WO2008111351A1 - 全反射テラヘルツ波測定装置 - Google Patents

全反射テラヘルツ波測定装置 Download PDF

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Publication number
WO2008111351A1
WO2008111351A1 PCT/JP2008/052336 JP2008052336W WO2008111351A1 WO 2008111351 A1 WO2008111351 A1 WO 2008111351A1 JP 2008052336 W JP2008052336 W JP 2008052336W WO 2008111351 A1 WO2008111351 A1 WO 2008111351A1
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WIPO (PCT)
Prior art keywords
total reflection
hertz wave
tera hertz
tera
face
Prior art date
Application number
PCT/JP2008/052336
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English (en)
French (fr)
Inventor
Takashi Yasuda
Yoichi Kawada
Hironori Takahashi
Shinichiro Aoshima
Original Assignee
Hamamatsu Photonics K.K.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics K.K. filed Critical Hamamatsu Photonics K.K.
Priority to EP08711194.4A priority Critical patent/EP2128600B1/en
Priority to US12/530,897 priority patent/US8354644B2/en
Publication of WO2008111351A1 publication Critical patent/WO2008111351A1/ja

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N21/552—Attenuated total reflection

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Toxicology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)

Abstract

全反射テラヘルツ波測定装置１は、テラヘルツ波を用いて全反射測定法により測定対象物Ｓの情報を取得するものであって、光源１１、分岐部１２、チョッパ１３、光路長差調整部１４、偏光子１５、ビームスプリッタ１７、テラヘルツ波発生素子２０、内部全反射プリズム３１、テラヘルツ波検出素子４０、１／４波長板５１、偏光分離素子５２、光検出器５３Ａ、光検出器５３Ｂ、差動増幅器５４およびロックイン増幅器５５を備える。内部全反射プリズム３１は、いわゆる無収差プリズムであって、入射面３１ａ，出射面３１ｂおよび反射面３１ｃを有する。内部全反射プリズム３１の入射面３１ａにテラヘルツ波発生素子２０が一体に設けられ、内部全反射プリズム３１の出射面３１ｂにテラヘルツ波検出素子４０が一体に設けられている。
PCT/JP2008/052336 2007-03-13 2008-02-13 全反射テラヘルツ波測定装置 WO2008111351A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP08711194.4A EP2128600B1 (en) 2007-03-13 2008-02-13 Total reflection tera hertz wave measuring apparatus
US12/530,897 US8354644B2 (en) 2007-03-13 2008-02-13 Total reflection tera hertz wave measuring apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-063878 2007-03-13
JP2007063878A JP4871176B2 (ja) 2007-03-13 2007-03-13 全反射テラヘルツ波測定装置

Publications (1)

Publication Number Publication Date
WO2008111351A1 true WO2008111351A1 (ja) 2008-09-18

Family

ID=39759294

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/052336 WO2008111351A1 (ja) 2007-03-13 2008-02-13 全反射テラヘルツ波測定装置

Country Status (4)

Country Link
US (1) US8354644B2 (ja)
EP (1) EP2128600B1 (ja)
JP (1) JP4871176B2 (ja)
WO (1) WO2008111351A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2273254A1 (en) * 2008-04-30 2011-01-12 Hamamatsu Photonics K.K. Total reflection terahertz wave measurement device
JP2013190311A (ja) * 2012-03-13 2013-09-26 Canon Inc センサ装置
CN104316498A (zh) * 2014-11-13 2015-01-28 中国科学院上海微***与信息技术研究所 一种表面等离子体共振的太赫兹传感器

