WO2011040198A1 - ガス処理装置 - Google Patents
ガス処理装置 Download PDFInfo
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- WO2011040198A1 WO2011040198A1 PCT/JP2010/065466 JP2010065466W WO2011040198A1 WO 2011040198 A1 WO2011040198 A1 WO 2011040198A1 JP 2010065466 W JP2010065466 W JP 2010065466W WO 2011040198 A1 WO2011040198 A1 WO 2011040198A1
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- pressure
- process gas
- processing apparatus
- gas
- compressor
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
- F04B49/06—Control using electricity
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
- F04B49/06—Control using electricity
- F04B49/065—Control using electricity and making use of computers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/0204—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream characterised by the feed stream
- F25J3/0223—H2/CO mixtures, i.e. synthesis gas; Water gas or shifted synthesis gas
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/0228—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream characterised by the separated product stream
- F25J3/0252—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream characterised by the separated product stream separation of hydrogen
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/0228—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream characterised by the separated product stream
- F25J3/0257—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream characterised by the separated product stream separation of nitrogen
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/0228—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream characterised by the separated product stream
- F25J3/0266—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream characterised by the separated product stream separation of carbon dioxide
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/0295—Start-up or control of the process; Details of the apparatus used, e.g. sieve plates, packings
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B2203/00—Motor parameters
- F04B2203/02—Motor parameters of rotating electric motors
- F04B2203/0209—Rotational speed
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B2205/00—Fluid parameters
- F04B2205/01—Pressure before the pump inlet
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2230/00—Processes or apparatus involving steps for increasing the pressure of gaseous process streams
- F25J2230/30—Compression of the feed stream
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2240/00—Processes or apparatus involving steps for expanding of process streams
- F25J2240/02—Expansion of a process fluid in a work-extracting turbine (i.e. isentropic expansion), e.g. of the feed stream
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2245/00—Processes or apparatus involving steps for recycling of process streams
- F25J2245/02—Recycle of a stream in general, e.g. a by-pass stream
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2280/00—Control of the process or apparatus
- F25J2280/02—Control in general, load changes, different modes ("runs"), measurements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/40—Capture or disposal of greenhouse gases of CO2
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/34—Hydrogen distribution
Definitions
- the present application relates to a gas processing apparatus.
- a closed cycle system that operates by circulating a refrigerant gas is known.
- a closed cycle system disclosed in the following Patent Document 1 (particularly, refer to FIG. 1 of Patent Document 1 below)
- an expander is installed downstream of the compressor, and the refrigerant gas flowing out from the refrigerant gas outlet of the expander is discharged.
- the refrigerant gas is recirculated by returning it to the refrigerant gas inlet of the compressor.
- the expander refrigerant gas outlet pressure is always higher than the compressor refrigerant gas inlet pressure, and the expander refrigerant gas outlet pressure is at the compressor refrigerant gas inlet pressure. There is no operating condition that is lower than the pressure.
- an object of the present invention is to provide a gas processing apparatus that can be operated regardless of the flow rate of the supplied process gas.
- a gas processing apparatus for solving the above-described problems is as follows.
- a compressor for compressing the process gas;
- a first process disposed downstream of the compressor to process the process gas;
- An expander disposed downstream of the first process to obtain power by expanding the process gas;
- a second process disposed downstream of the expander and treating the process gas;
- a gas processing apparatus comprising a driving means for driving the compressor,
- a first pressure gauge disposed at the process gas inlet of the compressor and measuring the pressure of the process gas;
- a second pressure gauge disposed at the outlet of the process gas of the second process and measuring the pressure of the process gas;
- a recirculation flow path for recirculating the process gas connected to the process gas inlet of the compressor from the process gas outlet of the second process;
- a first pressure regulating valve arranged in the recirculation flow path to regulate the pressure of the process gas to be recirculated;
- a second pressure regulating valve disposed downstream of the second pressure gauge and regulating the pressure of the process gas;
- a gas processing apparatus for solving the above-mentioned problems is the gas processing apparatus according to the first invention, A process gas outlet flow path connected between the process gas outlet of the second process and the second pressure regulating valve; A third pressure gauge disposed in the process gas outlet channel and measuring the pressure of the process gas; A third pressure regulating valve that is arranged upstream of the third pressure gauge in the process gas outlet channel and regulates the pressure of the process gas; The control means controls the third pressure regulating valve based on the pressure measured by the third pressure gauge.
