WO2006085597A1 - Multi-pattern bright film, multi-pattern bright sled, and bright multi-pattern product using them - Google Patents

Multi-pattern bright film, multi-pattern bright sled, and bright multi-pattern product using them Download PDF

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Publication number
WO2006085597A1
WO2006085597A1 PCT/JP2006/302276 JP2006302276W WO2006085597A1 WO 2006085597 A1 WO2006085597 A1 WO 2006085597A1 JP 2006302276 W JP2006302276 W JP 2006302276W WO 2006085597 A1 WO2006085597 A1 WO 2006085597A1
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WO
WIPO (PCT)
Prior art keywords
layer
glitter
relief
pattern
relief forming
Prior art date
Application number
PCT/JP2006/302276
Other languages
French (fr)
Japanese (ja)
Inventor
Makoto Aoyagi
Norikazu Saito
Tetsuya Matsuyama
Original Assignee
Dai Nippon Printing Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co., Ltd. filed Critical Dai Nippon Printing Co., Ltd.
Publication of WO2006085597A1 publication Critical patent/WO2006085597A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G03H1/0011—Adaptation of holography to specific applications for security or authentication
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2270/00—Substrate bearing the hologram
    • G03H2270/52—Integrated surface relief hologram without forming layer

Definitions

  • Multi-design glitter film, multi-design glitter thread and glitter multi-pattern formation using them are Multi-design glitter film, multi-design glitter thread and glitter multi-pattern formation using them.
  • the present invention relates to a multi-design glitter film or thread, and more specifically, a multi-design glitter film having a plurality of glitter designs, a unique design, and Z or security.
  • the present invention relates to a thread and a glittering multi-patterned product using them.
  • ratio “part”, “%” and the like indicating the composition are based on mass unless otherwise specified, and the “z” mark indicates that they are integrally laminated.
  • “brilliance” is a micro-order relief shape in which the relief shape is a hairline pattern, a line pattern, a mat pattern, a hologram, and a z or diffraction grating. It means the effect of having a unique optical design.
  • first base material 11A and second base material 11B are collectively referred to as “base material 11", and the same applies to the other layers.
  • a sheet is a thin and generally a flat product whose thickness is small relative to the length and width, and a film is a length and width.
  • This is a thin, flat product, usually supplied in the form of a roll, with a maximum thickness that is extremely small compared to the thickness. Therefore, it can be said that the film is particularly thin in the thickness of the sheet. Since the boundary between the sheet and the film is not clear, it is difficult to clearly distinguish between the sheet and the film. ".
  • the multi-design glitter film or thread of the present invention Using the multi-design glitter film or thread of the present invention and the multi-design glitter film or thread, at least a part of the multi-design glitter film is transferred to the transfer object by sticking or squeezing.
  • main uses of the glittered multi-pattern formation For example, banknotes, stock certificates, securities, certificates, gift certificates, checks, bills, hall tickets, passbooks, gift certificates, boarding tickets, car horse tickets, stamps, stamps, appreciation tickets, entrance certificates, passports, tickets, etc.
  • Cards such as cash cards, credit cards, ID cards, prepaid cards, members cards, IC cards, optical cards, greeting cards, postcards, business cards, driver's licenses, sports certificates, etc.
  • Packaging materials such as cartons, cases, flexible packaging materials, bags, forms, envelopes, tags, transparencies, slide films, bookmarks, books, magazines, calendars, posters, brochures, print clubs (registered trademark) , Menus, passports, POP supplies, coasters, displays, nameplates, keyboards, cosmetics, wrist watches, lighters, accessories, sentences Stationery such as furniture, underlay, report paper, building materials, panels, emblems, keys, cloth, clothing, footwear, radio, television, calculator, office equipment, various sample books, albums, and computer graphics Output and medical image output.
  • Stationery such as furniture, underlay, report paper, building materials, panels, emblems, keys, cloth, clothing, footwear, radio, television, calculator, office equipment, various sample books, albums, and computer graphics Output and medical image output.
  • there is no particular limitation as long as it is a use that requires a unique design with glitter and Z or security.
  • vouchers, cards, and various certificates have qualifications and certain economic values and effects, so they are constantly counterfeited, altered, and illegally used. In particular, it has facilitated the forgery of various media that are markedly improved by color copying machines.
  • Transfer foil with relief especially holograms and diffraction gratings
  • Transfer foil with relief has a design that can express unique decorative images and three-dimensional images, and these holograms and diffraction gratings require advanced manufacturing technology and are easily manufactured. Since it cannot be used, it is used to improve security to prevent forgery.
  • the transfer foil having a relief forming layer of the two layers are known to one side (e.g., see Patent Document 3.) While 0 tooth force, the two-layer relief-forming layer is transparent holo metal Two hologram reconstructed images are observed from one side for the combination of horo.
  • the present applicant also discloses an exposed portion and a covered portion that intermittently expose the glittering thread from the base paper.
  • the transfer foil having a relief forming layer of the two layers on one side is known (e.g., see Patent Document 3.) 0 with teeth force, the transfer foil embossing twice with different patterns on the same surface It is a patent relating to a manufacturing method, and there is no description regarding the double-sided glitter.
  • the present applicant has also disclosed a forgery prevention paper provided with an exposed portion and a covering portion that intermittently expose the glittering thread from the base paper (see, for example, Patent Document 4).
  • a forgery prevention paper provided with an exposed portion and a covering portion that intermittently expose the glittering thread from the base paper (see, for example, Patent Document 4).
  • Na husk even without looking at the end surface of the paper can determine whether the counterfeit is for hard to peel off simultaneously glitter Suretsu de groups paper strength.
  • embossing may be a double-sided embossing that is sufficient with single-sided embossing (see, for example, Patent Document 5).
  • double-sided embossing there is no further explanation about double-sided embossing, and there is no suggestion about the embossed pattern.
  • the clear meaning of double-sided embossing is not described, and it is not clear whether a relief pattern is formed on both sides. None of the prior art describes or suggests that the front and back surfaces have different brilliant designs. In addition, the total thickness was too thick to lack a sense of unity as anti-counterfeit paper.
  • Patent Document 1 JP 2001-172897
  • Patent Document 2 Japanese Patent Laid-Open No. 06-257028
  • Patent Document 3 Japanese Patent Application Laid-Open No. 07-199781
  • Patent Document 4 Japanese Patent Laid-Open No. 10-71759
  • Patent Document 5 JP 2001-31729 A
  • the present invention has been made to solve the above-described problems of the prior art.
  • the first aspect of the present invention provides a unique glitter design such as a hologram and a diffraction grating and an optical effect by providing two different glitter patterns and / or patterns, and is easy to manufacture.
  • the present invention is directed to providing a multi-design glitter film having low cost and a multi-design glitter composition using the same.
  • the second aspect of the present invention provides a unique glitter design such as a hologram or a diffraction grating, an optical effect, and Z or security by providing two different glitter patterns and Z or patterns.
  • the present invention is directed to providing a multi-pattern glitter thread that is excellent in unity with paper, easy to manufacture, and low in cost.
  • all of the plurality of patterns are peeled off of the grease, so-called “plate removal”.
  • the present invention is directed to providing a brilliant film excellent in bodily sensation, and a brilliant pattern formation using the same.
  • the multi-design glitter film according to the present invention has at least the first design of glitter and the second design of glitter, and the first design and the second design of the second design. The design is different.
  • the multi-design glitter film according to the present invention is such that the design of the first design and the second design is a hairline design, a line design, a mat design, a hologram and Z or a diffraction grating. It is.
  • the multi-pattern glitter film according to the present invention includes a first glitter film having at least a first relief formation layer and a first reflection layer, at least a second relief formation layer, and a first relief film.
  • a second glittering film having two reflective layers is formed by laminating the first reflective layer surface and the second reflective layer surface via an adhesive layer, and the first relief forming layer and the second relief forming layer. The relief shape is different so that it is formed.
  • the multi-pattern glitter film according to the present invention includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate. And a second glittering film having a second relief forming layer and a second reflecting layer, the first reflecting layer surface and the second reflecting layer surface being laminated via an adhesive layer, and the first relief forming layer. And the relief shapes formed in the second relief forming layer are different from each other.
  • the multi-pattern glitter film according to the present invention according to still another aspect includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate. A second glittering film having a second relief forming layer and a second reflective layer, the first substrate surface and the second substrate surface being bonded via an adhesive layer, the first The relief forming layer and the second relief forming layer are formed in different relief shapes.
  • the multi-pattern glitter film according to the present invention includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate.
  • a second glittering film having a second relief forming layer and a second reflective layer, the first reflective surface and the second substrate surface being bonded via an adhesive layer, and the first relief Formed on the forming layer and the second relief forming layer, the relief shapes are different from each other.
  • the multi-pattern glittering film according to the present invention has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. And the other surface has at least a second relief forming layer and a second reflective layer, and is formed in the first relief forming layer and the second relief forming layer! It is like that.
  • the multi-pattern glittering film according to the present invention according to still another aspect has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. Further, at least the second relief forming layer and the second reflecting layer are provided on the first reflecting layer surface, and the relief shapes formed in the first relief forming layer and the second relief forming layer are different. As you can see.
  • the relief shape in which the first relief forming layer and the second relief forming layer are formed has a hairline pattern, a line pattern, a mat pattern, A micro-order relief shape such as a hologram and a Z or diffraction grating.
  • a multi-pattern glittering film according to the present invention according to yet another aspect is such that the first reflective layer and Z or the second reflective layer are a metal layer and Z or a transparent reflective layer.
  • the multi-pattern glitter film according to the present invention according to yet another aspect is the multi-pattern glitter film according to any one of the above, wherein at least the interlayer and the Z or the surface have a substrate
  • the glitter multi-pattern formed product according to the present invention according to another embodiment is provided with a plurality of glitter multi-patterns in at least one part using any one of the above-described multi-design glitter films. That's what it did.
  • the multi-design glittering thread according to the second aspect of the present invention is formed by cutting a multi-design glitter film having at least the first design of glitter and the second design of glitter having a design different from the first design into a narrow width. It is characterized by having become.
  • a multi-design glitter thread includes a first glitter film having at least a first base material, a first relief forming layer, and a first reflective layer, and at least a second base material.
  • a second glittering film having a second relief forming layer and a second reflecting layer, the first reflecting layer surface and the second reflecting layer surface being laminated via an adhesive layer, and the first relief forming layer and A plurality of design glitter films having different relief shapes formed on the second relief forming layer are cut into narrow widths.
  • the multi-pattern glitter thread according to the present invention includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate.
  • a second glittering film having a second relief forming layer and a second reflective layer, the first substrate surface and the second substrate surface being laminated via an adhesive layer, and the first relief forming layer.
  • a plurality of design glitter films having different relief shapes formed in the second relief forming layer are cut into narrow widths.
  • the multi-pattern glitter thread according to the present invention includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate. And a second glittering film having a second relief forming layer and a second reflecting layer, the first reflecting layer surface and the second base material surface being laminated via an adhesive layer, and the first relief forming layer. It is formed on the second relief forming layer !, and the relief shape is different. It is characterized in that the film is cut into narrow widths.
  • a multi-pattern glittering thread according to the present invention has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. And the other surface has at least a second relief forming layer and a second reflective layer, and the plurality of designs having different relief shapes formed on the first relief forming layer and the second relief forming layer. This is characterized in that the glittering film is cut into a narrow width.
  • the multi-pattern glittering thread according to the present invention according to still another aspect has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. Further, at least a second relief forming layer and a second reflecting layer are provided on the first reflecting layer surface, and the relief shapes formed in the first relief forming layer and the second relief forming layer are different.
  • the multi-pattern glittering film is cut into narrow widths.
  • the design of the first design and the second design is a hairline design, a line design, a mat design, a hologram and Z or a diffraction grating. It is what you did.
  • the multi-design glittering thread according to the present invention according to yet another aspect is such that the overall thickness is 4 to 40 ⁇ m.
  • a glittering multi-pattern formed product according to the present invention uses the multi-design glittering thread according to any one of the above, and the multi-design glittering thread is used at least on the base paper. It is made to be formed on the surface of one side.
  • the glitter film according to the third invention has a relief forming layer and a metal thin film layer as one set of glitter pattern layers, and has two or more groups of glitter pattern layers via an interlayer primer layer. As described above, this is a feature.
  • the glitter film of the present invention has at least two kinds of glitter patterns.
  • the glitter film of the present invention is such that the glitter pattern is a hairline pattern, a line pattern, a hologram, Z, or a diffraction grating.
  • the glitter film of the present invention according to still another embodiment has at least a first metal thin film layer, a first relief forming layer having a first glitter pattern, an interlayer primer layer, and a second glitter pattern. The relief forming layer and the second metal thin film layer force are formed.
  • the glitter film of the present invention according to another embodiment is such that at least two glitter patterns can be visually recognized from the front side and the back side, respectively.
  • the glittering film of the present invention is such that the glass transition temperature of the interlayer primer layer is 130 ° C or lower.
  • the glitter film of the present invention according to another embodiment has an overall thickness of 5 to 20 ⁇ m.
  • the glitter film of the present invention is one in which a glitter pattern is provided on at least a part using any one of the glitter films described above.
  • a multi-design glittering film having a unique design and high security, and a multi-splitter design having the same can be observed. Things are provided.
  • a multi-design glittering thread having a plurality of glitter designs, and a glitter multi-pattern formation provided with the same.
  • each of the plurality of patterns has a plurality of glittering patterns without causing detachment of the grease, so-called "printing (pattern removal)".
  • a glittering film that is excellent in unity with the transfer material and the paper to be transferred, which has a single material and is resource-saving and has a very thin total thickness, and a glittering multiple-patterned product provided with this Is provided.
  • FIG. 1 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 2 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 3 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 4 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 5 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 6 is a cross-sectional view of a glitter film showing one example of the present invention.
  • [7] A cross-sectional view of a glitter film showing one embodiment of the present invention.
  • FIG. 10 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 13 A cross-sectional view of a glittering film showing one embodiment of the present invention.
  • FIG. 14 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 15 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 16 is a cross-sectional view of a glitter film showing an example of the present invention.
  • ⁇ 17 A cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 19 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 20 is a cross-sectional view of a glitter film showing an example of the present invention.
  • FIG. 24 is an explanatory view showing a visual recognition state of the design of the glitter film showing one embodiment of the present invention.
  • ⁇ 25] An explanatory view showing the visual recognition state of the design of the glitter film showing one embodiment of the present invention.
  • ⁇ 26] A plan view and a cross-sectional view of a glitter pattern formation showing one embodiment of the present invention.
  • Multi-pattern glitter film double-side glitter film
  • 317A, 317B, 317C, 317D l to n reflective layers (metal thin film layers)
  • 321B, 321D Interlayer primer layer
  • Figs. 1 to 8 are cross-sectional views of a multi-pattern glitter film showing one embodiment of the present invention.
  • the basic structure of the multi-pattern glitter film 10 of the present invention includes at least the first relief forming layer 15A (having the first relief shape 16A), the Z first reflection layer 17A, and the second reflection layer 17BZ It is sufficient that the two relief forming layers 15B (having the second relief shape 16B) are provided and the first relief shape 16A and the second relief shape 16B are different.
  • the 1st relief shape 16A shows the 1st design
  • the 2nd relief shape 16B shows the 2nd design
  • the glitter design of the 1st design and Z or the 2nd design is not particularly limited as long as it is a glitter, 1 part, The entire surface or a combination of multiple symbols may be used.
  • the relief shape 16 is provided on the surface of the reflective layer 17.
  • the configuration of the first and Z or second glitter patterns is not particularly limited.
  • the first relief forming layer 15A (having the first relief shape 16A) Z the first reflecting layer 1 7AZ adhesive layer 19Z second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B).
  • the first glittering film 10A (first substrate 11AZ first primer layer 13A (if necessary) Z first relief forming layer 15A (first relief shape 16A Z) first reflective layer 17A) and second glittering film 10B (second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B) Z second primer layer 13B (if necessary) )
  • a layer structure in which the first reflective layer 17A surface and the second reflective layer 17B surface are laminated with an adhesive layer 19 with the Z second base material 11B) may be used.
  • the first glittering film 10A and the second glittering film 10B may have a layer structure in which the first substrate 11A surface and the second substrate 11B surface are laminated with an adhesive layer 19. ,.
  • the first glittering film 10A (first base material 11AZ first relief forming layer 15A (having the first relief shape 16A) Z first reflecting layer 17A), the second First reflection with glitter film 1 OB (second base material 11BZ second relief forming layer 15B (having second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary))
  • first base material 11AZ first relief forming layer 15A having the first relief shape 16A
  • second First reflection with glitter film 1 OB second base material 11BZ second relief forming layer 15B (having second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary)
  • a layer structure in which the layer 17A surface and the second base material 11B surface are laminated with an adhesive layer 19 may be used.