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JP5601562B2 (ja) * 2009-09-04 2014-10-08 独立行政法人理化学研究所 移動度測定装置及びその方法、並びに、抵抗率測定装置及びその方法
US8416396B2 (en) 2010-07-18 2013-04-09 David H. Parker Methods and apparatus for optical amplitude modulated wavefront shaping
JP2012083166A (ja) * 2010-10-08 2012-04-26 Hamamatsu Photonics Kk 全反射分光計測装置
JP5550521B2 (ja) * 2010-10-20 2014-07-16 浜松ホトニクス株式会社 全反射分光計測装置
JP5877942B2 (ja) * 2010-11-29 2016-03-08 浜松ホトニクス株式会社 全反射分光計測装置
JP5723643B2 (ja) * 2011-03-22 2015-05-27 浜松ホトニクス株式会社 全反射分光計測方法
JP5894575B2 (ja) * 2011-03-29 2016-03-30 浜松ホトニクス株式会社 テラヘルツ波分光計測装置
JP5607566B2 (ja) * 2011-03-29 2014-10-15 浜松ホトニクス株式会社 テラヘルツ波分光計測装置
US9080913B2 (en) 2011-03-29 2015-07-14 Hamamatsu Photonics K.K Terahertz-wave spectrometer and prism member
JP2013195281A (ja) * 2012-03-21 2013-09-30 Furukawa Co Ltd 電気抵抗測定装置及び電気抵抗測定方法
US9435919B2 (en) 2012-03-26 2016-09-06 Konica Minolta, Inc. Prism and sensor chip
JP5957294B2 (ja) 2012-05-29 2016-07-27 浜松ホトニクス株式会社 プリズム部材、テラヘルツ波分光計測装置、及びテラヘルツ波分光計測方法
WO2014046170A1 (ja) * 2012-09-24 2014-03-27 日本碍子株式会社 テラヘルツ波検出素子とその作製方法、接合体、および観察装置
JP2014142309A (ja) * 2013-01-25 2014-08-07 Canon Inc 測定物情報取得装置とその取得方法
WO2014134923A1 (zh) * 2013-03-08 2014-09-12 法玛科技顾问股份有限公司 棱镜及应用此棱镜的光学检测***
KR102100931B1 (ko) * 2014-01-03 2020-04-14 삼성전자주식회사 광전도 안테나
JP6477693B2 (ja) 2014-05-14 2019-03-06 コニカミノルタ株式会社 検出デバイスおよびその製造方法
JP6407635B2 (ja) * 2014-09-03 2018-10-17 有限会社スペクトルデザイン 電磁波の偏光方位計測方法及び装置
ES2941720T3 (es) * 2014-09-24 2023-05-25 Otsuka Pharma Co Ltd Prisma, método de producción de prisma y chip sensor
CN106248616B (zh) * 2016-09-27 2017-10-24 深圳市太赫兹科技创新研究院有限公司 太赫兹全偏振态检测光谱仪
US10508985B2 (en) * 2017-06-05 2019-12-17 Northwestern University Systems and methods for pump-probe spectroscopy
JP6843013B2 (ja) 2017-07-19 2021-03-17 浜松ホトニクス株式会社 テラヘルツ波分光計測装置およびテラヘルツ波分光計測方法
CN109444084B (zh) * 2018-11-05 2023-12-12 天津大学 一种基于双模式的太赫兹波高灵敏度成像装置
DE102018133037B4 (de) * 2018-12-20 2021-02-25 Leibniz-Institut für Photonische Technologien e. V. Anordnung und Verfahren zur Erfassung von optischen Eigenschaften einer Probe, insbesondere zum selektiven Nachweis von biologischen Molekülen und zum Auslesen einer Molekülbelegung
JP6735368B2 (ja) * 2019-01-15 2020-08-05 東日本電信電話株式会社 検査装置
JP7505948B2 (ja) * 2020-09-23 2024-06-25 浜松ホトニクス株式会社 テラヘルツ波全反射減衰分光方法、テラヘルツ波全反射減衰分光装置及び圧力付与装置
WO2023074761A1 (ja) * 2021-10-27 2023-05-04 浜松ホトニクス株式会社 結晶形態判別方法

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JP2004354246A (ja) 2003-05-29 2004-12-16 Aisin Seiki Co Ltd 反射型テラヘルツ分光測定装置及び測定方法
JP2006184078A (ja) 2004-12-27 2006-07-13 Canon Inc 被対象物を透過した電磁波の状態を検出するための検出装置

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JP4280654B2 (ja) * 2004-02-17 2009-06-17 アイシン精機株式会社 マルチチャンネルテラヘルツ波スペクトル測定法及び測定装置
JP3913253B2 (ja) * 2004-07-30 2007-05-09 キヤノン株式会社 光半導体装置およびその製造方法
JP4546326B2 (ja) * 2004-07-30 2010-09-15 キヤノン株式会社 センシング装置

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JP2000348367A (ja) * 1999-06-04 2000-12-15 Olympus Optical Co Ltd 光学ユニットおよび光ピックアップ
JP2004354246A (ja) 2003-05-29 2004-12-16 Aisin Seiki Co Ltd 反射型テラヘルツ分光測定装置及び測定方法
JP2006184078A (ja) 2004-12-27 2006-07-13 Canon Inc 被対象物を透過した電磁波の状態を検出するための検出装置

Non-Patent Citations (2)

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Title
HIRORI H. ET AL.: "Destructive interference effect on surface plasmon resonance in terahertz attenuated total reflection", OPICS EXPRESS, vol. 13, no. 26, 26 December 2005 (2005-12-26), pages 10801 - 10814, XP008118065 *
See also references of EP2128600A4 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2273254A1 (en) * 2008-04-30 2011-01-12 Hamamatsu Photonics K.K. Total reflection terahertz wave measurement device
EP2273254A4 (en) * 2008-04-30 2014-02-26 Hamamatsu Photonics Kk TERRAHERTZIAN WAVE MEASURING DEVICE FOR TOTAL REFLECTION
JP2013190311A (ja) * 2012-03-13 2013-09-26 Canon Inc センサ装置
CN104316498A (zh) * 2014-11-13 2015-01-28 中国科学院上海微***与信息技术研究所 一种表面等离子体共振的太赫兹传感器

Also Published As

Publication number Publication date
JP2008224449A (ja) 2008-09-25
JP4871176B2 (ja) 2012-02-08
US8354644B2 (en) 2013-01-15
EP2128600A1 (en) 2009-12-02
EP2128600B1 (en) 2016-05-04
US20100091266A1 (en) 2010-04-15
EP2128600A4 (en) 2014-02-26

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