- FIG. 1 is a schematic diagram showing the configuration of a gas processing apparatus according to a first embodiment of the present invention.
- the gas processing apparatus includes a compressor 1 that compresses process gas supplied from an upstream facility.
- a first process 2 for processing the process gas compressed by the compressor 1 is provided downstream of the compressor 1.
- An expander 3 that obtains power by expanding a process gas is provided downstream of the process 2.
- a second process 4 for processing the process gas expanded by the expander 3 is provided downstream of the expander 3.
- the gas processing apparatus according to the present embodiment includes a driving device 5 that drives the compressor 1.
- a process gas inlet 25 which is a connection with an upstream facility serving as a process gas supply source, is installed.
- a second flow path 21 is installed between the process gas outlet of the compressor 1 and the process gas inlet of the first process 2.
- a third flow path 22 is provided between the process gas outlet of the first process 2 and the process gas inlet of the expander 3.
- a fourth flow path 23 is connected to the process gas outlet of the expander 3.
- a first process gas outlet 26 which is a connection with a downstream facility that uses the processed process gas, is installed.
- a first pressure gauge (PI 1 ) 10 for measuring the pressure at the inlet of the process gas of the compressor 1 is installed on the first flow path 20.
- a second pressure gauge (PI 2 ) 11 that measures the pressure at the outlet of the process gas of the second process 4 is installed on the fourth flow path 23. Further, a recirculation flow for recirculating the process gas from between the process gas outlet of the second process 4 and the second pressure gauge 11 and between the process gas inlet 25 and the first pressure gauge 10.
- a road 24 is installed.
- a first pressure regulating valve for adjusting the pressure of the process gas recirculation (CV 1) 12 is installed on the recirculation channel 24.
- a second pressure control valve (CV 2 ) 13 for adjusting the pressure of the process gas is installed. Yes.
- a rotation speed meter (SI) 14 for measuring the rotation speed is installed on the rotation shaft of the driving device 5.
- the gas processing apparatus is based on the pressure measured by the first pressure gauge 10 and the second pressure gauge 11 and the rotational speed measured by the rotational speed meter 14.
- a control device 6 that controls at least one of the pressure control valve 12 and the second pressure control valve 13 is provided.
- the configuration in which the control device 6 controls the rotational speed of the drive device 5 has been described, but the angle of the inlet guide vane of the compressor 1 may be controlled.
- the control device 9 in the gas processing apparatus increases the opening of the second pressure control valve 13 when the flow rate of the process gas supplied from the upstream equipment is large, and increases the power of the expander 3.
- the recovery amount can be increased.
- the power from the expander 3 is reduced by lowering the pressure of the process gas outlet of the first process. By obtaining, the power in the whole gas treatment apparatus can be reduced.
- FIG. 2 is a control block diagram of the gas processing apparatus according to the first embodiment of the present invention.
- the control device 6 in the gas processing apparatus according to this embodiment includes a first pressure control unit (PC 1 ) 33 that outputs a signal corresponding to the pressure measured by the first pressure gauge 10.
- PC 1 first pressure control unit
- a first function generator (FX 1 ) 30 that receives a signal from the first pressure control unit 33 and outputs a signal for controlling the first pressure control valve 12 based on predetermined input / output characteristics;
- a speed controller (SC) 34 that outputs a signal corresponding to the rotational speed measured by the meter 14 and a second signal that outputs a signal based on a predetermined input / output characteristic by inputting a signal from the first pressure controller 33.
- Function generator (FX 2 ) 31 a second pressure controller (PC 2 ) 35 that outputs a signal corresponding to the pressure measured by the second pressure gauge 11, and a signal from the first pressure controller 33 Enter the specified entry / exit
- the third function generator for outputting a signal based on the characteristics and a (FX 3) 32.
- FIG. 3 is a diagram showing input / output characteristics of the first function generator in the gas processing apparatus according to the first embodiment of the present invention.
- the input / output characteristics of the first function generator 30 in the control device 6 according to the present embodiment are set such that the input is 0% to 100% in accordance with the signal from the first pressure gauge 10.
- the output is 100%.
- the input is 50%
- the output is 0%.
- the input is between 0% and 50%
- the output decreases linearly, and the input is 50% to 100%.
- the first pressure control valve 12 is controlled by a signal from the first function generator 30.
- the control apparatus 6 which concerns on a present Example can adjust the opening degree of the 1st pressure control valve 12 suitably according to the pressure measured with the 1st pressure gauge 10.
