WO2012008736A3 - 파지티브 타입 감광성 수지 조성물 및 이를 포함하는 유기 발광 소자 블랙 뱅크 - Google Patents
파지티브 타입 감광성 수지 조성물 및 이를 포함하는 유기 발광 소자 블랙 뱅크 Download PDFInfo
- Publication number
- WO2012008736A3 WO2012008736A3 PCT/KR2011/005106 KR2011005106W WO2012008736A3 WO 2012008736 A3 WO2012008736 A3 WO 2012008736A3 KR 2011005106 W KR2011005106 W KR 2011005106W WO 2012008736 A3 WO2012008736 A3 WO 2012008736A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- emitting device
- organic light
- positive
- resin composition
- photosensitive resin
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000011159 matrix material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/127—Active-matrix OLED [AMOLED] displays comprising two substrates, e.g. display comprising OLED array and TFT driving circuitry on different substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
- H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
- H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
- H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Electroluminescent Light Sources (AREA)
- Materials For Photolithography (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2011800344850A CN102985876A (zh) | 2010-07-14 | 2011-07-12 | 正型光敏树脂组合物及包含其的有机发光装置遮屏 |
JP2013518286A JP2013533508A (ja) | 2010-07-14 | 2011-07-12 | ポジティブ型感光性樹脂組成物およびこれを含む有機発光素子ブラックバンク |
US13/810,131 US8993209B2 (en) | 2010-07-14 | 2011-07-12 | Positive-type photosensitive resin composition and black bank of an organic light-emitting device including same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2010-0067919 | 2010-07-14 | ||
KR20100067919 | 2010-07-14 | ||
KR20100067852 | 2010-07-14 | ||
KR10-2010-0067852 | 2010-07-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012008736A2 WO2012008736A2 (ko) | 2012-01-19 |
WO2012008736A3 true WO2012008736A3 (ko) | 2012-05-03 |
Family
ID=45469912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2011/005106 WO2012008736A2 (ko) | 2010-07-14 | 2011-07-12 | 파지티브 타입 감광성 수지 조성물 및 이를 포함하는 유기 발광 소자 블랙 뱅크 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8993209B2 (ko) |
JP (1) | JP2013533508A (ko) |
KR (1) | KR101295464B1 (ko) |
CN (1) | CN102985876A (ko) |
TW (1) | TW201217908A (ko) |
WO (1) | WO2012008736A2 (ko) |
Families Citing this family (29)
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JP2013232314A (ja) * | 2012-04-27 | 2013-11-14 | Jsr Corp | 感放射線性樹脂組成物、絶縁膜および有機el素子 |
JP6155823B2 (ja) * | 2012-07-12 | 2017-07-05 | Jsr株式会社 | 有機el素子、感放射線性樹脂組成物および硬化膜 |
KR20140023492A (ko) * | 2012-08-16 | 2014-02-27 | 삼성코닝정밀소재 주식회사 | 스퍼터링 타겟 및 이에 의해 증착된 블랙 매트릭스를 포함하는 유기 발광 디스플레이 장치 |
KR20140023491A (ko) * | 2012-08-16 | 2014-02-27 | 삼성코닝정밀소재 주식회사 | 스퍼터링 타겟 및 이에 의해 증착된 블랙 매트릭스를 포함하는 유기 발광 디스플레이 장치 |