  • the first relief forming layer 15A (having the first relief shape 16A) on one side of the first base material 11A Z the first reflective layer 17AZ the first protective layer 25A (if necessary) )
  • the second relief forming layer 15B (having the second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary) may be provided on the other surface!
  • FIG. 3 shows printing 27, first protective layer 25A and second protective layer 25B, FIG. 4 shows second protective layer 25B, and FIG. 5 shows first protective layer 25A and second protective layer 25B.
  • the position where the layer on which the printing, protective layer, other substrate, and Z or other layer may be provided may be one or more of the interlayer and Z or the surface. .
  • a first relief forming layer 15A (having a first relief shape 16A) Z first reflective layer 17A is provided on the first base material 11A, and a second second layer is further formed on the surface of the first reflective layer 17A.
  • Relief formation A layer 15B (having the second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary) may be provided.
  • an adhesive label or transfer foil that may be provided with a second adhesive layer 21B and a second support substrate 30B can do.
  • the first base material 11A and the second base material 11B base material 11 together
  • the first relief forming layer 15A and the second relief forming layer 15B (together relief forming layer 15)
  • first reflective layer 17A and second reflective layer 17B (together reflective layer 17)
  • first protective layer 25A and second protective layer 25B (together protective layer 25), adhesive layer 19, 21 B and 23
  • adhesive layer 19, 21 B and 23 may be the same material, forming method and different thickness.
  • the description is omitted, but the same applies to the third relief forming layer 15C, the fourth relief forming layer 15D, the third reflecting layer 17C, and the fourth reflecting layer 17D.
  • polyester resin such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene terephthalate-isophthalate copolymer, or terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer, nylon (product Name) 6, Nylon (trade name) 66, Nylon (trade name) 610, Nylon (trade name) 12, etc.
  • Polyamide resin Polyolefin, Polypropylene, Polybutene or Polymethyl pentene, etc.
  • (Meth) acrylic resins such as cyclic polyolefins such as polynorbornene, burs such as polysalts and burs, poly acrylate, polymeta acrylate, or polymethyl meta acrylate, polyimide, polyamide imide Or Polyer Imido resins such as imide, polyarylate, polysulfone, polyethersulfone, polyphenylene ether, polyphenylene sulfide (PPS), polyaramid, polyetherketone, polyether nitrile, polyetheretherketone, or polyethersulfur Engineered resin such as Fight, polystyrene, high impact polystyrene, AS resin, or styrene-based resin such as ABS resin, polybulu alcohol resin, or ethylene butyl alcohol copolymer Polybula alcohol-based resin such as ethylene tetrafluoroethylene, tetrafluoroethylene, tetrafluoroethylene perfluoroalkyl butyl ether
  • the substrate 11 may be a copolymerized resin mainly composed of these resins, a mixture (including alloy), or a laminate composed of a plurality of layers.
  • the substrate 11 may be a stretched film or an unstretched film, but a film stretched in a uniaxial direction or a biaxial direction is preferable for the purpose of improving the strength.
  • the substrate 11 is used as a film, sheet, or board formed of at least one layer of these resins.
  • the thickness of the substrate 11 is not particularly limited, and may be appropriately selected according to the usage.
  • polyethylene terephthalate and polyethylene naphthalate having good heat resistance and mechanical strength are suitable.
  • a material such as polypropylene or polyvinyl chloride is preferable.
  • a paper base material can also be used.
  • the base material 11 has a primer layer 13 or a corona discharge treatment, a plasma treatment, an ozone gas treatment, a flame treatment, a pre-treatment, if necessary, in order to improve the adhesion between the layers on the surface on which the layer is formed. Easy adhesion treatment such as heat treatment, dust removal treatment or alkali treatment may be performed.
  • the primer layer 13 includes, for example, a polyurethane-based resin, a polyester-based resin, a polyamide-based resin, an epoxy-based resin, a phenol-based resin, a polysalt-bulb-based resin, and a poly-acetic acid-based resin.
  • One or more of the above-mentioned rosins or monomers, oligomers, or prepolymers thereof are the main components. If necessary, for example, various stabilizers, fillers, reaction initiators, curing agents, One or a plurality of additives such as a cross-linking agent can be optionally added, or a main component and a curing agent can be combined to use either a one-component curable type or a two-component curable type. These waxes are appropriately dissolved or dispersed in a solvent, and sufficiently kneaded as necessary to prepare a coating agent composition (ink, coating solution), which is applied to the substrate 11 by a known coating method.
  • a coating agent composition ink, coating solution
  • the primer layer 13 is made to react by the drying force or the aging treatment after drying or drying.
  • the primer layer 13 has a thickness of about 0.05 to 10 m, preferably 0.1 to 5 ⁇ m, and more preferably 0.2 to 1 ⁇ m.
  • the coating method include coating methods such as a roll coating method, a gravure coating method, a spray coating method, an air knife coating method, a kiss coating method, and others.
  • the primer layer 13A and the primer layer 13B may be the same material and thickness, or may be different.
  • the relief shape 16 is shaped (also referred to as replication) on the relief forming layer 15 surface.
  • shaping method “hot pressing method” and “EC method” called by those skilled in the art can be applied.
  • the materials used depend on the shaping method, and will be described separately.
  • a stamper metal plate or resin plate
  • thermocompression-bonded on the surface of the relief forming layer 15 thermocompression-bonded on the surface of the relief forming layer 15 (so-called “so-called”).
  • This is a method in which the stamper is peeled after embossing) and shaping the relief to the relief forming layer 15 and replicating.
  • the heating temperature and pressure are adjusted as appropriate.
  • the material of the relief forming layer 15 used for the hot pressing method is thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Polyester (meth) acrylate, urea Cures thermosetting resins such as tan (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate, melamine (meth) acrylate, triazine acrylate
  • thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Polyester (meth) acrylate, urea Cures thermosetting resins such as tan (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate,
  • thermosetting resins excellent in durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams.
  • Sarakuko is preferably a material having excellent heat resistance and pressure resistance. That is, in the inventions of claims 3 to 6, a relief forming material that can withstand heat and pressure when the first glittering film and the second glittering film are bonded together is preferable.
  • the second relief forming layer is formed on the opposite surface of 11A of the first base material or on the same surface.
  • the material of the relief forming layer is preferably a material that can withstand the heat and pressure when the relief is formed on the second relief forming layer.
  • ionizing radiation curable resins having such characteristics include those obtained by curing ionizing radiation curable resins such as epoxy-modified acrylate resins, urethane-modified acrylate resins, and acrylic-modified polyesters. Preferably, it is urethane-modified attalylate resin.
  • a preferable one of the relief forming layer 15 is a cured product of an uncured ionizing radiation curable resin composition mainly composed of a urethane-modified talyl resin represented by the general formula (a).
  • an uncured ionizing radiation curable resin composition mainly composed of a urethane-modified talyl resin represented by the general formula (a).
  • the photocurable resin composition disclosed by the present applicant in Japanese Patent Application Laid-Open No. 2000-273129 can be applied, and the photocurable resin composition A described in the above specification can be applied to the present specification. It is also used in the examples in the manual and is described as “ionizing radiation curable resin composition A”.
  • 1 2 represents a hydrocarbon group having 1 to 20 carbon atoms.
  • X and Y represent a linear or branched alkylene group
  • Z represents a group for modifying a urethane-modified acryl resin, and preferably represents a group having a bulky cyclic structure.
  • Another preferred relief forming layer 15 is a reaction product of an isocyanate compound having a melting point of 40 ° C. or higher and a (meth) acrylic compound capable of reacting with an isocyanate group, and has a soft point. This is a resin containing 40 ° C or higher.
  • the isocyanate compound has an isocyanate group bonded to a non-aromatic hydrocarbon ring, a trimer of isophorone diisocyanate, or an isophorone diisocyanate and an active hydrogen-containing compound. It is a reaction product. Furthermore, (meth) acrylic compound strength (meth) acrylic acid, (meth) acrylate having a hydroxyl group Preferably there is.
  • the photocurable resin disclosed in Japanese Patent Application Laid-Open No. 2001-329031 can be applied, and in the examples of this specification, it is expressed as “ionizing radiation curable resin composition B”.
  • an ionizing radiation curable resin of urethane-modified acrylic resin for example, an ionizing radiation curable resin of urethane-modified acrylic resin, a photopolymerization initiator, a photosensitizer, a photosensitizer can be used.
  • the solvent is not used, but the non-solvent relief forming layer 15 composition (ink) is used.
  • the relief forming layer 15 composition (ink) may be applied by, for example, a mouth coat method, a gravure coat method, other known coating methods or printing methods, and dried if necessary.
  • the thickness of the relief forming layer 15 is usually about 0.1 to about LO / zm, preferably 0.2 to 5 / ⁇ ⁇ , and more preferably 0.5 to 2 / ⁇ ⁇ . If it is less than 0.5 m, the brightness (brightness) is remarkably reduced, and if it exceeds 2 m, the brightness is sufficient. This is disadvantageous in terms of cost.
  • the relief shape 16 is a concavo-convex shape and is not particularly limited, but preferably has a fine concavo-convex shape and expresses functions such as light diffusion, light scattering, light reflection, and light diffraction, such as Fourier transform and A lenticular lens, a light diffraction pattern, and a moth eye are formed. Further, although it does not have a light diffraction function, it may be a hairline pattern, a mat pattern, a line pattern, an interference pattern or the like that expresses a unique glitter.
  • a hologram or diffraction grating in which interference fringes due to the interference of light between the object light and the reference light are recorded as a concavo-convex pattern can be applied.
  • Holograms include laser reproduction holograms such as Fresnel holograms, white light reproduction holograms such as rainbow holograms, color holograms utilizing these principles, computer-generated holograms (CGH), holographic diffraction gratings, etc. There is.
  • the design described in this specification refers to a design formed by combining one or more of these various concavo-convex patterns, for example, text patterns such as "abc" and "Security".
  • the above-mentioned holograms and diffraction gratings are created by combining patterns such as geometric patterns called screens, snakes and polka dots, and painting patterns created by simulating flowers and birds. This is a picture visualized by a combination of powerful diffraction patterns.
  • “multiple symbols” refers to symbols that cannot be formed by using these symbols once and once, and usually refers to symbols that are created using two or more symbols multiple times.
  • Examples of the diffraction grating include a holographic diffraction grating using a hologram recording means.
  • a diffraction grating is mechanically created using an electron beam drawing apparatus or the like, so that any diffraction can be performed based on calculation.
  • a diffraction grating from which light can be obtained can also be mentioned.
  • a mechanical cutting method may be used.
  • These holograms and Z or diffraction gratings may be recorded in a single or multiple manner, or in combination.
  • These masters can be prepared by known materials and methods. Usually, a laser beam interference method using a glass plate coated with a photosensitive material, an electron beam drawing method on a glass plate coated with an electron beam resist material, Machine cutting method can be applied.
  • the relief shape 16 is shaped (also referred to as replication) on the surface of the relief forming layer 15.
  • a stamper metal plate or resin plate
  • emboss pressure-bonded
  • the stamper is peeled off.
  • the relief is duplicated by irradiating ionizing radiation during embossing and then removing the stamper.
  • Commercial duplication can be carried out in a long form, allowing continuous duplication work.
  • the relief can be replicated more commercially by using a cylindrical stamper that is manufactured by attaching a stamper to the cylinder or by cutting a relief directly into the cylinder.
  • the ionizing radiation curable resin When ionizing radiation curable resin is used as the relief forming layer 15, the ionizing radiation curable resin is hardened by irradiating ionizing radiation during embossing or after embossing with a stamper. Make it. When the ionizing radiation curable resin is cured (reacted) by irradiation with ionizing radiation after the relief is formed, the ionizing radiation curable resin (relief forming layer 15) is formed. Ionizing radiation may be classified according to the quantum energy of electromagnetic waves, but in this specification, all ultraviolet rays (UV—A, UV—B, UV—C), visible light, gamma rays, X-rays, It is defined as including an electron beam.
  • UV—A, UV—B, UV—C ultraviolet rays
  • visible light gamma rays
  • X-rays X-rays
  • UV ultraviolet rays
  • visible rays visible rays
  • gamma rays X-rays
  • electron rays having a wavelength of 300 to 400 nm are most suitable.
  • An ionizing radiation curable resin that is cured by ionizing radiation adds a photopolymerization initiator and Z or a photopolymerization accelerator in the case of ultraviolet curing, and does not add it in the case of high energy electron beam curing. It can also be cured with thermal energy if an appropriate catalyst is present.
  • a thermosetting resin is used as the relief forming layer 15, it may be cured by aging in a temperature and humidity environment according to the curing conditions of the thermosetting resin to be used.
  • the EC method is a so-called method called “etrusion coating (EC)” by those skilled in the art.
  • EC etrusion coating
  • the extruded resin is heated and melted, expanded and stretched in the required width direction with a T-die, and extruded into a curtain shape.
  • the molten resin layer is allowed to flow down onto the base material 11 and is sandwiched between a rubber roll and a cooled metal roll, whereby the formation of the extruded resin layer, the attachment to the base material 11 and the lamination are performed simultaneously.
  • the relief shape 16 is transferred to the surface of the molten resin layer by sticking a stamper (metal plate or resin plate) having a relief formed on the surface of the metal roll.
  • the extruded resin layer is cooled and the relief shape 16 is fixed, and a relief can be formed on the surface.
  • the extruded resin layer at this time becomes the relief forming layer 15.
  • the relief shape and stamper are the same as in the hot press method.
  • Examples of the relief forming layer 15 (extruded resin layer) of the EC method include low density polyethylene (LDPE), medium density polyethylene (MDPE), high density polyethylene (HDPE), and linear (linear) low density polyethylene.
  • LLDPE low density polyethylene
  • MDPE medium density polyethylene
  • HDPE high density polyethylene
  • LLDPE linear low density polyethylene
  • PP polypropylene
  • EVA ethylene acetate copolymer
  • EAA ethylene acrylic acid copolymer
  • EAA ethylene acrylate copolymer
  • EAA ethylene-methacrylic acid copolymer Coalescence
  • EMMA Ethylene-methyl methacrylate copolymer
  • EP ethylene-propylene copolymer
  • cyclic polyolefins such as polymethylpentene, polybutene, and polynorbornene
  • polyolefin resins such as polyethylene or polypropylene are treated with acrylic acid, methacrylic acid.
  • Acid-modified polyolefin resins modified with unsaturated carboxylic acids such as acid, maleic acid, maleic anhydride, fumaric acid, and itaconic acid, and polyvinyl acetate-based resins can be used. These resins can be used singly or in combination, and if necessary, additives may be added appropriately.
  • the thickness of the relief forming layer 15 (extruded resin layer) of the EC method is usually about 5 to 300 / ⁇ ⁇ , preferably 10 to L00m. When the thickness is less than 10 m, the formability is reduced, and when the thickness is more than 100 m, the material is wasted.
  • a paper base material can be used in addition to the synthetic resin film.
  • a paper substrate for example, a paper substrate such as a strong sized bleached or unbleached paper, a pure white roll paper, kraft paper, paperboard, processed paper, or the like can be used. . Also, it is possible to use a paper substrate in which various resin films or sheets are bonded.
  • Reflective layer 17A and reflective layer 17B enhance the reflection and Z or diffraction effect of the relief by providing reflective layer 17 on the relief surface of relief forming layer 15 with a predetermined relief structure. Therefore, it is not particularly limited as long as it is higher than the reflectance of the relief forming layer 15, and for example, a metal or a transparent metal compound having a difference in refractive index can be applied.
  • the reflective layer 17 can be formed on the relief forming layer 15 before providing the relief structure. That is, a relief can be formed after forming the reflective layer 17 by appropriately selecting the material and stamper of each layer.
  • the metal used for the reflective layer 17 is a metal element thin film that has a metallic luster and reflects light, such as Cr, Ni, Ag, Au, Al, and its oxides and sulfides.
  • a thin film of nitride or the like may be used alone or in combination.
  • the above light-reflective metal thin films are all formed to a thickness of about 10 to 2000 nm, preferably 20 to: a vacuum such as a vacuum deposition method, a sputtering method, or an ion plating method so as to have a thickness of LOOOnm.
  • the power obtained by the thin film method It can also be formed by a key. If the thickness of the reflective layer 17 is less than this range, the light is transmitted to some extent and the effect is reduced, and if it is more than that, the reflective effect is not changed, so that the cost is useless.
  • the reflective layer 17 a metal compound having an almost colorless and transparent hue and an optical refractive index different from that of the relief forming layer is used, so that a hologram such as a hologram can be used even though there is no metallic luster. Since the glitter is visible, a glitter film such as a transparent hologram can be produced.
  • Examples of the transparent metal or metal compound include a thin film having a higher refractive index than that of the relief forming layer 15 and a thin film having a lower refractive index.
  • Examples of the former include ZnS, TiO, Al
  • examples of the latter include LiF, MgF, A1F.