- FIG. 4 is a diagram showing input / output characteristics of the second function generator in the gas processing apparatus according to the first embodiment of the present invention.
- the input / output characteristics of the second function generator 31 in the control device 6 according to the present embodiment are set so that the input is 0% to 100% according to the signal from the first pressure gauge 10.
- the input is set to the specified X% when the input is 0% to 50%, the output is set to 100% when the input is 100%, and the output is increased linearly when the input is 50% to 100%. It has characteristics.
- the speed control unit 34 receives the signal from the second function generator 31 and the signal from the tachometer 14, and receives the signal from the second function generator 31 and the signal from the tachometer 14.
- the drive device 5 is controlled according to the above.
- the control device 6 according to the present embodiment can appropriately adjust the rotational speed of the driving device 5 according to the pressure measured by the first pressure gauge 10 and the rotational speed measured by the rotational speed meter 14. .
- FIG. 5 is a control block diagram of the third function generator in the gas processing apparatus according to the first embodiment of the present invention.
- the third function generator 32 in the control device 6 according to the present embodiment includes a hysteresis 36 that inputs a signal from the first pressure control unit 33 and outputs a signal with hysteresis.
- the first signal generator (SG 1 ) 37-1 for generating a predetermined signal, the second signal generator (SG 2 ) 37-2 for generating a predetermined signal, and the input Input 3 from the hysteresis 36 first the input input 1 from the signal generator 37-1 and the switch (SW) 38 for outputting one of the input input 2 of the second signal generator 37-2, increase and decrease of the input from the switch 38 Te Accordingly, a rate limiter (RLT) 39 that limits the rate of increase and decrease in output is provided.
- RLT rate limiter
- FIG. 6 is a diagram showing hysteresis input / output characteristics of the third function generator in the gas processing apparatus according to the first embodiment of the present invention.
- the input / output characteristic of the hysteresis 36 of the third function generator 32 according to the present embodiment is the output until the input exceeds the threshold value ⁇ according to the signal from the first pressure control unit 33. It has an input / output characteristic in which the output is turned on when the input exceeds the threshold value ⁇ , and the output is turned off when the input falls below the threshold value ⁇ .
- FIG. 7 is a diagram showing the input / output characteristics of the switches of the third function generator in the gas processing apparatus according to the first embodiment of the present invention.
- the switch 38 of the third function generator 32 responds to the signal from the hysteresis 36, and when the input Input 3 is OFF, from the first signal generator 37-1. outputs the input input 1, when the input input 3 of oN has input and output characteristics of outputting the input input 2 from the second signal generator 37-2.
- FIG. 8 is a diagram showing the input / output characteristics of the rate limiter of the third function generator in the gas processing apparatus according to the first embodiment of the present invention.
- the rate limiter 39 of the third function generator 32 according to the present embodiment is a unit as shown by an arrow a in FIG. 8 when the input increases in response to a signal from the switch 38. A signal is output with the rate of increase per time being limited.
- the rate of decrease per unit time is limited as shown by arrow b in FIG. Has output characteristics.
- FIG. 9 is a diagram showing input / output characteristics of the third function generator in the gas processing apparatus according to the first embodiment of the present invention.
- the hysteresis 36 outputs the signal shown in FIG. 9B in response to the input shown in FIG.
- the switch 38 outputs the signal shown in FIG. 9C in response to the signal shown in FIG.
- the rate limiter 39 outputs the signal shown in FIG. 9D in response to the input shown in FIG.
- the second pressure control unit 35 receives the signal from the third function generator 32 and the signal from the second pressure gauge 11, receives the signal from the third function generator 32,
- the second pressure control valve 13 is controlled according to the signal from the pressure gauge 11.
- the control apparatus 6 which concerns on a present Example can adjust the opening degree of the 2nd pressure control valve 13 suitably according to the pressure measured with the 2nd pressure gauge 11.
- the gas processing apparatus of the present embodiment it is possible to provide a gas processing apparatus that can be operated regardless of the flow rate of the process gas supplied from the upstream equipment.
- the gas processing apparatus according to the present embodiment has substantially the same configuration as the gas processing apparatus according to the first embodiment, but a desired pressure can be obtained in a downstream facility that uses the processed process gas. The pressure at the outlet of the process gas can be adjusted.
- FIG. 10 is a schematic diagram showing a configuration of a gas processing apparatus according to the second embodiment of the present invention.
- the gas processing apparatus according to the present embodiment is provided between the second pressure gauge 11 and the second pressure control valve 13.
