WO2008004792A1 - Multiple nozzle evaporator for vacuum thermal evaporation - Google Patents
Multiple nozzle evaporator for vacuum thermal evaporation Download PDFInfo
- Publication number
- WO2008004792A1 WO2008004792A1 PCT/KR2007/003209 KR2007003209W WO2008004792A1 WO 2008004792 A1 WO2008004792 A1 WO 2008004792A1 KR 2007003209 W KR2007003209 W KR 2007003209W WO 2008004792 A1 WO2008004792 A1 WO 2008004792A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- evaporator
- evaporation
- crucible
- body portion
- nozzle unit
- Prior art date
Links
- 238000002207 thermal evaporation Methods 0.000 title claims description 25
- 238000001704 evaporation Methods 0.000 claims abstract description 66
- 230000008020 evaporation Effects 0.000 claims abstract description 64
- 230000002093 peripheral effect Effects 0.000 claims abstract description 10
- 230000000149 penetrating effect Effects 0.000 claims abstract description 7
- 239000000463 material Substances 0.000 abstract description 38
- 239000000758 substrate Substances 0.000 abstract description 30
- 239000010409 thin film Substances 0.000 abstract description 11
- 230000005494 condensation Effects 0.000 abstract description 3
- 238000009833 condensation Methods 0.000 abstract description 3
- 230000008878 coupling Effects 0.000 description 12
- 238000010168 coupling process Methods 0.000 description 12
- 238000005859 coupling reaction Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 238000009826 distribution Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Definitions
- the present invention relates to an evaporator for vacuum thermal evaporation, and more particularly, to a multiple nozzle evaporator in which a material to be evaporated in the evaporator can be deposited on a substrate with an improved efficiency of use of the material, thereby forming a large- area uniform thin film.
- the vacuum thermal evaporation method is a method of forming a thin film by placing a substrate at an upper side within a vacuum container, and heating an evaporator, which is placed below the substrate and contains a material to be evaporated, so that the evaporated material can be deposited on the substrate.
- Fig. 1 shows a point evaporator that is most popularly used in the vacuum thermal evaporation method.
- the point evaporator 21 includes a cylindrical container with a spouting portion.
- a material to be evaporated is filled into the cylindrical container that in turn is heated to evaporate the material, so that the evaporated material spouts from the container toward a substrate to form a thin film.
- the point evaporator causes most of the evaporated material to spout therefrom in a direction 22 directed by the spouting portion, it has a problem in that a large-area uniform thin film cannot be obtained. In order to solve this problem, as shown in Fig.
- An object of the present invention is to provide an evaporator which can form a thin film with a uniform thickness on a large-area substrate without rotation of the substrate, improve the efficiency of use of a material to be evaporated, and minimize condensation of the evaporated material.
- a multiple nozzle evaporator for vacuum thermal evaporation which comprises a cylindrical crucible with an open top face; and a nozzle unit including a body portion having a cylindrical shape with a height smaller than that of the crucible and assembled to an upper portion of the crucible, and a plurality of evaporation tubes formed at an angle while penetrating through the body portion between top and bottom faces of the body portion, wherein a center of a lower end opening of each of the evaporation tubes in the nozzle unit is located on an identical circumference with a radius from a center of the body portion, and a center of an upper end opening of the evaporation tube is located on a tangential line to the circumference passing through the center of the lower end opening.
- a multiple nozzle evaporator for vacuum thermal evaporation which comprises a rectangular post-shaped crucible with an open top face; and a nozzle unit including a body portion having a rectangular post-like shape with a height smaller than that of the crucible and assembled to an upper portion of the crucible, and a plurality of evaporation tubes penetrating through the body portion between top and bottom faces of the body portion, wherein the evaporation tubes of the nozzle unit are divided into two groups of which evaporation tubes are inclined in opposite directions at an identical inclination angle with respect to a central axis of the top face of the body portion.
- the multiple nozzle evaporator for vacuum thermal evaporation is configured by disposing a plurality of evaporation tubes such that they are directed to peripheral areas of a substrate.
- a uniform thin film can be formed on a large-area substrate, the efficiency of use of a material to be evaporated can be improved, and the evaporated material can be prevented from being condensed on the evaporation tubes.
- Fig. 1 is a schematic view illustrating a vacuum thermal evaporation method using a conventional point evaporator.
- Fig. 2 is a perspective view showing a multiple nozzle evaporator according to a first embodiment of the present invention.
