WO2011149095A1 - フルオロスルホニルイミドのアルカリ金属塩およびその製造方法 - Google Patents
フルオロスルホニルイミドのアルカリ金属塩およびその製造方法 Download PDFInfo
- Publication number
- WO2011149095A1 WO2011149095A1 PCT/JP2011/062295 JP2011062295W WO2011149095A1 WO 2011149095 A1 WO2011149095 A1 WO 2011149095A1 JP 2011062295 W JP2011062295 W JP 2011062295W WO 2011149095 A1 WO2011149095 A1 WO 2011149095A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- alkali metal
- metal salt
- fluorosulfonylimide
- ppm
- less
- Prior art date
Links
- -1 Alkali metal salt Chemical class 0.000 title claims abstract description 224
- 229910052783 alkali metal Inorganic materials 0.000 title claims abstract description 196
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 32
- 239000000243 solution Substances 0.000 claims abstract description 96
- 238000006243 chemical reaction Methods 0.000 claims abstract description 71
- 239000002904 solvent Substances 0.000 claims abstract description 64
- 239000010409 thin film Substances 0.000 claims abstract description 46
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 41
- 238000004821 distillation Methods 0.000 claims abstract description 31
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 24
- 230000005587 bubbling Effects 0.000 claims abstract description 17
- 239000012266 salt solution Substances 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims description 111
- 239000008151 electrolyte solution Substances 0.000 claims description 43
- 239000007810 chemical reaction solvent Substances 0.000 claims description 34
- 239000013557 residual solvent Substances 0.000 claims description 28
- 150000003839 salts Chemical class 0.000 claims description 28
- 238000001035 drying Methods 0.000 claims description 23
- 125000001153 fluoro group Chemical group F* 0.000 claims description 22
- 125000004432 carbon atom Chemical group C* 0.000 claims description 21
- 239000007789 gas Substances 0.000 claims description 21
- 238000010438 heat treatment Methods 0.000 claims description 20
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 19
- 150000003949 imides Chemical class 0.000 claims description 12
- 150000002825 nitriles Chemical class 0.000 claims description 7
- 239000012141 concentrate Substances 0.000 claims description 6
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 claims description 6
- 239000012535 impurity Substances 0.000 abstract description 41
- 230000000717 retained effect Effects 0.000 abstract 1
- VDVLPSWVDYJFRW-UHFFFAOYSA-N lithium;bis(fluorosulfonyl)azanide Chemical compound [Li+].FS(=O)(=O)[N-]S(F)(=O)=O VDVLPSWVDYJFRW-UHFFFAOYSA-N 0.000 description 52
- 238000003682 fluorination reaction Methods 0.000 description 31
- 238000005341 cation exchange Methods 0.000 description 30
- 239000003792 electrolyte Substances 0.000 description 30
- 150000001768 cations Chemical class 0.000 description 29
- 239000000047 product Substances 0.000 description 25
- 239000000203 mixture Substances 0.000 description 22
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 21
- 238000005259 measurement Methods 0.000 description 19
- 239000000523 sample Substances 0.000 description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- 229910052731 fluorine Inorganic materials 0.000 description 18
- 150000002500 ions Chemical class 0.000 description 17
- 239000007787 solid Substances 0.000 description 17
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- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 16
- 238000005481 NMR spectroscopy Methods 0.000 description 14
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- 229920000642 polymer Polymers 0.000 description 13
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 12
- 239000011737 fluorine Substances 0.000 description 12
- 239000012044 organic layer Substances 0.000 description 12
- 239000010410 layer Substances 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 10
- 125000000962 organic group Chemical group 0.000 description 10
- 229910001414 potassium ion Inorganic materials 0.000 description 10
- 238000003756 stirring Methods 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
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- KTQDYGVEEFGIIL-UHFFFAOYSA-N n-fluorosulfonylsulfamoyl fluoride Chemical compound FS(=O)(=O)NS(F)(=O)=O KTQDYGVEEFGIIL-UHFFFAOYSA-N 0.000 description 9
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- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 6
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 description 4
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- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 4
- 150000002430 hydrocarbons Chemical group 0.000 description 4
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 4
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- 239000005297 pyrex Substances 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 229910021642 ultra pure water Inorganic materials 0.000 description 4
- 239000012498 ultrapure water Substances 0.000 description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 4
- BHHYHSUAOQUXJK-UHFFFAOYSA-L zinc fluoride Chemical compound F[Zn]F BHHYHSUAOQUXJK-UHFFFAOYSA-L 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
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- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 3
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- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
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- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- BXHHZLMBMOBPEH-UHFFFAOYSA-N diethyl-(2-methoxyethyl)-methylazanium Chemical compound CC[N+](C)(CC)CCOC BXHHZLMBMOBPEH-UHFFFAOYSA-N 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 125000003784 fluoroethyl group Chemical group [H]C([H])(F)C([H])([H])* 0.000 description 3
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical compound OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 description 3
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0564—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
- H01M10/0566—Liquid materials
- H01M10/0568—Liquid materials characterised by the solutes
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/087—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms
- C01B21/093—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms containing also one or more sulfur atoms
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/086—Compounds containing nitrogen and non-metals and optionally metals containing one or more sulfur atoms
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/087—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms
- C01B21/093—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms containing also one or more sulfur atoms
- C01B21/0935—Imidodisulfonic acid; Nitrilotrisulfonic acid; Salts thereof
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01D—COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM, RUBIDIUM, CAESIUM, OR FRANCIUM
- C01D1/00—Oxides or hydroxides of sodium, potassium or alkali metals in general
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01D—COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM, RUBIDIUM, CAESIUM, OR FRANCIUM
- C01D15/00—Lithium compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/022—Electrolytes; Absorbents
- H01G9/035—Liquid electrolytes, e.g. impregnating materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/052—Li-accumulators
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/052—Li-accumulators
- H01M10/0525—Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0564—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
- H01M10/0565—Polymeric materials, e.g. gel-type or solid-type
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D1/00—Evaporating
- B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
- B01D3/343—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas
- B01D3/346—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas the gas being used for removing vapours, e.g. transport gas
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to an alkali metal salt of fluorosulfonylimide, and more particularly to an alkali metal salt of N- (fluorosulfonyl) -N- (fluoroalkylsulfonyl) imide and bis (fluorosulfonyl) imide and a method for producing the same.
- N- (fluorosulfonyl) -N- (fluoroalkylsulfonyl) imide, fluorosulfonylimide salts such as bis (fluorosulfonyl) imide and derivatives thereof are represented by N (SO 2 F) group or N (SO 2 F) 2.
- N (SO 2 F) group or N (SO 2 F) 2.
- It is useful as an intermediate of a compound having a group, and is used as an electrolyte, an additive to an electrolyte of a fuel cell, a selective electrophilic fluorinating agent, a photoacid generator, a thermal acid generator, a near-infrared absorbing dye It is a compound useful in various applications such as being used as a
- fluorosulfonylimides have been obtained by halogen exchange of chlorosulfonylimide using a fluorinating agent (Non-patent Documents 1 and 2), or by distilling fluorosulfonic acid (HFSO 3 ) in the presence of urea.
- a fluorinating agent Non-patent Documents 1 and 2
- HFSO 3 fluorosulfonic acid
- it has been prepared by a method (Patent Document 1) to obtain bis (fluorosulfonyl) imide.
- Patent Document 2 a method for producing fluorosulfonylimide using a fluoride containing a predetermined element
- the fluorination of chlorosulfonylimide has been improved and the yield can be improved to some extent.
- the present inventors examined the production of the fluorosulfonylimide salt at the actual operation level, and when the reaction solvent was removed after the formation of the fluorosulfonylimide salt, the amount of the solvent relative to 100% by mass of the raw material was 150. It was recognized that there was a new problem that it was difficult to remove the solvent from the reaction solution when the content was less than mass%. The present inventors have also found that fluorosulfonylimide has a high affinity with water and it is difficult to reduce the water content in the product.
- Such moisture when used in an electrochemical device, not only lowers the voltage resistance of the electrolytic solution, but also causes corrosion of members (electrodes and the like) constituting the device. It is possible to remove the solvent and moisture from the product by heating, but the heat resistance of the fluorosulfonylimide salt is not so high. As a result, there is a problem that the manufacturing cost increases.
- the present invention has been made paying attention to the circumstances as described above, and its purpose is to produce an alkali metal salt of fluorosulfonylimide that can easily remove a solvent from a reaction solution even if it is scaled up.
- the present invention also provides a fluorosulfonylimide alkali metal salt with good heat resistance, a fluorosulfonylimide alkali metal salt with reduced specific impurities and moisture content, and an electrolyte containing the same. Also aimed.
- the present inventors have solved the above problems by the following method, and the alkali metal salt of fluorosulfonylimide obtained by the method of the present invention is excellent in heat resistance.
- the present inventors have found that an alkali metal salt of fluorosulfonylimide with reduced impurities and water content is excellent in heat resistance, and completed the present invention.
- the alkali metal salt of fluorosulfonylimide of the present invention is an alkali metal salt of fluorosulfonylimide represented by the following general formula (I), and the mass when held at 100 ° C. for 8 hours in an air stream It is characterized in that the reduction rate is 2% or less.
- M a is an alkali metal
- R a and R b are the same or different, and are fluorine atoms or carbon atoms having 1 to 6 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms. Represents a hydrogen group.
- the alkali metal salt of the fluorosulfonylimide of the present invention hardly decomposes even when exposed to a heated atmosphere for a long time and has excellent heat resistance.
- the alkali metal salt of fluorosulfonylimide preferably has a temperature at which the mass reduction rate of 2% is 210 ° C. or higher when heated from 25 ° C. at a rate of temperature increase of 10 ° C./min.
- the alkali metal salt of fluorosulfonylimide of the present invention is characterized in that the content of sulfate ion (SO 4 2 ⁇ ) is 3000 ppm or less.
- the content of fluoride ion (F ⁇ ) contained in the alkali metal salt of fluorosulfonylimide of the present invention is preferably 1000 ppm or less, and the content of water is preferably 500 ppm or less.
- the alkali metal salt of fluorosulfonylimide of the present invention preferably contains 4000 ppm or less of residual solvent.
- the present invention also includes an electrolytic solution containing an alkali metal salt of fluorosulfonylimide represented by the above general formula (I) and a medium and having a SO 4 2 ⁇ content of 1500 ppm or less.
- the electrolytic solution of the present invention preferably has a water content of 250 ppm or less.
- the electrolyte solution of this invention contains 2000 ppm or less of residual solvents.
- the electrolytic solution of the present invention preferably has an F ⁇ content of 500 ppm or less.
- the production method of the present invention capable of achieving the above object is a method for producing an alkali metal salt of a fluorosulfonylimide represented by the above general formula (I), (1) a step of concentrating the alkali metal salt solution of fluorosulfonylimide while bubbling gas into the reaction solution containing the alkali metal salt of fluorosulfonylimide, and / or (2) It is characterized in that it includes a step of concentrating a reaction solution containing an alkali metal salt of fluorosulfonylimide by thin film distillation.
- the present inventors have repeatedly studied the above problems, and the reason why it is difficult to remove the reaction solvent is that the boiling point rises due to the formation of an alkali metal salt by fluorosulfonylimide, and the alkali metal of fluorosulfonylimide. It was found that the salt was solvated with the solvent molecules. Therefore, the use of a reaction solvent that hardly forms a solvate with the product was examined. However, since the solvent that can be used in the fluorination step of chlorosulfonylimide is limited, it is not realistic to change the reaction solvent.
- the reaction solvent can be easily obtained by employing (1) bubbling method and / or (2) thin film distillation method in the concentration step. It was found that the alkali metal salt of fluorosulfonylimide can be purified efficiently. That is, when bubbling gas into the reaction solution of (1) above, the evaporation area can be increased, so that evaporation of the reaction solvent can be promoted. Therefore, the solvent can be removed quickly without heating the reaction solution to a high temperature.
- the thin film distillation method of (2) a large heat transfer coefficient can be obtained by making the reaction solution to be heat transferred into a thin film with respect to the heat transfer surface.
- the solvent can be quickly removed without heating the heat transfer surface to a high temperature.
