、フッ素原子または水素原子を表し、R21およびR22は、より好ましくは、それぞれ独立して、炭素数1~3のパーフルオロアルキル基である。
a’、b’、c’およびd’は、ポリマーの主骨格を構成するパーフルオロ(ポリ)エーテルの4種の繰り返し単位数をそれぞれ表わし、互いに独立して0以上300以下の整数であって、a’、b’、c’およびd’の和は少なくとも1、好ましくは1~300、より好ましくは20~300である。添字a’、b’、c’またはd’を付して括弧でくくられた各繰り返し単位の存在順序は、式中において任意である。これら繰り返し単位のうち、-(OC4F8)-は、-(OCF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-および-(OCF2CF(C2F5))-のいずれであってもよいが、好ましくは-(OCF2CF2CF2CF2)-である。-(OC3F6)-は、-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-および-(OCF2CF(CF3))-のいずれであってもよく、好ましくは-(OCF2CF2CF2)-である。-(OC2F4)-は、-(OCF2CF2)-および-(OCF(CF3))-のいずれであってもよいが、好ましくは-(OCF2CF2)-である。
R21-(OCF2CF2CF2)b’’-R22 ・・・(3a)
R21-(OCF2CF2CF2CF2)a’’-(OCF2CF2CF2)b’’-(OCF2CF2)c’’-(OCF2)d’’-R22 ・・・(3b)
これら式中、R21およびR22は上記の通りであり;式(3a)において、b’’は1以上100以下の整数であり;式(3b)において、a’’およびb’’は、それぞれ独立して1以上30以下の整数であり、c’’およびd’’はそれぞれ独立して1以上300以下の整数である。添字a’’、b’’、c’’、d’’を付して括弧でくくられた各繰り返し単位の存在順序は、式中において任意である。
合成例1~7の手順に従って、パーフルオロポリエーテル基含有シラン化合物を合成した。
還流冷却器、温度計および撹拌機を取り付けた100mLの4つ口フラスコに、平均組成CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH=CH2で表されるパーフルオロポリエーテル変性アリルオキシ体20g、1,3-ビス(トリフルオロメチル)ベンゼン20g、トリアセトキシメチルシラン0.06g、トリクロロシラン1.36gを仕込み、窒素気流下、5℃で30分間撹拌した。続いて、1,3-ジビニル-1,1,3,3-テトラメチルジシロキサンのPt錯体を2%含むキシレン溶液を0.094ml加えた後、60℃まで昇温させ、この温度にて5時間撹拌した。その後、減圧下で揮発分を留去することにより、末端にトリクロロシランを有する下記式のパーフルオロポリエーテル基含有シラン化合物(A)19gを得た。
・パーフルオロポリエーテル基含有シラン化合物(A):
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH2CH2SiCl3
還流冷却器、温度計および撹拌機を取り付けた100mLの4つ口フラスコに、合成例1にて合成した末端にトリクロロシランを有するパーフルオロポリエーテル基含有トリクロロシラン化合物(A)19g、1,3-ビス(トリフルオロメチル)ベンゼン20gを仕込み、窒素気流下、5℃で30分間撹拌した。続いて、アリルマグネシウムブロマイドを0.7mol/L含むジエチルエーテル溶液を26.4ml加えた後、室温まで昇温させ、この温度にて10時間撹拌した。その後、5℃まで冷却し、メタノールを5ml加えた後、室温まで昇温させて不溶物をろ過した。続いて、減圧下で揮発分を留去した後、不揮発分をパーフルオロヘキサンで希釈し、分液ロートでメタノールによる洗浄操作(より詳細には、パーフルオロヘキサン相(フルオラス相)にフルオロ系化合物を維持し、メタノール相(有機相)に非フルオロ系化合物を分離除去する操作)を3回行った。続いて、減圧下で揮発分を留去することにより、末端にアリル基を有する下記のパーフルオロポリエーテル基含有アリル体(B)20gを得た。
・パーフルオロポリエーテル基含有アリル体(B):
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH2CH2Si(CH2CH=CH2)3
還流冷却器、温度計、撹拌機を取り付けた100mLの4つ口フラスコに、合成例2にて合成した末端にアリル基を有するパーフルオロポリエーテル基含有アリル体(B)15g、1,3-ビス(トリフルオロメチル)ベンゼン15g、トリアセトキシメチルシラン0.05g、トリクロロシラン3.15gを仕込み、窒素気流下、5℃で30分間撹拌した。続いて、1,3-ジビニル-1,1,3,3-テトラメチルジシロキサンのPt錯体を2%含むキシレン溶液を0.141ml加えた後、60℃まで昇温させ、この温度にて5時間撹拌した。その後、減圧下で揮発分を留去することにより、末端にトリクロロシランを有する下記のパーフルオロポリエーテル基含有トリクロロシラン化合物(C)16gを得た。
・パーフルオロポリエーテル基含有トリクロロシラン化合物(C):
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH2CH2Si(CH2CH2CH2SiCl3)3
還流冷却器、温度計、撹拌機を取り付けた100mLの4つ口フラスコに、合成例3にて合成した末端にトリクロロシランを有するパーフルオロポリエーテル基含有トリクロロシラン化合物(C)16g、1,3-ビス(トリフルオロメチル)ベンゼン15gを加え、窒素気流下、50℃で30分間撹拌した。続いて、メタノール0.78gとオルソギ酸トリメチル36gの混合溶液を加えた後、65℃まで昇温させ、この温度にて3時間撹拌した。その後、減圧下で揮発分を留去することにより、末端にトリメチルシリル基を有する下記のパーフルオロポリエーテル基含有シラン化合物(D)17gを得た。
・パーフルオロポリエーテル基含有シラン化合物(D):
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH2CH2Si[CH2CH2CH2Si(OCH3)3]3
