WO2009093553A1 - 照明装置、露光装置、露光方法及びデバイス製造方法 - Google Patents
照明装置、露光装置、露光方法及びデバイス製造方法 Download PDFInfo
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- WO2009093553A1 WO2009093553A1 PCT/JP2009/050711 JP2009050711W WO2009093553A1 WO 2009093553 A1 WO2009093553 A1 WO 2009093553A1 JP 2009050711 W JP2009050711 W JP 2009050711W WO 2009093553 A1 WO2009093553 A1 WO 2009093553A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
Definitions
- the present invention relates to an illumination apparatus, an exposure apparatus, an exposure method, and a device manufacturing method for emitting illumination light introduced from a plurality of parts from a common part.
- an exposure apparatus is used to manufacture devices such as a semiconductor element, a liquid crystal display element, and a thin film magnetic head in a photolithography process.
- an original pattern formed on a mask is illuminated with illumination light and transferred onto a plate coated with a photosensitive agent such as a photoresist via a projection optical system. ing.
- the illumination light emitted from the discharge lamp as the exposure light is condensed using the elliptical mirror as described above, the light having a small incident angle with respect to the optical axis in the condensed light beam, that is, the numerical aperture (NA).
- the illumination light is introduced into the optical fiber bundle in a state where there is no light in a low range (a hollow state). Since the illumination light introduced into one end of the optical fiber bundle is emitted from the other end at an emission angle equal to the incident angle at the time of introduction, the pattern provided on the mask or the like is illuminated with the illumination light in the hollow state. Will be. In this case, the projected image of the pattern is more susceptible to aberrations remaining in the projection optical system and the pattern transfer accuracy to the plate than when illuminated with illumination light that is uniformly filled in the light beam. There was a possibility that it might fall.
- An object of the present invention is to efficiently illuminate illumination light emitted from a light source, and to emit illumination light while suppressing the omission of light according to the incident angle of the condensed light flux.
- An exposure method and a device manufacturing method are provided.
- the illumination device of the present invention receives illumination light emitted from the light source means from a plurality of incident ports, and transmits light from each of the incident ports and emits at least a part of each illumination light from a common exit port;
- the first partial illumination light of the illumination light from the light source means is optically relayed to form a first light flux having a first incident angle, which is introduced into the first entrance of the plurality of entrances.
- An exposure apparatus includes the illumination apparatus according to the present invention, and a projection optical system that forms a projection image of an object illuminated by illumination light emitted from the illumination apparatus on a photosensitive substrate. To do.
- the exposure method of the present invention includes an illumination step of illuminating an object with illumination light emitted by the illumination device of the present invention, and a projection step of forming a projected image of the object illuminated by the illumination light on a photosensitive substrate. It is characterized by including.
- the device manufacturing method of the present invention includes an exposure step of illuminating an object with illumination light emitted by the illumination device of the present invention and transferring a projected image of the object onto a photosensitive substrate, and the photosensitive device to which the projected image is transferred.
- the illumination light emitted from the light source is efficiently condensed, and the illumination is suppressed by preventing the light from being lost according to the incident angle of the condensed light flux. Light can be emitted. For this reason, in the exposure apparatus, the exposure method, and the device manufacturing method of the present invention, the projected image of the object can be transferred to the photosensitive substrate with high accuracy.
- 1 is a perspective view showing a schematic configuration of an exposure apparatus according to a first embodiment.
- 1 is a diagram showing a configuration of a lighting device according to a first embodiment.
- 1 is a diagram showing a configuration of a partial projection optical system according to a first embodiment. It is a figure which shows the structure of the entrance of the light guide fiber which concerns on 1st Embodiment.
- 1 is a diagram showing a partial configuration of a lighting device according to a first embodiment.
- 1 is a diagram showing a partial configuration of a lighting device according to a first embodiment. It is a figure which shows light quantity distribution in the incident side of the fly eye lens which concerns on 1st Embodiment.
- FIG. 1 is a perspective view showing the overall configuration of an exposure apparatus EX according to the first embodiment of the present invention.
