WO2012095907A1 - 半導体装置及びフリップチップ実装品 - Google Patents
半導体装置及びフリップチップ実装品 Download PDFInfo
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- WO2012095907A1 WO2012095907A1 PCT/JP2011/005886 JP2011005886W WO2012095907A1 WO 2012095907 A1 WO2012095907 A1 WO 2012095907A1 JP 2011005886 W JP2011005886 W JP 2011005886W WO 2012095907 A1 WO2012095907 A1 WO 2012095907A1
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- Prior art keywords
- semiconductor device
- protective film
- seal ring
- opening
- film
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 125
- 239000011229 interlayer Substances 0.000 claims abstract description 46
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 230000001681 protective effect Effects 0.000 claims description 134
- 239000010410 layer Substances 0.000 claims description 77
- 230000015572 biosynthetic process Effects 0.000 claims description 39
- 239000010949 copper Substances 0.000 claims description 9
- 238000002955 isolation Methods 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 229920001721 polyimide Polymers 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 238000007789 sealing Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 description 12
- 239000000463 material Substances 0.000 description 11
- 230000000630 rising effect Effects 0.000 description 10
- 230000003647 oxidation Effects 0.000 description 7
- 238000007254 oxidation reaction Methods 0.000 description 7
- 230000004888 barrier function Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000004299 exfoliation Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 229910020177 SiOF Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910020836 Sn-Ag Inorganic materials 0.000 description 1
- 229910020888 Sn-Cu Inorganic materials 0.000 description 1
- 229910020882 Sn-Cu-Ni Inorganic materials 0.000 description 1
- 229910020988 Sn—Ag Inorganic materials 0.000 description 1
- 229910019204 Sn—Cu Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3192—Multilayer coating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/585—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries comprising conductive layers or plates or strips or rods or rings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
- H01L2224/131—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/13101—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
- H01L2224/13111—Tin [Sn] as principal constituent
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/73—Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0133—Ternary Alloys
Definitions
- the present disclosure relates to a semiconductor device having a seal ring formed around a chip region.
- scribe line scribe line
- the chip area around the scribe line may receive a mechanical shock and affect the separated chip (that is, the semiconductor device). Specifically, cracks, chips, etc. occur in the dicing section of the semiconductor device, which affects the circuit formation region of the semiconductor device. In addition, the circuit formation region of the semiconductor device may be affected by moisture, ions, etc. contained in the ambient atmosphere.
- a protective structure called a seal ring may be provided inside the dicing portion, that is, near the edge portion of the chip (die). Further, as a means for protecting the surface of the semiconductor device, a protective film may be provided on the surface.
- Patent Document 1 is an example of such a configuration. The description will be described below.
- FIG. 11 shows a schematic configuration of the semiconductor device 100 of Patent Document 1.
- the semiconductor device 100 is configured using a semiconductor substrate 101.
- a plurality of layers (here, three layers) of interlayer insulating films 111a, 111b, and 111c (hereinafter, sometimes collectively referred to as an interlayer insulating film 111) are stacked.
- a circuit formation region 102 where wirings, circuits and the like are formed and a dicing region 103 where dicing is performed are provided, and a seal ring 104 is provided in the interlayer insulating film 111 between them.
- the seal ring 104 functions as a barrier against crack extension caused by moisture and stress entering from the cut surface of the interlayer insulating film 111 exposed by dicing.
- the seal ring 104 includes a plurality of seal layers (individual illustration is omitted) that are continuously stacked, and the seal layer 105 that constitutes the uppermost portion is made of, for example, aluminum.
- a first protective film 106 made of a silicon nitride film formed by plasma nitriding is formed on the interlayer insulating film 111 so as to cover the seal layer 105. Further thereon, a second protective film 107 made of a polyimide film is formed. Here, the first protective film 106 and the second protective film 107 cover the circuit forming region 102, the seal ring 104, and the dicing region 103.
- the shape of the second protective film 107 which is a polyimide film, may become unstable, and peeling due to the shape may occur.
- an object of the present disclosure is to obtain a highly reliable semiconductor device by ensuring shape stability and peel resistance of a protective film in a semiconductor device having a seal ring and a protective film.
- the inventors of the present application examined the cause of problems such as shape instability and peeling of the second protective film, which is a polyimide film.
- the shape variation when forming the second protective film end portion position accuracy variation, etc.
- the base shape etc.
- the inventors conceived to define the structure of the seal ring and its vicinity, such as the positional relationship of the end portion of the second protective film with respect to the seal ring.