還流冷却器、温度計および撹拌機を取り付けた50mLの4つ口フラスコに、合成例1にて合成した末端にトリクロロシランを有するパーフルオロポリエーテル基含有トリクロロシラン化合物(A)10g、1,3-ビス(トリフルオロメチル)ベンゼン10gを仕込み、窒素気流下、5℃で30分間撹拌した。続いて、アリルマグネシウムブロマイドを0.7mol/L含むジエチルエーテル溶液を7.06ml加えた後、室温まで昇温させ、この温度にて10時間撹拌した。その後、5℃まで冷却し、メタノールを4ml加えた後、室温まで昇温させて不溶物をろ過した。続いて、減圧下で揮発分を留去した後、不揮発分をパーフルオロヘキサンで希釈し、分液ロートでメタノールによる洗浄操作(より詳細には、パーフルオロヘキサン相(フルオラス相)にフルオロ系化合物を維持し、メタノール相(有機相)に非フルオロ系化合物を分離除去する操作)を3回行った。続いて、減圧下で揮発分を留去することにより、末端にアリル基を有する下記の式で表されるパーフルオロポリエーテル基含有アリル体の混合物(E)9gを得た。
・パーフルオロポリエーテル基含有アリル体の混合物(E):
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH2CH2Si(CH2CH=CH2)2.2(OCH3)0.8
還流冷却器、温度計、撹拌機を取り付けた50mLの4つ口フラスコに、合成例5にて合成した末端にアリル基を有するパーフルオロポリエーテル基含有アリル体(E)5g、1,3-ビス(トリフルオロメチル)ベンゼン7g、トリアセトキシメチルシラン0.02g、トリクロロシラン1.30gを仕込み、窒素気流下、5℃で30分間撹拌した。続いて、1,3-ジビニル-1,1,3,3-テトラメチルジシロキサンのPt錯体を2%含むキシレン溶液を0.045ml加えた後、60℃まで昇温させ、この温度にて5時間撹拌した。その後、減圧下で揮発分を留去することにより、末端にトリクロロシランを有する下記の式で表されるパーフルオロポリエーテル基含有トリクロロシラン化合物の混合物(F)6gを得た。
・パーフルオロポリエーテル基含有トリクロロシラン化合物の混合物(F):
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH2CH2Si(CH2CH2CH2SiCl3)2.2(OCH3)0.8
還流冷却器、温度計、撹拌機を取り付けた50mLの4つ口フラスコに、合成例6にて合成した末端にアリル基を有するパーフルオロポリエーテル基含有トリアリル体(F)6g、1,3-ビス(トリフルオロメチル)ベンゼン6gを加え、窒素気流下、50℃で30分間撹拌した。続いて、メタノール0.21gとオルソギ酸トリメチル10gの混合溶液を加えた後、65℃まで昇温させ、この温度にて2時間撹拌した。その後、減圧下で揮発分を留去することにより、末端にトリメチルシリル基を有する下記の式で表されるパーフルオロポリエーテル基含有シラン化合物の混合物(G)5gを得た。
・パーフルオロポリエーテル基含有シラン化合物の混合物(G):
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH2CH2Si[CH2CH2CH2Si(OCH3)3]2.2(OCH3)0.8
還流冷却器、温度計および撹拌機を取り付けた50mLの3つ口フラスコに、合成例3にて合成した末端にトリクロロシランを有するパーフルオロポリエーテル基含有トリクロロシラン化合物(C)2.5g、1,3-ビス(トリフルオロメチル)ベンゼン3.0gを仕込み、窒素気流下、5℃で30分間撹拌した。続いて、アリルマグネシウムブロマイドを0.7mol/L含むジエチルエーテル溶液を9.0ml加えた後、室温まで昇温させ、この温度にて10時間撹拌した。その後、5℃まで冷却し、メタノールを2ml加えた後、室温まで昇温させて不溶物をろ過した。続いて、減圧下で揮発分を留去した後、不揮発分をパーフルオロヘキサンで希釈し、分液ロートでメタノールによる洗浄操作(より詳細には、パーフルオロヘキサン相(フルオラス相)にフルオロ系化合物を維持し、メタノール相(有機相)に非フルオロ系化合物を分離除去する操作)を3回行った。続いて、減圧下で揮発分を留去することにより、末端にアリル基を有する下記のパーフルオロポリエーテル基含有アリル体(H)2.2gを得た。
・パーフルオロポリエーテル基含有アリル体(H):
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH2CH2Si[CH2CH2CH2Si(CH2CH=CH2)2.5(OCH3)0.5]3
還流冷却器、温度計、撹拌機を取り付けた50mLの3つ口フラスコに、合成例8にて合成した末端にアリル基を有するパーフルオロポリエーテル基含有アリル体(H)2.2g、1,3-ビス(トリフルオロメチル)ベンゼン5.0g、トリアセトキシメチルシラン7.0mg、トリクロロシラン1.5gを仕込み、窒素気流下、5℃で30分間撹拌した。続いて、1,3-ジビニル-1,1,3,3-テトラメチルジシロキサンのPt錯体を2%含むキシレン溶液を0.04ml加えた後、60℃まで昇温させ、この温度にて5時間撹拌した。その後、減圧下で揮発分を留去することにより、末端にトリクロロシランを有する下記のパーフルオロポリエーテル基含有トリクロロシラン化合物(I)2.2gを得た。
・パーフルオロポリエーテル基含有トリクロロシラン化合物(I):
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH2CH2Si[CH2CH2CH2Si(CH2CH2CH2SiCl3)2.5(OCH3)0.5]3
還流冷却器、温度計、撹拌機を取り付けた50mLの3つ口フラスコに、合成例9にて合成した末端にトリクロロシランを有するパーフルオロポリエーテル基含有トリクロロシラン化合物(I)2.2g、1,3-ビス(トリフルオロメチル)ベンゼン5.0gを加え、窒素気流下、50℃で30分間撹拌した。続いて、メタノール0.5gとオルソギ酸トリメチル17gの混合溶液を加えた後、65℃まで昇温させ、この温度にて3時間撹拌した。その後、室温まで冷却させて不溶物をろ過し、減圧下で揮発分を留去することにより、末端にトリメチルシリル基を有する下記のパーフルオロポリエーテル基含有シラン化合物(J)1.9gを得た。