- the solvent can be efficiently removed even with an apparatus having a small heat transfer area. Therefore, according to the method of the present invention, since it is not necessary to heat the reaction solution to a high temperature for a long time in the production process, the decomposition of the alkali metal salt of fluorosulfonylimide due to heating is suppressed, and as a result, the decomposition product results. The decrease in heat resistance of the alkali metal salt of fluorosulfonylimide is suppressed.
- the concentration step is preferably performed at 150 ° C. or lower.
- the concentration step is preferably performed at 40 kPa or less.
- the reaction solvent contained in the reaction solution is preferably an ester solvent and / or a nitrile solvent. Furthermore, in addition to the above-described steps, it is a recommended embodiment of the present invention to include a step of heating and drying the concentrate obtained in the concentration step at 100 ° C. or lower.
- the above production method preferably further includes a step of fluorinating chlorosulfonylimide or a salt thereof in the presence of a reaction solvent.
- fluorosulfonylimide in the present invention includes bis (fluorosulfonyl) imide having two fluorosulfonyl groups, N- (fluorosulfonyl)-having a fluorosulfonyl group and a fluorinated alkyl group. N- (fluoroalkylsulfonyl) imide is included. The same applies to “chlorosulfonylimide” as a starting material.
- Fluoroalkyl means an alkyl group having 1 to 6 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and examples thereof include a fluoromethyl group, a difluoromethyl group, and trifluoromethyl. Group, fluoroethyl group, difluoroethyl group, trifluoroethyl group, pentafluoroethyl group and the like are included.
- the solvent can be quickly removed from the reaction solution, and an alkali metal salt of fluorosulfonylimide can be produced efficiently.
- the alkali metal salt of fluorosulfonylimide of the present invention is excellent in heat resistance.
- FIG. 1 is a graph showing the results of Experimental Examples 1-2 to 1-5.
- the alkali metal salt of fluorosulfonylimide of the present invention is an alkali metal salt of fluorosulfonylimide represented by the following general formula (I), and the mass reduction rate when held at 100 ° C. for 8 hours in an air stream Is characterized by being 2% or less.
- M a is an alkali metal
- R a and R b are the same or different, and are fluorine atoms or carbon atoms having 1 to 6 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms. Represents a hydrogen group.
- the alkali metal salt of the fluorosulfonylimide of the present invention is not easily decomposed even when exposed to a heating atmosphere for a long time, various electrochemical devices using this as an ion conductor material have been used for a long time. Stable electrochemical characteristics can be exhibited. Moreover, various electrochemical devices can be used in a wide temperature range. The excellent heat resistance is attributed to the reduced amount of impurities contained in the alkali metal salt of the fluorosulfonylimide of the present invention, as will be described later.
- the alkali metal salt of fluorosulfonylimide of the present invention is a temperature at which the mass reduction rate becomes 2% (hereinafter referred to as “2%”) when heated from 25 ° C. at a rate of temperature increase of 10 ° C./min. It is preferable that it is 210 degreeC or more.
- the 2% mass reduction temperature means a temperature at which the mass reduction rate with respect to the initial mass is 2% when thermogravimetric analysis is performed under the above conditions. That is, the higher the 2% mass reduction temperature, the more stable the alkali metal salt of fluorosulfonylimide hardly decomposes even when exposed to high temperatures.
- the 2% mass reduction temperature is more preferably 215 ° C. or higher.
- the alkali metal salt of fluorosulfonylimide of the present invention has a mass reduction rate of 1% when measured under the same conditions as the 2% mass reduction temperature (hereinafter referred to as “1% mass reduction temperature”). Is preferably 175 ° C. or higher. More preferably, it is 185 ° C. or higher.
- a differential thermothermal gravimetric simultaneous measurement device for example, “EXSTAR TG / DTA6200” manufactured by SII Nano Technology Co., Ltd.
- an alkali metal salt of fluorosulfonylimide having a water content of 1000 ppm or less.
- the water content is more preferably 500 ppm or less, and further preferably 200 ppm or less. This is because, if the moisture content is in the above range, the influence on the measurement result is negligible.
- the measurement sample is held at a temperature of 50 ° C. under vacuum for 6 hours, After adjusting the amount of water and solvent contained in the sample, it is recommended that the sample be subjected to the above measurement.
- the alkali metal salt of fluorosulfonylimide of the present invention has an impurity content reduced to an extremely low level.
- the impurities include decomposition products generated by heating in the concentration step and drying step described later, and impurities mixed in in the purification step, for example, equivalent to decomposition products of alkali metal salts of fluorosulfonylimide.
- the content of sulfate ion (SO 4 2 ⁇ ) contained in the alkali metal salt (solid) of fluorosulfonylimide of the present invention is 3000 ppm or less, and the content of fluoride ion (F ⁇ ) is 1000 ppm or less. (All are based on mass. The same shall apply hereinafter.)
- An increase in the amount of impurities such as fluoride ions and sulfate ions means degradation of fluorosulfonylimide and a decrease in purity. Therefore, when the impurity content is large, it is difficult to obtain desired characteristics when fluorosulfonylimide is used in various applications. Moreover, these impurities have an adverse effect of promoting the decomposition of fluorosulfonylimide. Therefore, when the impurity content is large, the initial characteristics are difficult to maintain. Furthermore, fluoride ions may corrode peripheral members of various devices in which an alkali metal salt of fluorosulfonylimide is used. Accordingly, the content of these impurities is preferably as small as possible.
- the content of sulfate ions is preferably 1000 ppm or less, more preferably 500 ppm or less, and even more preferably 300 ppm in the alkali metal salt of fluorosulfonylimide. It is as follows. On the other hand, the content of fluoride ions is more preferably 800 ppm or less in the alkali metal salt of fluorosulfonylimide. More preferably, it is 500 ppm or less, More preferably, it is 300 ppm or less.
- the impurities are most preferably not contained in the alkali metal salt of the fluorosulfonylimide of the present invention. For example, the lower limit may be about 1 ppm.
- the alkali metal salt of the fluorosulfonylimide of the present invention may be used as an ionic conductor material provided in various electrochemical devices described later, and problems derived from impure ionic components will arise. hard.
- the water content of the alkali metal salt (solid) of the fluorosulfonylimide of the present invention is preferably 300 ppm or less.
- moisture contained in the solid alkali metal salt of fluorosulfonylimide causes corrosion of not only the fluorosulfonylimide but also the components of the device in which they are used. Therefore, the water content is more preferably 200 ppm or less, and even more preferably 100 ppm or less.
- content of water is so preferable that it is small and it is preferable that it is substantially 0 ppm, it is technically difficult to reduce a water content to 0 ppm, and it may be economically unpreferable. Therefore, the lower limit of the water content may be about 1 ppm.
- the alkali metal salt (solid) of fluorosulfonylimide of the present invention preferably has a residual solvent content of 4000 ppm or less used in the production stage of the alkali metal salt of fluorosulfonylimide.
- the residual solvent contained in the solid alkali metal salt of fluorosulfonylimide causes a decrease in heat resistance and a decrease in electrochemical performance. Therefore, the smaller the content of such residual solvent is, the more preferable it is, and it is preferable that it is substantially 0 ppm.
- the amount of residual solvent is more preferably 3000 ppm or less. .
- the lower limit of the residual solvent amount may be about 1 ppm.
- the solvent used in the manufacturing stage of the fluoro sulfonylimide mentioned later is contained in the said residual solvent.
- the alkali metal salt of fluorosulfonylimide of the present invention has a low content of other impurities such as chloride ion (Cl ⁇ ) and potassium ion (K + ) in addition to the fluoride ion and sulfate ion. Is preferred.
- the content of chloride ions is more preferably 200 ppm or less, and still more preferably 100 ppm or less.
- the content of potassium ions is preferably 10000 ppm or less, more preferably 8000 ppm or less, even more preferably 4000 ppm or less, still more preferably 1000 ppm or less, still more preferably 500 ppm or less, It is more preferably 200 ppm or less, and most preferably 100 ppm or less.
- the content of other impurities is preferably 10000 ppm or less in total, more preferably 1000 ppm or less, and even more preferably 500 ppm or less.
- the lower limit of the content of other impurities may be about 1 ppm in total.
- the types and contents of the impurities can be analyzed by ICP emission spectroscopy, NMR measurement, ion chromatography or the like described later.
- the water content can be measured by a Karl Fischer moisture meter, and the residual solvent content can be measured by gas chromatography.
- the present invention also includes a composition containing the alkali metal salt of fluorosulfonylimide.
- the composition of the present invention has a sulfate ion content of 100% by mass (hereinafter referred to as “the composition of the present invention”) of alkali metal salt of fluorosulfonylimide, sulfate ion, water, residual solvent and fluorine ion. It is preferably 3000 ppm or less. More preferably, it is 1000 ppm or less, More preferably, it is 500 ppm or less, More preferably, it is 300 ppm or less.
- the lower limit may be about 1 ppm. This is because even when the composition of the present invention is used in an electrolytic solution for an electrochemical device, problems such as decomposition of the electrolytic solution and corrosion of components of the electrochemical device are unlikely to occur.
- the content of impurities other than sulfate ions is reduced in the composition of the present invention.
- Water, residual solvent, and fluorine ions, as well as sulfate ions decompose the alkali metal salt of fluorosulfonylimide according to the present invention, or when the composition of the present invention is used as an electrolyte for an electrochemical device. In some cases, the device or the like may be deteriorated. Therefore, the content is preferably as follows.
- the amount of fluorine ions is preferably 1000 ppm or less in 100% by mass of the composition of the present invention, more preferably 800 ppm or less, still more preferably 500 ppm or less, and further preferably 300 ppm or less.
- the water content is preferably 500 ppm or less in 100% by mass of the composition of the present invention, more preferably 300 ppm or less, still more preferably 200 ppm or less, and even more preferably 100 ppm or less.
- the content of the residual solvent is preferably 4000 ppm or less, more preferably 3000 ppm or less, in 100% by mass of the composition of the present invention.
- the contents of water, residual solvent and fluorine ions in the composition of the present invention are most preferably 0 ppm, but for example, the lower limit may be about 1 ppm. If the content of water, residual solvent, and fluorine ions is in the above range, even if the composition of the present invention is used in an electrolytic solution provided in various electrochemical devices described later, problems due to impure ion components are unlikely to occur. .
- the composition of the present invention may contain chloride ions or potassium ions.
- the content of chloride ions is preferably 200 ppm or less, more preferably 100 ppm or less, out of a total of 100% by mass of the composition of the present invention and chloride ions and / or potassium ions.
- the content of potassium ions is preferably 10000 ppm or less, more preferably 8000 ppm or less, and still more preferably 4000 ppm, in the total 100 mass% of the composition of the present invention and chloride ions and / or potassium ions. Or less, more preferably 1000 ppm or less, even more preferably 500 ppm or less, particularly preferably 200 ppm or less, and most preferably 100 ppm or less.
- the total content of these ions is preferably 10000 ppm or less, more preferably 1000 ppm or less, and more preferably 500 ppm or less in the total 100 mass% of the composition of the present invention and chloride ions and / or potassium ions. More preferably. In addition, the minimum of content of these ions should just be about 1 ppm in total.
- the content of the above components (sulfate ions, fluorine ions, and water and residual solvent content) in the composition of the present invention is determined by ICP emission spectroscopy, ion chromatography, Karl Fischer moisture meter, gas chromatography. Can be measured.
- content of the said various ion is a value detected by the said measuring method. Therefore, in the alkali metal salt of solid fluorosulfonylimide or in the composition of the present invention, the above ions are considered to exist as a salt with a counter ion.
- the alkali metal salt of fluorosulfonylimide of the present invention is represented by the above general formula (I).
- M a represents an alkali metal.
- M a is preferably Li, Na, K, more preferably Li.
- R a and R b are the same or different and each represents a fluorine atom or a hydrocarbon group having 1 to 6 carbon atoms in which one or more hydrogen atoms are substituted with a fluorine atom.
- the hydrocarbon group is preferably a straight-chain C 1-6 fluoroalkyl group, for example, a fluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a fluoroethyl group, a difluoroethyl group, a trifluoroethyl group, A fluoroethyl group, a pentafluoroethyl group, etc. are mentioned.
- R a and R b a fluorine atom, a trifluoromethyl group, and a pentafluoroethyl group are preferable.