- the projection image of the pattern formed on the mask M while the mask M and the plate (photosensitive substrate) P are moved synchronously with respect to the projection optical system PL composed of a plurality of catadioptric partial projection optical systems.
- An example of a step-and-scan type exposure apparatus that transfers the image onto the plate P will be described.
- the XYZ rectangular coordinate system shown in FIG. 1 is set, and the positional relationship of each member will be described with reference to this XYZ rectangular coordinate system.
- the XYZ orthogonal coordinate system is set so that the X axis and the Y axis are parallel to the plate P, and the Z axis is set in a direction orthogonal to the plate P.
- the XY plane is actually set to a plane parallel to the horizontal plane, and the Z axis is set to the vertically upward direction.
- the direction (scanning direction) in which the mask M and the plate P are moved is set in the X-axis direction.
- the exposure apparatus EX includes an illumination apparatus IL that mixes and emits illumination light from a plurality of light sources in order to uniformly illuminate a mask M supported on a mask stage (not shown).
- the illuminating device IL includes three light sources 2a, 2b, and 2c formed of a discharge lamp such as an ultrahigh pressure mercury lamp.
- the illumination light emitted from the light source 2a is collected by the elliptical mirror 4a, and collected by the illumination relay optical system 6a on the entrance 12a of the light guide fiber 10.
- the illumination light emitted from the light source 2b is condensed on the entrance 12b of the light guide fiber 10 via the elliptic mirror 4b and the illumination relay optical system 6b, and the illumination light emitted from the light source 2c
- the light is condensed on the entrance 12c of the light guide fiber 10 via the relay optical system 6c.
- the light source 2a and the elliptical mirror 4a, the light source 2b and the elliptical mirror 4b, the light source 2c and the elliptical mirror 4c respectively constitute light source means.
- the elliptical mirrors 4a, 4b, and 4c have a first focal point in the vicinity of the light sources 2a, 2b, and 2c, which are light emitting units, and function as a light emission image forming unit.
- the light guide fiber (light transmission means) 10 is a random light guide fiber configured by randomly bundling a large number of optical fiber strands on the incident side and the exit side, and includes three incident ports 12a, 12b, 12c and seven injection ports (in FIG. 2, only the injection port 14a is shown).
- the optical fiber strands bundled at the respective entrances 12a to 12c are evenly distributed to the seven exits, and each illumination light incident on the entrances 12a to 12c is transmitted through the seven exits. It is divided equally and injected. That is, the light guide fiber 10 emits at least a part of each illumination light received from the entrances 12a to 12c from the common exit.
- Each of the illumination lights emitted from the seven exits enters a plurality of partial illumination optical systems IL1 that partially illuminate the mask M and six partial illumination optical systems IL2 to IL7 (not shown).
- the illumination light emitted from the exit 14a of the light guide fiber 10 is collimated by the collimator lens 16a and enters the fly-eye lens 17a that is an optical integrator.
- Illumination light incident on the fly-eye lens 17a is wavefront-divided by a large number of lens elements constituting the fly-eye lens 17a, and a secondary image composed of the same number of light source images as the number of lens elements on the rear focal plane (near the exit surface).
- a light source surface light source
- Illumination light from a large number of secondary light sources formed on the rear focal plane of the fly-eye lens 17a illuminates a part (partial illumination region) on the mask M almost uniformly by the condenser lens 18a.
- the configuration of the partial illumination optical systems IL2 to IL7 (not shown) is the same as that of the partial illumination optical system IL1, and each of the partial illumination optical systems IL2 to IL7 is similar to the partial illumination optical system IL1.
- the corresponding partial illumination area is illuminated almost uniformly.
- Illumination light from a partial illumination area corresponding to the partial illumination optical system IL1 is supplied from a plurality of partial projection optical systems PL1 to PL7 (PL2 is not shown in FIG. 1) arranged to correspond to each partial illumination area. Of these, it enters the partial projection optical system PL1.
- the partial projection optical systems PL1 to PL7 each form a projection image of a pattern provided on the mask M in the corresponding partial illumination area on the plate P.
- FIG. 3 is a diagram showing a configuration of the partial projection optical system PL1. As shown in FIG.