・パーフルオロポリエーテル基含有シラン化合物(J):
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH2CH2Si{CH2CH2CH2Si[CH2CH2CH2Si(OCH3)3]2.5(OCH3)0.5}3
還流冷却器、温度計および撹拌機を取り付けた100mLの4つ口フラスコに、平均組成CF3O(CF2CF2O)15(CF2O)16CF2CH2OH(ただし、混合物中には(CF2CF2CF2CF2O)および/または(CF2CF2CF2O)の繰り返し単位を微量含む化合物も微量含まれる)で表されるパーフルオロポリエーテル変性アルコール体30g、1,3-ビス(トリフルオロメチル)ベンゼン20g、NaOH0.8gを仕込み、65℃で4時間撹拌した。続いて、アリルブロマイド2.4gを加えた後、65℃で6時間撹拌した。その後、室温まで冷却し、パーフルオロヘキサン20g加えて不溶物をろ過し、分液ロートで3N塩酸による洗浄操作(より詳細には、パーフルオロヘキサン相(フルオラス相)にフルオロ系化合物を維持し、塩酸層(水相)に非フルオロ系化合物を分離除去する操作)を3回行った。続いて、減圧下で揮発分を留去することにより、末端にアリル基を有する下記のパーフルオロポリエーテル基含有アリルオキシ体(K)24gを得た。
・パーフルオロポリエーテル基含有アリル体(K):
CF3O(CF2CF2O)15(CF2O)16CF2CH2OCH2CH=CH2
還流冷却器、温度計および撹拌機を取り付けた100mLの4つ口フラスコに、合成例11にて合成した末端にアリルオキシ基を有するパーフルオロポリエーテル基含有アリルオキシ化合物(K)20g、1,3-ビス(トリフルオロメチル)ベンゼン20g、トリアセトキシメチルシラン0.06g、トリクロロシラン1.80gを仕込み、窒素気流下、5℃で30分間撹拌した。続いて、1,3-ジビニル-1,1,3,3-テトラメチルジシロキサンのPt錯体を2%含むキシレン溶液を0.10ml加えた後、60℃まで昇温させ、この温度にて5時間撹拌した。その後、減圧下で揮発分を留去することにより、末端にトリクロロシランを有する下記式のパーフルオロポリエーテル基含有シラン化合物(L)20gを得た。
・パーフルオロポリエーテル基含有シラン化合物(L):
CF3O(CF2CF2O)15(CF2O)16CF2CH2OCH2CH2CH2SiCl3
還流冷却器、温度計および撹拌機を取り付けた100mLの4つ口フラスコに、合成例12にて合成した末端にトリクロロシランを有するパーフルオロポリエーテル基含有トリクロロシラン化合物(L)20g、1,3-ビス(トリフルオロメチル)ベンゼン20gを仕込み、窒素気流下、5℃で30分間撹拌した。続いて、アリルマグネシウムブロマイドを0.7mol/L含むジエチルエーテル溶液を35.2ml加えた後、室温まで昇温させ、この温度にて10時間撹拌した。その後、5℃まで冷却し、メタノールを5ml加えた後、室温まで昇温させて不溶物をろ過した。続いて、減圧下で揮発分を留去した後、不揮発分をパーフルオロヘキサンで希釈し、分液ロートでメタノールによる洗浄操作(より詳細には、パーフルオロヘキサン相(フルオラス相)にフルオロ系化合物を維持し、メタノール相(有機相)に非フルオロ系化合物を分離除去する操作)を3回行った。続いて、減圧下で揮発分を留去することにより、末端にアリル基を有する下記のパーフルオロポリエーテル基含有アリル体(M)18gを得た。
・パーフルオロポリエーテル基含有アリル体(M):
CF3O(CF2CF2O)15(CF2O)16CF2CH2OCH2CH2CH2Si(CH2CH=CH2)3
還流冷却器、温度計、撹拌機を取り付けた100mLの4つ口フラスコに、合成例13にて合成した末端にアリル基を有するパーフルオロポリエーテル基含有アリル体(M)15g、1,3-ビス(トリフルオロメチル)ベンゼン15g、トリアセトキシメチルシラン0.05g、トリクロロシラン4.2g仕込み、窒素気流下、5℃で30分間撹拌した。続いて、1,3-ジビニル-1,1,3,3-テトラメチルジシロキサンのPt錯体を2%含むキシレン溶液を0.15ml加えた後、60℃まで昇温させ、この温度にて5時間撹拌した。その後、減圧下で揮発分を留去することにより、末端にトリクロロシランを有する下記のパーフルオロポリエーテル基含有トリクロロシラン化合物(M)16gを得た。
・パーフルオロポリエーテル基含有トリクロロシラン化合物(N):
CF3O(CF2CF2O)15(CF2O)16CF2CH2OCH2CH2CH2Si(CH2CH2CH2SiCl3)3
還流冷却器、温度計、撹拌機を取り付けた100mLの4つ口フラスコに、合成例14にて合成した末端にトリクロロシランを有するパーフルオロポリエーテル基含有トリクロロシラン化合物(N)16g、1,3-ビス(トリフルオロメチル)ベンゼン15gを加え、窒素気流下、50℃で30分間撹拌した。続いて、メタノール1.04gとオルソギ酸トリメチル48gの混合溶液を加えた後、65℃まで昇温させ、この温度にて3時間撹拌した。その後、室温まで冷却させて不溶物をろ過し、減圧下で揮発分を留去することにより、末端にトリメチルシリル基を有する下記のパーフルオロポリエーテル基含有シラン化合物(O)16gを得た。
・パーフルオロポリエーテル基含有シラン化合物(O):
CF3O(CF2CF2O)15(CF2O)16CF2CH2OCH2CH2CH2Si[CH2CH2CH2Si(OCH3)3]3
(なお、平均組成としては、(CF2CF2CF2CF2O)の繰り返し単位が0.17個および(CF2CF2CF2O)の繰り返し単位が0.18個含まれていたが、微量のため省略した。)
(実施例1)
上記合成例4で得た化合物(D)を、濃度20wt%になるように、ハイドロフルオロエーテル(スリーエム社製、ノベックHFE7200)に溶解させて、表面処理剤1を調製した。
上記で調製した表面処理剤1を化学強化ガラス(コーニング社製、「ゴリラ」ガラス、厚さ0.7mm)上に真空蒸着した。真空蒸着の処理条件は、圧力3.0×10-3Paとし、まず、電子線蒸着方式により二酸化ケイ素を7nmの厚さで、この化学強化ガラスの表面に蒸着させて二酸化ケイ素膜を形成し、続いて、化学強化ガラス1枚(55mm×100mm)あたり、表面処理剤2mg(即ち、化合物(D)を0.4mg含有)を蒸着させた。その後、蒸着膜付き化学強化ガラスを、温度20℃および湿度65%の雰囲気下で24時間静置した。これにより、蒸着膜が硬化して、表面処理層が形成された。