  • 2 3 2 3 2 3 2 2 3 Preferably, it is a metal oxide or nitride, specifically, Be, Mg, Ca, Cr, Mn, Cu, Ag, Al, Sn, In, Te, Fe, Co, Zn, Ge, Pb, Cd Bi, Se, Ga, Rb, Sb, Pb, Ni, Sr, Ba, La, Ce, Au, etc. .
  • general light-reflective metal thin films such as aluminum can be used with transparency when the thickness force is S200A or less.
  • the transparent metal compound is formed on the relief surface of the relief forming layer 15 in the same manner as the metal thin film by vapor deposition, sputtering, ion plating, CVD so as to have a thickness of about 10 to 2000 nm, preferably 20 to LOOOnm.
  • a vacuum thin film method may be used.
  • the refractive index of the adhesive layer 19, 21B or the protective layer 25 material and the relief forming layer 15 material may be sufficiently different from the relief forming layer 15 which may use a transparent synthetic resin having a different light refractive index.
  • the adhesive layers 19 and 21B and the protective layer 25 can also serve as the reflective layer 17.
  • the glitter films 10A and 10B are obtained.
  • the multi-pattern glittering film 10 of the present invention having a plurality of designs is obtained by repeating the steps of producing the relief forming layer 15, the relief shape 16 and the reflective layer 17 according to the layer configuration.
  • a multi-design glitter film having a plurality of designs is produced by repeating the process of producing the relief forming layer 15, the relief shape 16 and the reflective layer 17 on one base material. In this case, it is necessary not to destroy the relief shape 16 produced earlier in the step of producing the relief shape 16 in the relief forming layer later.
  • the glass transition temperature of the first relief forming material formed earlier is Tgl (u)
  • the glass transition temperature after hardening of this material is Tgl (h)
  • the second relief formed later is formed.
  • the glass transition temperature of the material from which the layer is made is Tg2 (u)
  • the glass transition temperature of this material after curing is Tg2 (h)
  • the relief of the second relief forming layer is added to the first relief forming layer. It is preferable that the resin is cured before being molded and has a relationship of Tgl (h)> Tg2 (u).
  • Tg4 (u) Tg4
  • the temperature at which the relief is formed in the second relief forming layer is sufficiently lowered, and the resin is converted to Tg2 ( Curing up to h) is preferable because the durability of the product can be sufficiently increased.
  • a relief can be produced.
  • ionizing radiation curable resin is particularly preferable as the relief forming material. The same applies when having multiple designs of three or more layers.
  • the glass transition temperature described above is the temperature at which the loss tangent (tan ⁇ ) in the dynamic viscoelasticity measurement has the maximum value, as the glass transition temperature of the resin.
  • the measurement method of viscoelasticity is ARES manufactured by Rheometrics as a measuring instrument. The measurement conditions are parallel plate 10 ⁇ ⁇ , strain 1%, amplitude 1 ⁇ , heating rate 2 ° CZmin. The temperature is raised from 30 ° C to 200 ° C.
  • the storage elastic modulus G ′ is an elastic component, which is generated by the generation of a structure such as a coil vibration or an aggregate structure in a high molecule
  • the loss elastic modulus G g is a viscous component, which is a static component. It is equivalent to shear stress.
  • tan ⁇ is determined by G "/ G 'and is an index of how much energy is absorbed when the material is deformed.
  • the two glitter films 1OA and 10B, the reflective layer 17A and the reflective layer 17B surface, the base material 11A and the base material 11B surface, or the reflective layer 17A And the substrate 11B surface may be laminated.
  • the laminating method is not particularly limited as long as it can be bonded.
  • a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method can be applied.
  • the 19 materials may be appropriately selected according to the bonding method.
  • the hot pressing molding method and the EC molding method may be combined, for example, first, on the first base material 11A
  • the first relief forming layer 15A is molded by the thermo-pressure molding method, and the first reflective layer 17A is not formed or formed, and the first substrate 11A surface or the first reflective layer 17A surface is EC molded. Then mold the second relief forming layer 15B.
  • the first glitter film and the second glitter film are bonded together, and then the substrate 11A and the substrate 1 IB are peeled off, respectively. It is possible to make it.
  • a film having the layer structure shown in FIG. 1 can be produced. If the adhesive strength between the substrate and the relief forming layer is too strong, By using a primer layer material that lowers the adhesive strength instead of the primer layer used to increase the adhesive strength, after bonding the first and second glitter films, By peeling, a film having the layer structure shown in FIG. 1 can be produced.
  • a protective layer, a colored layer, and a layer may be provided between the layers and Z or the surface of the layer structure, as long as the glitter pattern can be observed by some means.
  • Magnetic printing layers and other layers such as Z or resin layers, and Z or printing, primer layers, etc. may be provided.
  • thermoplastic resin such as acryl resin, unsaturated polyester, melamine, epoxy urethane (meth) atari Curing ultraviolet curable resin such as a composition obtained by curing a thermosetting resin such as a rate, a composition in which an unsaturated ethylene monomer and an unsaturated ethylene oligomer are appropriately mixed, and a sensitizer added.
  • a mixture of the thermoplastic resin and the thermosetting resin, or a thermoformable substance having a radically polymerizable unsaturated group can be used.
  • thermosetting resins with excellent durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams are preferred!
  • Another base material layer may be further provided on the multi-pattern glittering film of the present invention obtained as described above.
  • the metal surface can be protected by providing a support substrate 30B on the surface of the reflective layer 17B via an adhesive layer 21B.
  • the materials described for the substrate 11 are used.
  • These synthetic resin films and paper base materials may be laminated by a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method. Further, by using a support substrate that has been subjected to a release treatment as the support substrate, it is possible to obtain an adhesive label that is excellent in design and security.
  • the above-described conventionally known laminating method is used.
  • the materials may be selected as appropriate.
  • an adhesive that is cured by ionizing radiation such as heat or ultraviolet rays' electron beam can be applied.
  • Thermosetting adhesives include two- component curable urethane adhesives, polyester urethane adhesives, polyether urethane adhesives, acrylic adhesives, polyester adhesives, polyamide adhesives, and polyvinyl acetate adhesives.
  • Adhesives, epoxy adhesives, rubber adhesives, etc. can be applied. Among these, a two-component curable urethane adhesive is preferable.
  • an adhesive dispersed or dissolved in a solvent When an adhesive dispersed or dissolved in a solvent is applied and dried, two glitter films are stacked and laminated, and then the adhesive is cured by aging at 30 to 120 ° C for several hours to several days. Good.
  • An adhesive that can be cured at the lowest possible temperature so as not to destroy the already formed relief shape preferably an adhesive that can be cured at a temperature lower than the glass transition temperature Tg (h) of the shaped relief forming layer material, More preferably, an adhesive that can be cured at a lower temperature than Tg (u) is particularly preferably used.
  • the thickness of the adhesive layer is about 0.1 to 20; about ⁇ ⁇ (dry state), preferably 1.0 to 5. O / zm.
  • the glitter multi-pattern formed article 100 of the present invention is obtained by applying the multi-pattern glitter film 10 of the present invention to other supporting bases by various sticking methods.
  • the sticking method is not particularly limited.
  • a method using an adhesive or a pressure-sensitive adhesive, a thermocompression bonding method, a paper making method using paper making, a label or a transfer foil may be used.
  • the glitter multi-pattern formation has at least the first and second glitter designs having different designs, and has a unique design and security.
  • FIG. 8 shows an example of the glitter multi-patterned product of the present invention.
  • the first glitter film 10A (first substrate 11AZ first primer layer 13A (if necessary) Z first release Forming layer 15A (having first relief shape 16A) Z first reflecting layer 17A) and second glittering film 10B (second reflecting layer 17BZ second relief forming layer 15B (having second relief shape 16B) Z 2nd primer layer 13B (optional) Z 2nd base material 11B), multi-pattern luminosity consisting of a layer structure in which first reflective layer 17A surface and second reflective layer 17B surface are laminated with adhesive layer 19
  • the adhesive film 10 and the base paper 101 can be attached so that the second base material 11B of the multi-pattern glitter film 10 and the base paper 101 are in contact with each other through the adhesive layer 23.
  • the illustrated one uses a base paper as the supporting substrate, but is not limited to this, and is not limited to a synthetic resin film, card, glass, or the like. You can change it.
  • FIGS. 9 to 15 are cross-sectional views of a multi-design glitter thread showing one embodiment of the second invention
  • FIG. 16 is a diagram of a glitter multi-pattern formation showing one embodiment of the invention. It is a top view and AA sectional drawing.
  • the basic structure of the multi-pattern glittering thread 10 of the present invention includes at least the first relief forming layer 15A (having the first relief shape 16A), the Z first reflecting layer 17A, and the second reflecting layer 17BZ It is sufficient that the two relief forming layers 15B (having the second relief shape 16B) are provided and the first relief shape 16A and the second relief shape 16B are different.
  • the 1st relief shape 16A shows the 1st design
  • the 2nd relief shape 16B shows the 2nd design
  • the glitter design of the 1st design and Z or the 2nd design is not particularly limited as long as it is a glitter, 1 part, The entire surface or a combination of multiple symbols may be used.
  • the relief shape is provided on the surface of the reflective layer 17.
  • the force mainly described for two glitter designs.
  • the two or more patterns include, for example, the third relief forming layer 15CZ third reflecting layer 17CZ first relief forming layer 15 AZ first reflecting layer 17AZ adhesive layer 19Z second reflecting layer 17B Z second relief forming layer 15B, 3rd relief forming layer 15CZ 3rd reflective layer 17CZ 1st relief forming layer 15AZ 1st reflective layer 17AZ adhesive layer 19Z 2nd reflective layer 17BZ 2nd relief forming layer 15BZ 4th reflective layer 17DZ 4th relief forming layer 15D layer
  • the third reflective layer 17C and the fourth reflective layer 17D are transparent reflective layers, it is possible to obtain a glittering thread having a rich design. Also, it should be intentionally made translucent and opaque to improve security.
  • the first and Z or the second layer structure is not particularly limited.
  • the first relief forming layer 15A (having the first relief shape 16A) Z the first reflective layer 17AZ adhesion Layer 19Z is a layer structure of second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B).
  • the first glittering film 10A (first base material 11AZ first primer layer 13A (if necessary) Z first relief forming layer 15A (first relief shape 16A Z) first reflective layer 17A) and second glittering film 10B (second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B) Z second primer layer 13B (if necessary) )
  • first reflective layer 17A surface and the second reflective layer 17B surface are laminated with an adhesive layer 19 with the Z second base material 11B) is preferable.
  • the substrate may be removed, the first substrate 11AZ first relief forming layer 15A (having the first relief shape 16A) Z first reflective layer 17AZ adhesive layer 19Z second
  • the layer structure of the reflective layer 17B Z second relief forming layer 15B (having the second relief shape 16B) may be used.
  • the structure shown in FIG. 1 is obtained.
  • the substrate can be removed by removing one side of the paper, or removing the other after the paper making. Instead of paper making, it may be appropriately bonded by using an adhesive or the like.
  • the first glittering film 10A and the second glittering film 10B may have a layer structure in which the first substrate 11A surface and the second substrate 11B surface are laminated with an adhesive layer 19. ,.
  • the first glittering film 10A (first base material 11AZ first relief forming layer 15A (having the first relief shape 16A) Z first reflecting layer 17A), the second First reflection with glitter film 1 OB (second base material 11BZ second relief forming layer 15B (having second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary))
  • first glittering film 10A first base material 11AZ first relief forming layer 15A (having the first relief shape 16A) Z first reflecting layer 17A
  • the second First reflection with glitter film 1 OB (second base material 11BZ second relief forming layer 15B (having second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary))
  • a layer structure in which the layer 17A surface and the second base material 11B surface are laminated with an adhesive layer 19 may be used.
  • the first relief forming layer 15A (having the first relief shape 16A) on one side of the first base material 11A Z the first reflective layer 17AZ the first protective layer 25A (if necessary) And the second relief forming layer 15B and the second relief shape 16B are provided on the other surface.)
  • a Z second reflective layer 17 BZ second protective layer 25B (if necessary) may be provided.
  • FIG. 3 shows printing 27, first protective layer 25A, second protective layer 25B, and FIG. 4 shows second protective layer 2 5B and FIG. 5 illustrate the first protective layer 25A and the second protective layer 25B, but the printing, protective layer, other base material, and Z or other layers may be provided.
  • the location of the can be one or more of the interlayer and Z or surface.
  • a first relief forming layer 15A (having a first relief shape 16A) Z first reflective layer 17A is provided on the first base material 11A, and the first reflective layer 17A surface is further provided with a first relief layer 17A.
  • a two-relief layer 15B (having a second relief shape 16B) Z a second reflective layer 17BZ a second protective layer 25B (if necessary) may be provided.
  • an adhesive layer 21B can be provided and the second support base material 30B can be laminated.
  • the second support base material acts as a protective layer, and the durability of the reflective layer can be further improved.
  • the first base material 11A and the second base material 11B base material 11 together
  • the first relief forming layer 15A and the second relief forming layer 15B (together relief forming layer 15)
  • first reflective layer 17A and second reflective layer 17B (together reflective layer 17)
  • first protective layer 25A and second protective layer 25B (together protective layer 25), adhesive layer 19, 21 B
  • the same is applied to the third relief forming layer 15C, the fourth relief forming layer 15D, the third reflecting layer 17C, and the fourth reflecting layer 17D that are not described.
  • polyester resin such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene terephthalate-isophthalate copolymer, or terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer, nylon (product Name) 6, Nylon (trade name) 66, Nylon (trade name) 610, Nylon (trade name) 12, etc.
  • Polyamide resin Polyolefin, Polypropylene, Polybutene or Polymethyl pentene, etc.
  • cyclic polyolefin resin such as polynorbornene, poly salt (Meth) acrylic resin such as bulle resin, polyacrylate, polymetaacrylate, or polymethylmetaacrylate, polyimide resin such as polyimide, polyamideimide, or polyetherimide, polyarylate, Engineered ring resins such as polysulfone, polyethersulfone, polyphenylene ether, polyphenylene sulfide (PPS), polyaramid, polyetherketone, polyether nitrile, polyetheretherketone, or polyethersulfite, polystyrene, high Polystyrene alcohol such as impact polystyrene, AS resin, or ABS resin, polybulal alcohol resin, or polybutyl alcohol copolymer such as ethylene polyalcohol copolymer, ethylene tetrafluoroethylene copolymer , Ethylene trifluoride, tetrafluoroethylene Chemical Tylene Perfluoroalkyl buty
  • the substrate 11 may be a copolymerized resin containing these resins as a main component, a mixture (including alloy), or a laminate composed of a plurality of layers.
  • the substrate 11 may be a stretched film or an unstretched film, but a film stretched in a uniaxial direction or a biaxial direction is preferable for the purpose of improving the strength.
  • the substrate 11 is used as a film, sheet, or board formed of at least one layer of these resins.
  • the total thickness of the multi-pattern glittering thread 10 of the present invention is cut into a thin width and further cut into a paper base material. It is necessary to make it thin, and it is about 4 to 40 ⁇ m, preferably 8 to 30 ⁇ m, more preferably 10 to 24 ⁇ m. If it is less than 4 ⁇ m, the mechanical strength is insufficient, threads are cut during cutting and paper making, and the yield and productivity are low. At 40 / zm or more, the papermaking machine has good suitability for paper making.Since paper is uneven, the paper base is easily peeled off, and there is no sense of unity as paper. There is a drawback that it is easy to forge, such as attaching another glittering material to another paper.
  • the thickness of the base material 11 Most of the total thickness of the multi-pattern glitter thread 10 is the thickness of the base material 11, and the thicknesses of the first base material 11A and the second base material 11B may be the same or different. Although the thickness may be sufficient, the same thickness is preferable from the viewpoint of reducing curling when laminated.
  • the thickness of the single base material 11 must be extremely thin.
  • the thickness of the substrate 11 is about 2 to 20 / ⁇ ⁇ , preferably 4 to 15 / ⁇ ⁇ , and more preferably 5 to 12 m.
  • Polyethylene terephthalate and polyethylene naphthalate are suitable because they are thin but have good mechanical strength and heat resistance.
  • the base material 11 has a primer layer 13 or a corona discharge treatment, a plasma treatment, an ozone gas treatment, a flame treatment, a pre-treatment, if necessary, in order to improve the adhesion between the layers on the surface on which the layer is formed. Easy adhesion treatment such as heat treatment, dust removal treatment or alkali treatment may be performed.
  • the primer layer 13 includes, for example, a polyurethane-based resin, a polyester-based resin, a polyamide-based resin, an epoxy-based resin, a phenol-based resin, a polysalt-bulb-based resin, and a poly-acetic acid-based resin.
