WO2011056948A3 - Methods of texturing surfaces for controlled reflection - Google Patents

Methods of texturing surfaces for controlled reflection Download PDF

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Publication number
WO2011056948A3
WO2011056948A3 PCT/US2010/055418 US2010055418W WO2011056948A3 WO 2011056948 A3 WO2011056948 A3 WO 2011056948A3 US 2010055418 W US2010055418 W US 2010055418W WO 2011056948 A3 WO2011056948 A3 WO 2011056948A3
Authority
WO
WIPO (PCT)
Prior art keywords
texturing
substrate
microstamp
another aspect
surface structure
Prior art date
Application number
PCT/US2010/055418
Other languages
French (fr)
Other versions
WO2011056948A2 (en
Inventor
Tianniu Chen
Michael B. Korzenski
Ping Jiang
Lawrence H. Dubois
Original Assignee
Advanced Technology Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Technology Materials, Inc. filed Critical Advanced Technology Materials, Inc.
Publication of WO2011056948A2 publication Critical patent/WO2011056948A2/en
Publication of WO2011056948A3 publication Critical patent/WO2011056948A3/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Abstract

Novel methods for the texturing of photovoltaic cells is described, wherein texturing minimizes reflectance losses and hence increases solar cell efficiency. In one aspect, a microstamp with the mirror inverse of the optimum surface structure is described. The photovoltaic cell substrate to be etched and the microstamp are immersed in a bath and pressed together to yield the optimum surface structure. In another aspect, nanoscale structures are introduced to the surface of a photovoltaic cell by depositing nanoparticles or introducing metal induced pitting to a substrate surface. In still another aspect, remote plasma source (RPS) or reactive ion etching (RIE), is used to etch nanoscale features into a silicon-containing substrate.
PCT/US2010/055418 2009-11-05 2010-11-04 Methods of texturing surfaces for controlled reflection WO2011056948A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US25844909P 2009-11-05 2009-11-05
US61/258,449 2009-11-05
US31347310P 2010-03-12 2010-03-12
US61/313,473 2010-03-12

Publications (2)

Publication Number Publication Date
WO2011056948A2 WO2011056948A2 (en) 2011-05-12
WO2011056948A3 true WO2011056948A3 (en) 2011-08-25

Family

ID=43970744

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2010/055418 WO2011056948A2 (en) 2009-11-05 2010-11-04 Methods of texturing surfaces for controlled reflection

Country Status (2)

Country Link
TW (1) TW201126744A (en)
WO (1) WO2011056948A2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103563093B (en) * 2011-06-07 2016-05-25 东友精细化工有限公司 Monocrystalline silicon piece and preparation method thereof
CN104576826B (en) * 2014-12-17 2017-04-26 山东力诺太阳能电力股份有限公司 Post-processing method of solar cell

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5479301B2 (en) * 2010-05-18 2014-04-23 株式会社新菱 Etching solution and silicon substrate surface processing method
TW201716588A (en) 2010-08-20 2017-05-16 恩特葛瑞斯股份有限公司 Sustainable process for reclaiming precious metals and base metals from e-waste
TWI447925B (en) * 2010-09-14 2014-08-01 Wakom Semiconductor Corp Method for manufacturing monocrystalline silicon solar cells and etching step of the method for manufacturing the same
DE102011084346A1 (en) * 2011-10-12 2013-04-18 Schott Solar Ag Process for treating silicon wafers, treatment liquid and silicon wafers
WO2013058477A2 (en) * 2011-10-19 2013-04-25 동우화인켐 주식회사 Texture etching fluid composition and texture etching method for crystalline silicon wafers
KR101933527B1 (en) * 2011-10-19 2018-12-31 동우 화인켐 주식회사 Texture etching solution composition and texture etching method of crystalline silicon wafers
JP2014534630A (en) * 2011-10-19 2014-12-18 ドングウー ファイン−ケム カンパニー、 リミテッドＤｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． Texture etching solution composition for crystalline silicon wafer and texture etching method
CN104584231A (en) * 2012-03-19 2015-04-29 可持续能源联合有限责任公司(美国) Copper-assisted, anti-reflection etching of silicon surfaces
CN102677060B (en) * 2012-05-15 2013-10-30 韩华新能源（启东）有限公司 Polysilicon etchback solution and use thereof
KR101804266B1 (en) * 2012-07-25 2017-12-04 동우 화인켐 주식회사 Texture etching solution composition and texture etching method of crystalline silicon wafers
CN103806107A (en) * 2012-11-02 2014-05-21 无锡尚德太阳能电力有限公司 Polysilicon slice texturization method and texturizing liquid
CN103996742B (en) * 2014-05-21 2016-08-24 奥特斯维能源（太仓）有限公司 A kind of etching edge method improving crystal-silicon solar cell electrical property
CN108624962A (en) * 2018-05-03 2018-10-09 上海汉遥新材料科技有限公司 A kind of diamond wire polycrystalline slice flocking additive and preparation method thereof, application method
TW202106647A (en) * 2019-05-15 2021-02-16 美商康寧公司 Methods of reducing the thickness of textured glass, glass-ceramic, and ceramic articles with high concentration alkali hydroxide at elevated temperature
WO2020243211A1 (en) * 2019-05-31 2020-12-03 Corning Incorporated Etching glass and glass ceramic materials in hydroxide containing molten salt
CN113136144A (en) * 2021-03-18 2021-07-20 武汉风帆电化科技股份有限公司 Polishing agent for rapid alkali polishing of crystal silicon wafer and application method thereof
CN114316804A (en) * 2021-12-15 2022-04-12 嘉兴市小辰光伏科技有限公司 Additive for improving monocrystalline silicon alkali polishing appearance problem and polishing process thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005072235A2 (en) * 2004-01-23 2005-08-11 University Of Massachusetts Structured materials and methods
KR20080063203A (en) * 2006-12-30 2008-07-03 고려대학교 산학협력단 Hybrid imprinting stamp and method of manufacturing the same
KR20090080150A (en) * 2008-01-21 2009-07-24 고려대학교 산학협력단 Method for preparing solar cell using triblock copolymer nanoporous

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005072235A2 (en) * 2004-01-23 2005-08-11 University Of Massachusetts Structured materials and methods
KR20080063203A (en) * 2006-12-30 2008-07-03 고려대학교 산학협력단 Hybrid imprinting stamp and method of manufacturing the same
KR20090080150A (en) * 2008-01-21 2009-07-24 고려대학교 산학협력단 Method for preparing solar cell using triblock copolymer nanoporous

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103563093B (en) * 2011-06-07 2016-05-25 东友精细化工有限公司 Monocrystalline silicon piece and preparation method thereof
CN104576826B (en) * 2014-12-17 2017-04-26 山东力诺太阳能电力股份有限公司 Post-processing method of solar cell

Also Published As

Publication number Publication date
WO2011056948A2 (en) 2011-05-12
TW201126744A (en) 2011-08-01

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