- the partial projection optical system PL1 includes a first catadioptric optical system PL11 that forms an intermediate image of a pattern in the partial illumination area on the field stop 22, and a partial illumination optical area PL1 on the plate P. And a second catadioptric optical system PL12 that forms a projected image of the pattern (equal magnification erect image).
- each illumination light having passed through the partial illumination optical systems IL2 to IL7 is incident on partial projection optical systems PL2 to PL7 provided corresponding to the partial illumination optical systems IL2 to IL7.
- the partial projection optical systems PL2 to PL7 have the same configuration as the partial projection optical system PL1, and form projection images of patterns in the corresponding partial illumination areas on the plate P, respectively.
- the partial projection optical systems PL1 to PL7 are arranged in a staggered manner so that the partial projection optical systems PL2, PL4, and PL6 are respectively positioned between the partial projection optical systems PL1, PL2, PL5, and PL7 in the Y direction.
- the partial illumination optical systems IL1 to IL7 are also arranged in a staggered pattern in the Y direction.
- the entrance 12b provided corresponding to the light source 2b has a plurality of optical fibers (optical fiber bundles) bundled in a circular shape as shown in FIG. It is comprised by. Further, the entrances 12a and 12c provided corresponding to the light sources 2a and 2c are configured by a plurality of optical fibers (optical fiber bundles) bundled in a ring shape as shown in FIG. 4B. . That is, the entrances 12a and 12c are constituted by a hollow optical fiber bundle.
- the illumination relay optical system (first relay optical system) 6b includes a collimator lens 40 and a condenser lens 41, and optically relays illumination light (first partial illumination light) from the light source 2b. Then, it introduces into the entrance (1st entrance) 12b as a 1st light beam which has incident angle (phi) b. At this time, the illumination relay optical system 6b projects an image of the light source 2b as a light emitting unit into the entrance 12b.
- the incident angle (angle with respect to the optical axis 7b of the illumination relay optical system 6b) of the condensed light flux is small.
- the incident angle ⁇ b as the first incident angle is determined by the divergence angle of the illumination light in the light source 2b and the relay magnification of the illumination relay optical system 6b.
- the illumination relay optical system (second relay optical system) 6a, 6c includes a first collimating lens 42, a condensing lens 43, and a second collimating lens 44, respectively, from the light sources 2a, 2c.
- the illumination relay optical systems 6a and 6c project the Fourier transform images corresponding to the light sources 2a and 2c as the light emitting sections to the entrances 12a and 12c provided on the focal planes of the illumination relay optical systems 6a and 6c, respectively. To do.
- the incident angle (the optical axis 7a of the illumination relay optical systems 6a and 6c) of the condensed light flux. , 7c) ie, light in a range with a low numerical aperture (NA) (for example, light in a range shown by hatching in FIG. 6) does not exist (missing state).
- the incident angles ⁇ a and ⁇ c as the second incident angles are angles determined by the sizes of the light sources 2a and 2c and the focal lengths of the illumination relay optical systems 6a and 6c, respectively.
- the illumination light in the hollow state is introduced into the annular entrances 12a and 12c as shown in FIG. 4B, the illumination light from the light sources 2a and 2c is used.
- the light guide fiber 10 can be efficiently incident.
- the incident angles ⁇ a to ⁇ c are angles corresponding to the numerical apertures of the illumination light introduced into the incident ports 12a to 12c, respectively, and as shown in FIG. 5 or FIG. This corresponds to the maximum incident angle in the illumination light.
- FIG. 7 is a diagram showing a light amount distribution in the vicinity of the incident side of the fly-eye lens 17a of the illumination light emitted from the exit port 14a of the light guide fiber 10.
- This light quantity distribution shows the light quantity in the cross section including the optical axis of the partial illumination optical system IL1 with respect to the position from the optical axis.
- the amount of light in the vicinity of the optical axis is smaller than the amount of light at the outer peripheral portion, and the illumination characteristics are similar to those of the annular illumination.
- the light quantity distribution of light has illumination characteristics in which the light quantity in the vicinity of the optical axis is larger than the light quantity in the outer peripheral portion and the light quantity is concentrated in the vicinity of the optical axis.