  • the main component is one or more of the above-mentioned rosins or monomers, oligomers, or prepolymers thereof. If necessary, for example, various stabilizers, fillers, reaction initiators, curing agents, One or a plurality of additives such as a cross-linking agent can be arbitrarily added, or a main component and a curing agent can be combined to use either a one-component curable type or a two-component curable type. These waxes are appropriately dissolved or dispersed in a solvent, and kneaded thoroughly as necessary to prepare a coating agent composition (ink, coating solution), which is applied to the substrate 11 by a known coating method.
  • a coating agent composition (ink, coating solution), which is applied to the substrate 11 by a known coating method.
  • the primer layer 13 is obtained by reacting with a drying force, aging treatment after drying or drying.
  • the primer layer 13 has a thickness of about 0.05 to 10 m, preferably 0.1 to 5 / ⁇ ⁇ , and more preferably 0.2 to m.
  • the coating method include coating methods such as a roll coating method, a gravure coating method, a spray coating method, an air knife coating method, a kiss coating method, and others.
  • Primer layer 13A and primer layer 13 B may be the same material and thickness, or may be different.
  • the relief shape 16 is shaped (also referred to as replication) on the relief forming layer 15 surface.
  • a “hot pressing method” called by those skilled in the art can be applied.
  • a stano metal plate or resin plate
  • embossing the surface of the relief forming layer 15
  • the relief is shaped into the relief forming layer 15 and replicated, and then the stamper is peeled off.
  • the material of the relief forming layer 15 used for the hot pressing method is thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, poly (meth) acrylate, melamine (meth) acrylate, triazine acrylate
  • thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, poly (meth) acrylate, melamine (meth) acrylate, triazine acrylate
  • thermosetting resins excellent in durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams.
  • Sarakuko is preferably a material having excellent heat resistance and pressure resistance. That is, in the inventions of claims 14 to 16, a relief forming material that can withstand heat and pressure when the first glittering film and the second glittering film are bonded together is preferable. In the inventions of claims 17 to 18, after the first relief forming layer is formed, the second relief forming layer is further formed on the opposite surface or the same surface of 11A of the first base material.
  • the material of the layer is preferably a material that can withstand the heat and pressure when the relief is formed on the second relief forming layer.
  • the ionizing radiation curable resin having such characteristics for example, those obtained by curing an ionizing radiation curable resin such as epoxy-modified acrylate resin, urethane-modified acrylate resin, and acrylic-modified polyester can be applied.
  • it is urethane-modified attalylate resin.
  • the relief forming layer 15 is a urethane-modified attali represented by the general formula (a).
  • This is a cured product obtained by curing an uncured ionizing radiation curable resin composition mainly composed of a ruby resin.
  • the photocurable resin composition disclosed by the present applicant in Japanese Patent Application Laid-Open No. 2000-273129 can be applied, and the photocurable resin composition A described in the above specification can be applied to the present specification. Used in the examples in the certificate, and is labeled as “ionizing radiation curable resin composition A”
  • R's each independently represent a hydrogen atom or a methyl group
  • 1 2 represents a hydrocarbon group having 1 to 20 carbon atoms.
  • X and Y represent a linear or branched alkylene group
  • Z represents a group for modifying a urethane-modified acryl resin, and preferably represents a group having a bulky cyclic structure.
  • Another preferred relief forming layer 15 is a reaction product of an isocyanate compound having a melting point of 40 ° C. or higher and a (meth) acrylic compound capable of reacting with an isocyanate group, and has a soft point. This is a resin containing 40 ° C or higher.
  • a reaction between an isocyanate compound having a melting point of 40 ° C. or higher and a (meth) acrylic compound having a (meth) atallyloyl group and capable of reacting with an isocyanate group A product that has a soft melting point of 40 ° C or higher, (2) an isocyanate compound having a melting point of 40 ° C or higher, a (meth) atallyloyl group, and an isocyanate group Can react with (meta)
  • An ionizing radiation curable product containing a reaction product of an acrylic compound and a compound that does not have a (meth) attalyloyl group and can react with an isocyanate group and has a soft spot of 40 ° C or higher.
  • the isocyanate compound has an isocyanate group bonded to a non-aromatic hydrocarbon ring, a trimer of isophorone diisocyanate, or an isophorone diisocyanate and an active hydrogen-containing compound. It is a reaction product, and (meth) acrylic compound strength (meth) acrylic acid and (meth) acrylate having a hydroxyl group are preferred.
  • the photocurable resin disclosed in Japanese Patent Application Laid-Open No. 2001-329031 can be applied, and in the examples of this specification, it is expressed as “ionizing radiation curable resin composition B”.
  • an ionizing radiation curable resin of urethane-modified acrylic resin for example, an ionizing radiation curable resin of urethane-modified acrylic resin, a photopolymerization initiator, a photosensitizer, a photosensitizer can be used.
  • the solvent is not used, but the non-solvent relief forming layer 15 composition (ink) is used.
  • the relief forming layer 15 composition (ink) may be applied by, for example, a roll coating method, a gravure coating method, other known coating methods or printing methods, and dried as necessary.
  • the thickness of the relief forming layer 15 is usually about 0.1 to about LO / zm, preferably 0.2 to 5 / ⁇ ⁇ , and more preferably 0.5 to 2 / ⁇ ⁇ . If it is less than 0.5 m, the brightness (brightness) is remarkably reduced, and if it exceeds 2 m, the brightness is sufficient. This is disadvantageous in terms of cost.
  • the relief shape 16 is a concavo-convex shape and is not particularly limited, but preferably has a fine concavo-convex shape and expresses functions such as light diffusion, light scattering, light reflection, and light diffraction, such as Fourier transform and A lenticular lens, a light diffraction pattern, and a moth eye are formed. Further, although it does not have a light diffraction function, it may be a hairline pattern, a mat pattern, a line pattern, an interference pattern or the like that expresses a unique glitter.
  • Holograms include laser reproduction holograms such as Fresnel holograms and white light reproduction holograms such as rainbow holograms, color holograms utilizing these principles, computer-generated holograms (CGH), holographic diffraction gratings, etc. There is.
  • the pattern described in this specification refers to a pattern formed by combining one or more of these various concavo-convex patterns.
  • text patterns such as "abc” and "Security” Patterns formed from combinations of geometric patterns called patterns, polka dots, and painting patterns created by simulating flowers and birds, etc.
  • patterns polka dots
  • multiple symbols refers to symbols that cannot be formed by using these symbols once and once, and usually refers to symbols that are created using two or more symbols multiple times.
  • the present invention can also be used when both the front and back sides can observe “Securit y ” by bonding the vapor-deposited surfaces of the glitter film with the design of “Security” observed from the substrate surface.
  • This is a multi-designed glitter thread.
  • Examples of the diffraction grating include a holographic diffraction grating using a hologram recording means.
  • a diffraction grating is mechanically created by using an electron beam drawing apparatus or the like, so that arbitrary diffraction can be performed based on calculation.
  • a diffraction grating from which light can be obtained can also be mentioned.
  • a mechanical cutting method may be used.
  • These holograms and Z or diffraction gratings may be recorded in a single or multiple manner, or in combination.
  • These masters can be prepared by known materials and methods. Usually, a laser beam interference method using a glass plate coated with a photosensitive material, an electron beam drawing method on a glass plate coated with an electron beam resist material, Machine cutting method can be applied.
  • the relief shape 16 is shaped (also referred to as replication) on the surface of the relief forming layer 15.
  • a stamper metal plate or resin plate
  • emboss pressure-bonded
  • the stamper is peeled off.
  • a reflective layer 17 on the surface of the relief forming layer 15 and then mold it by pressing a stamper on the surface. is there.
  • the relief is replicated by irradiating ionizing radiation during embossing and then removing the stamper.
  • Commercial duplication can be done in a continuous form, allowing continuous duplication work.
  • the relief can be replicated more commercially by using a cylindrical stamper that is manufactured by attaching a stamper to the cylinder or by directly engraving the relief on the cylinder.
  • ionizing radiation curable resin When ionizing radiation curable resin is used as the relief forming layer 15, ionizing radiation is irradiated during or after embossing with a stamper to harden the ionizing radiation curable resin. When the ionizing radiation curable resin is cured (reacted) by irradiation with ionizing radiation after the relief is formed, the ionizing radiation curable resin (relief forming layer 15) is formed.
  • Ionizing radiation may be classified according to the quantum energy of electromagnetic waves, but in this specification, all ultraviolet rays (UV—A, UV—B, UV—C), visible light, gamma rays, X-rays, It is defined as including an electron beam.
  • UV ultraviolet rays
  • visible rays visible rays
  • gamma rays X-rays
  • electron rays having a wavelength of 300 to 400 nm are most suitable.
  • An ionizing radiation curable resin that is cured by ionizing radiation adds a photopolymerization initiator and Z or a photopolymerization accelerator in the case of ultraviolet curing, and does not add it in the case of high energy electron beam curing. It can also be cured with thermal energy if an appropriate catalyst is present.
  • a thermosetting resin is used as the relief forming layer 15, it may be cured by aging in a temperature and humidity environment according to the curing conditions of the thermosetting resin to be used.
  • Reflective layer 17A and reflective layer 17B enhance the reflection and Z or diffraction effect of the relief by providing reflective layer 17 on the relief surface of relief forming layer 15 with a predetermined relief structure. Therefore, it is not particularly limited as long as it is higher than the reflectance of the relief forming layer 15, and for example, a metal or a transparent metal compound having a difference in refractive index can be applied.
  • the reflective layer 17 can be formed on the relief forming layer 15 before providing the relief structure. That is, a relief can be formed after forming the reflective layer 17 by appropriately selecting the material and stamper of each layer.
  • the metal used for the reflective layer 17 is a metal element thin film that has a metallic luster and reflects light, such as Cr, Ni, Ag, Au, and Al, and its oxides and sulfides.
  • a thin film of nitride or the like may be used alone or in combination.
  • the above light-reflective metal thin films are all formed to a thickness of about 10 to 2000 nm, preferably 20 to: a vacuum such as a vacuum deposition method, a sputtering method, or an ion plating method so as to have a thickness of LOOOnm. It can also be formed by the force obtained by the thin film method and other methods. If the thickness of the reflective layer 17 is less than this range, the light is transmitted to some extent and the effect is reduced, and if it is more than that, the reflective effect is not changed, so that the cost is useless.
  • the reflective layer 17 a metal compound having an almost colorless and transparent hue and an optical refractive index different from that of the relief forming layer is used. Since the glitter is visible, a glitter film such as a transparent hologram can be produced.
  • Examples of the transparent metal or metal compound include a thin film having a higher refractive index than the relief forming layer 15 and a thin film having a lower refractive index.
  • Examples of the former include ZnS, TiO, Al
  • examples of the latter include LiF, MgF, A1F.
  • 2 3 2 3 2 3 2 2 3 Preferably, it is a metal oxide or nitride, specifically, Be, Mg, Ca, Cr, Mn, Cu, Ag, Al, Sn, In, Te, Fe, Co, Zn, Ge, Pb, Cd Bi, Se, Ga, Rb, Sb, Pb, Ni, Sr, Ba, La, Ce, Au, etc. .
  • general light-reflective metal thin films such as aluminum can be used with transparency when the thickness force is S200A or less.
  • the transparent metal compound is formed on the relief surface of the relief forming layer 15 in the same manner as the metal thin film by vapor deposition, sputtering, ion plating, CVD so as to have a thickness of about 10 to 2000 nm, preferably 20 to LOOOnm.
  • a vacuum thin film method may be used.
  • the refractive index of the adhesive layer 19, 21B or the protective layer 25 material and the relief forming layer 15 material may be sufficiently different from the relief forming layer 15 which may use a transparent synthetic resin having a different light refractive index.
  • the adhesive layers 19 and 21B and the protective layer 25 can also serve as the reflective layer 17.
  • the glitter films 10A and 10B are obtained.
  • inventions of claims 5-6 According to the structure of the layer, by repeating the process of producing the relief forming layer 15, the relief shape 16 and the reflective layer 17, a multi-design glitter film having a plurality of designs is produced, and this multi-design glitter film is appropriately used. By slitting, the multi-design glitter thread 10 of the present invention can be obtained.
  • the glass transition temperature of the first relief forming material formed earlier is Tgl (u)
  • the glass transition temperature after curing of this material is Tgl (h)
  • the second relief formed later is formed.
  • the glass transition temperature of the material from which the layer is made is Tg2 (u)
  • the glass transition temperature of this material after curing is Tg2 (h)
  • the relief of the second relief forming layer is added to the first relief forming layer. It is preferable that the resin is cured before being molded and has a relationship of Tgl (h)> Tg2 (u).
  • Tg4 (u) Tg4
  • Tgl> Tg2 it is not particularly preferable that the relationship of (Tgl> Tg2) is satisfied when a curable resin is used. If a curable resin is used as the resin to be relief formed first, even if the Tgl (u) before curing is low, this resin is cured after the relief is formed, so that the relief is later applied to the second relief forming layer. This is preferable because it is easy to make Tgl (h) sufficiently high at the time of molding. On the contrary, if curable resin is used as the resin to be relief formed later, the temperature at which the relief is formed on the second relief forming layer is sufficiently lowered, and the resin is converted to Tg2 after the second relief is formed.
  • Curing to (h) is preferable because the durability of the product can be sufficiently increased.
  • Tgl (h)> Tg2 (u) can be established, and a relief formed later can be produced without destroying the shape of the relief formed earlier.
  • ionizing radiation curable resin is particularly preferable as the relief forming material. The same applies when having multiple designs of 3 layers or more.
  • the glass transition temperature described above is the temperature at which the loss tangent (tan ⁇ ) in the dynamic viscoelasticity measurement has the maximum value, as the glass transition temperature of the resin.
  • the measurement method of viscoelasticity is ARES manufactured by Rheometrics as a measuring instrument. The measurement conditions are parallel plate 10 ⁇ ⁇ , strain 1%, amplitude 1 ⁇ , heating rate 2 ° CZmin. The temperature is raised from 30 ° C to 200 ° C.
  • the storage elastic modulus G ′ is an elastic component, which is generated by the generation of a structure such as a coil vibration or an aggregate structure in a high molecule
  • the loss elastic modulus G g is a viscous component, which is a static component. It is equivalent to shear stress.
  • tan ⁇ is determined by G "/ G 'and is an index of how much energy is absorbed when the material is deformed.
  • two or more glitter films having different designs are prepared, and the reflective layer 17A of the two glitter films 10A and 10B is prepared. And a reflecting layer 17B surface, a base material 11 18 and a base material 11 7 surface, or a reflective layer 17A and a base material 11B surface are laminated, and a plurality of design glitter films are obtained by appropriately slitting.
  • the multi-design glitter thread 10 of the invention can be obtained.
  • the laminating method is not particularly limited as long as it can be bonded. For example, a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method can be applied. The material should be selected appropriately according to the bonding method. The dry lamination method is preferred.
  • the first glitter film and the second glitter film are bonded together, and then the substrate 11A and the substrate 1 IB are peeled off, respectively. It is possible to make it.
  • the layer structure shown in Fig. 9 is achieved by adjusting the adhesion between the base material and the relief forming material. Thread can be made. If the adhesive strength between the substrate and the relief forming layer is too strong, the first glittering film can be obtained by using a primer layer material that reduces the adhesive strength instead of the primer layer that is usually used to increase the adhesive strength. After laminating the second glittering film, the respective base materials are peeled off to produce a thread having a layer structure shown in FIG.
  • a protective layer a colored layer, magnetic printing, and Z are provided on the interlayer and Z or the surface of the layer structure as necessary, as long as the glitter pattern can be observed.
  • other layers such as a resin layer, and Z or printing, a primer layer, etc. may be provided.
  • thermoplastic resin such as acryl resin, unsaturated polyester, melamine, epoxy urethane
  • Ultraviolet curable molds such as those obtained by curing thermosetting resin such as (meth) arylate, compositions obtained by appropriately adding unsaturated ethylene monomers and unsaturated ethylene oligomers, and adding sensitizers
  • a product obtained by curing fat, a mixture of the above-mentioned thermoplastic resin and thermosetting resin, or a thermoformable substance having a radical polymerizable unsaturated group can be used.
  • thermosetting resins with excellent durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams are preferred!
  • Another base material layer may be further provided on the multi-pattern glittering film of the present invention obtained as described above.
  • Another substrate is not particularly limited, and examples thereof include the materials described for the substrate 11.
  • These synthetic resin films may be laminated by a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method.
  • the metal surface can be protected by providing the second supporting substrate 30B on the surface of the reflective layer 17B via the adhesive layer 21B.
  • a material may be appropriately selected in accordance with the above-described conventionally known lamination method.
  • an adhesive that is cured by ionizing radiation such as heat or ultraviolet rays' electron beam can be applied.
  • Thermosetting Adhesive adhesives include two-component curable urethane adhesives, polyester urethane adhesives, polyether urethane adhesives, acrylic adhesives, polyester adhesives, polyamide adhesives, and polyvinyl acetate adhesives. Epoxy adhesives and rubber adhesives can be applied. Among these, a two-component curable urethane adhesive is preferable.