- the bis (fluorosulfonyl) imide of the present invention and the alkali metal salt of N- (fluorosulfonyl) -N- (fluoroalkylsulfonyl) imide are suitable as ion conductor materials for various electrochemical devices.
- lithium fluorosulfonylimide whose cation is lithium is useful as an electrolyte or ionic liquid used in lithium secondary batteries, capacitors, or the like, or an intermediate of a fluorosulfonyl compound.
- the production method of the fluorosulfonylimide of the present invention having the above heat resistance is not particularly limited, but from the viewpoint of improving the heat resistance by reducing the impurity content, it is recommended to produce by the method described below. .
- the method for producing an alkali metal salt of fluorosulfonylimide of the present invention includes (1) a step of concentrating an alkali metal salt solution of fluorosulfonylimide while bubbling gas into a reaction solution containing the alkali metal salt of fluorosulfonylimide. And / or (2) a step of concentrating an alkali metal salt solution of fluorosulfonylimide by thin film distillation. Therefore, the steps (1) and / or (2) may be included, and other steps are not particularly limited.
- the method for synthesizing the alkali metal salt of fluorosulfonylimide is not particularly limited, and all conventionally known methods can be employed.
- a method for synthesizing fluorosulfonylimide as described in Patent Document 1, a method of obtaining (fluorosulfonyl) imide by distilling fluorosulfonic acid (HFSO 3 ) in the presence of urea, fluorine from chlorosulfonylimide. And a method of synthesizing fluorosulfonylimide using an agent.
- Examples of the method for obtaining an alkali metal salt of fluorosulfonylimide include a method of cation exchange of the cation of fluorosulfonylimide obtained by the above method with an alkali metal cation.
- fluorosulfonylimide is synthesized from chlorosulfonylimide using a fluorinating agent (fluorination step), and then an alkali metal salt of fluorosulfonylimide is obtained by cation exchange reaction (cation exchange step).
- fluorosulfonylimide is synthesized from chlorosulfonylimide using a fluorinating agent (fluorination step), and then an alkali metal salt of fluorosulfonylimide is obtained by cation exchange reaction (cation exchange step).
- fluorination step fluorination step
- fluorination process fluorination reaction of chlorosulfonylimide or a salt thereof is performed.
- chlorosulfonylimide as a starting material, a commercially available product may be used, or a chlorosulfonylimide synthesized by a known method may be used.
- chlorosulfonylimide for example, after reacting cyanic chloride with sulfuric anhydride, reacting the product (chlorosulfonyl isocyanate) with chlorosulfonic acid, reacting amidosulfuric acid with thionyl chloride.
- a method of further reacting chlorosulfonic acid (a method for synthesizing bis (chlorosulfonyl) imide); a method of reacting chlorosulfonyl isocyanate with fluorinated alkylsulfonic acid or fluorosulfonic acid (N- (chlorosulfonyl)- N- (fluoroalkylsulfonyl) imide or N- (chlorosulfonyl) -N- (fluorosulfonyl) imide synthesis method);
- a fluorination reaction of chlorosulfonylimide is performed.
- the timing of the fluorination reaction is not particularly limited.
- chlorosulfonylimide proton or a salt thereof (hereinafter referred to as chlorosulfonylimide)
- the fluorinating agents (AsF 3 , SbF 3 ) described in Non-Patent Documents 1 and 2 are used.
- a method of halogen exchange of chlorosulfonylimide a method of fluorinating di (chlorosulfonyl) imide using ionic fluorides of monovalent cations such as KF and CsF as a fluorinating agent, and chlorosulfonylimides
- Fluoride containing at least one element selected from the group consisting of elements of Groups 11 to 15 and Groups 4 to 6 preferably CuF 2 , ZnF 2 , SnF 2 , PbF 2, BiF 3, etc.
- fluorinate di (chlorosulfonylimide) in terms of reaction yield.
- the method of fluorinating di (chlorosulfonylimide) using an alkali metal fluoride such as KF, LiF, or NaF as a fluorinating agent is preferable because an alkali metal salt of fluorosulfonylimide can be obtained in one step.
- an aprotic solvent as the reaction solvent.
- carbonate solvents such as ethylene carbonate, propylene carbonate, butylene carbonate, dimethyl carbonate, ethylmethyl carbonate, diethyl carbonate; dimethoxymethane, 1,2-dimethoxyethane, tetrahydrofuran, 2-methyltetrahydrofuran, 1,3- Ether solvents such as dioxane and 4-methyl-1,3-dioxolane; ester solvents such as methyl formate, methyl acetate, ethyl acetate, isopropyl acetate, butyl acetate, methyl propionate, ⁇ -butyrolactone, ⁇ -valerolactone; Amide solvents such as N, N-dimethylformamide; Nitrile solvents such as acetonitrile, butyronitrile, isobutyronitrile, valeronitrile, and
- solvents may be used alone or in combination of two or more. From the viewpoint of smoothly proceeding the fluorination reaction, it is recommended to use a polar solvent, and among the solvents exemplified above, ester solvents and / or nitrile solvents are preferable, and in particular, butyronitrile, isobutyronitrile, valero Nitrile, ethyl acetate, isopropyl acetate and butyl acetate are preferred. From the viewpoint of workability during purification, a solvent having a low boiling point and capable of forming a two-layer state with water is preferable.
- the completion of the fluorination reaction can be confirmed by, for example, 19 F-NMR. That is, as the reaction proceeds, a peak appears in the chemical shift derived from fluorine, and the relative intensity (integrated value) of the peak increases. Therefore, the completion of the fluorination reaction may be confirmed while tracking the progress of the reaction by 19 F-NMR. If the reaction time is too long, the formation of by-products becomes significant, so fluorination is performed at the time when the relative intensity of the target peak is maximized (for example, about 6 to 12 hours from the start of the reaction). The reaction is preferably terminated.
- Cation exchange can be performed by reacting chlorosulfonylimides or fluorosulfonylimides or salts thereof (hereinafter sometimes referred to as fluorosulfonylimides) with a salt containing a desired cation.
- a salt containing a desired cation an alkali metal such as Li, Na, K, Rb, or Cs, or an onium cation described later is preferable.
- the fluorosulfonylimide salt containing an alkali metal can be used as an ion conductor material for various electrochemical devices by melting it at a high temperature or dissolving it in an appropriate organic solvent.
- fluorosulfonylimide salt containing onium cation is a room temperature molten salt that keeps the molten state stable at room temperature, and is suitable as an ion conductor material for electrochemical devices that can withstand long-term use, as a reaction solvent in organic synthesis, etc. It will be something. More preferable fluorosulfonylimide salts include lithium cations and fluorosulfonylimide salts containing onium cations.
- Examples of the salt containing an alkali metal include hydroxides such as LiOH, NaOH, KOH, RbOH, and CsOH; carbon dioxide such as Li 2 CO 3 , Na 2 CO 3 , K 2 CO 3 , Rb 2 CO 3 , and Cs 2 CO 3.
- Salts, bicarbonates such as LiHCO 3 , NaHCO 3 , KHCO 3 , RbHCO 3 , CsHCO 3 ; chlorides such as LiCl, NaCl, KCl, RbCl, CsCl; fluorides such as LiF, NaF, KF, RbF, CsF; Alkali compounds such as CH 3 OLi and EtOLi; and alkyllithium compounds such as EtLi, BuLi and t-BuLi (where Et represents an ethyl group and Bu represents a butyl group);
- the onium cation has the general formula (II); L + -Rs (wherein L represents C, Si, N, P, S or O. R is the same or different and represents a hydrogen atom, fluorine In the case of an atom or an organic group and R is an organic group, these may be bonded to each other, s is 2, 3 or 4, and is a value determined by the valence of the element L.
- the bond represented by LR may be a single bond or a double bond.
- the “organic group” represented by R means a group having at least one carbon atom.
- the “group having at least one carbon atom” may have at least one carbon atom, and may have another atom such as a halogen atom or a hetero atom, a substituent, or the like.
- Specific examples of the substituent include an amino group, an imino group, an amide group, a group having an ether bond, a group having a thioether bond, an ester group, a hydroxyl group, an alkoxy group, a carboxyl group, a carbamoyl group, a cyano group, and a disulfide.
- onium cation represented by the general formula (II) include the following general formula:
- onium cations may be used alone or in combination of two or more.
- Specific examples of the onium cation include a heterocyclic onium cation, an unsaturated onium cation, a saturated ring onium cation, and a chain onium cation described in WO2009 / 123328.
- Preferred onium cations are those represented by the general formula (II): L + -Rs, in which L is N, R is hydrogen, a C 1 -C 8 alkyl group, and a chain onium cation in which s is 4, There are five types of onium cations represented by the general formula.
- R 1 to R 12 are the same or different and each represents a hydrogen atom, a fluorine atom, or an organic group. In the case of an organic group, these may be bonded to each other.
- the organic group is preferably a linear, branched, or cyclic saturated or unsaturated hydrocarbon group having 1 to 18 carbon atoms, a fluorine group, or the like, more preferably a saturated or unsaturated hydrocarbon group having 1 to 8 carbon atoms. , A fluorocarbon group.
- organic groups are hydrogen atom, fluorine atom, nitrogen atom, oxygen atom, sulfur atom, amino group, imino group, amide group, ether group, ester group, hydroxyl group, carboxyl group, carbamoyl group, cyano group, sulfone.
- a functional group such as a group or sulfide group may be contained. More preferably, R 1 to R 12 have one or more of hydrogen atom, fluorine atom, cyano group, sulfone group and the like. When two or more organic groups are bonded, the bond may be formed between the main skeleton of the organic group, or between the main skeleton of the organic group and the functional group described above, or It may be formed between the functional groups.
- Examples of the chain onium cation include tetramethylammonium, tetraethylammonium, tetrapropylammonium, tetrabutylammonium, tetraheptylammonium, tetrahexylammonium, tetraoctylammonium, triethylmethylammonium, methoxyethyldiethylmethylammonium, and trimethylphenylammonium.
- Tertiary ammoniums such as trimethylammonium, triethylammonium, tributylammonium, diethylmethylammonium, dimethylethylammonium and dibutylmethylammonium
- secondary ammoniums such as dimethylammonium, diethylammonium and dibutylammonium, methylammonium and ethyl
- primary ammoniums such as ammonium, butylammonium, hexylammonium and octylammonium
- ammonium compounds such as N-methoxytrimethylammonium, N-ethoxytrimethylammonium, N-propoxytrimethylammonium and NH 4 .
- preferred chain onium cations are ammonium, trimethylammonium, triethylammonium, tributylammonium, triethylmethylammonium, tetraethylammonium, and diethylmethyl (2-methoxyethyl) ammonium.
- Examples of the salt containing the onium cation include halides, hydroxides, carbonates and hydrogencarbonates of the onium cation. Moreover, you may use as a raw material the compound which the salt containing an onium cation produces
- Examples of the solvent that can be used in the cation exchange step include those exemplified in the fluorination step.
- the timing of performing the cation exchange step is not particularly limited, and can be performed at any stage depending on the situation. For example, it may be carried out before the fluorination step or after the fluorination step, but preferably after the fluorination step.
- the number of times of performing the cation exchange step is not limited, and it may be repeated once or twice or more.
- the cation of chlorosulfonylimides or fluorosulfonylimides may be exchanged with an alkali metal cation by a single cation exchange step, and the chlorosulfonylimides or fluorosulfonylimide may be exchanged by a first cation exchange step.
- an alkali metal salt may be obtained in the second cation exchange step.
- the concentration of the compound having a sulfonylimide skeleton (eg, fluorosulfonylimide, fluorosulfonylimide salt, etc.) contained in the reaction solution is 1% by mass to 70% by mass. It is preferable to do this. If the concentration is too high, the reaction may become non-uniform. On the other hand, if the concentration is too low, the productivity per batch is low and it is not economical. More preferably, it is 3% by mass to 60% by mass, and further preferably 5% by mass to 50% by mass.
- a step of contacting with an alkaline aqueous solution may be provided.
- impurities contained in the product can be removed.
- “after the fluorination step” is not limited to just after the fluorination step, and includes “after the fluorination step” even after the cation exchange step is performed following the fluorination step.
- an aqueous solution of a basic substance may be used.