- the light quantity distribution of the illumination light in the vicinity of the incident side of the fly-eye lens 17a is indicated by a solid line and a dotted line in FIG.
- the light quantity near the optical axis and the light quantity at the outer periphery thereof become a substantially uniform light quantity distribution.
- the same light amount distribution as that of the partial illumination optical system IL1 can be obtained.
- the power supply device 32 By the way, in the illuminating device IL, power is supplied to the light sources 2a, 2b, and 2c by the power supply device 32. It is possible to change to That is, the power supply device 32 and the control unit 30 function as a light amount ratio adjusting unit. Therefore, under the control of the control unit 30, by changing the amount of power supplied to the light sources 2a and 2c and the amount of power supplied to the light source 2b, the illumination light via the entrances 12a and 12c and the entrance 12b are changed. It is possible to change the light amount distribution (light amount balance) with the illumination light through the illumination light and change the light amount distribution of the illumination light in the vicinity of the incident side of the fly-eye lens of each of the partial illumination optical systems IL1 to IL7.
- the light amount distribution light amount balance
- the amount of light near the optical axis can be changed to have a light amount distribution greater than the amount of light at the outer periphery, and the amount of light near the optical axis can be changed to be less than the amount of light at the outer periphery. can do. That is, in the manufacturing process, there is a need to optimize the light quantity distribution of illumination light according to the manufacturing process, such as when high resolution is required or when high contrast is required, but the light sources 2a, 2b, 2c are required. This requirement can be satisfied by individually changing the amount of electric power supplied to each of them and adjusting the light quantity distribution of the illumination light in the vicinity of the incident side of the fly-eye lens of each of the partial illumination optical systems IL1 to IL7.
- the mask M is illuminated by the illuminating device described above, and the mask M and the plate P are synchronously moved with respect to the partial projection optical systems PL1 to PL7 to perform scan exposure (scan exposure), thereby A projected image of the pattern formed on M is formed on the plate P and transferred.
- the illumination light from the light sources 2a to 2c is efficiently collected, and the omission of light corresponding to the incident angle of the condensed light flux is suppressed. Illumination light can be emitted.
- the mask M can be illuminated with illumination light in which the inside of the light beam is uniformly filled, compared with the case where the mask M is illuminated with illumination light in a hollow state.
- the projection image of the pattern of the mask M can be transferred to the plate P with high accuracy.
- each of the partial illumination optical systems IL1 to IL7 is provided with a diaphragm mechanism that can change at least one of the aperture diameter and the aperture shape in the vicinity of the exit side of the fly-eye lens.
- the illumination conditions of the illumination light corresponding to the partial projection optical systems PL1 to PL7 and consequently the projection conditions of the pattern of the mask M (imaging conditions of the projection image).
- the diaphragm mechanism for example, a revolver mechanism or a slider mechanism that can selectively arrange (switchable arrangement) a plurality of diaphragms having at least one of an aperture diameter and an aperture shape on the optical path of illumination light can be used.
- a plurality of stops for example, a first circular opening having a first aperture diameter for performing normal illumination (conventional illumination), and small ⁇ illumination in which the numerical aperture (NA) of illumination light is limited to be smaller than that of normal illumination.
- the light amount distribution of the illumination light in the vicinity of the incident side of the fly-eye lens of each of the partial illumination optical systems IL1 to IL7 is substantially uniform between the light amount in the vicinity of the optical axis and the light amount in the outer peripheral portion. Since the light quantity is distributed, the illumination light quantity decreases when the normal illumination is switched to the small ⁇ illumination and when the normal illumination is switched to the annular illumination (ie, the mask M and the substrate). The illuminance reduction of the illumination light at P) can be suppressed.
- the illuminance reduction rate when the aperture is switched can be reduced as compared with the case of using a conventional illumination device in which the light amount distribution is hollow.
- the illuminance balance between the illuminance at the time of small ⁇ illumination and the illuminance at the time of annular illumination can be made uniform.