  • the adhesive dispersed or dissolved in a solvent is applied and dried, and two glitter films are stacked and laminated, and then the adhesive is cured by aging at 30 to 120 ° C for several hours to several days. It is good to let them.
  • An adhesive that can be cured at the lowest possible temperature so as not to destroy the already formed relief shape preferably an adhesive that can be cured at a temperature lower than the glass transition temperature Tg (h) of the shaped relief-forming layer material. More preferably, an adhesive that can be cured at a temperature lower than Tg (u) is particularly preferably used.
  • the thickness of the adhesive layer is about 0.1 to 20; about ⁇ ⁇ (dry state), preferably 1.0 to 5.0 m.
  • a surface easy-adhesion layer that improves adhesion to the paper substrate may be provided on at least one surface of the multi-pattern glitter thread 10.
  • polyvinyl alcohol resin, acrylic resin, and cellulose resin are preferable.
  • the total thickness of the whole is about 4 to 40 ⁇ m, preferably 8 to 30 ⁇ m, more preferably 10 to 24 ⁇ m. To do.
  • a surface easy-adhesion layer that improves adhesion to the film substrate may be provided on at least one surface of the multiple-pattern glittering thread 10. Good.
  • the material for the surface easy-adhesion layer the same material as the primer layer can be preferably used.
  • the glitter multi-pattern formed article 100 of the present invention can be produced by a papermaking method by embedding the multi-pattern glitter thread 10 of the present invention, and has at least the first pattern of glitter and the second pattern of glitter having different patterns. It has a unique design and security.
  • FIG. 8 as an example of the glitter multi-pattern formed product 100 of the present invention, a multi-pattern glitter thread 10 formed by slitting the multi-pattern glitter film of the present invention in a narrow width is provided with less base paper.
  • a multi-pattern glitter thread 10 formed by slitting the multi-pattern glitter film of the present invention in a narrow width is provided with less base paper.
  • an example of a gift certificate using paper forged on one side to produce a forgery-preventing paper is shown.
  • One or more threads may be used for the anti-counterfeit paper. Also
  • the multi-pattern glitter film is slit into a narrow width of about 0.5 to 30 mm, preferably 1 to 10 mm, and the slit multi-pattern glitter thread is incorporated into the base paper 101.
  • the base paper 101 of the anti-counterfeit paper is not particularly limited as long as it has excellent surface smoothness and heat resistance and has an appropriate strength and thickness. Paper such as card paper can be applied. High-quality paper and coated paper having a basis weight of 100 to 200 gZm 2 and excellent printability and transferability are preferred.
  • the base paper 101 is manufactured by embedding a thread having a width of about 0.5 to 30 mm, preferably 1 to LOmm, slit into a narrow width.
  • a thread having a width of about 0.5 to 30 mm, preferably 1 to LOmm, slit into a narrow width.
  • NNKP softwood bleached kraft pulp
  • LKP hardwood bleached kraft pulp
  • NBSP softwood bleached sulfite pulp
  • TMP thermomechanical pulp
  • the paper stock is manufactured by using a known paper machine such as a long paper machine or a circular paper machine while feeding a narrow-width thread, and if necessary, a machine calendar, a super calendar Process.
  • the multi-design glittering thread 10 of the present invention may be provided with a printed pattern in addition to the above configuration.
  • the thread may be embedded in the base paper, or it may be half-embedded or on the surface if it is sufficiently adhered. Further, it may be partially exposed on the surface of the base paper. Further, the base paper may be partially thinned and embedded. In particular, in the partially embedded or partially thin base paper 101, the glitter on both sides of the multi-pattern glitter thread 10 of the present invention is used. The design is fully visible. Further, in the case of burying or half-embedding, at least one of the glittering patterns is too strong or difficult to see, but if necessary, it can be observed by peeling and observing, so that it is within the scope of the present invention.
  • the manufacturing of the multi-pattern glittering thread 10 of the present invention can be performed easily and at low cost because any process can use existing equipment and technology.
  • both the manufacturing process of the glittering multi-pattern formation product 100 of the present invention can use existing equipment and technology, it can be manufactured easily and at low cost.
  • FIGS. 17 to 21 are cross-sectional views of the glitter film showing one embodiment of the present invention
  • FIGS. 22 to 25 show the state of visual recognition of the pattern of the glitter film showing one embodiment of the present invention.
  • FIG. 26 is a plan view and a cross-sectional view of the glitter pattern forming product showing one embodiment of the present invention.
  • the glitter pattern layer 320 includes a relief forming layer 315 and a metal thin film layer 317 provided in contact with the relief surface on which the relief forming layer 315 is formed, and the relief is combined with the metal thin film layer 317 with fine irregularities. Brings out glitter by diffracting, diffusing light, and Z or diffuse reflection.
  • the height of the projections and depressions and the interval between the projections and projections are extremely fine, usually about 0.005 mm or less. Both require advanced technology. That is, when multiple patterns are forcibly formed on a single substrate 311, the first first glittering pattern layer 320A is excellent in the relief formation of the relief, “relief layer formation phenomenon where the resin is photographed on the plate”, Although there is no occurrence of so-called “plate removal (pattern removal)”, since the second glitter pattern layer 320B is subjected to heat embossing again at the time of shaping, the first metal thin film layer 317A and the second relief are formed.
  • the relief layer forming resin is taken on the plate between the first metal thin film layer 317A and the second relief forming layer 315B.
  • ⁇ Phenomenon '',, ⁇ Plate removed (pattern missing) '' I will be born. Therefore, only one design with inferior design was obtained.
  • the present inventors have further advanced research, and even if they have a plurality of glittering patterns, all of the plurality of patterns are peeled off of the grease, so-called "printing (pattern removal).
  • an interlayer primer layer is provided between the first glitter pattern layer and the second glitter pattern layer, so that the resin is peeled off, so-called “plate”.
  • “Small (pattern removal)” has been solved, and the transferred material is excellent in unity with the paper-making paper, and moreover, only one base material is required, thus saving resources.
  • the first glittering film 310A of the first glittering pattern layer 320A, the second glittering film 310B of the second glittering pattern layer 320B, and two different kinds of glittering films 310 were produced.
  • an interlayer primer layer 321 is provided between the first glitter pattern layer 320A and the second glitter pattern layer 320B, and the glass transition temperature (Tg) of the interlayer primer layer 321 is formed as a relief.
  • Layer 3 By setting the temperature to 130 ° C or lower, which is lower than the Tg of 15A, the adhesive action of the interlayer primer layer 321 does not cause ⁇ plate removal (pattern removal) '' even in the embossing process, and the glitter is maintained.
  • the total thickness can be made extremely thin, for example, 5 to 20 / ⁇ ⁇ . If the total thickness is extremely thin, there is no sense of incongruity and excellent unity even if it is applied as a thread to the base paper.
  • the glitter film 310 of the present invention comprises a first glitter pattern layer 320 ⁇ comprising a first relief forming layer 315 A and a first metal thin film layer 317, a second relief forming layer 315 B and a second metal thin film layer 317 B.
  • the second glittering design layer 320B may be laminated via the interlayer primer layer 321B.
  • the first glittering design layer 320A composed of the first relief forming layer 315A and the first metal thin film layer 317A is disposed on one surface of the substrate 311 via the interlayer primer layer 321B.
  • the second glitter pattern layer 320B composed of the second relief forming layer 315B and the second metal thin film layer 317B and the base material are laminated on the same surface.
  • the example of FIG. 12 is obtained.
  • the fourth glitter design layer 320D may be provided in the lower part of the written display of the example of FIG. 12, the example shown in FIG. 13 is obtained.
  • the third bright design layer 320C and the fourth bright design layer 320D are in contact with each other, it is preferable to provide an interlayer primer layer 321D between them.
  • the first glittering pattern layer 320A composed of the first relief forming layer 315A and the first metal thin film layer 317A is disposed on one surface of the substrate 311 via the interlayer primer layer 321B.
  • the second glitter pattern layer 320B composed of the second relief forming layer 315B and the second metal thin film layer 317B and the protective layer 325 are laminated on the same surface.
  • an adhesive label or a transfer foil may be provided in which an adhesive layer 321 may be provided on the first metal thin film layer 317B having the configuration of FIG. 11A.
  • the inner glitter pattern is hidden by the outer glitter pattern metal thin film layer.
  • a film layer may be used.
  • the outer brilliant design is a brilliant design in which at least one of the brilliant designs has no other brilliant design, and the inner brilliant design is the brilliant design. It is a glitter design where there are two or more pairs of other glitter designs on both sides.
  • All the metal thin film layers may be transparent metal thin film layers. Conversely, it is also possible to make a thread with unique security that allows the inner glittering pattern to be confirmed only when it is broken by making the outer metal thin film layer opaque.
  • the symbols of the 1st to n-th glitter design layers 320 may be the same or different.
  • the first glitter pattern and the second glitter pattern are the same, the same image can be viewed from the front side and the back side.
  • the first metal thin film layer and the third metal thin film layer are opaque metal thin film layers
  • the second metal thin film layer and the fourth metal thin film layer are transparent metal thin film layers. Each of them can visually recognize 2 designs, a total of 4 designs, so that a very unique design and Z or security can be obtained.
  • the materials and the forming method are the same, and it should be read as l to n.
  • the first to nth relief forming layers and the metal thin film layer layers may be the same material, forming method and different thickness.
  • polyester resin such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene terephthalate-isophthalate copolymer, or terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer, nylon (trade name) ) 6, nylon (trade name) 66, nylon (trade name) 610, or nylon (trade name) 12, etc.
  • polyamide resin polyethylene, polypropylene, polybutene, or polyolefin resin such as polymethylpentene
  • Cyclic polyolefin resins such as polynorbornene, bur resins such as polyvinyl chloride, (meth) acrylic resins such as polyacrylate, polymetaacrylate, or polymethylmetaacrylate, polystyrene, high-impact polystyrene AS oil, Is a styrene resin such as ABS resin, a polyvinyl alcohol resin, or a polybutyl alcohol resin such as an ethylene vinyl alcohol copolymer, a polycarbonate resin, a saponified product of an ethylene-vinyl acetate copolymer, or a polyvinyl plastic.
  • the base material 311 may be a copolymer resin containing these resins as a main component, a mixture (including alloy), or a laminate including a plurality of layers.
  • the substrate 311 may be a stretched film or an unstretched film, but a film stretched in a uniaxial direction or a biaxial direction is preferable for the purpose of improving the strength.
  • the base material 311 is used as a film, sheet, or board that has at least one layer strength of these resins.
  • the total thickness of the entire glittering film 310 of the present invention is not particularly limited.
  • the thickness can be about 1 to 200 / ⁇ ⁇ .
  • the thickness of the base material 311 Most of the total thickness of the glitter film 310 is the thickness of the base material 311. Conventionally, in the case of forming a plurality of glitter patterns, it is usually necessary to use two base materials. I got it. For this reason, in order to reduce the total thickness, it is necessary to use a very thin base material, and in the layer formation process by coating and the relief shaping process, high-precision equipment, delicate operations, and loss of caulking are also lost. There were many low yields and cost. In the present invention, since only one base material 311 is sufficient, it is possible to use a general-purpose base material that is suitable for good processing and inexpensive. Polyethylene terephthalate and polyethylene naphthalate having good mechanical strength and good heat resistance are suitable.
  • a substrate having a thickness of about 1 to 200 / ⁇ ⁇ can be used.
  • the base material with a thickness of 2-38 m Preferably 4-18 m can be used.
  • the base material When the base material is used, it can be easily manufactured by conventional equipment and normal operation, and the force is low.
  • the base material 311 has a primer layer 313 or a corona discharge treatment, a plasma treatment, an ozone gas treatment, a flame treatment as necessary to improve the adhesion between the layers on the surface side on which the relief layer is formed. Further, easy adhesion treatment such as pre-heat treatment, dust removal treatment and alkali treatment may be performed. Particularly preferably, by providing a primer layer (not shown), the adhesiveness between the base material 311 and the relief layer can be improved, and the plate-cutting during the running of replication can be further suppressed.
  • the primer layer is flexible even when heat and / or pressure is applied in synergy with the base material 311, and its cushioning action reduces the load on the relief forming layer 315 and has already been molded. As a result, the relief of the already formed relief is retained.
  • the primer layer 313 includes, for example, polyurethane-based resin, polyester-based resin, polyamide-based resin, epoxy-based resin, phenol-based resin, polyvinyl chloride-based resin, polyvinyl acetate-based resin, and salt vinyl.
  • a Kuryl resin polyvinyl alcohol resin, polyvinyl acetal resin, polybutadiene resin, rubber compound, petroleum resin, alkyl titanate compound, polyethyleneimine compound, isocyanate compound, starch, casein Further, gum arabic, cellulose derivatives, waxes and the like can be used.
  • Relief forming layer 315 Relief shape is formed on the surface (also called replication).
  • a “hot pressing method” called by those skilled in the art can be applied.
  • a stamper metal plate or resin plate
  • embossing the stamper is peeled off after the relief is shaped and copied to the relief forming layer 315.
  • the relief shaping is the same in the material and the formation method except that the layers are different.
  • the first to nth reliefs may be the same or different.
  • the material of the relief forming layer 315 used in the hot pressing method is a thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Hardened thermosetting resin such as urethane, polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate, A product obtained by curing ionizing radiation curable resin such as melamine (meth) acrylate or triazine acrylate, or a mixture of the above thermoplastic resin and thermosetting resin or ionizing radiation curable resin. It can be used.
  • a thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Hardened thermosetting resin such as
  • thermosetting resins excellent in durability such as chemical resistance, light resistance and weather resistance, and curable resins cured by ionizing radiation such as ultraviolet rays and electron beams.
  • Sarakuko is preferably a material with excellent heat resistance and pressure resistance. That is, in the inventions of claims 3 to 6, a relief forming material that can withstand heat and pressure when the first glitter film and the second glitter film are bonded together is preferable.
  • the second relief forming layer is further formed on the opposite surface or the same surface of 11A of the first substrate.
  • the heat and pressure when the relief is formed on the second relief forming layer Materials that can withstand are preferred.
  • ionizing radiation curable resins having such characteristics ionizing radiation curable resins such as polyester (meth) acrylate, urethane (meth) acrylate and epoxy (meth) acrylate are preferably cured. Can be applied, particularly preferably urethane-modified
  • One relief forming layer is a cured product obtained by curing an uncured ionizing radiation curable resin composition mainly composed of the urethane-modified acryl resin represented by the general formula (a).
  • an uncured ionizing radiation curable resin composition mainly composed of the urethane-modified acryl resin represented by the general formula (a).
  • the photocurable resin composition disclosed by the present applicant in Japanese Patent Application Laid-Open No. 2000-273129 can be applied, and the photocurable resin composition S described in the above specification can be applied to the present specification. Used in the examples in the manual and is labeled as "ionizing radiation curable resin composition A"
  • Rl's each independently represent a hydrogen atom or a methyl group
  • R2 represents a hydrocarbon group having 1 to 20 carbon atoms.
  • the sum of 1, m, n, o and p is 100 is an integer from 1 to 20 to 90, mi to 0 to 80, ⁇ to 0 to 50, ⁇ + ⁇ to 10 to 80, pi to 0 to 40.
  • X and Y are linear or Represents a branched alkylene group
  • Z represents a group for modifying a urethane-modified acryl resin, and preferably represents a group having a bulky cyclic structure.
  • Other preferable one of the relief forming layer 315 Is a reaction product of an isocyanate compound having a melting point of 40 ° C or higher and a (meth) acrylic compound capable of reacting with an isocyanate group. In other words, it is a resin containing a soft low point of 40 ° C or higher.
  • the isocyanate compound has an isocyanate group bonded to a non-aromatic hydrocarbon ring, a trimer of isophorone diisocyanate, or an isophorone diisocyanate and an active hydrogen-containing compound. It is a reaction product, and (meth) acrylic compound strength (meth) acrylic acid and (meth) acrylate having a hydroxyl group are preferred. Specifically, a photocurable resin disclosed in JP 2001-329031 A can be applied. (As ionizing radiation curable composition B, details are separately described in actual examples.)
  • ionizing radiation curable resin of urethane-modified acryl-based resin for example, ionizing radiation curable resin of urethane-modified acryl-based resin, a photopolymerization initiator, a photosensitizer, and a photopolymerization acceleration may be used as necessary.
  • the solvent is not used, but the non-solvent relief forming layer 15 composition (ink) is used.
  • the relief forming layer 15 composition (ink) may be applied by, for example, a mouth coat method, a gravure coat method, other known coating methods or printing methods, and dried if necessary. .