- the semiconductor device of the present disclosure includes a substrate having a circuit formation region, an interlayer insulating film formed on the substrate, a first seal ring formed in the interlayer insulating film and surrounding the circuit forming region, and an interlayer A first protective film formed in a circuit formation region on the insulating film and a region including above the first seal ring, and a second protective film formed on the first protective film and inside the first seal ring;
- the first protective film includes a first surface in contact with the second protective film, a second surface located immediately above the first seal ring, and a third surface connected from the first surface to the second surface. And the end portion of the second protective film is located more inside than the third surface.
- a first opening may be provided immediately above the first seal ring in the first protective film.
- a second opening may be provided outside the first seal ring in the first protective film.
- the interlayer insulating film may have at least one second seal ring surrounding the first seal ring.
- the plurality of seal rings surround the circuit formation region more than twice, and the effect of protecting the circuit formation region from moisture entering from the cut surface of the interlayer insulating film, crack extension due to stress, etc. is more effective.
- the first seal ring is located on the innermost side (circuit formation region side), and since the end portion of the second protective film is located on the inner side of the third surface located above the first seal ring, The effect of improving the shape stability and peel resistance of the second protective film is ensured.
- the second opening may be disposed between the first seal ring and the second seal ring.
- the second opening may be formed so as to penetrate the first protective film.
- the second opening may be formed so as to avoid reaching the interlayer insulating film immediately below the first protective film.
- inspection wiring or the like may be provided outside the seal ring, and it is desirable to avoid exposure. Further, exposure of the seal layer itself constituting the seal ring can be avoided.
- the second opening may be arranged so as to surround the first seal ring.
- the second opening may be arranged so as to continuously surround the first seal ring.
- the first protective film has a first opening immediately above the first seal ring, and the first protective film has a second opening on the outside of the first seal ring.
- the second opening may be deeper than the first opening.
- a third opening may be provided outside the second seal ring in the first protective film.
- the third opening may be deeper than the second opening.
- the second opening may be deeper than the third opening.
- the second seal ring may be the outermost seal ring.
- openings may be arranged immediately above all seal rings in the first protective film.
- the first seal ring may include a plurality of stacked seal layers and a cap layer formed on the uppermost seal layer.
- the seal layer may be made of copper (Cu) and the cap layer may be made of aluminum (Al).
- the width of the cap layer may be larger than the width of the uppermost seal layer.
- end portion of the second protective film may be located between the third surface and the circuit formation region.
- the circuit formation region can be protected by the second protective film, and the shape stability and peel resistance of the second protective film can be improved.
- the upper surface of the first protective film where the end of the second protective film is located may be substantially flat.
- an isolation region that avoids the formation of circuits and wirings is provided between the first seal ring and the circuit formation region, and the upper surface of the first protective film is substantially flat in the isolation region, and the second protective film The end of may be located on the isolation region.
- the distance between the seal ring and the circuit formation region is ensured, and the effect of protecting the circuit formation region from moisture, cracks, etc. can be enhanced.
- the region where the end portion of the second protective film can be located is widened, the end portion is located in a necessary region even when the end portion position accuracy varies when forming the second protective film.
- the second protective film can be formed stably.
- the interlayer insulating film may include a low dielectric constant film.
- the interlayer insulating film may include an ultra-low dielectric constant film.
- the entire interlayer insulating film is composed of a low dielectric constant film (low-k film) or an ultra-low dielectric constant film (Extremely Low-k (ELK) film), or a low dielectric constant film or an ultra-low dielectric constant film. It may consist of a laminated structure including. As a result, high speed and low power consumption of the semiconductor device can be realized.
- a plurality of bumps arranged in a grid shape may be provided on the back surface of the substrate under the circuit formation region.
- the bumps may be arranged only under the circuit formation region and not under the seal ring.
- the first protective film may be made of a silicon nitride film
- the second protective film may be made of a polyimide film.
- each material it may be like this.
- the surface of the second protective film may be higher than the second surface of the first protective film.
- the flip chip mounted product of the present disclosure has a structure in which any semiconductor device of the present disclosure is flip chip mounted on a mounting substrate.
- Such a flip-chip mounting product has high reliability of the mounted semiconductor device and supports high density mounting.
- the shape stability and peel resistance of the protective film for protecting the chip surface can be improved, and a highly reliable semiconductor device can be obtained.
- FIGS. 1A and 1B are a cross-sectional view and a plan view schematically illustrating an exemplary semiconductor device according to an embodiment of the present disclosure.
- FIG. 2 is a cross-sectional view schematically illustrating a modification example of the exemplary semiconductor device according to the embodiment of the present disclosure.
- FIG. 3 is a cross-sectional view schematically illustrating a modification example of the exemplary semiconductor device according to the embodiment of the present disclosure.