- the exposure apparatus according to the second embodiment is related to the first embodiment except that the configuration of the illumination apparatus constituting the exposure apparatus according to the first embodiment is changed to the configuration shown in FIG. It has the same configuration as the exposure apparatus. Accordingly, in the description of the second embodiment, a detailed description of the same configuration as that of the exposure apparatus according to the first embodiment is omitted, and the same configuration as the configuration of the exposure apparatus according to the first embodiment is omitted. Will be described using the same reference numerals as those used in the first embodiment.
- FIG. 8 is a diagram illustrating a configuration of the illumination device IL ′ according to the second embodiment.
- the control unit 30 controls the condensing lens 43 and the second collimating lens 44 of the relay optical system 6a for relaying the illumination light from the light source 2a to the entrance 12a of the light guide fiber 10.
- the condenser lens 45 is replaceable. That is, the relay optical system 6a optically relays the illumination light from the light source 2a, and introduces the light into the entrance (first entrance) 12a of the light guide fiber 10 as a first light flux having a first incident angle. It can be replaced with an optical system (third relay optical system).
- the light quantity distribution on the surface perpendicular to the optical axis of the partial illumination optical system in the vicinity of the incident side of the fly-eye lens is adjusted by replacing the relay optical system 6a with the third relay optical system. be able to.
- the multi-lens scanning exposure apparatus has been described as an example.
- the pattern of the mask M is exposed while the mask M and the plate P are stationary.
- the present invention can be applied to a step-and-repeat type exposure apparatus that sequentially moves the plate P stepwise.
- the present invention is not limited to a multi-lens type exposure apparatus, and the present invention can also be applied to an exposure apparatus having one projection optical system.
- the light guide fiber 10 has the three incident ports 12a to 12c.
- the number is not limited to three, and may be plural.
- the light guide fiber 10 is provided with one incident port 12b provided at a position optically conjugate with the light source image, and two incident ports 12a and 12c provided on the pupil plane (Fourier transform plane) corresponding to the light source image.
- the number of entrances provided at positions optically conjugate with the light source image and the entrance provided on the pupil plane corresponding to the light source image so that the illumination light has a desired light intensity distribution.
- the number of mouths can be selected as appropriate.
- the three light sources 2a to 2c are used as the light source of the illuminating device, but one or more light sources may be provided.
- the illumination light reflected by the elliptical mirror is divided by the optical system and provided at an entrance provided at a position optically conjugate with the light source image or at a pupil plane corresponding to the light source image. Illumination light is incident on the incident port. That is, the light source and the light guide fiber entrance need not correspond one-to-one.
- the light source, the elliptical mirror, and the optical system for dividing the illumination light constitute the light source means.
- the illumination light emitted from the light may have a desired light amount ratio.
- the light guide fiber 10 has seven exit ports.
- the light guide fiber may have any number of exit ports as long as there is one or more exit ports.
- a part of the lenses constituting the illumination relay optical system is replaced with another lens by the drive unit under the control of the control unit.
- a part of the lenses constituting the system may be replaced with another lens.
- control unit and the power supply device are used as the light amount ratio adjusting unit, and the amount of power supplied from the power supply device to each power source is changed based on the control of the control unit.
- the amount of illumination light from each light source may be adjusted using a neutral density filter or the like.
- the light amount of the illumination light from each light source may be adjusted by the light amount ratio adjusting means.
- FIG. 9 is a flowchart showing a semiconductor device manufacturing process.
- a metal film is deposited on a wafer to be a substrate of the semiconductor device (step S40), and a photoresist, which is a photosensitive material, is applied on the deposited metal film.
- the plate P is used (step S42).
- step S44 exposure process (illumination process and projection process)
- step S46 development process
- step S48 processing step
- the resist pattern is a photoresist layer (transfer pattern layer) in which unevenness having a shape corresponding to the pattern transferred by the exposure apparatus of each embodiment is generated, and the recess penetrates the photoresist layer. It is what.
- the wafer surface is processed through this resist pattern.
- the processing performed in step S48 includes at least one of etching of the wafer surface or film formation of a metal film, for example.
- the exposure apparatus of each embodiment performs pattern transfer using the photoresist-coated wafer as a photosensitive substrate.
- FIG. 10 is a flowchart showing a manufacturing process of a liquid crystal device such as a liquid crystal display element.