- the basic substance include ammonia; primary, secondary or tertiary having an alkyl group having 1 to 8 carbon atoms.
- Aliphatic amines such as alkylamines, alkylenediamines having an alkylene group of 1 to 8 carbon atoms; alkanolamines; alicyclic amines; aromatic amines; ethylene oxide adducts of these amines; formamidines; guanidines; amidines; Heterocyclic amines; alkali metal or alkaline earth metal hydroxides, carbonates, phosphates, silicates, borates, formates, acetates, stearates, palmitates, propionic acids Examples include salts and oxalates.
- the concentration step the solvent is removed from the reaction solution after the cation exchange step, and the resulting alkali metal salt solution of fluorosulfonylimide is concentrated.
- the concentration step is carried out by (1) a method of bubbling a gas into the reaction solution (a bubbling method) and / or (2) a thin film distillation method.
- the concentration step means that in addition to distilling off a part of the solvent from the obtained alkali metal salt solution (reaction solution) of fluorosulfonylimide, the target alkali metal salt of fluorosulfonylimide is It also includes distilling off the solvent from the reaction solution until it is obtained as a solid. Therefore, the product obtained in the concentration step is a concentrated solution of alkali metal salt of fluorosulfonylimide, solid (powder) of alkali metal salt of fluorosulfonylimide, or a part of alkali metal salt of fluorosulfonylimide is solid. It is a concentrated liquid (slurry solution) present in a state.
- the concentration process employing the bubbling method will be described.
- the evaporation area can be increased by flowing a gas through the reaction solution, so that the evaporation of the reaction solvent is promoted and the reaction solvent can be quickly removed from the reaction solution.
- the reaction apparatus that can be used for the concentration step is not particularly limited as long as it is provided with a means for introducing gas into the reaction solution and a means for discharging the reaction solvent out of the system.
- a tank reactor, a tank reactor capable of depressurization, and the like can be mentioned.
- inert gases such as helium, nitrogen, and argon, dry air, and mixed gases thereof can be used.
- Nitrogen gas is preferred from the viewpoint of product quality and safety.
- the amount of gas flowing into the reaction solution may be appropriately determined according to the concentration of the fluorosulfonyl compound (alkali metal salt of fluorosulfonylimide) in the reaction solution. For example, per 1 g of alkali metal salt solution of fluorosulfonylimide. It is preferably 0.001 mL / min to 10,000 mL / min.
- the gas bubbles supplied to the reaction solution have a smaller diameter.
- the means for forming bubbles is not particularly limited.
- bubbles may be formed by passing the supply gas through a filter such as a glass filter, or a gas generator such as a fine gas generator may be used. Also good.
- the concentration step may be performed while heating the reaction solution.
- the heating temperature may be appropriately set according to the reaction solvent to be used, but is preferably 30 ° C. or higher and 150 ° C. or lower from the viewpoint of suppressing decomposition of the alkali metal salt of fluorosulfonylimide.
- a more preferable temperature is 50 ° C. or higher, and more preferably 120 ° C. or lower. If the temperature is too low, the removal efficiency of the reaction solvent cannot be obtained. On the other hand, if the temperature is too high, the alkali metal salt of fluorosulfonylimide may be decomposed.
- Conditions in the concentration step employing the bubbling method are not particularly limited. Conditions other than the above may be appropriately determined according to the size of the apparatus to be used and the concentration of the alkali metal salt of fluorosulfonylimide in the reaction solution.
- the thin film distillation method is a method in which a thin film of a liquid to be treated is formed and heated to separate components contained in the liquid to be treated into an evaporated component and a non-evaporated component. Therefore, in the concentration step employing the thin film distillation method, the solvent is separated from the reaction solution after the cation exchange step by thin film distillation, and the alkali metal salt solution of fluorosulfonylimide is concentrated.
- the concentration step is performed using a thin film distiller.
- a thin film distiller means for forming a thin film of a reaction solution, means for heating the formed thin film, means for recovering an evaporated component (reaction solvent), and recovering a non-evaporated component (an alkali metal salt of fluorosulfonylimide) Any device provided with means may be used. Moreover, you may provide the circulation means which returns the concentrate extracted from the thin film distiller to the thin film distiller again. Thereby, it can concentrate repeatedly.
- the method for forming the thin film is not particularly limited, and any conventionally known method such as a flow-down method, a centrifugal method, a stirring method, a rotating method, a blade method, and a lifting method can be employed.
- Specific thin-film distillers include, for example, “Short-stroke Distiller” (manufactured by UIC GmbH), “Wipren (registered trademark)”, “Exeva (registered trademark)” (manufactured by Shinko Environmental Solution Co., Ltd.), “Contro” ”,“ Inclined Wing Contro ”,“ Cebucon (registered trademark) ”(manufactured by Hitachi Plant Technology Co., Ltd.),“ High Evaporator (registered trademark) ”(manufactured by Sakai Manufacturing Co., Ltd.),“ Thin Film Distiller ”,“ Biscon ” , “Film Truder” (above, Kimura Chemical Co., Ltd.), “Hi-U Brusher”, “
- the temperature during thin film distillation may be appropriately set according to the reaction solvent to be used, but is preferably 30 ° C. or higher and 150 ° C. or lower from the viewpoint of suppressing decomposition of the alkali metal salt of fluorosulfonylimide. .
- a more preferable temperature is 40 ° C. or higher, further preferably 50 ° C. or higher, more preferably 120 ° C. or lower, and still more preferably 110 ° C. or lower. If the thin film temperature is too low, the removal efficiency of the reaction solvent cannot be obtained. On the other hand, if the temperature is too high, the alkali metal salt of fluorosulfonylimide may be decomposed.
- heat amount given to the alkali metal salt of fluorosulfonyl imide shall be the said range.
- the concentration step may be carried out while circulating the gas in the thin film distiller.
- the gas an inert gas such as nitrogen or argon is preferably used, and more preferably nitrogen.
- the supply rate of the reaction solution into the thin-film distiller may be appropriately determined according to the size of the apparatus used and the concentration of the alkali metal salt of fluorosulfonylimide in the reaction solution.
- the concentration step may be performed under reduced pressure from the viewpoint of performing an efficient concentration step.
- the degree of vacuum By controlling the degree of vacuum, the reaction solvent can be efficiently removed even at low temperatures, and decomposition of the alkali metal salt of fluorosulfonylimide by heat can also be prevented.
- the degree of reduced pressure is not particularly limited as long as it is appropriately adjusted according to the type of the reaction solvent, but is preferably 40 kPa or less, for example. More preferably, it is 15 kPa or less, More preferably, it is 5 kPa or less.
- the amount of the reaction solvent When the amount of the reaction solvent is large, a part of the reaction solvent may be removed before the concentration step.
- the interaction between the alkali metal salt of fluorosulfonylimide and the solvent becomes significant, making it difficult to remove the reaction solvent from the reaction solution.
- the amount of the reaction solvent relative to the alkali metal salt of fluorosulfonylimide is 150% by mass or less. This is because the concentration step can be efficiently carried out by reducing the amount of the reaction solution as much as possible.
- both the bubbling method and the thin film distillation method may be performed in order (the order of execution is not particularly limited), or either one may be performed alone.
- a thin film distillation method that can carry out the concentration step in a shorter time is preferable.
- the amount of heat applied in the concentration step is the alkali metal salt of fluorosulfonylimide, regardless of whether the above bubbling method or thin film distillation method is employed.
- the amount is preferably 1,000,000 J or less per gram, more preferably 500,000 J or less, and still more preferably 100,000 J or less.
- the amount of heat does not include the amount of heat given to the reaction solution in order to remove a part of the reaction solvent before being subjected to the concentration step.
- the amount of heat given to the reaction solution in the concentration step is the amount of heat given to the alkali metal salt of fluorosulfonylimide.
- heat amount is calculated
- the amount of heat given to the reaction solution in the concentration step may be calculated and converted to the amount of heat given per 1 g of fluorosulfonylimide alkali metal salt.
- the alkali metal salt concentrate of fluorosulfonylimide obtained in the concentration step can be used as it is, but in order to improve stability during storage and facilitate the distribution of the product,
- the metal salt may be pulverized (powdering and drying step).
- the obtained solid may be dried as it is with a drying apparatus, and the alkali metal salt of fluorosulfonylimide is soluble. After dissolving in an appropriate solvent, it may be subjected to a drying and powdering process.
- the method for drying and pulverizing the alkali metal salt of fluorosulfonylimide is not particularly limited. (1) The above concentration step is continued until the alkali metal salt of fluorosulfonylimide is precipitated, and this is separated and dried. (2) The concentrated solution obtained in the concentration step is left as it is or while cooling to 30 ° C. or lower as necessary to precipitate the alkali metal salt of fluorosulfonylimide. A method of separating and drying to powder, (3) a method of adding a solvent to the concentrated solution to precipitate an alkali metal salt of fluorosulfonylimide, separating it by filtration, drying and powdering, Etc.
- the solvent that can be used in the above (3) may be any solvent other than the reaction solvent described above, and it is difficult to form a solvate with the alkali metal salt of fluorosulfonylimide.
- solvents usable in the method (3) include toluene, o-xylene, m-xylene, p-xylene, ethylbenzene, isopropylbenzene, 1,2,4-trimethylbenzene, 1,3,5- Aromatic hydrocarbon solvents such as trimethylbenzene, 1,2,3-trimethylbenzene, chlorobenzene and dichlorobenzene, and aliphatic hydrocarbon solvents such as hexane, heptane, octane, nonane, decane, undecane, dodecane, decalin and dichloromethane Can be mentioned. These solvents are preferably added in an amount of 20 parts by mass or less, more preferably 10 parts by mass or less based on 1 part by mass of the
- the precipitated alkali metal salt of fluorosulfonylimide is separated from the reaction solvent by a gradient method, a centrifugal separation method, a filtration method or the like, and dried.
- the method for drying the alkali metal salt of fluorosulfonylimide is not particularly limited, and a conventionally known drying apparatus can be used.
- the temperature during drying is preferably 0 ° C to 100 ° C. More preferably, it is 10 degreeC or more, More preferably, it is 20 degreeC or more, More preferably, it is 80 degreeC or less, More preferably, it is 60 degreeC or less.
- the alkali metal salt of fluorosulfonylimide may be dried while supplying a gas to a drying apparatus.
- a gas examples include those used in the concentration step, and examples thereof include inert gases such as nitrogen and argon, and dry air.
- the alkali metal salt of fluorosulfonylimide obtained in the drying and powdering step may be purified alone, but the fluorosulfonylimide in the solid state (powder)
- An alkali metal salt may be mixed with a recovery solution (the above waste liquid or mother liquor). Since the operations in the drying and pulverization steps correspond to purification operations such as crystallization and reprecipitation, the alkali metal salt of fluorosulfonylimide is recovered together with the recovery of the alkali metal salt of fluorosulfonylimide from the waste liquid and the mother liquor. It is because the purity of can be improved.
- the method for purifying the recovered alkali metal salt of fluorosulfonylimide is not particularly limited, and the solution recovered from each step may be recovered alone or mixed to be purified to recover the alkali metal salt of fluorosulfonylimide.
- the recovered solution may be supplied to any of the cation exchange step, the concentration step, the pulverization step, and the drying step. From the viewpoint of productivity, the recovered solution is preferably supplied to the concentration step.
- the alkali metal salt of fluorosulfonylimide obtained by the above method may be subjected to a purification step for further improving the purity as necessary. Any conventionally known purification method can be adopted as the purification step.
- the present invention also includes an electrolytic solution containing the alkali metal salt of the fluorosulfonylimide and a medium.
- the alkali metal salt of the fluorosulfonylimide of the present invention has a reduced content of impure ions and moisture, so that the electrolytic solution is hardly decomposed. Therefore, the electrochemical device provided with the electrolytic solution of the present invention as an ionic conductor can be an electrochemical device having stable characteristics over a long period of time.
- the medium examples include aprotic solvents and polymers.
- aprotic organic solvent the dielectric constant is large, the solubility of the electrolyte salt (alkali metal salt of fluorosulfonylimide, other electrolyte described later) is high, the boiling point is 60 ° C. or more, and the electrochemical stability
- a wide range of solvents is preferred. More preferably, it is an organic solvent (non-aqueous solvent) having a low water content. Specifically, the water content is preferably 250 ppm or less, more preferably 100 ppm or less, and even more preferably 50 ppm or less.