  • the thickness of the relief forming layer 15 is usually about 0.1 to about LO / zm, preferably 0.2 to 5 / ⁇ ⁇ , and more preferably 0.5 to 2 / ⁇ ⁇ . If it is less than 0.5 m, the brightness (brightness) is remarkably lowered, and if it exceeds 2 m, the brightness is sufficient, which is disadvantageous in terms of cost.
  • the relief shape is uneven and is not particularly limited.
  • those that exhibit functions such as light diffusion, light scattering, light reflection, and light diffraction are preferably formed by Fourier transform, lenticular lens, light diffraction pattern, and moth eye.
  • a hairline pattern, a mat pattern, a line pattern, an interference pattern, or the like that expresses a unique glitter may be used.
  • a hologram or diffraction grating in which interference fringes due to interference of light between the object light and the reference light are recorded in a concavo-convex pattern can be applied.
  • Holograms include laser reproduction holograms such as Fresnel holograms, white light reproduction holograms such as rainbow holograms, color holograms utilizing these principles, computer-generated holograms (CGH), holographic diffraction gratings, etc. There is.
  • the pattern described in this specification refers to a pattern formed by combining one or more of these various concavo-convex patterns.
  • text patterns such as "abc” and "Security” Patterns formed from combinations of geometric patterns called patterns, polka dots, and painting patterns created by simulating flowers and birds, etc.
  • patterns polka dots
  • multiple symbols refers to symbols that cannot be formed by using these symbols once and once, and usually refers to symbols that are created using two or more symbols multiple times.
  • Examples of the diffraction grating include a holographic diffraction grating using a hologram recording means.
  • a diffraction grating is mechanically created by using an electron beam drawing apparatus or the like, so that arbitrary diffraction can be performed based on calculation.
  • a diffraction grating from which light can be obtained can also be mentioned.
  • a mechanical cutting method may be used.
  • These holograms and Z or diffraction gratings may be recorded in a single or multiple manner, or in combination.
  • These masters can be prepared by known materials and methods. Usually, a laser beam interference method using a glass plate coated with a photosensitive material, an electron beam drawing method on a glass plate coated with an electron beam resist material, Machine cutting method can be applied.
  • the relief shape 16 is shaped (also referred to as replication) on the surface of the relief forming layer 315.
  • a stamper metal plate or resin plate
  • embossing pressure-bonded (so-called embossing) to the surface of the relief forming layer 315, and the relief is applied to the relief forming layer 315.
  • the stamper is peeled off. It is also possible to form a reflective layer 117 on the surface of the relief forming layer 115 and then mold it by pressing a stamper on this surface.
  • the relief is replicated by irradiating ionizing radiation during embossing and then removing the stamper.
  • Commercial duplication can be carried out continuously by making it long.
  • the relief can be replicated more commercially by using a cylindrical stamper prepared by attaching a stamper to the cylinder, or by directly engraving the relief on the cylinder.
  • This interlayer primer layer was also effective in the roll-type continuous replication method.
  • ionizing radiation curable resin When ionizing radiation curable resin is used as the relief forming layer 315, ionizing radiation curable resin is cured by irradiation with ionizing radiation during or after embossing with a stamper. When the ionizing radiation curable resin is cured (reacted) by irradiation with ionizing radiation after the relief is formed, the ionizing radiation curable resin (relief forming layer 315) is formed.
  • Ionizing radiation may be classified by the quantum energy of electromagnetic waves, but in this specification, all ultraviolet rays (UV-A, UV-B, UV-C), visible light, gamma rays, X-rays, electrons It is defined as including a line.
  • UV ultraviolet rays
  • visible rays visible rays
  • gamma rays X-rays
  • electron rays having a wavelength of 300 to 400 nm are most suitable.
  • An ionizing radiation curable resin that is cured by ionizing radiation adds a photopolymerization initiator and Z or a photopolymerization accelerator in the case of ultraviolet curing, and does not add it in the case of high energy electron beam curing. It can also be cured with thermal energy if an appropriate catalyst is present.
  • a thermosetting resin is used as the relief forming layer 315, it should be aged and cured in a temperature and humidity environment according to the curing conditions of the thermosetting resin used.
  • the reflective layer 317A and the reflective layer 317B are provided with a relief having a predetermined relief structure.
  • the reflective layer 317 is provided on the relief surface of the surface forming layer 315 to enhance the reflection and Z or diffraction effect of the relief, so that it is not particularly limited as long as it is higher than the reflectance of the relief forming layer 315.
  • a transparent metal compound having a difference in refractive index can be applied.
  • the reflective layer 317 can be formed on the relief forming layer 315 before providing the relief structure. That is, a relief can be formed after forming the reflective layer 317 by appropriately selecting the material and stamper of each layer.
  • the metal used for the reflective layer 317 is a thin metal element film having a metallic luster and reflecting light, such as Cr, Ni, Ag, Au, and Al, and their oxides and sulfides.
  • a thin film such as an oxide or nitride may be used alone or in combination.
  • the above light-reflective metal thin film is formed by a vacuum thin film method such as a vacuum deposition method, a sputtering method, an ion plating method or the like so as to have a thickness of about 10 to 2000 nm, preferably 20 to: LOOOnm. It can also be formed by the obtained force and other factors. If the thickness of the reflective layer 317 is less than this range, light is transmitted to some extent and the effect is reduced, and if it is more than that, the reflective effect does not change, which is wasteful in cost.
  • the reflective layer 317 a metallic compound having an almost colorless and transparent hue and an optical refractive index different from that of the relief forming layer is used.
  • the glitter such as a hologram can be visually recognized, a glitter film such as a transparent hologram can be produced.
  • Examples of the transparent metal or metal compound include a thin film having a higher refractive index than the relief forming layer 15 and a thin film having a lower refractive index.
  • Examples of the former include ZnS, TiO, Al
  • examples of the latter include LiF, MgF, A1F.
  • 2 3 2 3 2 3 2 2 3 Preferably, it is a metal oxide or nitride, specifically, Be, Mg, Ca, Cr, Mn, Cu, Ag, Al, Sn, In, Te, Fe, Co, Zn, Ge, Pb, Cd Bi, Se, Ga, Rb, Sb, Pb, Ni, Sr, Ba, La, Ce, Au, etc. .
  • general light-reflective metal thin films such as aluminum can be used with transparency when the thickness force is S200A or less.
  • the transparent metal compound is formed on the relief surface of the relief forming layer 315 on the relief surface of the relief forming layer 315 by vapor deposition, sputtering, ion plating, CVD to a thickness of about 10 to 2000 nm, preferably 20 to LOOOnm. It may be provided by a vacuum thin film method or the like. Furthermore, if the refractive index of the adhesive layer 321 or the protective layer 325 material and the relief forming layer 315 material are sufficiently different from each other, it is possible to use a transparent synthetic resin having a refractive index different from that of the relief forming layer 315. In addition, the adhesive layer 321 and the protective layer 325 can also serve as the reflective layer 317.
  • the material of the interlayer primer layer 321B is preferably a material that improves the adhesion between the reflective layer (metal thin film layer) forming material and the relief material, and is lower than the Tg of the relief forming layer 315A.
  • the material of the interlayer primer layer 321B is preferably higher than room temperature in consideration of the necessity of removing and storing the interlayer primer coating.
  • interlayer primer layers may be used, such as an interlayer primer layer having excellent adhesion to the reflective layer forming material and an interlayer primer layer having excellent adhesion to the relief layer material.
  • the interlayer primer layer 321B is flexible because it is lower than the Tg of the relief forming layer 315 even when heat and Z or pressure are applied, and its cushioning action reduces the load on the relief forming layer 315. Thus, deterioration of the already shaped relief shape is prevented, and as a result, the glitter of the already shaped relief is maintained.
  • the material of the interlayer primer layer 321B includes, for example, polyurethane-based resins, polyester-based resins, polyamide-based resins, epoxy-based resins, phenol-based resins, and polysalt-vinyl-based resins.
  • Polyvinyl acetate resin Polyvinyl acetate resin, salt vinyl acetate copolymer, acid-modified polyolefin resin, copolymer of ethylene and butyl acetate or acrylic acid, (meth) acrylic resin, polyvinyl alcohol Resin, polyvinylacetal resin, polybutadiene resin, rubber compound, petroleum resin, alkyl titanate compound, polyethyleneimine system Compounds, isocyanate compounds, starch, casein, gum arabic, cellulose derivatives, waxes and the like can be used.
  • ABS acrylonitrile monobutagen-styrene
  • AS acrylonitrile-styrene
  • cellulose acetate resin acrylonitrile-styrene
  • ionomer resin polyacrylonitrile resin, one or more of these resins Can be used in combination.
  • a cross-linking agent such as isocyanate may be added as appropriate to improve the adhesion.
  • the adhesion between the substrate and the relief layer may be increased by surface treatment such as corona discharge treatment or plasma treatment.
  • surface treatment such as corona discharge treatment or plasma treatment.
  • corona discharge treatment, plasma treatment, ozone gas treatment, flame treatment, pre-heat treatment, dust removal treatment, alkali treatment, etc. as necessary to improve the adhesion between the layers on the surface where the relief layer is formed.
  • Easy adhesion treatment may be performed.
  • the interlayer primer layer 321B may be applied as a melt or a solution by a known method, or may be formed into a film and bonded by force.
  • the glittering film 310 of the present invention is obtained by repeating the formation and shaping of each layer described above.
  • the first relief forming layer 315A is formed on one surface of the base material 311, the first glitter pattern is shaped, and the first reflection is performed.
  • the layer 317A is formed, and further, the interlayer primer layer 321B is formed on the surface of the first reflective layer 317A, the second relief forming layer 315B is formed, the second glitter pattern is formed, and the second reflective layer 317B is formed. Should be formed
  • the third relief forming layer 315C is further formed on the surface opposite to the first reflective layer 317A and the base material 311 of the glitter film 310 of the present invention shown in FIG.
  • the characteristic pattern is formed and the third reflective layer 317C is formed, the glittering film 310 shown in FIG. 20 is obtained and has three glittering patterns.
  • an interlayer primer layer 321D is further formed, a fourth relief forming layer 315D is formed, and a fourth glitter pattern is imparted. Then, when the transparent fourth reflective layer 317D is formed, the glitter film 310 shown in FIG. 21 is obtained and has four glitter patterns.
  • Further description of the above-described plurality of patterns i will give the glitter films 310A and 310B as described above. Further, in the present invention, by repeating the steps of producing the relief forming layer 315, the relief shape 316, and the reflective layer 317 according to the layer configuration, a multi-design glitter film having a plurality of designs is produced. By appropriately slitting the film, the multi-design glittering thread 310 of the present invention can be obtained.
  • Tgl (u) is the glass transition temperature of the first relief forming material formed earlier
  • Tgl (h) is the glass transition temperature after hardening of this material
  • the second relief formation is formed later.
  • Tg2 (u) glass transition temperature of the material from which the layer is made
  • Tg2 (h) glass transition temperature of this material after curing
  • the relief of the second relief forming layer is added to the first relief forming layer. It is preferable that the resin is cured before being molded and has a relationship of Tgl (h)> Tg2 (u).
  • Tg4 (u) Tg4
  • Tgl> Tg2 the relationship (Tgl> Tg2) is established. If a curable resin is used as the resin to be relief formed first, even if the Tgl (u) before curing is low, this resin is cured after the relief is formed, so that the relief is later applied to the second relief forming layer. This is preferable because it is easy to make Tgl (h) sufficiently high at the time of molding. On the contrary, if curable resin is used as the resin to be relief formed later, the temperature at which the relief is formed on the second relief forming layer is sufficiently lowered, and the resin is converted to Tg2 after the second relief is formed.
  • Curing to (h) is preferable because the durability of the product can be sufficiently increased.
  • the relief formed later can be produced without destroying the shape of the relief formed earlier.
  • ionizing radiation curable resin is particularly preferable as the relief forming material. The same applies when having multiple designs of 3 layers or more.
  • the glass transition temperature mentioned above is the temperature at which the loss tangent (tan ⁇ ) in the dynamic viscoelasticity measurement has the maximum value is defined as the glass transition temperature of the resin.
  • the measurement method of viscoelasticity is ARES manufactured by Rheometrics as a measuring instrument. The measurement conditions are parallel plate 10 ⁇ ⁇ , strain 1%, amplitude 1 ⁇ , heating rate 2 ° CZmin. The temperature is raised from 30 ° C to 200 ° C.
  • the storage elastic modulus G ′ is an elastic component, which is generated by the generation of a coil vibration or aggregate structure in a high molecule, and the loss elastic modulus G is a viscous component. It is equivalent to stress.
  • tan ⁇ is determined by G "/ G 'and is an index of how much energy is absorbed when the material is deformed.
  • the glitter film 310 of the present invention has a plurality of glitter designs, all of which have excellent glitter properties, a single substrate is sufficient, resource saving, and the total thickness is extremely high. Can be thin.
  • the glittering film 310 is excellent in a sense of unity with the transfer material or paper. Costs can be reduced.
  • the glittering film 310 of the present invention has a protective layer, a colored layer, magnetic printing, and Z or resin on the interlayer and Z or the surface of the layer structure as necessary, as long as the glittering pattern can be observed.
  • Other layers, such as layers, as well as Z or printing, primer layers, etc. may be provided.
  • an easy primer layer may be provided on at least one surface of the glittering film 310.
  • the primer layer is made of a hydrophilic material such as a polybutyl alcohol-based resin, a resin. Krill oil and cellulosic oil are preferred.
  • thermoplastic resin such as acryl resin, unsaturated polyester, melamine, epoxy urethane (meth) atariate.
  • Curing ultraviolet curable resin such as a composition obtained by curing a thermosetting resin such as a rate, a composition in which an unsaturated ethylene monomer and an unsaturated ethylene oligomer are appropriately mixed, and a sensitizer added.
  • a mixture of the thermoplastic resin and the thermosetting resin, or a thermoformable substance having a radically polymerizable unsaturated group can be used.
  • thermosetting resins with excellent durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams are preferred!
  • the glitter pattern formation product 300 of the present invention uses the glitter film 310 of the present invention to transfer at least a part of the glitter pattern to the transfer target body by adhering, bonding, or punching. It can be produced by a papermaking method by embedding and has a plurality of designs with excellent glitter, and can have special design and security.
  • FIG. 26 shows, as an example of the glitter pattern formation 300 of the present invention, a thread formed by slitting the glitter film 310 of the present invention on a surface of at least one surface of a base paper.
  • the total thickness of the threads is extremely thin, and the transferred material is excellent in unity with the paper-making paper. In addition, it is resource-saving and easy to manufacture.
  • One or more threads may be used for the anti-counterfeit paper.
  • Fig. 26 (B) is an example of only one side when it is provided on the same side as the securities printing section, and Fig. 26 (C) is provided on the opposite side of the securities printing section. Also good.
  • the glitter film 310 of the present invention has a narrow stripe shape, those skilled in the papermaking industry call it a thread.
  • the glitter film 310 of the present invention is slit to a width of SO. 5 to 30 mm, preferably 1 to a narrow width of LO mm, and the thread is incorporated into the base paper 301.
  • the anti-counterfeit base paper 301 is excellent in surface smoothness and heat resistance and has an appropriate strength. There is no particular limitation as long as it has a thickness and thickness, but paper such as fine paper such as fine paper, thin paperboard, and card paper can be applied. High-quality paper and coated paper having a basis weight of 100 to 200 gZm2 and excellent printability and transferability are preferred.
  • the base paper 301 is manufactured by embedding a thread having a width of about 0.5 to 30 mm, preferably 1 to LOmm, slit into a narrow width. In other words, softwood bleached kraft pulp (NBKP), hardwood bleached kraft pulp (LBKP), softwood bleached sulfite pulp (NBSP), thermomechanical pulp (TMP), etc.
  • the paper stock is manufactured by using a known paper machine such as a long paper machine or a circular paper machine while feeding a narrow-width thread, and if necessary, a machine calendar, a super calendar Process.
  • Another base material layer may be further provided on the multi-pattern glittering film of the present invention obtained as described above.
  • the metal surface can be protected by providing a support substrate 301 on the surface of the reflective layer 317B with an adhesive layer 321 interposed therebetween.
  • the materials described for the substrate 301 are used.
  • These synthetic resin films and paper base materials may be laminated by a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method. Further, by using a support substrate that has been subjected to a release treatment as the support substrate, an adhesive label having excellent design and security can be obtained.
  • an appropriate material may be selected in accordance with the above-described conventionally known lamination method.
  • an adhesive that is cured by ionizing radiation such as heat or ultraviolet rays' electron beam
  • Thermosetting adhesives include two-component curable urethane adhesives, polyester urethane adhesives, polyether urethane adhesives, acrylic adhesives, polyester adhesives, polyamide adhesives, and polyvinyl acetate adhesives.
  • Adhesives, epoxy adhesives, rubber adhesives, etc. can be applied .
  • a two-component curable urethane adhesive is preferable.
