WO2009145483A3 - 발광 소자 및 그 제조방법 - Google Patents
발광 소자 및 그 제조방법 Download PDFInfo
- Publication number
- WO2009145483A3 WO2009145483A3 PCT/KR2009/001710 KR2009001710W WO2009145483A3 WO 2009145483 A3 WO2009145483 A3 WO 2009145483A3 KR 2009001710 W KR2009001710 W KR 2009001710W WO 2009145483 A3 WO2009145483 A3 WO 2009145483A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- light
- emitting element
- production method
- method therefor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 abstract 4
- 238000002161 passivation Methods 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0093—Wafer bonding; Removal of the growth substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Led Device Packages (AREA)
- Semiconductor Lasers (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/936,090 US8829554B2 (en) | 2008-04-02 | 2009-04-02 | Light emitting element and a production method therefor |
CN200980119150.1A CN102106001B (zh) | 2008-04-02 | 2009-04-02 | 发光器件及其制造方法 |
JP2011502858A JP5220916B2 (ja) | 2008-04-02 | 2009-04-02 | 発光素子及びその製造方法 |
EP09754948.9A EP2262012B1 (en) | 2008-04-02 | 2009-04-02 | Light-emitting diode and a method of manufacturing thereof |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080030919A KR101428066B1 (ko) | 2008-04-02 | 2008-04-02 | 수직구조 그룹 3족 질화물계 반도체 발광다이오드 소자 및이의 제조 방법 |
KR10-2008-0030919 | 2008-04-02 | ||
KR20080031900A KR101480551B1 (ko) | 2008-04-04 | 2008-04-04 | 수직구조 그룹 3족 질화물계 반도체 발광다이오드 소자 및이의 제조 방법 |
KR10-2008-0031900 | 2008-04-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2009145483A2 WO2009145483A2 (ko) | 2009-12-03 |
WO2009145483A3 true WO2009145483A3 (ko) | 2010-01-21 |
Family
ID=41377727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2009/001710 WO2009145483A2 (ko) | 2008-04-02 | 2009-04-02 | 발광 소자 및 그 제조방법 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8829554B2 (ko) |
EP (1) | EP2262012B1 (ko) |
JP (1) | JP5220916B2 (ko) |
CN (1) | CN102106001B (ko) |
WO (1) | WO2009145483A2 (ko) |
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TWI403003B (zh) * | 2009-10-02 | 2013-07-21 | Chi Mei Lighting Tech Corp | 發光二極體及其製造方法 |
KR101007137B1 (ko) * | 2010-03-08 | 2011-01-10 | 엘지이노텍 주식회사 | 발광 소자, 발광 소자 제조방법 및 발광 소자 패키지 |
KR101039988B1 (ko) * | 2010-03-09 | 2011-06-09 | 엘지이노텍 주식회사 | 발광 소자 및 그 제조방법 |
US8686461B2 (en) | 2011-01-03 | 2014-04-01 | SemiLEDs Optoelectronics Co., Ltd. | Light emitting diode (LED) die having stepped substrates and method of fabrication |
US9324905B2 (en) | 2011-03-15 | 2016-04-26 | Micron Technology, Inc. | Solid state optoelectronic device with preformed metal support substrate |
KR101795038B1 (ko) * | 2011-06-10 | 2017-11-07 | 엘지이노텍 주식회사 | 발광 소자 및 발광 소자 패키지 |
KR101795037B1 (ko) * | 2011-06-10 | 2017-12-01 | 엘지이노텍 주식회사 | 발광 소자 및 발광 소자 패키지 |
US8787418B2 (en) * | 2011-08-11 | 2014-07-22 | Sensor Electronic Technology, Inc. | Emitting device with compositional and doping inhomogeneities in semiconductor layers |
US8879598B2 (en) | 2011-08-11 | 2014-11-04 | Sensor Electronic Technology, Inc. | Emitting device with compositional and doping inhomogeneities in semiconductor layers |
US9595634B2 (en) | 2011-08-11 | 2017-03-14 | Sensor Electronic Technology, Inc. | Device with transparent and higher conductive regions in lateral cross section of semiconductor layer |
US10411156B2 (en) | 2011-08-11 | 2019-09-10 | Sensor Electronic Technology, Inc. | Device with transparent and higher conductive regions in lateral cross section of semiconductor layer |
US9385271B2 (en) | 2011-08-11 | 2016-07-05 | Sensor Electronic Technology, Inc. | Device with transparent and higher conductive regions in lateral cross section of semiconductor layer |