- the organic solvent having a low water content a commercially available dehydrated solvent or the like can be used.
- organic solvents examples include ethylene glycol dimethyl ether (1,2-dimethoxyethane), ethylene glycol diethyl ether, tetrahydrofuran, 2-methyltetrahydrofuran, 2,6-dimethyltetrahydrofuran, tetrahydropyran, crown ether, triethylene glycol dimethyl ether, Ethers such as tetraethylene glycol dimethyl ether, 1,4-dioxane, 1,3-dioxolane; dimethyl carbonate, ethyl methyl carbonate (methyl ethyl carbonate), diethyl carbonate (diethyl carbonate), diphenyl carbonate, methyl phenyl carbonate, etc.
- Ethers such as tetraethylene glycol dimethyl ether, 1,4-dioxane, 1,3-dioxolane; dimethyl carbonate, ethyl methyl carbonate (methyl ethyl carbonate), diethyl carbonate (die
- Polymers used as a medium include polyether polymers such as polyethylene oxide (PEO) and polypropylene oxide, methacrylic polymers such as polymethyl methacrylate (PMMA), nitrile polymers such as polyacrylonitrile (PAN), and polyvinylidene fluoride ( PVDF), fluoropolymers such as polyvinylidene fluoride-hexafluoropropylene, and copolymers thereof.
- PMMA polymethyl methacrylate
- PAN polyacrylonitrile
- PVDF polyvinylidene fluoride
- fluoropolymers such as polyvinylidene fluoride-hexafluoropropylene, and copolymers thereof.
- a polymer gel obtained by mixing these polymers with another organic solvent can also be used as the medium according to the present invention.
- the other organic solvent include the aprotic solvents described above.
- a solution obtained by dissolving an electrolyte such as an alkali metal salt of fluorosulfonylimide in the above-mentioned aprotic solvent in a polymer formed by a conventionally known method As a method for producing an electrolytic solution using the polymer gel as a medium, a solution obtained by dissolving an electrolyte such as an alkali metal salt of fluorosulfonylimide in the above-mentioned aprotic solvent in a polymer formed by a conventionally known method.
- a method in which an electrolyte solution previously dissolved in an aprotic solvent and a polymer are mixed, and then a film is formed by a casting method or a coating method to volatilize the aprotic solvent (the gel electrolyte); the melting point of the polymer A method in which a polymer and an electrolyte are melted at the above temperature, mixed and molded (intrinsic polymer electrolyte);
- the amount of the medium used is preferably 50 parts by mass to 99.9 parts by mass with respect to 100 parts by mass of the total amount of the electrolyte (an alkali metal salt of fluorosulfonylimide and another electrolyte) and the medium. More preferred is 60 to 99.5 parts by mass, and still more preferred is 70 to 99 parts by mass. If the amount of the medium is too small, it may be difficult to obtain sufficient ion conductivity. On the other hand, if the amount is too large, the ion concentration in the ion conductive material is likely to change due to volatilization of the solvent, and stable ion conductivity is obtained. It may be difficult to obtain.
- the electrolyte solution according to the present invention may contain only the alkali metal salt of fluorosulfonylimide as an electrolyte, but contains other electrolytes in addition to the alkali metal salt of fluorosulfonylimide. Also good. By using another electrolyte, the absolute amount of ions in the electrolytic solution can be increased, and the electrical conductivity can be improved.
- electrolytes those having a large dissociation constant in the electrolytic solution and having an anion that is difficult to solvate with the aprotic solvent are preferable.
- cation species constituting other electrolytes include alkali metal ions such as Li + , Na + and K + , alkaline earth metal ions such as Ca 2+ and Mg 2+ , and onium cations. Lithium ions are preferred.
- PF 6 ⁇ and BF 4 ⁇ are more preferable, and PF 6 ⁇ is particularly preferable.
- the abundance of the other electrolyte is preferably 0.1% by mass or 99% by mass or less in a total of 100% by mass of the alkali metal salt of fluorosulfonylimide and the other electrolyte. If the amount of other electrolytes is too small, it may be difficult to obtain the effect of using other electrolytes (for example, the absolute amount of ions is not sufficient and the electrical conductivity is reduced). When there is too much quantity, there exists a possibility that the movement of ion may be inhibited greatly. More preferably, it is 1 mass% or more, More preferably, it is 5 mass% or more, More preferably, it is 95 mass% or less, More preferably, it is 90 mass% or less.
- the electrolyte concentration in the electrolyte solution according to the present invention is preferably 0.1% by mass or more, and preferably less than the saturation concentration. If it is less than 0.1% by mass, the ionic conductivity is lowered, which is not preferable. More preferably, it is 0.5 mass% or more, More preferably, it is 1 mass% or more.
- the electrolyte concentration in the electrolytic solution is more preferably less than 50% by mass, further preferably 40% by mass or less, and still more preferably 30% by mass or less.
- the electrolyte solution of the present invention preferably has a sulfate ion content of 1500 ppm or less.
- sulfate ions correspond to impurities in the electrolytic solution of the present invention. When the content of such impurities is large, desired characteristics can be obtained when the electrolytic solution of the present invention is used in an electricity storage device. It may be difficult.
- the amount of sulfate ion in the electrolytic solution of the present invention is more preferably 500 ppm or less, and further preferably 250 ppm or less. The lower the sulfate ion content, the better, and most preferably 0 ppm.
- the lower limit of the sulfate ion content may be about 0.5 ppm, and may be 1 ppm or less. This is because the above-described problems are unlikely to occur within this range.
- the electrolyte solution of the present invention preferably has a reduced content of water, solvent, fluorine ions, chloride ions and potassium ions in addition to sulfate ions.
- the content of water is preferably 250 ppm or less in the electrolytic solution of the present invention, more preferably 150 ppm or less, and still more preferably 50 ppm or less.
- the content of the residual solvent is preferably 2000 ppm or less in the composition of the present invention, and more preferably 1500 ppm or less.
- the content of fluorine ions is preferably 500 ppm or less in the electrolytic solution of the present invention, more preferably 400 ppm or less, and still more preferably 150 ppm or less.
- the chloride ion content is preferably 100 ppm or less, more preferably 50 ppm or less in the electrolytic solution of the present invention.
- the potassium ion content in the electrolytic solution of the present invention is preferably 5000 ppm or less, more preferably 4000 ppm or less, even more preferably 2000 ppm or less, still more preferably 500 ppm or less, still more preferably 250 ppm or less, In particular, it is preferably 100 ppm or less, and most preferably 50 ppm or less.
- the contents of water, solvent, fluorine ions, chloride ions and potassium ions in the electrolytic solution of the present invention are most preferably 0 ppm, but for example, the lower limit may be about 0.5 ppm. Moreover, about 1 ppm may be sufficient. This is because, if the content of water, solvent, and fluorine ions is within the above ranges, problems caused by these impurities are unlikely to occur even when the electrolytic solution of the present invention is used in various electrochemical devices.
- the solvent contained in the residual solvent is a reaction solvent or water used in the production process of the alkali metal salt of fluorosulfonylimide.
- the reaction solvent used in the manufacturing process is the same as the solvent contained as the electrolyte medium, the solvent is not included in the residual solvent.
- the contents of the ions, water and residual solvent contained in the electrolytic solution of the present invention can be measured by, for example, ICP emission spectroscopic analysis, ion chromatography, Karl Fischer moisture meter, gas chromatography.
- ICP emission spectroscopy A multi-type ICP emission spectroscopic analyzer (“ICPE-9000” manufactured by Shimadzu Corporation) was prepared by using an aqueous solution having a concentration of 1% by mass obtained by mixing 0.1 g of a fluorosulfonylimide salt obtained in the following example with 9.9 g of ultrapure water. )It was used.
- Experimental example 1 Experimental Example 1-1 [Fluorination process] 1800 g of butyl acetate was added to a Pyrex (registered trademark) reaction vessel A (internal volume 10 L) equipped with a stirrer under a nitrogen stream, and 200 g (934 mmol) of bis (chlorosulfonyl) imide was added thereto at room temperature (25 ° C.). It was dripped at.
- Pyrex registered trademark
- the concentration of fluorosulfonylimide was measured by 19 F-NMR (solvent: deuterated acetonitrile) using the obtained organic layer as a sample, and the amount of trifluoromethylbenzene added as an internal standard substance in the measurement result chart. And the peak integration value derived from this and the peak integration value derived from the target product.
- a rotary evaporator (“REN-1000”, manufactured by IWAKI) equipped with a gas introduction tube and a pressure reducing device was charged with a flask (volume: 500 mL). While nitrogen gas was blown into the liquid in the flask at 500 mL / min, rotation was started while heating in a constant temperature water bath set at 60 ° C. (100 rpm). Next, the pressure in the apparatus was gradually reduced to 933 Pa, and a concentration process was performed for 12 hours. The concentration of the obtained solution was 72% by mass. The amount of heat applied in the concentration step was 72,000 J with respect to 1 g of lithium bis (fluorosulfonyl) imide.
- Experimental Example 1-2 A gas introduction tube and a decompression device were attached to a test tube having an outer diameter of 15 mm.
- a test tube 5 g of a butyl acetate solution of lithium bis (fluorosulfonyl) imide having a concentration of 45% by mass obtained in the cation exchange step 2 of Experimental Example 1-1 was put, and the pressure in the test tube was gradually reduced to 2666 Pa. .
- Concentration was started while heating in a constant temperature water bath set at 65 ° C. while blowing nitrogen gas into the liquid at a flow rate of 1 mL / min in a standard state while maintaining the degree of vacuum.
- the concentration step was performed for 2.5 hours, the concentration of lithium bis (fluorosulfonyl) imide in the obtained solution was 85% by mass.
- the amount of heat applied in the concentration step was 17,000 J with respect to 1 g of lithium bis (fluorosulfonyl) imide.
- Example 1-3 In the concentration step, experiment was performed except that air was used instead of nitrogen gas (supply rate: about 1 mL / min in the standard state), the temperature of the constant temperature bath was changed to 75 ° C., and the degree of vacuum was 667 Pa.
- lithium bis (fluorosulfonyl) imide was produced.
- the implementation time of the concentration step at this time was 2 hours, and the lithium bis (fluorosulfonyl) imide concentration of the solution obtained in the concentration step was 88% by mass.
- the amount of heat applied in the concentration step was 15,000 J with respect to 1 g of lithium bis (fluorosulfonyl) imide.
- Experimental Example 1-5 In the concentration step, the concentration step was performed for 20 hours in the same manner as in Experimental Example 1-2, except that nitrogen gas was not blown, the temperature of the constant temperature bath was 50 ° C., and the degree of vacuum was 667 Pa. . The concentration of the obtained solution was 60% by mass. The amount of heat applied in the concentration step was 100,000 J with respect to 1 g of lithium bis (fluorosulfonyl) imide.
- Table 1 shows the concentration conditions and results of Experimental Examples 1-1 to 1-5, and FIG. 1 shows the results of Experimental Examples 1-2 to 1-5.
- the amount of the reaction solvent is plotted against the concentration time.
- the alkali metal salt of fluorosulfonylimide as a product can be quickly obtained. It turns out that it can concentrate. Moreover, it turns out that the alkali metal salt of a fluoro sulfonylimide can be concentrated much more efficiently by performing a concentration process under reduced pressure. Furthermore, it can be seen from the comparison between Experimental Examples 1-1 and 1-5 that if the concentration step is carried out while bubbling, the alkali metal salt of fluorosulfonylimide can be efficiently concentrated even if the scale is increased.
- Experimental example 2 Experimental example 2-1 [Fluorination process] To a Pyrex (registered trademark) reaction vessel A equipped with a stirrer (internal volume 5 L), 900 g of butyl acetate was added under a nitrogen stream, and 100 g (467 mmol) of bis (chlorosulfonyl) imide was added thereto at room temperature (25 ° C.). It was dripped at.
- Pyrex registered trademark
- butyl acetate was added under a nitrogen stream, and 100 g (467 mmol) of bis (chlorosulfonyl) imide was added thereto at room temperature (25 ° C.). It was dripped at.