- FIG. 4 is a cross-sectional view schematically illustrating a modification example of the exemplary semiconductor device according to the embodiment of the present disclosure.
- FIGS. 5A and 5B are a cross-sectional view and a plan view schematically showing a modification of the exemplary semiconductor device according to the embodiment of the present disclosure.
- FIG. 6 is a cross-sectional view schematically illustrating a modified example of the exemplary semiconductor device according to the embodiment of the present disclosure.
- FIG. 7 is a cross-sectional view schematically illustrating a modified example of the exemplary semiconductor device according to the embodiment of the present disclosure.
- FIG. 8 is a cross-sectional view schematically illustrating a modified example of the exemplary semiconductor device according to the embodiment of the present disclosure.
- FIG. 9 is a plan view schematically illustrating bumps provided in an exemplary semiconductor device according to an embodiment of the present disclosure.
- FIG. 10 is a cross-sectional view schematically illustrating a state in which an exemplary semiconductor device according to an embodiment of the present disclosure is flip-chip mounted using bumps.
- FIG. 11 is a cross-sectional view schematically showing a semiconductor device of the background art.
- FIGS. 1A and 1B are diagrams schematically showing an exemplary semiconductor device 50
- FIG. 1A which is a cross-sectional view, is a plan view of Ia-Ia ′ in FIG. Corresponds to a line.
- the semiconductor device 50 is formed using a semiconductor substrate 1 such as a silicon substrate.
- a semiconductor substrate 1 such as a silicon substrate.
- an interlayer insulating film 11 having a structure in which a plurality of layers (three layers in the example of FIG. 1) of insulating films 11a, 11b, and 11c are stacked is formed.
- a circuit formation region 2 in which wirings, circuits, and the like are formed is provided on the center side of the semiconductor device 50, and a dicing region 3 is provided on the outside so as to surround the periphery.
- Wiring and contact portions are formed in the interlayer insulating film 11 in the circuit formation region 2 so as to be electrically connected to elements such as transistors formed on the semiconductor substrate 1 (not shown).
- a seal ring 4 is formed between the circuit forming region 2 and the dicing region 3 so as to be embedded in the interlayer insulating film 11.
- the seal layers 4a and 4b formed by using the formation process of the contact portion and the wiring layer formed in each layer of the interlayer insulating film 11 and the cap layer 5 formed in the uppermost portion are continuous. And have a laminated structure.
- the seal layers 4 a and 4 b are formed using, for example, copper (Cu), and a barrier metal layer (not shown) made of, for example, TaN is formed between the seal layer and the interlayer insulating film 11. This prevents the material constituting the seal layer (contact portion and wiring layer) from coming into direct contact with the interlayer insulating film 11.
- the opening of the interlayer insulating film 11 (more specifically, the opening of the insulating film 11 c) is convex with respect to the upper surface of the interlayer insulating film 11 (a shape protruding upward).
- the cap layer 5 may be provided as a seal layer formed so as to form The cap layer 5 is formed so as to cover the opening.
- a first protective film 6 is formed on the interlayer insulating film 11 so as to cover a range from the circuit formation region 2 to the dicing region 3 including the cap layer 5.
- the first protective film 6 is preferably a silicon nitride film formed by plasma nitriding, for example, and the film thickness is preferably about 0.6 ⁇ m. However, neither material nor film thickness is limited to this.
- the upper surface of the cap layer 5 has a shape recessed along the opening of the insulating film 11c, and the upper surface of the first protective film 6 is recessed above it to form the opening 31.
- a second protective film 7 is formed on the first protective film 6.
- a material and film thickness of the 2nd protective film 7 it is suitable to form, for example with a polyimide, and a film thickness shall be about 5 micrometers. However, it is not limited to these.
- the shape of the second protective film 7 becomes unstable.
- the inventors of the present application have found that peeling or the like resulting from the above occurs. The cause of this is due to the influence of the shape variation of the second protective film 7 (end portion position accuracy variation, etc.), the base shape and the like.
- the width of the seal ring 4 (cap layer 5) is 4 ⁇ m
- the width of the rising portion 8 of the first protective film 6 covering the seal ring 4 (cap layer 5) is 10 ⁇ m.
- the end portion of the second protective film 7 is designed to be positioned on the rising portion 8 of the first protective film 6. In such a case, if the positional accuracy variation of the end portion of the second protective film 7 is ⁇ 5 ⁇ m or more, the cross-sectional shape of the end portion of the second protective film 7 has a large difference depending on the location. As a result, the shape of the second protective film 7 may become unstable, and peeling due to the shape may occur.