化合物(D)に代えて、それぞれ、上記合成例7で得た化合物(G)、上記合成例10で得た化合物(J)および上記合成例15で得た化合物(O)を用いたこと以外は、実施例1と同様にして、表面処理剤を調製し、表面処理層を形成した。
化合物(D)に代えて、下記対照化合物1~5を用いたこと以外は、実施例1と同様にして、表面処理剤を調製し、表面処理層を形成した。
・対照化合物1
・対照化合物2
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CH2OCH2CH2CH2Si(OCH3)3
・対照化合物3
CF3O(CF2CF2O)17(CF2O)18CF2CH2OCH2CH2CH2Si(OCH3)3
・対照化合物4
(CH3O)3SiCH2CH2CH2OCH2CF2O(CF2CF2O)28(CF2O)26CF2CH2OCH2CH2CH2Si(OCH3)3
・対照化合物5
CF3CF2CF2O(CF2CF2CF2O)20CF2CF2CON[CH2CH2CH2Si(OCH3)3]2
・摩擦耐久性評価
上記の実施例および比較例にて基材表面に形成された表面処理層について、水の静的接触角を測定した。水の静的接触角は、接触角測定装置(協和界面科学社製)を用いて、水1μLにて実施した。
化学強化ガラス1枚あたりの表面処理剤の量を3mg(即ち、化合物(D)を0.6mg含有)としたこと以外は、実施例1と同様にして、表面処理層を形成した。
化合物(D)に代えて、化合物(O)を用いたこと以外は、実施例5と同様にして、表面処理剤を調製し、表面処理層を形成した。
化学強化ガラス1枚あたりの表面処理剤の量を1.5mg(即ち、化合物(D)を0.3mg含有)としたこと以外は、実施例1と同様にして、表面処理層を形成した。
化合物(D)に代えて、化合物(O)を用いたこと以外は、実施例7と同様にして、表面処理剤を調製し、表面処理層を形成した。
化合物(D)に代えて、対象化合物1を用いたこと以外は、実施例5と同様にして、表面処理剤を調製し、表面処理層を形成した。
化合物(D)に代えて、対象化合物3を用いたこと以外は、実施例5と同様にして、表面処理剤を調製し、表面処理層を形成した。
化合物(D)に代えて、対象化合物1を用いたこと以外は、実施例7と同様にして、表面処理剤を調製し、表面処理層を形成した。
化合物(D)に代えて、対象化合物3を用いたこと以外は、実施例7と同様にして、表面処理剤を調製し、表面処理層を形成した。
・摩擦耐久性評価
上記の実施例5~8および比較例6~9にて基材表面に形成された表面処理層について、上記試験例1と同様に、水の静的接触角を測定した。なお、実施例6は、20,000回往復した時点で、スチールウールが磨り減り、それ以上試験を続けることができなかった。
化合物(D)および下記の平均分子量が約25,000のパーフルオロポリエーテル化合物(P)(Solvay社製、FOMBLIN(品番)M60)を、質量比2:1の割合で、濃度20wt%(化合物(D)および化合物(P)の合計)になるようにハイドロフルオロエーテル(スリーエム社製、ノベックHFE7200)に溶解させて表面処理剤を調製した以外は、実施例1と同様にして(即ち、化学強化ガラス1枚あたりの表面処理剤の量は2mg)、表面処理層を形成した。
・パーフルオロポリエーテル化合物(P)
CF3O(CF2CF2O)139(CF2O)122(CF2CF2CF2O)4(CF2CF2CF2CF2O)4CF3
化合物(D)に代えて、化合物(O)を用いたこと以外は、実施例9と同様にして、表面処理剤を調製し、表面処理層を形成した。
化学強化ガラス1枚あたりの表面処理剤の量を3mgにしたこと以外は、実施例9と同様にして、表面処理層を形成した。
化合物(D)と化合物(P)の割合を、質量比1:1として表面処理剤を調製したこと以外は、実施例11と同様にして、表面処理層を形成した。
化合物(D)と化合物(P)の割合を、質量比1:2として表面処理剤を調製したこと以外は、実施例11と同様にして、表面処理層を形成した。
化学強化ガラス1枚あたりの表面処理剤の量を3mgにしたこと以外は、実施例10と同様にして、表面処理層を形成した。
化合物(O)と化合物(P)の割合を、質量比1:1として表面処理剤を調製したこと以外は、実施例14と同様にして、表面処理層を形成した。
化合物(O)と化合物(P)の割合を、質量比1:2として表面処理剤を調製したこと以外は、実施例14と同様にして、表面処理層を形成した。
・摩擦耐久性評価
上記の実施例9~16にて基材表面に形成された表面処理層について、上記試験例1と同様に、水の静的接触角を測定した。なお、実施例10~12および14~16は、20,000回往復した時点で、スチールウールが磨り減り、それ以上試験を続けることができなかった。
・滑り性の評価
上記の実施例1~16および比較例1~9にて基材表面に形成された表面処理層について、動摩擦係数を測定した。
(実施例17)
上記合成例4で得た化合物(D)を、濃度0.1wt%になるように、ハイドロフルオロエーテル(スリーエム社製、ノベックHFE7200)に溶解させて、表面処理剤2を調製した。
次に、市販の2流体ノズルを搭載したスプレー塗布装置を用いて、上記で調製した表面処理剤2をヘッドスピード70mm/secとして、化学強化ガラス(コーニング社製、「ゴリラ」ガラス、厚さ0.7mm)上に均一にスプレー塗布した。スプレー塗布の直前に、大気圧プラズマ発生装置(エネルコン・インダストリーズ社製、Dyne-A-Mite IT)を用いて、化学強化ガラス表面をプラズマ処理した。表面処理剤の塗布量は、化学強化ガラス1枚(55mm×100mm)あたり、表面処理剤0.2mlとした。その後、スプレー処理膜付き化学強化ガラスを、温度20℃および湿度65%の雰囲気下で48時間静置した。これにより、スプレー処理膜が硬化して、表面処理層が形成された。