- the concentration of fluorosulfonylimide was measured by 19 F-NMR (solvent: deuterated acetonitrile) using the obtained organic layer as a sample, and the amount of trifluoromethylbenzene added as an internal standard substance in the measurement result chart. And the peak integration value derived from this and the peak integration value derived from the target product.
- the temperature of the heating surface is 100 ° C.
- the pressure is 1.333 kPa
- the rotor At a rotation speed of 300 rpm, 120 g of a 45% by mass lithium bis (fluorosulfonyl) imide solution was supplied into the apparatus at a supply rate of 2 g / min, and after thin film distillation was performed, the apparatus was stopped and the concentrated liquid was extracted.
- the concentration of lithium bis (fluorosulfonyl) imide in the obtained solution was 80% by mass.
- the amount of heat applied in the concentration step was 20,000 J with respect to 1 g of lithium bis (fluorosulfonyl) imide.
- Experimental Example 2-2 In the concentration step, lithium bis (fluorosulfonyl) imide was produced in the same manner as in Experimental Example 2-1, except that the thin film temperature was changed to 75 ° C. At this time, the supply rate of the lithium bis (fluorosulfonyl) imide solution was 2 g / min (thin film distillation time: 1 hour), and the concentration of the solution obtained in the concentration step was 63% by mass. The amount of heat applied in the concentration step was 15,000 J with respect to 1 g of lithium bis (fluorosulfonyl) imide.
- Experimental Example 2-3 In the concentration step, lithium bis (fluorosulfonyl) imide was produced in the same manner as in Experimental Example 2-1, except that the thin film temperature was changed to 50 ° C. At this time, the supply rate of the lithium bis (fluorosulfonyl) imide solution was 2 g / min (thin film distillation time: 1 hour), and the concentration of the solution obtained in the concentration step was 58% by mass. The amount of heat applied in the concentration step was 10,000 J with respect to 1 g of lithium bis (fluorosulfonyl) imide.
- Experimental Examples 2-1 to 2-3 including the concentration step by thin film distillation are compared with Experimental Example 2-4 that does not employ the thin film distillation method. It can be seen that the product, lithium bis (fluorosulfonyl) imide, can be concentrated in a short time.
- Experimental example 3 The lithium bis (fluorosulfonyl) imide solution obtained by carrying out the fluorination step and the cation exchange step 1 and 2 in the same manner as in Experimental Example 2-1 was added to a rotary evaporator (“REN-1000”, manufactured by IWAKI). Then, the solvent was distilled off under reduced pressure to obtain 140 g of lithium bis (fluorosulfonyl) imide solution (concentration: 45% by mass). The obtained solution was poured into a stainless steel vat (length: 29 cm, width: 22 cm, height: 5 cm) coated with Teflon (registered trademark).
- Experimental Example 4 According to the following method, the heat resistance (mass reduction rate, 2% mass reduction temperature) and impurity content of the alkali metal salt of fluorosulfonylimide obtained in Experimental Example 2-1 and Experimental Example 3 were measured.
- the water content of the samples used for heat resistance 1 and 2 was measured by “AQ-2000” manufactured by Hiranuma Sangyo Co., Ltd., and they were 64 ppm and 68 ppm, respectively.
- [Impurity content] 0.01 g of the alkali metal salt of fluorosulfonylimide obtained in the above experimental example was diluted 1000 times with ultrapure water (over 18.2 ⁇ ⁇ cm) to obtain a measurement solution, and ion chromatography system ICS-3000 (Nippon Dionex) The amount of halide ions (F ⁇ , Cl ⁇ ) and sulfate ions (SO 4 2 ⁇ ) contained in the alkali metal salt of fluorosulfonylimide was measured.
- Ion exchange Eluent 7-20 mM KOH aqueous solution
- Detector Conductivity detector
- Column Anion analysis column Ion PAC AS-17C (manufactured by Nippon Dionex Co., Ltd.) The amounts of potassium ion, sodium ion and zinc ion were measured by the above ICP emission spectroscopic analysis method.
- the lithium bis (fluorosulfonyl) imide of Experimental Example 3 which was concentrated and dried by a shelf-type vacuum dryer, had a higher impurity content and lower heat resistance than Experimental Example 2-1. there were. This is because the shelf-type vacuum dryer must remove the solvent from lithium bis (fluorosulfonyl) imide and heat it for a long time to dry (7 days). At this time, lithium bis (fluorosulfonyl) imide Is decomposed slightly, and the resulting decomposition product is considered to reduce the heat resistance of lithium bis (fluorosulfonyl) imide.
- Experimental Example 5 The fluorination step and cation exchange step 1 and 2 were carried out in the same manner as in Experimental Example 2-1, to obtain a butyl acetate solution of lithium bis (fluorosulfonyl) imide.
- the alkali metal salt concentration step, the drying step, and the powdering step of fluorosulfonylimide were performed in the same manner as in the experimental example 2-1.
- the impurity content of the alkali metal salt of the obtained fluorosulfonylimide was measured in the same manner as in Experimental Example 4.
- the water content was measured according to the following method.
- the results are shown in Table 3.
- the results of Experimental Example 2-1 and Experimental Example 3 are also shown in Table 3.
- the alkali metal salts of fluorosulfonylimide obtained in Experimental Examples 5-1 to 5-16 do not contain any unreacted raw materials or compounds in the middle of the reaction, both of which are fluorinated. The cation exchange was confirmed.
- the sample injection amount is 0.1 ml to 3 ml depending on the moisture content of the sample, “Hydranal (registered trademark) Chromat AK” (manufactured by Sigma Aldrich) is used as the generated solution, and “Hydranal” is used as the counter electrode solution. “Nar (registered trademark) Chromat CG-K” (manufactured by Sigma Aldrich) was used.
- the sample was injected from the sample inlet using a syringe so as not to touch the outside air.
- the moisture content of the alkali metal salt of fluorosulfonylimide is determined by measuring the moisture content of methanol used for dilution and subtracting the moisture content of methanol from the moisture content (measured value) of the sample solution. Asked.
- the yield means the yield from the concentration step. In Examples 5-3 to 5-6, 5-15 to 5-16, and Example 3, the yield was not calculated. “Purity 100%” means that no peaks other than those derived from fluorosulfonylimide and an internal standard substance were confirmed in the chart obtained by 19 F-NMR (solvent: deuterated acetonitrile) measurement. To do.
- Experimental Example 6 The amount of residual solvent contained in the alkali metal salt of fluorosulfonylimide obtained in Experimental Examples 2-1, 3 and 5 was measured by the following method.
- Experimental Example 7 According to the same method as in Experimental Example 4, the heat resistance (mass reduction rate, 2% mass reduction temperature) of the alkali metal salt of fluorosulfonylimide obtained in Experimental Example 5 was measured. The results are shown in Table 6. For comparison, Table 5 also shows the amount of impurities in each experimental example and the results of experimental example 2-1 and experimental example 3.
- Experimental Example 8 1 g of lithium bis (fluorosulfonyl) imide obtained in Experimental Example 2-1 was dissolved in 9 g (50/50, volume ratio) of a mixed solution of ethylene carbonate / ethyl methyl carbonate to prepare an electrolytic solution 1. Similarly, an electrolytic solution 2 was produced using the lithium bis (fluorosulfonyl) imide obtained in Experimental Example 3.
- Electrolytes 1 and 2 were each sealed in a 20 ml brown screw tube to prevent moisture from entering from the outside.
- the screw tubes containing the respective electrolytes were stored for 2 months in an environment at a temperature of 25 ° C., and changes with time of the electrolytes 1 and 2 were evaluated.
- the electrolytic solution 1 produced using the product of Experimental Example 2-1 as a raw material showed no change in appearance and was a colorless and transparent liquid, but the electrolytic solution 2 produced using the product of Experimental Example 3 as a raw material. Was colored yellow-orange.
- the impurity content was measured by the ion chromatography about the measurement solution which diluted the electrolyte solutions 1 and 2 before and behind storage with the ultrapure water. The results are shown in Table 6.
- the fluoride ion amount was 2 ppm (before storage: 1 ppm), and the sulfate ion amount was 14 ppm (before storage: 14 ppm). It was almost the same value as before.
- the amount of fluoride ions was 153 ppm (before storage: 122 ppm) and the amount of sulfate ions was 413 ppm (339 ppm), indicating that impurities were increased compared to before storage. confirmed. From this result, it was found that the electrolytic solution of the present invention was excellent in storage stability.
- the solvent can be quickly removed from the reaction solution, and an alkali metal salt of fluorosulfonylimide can be produced efficiently.
- a decrease in yield due to thermal decomposition of the alkali metal salt of fluorosulfonylimide can be suppressed, and as a result, the heat resistance of the alkali metal salt of fluorosulfonylimide. Can be suppressed.
- the alkali metal salt of fluorosulfonylimide of the present invention is useful as an ion conductor for various electrochemical devices.
- the production method of the present invention is suitable as an industrial method for producing an alkali metal salt of fluorosulfonylimide.