- a fifth flow path 40 is connected.
- a second process gas outlet 43 is provided at the end of the fifth flow path 40.
- a third pressure gauge (PI 3 ) 41 that measures the pressure of the process gas is installed on the fifth flow path 40.
- a third pressure control valve (CV 3 ) 42 for adjusting the pressure of the process gas is installed upstream of the third pressure gauge 41 on the fifth flow path 40.
- a downstream facility that uses the processed process gas is connected to the second process gas outlet 43, and the process gas emitted from the first process gas outlet 26 is a process gas.
- Appropriate treatment is performed according to the type and amount of emissions.
- the process gas is a mixed gas containing nitrogen, hydrogen, or carbon dioxide, it is processed by being isolated into the ground or released into the atmosphere.
- control device 6 controls the third pressure regulating valve 42 based on the pressure measured by the third pressure gauge 41.
- FIG. 11 is a control block diagram of the gas processing apparatus according to the second embodiment of the present invention.
- the control device 6 in the gas processing apparatus according to the present embodiment has a pressure measured by a third pressure gauge 41 in addition to the configuration of the control device 6 in the gas processing apparatus according to the first embodiment.
- a third pressure control unit (PC 3 ) 44 that outputs a signal corresponding to the above.
- the third pressure control unit 44 receives a signal from the third pressure gauge 41 and controls the third pressure control valve 42 according to the signal from the third pressure gauge 41. Thereby, the control device 6 according to the present embodiment can appropriately adjust the opening degree of the third pressure regulating valve 42 according to the pressure measured by the third pressure gauge 41.
- the pressure of the process gas flowing out from the second process gas outlet 43 is It can be adjusted and supplied to a desired pressure in the downstream equipment.
- the present invention can be used, for example, in a gas processing apparatus that has a recirculation flow path for refrigerant gas, uses process gas as refrigerant gas, and processes the process gas at the same time.
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Abstract
Description
プロセスガスを圧縮するコンプレッサと、
前記コンプレッサの下流に配置され前記プロセスガスを処理する第1のプロセスと、
前記第1のプロセスの下流に配置され前記プロセスガスを膨張させて動力を得るエキスパンダと、