- the end portion of the second protective film 7 is located outside the seal ring 4 (as viewed from the circuit forming region 2 side) is not desirable. This is because the second protective film 7 having a uniform film thickness cannot be formed depending on the rising degree (degree of protrusion) of the first protective film 6 following the shape of the seal ring 4 and its upper part and the surface form. Because there are cases.
- the end of the second protective film 7 is located on the inner side of the seal ring 4 as viewed from the circuit forming region 2 and does not reach the rising part 8 of the first protective film 6.
- This may be paraphrased as follows. That is, among the surfaces of the first protective film 6, the flat surface inside the seal ring 4 and substantially covered with the second protective film 7 is the first surface 6 a, and the surface above the seal ring 4 is the second surface. A surface connecting the first surface 6b to the second surface is referred to as a third surface 6c.
- the end portion of the second protective film 7 is positioned on the inner side of the third surface 6c when viewed from the circuit forming region side.
- the end of the second protective film 7 is positioned at least 5 ⁇ m inside from the rising portion 8 (third surface 6c).
- the end of the second protective film 7 can be prevented from reaching the rising portion 8.
- the second protective film 7 is formed on the flat first protective film 6 located on the circuit forming region 2 side, thereby suppressing shape instability, peeling, and the like. it can.
- the cap layer 5 is made of, for example, aluminum (Al).
- Al aluminum
- the material of the cap layer 5 and the seal layer 4b below the cap layer 5 is not limited to the aluminum and copper.
- the insulating films 11a, 11b, and 11c constituting the interlayer insulating film 11 are not particularly limited.
- An oxide film (TEOS oxide film) may be used.
- FIG. 2 is a diagram showing a schematic cross section of a modified semiconductor device 50a.
- FIG. 1A the same reference numerals as those in FIG. 1A are used for the same components as those of the semiconductor device 50 in FIGS. 1A and 1B, and differences will be described in detail below.
- the cap layer 5 made of Al is provided on the seal layer 4b made of Cu so as to fill the opening provided in the insulating film 11c and to be in contact with the seal layer 4b. It has been.
- the cap layer 5 protrudes from the upper surface of the insulating film 11c.
- the opening of the insulating film 11c is filled with a seal layer 9 made of Cu formed by plating or the like, and the seal layer 9 is in contact with the upper surface of the seal layer 4b. Further, a cap layer 5 made of Al is formed on the insulating film 11 c so as to cover the seal layer 9. Since the cap layer 5 has a wider width than the seal layer 9, the cap layer 5 completely covers the upper surface of the seal layer 9.
- Such a configuration is particularly effective when the cap layer 5 is superior in oxidation resistance to the seal layer 9 immediately below it.
- the second protective film 7 is located on the inner side of the seal ring 4 as viewed from the circuit forming region 2 and does not reach the rising portion 8 of the first protective film 6. Thereby, shape instability, exfoliation, etc. of the 2nd protective film 7 are controlled, and a reliable semiconductor device can be obtained.
- FIG. 3 is a diagram showing a schematic cross section of another variation of the semiconductor device 50b.
- the same reference numerals as those in FIG. 1A are used for the same components as those of the semiconductor device 50 in FIGS. 1A and 1B, and differences will be described in detail below.
- the semiconductor device 50b is provided with another seal ring 14 on the outer side (outside as viewed from the circuit formation region 2) in addition to the seal ring 4 similar to the semiconductor device 50a.
- the seal ring 4 of the semiconductor device 50b is referred to as a first seal ring 4
- the seal ring 14 is referred to as a second seal ring 14.
- the second seal ring 14 Similar to the first seal ring 4, the second seal ring 14 includes seal layers 14 a and 14 b embedded in the interlayer insulating film 11, and a cap layer 15 formed in contact therewith.
- an opening 31 is also formed in the first protective film 6 above the second seal ring 14. Furthermore, an opening 32 is also formed between the first seal ring 4 and the second seal ring 14. Here, the opening 32 located between the seal rings is deeper than the opening 31 located above the seal ring.
- the circuit forming region 2 is surrounded by a plurality of rows of seal rings so that the circuit forming region 2 can be more reliably protected from moisture entering from the cut surface of the interlayer insulating film 11 and crack extension caused by stress. Can be protected.
- an example of surrounding twice is shown, but by providing a plurality of second seal rings 14, the circuit forming region 2 may be surrounded three or more times to provide more reliable protection.
- the first protection film 6 that follows the shape on the innermost seal ring (first seal ring 4) has the 2
- the end of the protective film 7 is positioned. Thereby, shape instability, exfoliation, etc. of the 2nd protective film 7 are controlled, and a reliable semiconductor device can be obtained.