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Abstract
Description
(1)フルオロスルホニルイミドのアルカリ金属塩を含む反応溶液中にガスをバブリングしながらフルオロスルホニルイミドのアルカリ金属塩溶液を濃縮する工程、及び/又は、
(2)フルオロスルホニルイミドのアルカリ金属塩を含む反応溶液を薄膜蒸留により濃縮する工程
を含むところに特徴を有する。
本発明のフルオロスルホニルイミドのアルカリ金属塩とは、下記一般式(I)で表されるフルオロスルホニルイミドのアルカリ金属塩であって、空気気流下、100℃で8時間保持したときの質量減少率が2%以下であるところに特徴を有する。
また、本発明には、上記フルオロスルホニルイミドのアルカリ金属塩を含む組成物も含まれる。本発明の組成物は、フルオロスルホニルイミドのアルカリ金属塩と、硫酸イオン、水、残留溶媒およびフッ素イオンの合計100質量%(以下、「本発明の組成物」という)に対する硫酸イオンの含有量が、3000ppm以下であるのが好ましい。より好ましくは1000ppm以下であり、より一層好ましくは500ppm以下であり、さらに好ましくは300ppm以下である。硫酸イオンは、本発明の組成物中に含まれていないことが最も好ましいが、例えば下限は1ppm程度であればよい。本発明の組成物を電気化学デバイス用の電解液に用いても、電解液の分解や電気化学デバイスの構成部材の腐食といった問題を生じ難いからである。
なお、上記各種イオンの含有量は、上記測定方法により検出される値である。したがって、固体のフルオロスルホニルイミドのアルカリ金属塩中、または、本発明の組成物中では、上記イオンは対イオンとの塩として存在しているものと考えられる。
本発明のフルオロスルホニルイミドのアルカリ金属塩の製造方法とは、(1)フルオロスルホニルイミドのアルカリ金属塩を含む反応溶液中にガスをバブリングしながらフルオロスルホニルイミドのアルカリ金属塩溶液を濃縮する工程、及び/又は、(2)薄膜蒸留によりフルオロスルホニルイミドのアルカリ金属塩溶液を濃縮する工程、を含む点に特徴を有するものである。したがって、上記(1)及び/又は(2)の工程を含んでいればよく、その他の工程は特に限定されない。本発明においては、フルオロスルホニルイミドのアルカリ金属塩を合成する方法は特に限定されず、従来公知の方法は全て採用することが出来る。例えば、フルオロスルホニルイミドの合成方法としては、特許文献1に記載の、尿素の存在下で、フルオロスルホン酸(HFSO3)を蒸留することによって(フルオロスルホニル)イミドを得る方法、クロロスルホニルイミドからフッ素化剤を用いてフルオロスルホニルイミドを合成する方法等が挙げられる。また、フルオロスルホニルイミドのアルカリ金属塩を得る方法としては、上記方法により得られたフルオロスルホニルイミドのカチオンをアルカリ金属カチオンとカチオン交換する方法が挙げられる。以下では、上記方法の中でも、クロロスルホニルイミドからフッ素化剤を用いてフルオロスルホニルイミドを合成し(フッ素化工程)、次いで、カチオン交換反応(カチオン交換工程)により、フルオロスルホニルイミドのアルカリ金属塩を合成する方法について説明する。
フッ素化工程では、クロロスルホニルイミド又はその塩のフッ素化反応を行う。出発原料となるクロロスルホニルイミドは、市販のものを使用してもよく、また、公知の方法で合成したものを用いてもよい。
次に、カチオン交換工程について説明する。クロロスルホニルイミド類またはフルオロスルホニルイミドまたはその塩(以下、フルオロスルホニルイミド類と言う場合がある)を、所望のカチオンを含む塩と反応させることで、カチオン交換することができる。カチオンとしては、Li,Na,K,Rb,Csなどのアルカリ金属、または、後述するオニウムカチオンが好ましい。アルカリ金属を含むフルオロスルホニルイミド塩は、高温で溶融させたり、あるいは、適当な有機溶媒に溶解させることで、各種電気化学デバイスのイオン伝導体材料として使用することができる。また、オニウムカチオンを含むフルオロスルホニルイミド塩は、常温で溶融した状態を安定に保つ常温溶融塩となり、長期間の使用に耐える電気化学デバイスのイオン伝導体材料や、有機合成における反応溶媒等として好適なものとなる。より好ましいフルオロスルホニルイミド塩としては、リチウムカチオンや、オニウムカチオンを含むフルオロスルホニルイミド塩が挙げられる。
濃縮工程は、カチオン交換工程後の反応溶液から溶媒を除去して、生成したフルオロスルホニルイミドのアルカリ金属塩溶液を濃縮する工程である。本発明では、(1)反応溶液中にガスをバブリングする方法(バブリング法)、及び/又は、(2)薄膜蒸留法により、濃縮工程を実施する。
濃縮工程で得られたフルオロスルホニルイミドのアルカリ金属塩濃縮液は、そのまま製品とすることもできるが、保存時の安定性を高め、また、製品の流通を容易にするため、フルオロスルホニルイミドのアルカリ金属塩を粉体化してもよい(粉体化、乾燥工程)。なお、濃縮工程で、固体状態のフルオロスルホニルイミドのアルカリ金属塩を得た場合には、得られた固体をそのまま乾燥装置で乾燥してもよく、また、フルオロスルホニルイミドのアルカリ金属塩が可溶な溶媒に溶解させた後、乾燥、粉体化工程に供してもよい。
本発明の製造方法では、上記各工程で生成物から分離されたフルオロスルホニルイミドのアルカリ金属塩やスルホニルイミド骨格を有する化合物を回収する工程を設けてもよい。特に、薄膜蒸留法を採用する濃縮工程で排出される廃液や、上記粉体化、乾燥工程で析出したフルオロスルホニルイミドのアルカリ金属塩を除去した溶液(母液)には、溶解したフルオロスルホニルイミドのアルカリ金属塩が含まれているので、これを回収することでフルオロスルホニルイミドのアルカリ金属塩の収率を向上させることができる。
本発明には、上記フルオロスルホニルイミドのアルカリ金属塩と媒体とを含む電解液も含まれる。本発明のフルオロスルホニルイミドのアルカリ金属塩は、上述のように、不純なイオンや水分の含有量が低減されているので、電解液の分解が生じ難いものである。したがって、本発明の電解液をイオン伝導体として備えた電気化学デバイスは長期に亘って安定した特性を有する電気化学デバイスとすることができる。
1H-NMR、19F-NMRの測定は、Varian社製の「Unity Plus-400」を使用して行った(内部標準物質:トリフルオロメチルベンゼン、溶媒:重アセトニトリル、積算回数:16回)。
下記例で得られたフルオロスルホニルイミド塩0.1gを超純水9.9gと混合した濃度1質量%の水溶液を測定試料とし、マルチタイプICP発光分光分析装置(島津製作所製「ICPE-9000」)を使用した。
実験例1-1
〔フッ素化工程〕
攪拌装置を備えたパイレックス(登録商標)製反応容器A(内容量10L)に、窒素気流下で酢酸ブチル1800gを加え、ここに200g(934mmol)のビス(クロロスルホニル)イミドを室温(25℃)で滴下した。
攪拌装置を備えたパイレックス(登録商標)製反応容器B(内容量10L)に、25質量%アンモニア水540g(7928mmol、ビス(クロロスルホニル)イミドに対して8.49当量)を加えた。アンモニア水の攪拌下、室温で、反応容器Bに、反応容器Aの反応溶液を滴下して加えた。反応溶液の滴下終了後、攪拌を停止し、水層と酢酸ブチル層の2層に分かれた反応溶液から、塩化亜鉛などの副生物を含む水層を除去し、有機層として、アンモニウムビス(フルオロスルホニル)イミドの酢酸ブチル溶液を得た。得られた有機層を試料として、19F-NMR(溶媒:重アセトニトリル)測定を行った。得られたチャートにおいて、内部標準物質として加えたトリフルオロメチルベンゼンの量、及び、これに由来するピークの積分値と、目的生成物に由来するピークの積分値との比較から、有機層に含まれるアンモニウムビス(フルオロスルホニル)イミドの粗収量を求めた(756mmol)。
19F-NMR(溶媒:重アセトニトリル):δ56.0
得られた有機層に含まれるアンモニウムビス(フルオロスルホニル)イミドに対して、リチウムの量が2当量となるように、15質量%の水酸化リチウム水溶液242g(Liとして1516mmol)を加え、室温で10分間攪拌した。その後、反応溶液から水層を除去して、リチウムビス(フルオロスルホニル)イミドの酢酸ブチル溶液を得た。
まず、カチオン交換工程で得られたリチウムビス(フルオロスルホニル)イミド溶液をロータリーエバポレーター(「REN-1000」、IWAKI社製)に加えて、減圧下で溶媒を留去し、リチウムビス(フルオロスルホニル)イミド溶液282gを得た(濃度:45質量%)。
得られた濃縮液125gに、トルエン125gを加えて、25℃で1時間静置し、リチウムビス(フルオロスルホニル)イミドの固体を析出させた。得られた固体をろ取し、これを50℃で真空乾燥することで、リチウムビス(フルオロスルホニル)イミドを得た(収量:68g、収率:76%(濃縮工程より))。
外径15mmの試験管にガス導入管及び減圧装置を装着した。試験管の中に、実験例1-1のカチオン交換工程2で得られた45質量%の濃度のリチウムビス(フルオロスルホニル)イミドの酢酸ブチル溶液5gを入れ、試験管内を2666Paまで徐々に減圧した。減圧度を保ったまま更に標準状態で1mL/分の流量で窒素ガスを液中に吹き込みながら、65℃に設定した恒温水槽で加熱しながら濃縮を開始した。2.5時間濃縮工程を行ったところ、得られた溶液のリチウムビス(フルオロスルホニル)イミドの濃度は85質量%であった。濃縮工程で加えられた熱量は、リチウムビス(フルオロスルホニル)イミド1gに対して、17,000Jであった。
濃縮工程において、窒素ガスに代えて空気を使用したこと(供給速度:標準状態で約1mL/分)、恒温水槽の温度を75℃に変更したこと、減圧度を667Paとしたこと以外は、実験例1-2と同様にして、リチウムビス(フルオロスルホニル)イミドの製造を行った。このときの濃縮工程の実施時間は2時間であり、濃縮工程で得られた溶液のリチウムビス(フルオロスルホニル)イミド濃度は88質量%であった。濃縮工程で加えられた熱量は、リチウムビス(フルオロスルホニル)イミド1gに対して、15,000Jであった。
濃縮工程において、窒素ガスに代えて空気を使用したこと(供給速度:標準状態で約1mL/分)、恒温水槽の温度を50℃に変更したこと、減圧度を667Paとしたこと以外は、実験例1-2と同様にして、リチウムビス(フルオロスルホニル)イミドの製造を行った。このときの濃縮工程の実施時間は10時間であり、濃縮工程で得られた溶液のリチウムビス(フルオロスルホニル)イミド濃度は84質量%であった。濃縮工程で加えられた熱量は、リチウムビス(フルオロスルホニル)イミド1gに対して、50,000Jであった。
濃縮工程において、窒素ガスを吹き込まなかったこと、恒温水槽の温度を50℃としたこと、減圧度を667Paとしたこと以外は、実験例1-2と同様にして、20時間濃縮工程を行った。得られた溶液の濃度は60質量%であった。濃縮工程で加えられた熱量は、リチウムビス(フルオロスルホニル)イミド1gに対して、100,000Jであった。
実験例2-1
〔フッ素化工程〕
攪拌装置を備えたパイレックス(登録商標)製反応容器A(内容量5L)に、窒素気流下で酢酸ブチル900gを加え、ここに100g(467mmol)のビス(クロロスルホニル)イミドを室温(25℃)で滴下した。
攪拌装置を備えたパイレックス(登録商標)製反応容器B(内容量1L)に、25質量%アンモニア水270g(3964mmol、ビス(クロロスルホニル)イミドに対して8.49当量)を加えた。アンモニア水の攪拌下、室温で、反応容器Bに、反応容器Aの反応溶液を滴下して加えた。反応溶液の滴下終了後、攪拌を停止し、水層と酢酸ブチル層の2層に分かれた反応溶液から、塩化亜鉛などの副生物を含む水層を除去し、有機層として、アンモニウムビス(フルオロスルホニル)イミドの酢酸ブチル溶液を得た。得られた有機層を試料として、19F-NMR(溶媒:重アセトニトリル)測定を行った。得られたチャートにおいて、内部標準物質として加えたトリフルオロメチルベンゼンの量、及び、これに由来するピークの積分値と、目的生成物に由来するピークの積分値との比較から、有機層に含まれるアンモニウムビス(フルオロスルホニル)イミドの粗収量を求めた(378mmol)。
19F-NMR(溶媒:重アセトニトリル):δ56.0
得られた有機層に含まれるアンモニウムビス(フルオロスルホニル)イミドに対して、リチウムの量が2当量となるように、15質量%の水酸化リチウム水溶液121g(Liとして758mmol)を加え、室温で10分間攪拌した。その後、反応溶液から水層を除去して、リチウムビス(フルオロスルホニル)イミドの酢酸ブチル溶液を得た。
カチオン交換工程で得られたリチウムビス(フルオロスルホニル)イミド溶液をロータリーエバポレーター(「REN-1000」、IWAKI社製)に加えて、減圧下で溶媒を留去し、リチウムビス(フルオロスルホニル)イミド溶液141gを得た(濃度:45質量%)。
次いで、得られた濃縮液67.5gに、トルエン600gを加えて、25℃で1時間静置し、リチウムビス(フルオロスルホニル)イミドの固体を析出させた。得られた固体をろ取し、これを50℃で真空乾燥することで、リチウムビス(フルオロスルホニル)イミドを得た(収量:38g、濃縮工程からの収率:56%)。このとき、ろ液には、濃縮工程からの収率で44質量%に相当するリチウムビス(フルオロスルホニル)イミドが含まれていた。なお、ろ液に含まれるリチウムビス(フルオロスルホニル)イミドは、ろ液を再び濃縮工程、粉体化、乾燥工程に供することで回収することができる。
濃縮工程において、薄膜温度を75℃に変更したこと以外は、実験例2-1と同様にして、リチウムビス(フルオロスルホニル)イミドの製造を行った。このときのリチウムビス(フルオロスルホニル)イミド溶液の供給速度は2g/分(薄膜蒸留時間:1時間)であり、濃縮工程で得られた溶液の濃度は63質量%であった。また、濃縮工程で加えられた熱量は、リチウムビス(フルオロスルホニル)イミド1gに対して、15,000Jであった。
濃縮工程において、薄膜温度を50℃に変更したこと以外は、実験例2-1と同様にして、リチウムビス(フルオロスルホニル)イミドの製造を行った。このときのリチウムビス(フルオロスルホニル)イミド溶液の供給速度は2g/分(薄膜蒸留時間:1時間)であり、濃縮工程で得られた溶液の濃度は58質量%であった。また、濃縮工程で加えられた熱量は、リチウムビス(フルオロスルホニル)イミド1gに対して、10,000Jであった。