- a pattern forming process step S50
- a color filter forming process step S52
- a cell assembling process step S54
- a module assembling process step S56
- a predetermined pattern such as a circuit pattern and an electrode pattern is formed on the glass substrate coated with a photoresist as the plate P using the exposure apparatus of each embodiment.
- an exposure process for transferring the pattern to the photoresist layer using the exposure apparatus of each embodiment development of the plate to which the pattern is transferred, that is, a photoresist layer (transfer pattern layer) on the glass substrate and developing a step of generating a photoresist layer having a shape corresponding to the pattern, and a processing step of processing the surface of the glass substrate through the developed photoresist layer.
- a large number of sets of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix, or three of R, G, and B are arranged.
- a color filter is formed by arranging a plurality of stripe filter sets in the horizontal scanning direction.
- a liquid crystal panel (liquid crystal cell) is assembled using the glass substrate on which the predetermined pattern is formed in step S50 and the color filter formed in step S52.
- a liquid crystal panel is formed by injecting liquid crystal between a glass substrate and a color filter.
- step S56 various components such as an electric circuit and a backlight for performing the display operation of the liquid crystal panel are attached to the liquid crystal panel assembled in step S54.
- the present invention is not limited to application to an exposure apparatus for manufacturing a semiconductor device or a liquid crystal device.
- an exposure apparatus for a display device such as a plasma display, an image sensor (CCD or the like), a micromachine
- the present invention can be widely applied to an exposure apparatus for manufacturing various devices such as a thin film magnetic head and a DNA chip.
- the present invention can also be applied to an exposure process (exposure apparatus) when manufacturing a mask (photomask, reticle, etc.) on which mask patterns of various devices are formed using a photolithography process.
- the present disclosure relates to the subject matter included in Japanese Patent Application No. 2008-10286 filed on January 21, 2008, the entire disclosure of which is expressly incorporated herein by reference.
- the present invention can be used for an illumination apparatus, an exposure apparatus, an exposure method, and a device manufacturing method.
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Abstract
Description