- the underlying surface (the surface of the first protective film 6) in the region where the end of the second protective film 7 is located is flat.
- a low dielectric constant film (low-k film) or an ultra-low dielectric constant film (Extremely low-low- k (ELK) film) film is used.
- Low dielectric constant film (ultra-low dielectric constant) generally has low film density, and therefore has high hygroscopicity and moisture permeability. Therefore, when using a low dielectric constant film, it is particularly necessary to suppress the intrusion of moisture to suppress an increase in relative dielectric constant, a decrease in wiring reliability, and the like. Similarly, since the low dielectric constant film (ultra low dielectric constant) is mechanically fragile, it is necessary to suppress the extension of cracks due to stress. Therefore, it is effective to provide a plurality of rows of seal rings to protect the circuit formation region 2 more reliably as in the semiconductor device 50b.
- the low dielectric constant film is a film having a low dielectric constant compared to a silicon oxide film (relative dielectric constant is about 3.5 to 4.0), and has a relative dielectric constant of about 2.7 to 3.0.
- a film for example, a SiOF film, but not limited to this.
- the ultra-low dielectric constant is a film having a lower dielectric constant and a relative dielectric constant of about 2.7 or less (for example, a SiCOH film, but is not limited thereto).
- an isolation region 21 in which no circuit, wiring or the like is provided is provided between the innermost seal ring (first seal ring 4) and the circuit formation region 2.
- the end portion of the second protective film 7 may be positioned on the first protective film 6 having a flat upper surface.
- the first seal ring 4 and the circuit forming region 2 are isolated from each other, so that the circuit forming region 2 is further separated from moisture entering from the cut surface of the interlayer insulating film 11 and crack extension caused by stress. It can be surely protected.
- a wide flat region for positioning the end portion of the second protective film 7 can be secured, even when the second protective film 7 is formed by a method that causes variations in end position accuracy, the second protective film 7 is stable. Thus, the second protective film 7 can be formed.
- FIG. 4 shows the case where a plurality of rows of seal rings are provided, it is of course possible to provide the isolation region 21 when the seal rings are single.
- FIGS. 5A and 5B show a schematic cross-sectional view and a plan view of a semiconductor device 50c of still another modified example.
- FIG. 5A corresponds to the Va-Va ′ line in FIG.
- the same components as those of the semiconductor device 50 of FIGS. 1A and 1B are denoted by the same reference numerals as those of FIGS. 1A and 1B, and differences will be described in detail below.
- the opening 13 is provided in the first protective film 6 outside the seal ring 4 (outside as viewed from the circuit formation region 2 side). Thereby, it is possible to block propagation paths such as impacts and stresses from the outside toward the circuit forming region 2 when dicing the wafer. That is, when the opening 13 does not exist, the first protective film 6 serves as a propagation path, and impact, stress, etc. propagate to the circuit formation region 2, but this can be blocked by providing the opening 13. In particular, if the opening 13 penetrates the first protective film 6, impact, stress, and the like are less easily transmitted, so that the effect of protecting the circuit forming region 2 is enhanced. Note that the openings 31 and 32 can be expected to relieve stress in the same manner as the opening 13.
- the opening 13 does not reach the inside of the interlayer insulating film 11 immediately below the first protective film 6. In other words, if the opening 13 is formed so as to remove a part of the upper portion of the interlayer insulating film 11, there is a risk that the wiring provided in the interlayer insulating film 11 is exposed. It is desirable to avoid it.
- inspection wiring or the like may be provided outside the seal ring, so it is desirable to avoid this exposure.
- the seal layer constituting the seal ring itself may be exposed. It is desirable to avoid this.
- the opening 13 has a closed loop shape (a frame shape closed in a chain) when the semiconductor device 50c is viewed in plan.
- FIG. 5B shows an example in which the seal ring 4 has a closed quadrangle that goes around the outside (the outside of the rising portion 8 of the first protective film 6). By doing so, the path transmitted to the circuit formation region 2 can be blocked with respect to impact, stress, etc. from any direction, and the protective effect is further ensured.
- the opening 13 can also be provided when a plurality of seal rings are provided.
- the first seal ring 4 and the second seal ring 14 are provided as in the example of FIG. 3, and the opening 13 is provided outside the second seal ring 14.
- an opening 13 is provided outside the innermost seal ring 4.
- openings 13 are provided between the first seal ring 4 and the second seal ring 14 and outside the second seal ring 14.
- the end of the second protective film 7 is located inside the seal ring 4.