短行程蒸留装置に代えて、ロータリーエバポレーター(「REN-1000」、IWAKI社製)を使用した。45質量%の濃度のリチウムビス(フルオロスルホニル)イミドの酢酸ブチル溶液10gを入れたフラスコをロータリーエバポレーターに装着し、これを50℃に設定した恒温水槽で加熱しながら回転を開始し(100rpm)、系内を667Paにまで減圧して、20時間濃縮工程を行った。得られた溶液の濃度は60質量%であった。また、濃縮工程で加えられた熱量は、リチウムビス(フルオロスルホニル)イミド1gに対して、100,000Jであった。
実験例2-1と同様にしてフッ素化工程およびカチオン交換工程1,2を実施して得られたリチウムビス(フルオロスルホニル)イミド溶液をロータリーエバポレーター(「REN-1000」、IWAKI社製)に加えて、減圧下で溶媒を留去し、リチウムビス(フルオロスルホニル)イミド溶液140gを得た(濃度45質量%)。得られた溶液を、テフロン(登録商標)コーティングされたステンレス鋼製のバット(長さ:29cm、幅22cm、高さ5cm)に流し込み、これを棚段減圧乾燥機に入れ、温度50℃、減圧度150Paで7日間乾燥を行って、リチウムビス(フルオロスルホニル)イミドの固体を得た(収量:63g)。濃縮時に加えられた熱量は、リチウムビス(フルオロスルホニル)イミド1gに対して、1,200,000Jであった。
下記方法に従って、実験例2-1および実験例3で得られたフルオロスルホニルイミドのアルカリ金属塩の耐熱性(質量減少率、2%質量減少温度)、および、不純物含有量を測定した。
アルミパンに約20mgの試料を量り取り、示差熱熱重量同時測定装置(「EXSTAR TG/DTA6200」、エスアイアイ・ナノテクノロジー株式会社製)を使用して、乾燥空気気流下(流量200mL/分)、100℃で8時間試料を保持した後の質量減少量を測定した。
アルミパンに量り取った約20mgの試料を、示差熱熱重量同時測定装置(「EXSTAR TG/DTA6200」、エスアイアイ・ナノテクノロジー株式会社製)を使用して、乾燥空気の流量200mL/分、測定温度範囲25℃~450℃、昇温速度10℃/分で加熱し、質量減少の様子を観察した。
上記実験例で得られたフルオロスルホニルイミドのアルカリ金属塩0.01gを超純水(18.2Ω・cm超)で1000倍に希釈して測定溶液とし、イオンクロマトグラフィーシステム ICS-3000(日本ダイオネクス株式会社製)を用いて、フルオロスルホニルイミドのアルカリ金属塩中に含まれるハロゲン化物イオン(F-,Cl-)、および硫酸イオン(SO4 2-)の量を測定した。
分離モード:イオン交換
溶離液:7~20mM KOH水溶液
検出器:電気伝導度検出器
カラム:アニオン分析用カラム Ion PAC AS-17C(日本ダイオネクス株式会社製)
なお、カリウムイオン、ナトリウムイオンおよび亜鉛イオン量は、上記ICP発光分光分析法により測定した。
実験例2-1と同様にしてフッ素化工程およびカチオン交換工程1,2を実施して、リチウムビス(フルオロスルホニル)イミドの酢酸ブチル溶液を得た。
実験例5-1~5-16の各実験例では、実験例2-1と同様にして、フルオロスルホニルイミドのアルカリ金属塩の濃縮工程、乾燥、粉体化工程を行った。
平沼産業(株)製カールフィッシャー水分測定装置「AQ-2100」を用いて行った。測定試料は、各実験例で得られたフルオロスルホニルイミドのアルカリ金属塩0.3gをメタノールで10倍に希釈して調製した。なお、試料の調整及び測定などの一連の操作は、ドライルーム(温度:25℃、露点:-70℃~-50℃)で行った。試料注入量は試料の水分含有量に応じて0.1ml~3mlとし、発生液には「ハイドラナール(登録商標) クローマットAK」(Sigma Aldrich社製)を使用し、対極液には「ハイドラナール(登録商標) クローマットCG-K」(Sigma Aldrich社製)を使用した。試料は、外気に触れないよう注射器を用いて試料注入口より注入した。同様にして、希釈に使用したメタノールの水分含有量を測定し、試料溶液の水分含有量(測定値)から、メタノールの水分含有量を差し引くことで、フルオロスルホニルイミドのアルカリ金属塩の水分含有量を求めた。
なお、実験例5では、いずれの実験例も不純物イオン量は少ないものの、実験例間においてその含有量にややバラツキが見られている。これは、フルオロスルホニルイミドが熱による影響を受け易いため、同じ操作を行っていても不純物の生成量に多少のバラツキが見られたものと考えられる。
実験例2-1、3及び5で得られたフルオロスルホニルイミドのアルカリ金属塩に含まれる残留溶媒量を、下記方法により測定した。
上記実験例で得られたフルオロスルホニルイミドのアルカリ金属塩0.05gにジメチルスルホキシド水溶液(ジメチルスルホキシド/超純水=20/80、体積比)200μl、20質量%塩化ナトリウム水溶液2mlを加えて測定溶液とし、これをバイアル瓶に入れ密閉し、ヘッドスペース-ガスクロマトグラフィーシステム(「Agilent6890」、Agilent社製)により、フルオロスルホニルイミドのアルカリ金属塩中に含まれる残留溶媒量を測定した。
装置:Agilent6890
カラム:HP-5(長さ:30m、カラム内径:0.32mm、膜厚:0.25μm)(Agilent社製)
カラム温度条件:60℃(2分保持)、30℃/分で300℃まで昇温、300℃(2分保持)
ヘッドスペース条件:80℃(30分保持)
インジェクター温度:250℃
検出器:FID(300℃)
結果を表4に示す。また、実験例2-1及び実験例3における残留溶媒量も併せて表4に示す。
実験例4と同様の方法に従って、実験例5で得られたフルオロスルホニルイミドのアルカリ金属塩の耐熱性(質量減少率、2%質量減少温度)を測定した。結果を表6に示す。比較のため、各実験例における不純物量、及び、実験例2-1、実験例3の結果を表5に併せて示す。
実験例2-1で得られたリチウムビス(フルオロスルホニル)イミド1gを、エチレンカーボネート/エチルメチルカーボネートの混合溶液9g(50/50、体積比)に溶解し、電解液1を作製した。同様にして実験例3で得られたリチウムビス(フルオロスルホニル)イミドを用いて電解液2を作製した。
Claims (17)
- さらに、F-の含有量が1000ppm以下である請求項3に記載のフルオロスルホニルイミドのアルカリ金属塩。
- 水の含有量が500ppm以下である請求項3又は4に記載のフルオロスルホニルイミドのアルカリ金属塩。
- 4000ppm以下の残留溶媒を含む請求項3~5のいずれかに記載のフルオロスルホニルイミドのアルカリ金属塩。
- 水の含有量が250pm以下である請求項7に記載の電解液。
- 2000ppm以下の残留溶媒を含む請求項7または8に記載の電解液。
- さらに、F-の含有量が500ppm以下である請求項7~9のいずれかに記載の電解液。
- 請求項1~6のいずれかに記載のフルオロスルホニルイミドのアルカリ金属塩の製造方法であって、
フルオロスルホニルイミドのアルカリ金属塩を含む反応溶液中にガスをバブリングしながらフルオロスルホニルイミドのアルカリ金属塩溶液を濃縮する工程、及び/又は、
薄膜蒸留によりフルオロスルホニルイミドのアルカリ金属塩溶液を濃縮する工程
を含むことを特徴とするフルオロスルホニルイミドのアルカリ金属塩の製造方法。 - 前記濃縮工程を150℃以下で行う請求項11に記載のフルオロスルホニルイミドのアルカリ金属塩の製造方法。
- 前記濃縮工程を40kPa以下で行う請求項11または12に記載のフルオロスルホニルイミドのアルカリ金属塩の製造方法。
- 前記反応溶液に含まれる反応溶媒が、エステル系溶媒及び/又はニトリル系溶媒である請求項11~13のいずれかに記載のフルオロスルホニルイミドのアルカリ金属塩の製造方法。
- 請求項1~6のいずれかに記載のフルオロスルホニルイミドのアルカリ金属塩の製造方法であって、
薄膜蒸留によりフルオロスルホニルイミドのアルカリ金属塩溶液を濃縮する工程を含むことを特徴とするフルオロスルホニルイミドのアルカリ金属塩の製造方法。 - 濃縮工程で得られた濃縮液を100℃以下で加熱して乾燥する工程を含む請求項11~15のいずれかに記載のフルオロスルホニルイミドのアルカリ金属塩の製造方法。
- 反応溶媒の存在下で、クロロスルホニルイミドまたはその塩をフッ素化する工程を含む請求項11~16のいずれかに記載のフルオロスルホニルイミドのアルカリ金属塩の製造方法。
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EP20172094.3A EP3705453B1 (en) | 2010-05-28 | 2011-05-27 | Alkali metal salt of fluorosulfonyl imide |
EP18204391.9A EP3461789B1 (en) | 2010-05-28 | 2011-05-27 | Production method for alkali metal salt of bis(fluorosulfonyl) imide |
EP20193688.7A EP3763670A1 (en) | 2010-05-28 | 2011-05-27 | Alkali metal salt of fluorosulfonyl imide |
CN201911157243.5A CN111072000B (zh) | 2010-05-28 | 2011-05-27 | 氟磺酰亚胺的碱金属盐及其制备方法和电解液 |
KR1020127034082A KR101361701B1 (ko) | 2010-05-28 | 2011-05-27 | 플루오로설포닐이미드의 알칼리 금속염 및 그 제조방법 |
EP20204417.8A EP3792221B1 (en) | 2010-05-28 | 2011-05-27 | Alkali metal salt of fluorosulfonyl imide |
CN201180026278.0A CN102917979B (zh) | 2010-05-28 | 2011-05-27 | 氟磺酰亚胺的碱金属盐及其制备方法 |
EP20198980.3A EP3778473B1 (en) | 2010-05-28 | 2011-05-27 | Alkali metal salt of fluorosulfonyl imide |
EP20182860.5A EP3736250B1 (en) | 2010-05-28 | 2011-05-27 | Alkali metal salt of fluorosulfonyl imide |
EP20177521.0A EP3733596B1 (en) | 2010-05-28 | 2011-05-27 | Alkali metal salt of fluorosulfonyl imide |
EP20188643.9A EP3750849A1 (en) | 2010-05-28 | 2011-05-27 | Alkali metal salt of fluorosulfonyl imide, and production method therefor |
JP2012517349A JP5074636B2 (ja) | 2010-05-28 | 2011-05-27 | フルオロスルホニルイミドのアルカリ金属塩およびその製造方法 |
EP11786792.9A EP2578533B1 (en) | 2010-05-28 | 2011-05-27 | Alkali metal salt of fluorosulfonyl imide, and production method therefor |
PL11786792T PL2578533T3 (pl) | 2010-05-28 | 2011-05-27 | Sól metalu alkalicznego fluorosulfonyloimidu i sposób jej wytwarzania |
PL20172094T PL3705453T3 (pl) | 2010-05-28 | 2011-05-27 | Sól metalu alkalicznego fluorosulfonyloimidu |
US13/700,364 US9079780B2 (en) | 2010-05-28 | 2011-05-27 | Alkali metal salt of fluorosulfonyl imide, and production method therefor |
TW100125252A TWI406869B (zh) | 2010-09-01 | 2011-07-15 | An alkali metal salt of fluosulfonyl imide and a process for producing the same |
US14/560,315 US9586833B2 (en) | 2010-05-28 | 2014-12-04 | Alkali metal salt of fluorosulfonyl imide, and production method therefor |
US15/409,708 US9985317B2 (en) | 2010-05-28 | 2017-01-19 | Alkali metal salt of fluorosulfonyl imide, and production method therefor |
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WO2021171948A1 (ja) * | 2020-02-27 | 2021-09-02 | 株式会社日本触媒 | 組成物、電解液材料及び電解液 |
WO2022186160A1 (ja) | 2021-03-01 | 2022-09-09 | 株式会社日本触媒 | 電解質成形体の製造方法及び電解質成形体 |
WO2023276812A1 (ja) | 2021-06-30 | 2023-01-05 | 株式会社日本触媒 | 組成物の製造方法及び非水電解液 |
WO2023276561A1 (ja) | 2021-06-30 | 2023-01-05 | 株式会社日本触媒 | 非水電解液の製造方法 |
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