KR101954220B1 (ko) * | 2012-09-14 | 2019-03-06 | 삼성디스플레이 주식회사 | 박막 봉지 유닛, 이를 포함하는 유기 발광 표시 장치 및 그의 제조 방법 |
US11130320B2 (en) * | 2014-07-11 | 2021-09-28 | Samsung Electronics Co., Ltd. | Transparent polymer film and electronic device including the same |
CN107406673B (zh) * | 2015-03-30 | 2019-09-06 | 东丽株式会社 | 着色树脂组合物、着色膜、装饰基板及触摸面板 |
WO2017057143A1 (ja) | 2015-09-30 | 2017-04-06 | 東レ株式会社 | ネガ型着色感光性樹脂組成物、硬化膜、素子および表示装置 |
KR102054030B1 (ko) | 2015-10-19 | 2020-01-08 | 주식회사 엘지화학 | 수지 조성물 및 이를 이용하여 제조된 블랙뱅크를 포함하는 디스플레이 장치 |
KR102127033B1 (ko) * | 2016-04-26 | 2020-06-25 | 주식회사 엘지화학 | 네가티브 타입 감광성 수지 조성물 및 이를 포함하는 유기 발광 소자 블랙 매트릭스 |
JP7106863B2 (ja) * | 2016-06-16 | 2022-07-27 | 東レ株式会社 | 有機el表示装置用感光性樹脂組成物 |
KR102066549B1 (ko) * | 2016-12-01 | 2020-01-15 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치 |
US20200012191A1 (en) | 2017-03-28 | 2020-01-09 | Toray Industries, Inc. | Photosensitive resin composition, cured film, element equipped with cured film, organic el display device equipped with cured film, cured film production method, and organic el display device production method |
TWI683182B (zh) | 2017-04-07 | 2020-01-21 | 日商昭和電工股份有限公司 | 感光性樹脂組成物及輻射線微影構造物之製造方法 |
TWI635359B (zh) * | 2017-06-02 | 2018-09-11 | 律勝科技股份有限公司 | 感光性聚醯亞胺樹脂組合物及應用其之覆蓋膜的製造方法 |
CN111095044B (zh) * | 2017-09-25 | 2022-08-12 | 东丽株式会社 | 着色树脂组合物、着色膜、滤色器及液晶显示装置 |
JP7010260B2 (ja) * | 2018-04-18 | 2022-01-26 | 信越化学工業株式会社 | 光酸発生剤、化学増幅レジスト材料及びパターン形成方法 |
KR102287214B1 (ko) * | 2018-09-17 | 2021-08-06 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 전자 소자 |
CN110649185B (zh) * | 2019-09-26 | 2022-08-09 | 合肥京东方卓印科技有限公司 | 显示基板及其喷墨打印方法、显示装置 |
KR20210056011A (ko) | 2019-11-08 | 2021-05-18 | 주식회사 엘지화학 | 화합물, 착색제 분산액, 네가티브형 감광성 수지 조성물 및 이를 이용하여 형성된 블랙뱅크를 포함하는 디스플레이 장치 |
KR20210056012A (ko) * | 2019-11-08 | 2021-05-18 | 주식회사 엘지화학 | 화합물, 바인더 수지, 네가티브형 감광성 수지 조성물 및 이를 이용하여 형성된 블랙뱅크를 포함하는 디스플레이 장치 |
KR20210056014A (ko) | 2019-11-08 | 2021-05-18 | 주식회사 엘지화학 | 바인더 수지, 네가티브형 감광성 수지 조성물 및 이를 이용하여 형성된 블랙뱅크를 포함하는 디스플레이 장치 |
CN111303420A (zh) * | 2019-11-19 | 2020-06-19 | 上海极紫科技有限公司 | 一种可碱显影的正性聚酰亚胺光敏树脂及其制备方法 |
KR20210065487A (ko) | 2019-11-27 | 2021-06-04 | 주식회사 엘지화학 | 바인더 수지, 감광성 수지 조성물, 블랙뱅크 및 이를 포함하는 디스플레이 장치 |
KR102637326B1 (ko) | 2019-12-06 | 2024-02-15 | 주식회사 엘지화학 | 포지티브형 감광성 수지 조성물 및 이를 이용하여 형성된 블랙뱅크를 포함하는 디스플레이 장치 |
JP7351451B2 (ja) | 2019-12-17 | 2023-09-27 | エルジー・ケム・リミテッド | 化合物、バインダー樹脂、ネガ型感光性樹脂組成物およびこれを用いて形成されたブラックバンクを含むディスプレイ装置 |
KR20210081029A (ko) | 2019-12-23 | 2021-07-01 | 주식회사 엘지화학 | 블랙뱅크용 감광성 수지 조성물 |
KR20210081032A (ko) | 2019-12-23 | 2021-07-01 | 주식회사 엘지화학 | 고분자 수지 화합물, 이의 제조 방법 및 이를 포함하는 감광성 수지 조성물 |
WO2021182499A1 (ja) | 2020-03-13 | 2021-09-16 | 東レ株式会社 | 有機el表示装置および感光性樹脂組成物 |