前記エキスパンダの下流に配置され前記プロセスガスを処理する第2のプロセスと、
前記コンプレッサを駆動する駆動手段と
を備えるガス処理装置において、
前記コンプレッサの前記プロセスガスの入口に配置され前記プロセスガスの圧力を測定する第1の圧力計と、
前記第2のプロセスの前記プロセスガスの出口に配置され前記プロセスガスの圧力を測定する第2の圧力計と、
前記第2のプロセスの前記プロセスガスの出口から、前記コンプレッサの前記プロセスガスの入口に接続される前記プロセスガスを再循環させる再循環流路と、
前記再循環流路に配置され再循環させる前記プロセスガスの圧力を調節する第1の圧力調節弁と、
前記第2の圧力計の下流に配置され前記プロセスガスの圧力を調節する第2の圧力調節弁と、
前記駆動手段の回転速度を測定する回転速度計と、
前記第1の圧力計及び前記第2の圧力計により測定した圧力並びに回転速度計により測定した回転速度に基づき、前記駆動手段の回転速度、前記第1の圧力調節弁及び前記第2の圧力調節弁のうち少なくともいずれかひとつを制御する制御手段と
を備える
ことを特徴とする。
前記第2のプロセスの前記プロセスガスの出口と前記第2の圧力調節弁との間に接続されたプロセスガス出口流路と、
前記プロセスガス出口流路に配置され前記プロセスガスの圧力を測定する第3の圧力計と、
前記プロセスガス出口流路の前記第3の圧力計の上流に配置され前記プロセスガスの圧力を調節する第3の圧力調節弁と
を備え、
前記制御手段は、前記第3の圧力計により測定した圧力に基づき、前記第3の圧力調節弁を制御する
ことを特徴とする。
はじめに、本発明の第1の実施例に係るガス処理装置の構成について説明する。
なお、本実施例に係るガス処理装置の上流にはプロセスガスの供給元となる設備が設置されており、下流には処理後のプロセスガスを利用する設備が設置されているが、ここでの説明は省略する。また、プロセスガスとしては、例えば、窒素や水素や二酸化炭素を含む混合ガスを用いることができる。
図1に示すように、本実施例に係るガス処理装置は、上流の設備より供給されたプロセスガスを圧縮するコンプレッサ1を備えている。コンプレッサ1の下流には、コンプレッサ1により圧縮されたプロセスガスに処理を施す第1のプロセス2を備えている。プロセス2の下流には、プロセスガスを膨張させて動力を得るエキスパンダ3を備えている。エキスパンダ3の下流には、エキスパンダ3により膨張させられたプロセスガスに処理を施す第2のプロセス4を備えている。また、本実施例に係るガス処理装置は、コンプレッサ1を駆動する駆動装置5を備えている。
図2は、本発明の第1の実施例に係るガス処理装置の制御ブロック図である。
図2に示すように、本実施例に係るガス処理装置における制御装置6は、第1の圧力計10により測定した圧力に応じた信号を出力する第1の圧力制御部(PC1)33と、第1の圧力制御部33からの信号を入力して所定の入出力特性に基づき第1の圧力調節弁12を制御する信号を出力する第1のファンクションジェネレータ(FX1)30と、回転速度計14により測定した回転速度に応じた信号を出力する速度制御部(SC)34と、第1の圧力制御部33からの信号を入力して所定の入出力特性に基づき信号を出力する第2のファンクションジェネレータ(FX2)31と、第2の圧力計11により測定した圧力に応じた信号を出力する第2の圧力制御部(PC2)35と、第1の圧力制御部33からの信号を入力して所定の入出力特性に基づき信号を出力する第3のファンクションジェネレータ(FX3)32を備えている。
図3に示すように、本実施例に係る制御装置6における第1のファンクションジェネレータ30の入出力特性は、第1の圧力計10からの信号に応じて入力を0%~100%として設定し、入力が0%のときには出力を100%とし、入力が50%のときには出力を0%とし、入力が0%~50%の間は直線的に出力を減少させ、入力が50%~100%の間は出力を0%とする入出力特性を有している。
図4に示すように、本実施例に係る制御装置6における第2のファンクションジェネレータ31の入出力特性は、第1の圧力計10からの信号に応じて入力を0%~100%として設定し、入力が0%~50%の間は出力を所定のX%とし、入力が100%のときには出力を100%とし、入力が50%~100%の間は直線的に出力を増加させる入出力特性を有している。
図5に示すように、本実施例に係る制御装置6における第3のファンクションジェネレータ32は、第1の圧力制御部33からの信号を入力してヒステリシスを持たせて信号を出力するヒステリシス36と、所定の信号を発生させる第1のシグナルジェネレータ(SG1)37-1と、所定の信号を発生させる第2のシグナルジェネレータ(SG2)37-2と、ヒステリシス36からの入力Input3に応じて第1のシグナルジェネレータ37-1からの入力Input1と第2のシグナルジェネレータ37-2の入力Input2のいずれか一方を出力するスイッチ(SW)38と、スイッチ38からの入力の増加及び減少に伴い出力の増加及び減少の割合に制限を施すレートリミッタ(RLT)39とを備えている。
図6に示すように、本実施例に係る第3のファンクションジェネレータ32のヒステリシス36の入出力特性は、第1の圧力制御部33からの信号に応じ、入力が閾値βを上回るまでは出力をOFFとし、入力が閾値βを上回った場合に出力をONとし、その後、入力が閾値αを下回った場合に出力をOFFとする入出力特性を有している。
図7に示すように、本実施例に係る第3のファンクションジェネレータ32のスイッチ38は、ヒステリシス36からの信号に応じ、入力Input3がOFFの場合には第1のシグナルジェネレータ37-1からの入力Input1を出力し、入力Input3がONの場合には第2のシグナルジェネレータ37-2からの入力Input2を出力する入出力特性を有している。