化合物(D)および下記の平均分子量が約4,000のパーフルオロポリエーテル化合物(Q)(Solvay社製、FOMBLIN(品番)M03)を、質量比2:1の割合で、濃度0.1wt%(化合物(D)および化合物(Q)の合計)になるようにハイドロフルオロエーテル(スリーエム社製、ノベックHFE7200)に溶解させて表面処理剤を調製した以外は、実施例17と同様にして、表面処理層を形成した。
・パーフルオロポリエーテル化合物(Q)
CF3O(CF2CF2O)20(CF2O)19(CF2CF2CF2O)1(CF2CF2CF2CF2O)1CF3
化合物(D)および平均分子量が約4,000のパーフルオロポリエーテル化合物(Q)を、質量比1:1の割合で、濃度0.1wt%(化合物(D)および化合物(Q)の合計)になるようにハイドロフルオロエーテル(スリーエム社製、ノベックHFE7200)に溶解させて表面処理剤を調製した以外は、実施例17と同様にして、表面処理層を形成した。
化合物(D)に代えて、上記合成例15で得た化合物(O)を用いたこと以外は、実施例17と同様にして、表面処理剤を調製し、表面処理層を形成した。
化合物(D)に代えて、上記対照化合物1を用いたこと以外は、実施例17と同様にして、表面処理剤を調製し、表面処理層を形成した。
対照化合物1および平均分子量が約4,000のパーフルオロポリエーテル化合物(Q)を、質量比2:1の割合で、濃度0.1wt%(対照化合物1および化合物(Q)の合計)になるようにハイドロフルオロエーテル(スリーエム社製、ノベックHFE7200)に溶解させて表面処理剤を調製した以外は、実施例17と同様にして、表面処理層を形成した。
対照化合物1および平均分子量が約4,000のパーフルオロポリエーテル化合物(Q)を、質量比1:1の割合で、濃度0.1wt%(対照化合物1および化合物(Q)の合計)になるようにハイドロフルオロエーテル(スリーエム社製、ノベックHFE7200)に溶解させて表面処理剤を調製した以外は、実施例17と同様にして、表面処理層を形成した。
化合物(D)に代えて対照化合物3を用いたこと以外は、実施例17と同様にして、表面処理剤を調製し、表面処理層を形成した。
・摩擦耐久性評価
上記の実施例17~20および比較例10~13にて基材表面に形成された表面処理層について、上記試験例1と同様に、水の静的接触角を測定した。
・滑り性の評価
上記の実施例17~20および比較例10~13にて基材表面に形成された表面処理層について、上記試験例4と同様に、動摩擦係数を測定した。
Claims (41)
- 式(1a)または式(1b):
Rfは、-(OC4F8)a-(OC3F6)b-(OC2F4)c-(OCF2)d-を表し、ここに、a、b、cおよびdは、それぞれ独立して0以上200以下の整数であって、a、b、cおよびdの和は少なくとも1であり、a、b、cまたはdを付して括弧でくくられた各繰り返し単位の存在順序は式中において任意であり、
Xは、2価の有機基を表し、
Yは、各出現において、それぞれ独立して、水酸基、加水分解可能な基、または炭化水素基を表し、
Qは、各出現において、それぞれ独立して、-Z-SiR1 nR2 3-nを表し、
Zは、各出現において、それぞれ独立して、2価の有機基を表し:ただし、Zは、式(1a)または式(1b)における分子主鎖の末端のSi原子とシロキサン結合を形成するものを除く、
R1は、各出現において、それぞれ独立して、水酸基または加水分解可能な基を表し、
R2は、各出現において、それぞれ独立して、C1-22アルキル基、またはQ’を表し、
Q’は、Qと同意義であり、
nは、各QおよびQ’において、それぞれ独立して、0~3から選択される整数であって、nの総和は1以上であり、
Q中、Z基を介して直鎖状に連結されるSiは最大で5個であり、
kは、それぞれ独立して、1~3から選択される整数である。)
で表されるパーフルオロ(ポリ)エーテル基含有シラン化合物。 - kが3である、請求項1に記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。
- Q中、Z基を介して直鎖状に連結されるSiが1個または2個である、請求項1または2に記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。
- Q中、Z基を介して直鎖状に連結されるSiが1個である、請求項1~3のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。
- Aが、C1-16パーフルオロアルキル基である、請求項1~4のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。
- Rfが下記式(a)または(b):
(a)-(OC3F6)b-
(式中、bは1以上200以下の整数である);または
(b)-(OC4F8)a-(OC3F6)b-(OC2F4)c-(OCF2)d-
(式中、aおよびbは、それぞれ独立して0以上30以下の整数であり、cおよびdは、それぞれ独立して1以上200以下整数であり、a、b、cおよびdの和は、10以上200以下であり、添字a、b、cまたはdを付して括弧でくくられた各繰り返し単位の存在順序は、式中において任意である)
である、
請求項1~5のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。 - Rfにおいて:
-(OC4F8)a-が、-(OCF2CF2CF2CF2)a-であり、
-(OC3F6)b-が、-(OCF2CF2CF2)b-であり、
-(OC2F4)c-が、-(OCF2CF2)c-である、
請求項1~6のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。 - Xが、-(R6)p-(X1)q-R7-
[式中:
R6は、-(CH2)s-またはo-、m-もしくはp-フェニレン基を表し、
R7は、-(CH2)t-またはo-、m-もしくはp-フェニレン基を表し、
X1は、-(X2)r-を表し、
X2は、各出現において、それぞれ独立して、-O-、-S-、o-、m-もしくはp-フェニレン基、-C(O)O-、-CONR5-、-O-CONR5-、-NR5-、-Si(R3)2-、-(Si(R3)2O)m-Si(R3)2-および-(CH2)v-からなる群から選択される基を表し、
R3は、各出現において、それぞれ独立して、フェニル基またはC1-6アルキル基を表し、