- Fig. 3 is a plan view of a nozzle unit in the multiple nozzle evaporator according to the first embodiment of the present invention.
- Fig. 4 is a schematic view illustrating a vacuum thermal evaporation method using the first embodiment of the present invention.
- FIG. 5 is a perspective view showing a second embodiment of the present invention.
- FIG. 6 is a perspective view showing a third embodiment of the present invention.
- FIGS. 7 and 8 are perspective views showing variants of the third embodiment of the present invention.
- Figs. 9 and 10 show a perspective view and front and side views illustrating a fourth embodiment of the present invention, respectively.
- Fig. 11 is a schematic view illustrating a vacuum thermal evaporation method using the fourth embodiment of the present invention.
- Figs. 12 and 13 show a perspective view and front and side views illustrating a variant of the fourth embodiment of the present invention, respectively.
- a multiple nozzle evaporator of the present invention can be implemented in two different ways according to configurations of a crucible and a nozzle unit of the evaporator.
- a type of multiple nozzle evaporator is a circular multiple nozzle evaporator that has a circular crucible and a circular nozzle unit and corresponds to first and second embodiments of the present invention.
- Another type of multiple nozzle evaporator is a rectangular multiple nozzle evaporator that has a rectangular crucible and a rectangular nozzle unit and corresponds to third and fourth embodiments of the present invention.
- the multiple nozzle evaporator for vacuum thermal evaporation according to the present invention includes a crucible 31 and a nozzle unit
- the crucible 31 is formed of a cylindrical container that has an open top face and can receive a material 4 to be evaporated therein.
- a coupling means for use in coupling with the nozzle unit is formed at an upper portion of the crucible 31.
- the nozzle unit 32 includes a body portion 32a having a cylindrical shape with a height smaller than that of the crucible 31 and assembled to the upper portion of the crucible 31, and a plurality of evaporation tubes 33 formed at an angle while penetrating through the body portion 32a between top and bottom faces of the body portion 32a.
- a coupling means for use in coupling with the upper portion of the crucible 31 is provided at a lower portion of the nozzle unit 32.
- the coupling means for coupling the nozzle unit with the crucible may be constructed of snap-fit protrusions provided at peripheries of the crucible and the nozzle unit where they are coupled with each other.
- the coupling means may be constructed of clamps or the like provided respectively at the crucible and the nozzle unit.
- the center of an upper end opening 33a of the evaporation tube 33 is located on a tangential line to the circumference passing through the center of the lower end opening 33b.
- each of the evaporation tubes 33 be formed at an angle of less than about 60 degrees with respect to the vertical direction of the body portion 32a.
- the multiple nozzle evaporator of the present invention is placed below a center of the substrate 1, as shown in Fig. 4. Then, the evaporator is heated so that a material to be evaporated is evaporated and spouts through the inclined evaporation tubes 33 toward lateral sides of the substrate and is finally deposited on the substrate.
- the evaporated material spouts toward the peripheral areas of the substrate by means of the evaporation tubes inclined to be directed to the peripheral areas, resulting in a thin film with a uniform thickness even in case of a large-area substrate. Since the evaporator is placed below the center of the substrate, it is possible to minimize the amount of the material to be wasted by being directed to the outside of the substrate.
- the structure and inclination angle of the evaporation tube can be optimally adjusted according to process conditions so as to optimize the uniformity of a thin film and the efficiency of use of the material.
- the evaporation tube 33 may be constructed to be inclined toward the outside of the nozzle unit from a center line of the nozzle unit (i.e., in a direction toward an outer periphery of a top face of the nozzle unit from the center of the bottom face of the nozzle unit).
- the evaporation tubes are configured as above, they can be disposed more densely. Thus, it is possible to obtain effects similar to those obtained in a case where nozzles are consecutively disposed. In addition, since the entire evaporation tubes are formed near the outer periphery of the nozzle unit, better thermal conduction can be achieved and it is possible to prevent condensation of the evaporated material within the evaporation tubes.
- a protrusion or inclined surface may be formed on the top face of the body portion 32a of the nozzle unit in order to properly control the spouting distribution of the material that spouts through each of the evaporation tubes.
- the diameter of the evaporation tube may vary along the length thereof, or a protrusion may be formed within the evaporation tube.
- FIG. 5 shows a perspective view of a second embodiment of the present invention.
- a hollow portion 35 is formed along central portions of the nozzle unit 32 and the crucible 31, so that a central heater can be additionally installed in the hollow portion.