- the rising portion 8 of the first protective film 6 is located on the innermost side of the first seal ring 4) and follows the upper part of the seal ring 4. Do not reach. Thereby, shape instability, exfoliation, etc. of the 2nd protective film 7 are controlled, and a reliable semiconductor device can be obtained.
- a plurality (16 in this example) of bumps 24 are arranged in a grid (matrix). ). By arranging such bumps 24, a large number of bumps 24 can be provided in the limited circuit formation region 2.
- the bump 24 is made of, for example, a Sn—Ag lead-free solder material.
- the present invention is not limited to this, and a solder material such as Sn—Cu or Sn—Cu—Ni may be used, or another material may be used.
- the arrangement interval of the bumps 24 is, for example, 160 ⁇ m.
- flip-chip mounting can be performed on the organic substrate 25 or the like to contribute to high-density mounting of the semiconductor device.
- the semiconductor device 50 and the like are shown so that the side on which the protective film is formed faces down, and the illustration of the semiconductor substrate 1 is omitted.
- electrode pads 27 are formed below the bumps 24 formed in the semiconductor device.
- the electrode pad 27 is made of, for example, aluminum, and is provided in a portion where the first protective film 6 and the second protective film 7 are opened on the interlayer insulating film 11.
- wirings connected to the electrode pads 27 are provided in the interlayer insulating film 11.
- the under barrier metal 28 is formed as a metal layer that assists the bonding strength between the electrode pad 27 and the bump 24 formed thereon.
- the material include nickel (Ni), but are not limited thereto.
- the underfill 26 is filled between the flip-chip mounted semiconductor device and the organic substrate 25.
- the underfill 26 has a function of preventing connection of moisture, dust, and the like from the outside, relieving stress due to warpage of the organic substrate 25, and ensuring connection reliability.
- the material is, for example, a thermosetting liquid sealing material, and more specifically, may be composed of an epoxy resin, a curing agent, a filler, or the like.
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Abstract
Description
次に、本開示の実施形態の変形例を説明する。図2は、変形例の半導体装置50aの模式的な断面を示す図である。
2 回路形成領域
3 ダイシング領域
4 (第1)シールリング
4a、4b シール層
5 キャップ層
6 第1保護膜
7 第2保護膜
8 立上がり部
9 シール層
11 層間絶縁膜
11a、11b、11c、11d 絶縁膜
13 開口部
14 (第2)シールリング
14a、14b シール層
15 キャップ層
21 隔離領域
24 バンプ
25 有機基板
26 アンダーフィル
27 電極パッド
28 アンダーバリアメタル
31、32 開口部
50、50a、50b、50c 半導体装置
Claims (28)
- 回路形成領域を有する基板と、
前記基板上に形成された層間絶縁膜と、
前記層間絶縁膜中に形成され、前記回路形成領域を取り囲む第1シールリングと、
前記層間絶縁膜上における前記回路形成領域及び前記第1シールリング上方を含む領域に形成された第1保護膜と、
前記第1保護膜上で且つ前記第1シールリングよりも内側に形成された第2保護膜とを備え、
前記第1保護膜は、前記第2保護膜と接触する第1の表面と、前記第1シールリングの直上に位置する第2の表面と、前記第1の表面から前記第2の表面へとつながる第3の表面とを有し、
前記第2保護膜の端部は、前記第3の表面よりも内側に位置していることを特徴とする半導体装置。 - 請求項1の半導体装置において、
前記第1保護膜における前記第1シールリングの直上には、第1の開口部を有することを特徴とする半導体装置。 - 請求項2の半導体装置において、
前記第1保護膜における前記第1シールリングの外側には、第2の開口部を有することを特徴とする半導体装置。 - 請求項3の半導体装置において、