R5は、各出現において、それぞれ独立して、水素原子、フェニル基またはC1-6アルキル基を表し、
mは、各出現において、それぞれ独立して、1~100の整数であり、
vは、各出現において、それぞれ独立して、1~20の整数であり、
sは、1~20の整数であり、
tは、1~20の整数であり、
rは、1~10の整数であり、
pは、0または1であり、
qは、0または1である。]
で表される基である、請求項1~7のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。 - Xが、C1-20アルキレン基、-R6-X3-R7-、または-X4-R7-
[式中、X3は、-O-、-S-、-C(O)O-、-CONR5-、-O-CONR5-、-Si(R3)2-、-(Si(R3)2O)m-Si(R3)2-、-O-(CH2)u-(Si(R3)2O)m-Si(R3)2-、-CONR5-(CH2)u-(Si(R3)2O)m-Si(R3)2-、
-CONR5-(CH2)v-N(R5)-、または-CONR5-(o-、m-またはp-フェニレン)-Si(R3)2-を表し、
X4は、-S-、-C(O)O-、-CONR5-、-CONR5-(CH2)u-(Si(R3)2O)m-Si(R3)2-、-CONR5-(CH2)v-N(R5)-、または-CONR5-(o-、m-またはp-フェニレン)-Si(R3)2-を表し、
uは1~20の整数であり、
R3、R5、R6、R7、mおよびvは、請求項8の記載と同意義である。]
である、請求項1~8のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。 - R6が-(CH2)s-であり、R7が-(CH2)t-である[式中、sおよびtは、請求項8の記載と同意義である。]、請求項8または9に記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。
- Xが、C1-20アルキレン基、-(CH2)s-O-(CH2)t-、-(CH2)s-(Si(R3)2O)m-Si(R3)2-(CH2)t-、または-(CH2)s-O-(CH2)u-(Si(R3)2O)m-Si(R3)2-(CH2)t-
[式中、R3、s、tおよびmは、請求項8の記載と同意義であり、uは、請求項9の記載と同意義である。]
である、請求項1~10のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。 - Xが:
-CH2O(CH2)2-、
-CH2O(CH2)3-、
-CH2O(CH2)6-、
-CH2O(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)2Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-、
-(CH2)2-、
-(CH2)3-、
-(CH2)4-、
-(CH2)6-、
-CONH-(CH2)3-、
-CON(CH3)-(CH2)3-、
-CON(Ph)-(CH2)3-(式中、Phはフェニルを意味する)、
-CONH-(CH2)6-、
-CON(CH3)-(CH2)6-、
-CON(Ph)-(CH2)6-(式中、Phはフェニルを意味する)、
-CONH-(CH2)2NH(CH2)3-、
-CONH-(CH2)6NH(CH2)3-、
-CH2O-CONH-(CH2)3-、
-CH2O-CONH-(CH2)6-、
-S-(CH2)3-、
-(CH2)2S(CH2)3-、
-CONH-(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-
-C(O)O-(CH2)3-、
-C(O)O-(CH2)6-、
からなる群から選択される、請求項1~9のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。 - Yが、各出現において、それぞれ独立して、水酸基、-O(R5)(式中、R5はC1-12アルキル基を表す)、C1-12アルキル基、C2-12アルケニル基、C2-12アルキニル基およびフェニル基からなる群から選択される、請求項1~12のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。
- Yが、各出現において、それぞれ独立して、水酸基または-O(R5)(式中、R5はC1-12アルキル基を表す)である、請求項1~13のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。
- Q中、nが3である、請求項1~13のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。
- Aが、C1-16パーフルオロアルキル基であり、
Rfが下記式(a)または(b):
(a)-(OC3F6)b-
(式中、bは1以上200以下の整数である);または
(b)-(OC4F8)a-(OC3F6)b-(OC2F4)c-(OCF2)d-
(式中、aおよびbは、それぞれ独立して0以上30以下の整数であり、cおよびdは、それぞれ独立して1以上200以下整数であり、a、b、cおよびdの和は、10以上200以下であり、添字a、b、cまたはdを付して括弧でくくられた各繰り返し単位の存在順序は、式中において任意である)
であり、
Xが、C1-20アルキレン基、-(CH2)s-O-(CH2)t-、-(CH2)s-(Si(R3)2O)m-Si(R3)2-(CH2)t-、または-(CH2)s-O-(CH2)u-(Si(R3)2O)m-Si(R3)2-(CH2)t-
[式中、 sは、1~20の整数であり、
tは、1~20の整数であり、
R3は、各出現において、それぞれ独立して、C1-6アルキル基を表し、
mは1~100の整数であり、
uは1~20の整数である]
であり、
nが3であり、
kが3である、
請求項1~15のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。 - A-Rf-部の数平均分子量が、500~30,000である、請求項1~16のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。