- the central heater enhances the heating capacity of the evaporator and also mainly heats the nozzle unit to prevent the evaporated material from being condensed within the evaporation tubes.
- a multiple nozzle evaporator includes a rectangular crucible 51 and a rectangular nozzle unit 52.
- the crucible 51 is formed of a rectangular container that has an open top face and can receive a material to be evaporated therein.
- a coupling means for use in coupling with the nozzle unit is formed at an upper portion of the crucible.
- the coupling means for coupling the nozzle unit with the crucible may be constructed of snap-fit protrusions provided at peripheries of the crucible and the nozzle unit where they are coupled with each other.
- the coupling means may be constructed of clamps or the like provided respectively at the crucible and the nozzle unit.
- the nozzle unit 52 is formed with a plurality of evaporation tubes 531 and 532 extending from a top face to a bottom face of the nozzle unit.
- the evaporation tubes are inclined in opposite directions and thus divided into two groups 531 and 532 according to the inclined directions, so that the deposited material can be directed to the peripheral areas of the substrate.
- Each of the groups may include a single evaporation tube as shown in Fig. 6, a single row of evaporation tubes as shown in Fig. 7, or a cluster of two rows of evaporation tubes as shown in Fig. 8.
- a protrusion or inclined surface may be formed on a top face of the body portion of the nozzle unit.
- the diameter of the evaporation tube may vary along the length thereof, or a protrusion may be formed within the evaporation tube.
- the two groups of evaporation tubes are directed to the peripheral areas of the substrate, and thus, a combination of the spouting distributions of the evaporated material spouting through the two groups of evaporation tubes can achieve a uniform distribution in the longitudinal direction of the evaporator.
- the structures and inclination angles of the evaporation tubes can be properly adjusted to achieve a spouting distribution that enables better uniformity of vacuum thermal evaporation and a higher efficiency of use of the material.
- the third embodiment enables uniform vacuum thermal evaporation only in the longitudinal direction of the evaporator, it is preferred that vacuum thermal evaporation using the evaporator of the third embodiment be performed by moving the substrate or evaporator in a direction perpendicular to the length of the evaporator.
- a fourth embodiment of the present invention includes four groups 531a, 531b, 532a and 532b of evaporation tubes in a nozzle unit. That is, the evaporation tubes are divided into two main groups each of which is again divided into two sub-groups, thereby generating the four groups in total.
- the two main groups 531 and 532 are inclined outwardly in the longitudinal direction of the evaporator, and the two sub-groups 531a and 531b or 532a and 532b of each of the main groups are inclined toward peripheral areas of a substrate in a direction perpendicular to the longitudinal direction of the evaporator while being inclined outwardly in the longitudinal direction of the evaporator.
- the four groups are inclined toward respective four corners of the substrate 1 positioned above the evaporator.
- each group of evaporation tubes in a nozzle unit includes a plurality of evaporation tubes in a row.
- each group of evaporation tubes may include a cluster of two rows of evaporation tubes, as shown in Fig. 9.
- the evaporation tubes may be arranged into four groups.
- a protrusion or inclined surface may be formed on a top face of a body portion of the nozzle unit.
- the diameter of the evaporation tube may vary along the length thereof, or a protrusion may be formed within the evaporation tube.
- the structures and inclination angles of the evaporation tubes are adjusted appropriately so as to achieve a spouting distribution of a material, which enables uniform vacuum thermal evaporation in the longitudinal direction of the evaporator as well as in the direction perpendicular to the longitudinal direction.
- vacuum thermal evaporation can be carried out with both the evaporator and the substrate held in place.
- the fourth embodiment can provide a higher efficiency of use of a material as compared with the first and second embodiments which provide a circular spouting distribution of a material.
- an additional group of vertical evaporation tubes may be further provided, or a sub-group of evaporation tubes having a different inclination angle may be added.