JP5891436B2 (ja) * | 2012-06-21 | 2016-03-23 | パナソニックIpマネジメント株式会社 | 縦型構造発光素子の製造方法 |
JP5891437B2 (ja) * | 2012-06-21 | 2016-03-23 | パナソニックIpマネジメント株式会社 | 縦型構造発光素子の製造方法 |
JP6478913B2 (ja) * | 2012-09-05 | 2019-03-06 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | デバイスウエハからのキャリアウエハのレーザ剥離 |
JP2014187325A (ja) * | 2013-03-25 | 2014-10-02 | Toshiba Corp | 半導体発光装置及びその製造方法 |
DE102013107531A1 (de) * | 2013-07-16 | 2015-01-22 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
DE102013221788B4 (de) * | 2013-10-28 | 2021-05-27 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zum Herstellen eines Kontaktelements und eines optoelektronischen Bauelements |
US9355881B2 (en) * | 2014-02-18 | 2016-05-31 | Infineon Technologies Ag | Semiconductor device including a dielectric material |
DE102015104138A1 (de) * | 2015-03-19 | 2016-09-22 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung von optoelektronischen Halbleiterbauelementen und optoelektronisches Halbleiterbauelement |
KR102431750B1 (ko) * | 2016-03-04 | 2022-08-12 | 삼성디스플레이 주식회사 | 플렉서블 표시장치 및 그의 제조방법 |
WO2018106030A1 (ko) * | 2016-12-06 | 2018-06-14 | 엘지이노텍 주식회사 | 발광소자 |
US10840405B2 (en) * | 2017-10-31 | 2020-11-17 | Sivananthan Laboratories, Inc. | Inductively coupled plasma for hydrogenation of type II superlattices |
JP7068577B2 (ja) * | 2018-03-28 | 2022-05-17 | 日亜化学工業株式会社 | 窒化物半導体発光素子 |
US11056611B2 (en) * | 2018-09-11 | 2021-07-06 | Facebook Technologies, Llc | Mesa formation for wafer-to-wafer bonding |
US11145786B2 (en) | 2018-09-11 | 2021-10-12 | Facebook Technologies, Llc | Methods for wafer-to-wafer bonding |
US11342479B2 (en) | 2018-09-11 | 2022-05-24 | Facebook Technologies, Llc | Reducing bowing of materials before wafer-to-wafer bonding for LED manufacturing |
US11164844B2 (en) * | 2019-09-12 | 2021-11-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Double etch stop layer to protect semiconductor device layers from wet chemical etch |
CN117174802B (zh) * | 2023-11-02 | 2024-02-20 | 江西兆驰半导体有限公司 | 发光二极管的外延结构及其制备方法 |
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JP2004281863A (ja) * | 2003-03-18 | 2004-10-07 | Nichia Chem Ind Ltd | 窒化物半導体素子及びその製造方法 |
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JP2007511065A (ja) * | 2003-11-04 | 2007-04-26 | 松下電器産業株式会社 | 半導体発光装置、照明モジュール、照明装置、および半導体発光装置の製造方法 |
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-
2009
- 2009-04-02 CN CN200980119150.1A patent/CN102106001B/zh active Active
- 2009-04-02 US US12/936,090 patent/US8829554B2/en active Active
- 2009-04-02 JP JP2011502858A patent/JP5220916B2/ja active Active
- 2009-04-02 EP EP09754948.9A patent/EP2262012B1/en active Active
- 2009-04-02 WO PCT/KR2009/001710 patent/WO2009145483A2/ko active Application Filing
Patent Citations (3)
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JP2004281863A (ja) * | 2003-03-18 | 2004-10-07 | Nichia Chem Ind Ltd | 窒化物半導体素子及びその製造方法 |
JP2007511065A (ja) * | 2003-11-04 | 2007-04-26 | 松下電器産業株式会社 | 半導体発光装置、照明モジュール、照明装置、および半導体発光装置の製造方法 |
KR20070038272A (ko) * | 2005-10-05 | 2007-04-10 | 삼성전기주식회사 | 수직구조 발광 다이오드의 제조 방법 |
Non-Patent Citations (1)
Title |
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See also references of EP2262012A4 * |
Also Published As
Publication number | Publication date |
---|---|
US20110140076A1 (en) | 2011-06-16 |
WO2009145483A2 (ko) | 2009-12-03 |
JP2011517086A (ja) | 2011-05-26 |
JP5220916B2 (ja) | 2013-06-26 |
EP2262012B1 (en) | 2017-12-27 |
CN102106001B (zh) | 2014-02-12 |
EP2262012A4 (en) | 2014-12-31 |
EP2262012A2 (en) | 2010-12-15 |
US8829554B2 (en) | 2014-09-09 |
CN102106001A (zh) | 2011-06-22 |
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