- 2,000~32,000の数平均分子量を有する、請求項1~17のいずれかに記載のパーフルオロ(ポリ)エーテル基含有シラン化合物。
- 請求項1に記載の式(1a)または式(1b)で表されるパーフルオロ(ポリ)エーテル基含有シラン化合物の製造方法であって、下記工程:
工程(1):式(1a-1)または式(1b-1):
で表される化合物を、HSiM3(式中、Mは、それぞれ独立して、ハロゲン原子またはC1-6アルコキシ基である)と反応させて、式(1a-2)または式(1b-2):
で表される化合物を得る工程;
工程(2):上記式(1a-2)または式(1b-2)で表される化合物を、
式:Hal-J-Z’-CH=CH2(式中、Z’は結合または2価の有機基を表し、Jは、Mg、Cu、PdまたはZnを表し、Halはハロゲン原子を表す。)
で表される化合物、および、所望により
式:YhL(式中、Yは請求項1の記載と同意義であり、Lは、Yと結合可能な基を表し、hは1~3の整数である。)
で表される化合物と反応させて、式(1a-3)または式(1b-3):
で表される化合物を得る工程;および
工程(3):式(1a-3)または式(1b-3)で表される化合物を、HSiM3(式中、Mは上記と同意義である)および、所望により
式:R1 iL’(式中、R1は請求項1の記載と同意義であり、L’は、R1と結合可能な基を表し、iは1~3の整数である。)
で表される化合物、および/または
式:R2’ jL”(式中、R2’は、C1-22アルキル基を表し、L”は、R2’と結合可能な基を表し、jは1~3の整数である。)
で表される化合物と反応させる工程、
を含む方法。 - 請求項1に記載の式(1a)または式(1b)で表されるパーフルオロ(ポリ)エーテル基含有シラン化合物の製造方法であって、下記工程:
工程(1):式(1a-1)または式(1b-1):
で表される化合物を、HSiM3(式中、Mは、それぞれ独立して、ハロゲン原子またはC1-6アルコキシ基である)と反応させて、式(1a-2)または式(1b-2):
で表される化合物を得る工程;
工程(2’):上記式(1a-2)または式(1b-2)で表される化合物を、
式:G-Z’-CH=CH2(式中、Z’は結合または2価の有機基を表し、Gは、Li、NaまたはKを表す。)
で表される化合物、および、所望により
式:YhL(式中、Yは請求項1の記載と同意義であり、Lは、Yと結合可能な基を表し、hは1~3の整数である。)
で表される化合物と反応させて、式(1a-3)または式(1b-3):
で表される化合物を得る工程;および
工程(3):式(1a-3)または式(1b-3)で表される化合物を、HSiM3(式中、Mは上記と同意義である)および、所望により
式:R1 iL’(式中、R1は請求項1の記載と同意義であり、L’は、R1と結合可能な基を表し、iは1~3の整数である。)
で表される化合物、および/または
式:R2’ jL”(式中、R2’は、C1-22アルキル基を表し、L”は、R2’と結合可能な基を表し、jは1~3の整数である。)
で表される化合物と反応させる工程、
を含む方法。 - 請求項21に記載の式(1a-3’)または式(1b-3’)で表される化合物の製造方法であって:
式(1a-2’)または式(1b-2’):
で表される化合物を、
式:Hal-J-Z’-CH=CH2(式中、Z’は、請求項6の記載と同意義であり、Jは、Mg、Cu、PdまたはZnを表し、Halはハロゲン原子を表す。)
で表される化合物、および、所望により
式:YhL(式中、Yは、請求項1の記載と同意義であり、Lは、Yと結合可能な基を表し、hは1~3の整数である。)
で表される化合物と反応させる工程を含む方法。 - 請求項1~18のいずれかに記載の式(1a)および/または式(1b)で表される少なくとも1種のパーフルオロ(ポリ)エーテル基含有シラン化合物を含有する、表面処理剤。
- 含フッ素オイル、シリコーンオイル、および触媒から選択される1種またはそれ以上の他の成分をさらに含有する、請求項24に記載の表面処理剤。
- 含フッ素オイルが、式(3):
R21-(OC4F8)a’-(OC3F6)b’-(OC2F4)c’-(OCF2)d’-R22
・・・(3)
[式中:
R21は、1個またはそれ以上のフッ素原子により置換されていてもよい炭素数1~16のアルキル基を表し;
R22は、1個またはそれ以上のフッ素原子により置換されていてもよい炭素数1~16のアルキル基、フッ素原子または水素原子を表し;
a’、b’、c’およびd’は、ポリマーの主骨格を構成するパーフルオロ(ポリ)エーテルの4種の繰り返し単位数をそれぞれ表わし、互いに独立して0以上300以下の整数であって、a’、b’、c’およびd’の和は少なくとも1であり、添字a’、b’、c’またはd’を付して括弧でくくられた各繰り返し単位の存在順序は、式中において任意である。]
で表される1種またはそれ以上の化合物である、請求項25に記載の表面処理剤。 - 含フッ素オイルが、式(3a)または(3b):
R21-(OCF2CF2CF2)b’’-R22 ・・・(3a)
R21-(OCF2CF2CF2CF2)a’’-(OCF2CF2CF2)b’’-(OCF2CF2)c’’-(OCF2)d’’-R22 ・・・(3b)
[式中:
R21は、1個またはそれ以上のフッ素原子により置換されていてもよい炭素数1~16のアルキル基を表し;
R22は、1個またはそれ以上のフッ素原子により置換されていてもよい炭素数1~16のアルキル基、フッ素原子または水素原子を表し;
式(3a)において、b’’は1以上100以下の整数であり;
式(3b)において、a’’およびb’’は、それぞれ独立して0以上30以下の整数であり、c’’およびd’’は、それぞれ独立して1以上300以下の整数であり;
添字a’’、b’’、c’’またはd’’を付して括弧でくくられた各繰り返し単位の存在順序は、式中において任意である。]
で表される1種またはそれ以上の化合物である、請求項25または26に記載の表面処理剤。 - 少なくとも式(3b)で表される1種またはそれ以上の化合物を含む、請求項27に記載の表面処理剤。
- 式(3a)で表される化合物および式(3b)で表される化合物を、1:1~1:30の質量比で含む、請求項27または28に記載の表面処理剤。