なお、本実施形態に係る露光装置EXでは、各部分照明光学系IL1~IL7におけるフライアイレンズの射出側近傍に、開口径および開口形状の少なくとも一方が変更可能な絞り機構を設けることで、各部分投影光学系PL1~PL7に対応する照明光の照明条件を、ひいてはマスクMのパターンの投影条件(投影像の結像条件)を制御することができる。
その絞り機構として、例えば開口径および開口形状の少なくとも一方が異なる複数の絞りを照明光の光路上に選択的に配置可能(切換配置可能)なレボルバー機構あるいはスライダー機構を用いることができる。また、複数の絞りとして、例えば通常照明(コンベンショナル照明)を行うための第1の開口径を有する第1円形開口と、通常照明よりも照明光の開口数(NA)を小さく制限した小σ照明を行うために第1の開口径よりも小さい第2の開口径を有する第2円形開口と、輪帯照明を行うための輪帯状(リング状)の開口を有する輪帯開口とを備えることができる。
本実施形態に係る照明装置ILでは、各部分照明光学系IL1~IL7のフライアイレンズの入射側近傍における照明光の光量分布が、光軸近傍の光量とその外周部の光量とが略均一な光量分布とされているため、上述のような絞り機構によって、例えば通常照明から小σ照明に切り換えた場合および通常照明から輪帯照明に切り換えた場合の照明光量の低下(すなわち、マスクMおよび基板Pにおける照明光の照度低下)をそれぞれ抑制することができる。言い換えると、図7(a)に実線で示したように光量分布が中抜けした従来の照明装置を用いる場合に比して、絞りを切り換えた場合の照度の低下率を小さくすることができるとともに、小σ照明時の照度と輪帯照明時の照度との照度バランスを均等にすることができる。
なお、本開示は、2008年1月21日に提出された日本国特許出願2008-10286号に含まれた主題に関し、その開示の全ては、ここに参照事項として明白に組み込まれる。
Claims (16)
- 光源手段から発せられる照明光を複数の入射口から受光し、該入射口ごとに受光した各照明光の少なくとも一部を共通の射出口から射出させる光伝送手段と、
前記光源手段からの前記照明光のうち第1部分照明光を光学的にリレーして第1の入射角を有する第1光束とし、複数の前記入射口のうちの第1入射口へ導入する第1リレー光学系と、
前記光源手段からの前記照明光のうち第2部分照明光を光学的にリレーして前記第1の入射角と異なる第2の入射角を有する第2光束とし、複数の前記入射口のうちの第2入射口へ導入する第2リレー光学系と、
を備えたことを特徴とする照明装置。 - 前記第1の入射角は、前記光源手段の発光部における前記照明光の発散角に対応する角度であることを特徴とする請求項1に記載の照明装置。
- 前記第1リレー光学系は、
前記発光部の像を前記第1入射口内に投射することを特徴とする請求項2に記載の照明装置。 - 前記第2の入射角は、前記光源手段の発光部の大きさ若しくは該発光部の像の大きさに対応する角度であることを特徴とする請求項1乃至請求項3のいずれか一項に記載の照明装置。
- 前記第2リレー光学系は、前記第2部分照明光を、該第2リレー光学系の焦点面に設けられた前記第2入射口へ導入することを特徴とする請求項4に記載の照明装置。
- 前記第2リレー光学系は、前記発光部に対応するフーリエ変換像を前記第2入射口内に投射することを特徴とする請求項4または請求項5に記載の照明装置。
- 前記光源手段は、複数の発光部を有し、
前記第1リレー光学系および前記第2リレー光学系は、それぞれ異なる前記発光部から発せられる前記照明光を前記第1部分照明光および前記第2部分照明光として光学的にリレーすることを特徴とする請求項1乃至請求項6のいずれか一項に記載の照明装置。 - 前記光源手段は、該光源手段の発光部の像を形成する発光像形成手段を有し、
前記第1リレー光学系および前記第2リレー光学系は、それぞれ前記発光部の像から発せられる前記照明光を光学的にリレーすることを特徴とする請求項1乃至請求項7のいずれか一項に記載の照明装置。 - 前記発光像形成手段は、前記発光部の近傍に第1焦点を有する楕円鏡を含み、
前記第2入射口は、輪帯状に形成されることを特徴とする請求項8に記載の照明装置。 - 前記第1入射口および前記第2入射口は、光ファイバ束を用いて形成されることを特徴とする請求項1乃至請求項9のいずれか一項に記載の照明装置。
- 前記第2リレー光学系は、前記第2部分照明光を光学的にリレーして前記第1の入射角を有する光束として前記第2入射口へ導入する第3リレー光学系と交換可能に設けられることを特徴とする請求項1乃至請求項10のいずれか一項に記載の照明装置。
- 前記共通の射出口から射出される前記照明光のうち前記第1入射口を介した前記照明光と前記第2入射口を介した前記照明光との光量比を変化させる光量比調整手段を備えたことを特徴とする請求項1乃至請求項11のいずれか一項に記載の照明装置。
- 前記光源手段は、前記第1入射口または前記第2入射口に対応付けられた複数の発光部を有し、
前記光量比調整手段は、前記第1入射口に対応付けられた前記発光部へ供給する電力と、前記第2入射口に対応付けられた前記発光部へ供給する電力との電力比を変化させることを特徴とする請求項12に記載の照明装置。 - 請求項1乃至請求項13のいずれか一項に記載の照明装置と、
前記照明装置が射出する照明光によって照明される物体の投影像を感光基板上に形成する投影光学系と、
を備えたことを特徴とする露光装置。 - 請求項1乃至請求項13のいずれか一項に記載の照明装置が射出する照明光によって物体を照明する照明工程と、
前記照明光によって照明された前記物体の投影像を感光基板上に形成する投影工程と、
を含むことを特徴とする露光方法。 - 請求項1乃至請求項13のいずれか一項に記載の照明装置が射出する照明光によって物体を照明し、該物体の投影像を感光基板に転写する露光工程と、
前記投影像が転写された前記感光基板を現像し、前記投影像に対応する形状の転写パターン層を前記感光基板上に生成する現像工程と、
前記転写パターン層を介して前記感光基板を加工する加工工程と、
を含むことを特徴とするデバイス製造方法。
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