前記層間絶縁膜中に、前記第1シールリングを取り囲む少なくとも1つの第2シールリングを有することを特徴とする半導体装置。 - 請求項4の半導体装置において、
前記第2の開口部は、前記第1のシールリングと前記第2のシールリングとの間に配置されていることを特徴とする半導体装置。 - 請求項3~5のいずれか1つの半導体装置において、
前記第2の開口部は、前記第1保護膜を貫通するように形成されていることを特徴とする半導体装置。 - 請求項4~6のいずれか1つの半導体装置において、
前記第2の開口部は、前記第1保護膜直下の前記層間絶縁膜内にまで達するのを避けて形成されていることを特徴とする半導体装置。 - 請求項4~7のいずれか1つの半導体装置において、
前記第2の開口部は、前記第1シールリングを取り囲むように配置されていることを特徴とする半導体装置。 - 請求項8の半導体装置において、
前記第2の開口部は、前記第1シールリングを連続的に取り囲むように配置されていることを特徴とする半導体装置。 - 請求項1の半導体装置において、
前記第1保護膜における前記第1シールリングの直上には、第1の開口部を有しており、
前記第1保護膜における前記第1シールリングの外側には、第2の開口部を有しており、
前記第1の開口部よりも前記第2の開口部の方が深いことを特徴とする半導体装置。 - 請求項4~10のいずれか1つの半導体装置において、
前記第1保護膜における前記第2シールリングの外側に、第3の開口部を有することを特徴とする半導体装置。 - 請求項11の半導体装置において、
前記第2の開口部よりも前記第3の開口部の方が深いことを特徴とする半導体装置。 - 請求項11の半導体装置において、
前記第3の開口部よりも前記第2の開口部の方が深いことを特徴とする半導体装置。 - 請求項4~13のいずれか1つの半導体装置において、
前記第2シールリングは、最も外側に位置するシールリングであることを特徴とする半導体装置。 - 請求項4~14のいずれか1つの半導体装置において、
前記第1保護膜における全てのシールリングの直上に開口部が配置されていることを特徴とする半導体装置。 - 請求項1~15のいずれか1つの半導体装置において、
前記第1シールリングは、積層された複数のシール層と、最上層の前記シール層上に接続して形成されたキャップ層とを含むことを特徴とする半導体装置。 - 請求項16の半導体装置において、
前記キャップ層の幅は、前記最上層のシール層の幅よりも大きいことを特徴とする半導体装置。 - 請求項16又は17の半導体装置において、
前記シール層は銅からなり、
前記キャップ層はアルミニウムからなることを特徴とする半導体装置。 - 請求項1~18のいずれか1つの半導体装置において、
前記第2保護膜の端部は、前記第3の表面と前記回路形成領域との間に位置することを特徴とする半導体装置。 - 請求項1~19のいずれか1つの半導体装置において、
前記第2保護膜の端部が位置する部分の前記第1保護膜は、上面が実質的に平坦であることを特徴とする半導体装置。 - 請求項1~20のいずれか1つの半導体装置において、
前記第1シールリングと前記回路形成領域との間に、回路及び配線の形成を避けた隔離領域を備え、
前記隔離領域において、前記第1保護膜の上面は実質的に平坦であり、
前記第2保護膜の端部は、前記隔離領域上に位置することを特徴とする半導体装置。 - 請求項1~21のいずれか1つの半導体装置において、
前記層間絶縁膜は、低誘電率膜を含むことを特徴とする半導体装置。 - 請求項1~21のいずれか1つの半導体装置において、
前記層間絶縁膜は、超低誘電率膜を含むことを特徴とする半導体装置。 - 請求項1~23のいずれか1つの半導体装置において、
前記基板の裏面において、前記回路形成領域下に、グリッド状に配列された複数のバンプを備えることを特徴とする半導体装置。 - 請求項24の半導体装置において、
前記バンプは、前記回路形成領域下にのみ配置され、前記シールリングの下には配置されていないことを特徴とする半導体装置。 - 請求項1~25のいずれか1つの半導体装置において、
前記第1保護膜はシリコン窒化膜からなり、
前記第2保護膜はポリイミド膜からなることを特徴とする半導体装置。 - 請求項1~26のいずれか1つの半導体装置において、
前記第2保護膜の表面は、前記第1保護膜における第2の表面よりも高い位置にあることを特徴とする半導体装置。 - 請求項1~27のいずれか1つの半導体装置が実装基板にフリップチップ実装されていることを特徴とするフリップチップ実装品。
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CN2011800261400A CN102918637A (zh) | 2011-01-14 | 2011-10-20 | 半导体装置及倒装芯片安装件 |
US13/658,660 US20130043566A1 (en) | 2011-01-14 | 2012-10-23 | Semiconductor device and flip-chip package |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020255573A1 (ja) | 2019-06-18 | 2020-12-24 | 株式会社Jvcケンウッド | 半導体ウエハ、及び、半導体チップの製造方法 |
KR20220004943A (ko) * | 2018-09-27 | 2022-01-12 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | 반도체 패키징된 디바이스 내의 본딩 구조물 및 그 형성 방법 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5968711B2 (ja) * | 2012-07-25 | 2016-08-10 | ルネサスエレクトロニクス株式会社 | 半導体装置及び半導体装置の製造方法 |
US11456247B2 (en) * | 2019-06-13 | 2022-09-27 | Nanya Technology Corporation | Semiconductor device and fabrication method for the same |
CN113130413A (zh) * | 2019-12-30 | 2021-07-16 | 联华电子股份有限公司 | 半导体元件封装结构及其制造方法 |
CN113035835B (zh) * | 2021-03-01 | 2022-04-01 | 长鑫存储技术有限公司 | 半导体结构及半导体结构制作方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03129855A (ja) * | 1989-10-16 | 1991-06-03 | Sanyo Electric Co Ltd | 半導体装置の製造方法 |
JP2004079596A (ja) * | 2002-08-12 | 2004-03-11 | Renesas Technology Corp | 半導体装置 |