  • the adhesive dispersed or dissolved in a solvent is applied and dried, and two glitter films are stacked and laminated, and then the adhesive is cured by aging at 30 to 120 ° C for several hours to several days. Good.
  • Adhesives, more preferably adhesives that can be cured at temperatures below Tg (u), are particularly preferably used.
  • the thickness of the adhesive layer is 0.1 to 20; about ⁇ ⁇ (dry state), preferably 1.0 to 5. O / zm.
  • the glitter film 310 of the present invention may be provided with a printed pattern or the like in addition to the above configuration.
  • the thread may be embedded in the base paper, or it may be half-embedded or on the surface if it is sufficiently adhered. Further, it may be partially exposed on the surface of the base paper. Further, the base paper may be partially thinned and embedded, in particular, half-embedded or partially thin V. With the base paper 301, the glitter pattern on both sides of the glitter film 310 of the present invention can be fully observed. . Further, in the case of embedding or partial embedding, at least one of the glittering patterns cannot be visually recognized or is difficult to visually recognize, but can be observed by peeling and observing as necessary, and thus is within the scope of the present invention.
  • the production of the glitter film 310 of the present invention can be carried out easily and at a low cost because existing processes and techniques can be used in any process.
  • both the production of the glitter pattern formation 300 of the present invention and the existing equipment and technology can be used in both processes, the production is easy and can be produced at low cost.
  • Lumirror 6CF53 product name: Torayen clay, PET film product name
  • the above-mentioned ionizing radiation curable resin composition A is applied to one surface of the substrate 11A with a gravure reverse coater and dried at 100 ° C. to form a relief forming layer 15A having a thickness of 1 ⁇ m. Formed.
  • a stamper duplicated by the 2P method from the rainbow hologram by the two-beam method is applied to the relief forming layer surface, and is applied to the embossing roller of the duplicating apparatus, and is heated and pressed (embossed) with the opposite roller. A relief with a fine patterning power was formed.
  • Lumirror 6CF53 manufactured by Torayen clay, trade name of PET film having a thickness of 6 ⁇ m was used as the base material 11B.
  • the above-mentioned ionizing radiation curable resin composition A is applied to one surface of the substrate 11B with a gravure reverse coater and dried at 100 ° C to form a relief forming layer 15B having a thickness of 1 ⁇ m. did.
  • a stamper replicated from the diffraction grating by the 2P method on the relief forming layer surface is attached to an embossing roller of a replication apparatus, and heated and pressed (enbossed) with an opposing roller to form a fine uneven pattern. A powerful relief was shaped.
  • the reflective layer 17A of the first glitter film and the reflective layer 17B of the second glitter film are bonded together by a known dry lamination method. Apply a two-part curable polyurethane adhesive to the reflective layer 17A surface of the first glitter film by gravure coating so that the thickness after drying is 1.5 m, and after drying, apply the second glitter.
  • the reflective layer 17B surface of the conductive film was overlaid and pressurized, and then allowed to stand at 40 ° C. for 3 days to obtain a multi-pattern glitter film 10 of Example 1.
  • the multi-pattern glittering film 10 has an overall thickness of approximately 15 ⁇ m, and one surface has a hologram, and the other surface has a separate glittering pattern formed by a diffraction grating.
  • a multi-pattern glittering film 10 was obtained in the same manner as in Example A1 except that a titanium oxide thin film having a thickness of 1 OOnm was used for forming the reflective layer 17A by sputtering.
  • the multi-pattern glitter film 10 has an overall thickness of approximately 15 m, one surface having a glitter pattern and a hologram pattern by a diffraction grating, and the other surface having a separate transparent glitter pattern by the diffraction grating. I could observe brightly.
  • Example A1 Except using PET film with thickness 6 / ⁇ ⁇ as substrate 11A, 12 / zm thickness as substrate 11B, and using ionizing radiation curable resin composition B as a relief forming layer coating liquid in the same manner as in Example A1, a multi-pattern glitter film 10 was obtained.
  • the multi-pattern glitter film 10 had an overall thickness of approximately 21 ⁇ m, and a bright surface with a separate glitter pattern on one side of the hologram and a diffraction grating on the other side could be observed brightly.
  • Polyester resin is applied with a gravure reverse coater on the surface of the base material 11A and the base material 11B where the relief forming layer 15 is formed, dried at 100 ° C, and a primer layer having a thickness of 0.5 ⁇ m 1 3A and A multi-pattern glitter film 10 was obtained in the same manner as in Example A1 except that 13B was formed.
  • the multi-pattern glitter film 10 has an overall thickness of approximately 15 / zm, one surface is a hologram, and the other surface is brightly observed with a separate transparent glitter pattern by a diffraction grating.
  • the interlayers are firmly bonded, the durability that peeling hardly occurs is good.
  • a multi-pattern glittering film 10 was obtained in the same manner as in Example A1, except that a PET film having a thickness of 16 m was used as the base materials 11A and 11B.
  • the multi-pattern glitter film 10 had an overall thickness of approximately 35 m, and a bright and distinct glitter pattern with a diffraction grating on one surface could be observed brightly.
  • Example A A PET film having a thickness of 50 ⁇ m is used as the base material 11A and 11B, the thickness of the primer layers 13A and 13B is 1 ⁇ m, and the thickness of the relief forming layers 15A and 15B is 2 m.
  • a multi-pattern glitter film 10 was obtained.
  • the multi-pattern glitter film 10 had an overall thickness of approximately 110 / zm, and one surface could be brightly observed with a hologram and another surface with a separate glitter pattern with a diffraction grating.
  • the first substrate 11A of the first glitter film and the second substrate 11B of the second glitter film are bonded by a known dry lamination method.
  • the second substrate 11B side of the glittering film 2 was pressed and pressed, and then allowed to stand at 40 ° C for 3 days to obtain a multi-pattern glittering film 10.
  • the multi-pattern glitter film 10 has an overall thickness of approximately 15 m, and one surface has a hologram, and the other surface has a separate glitter pattern by a diffraction grating.
  • Example A1 After producing in Example A1, the first substrate 11A of the first glitter film and the second substrate 11B of the second glitter film are bonded by a known dry lamination method. After applying and drying the two-component curable polyurethane adhesive on the first substrate 11A surface of the first glittering film by gravure coating method so that the thickness after drying becomes 1.5 / zm, The reflective layer 17B surface of the glitter film 2 was overlaid and pressurized, and then allowed to stand at 40 ° C for 3 days to obtain a multi-pattern glitter film 10.
  • the multi-pattern glittering film 10 had an overall thickness of approximately 15 m, and a bright surface with a separate glittering pattern formed by a diffraction grating on one surface could be observed brightly.
  • the above-mentioned ionizing radiation curable resin composition A was applied to the reflective layer 17A surface of the glitter film with a gravure reverse coater. Then, it was dried at 100 ° C. to form a relief forming layer 15B having a thickness of 1 ⁇ m.
  • a stamper duplicated by the diffraction grating cover 2P method is attached to the relief forming layer surface to an embossing roller of a duplicating apparatus, and is heated and pressed (embossed) with an opposing roller. Relief that has an uneven pattern power was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • the multi-design glitter film 10 had an overall thickness of approximately 8 m, and one surface could be brightly observed with a hologram on one surface and a separate glitter pattern on the other surface with a diffraction grating.
  • the above-mentioned ionizing radiation curable resin composition A was applied to the first substrate 11A surface of the glittering film with a gravure reverse coater. It was applied and dried at 100 ° C. to form a relief forming layer 15B having a thickness of 1 m.
  • a stamper duplicated by 2P method on the surface of the relief forming layer is attached to the embossing roller of the duplicating apparatus, and heated and pressed (embossed) with the opposing roller to make fine Relief that has uneven pattern force was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • the multi-pattern glittering film 10 had an overall thickness of about 8 m, and a bright surface with a separate glittering pattern formed by a diffraction grating on one surface could be observed brightly.
  • the ionizing radiation curable resin composition A described above was applied on the reflective layer 17B of the first glittering film prepared in Example A1 and the second glittering film prepared in Example A1, the ionizing radiation curable resin composition A described above was applied. Coating with a gravure reverse coater and drying at 100 ° C to form a protective layer 25 having a thickness of 0.5 ⁇ m, and using these, the reflective layer 17A of the first glittering film and the first Bonding is performed by a known dry lamination method so that the second substrate 11B of the glitter film 2 is opposed.
  • 2nd glitter film After applying a two-component curable polyurethane adhesive to the reflective layer 17A surface of the first glittering film by the gravure coating method so that the thickness after drying is 1.5 / zm, and drying it, 2nd glitter film (2) Substrate (1) The IB surface was superposed and pressurized, and then allowed to stand at 40 ° C for 3 days to obtain a multi-pattern glitter film 10.
  • the multi-pattern glitter film 10 had an overall thickness of approximately 15 m, and a bright surface with a separate glitter pattern on one side of the hologram and a diffraction grating on the other side could be observed brightly. Note that the glittering film produced in Example 11 was covered with the protective layer 25 without the reflective layer 17B being exposed on the surface, and the durability was further improved.
  • the second substrate 11B of the multi-pattern glitter film 10 having an overall thickness of approximately 35 ⁇ m produced in Example A5 is opposed to one surface of the 100 / zm PET film used as the base paper 101. Bonding is performed by a known dry lamination method. After applying and drying a two-component curable polyurethane adhesive on the second substrate 11B surface of the multi-pattern glitter film 10 by gravure coating method to a thickness of 5 ⁇ m after drying, 100 / zm The PET film was overlaid and pressurized, and then allowed to stand at 40 ° C for 3 days to obtain a glittering multi-graphical material 100.
  • the glittering multiple-pattern formed product 100 had an overall thickness of approximately 140 m, and a bright surface with a separate glittering pattern formed by a diffraction grating on one surface could be observed brightly.
  • Lumirror 6CF53 manufactured by Torayen clay, trade name of PET film having a thickness of 6 ⁇ m was used as the substrate 111A.
  • the above-mentioned ionizing radiation curable resin composition B is applied to one surface of the substrate 111 A with a Daravia reverse coater and dried at 100 ° C. to form a relief forming layer 115 A having a thickness of 1 ⁇ m. Formed.
  • a stamper duplicated by the 2P method from a rainbow hologram by the two-beam method is applied to the relief forming layer surface, and is applied to the embossing roller of the duplicating apparatus, and is heated and pressed (embossed) with one opposing roller.
  • Relief with a strong uneven pattern force was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 115A by a vacuum deposition method to obtain a reflective layer 117A.
  • Lumirror 6CF53 product name: PET film trade name, manufactured by Torayne soil
  • the ionizing radiation curable resin composition B described above is applied to one surface of the substrate 111B with a Daravia reverse coater and dried at 100 ° C. to form a relief forming layer 115 B having a thickness of 1 ⁇ m. Formed.
  • a stamper duplicated from the diffraction grating by the 2P method is stuck on the relief forming layer surface to the embossing roller of the duplicating apparatus, and is heated and pressed (embossed) with the opposing roller, so that the fine uneven pattern force is also reduced.
  • a relief was formed.
  • it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 115B by a vacuum deposition method to obtain a reflective layer 117B.
  • the reflective layer 117A of the first glitter film and the reflective layer 117B of the second glitter film are bonded together by a known dry lamination method. Apply a two-component curable polyurethane adhesive to the reflective layer 117A surface of the first glittering film by the gravure coating method so that the thickness after drying is 1.5 m.
  • the reflective layer 117B surface of the glitter film of 2 is overlaid and pressurized, and then left to stand at 40 ° C for 3 days, then slit with a precision micro slitter machine to a width of 1.5 mm, as a narrow thread,
  • the multi-design glitter thread 110 of Example B1 was obtained.
  • the multi-design glitter thread 110 has an overall thickness of approximately 15 ⁇ m, and one face can be a hologram, and the other face can be brightly observed with a distinct glitter pattern by a diffraction grating.
  • the glitter pattern could be observed and identified by anyone at a glance even in the dark.
  • the holograms and the copy of the thread with the unique brightness of the hologram were completely different, and the authenticity could be judged at a glance.
  • a multi-pattern glittering thread 110 was obtained in the same manner as in Example B1 except that a PET film having a thickness of 4.5 m was used as the base material 111A and the base material 111B.
  • the multi-design glitter thread 110 has an overall thickness of approximately 12 / zm, and one surface is a hologram, and the other surface is brightly observable with a separate glitter pattern by a diffraction grating.
  • a PET film having a thickness of 4.5 m was used as the base material 111A and the base material 111B.
  • the multi-design glitter thread 110 has an overall thickness of approximately 12 / zm, and one surface is a hologram, and the other surface is brightly observable with a separate glitter pattern by a diffraction grating.
  • a multi-pattern glittering thread 110 was obtained in the same manner as in Example B1, except that a PET film having a thickness of 9 ⁇ m was used as the base material 111A and the base material 11 IB.
  • the multi-design glitter thread 110 has an overall thickness of approximately 21 m, and one surface can be observed as a hologram, and the other surface can be brightly observed as a separate glitter pattern using a diffraction grating. But even in the dark, I could observe and identify it at a glance. Furthermore, when copied with a color copier, the hologram's unique brightness was completely different from the hologram and copy of the thread, and the authenticity could be judged at a glance.
  • a 6 ⁇ m thick PET film was used as substrate 111A, and substrate 111B was used.
  • a multi-pattern glittering thread 110 was obtained in the same manner as in Example B1.
  • the multi-design glitter thread 110 has an overall thickness of approximately 21 m, a hologram on one surface, and a separate glitter pattern with a diffraction grating can be brightly observed on the other surface. Moreover, even in the dark, it was possible to observe and identify with a glance. Furthermore, when copying with a color copier, there was no hologram-specific brightness, and the hologram and copy of the thread were completely different, and authenticity could be judged at a glance.
  • a multi-pattern glitter thread was obtained in the same manner as in Example B1, except that a PET film having a thickness of 16 ⁇ m was used as the base material 111A and the base material 111B.
  • the multi-design glitter thread 110 had an overall thickness of approximately 35 m, and one surface could be a hologram, and the other surface could be brightly observed with another glitter pattern made of a diffraction grating.
  • a multi-pattern glitter thread was obtained in the same manner as in Example B1 except that a PET film having a thickness of 25 ⁇ m was used as the base material 111A and the base material 111B.
  • a multi-pattern glittering thread 110 was obtained in the same manner as in Example B1, except that a sputtering method was used to form a titanium oxide thin film having a thickness of lOOnm as the reflective layer 117A.
  • the multi-pattern glitter thread 110 has an overall thickness of approximately 15 m, and one surface is formed by a diffraction grating. A bright and holographic pattern was observed, and the other surface was brightly observed with a separate transparent glitter pattern with a diffraction grating. Furthermore, when copying with a color copier, one of the holograms and copies of the thread with the unique brightness of one program was completely different, and the other side of the grating with the unique brightness of the other grating could be judged at a glance. .
  • a plurality of design glitter threads 110 was obtained in the same manner as in Example B1, except that the ionizing radiation-curable resin composition A was used as the coating liquid for the relief forming layers 115A and 115B.
  • the multi-design glitter thread 110 had an overall thickness of approximately 15 / z m, and a bright glitter pattern could be observed brightly on one side and a diffraction grating on the other side.
  • Polyester resin is applied to the surface on which the relief forming layer 115 of the base material 111A and the base material 111B is to be formed with a gravure reverse coater, and dried at 100 ° C, and an interlayer primer layer 113A having a thickness of 0.5 ⁇ m. And 113B were formed in the same manner as in Example B1 to obtain a multi-design glittering thread 110.
  • the multi-design glitter thread 110 has an overall thickness of approximately 16 m, a hologram on one surface, and a separate transparent glitter pattern with a diffraction grating can be clearly observed on the other surface, and In addition, since the interlayers are firmly bonded, the durability that peeling hardly occurs is good.
  • Polyester resin is applied to the surface on which the relief forming layer 115 of the base material 111A and the base material 111B is to be formed with a gravure reverse coater, and dried at 100 ° C, and an interlayer primer layer 113A having a thickness of 0.5 ⁇ m. And 113B were formed in the same manner as in Example B2 to obtain a multi-design glitter thread 110.
  • the multi-design glitter thread 110 has an overall thickness of approximately 13 m, a hologram on one surface, and a separate transparent glitter pattern with a diffraction grating can be clearly observed on the other surface, and In addition, since the interlayers are firmly bonded, the durability that peeling hardly occurs is good.
  • Example B1 After producing in Example B1, the first substrate 111A of the first glittering film and the second substrate 111B of the second glittering film are bonded by a known dry lamination method.
  • 1st glitter film After applying a two-component curable polyurethane adhesive to the surface of the first substrate 111A using a gravure coating method to a thickness of 1.5 / zm after drying, the second glittering film The second substrate 111B surface was overlaid and pressurized, then left at 40 ° C for 3 days, then slit with a precision micro slitter machine to a width of 1.5 mm to form a narrow thread. A glittering thread 110 was obtained.