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KR0123891B1 (ko) * | 1987-07-21 | 1997-11-24 | 로버어트 에이 롱맨 | 히드록시 폴리이미드, 이를 포함하는 고온 양성 감광성 방식제 조성물 및 감광성 제품 |
KR0148011B1 (ko) * | 1989-10-27 | 1998-08-01 | 나까이 다께오 | 포지티브 감광성의 폴리이미드 수지 조성물 |
KR20090063543A (ko) * | 2007-12-14 | 2009-06-18 | 주식회사 엘지화학 | 폴리이미드계 고분자 화합물 및 이를 포함하는 포지티브형폴리이미드 감광성 수지 조성물 |
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US5288588A (en) | 1989-10-27 | 1994-02-22 | Nissan Chemical Industries Ltd. | Positive photosensitive polyimide resin composition comprising an o-quinone diazide as a photosensitive compound |
JP3541625B2 (ja) * | 1997-07-02 | 2004-07-14 | セイコーエプソン株式会社 | 表示装置及びアクティブマトリクス基板 |
JPH11273870A (ja) * | 1998-03-24 | 1999-10-08 | Tdk Corp | 有機el素子 |
JP3701123B2 (ja) * | 1998-06-24 | 2005-09-28 | 株式会社日立製作所 | 隔壁転写凹版用元型の製造方法及びプラズマディスプレイパネルの隔壁形成方法 |
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EP1475665B1 (en) | 2003-04-07 | 2009-12-30 | Toray Industries, Inc. | Positive-type photosensitive resin composition |
JP4483371B2 (ja) | 2003-04-07 | 2010-06-16 | 東レ株式会社 | 感光性樹脂組成物 |
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EP1662319A3 (en) | 2004-11-24 | 2009-05-27 | Toray Industries, Inc. | Photosensitive resin composition |
JP2008039961A (ja) * | 2006-08-03 | 2008-02-21 | Toray Ind Inc | ポジ型感光性樹脂組成物およびそれを用いた有機エレクトロルミネッセンス素子 |
JP2009031344A (ja) | 2007-07-24 | 2009-02-12 | Kaneka Corp | 感光性ドライフィルムレジスト、これを用いたプリント配線板、及び、プリント配線板の製造方法 |
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2011
- 2011-07-12 WO PCT/KR2011/005106 patent/WO2012008736A2/ko active Application Filing
- 2011-07-12 JP JP2013518286A patent/JP2013533508A/ja active Pending
- 2011-07-12 CN CN2011800344850A patent/CN102985876A/zh active Pending
- 2011-07-12 US US13/810,131 patent/US8993209B2/en active Active
- 2011-07-12 KR KR1020110069080A patent/KR101295464B1/ko active IP Right Grant
- 2011-07-14 TW TW100124952A patent/TW201217908A/zh unknown
Patent Citations (3)
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KR0123891B1 (ko) * | 1987-07-21 | 1997-11-24 | 로버어트 에이 롱맨 | 히드록시 폴리이미드, 이를 포함하는 고온 양성 감광성 방식제 조성물 및 감광성 제품 |
KR0148011B1 (ko) * | 1989-10-27 | 1998-08-01 | 나까이 다께오 | 포지티브 감광성의 폴리이미드 수지 조성물 |
KR20090063543A (ko) * | 2007-12-14 | 2009-06-18 | 주식회사 엘지화학 | 폴리이미드계 고분자 화합물 및 이를 포함하는 포지티브형폴리이미드 감광성 수지 조성물 |
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KR20120007453A (ko) | 2012-01-20 |
JP2013533508A (ja) | 2013-08-22 |
US8993209B2 (en) | 2015-03-31 |
TW201217908A (en) | 2012-05-01 |
US20130189623A1 (en) | 2013-07-25 |
WO2012008736A2 (ko) | 2012-01-19 |
CN102985876A (zh) | 2013-03-20 |
KR101295464B1 (ko) | 2013-08-09 |
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