図8に示すように、本実施例に係る第3のファンクションジェネレータ32のレートリミッタ39は、スイッチ38からの信号に応じ、入力が増加した場合には図8中に矢印aで示すように単位時間当たりの増加の割合に制限を施して信号を出力し、入力が減少した場合には図8中に矢印bで示すように単位時間当たりの減少の割合に制限を施して信号を出力する入出力特性を有している。
図9に示すように、第3のファンクションジェネレータ32において、ヒステリシス36は、図9(a)に示す入力に対し、図9(b)に示す信号を出力する。スイッチ38は、図9(b)に示す信号に対し、図9(c)に示す信号を出力する。レートリミッタ39は、図9(c)に示す入力に対し、図9(d)に示す信号を出力する。
本実施例に係るガス処理装置は、第1の実施例に係るガス処理装置とほぼ同様の構成であるが、処理後のプロセスガスを利用する下流の設備において所望する圧力を得られるように、プロセスガスの出口の圧力を調節することができる構成となっている。
図10に示すように、本実施例に係るガス処理装置は、第1の実施例に係るガス処理装置の構成に加え、第2の圧力計11と第2の圧力調節弁13との間に第5の流路40が接続されている。第5の流路40の端部には、第2のプロセスガス出口43が設置されている。第5の流路40上には、プロセスガスの圧力を測定する第3の圧力計(PI3)41が設置されている。第5の流路40上の第3の圧力計41の上流には、プロセスガスの圧力を調節する第3の圧力調節弁(CV3)42が設置されている。
図11は、本発明の第2の実施例に係るガス処理装置の制御ブロック図である。
図11に示すように、本実施例に係るガス処理装置における制御装置6は、第1の実施例に係るガス処理装置における制御装置6の構成に加え、第3の圧力計41により測定した圧力に応じた信号を出力する第3の圧力制御部(PC3)44を備えている。
2 第1のプロセス
3 エキスパンダ
4 第2のプロセス
5 駆動装置
6 制御装置
10 第1の圧力計(PI1)
11 第2の圧力計(PI2)
12 第1の圧力調節弁(CV1)
13 第2の圧力調節弁(CV2)
14 回転速度計(SI)
20 第1の流路
21 第2の流路
22 第3の流路
23 第4の流路
24 再循環流路
25 プロセスガス入口
26 第1のプロセスガス出口
30 第1のファンクションジェネレータ(FX1)
31 第2のファンクションジェネレータ(FX2)
32 第3のファンクションジェネレータ(FX3)
33 第1の圧力制御部(PC1)
34 速度制御部(SC)
35 第2の圧力制御部(PC2)
36 ヒステリシス
37-1 第1のシグナルジェネレータ(SG1)
37-2 第2のシグナルジェネレータ(SG2)
38 スイッチ(SW)
39 レートリミッタ(RLT)
40 第5の流路
41 第3の圧力計(PI3)
42 第3の圧力調節弁(CV3)
43 第2のプロセスガス出口
44 第3の圧力制御部(PC3)
Claims (2)
- プロセスガスを圧縮するコンプレッサと、
前記コンプレッサの下流に配置され前記プロセスガスを処理する第1のプロセスと、
前記第1のプロセスの下流に配置され前記プロセスガスを膨張させて動力を得るエキスパンダと、
前記エキスパンダの下流に配置され前記プロセスガスを処理する第2のプロセスと、
前記コンプレッサを駆動する駆動手段と
を備えるガス処理装置において、
前記コンプレッサの前記プロセスガスの入口に配置され前記プロセスガスの圧力を測定する第1の圧力計と、
前記第2のプロセスの前記プロセスガスの出口に配置され前記プロセスガスの圧力を測定する第2の圧力計と、
前記第2のプロセスの前記プロセスガスの出口から、前記コンプレッサの前記プロセスガスの入口に接続される前記プロセスガスを再循環させる再循環流路と、
前記再循環流路に配置され再循環させる前記プロセスガスの圧力を調節する第1の圧力調節弁と、
前記第2の圧力計の下流に配置され前記プロセスガスの圧力を調節する第2の圧力調節弁と、
前記駆動手段の回転速度を測定する回転速度計と、
前記第1の圧力計及び前記第2の圧力計により測定した圧力並びに回転速度計により測定した回転速度に基づき、前記駆動手段の回転速度、前記第1の圧力調節弁及び前記第2の圧力調節弁のうち少なくともいずれかひとつを制御する制御手段と
を備える
ことを特徴とするガス処理装置。 - 前記第2のプロセスの前記プロセスガスの出口と前記第2の圧力調節弁との間に接続されたプロセスガス出口流路と、
前記プロセスガス出口流路に配置され前記プロセスガスの圧力を測定する第3の圧力計と、
前記プロセスガス出口流路の前記第3の圧力計の上流に配置され前記プロセスガスの圧力を調節する第3の圧力調節弁と
を備え、
前記制御手段は、前記第3の圧力計により測定した圧力に基づき、前記第3の圧力調節弁を制御する
ことを特徴とする請求項1に記載のガス処理装置。
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US13/265,013 US8869554B2 (en) | 2009-09-30 | 2010-09-09 | Gas processing apparatus |
CN201080019844.0A CN102421516B (zh) | 2009-09-30 | 2010-09-09 | 气体处理设备 |
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