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/814,729 US7833354B2 (en) | 2006-07-03 | 2007-07-03 | Multiple nozzle evaporator for vacuum thermal evaporation |
JP2008523813A JP4781433B2 (en) | 2006-07-03 | 2007-07-03 | Multi-nozzle vaporizer for vacuum thermal evaporation |
US12/899,767 US7976636B2 (en) | 2006-07-03 | 2010-10-07 | Multiple nozzle evaporator for vacuum thermal evaporation |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20060061867 | 2006-07-03 | ||
KR10-2006-0061867 | 2006-07-03 | ||
KR20060090545 | 2006-09-19 | ||
KR10-2006-0090545 | 2006-09-19 | ||
KR1020070066024A KR100980729B1 (en) | 2006-07-03 | 2007-07-02 | Multiple nozzle evaporator for vacuum thermal evaporation |
KR10-2007-0066024 | 2007-07-02 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/814,729 A-371-Of-International US7833354B2 (en) | 2006-07-03 | 2007-07-03 | Multiple nozzle evaporator for vacuum thermal evaporation |
US12/899,767 Division US7976636B2 (en) | 2006-07-03 | 2010-10-07 | Multiple nozzle evaporator for vacuum thermal evaporation |
Publications (1)
Publication Number | Publication Date |
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WO2008004792A1 true WO2008004792A1 (en) | 2008-01-10 |
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ID=38894727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2007/003209 WO2008004792A1 (en) | 2006-07-03 | 2007-07-03 | Multiple nozzle evaporator for vacuum thermal evaporation |
Country Status (1)
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WO (1) | WO2008004792A1 (en) |
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US20110052795A1 (en) * | 2009-09-01 | 2011-03-03 | Samsung Mobile Display Co., Ltd. | Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
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DE102010055285A1 (en) | 2010-12-21 | 2012-06-21 | Solarion Ag Photovoltaik | Evaporator source, evaporator chamber and coating process |
CN102534507A (en) * | 2010-12-27 | 2012-07-04 | 瑞必尔 | Injector for a vacuum evaporation source |
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US8696815B2 (en) | 2009-09-01 | 2014-04-15 | Samsung Display Co., Ltd. | Thin film deposition apparatus |
US8833294B2 (en) | 2010-07-30 | 2014-09-16 | Samsung Display Co., Ltd. | Thin film deposition apparatus including patterning slit sheet and method of manufacturing organic light-emitting display device with the same |
US8852687B2 (en) | 2010-12-13 | 2014-10-07 | Samsung Display Co., Ltd. | Organic layer deposition apparatus |
US8859043B2 (en) | 2011-05-25 | 2014-10-14 | Samsung Display Co., Ltd. | Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
US8859325B2 (en) | 2010-01-14 | 2014-10-14 | Samsung Display Co., Ltd. | Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method |
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JP2014201833A (en) * | 2013-04-01 | 2014-10-27 | 上海和輝光電有限公司Everdisplay Optronics (Shanghai) Limited | Evaporation source assembly |
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CN108103479A (en) * | 2017-12-26 | 2018-06-01 | 德淮半导体有限公司 | For the nozzle of vapor deposition |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030051459A (en) * | 2003-04-18 | 2003-06-25 | 이영희 | Manufacturing Thermal Evaporator for Synthesizing Carbon Nanotubes |
KR20030071205A (en) * | 2002-02-28 | 2003-09-03 | 한국과학기술연구원 | Deposition Method of CdTe and CdZnTe by Controling Group II Metal Atom Atmosphere |
KR20040105957A (en) * | 2003-06-10 | 2004-12-17 | 엘지전자 주식회사 | Vapor depositing device |
-
2007
- 2007-07-03 WO PCT/KR2007/003209 patent/WO2008004792A1/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030071205A (en) * | 2002-02-28 | 2003-09-03 | 한국과학기술연구원 | Deposition Method of CdTe and CdZnTe by Controling Group II Metal Atom Atmosphere |
KR20030051459A (en) * | 2003-04-18 | 2003-06-25 | 이영희 | Manufacturing Thermal Evaporator for Synthesizing Carbon Nanotubes |
KR20040105957A (en) * | 2003-06-10 | 2004-12-17 | 엘지전자 주식회사 | Vapor depositing device |
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US8951610B2 (en) | 2011-07-04 | 2015-02-10 | Samsung Display Co., Ltd. | Organic layer deposition apparatus |
JP2014201833A (en) * | 2013-04-01 | 2014-10-27 | 上海和輝光電有限公司Everdisplay Optronics (Shanghai) Limited | Evaporation source assembly |
TWI495741B (en) * | 2013-04-01 | 2015-08-11 | Everdisplay Optronics Shanghai Ltd | Evaporation source assembly, thin film deposition apparatus and thin film deposition method |
CN108103479B (en) * | 2017-12-26 | 2020-07-14 | 德淮半导体有限公司 | Showerhead for vapor deposition |
CN108103479A (en) * | 2017-12-26 | 2018-06-01 | 德淮半导体有限公司 | For the nozzle of vapor deposition |
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