- 式(3a)で表される化合物および式(3b)で表される化合物を、1:1~1:10の質量比で含む、請求項27~29のいずれかに記載の表面処理剤。
- 請求項1~4のいずれかに記載の式(1a)または式(1b)で表される少なくとも1種のパーフルオロ(ポリ)エーテル基含有シラン化合物と、式(3b)で表される化合物との質量比が、4:1~1:4である、請求項28~30のいずれかに記載の表面処理剤。
- 式(3a)で表される化合物が、2,000~8,000の数平均分子量を有する、請求項27~31のいずれかに記載の表面処理剤。
- 式(3b)で表される化合物が、2,000~30,000の数平均分子量を有する、請求項27~31のいずれかに記載の表面処理剤。
- 式(3b)で表される化合物が、8,000~30,000の数平均分子量を有する、請求項27~31のいずれかに記載の表面処理剤。
- さらに溶媒を含む、請求項24~34のいずれかに記載の表面処理剤。
- 防汚性コーティング剤として使用される、請求項24~35のいずれかに記載の表面処理剤。
- 真空蒸着用である、請求項24~36のいずれかに記載の表面処理剤。
- 請求項24~37のいずれかに記載の表面処理剤を含有するペレット。
- 基材と、該基材の表面に、請求項1~18のいずれかに記載の化合物または請求項24~37のいずれかに記載の表面処理剤より形成された層とを含む物品。
- 前記物品が光学部材である、請求項39に記載の物品。
- 前記物品がディスプレイである、請求項39に記載の物品。
Priority Applications (5)
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CN201380057304.5A CN104769009B (zh) | 2012-11-05 | 2013-10-31 | 含全氟(聚)醚基硅烷化合物 |
US14/440,192 US10563070B2 (en) | 2012-11-05 | 2013-10-31 | Silane compound containing perfluoro(poly)ether group |
KR1020157010715A KR101743851B1 (ko) | 2012-11-05 | 2013-10-31 | 퍼플루오로(폴리)에테르기 함유 실란 화합물 |
EP13852235.4A EP2915833B1 (en) | 2012-11-05 | 2013-10-31 | Silane compound containing perfluoro(poly)ether group |
US16/697,030 US11193026B2 (en) | 2012-11-05 | 2019-11-26 | Silane compound containing perfluoro (poly)ether group |
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JP2013-023133 | 2013-02-08 | ||
JP2013083921 | 2013-04-12 | ||
JP2013-083921 | 2013-04-12 |
Related Child Applications (2)
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US14/440,192 A-371-Of-International US10563070B2 (en) | 2012-11-05 | 2013-10-31 | Silane compound containing perfluoro(poly)ether group |
US16/697,030 Division US11193026B2 (en) | 2012-11-05 | 2019-11-26 | Silane compound containing perfluoro (poly)ether group |
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Country Status (7)
Country | Link |
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US (2) | US10563070B2 (ja) |
EP (1) | EP2915833B1 (ja) |
JP (1) | JP5761305B2 (ja) |
KR (1) | KR101743851B1 (ja) |
CN (1) | CN104769009B (ja) |
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Also Published As
Publication number | Publication date |
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TW201425382A (zh) | 2014-07-01 |
EP2915833A1 (en) | 2015-09-09 |
CN104769009A (zh) | 2015-07-08 |
JP2014218639A (ja) | 2014-11-20 |
EP2915833B1 (en) | 2018-06-06 |
US20200095433A1 (en) | 2020-03-26 |
TWI549987B (zh) | 2016-09-21 |
JP5761305B2 (ja) | 2015-08-12 |
US11193026B2 (en) | 2021-12-07 |
KR101743851B1 (ko) | 2017-06-05 |
EP2915833A4 (en) | 2016-07-06 |
KR20150060914A (ko) | 2015-06-03 |
US20150307719A1 (en) | 2015-10-29 |
CN104769009B (zh) | 2017-08-11 |
US10563070B2 (en) | 2020-02-18 |
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