JP2004297022A (ja) * | 2003-02-03 | 2004-10-21 | Nec Electronics Corp | 半導体装置及びその製造方法 |
WO2004097917A1 (ja) * | 2003-04-30 | 2004-11-11 | Fujitsu Limited | 半導体装置の製造方法、半導体ウエハおよび半導体装置 |
JP2008066716A (ja) * | 2006-08-10 | 2008-03-21 | Matsushita Electric Ind Co Ltd | 半導体装置 |
JP2008270488A (ja) * | 2007-04-19 | 2008-11-06 | Matsushita Electric Ind Co Ltd | 半導体装置及びその製造方法 |
WO2010086952A1 (ja) * | 2009-01-30 | 2010-08-05 | パナソニック株式会社 | 半導体装置及びその製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005109145A (ja) * | 2003-09-30 | 2005-04-21 | Toshiba Corp | 半導体装置 |
JP4401874B2 (ja) * | 2004-06-21 | 2010-01-20 | 株式会社ルネサステクノロジ | 半導体装置 |
US7696607B2 (en) * | 2006-08-10 | 2010-04-13 | Panasonic Corporation | Semiconductor device |
US8125052B2 (en) * | 2007-05-14 | 2012-02-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Seal ring structure with improved cracking protection |
JP2010278040A (ja) * | 2009-05-26 | 2010-12-09 | Renesas Electronics Corp | 半導体装置の製造方法および半導体装置 |
WO2011063547A1 (en) * | 2009-11-25 | 2011-06-03 | Intel Corporation | Through silicon via guard ring |
JP2011216753A (ja) * | 2010-04-01 | 2011-10-27 | Panasonic Corp | 半導体装置及びその製造方法 |
-
2011
- 2011-10-20 WO PCT/JP2011/005886 patent/WO2012095907A1/ja active Application Filing
- 2011-10-20 JP JP2012536123A patent/JPWO2012095907A1/ja not_active Withdrawn
- 2011-10-20 CN CN2011800261400A patent/CN102918637A/zh active Pending
-
2012
- 2012-10-23 US US13/658,660 patent/US20130043566A1/en not_active Abandoned
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03129855A (ja) * | 1989-10-16 | 1991-06-03 | Sanyo Electric Co Ltd | 半導体装置の製造方法 |
JP2004079596A (ja) * | 2002-08-12 | 2004-03-11 | Renesas Technology Corp | 半導体装置 |
JP2004297022A (ja) * | 2003-02-03 | 2004-10-21 | Nec Electronics Corp | 半導体装置及びその製造方法 |
WO2004097917A1 (ja) * | 2003-04-30 | 2004-11-11 | Fujitsu Limited | 半導体装置の製造方法、半導体ウエハおよび半導体装置 |
JP2008066716A (ja) * | 2006-08-10 | 2008-03-21 | Matsushita Electric Ind Co Ltd | 半導体装置 |
JP2008270488A (ja) * | 2007-04-19 | 2008-11-06 | Matsushita Electric Ind Co Ltd | 半導体装置及びその製造方法 |
WO2010086952A1 (ja) * | 2009-01-30 | 2010-08-05 | パナソニック株式会社 | 半導体装置及びその製造方法 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220004943A (ko) * | 2018-09-27 | 2022-01-12 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | 반도체 패키징된 디바이스 내의 본딩 구조물 및 그 형성 방법 |
KR102481141B1 (ko) | 2018-09-27 | 2022-12-23 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | 반도체 패키징된 디바이스 내의 본딩 구조물 및 그 형성 방법 |
US11990428B2 (en) | 2018-09-27 | 2024-05-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Bonding structures in semiconductor packaged device and method of forming same |
WO2020255573A1 (ja) | 2019-06-18 | 2020-12-24 | 株式会社Jvcケンウッド | 半導体ウエハ、及び、半導体チップの製造方法 |
KR20220007164A (ko) | 2019-06-18 | 2022-01-18 | 가부시키가이샤 제이브이씨 켄우드 | 반도체 웨이퍼 및, 반도체 칩의 제조 방법 |
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JPWO2012095907A1 (ja) | 2014-06-09 |
US20130043566A1 (en) | 2013-02-21 |
CN102918637A (zh) | 2013-02-06 |
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