  • the multi-design glitter thread 110 has an overall thickness of approximately 15 / zm, and one surface has a hologram and the other surface can be brightly observed with a separate glitter pattern by a diffraction grating.
  • a diffraction grating a diffraction grating
  • the above-mentioned ionizing radiation curable resin composition A was applied on the reflective layer 17B of the first glittering film prepared in Example B1 and the second glittering film prepared in Example B1, the above-mentioned ionizing radiation curable resin composition A was applied. Coating with a gravure reverse coater and drying at 100 ° C to form a protective layer 25 having a thickness of 0.5 ⁇ m, and using these, the reflective layer 17A of the first glittering film and the first Bonding is performed by a known dry lamination method so that the second substrate 11B of the glitter film 2 is opposed.
  • the multi-design glitter thread 10 of Example 11 was obtained.
  • the multi-design glitter thread 10 had an overall thickness of approximately 15 m, and a bright glitter pattern on one side of the hologram and a bright grating on the other side could be observed.
  • the above-mentioned ionizing radiation curable resin composition A was applied to the surface of the first substrate 111A of the glittering film with a gravure reverse coater. Then, it was dried at 100 ° C. to form a relief forming layer 115B having a thickness of 1 m.
  • a stamper copied by the diffraction grating mirror 2P method is applied to the surface of the relief forming layer. It was attached to an embossing roller and heated and pressed (embossed) with an opposing roller to form a relief with a fine uneven pattern force. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • a 500 nm thick aluminum thin film is formed on the relief surface of the relief forming layer 115B by vacuum deposition to produce a multi-pattern glitter film as the reflective layer 117B, and slit to a width of 1.5 mm with a precision micro slitter machine.
  • a multi-pattern glittering thread 110 of Example B12 was obtained as a narrow thread.
  • the multi-design glitter thread 110 had an overall thickness of approximately 8 ⁇ m, and a bright glitter pattern with a diffraction grating on one surface could be observed brightly on one surface.
  • the ionizing radiation curable resin composition A was applied to the reflective layer 117A surface of the glittering film with a gravure reverse coater. Then, it was dried at 100 ° C. to form a relief forming layer 115B having a thickness of 1 m.
  • a stamper duplicated by 2P method on the surface of the relief forming layer is attached to the embossing roller of the duplicating apparatus, and heated and pressed (embossed) with the opposing roller to make fine Relief that has uneven pattern force was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • a 500 nm thick aluminum thin film is formed on the relief surface of the relief forming layer 115B by vacuum deposition to produce a multi-pattern glitter film as the reflective layer 117B, and slit to a width of 1.5 mm with a precision micro slitter machine.
  • a multi-design glittering thread 10 of Example B13 was obtained as a narrow thread.
  • the multi-design glitter thread 110 had an overall thickness of about 8 / zm, and one surface could be a bright image with one surface being a hologram and the other surface being a diffraction grating.
  • Example B13 Using the multi-pattern glitter thread produced in Example B13, apply a two-component curable polyurethane adhesive to the reflective layer 117B surface by the dry via coating method so that the thickness after drying is 1.5 m. After drying, using Lumirror 6CF53 (product name: PET film product), 6 ⁇ m thick as the protective substrate 30, the protective substrate 30 and the adhesive layer of the urethane adhesive are overlapped. After pressurizing and leaving at 40 ° C for 3 days, slitting to a width of 1.5 mm with a precision micro slitter machine, and making it a narrow thread, the multiple design glittering thread of Example B 14 Red 110 was obtained.
  • Lumirror 6CF53 product name: PET film product
  • the multi-design glitter thread 110 had an overall thickness of approximately 8 m, and a bright glitter pattern could be observed brightly on one side of the hologram and on the other side of the diffraction grating. Further, this thread has good durability because the second support base material acts as a protective base material and the reflective layer 117B is coated.
  • the multi-design glittering thread 110 obtained in Examples Bl to 14 is incorporated into the stock.
  • NBK P20 parts by mass and LBKP80 parts by mass were beaten, and 10 parts by mass of white clay, 0.3 part by mass of paper strength enhancer, 1.0 part by mass of sizing agent, and an appropriate amount of sulfuric acid band were added to prepare a stock.
  • two layers are combined with a two-tank circular paper machine at a papermaking speed of 50 mZ. At this time, the thread produced as described above was flowed to a predetermined position with the hologram surface as the surface.
  • the wet paper was dehydrated according to a known general method and dried with a dryer, so that the thread was attached to the base paper 101, and the anti-counterfeit paper which is the glittering multi-pattern formation 100 of the present invention was manufactured. .
  • the obtained anti-counterfeit paper had a thread embedded in the base paper layer in the paper flow direction with the thread surface exposed! Holograms can be seen on the thread surface of the anti-counterfeit paper, and when the thread is forcibly peeled off, the diffraction grating is visually recognized on the back surface of the multi-pattern glitter thread 110 produced in Examples B1 to B14. It was possible to clearly observe different glitter patterns on both sides. In addition, when copying with a color copier, the hologram and copy of the thread that has the unique brightness of one hologram are completely different, and the other diffraction grating also has a unique brightness and both sides can be judged at a glance. It was.
  • the reflective layer 117B was not exposed on the surface but was covered with the protective layer 125, and the durability was further improved.
  • this thread has good durability because the second support base material acts as a protective base material.
  • Example B1 Incorporate the multi-design glitter thread 110 obtained in Example B1 into the stock, except that the surface of the thread is exposed and the stock on the back of the thread is shaded in the flow direction.
  • anti-counterfeit paper which is a glittering multiple-pattern formation 100, was produced.
  • the obtained anti-counterfeit paper has a hologram on the thread surface, and a thin part of the material on the back with a glittering diffraction grating. I was able to observe exactly.
  • the anti-counterfeit paper which is a multi-design glittering product, was produced using the multi-design glitter thread obtained in Reference Example B1 in the same manner as in Example B10.
  • the thread portion has a hump shape, and the hump force is generated.
  • the thread portion swelled and lacked a sense of unity as anti-counterfeit paper.
  • the reactive organism (A) was produced by the following procedure.
  • 0.38 g of hydroquinone monomethyl ether, 249.3 g of pentaerythritol tritalylate (product of Osaka Organic Chemical Industry Co., Ltd., Biscoat 300) and 0.38 g of dibutyltin dilaurate were charged.
  • An ionizing radiation-curable resin composition B was prepared by adding the reaction product (A), a film-forming resin, a photopolymerization initiator, and a solvent in the following composition.
  • Reactive organism (A) 24 parts by weight
  • Film-forming resin (methacrylic resin: Kuraray product Norapet GF) 6 parts by weight Photopolymerization initiator (Irgacure 184) 0.9 parts by weight
  • Lumirror 6CF53 manufactured by Torayen clay, trade name of PET film having a thickness of 6 ⁇ m was used as the base material 311.
  • the above-mentioned ionizing radiation curable resin composition M was applied to one surface of the substrate 311 with a gravure reverse coater and dried at 100 ° C. to form a relief forming layer 315A having a thickness of 1 m. .
  • a stamper duplicated by the 2P method from the rainbow hologram (pattern 1: repeated pattern of the character string “abc”) by the two-beam method is attached to the relief forming layer surface to the emboss roller of the duplicating apparatus, and the opposite roller.
  • a relief with a fine concavo-convex pattern was formed by hot pressing (embossing). Immediately after shaping, it was cured by irradiating ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 315A by a vacuum deposition method to obtain a metal thin film layer 317A.
  • Byron 200 (polyester resin product name, manufactured by Toyobo Co., Ltd.) was applied to the 317A surface of the metal thin film layer with a gravure reverse coater and dried at 100 ° C to a thickness of 0.5 ⁇ m.
  • the interlaminar primer layer 321B is formed, and the surface of the interlayer primer layer 321B is further coated with the above-mentioned ionizing radiation curable resin composition M with a gravure reverse coater and dried at 100 ° C to obtain a thickness.
  • m relief forming layer 315B was formed.
  • a stamper duplicated by the 2P method from the rainbow hologram (pattern 2: repeated pattern of the character string “xyz”) by the two-beam method is attached to the relief forming layer surface to the embossing roller of the duplicating device and opposed.
  • Heat relief was performed between the rollers to form a relief with a fine uneven pattern force.
  • it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • An aluminum thin film (metal thin film layer 317B) having a thickness of 500 nm was formed on the relief surface of the relief forming layer 315B by vacuum deposition.
  • the glittering film 310 of Example C1 was obtained.
  • a glittering film 310 was obtained in the same manner as in Example C1, except that a 12-m PET film was used as the substrate.
  • a glittering film 310 was obtained in the same manner as in Example C1, except that a 16 m PET film was used as the substrate. [0276] (Example C4)
  • a glittering film 310 was obtained in the same manner as in Example C1, except that the ionizing radiation curable resin composition A was used as the ionizing radiation curable resin composition.
  • a glittering film 310 was obtained in the same manner as in Example C4, except that a 12 m PET film was used as the substrate.
  • a glittering film 310 was obtained in the same manner as in Example C4, except that a 16 m PET film was used as the substrate.
  • Example C 1 Metallic thin film layer 310 of the glittering film 310
  • the above-mentioned ionizing radiation curable resin composition A was applied to the 317B surface with a gravure reverse coater, dried at 100 ° C, and a thickness of 0.5 ⁇ m.
  • m protective layer 325 was formed.
  • Example C 1 After coating and drying a two-component curable polyurethane adhesive on the 317B surface with a gravure coat method so that the thickness after drying is 1.5 m. , Using Lumirror 6CF53 (product name: PET film product made by Torayen clay) with a thickness of 6 m as the base material 301, the base material 301 and the polyurethane adhesive were overlapped and pressurized, and then at 40 ° C for 3 days This was allowed to stand to obtain a glittering film of Example C8.
  • Lumirror 6CF53 product name: PET film product made by Torayen clay
  • Lumirror 6CF53 manufactured by Torayen clay, trade name of PET film having a thickness of 6 ⁇ m was used as the base material 311.
  • the ionizing radiation curable resin composition B described above is applied to one surface of the substrate 311 with a gravure reverse coater and dried at 100 ° C. to form a relief forming layer 315A having a thickness of 1 m. Formed.
  • a stamper duplicated by the 2P method from the rainbow hologram (pattern 1: repeated pattern of the character string “abc”) by the two-beam method is attached to the relief forming layer surface to the emboss roller of the duplicating apparatus, and the opposite roller.
  • a relief with a fine concavo-convex pattern was formed by hot pressing (embossing). Immediately after shaping, it was cured by irradiating ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 315A by a vacuum deposition method to obtain a metal thin film layer 317A.
  • Byron 200 (polyester resin product name, manufactured by Toyobo Co., Ltd.) was applied to the 317A surface of the metal thin film layer with a gravure reverse coater and dried at 100 ° C to a thickness of 0.5 ⁇ m.
  • m-layer primer layer 321B was formed, and the surface of the interlayer primer layer 321B was further coated with ionizing radiation curable resin composition A with a gravure reverse coater and dried at 100 ° C to obtain a thickness of 1 m.
  • a relief forming layer 315B was formed.
  • the rainbow hologram (pattern 2: repeated pattern of character string “xyz”) force by the two-beam method is applied to the relief forming layer surface, and the stamp duplicated by the 2P method is attached to the embossing roller of the duplicating apparatus and opposed.
  • a relief (positive pattern) with a fine uneven pattern force was formed by heating (embossing) between the rollers.
  • it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • a 300 nm thick titanium oxide thin film was formed on the relief surface of the relief forming layer 315B by vacuum deposition to form a metal thin film layer 317B.
  • the glittering film 310 of Example C9 was obtained.
  • Example C9 When the glitter film 310 of Example C9 was observed through the base material (PET), a repeated pattern (positive pattern) of the character string “abc” was observed as shown in FIG. When observed from the opposite side, a repetitive pattern (negative pattern) of the character string “abc” was observed over a repetitive pattern (positive pattern) of the character string “xyz”. Two patterns on the front and one pattern on the back were observed, and the hologram was extremely high in design. A good reproduction that could not be taken off was obtained.
  • the above-mentioned ionizing radiation curable resin composition B was applied to the PET surface opposite to the first metal thin film layer 317A using a gravure river coater. It was applied and dried at 100 ° C. to form a third relief forming layer 315C having a thickness of 1 ⁇ m. Next, a rainbow hologram (pattern 3: text) by the two-beam method is applied to the relief forming layer surface.
  • a stamper duplicated by the 2P method is attached to the embossing roller of the duplicating machine, and is heated and pressed (embossed) with the opposite roller to provide a relief with fine concave and convex pattern force.
  • a metal thin film layer 317C was formed by forming a 500 nm thick aluminum thin film on the relief surface of the third relief forming layer 315C by vacuum deposition.
  • Example C10 When the glitter film 310 of Example C10 was observed from the third relief forming layer 315C side, a repeated pattern of the character string “ghi” was observed as shown in FIG. When observed from the opposite side, a repetitive pattern (negative pattern) of the character string “abc” was observed over a repetitive pattern (positive pattern) of the character string “xyz”. A good reproduction that could not be removed was obtained.
  • Byron 200 (manufactured by Toyobo Co., Ltd., trade name for polyester resin) was applied to the third metal thin film layer 317C of the glittering film 310 of Example C8 and dried at 100 ° C using a gravure reverse coater. Then, a second interlayer primer layer 321D having a thickness of 0.5 m was formed, and the above-mentioned ionizing radiation curable resin composition M was further applied to the second interlayer primer layer 321D surface with a gravure river scooter. Then, it was dried at 100 ° C. to form a fourth relief forming layer 315D having a thickness of 1 ⁇ m.
  • a stamper copied by the 2P method from a rainbow hologram (pattern 4: repetitive pattern of the pattern “star”) by the two-beam method is attached to the relief forming layer surface to the embossing roller of the copying apparatus, and the opposite roller
  • a relief with a fine concave / convex pattern force was formed by hot pressing (embossing).
  • it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp.
  • a fourth titanium thin film layer 317D was formed by forming a 300 nm thick transparent titanium oxide thin film on the relief surface of the fourth relief forming layer 315D by vacuum deposition.
  • Example C11 When the glittering film 310 of Example C11 is observed from the fourth relief forming layer 315D side, the repeated pattern of the character string “ghi” is observed over the repeated pattern of the pattern “star” as shown in FIG. It was done. When observed from the opposite side, the repeated pattern (negative pattern) of the character string “abc” is observed over the repeated pattern (positive pattern) of the character string “xyz”. It was. A good reproduction that could not be taken off was obtained.
  • the glitter film 310 obtained in Examples C1 to C11 is incorporated into a paper stock.
  • NBKP20 parts by mass and LBKP80 parts by mass were beaten, and a stock was prepared by adding 10 parts by mass of white clay, 0.3 parts by mass of paper strength enhancer, 1.0 part by mass of sizing agent, and a sulfuric acid band.
  • two layers are combined with a two-tank type circular paper machine at a papermaking speed of 50 mZ.
  • the thread produced as described above was flowed to a predetermined position with the hologram surface as the surface.
  • the wet paper was dehydrated according to a known general method and dried with a drier, so that the thread adhered to the base paper 301, and the anti-counterfeit paper, which is the glitter pattern formation 300 of the present invention, was produced.
  • the obtained anti-counterfeit paper had the thread surface exposed, and the thread was embedded in the base paper layer in the paper flow direction!
  • the glitter surface of the anti-counterfeit paper was clearly observed with different glittering patterns on both sides described in each example.
  • the hologram and copy of the thread that has the unique brightness of one of the holograms was completely different, and the authenticity of both sides could be judged at a glance.

Abstract

There is provided a multi-pattern bright film capable of obtaining a special bright design and optical effect such as a hologram and diffraction grating by arranging two different bright patterns. The film can be easily manufactured at a low cost. The film has at least a first bright pattern and a second bright pattern which is different from the first bright pattern.

Description

明 細 書  Specification
複数図柄光輝性フィルム、複数図柄光輝性スレッドおよびそれらを用いた 光輝性複数図柄形成物  Multi-design glitter film, multi-design glitter thread and glitter multi-pattern formation using them
技術分野  Technical field
[0001] 本発明は、複数図柄光輝性フィルムないしスレッドに関し、さらに詳しくは、複数の 光輝性図柄を有し、特異な意匠性、及び Z又はセキュリティ性を有する複数図柄光 輝性フィルムな 、しスレッド、及びそれらを用いた光輝性複数図柄形成物に関するも のである。  [0001] The present invention relates to a multi-design glitter film or thread, and more specifically, a multi-design glitter film having a plurality of glitter designs, a unique design, and Z or security. The present invention relates to a thread and a glittering multi-patterned product using them.
[0002] 本明細書において、配合を示す「比」、「部」、「％」などは特に断わらない限り質量 基準であり、「z」印は一体的に積層されていることを示す。  In the present specification, “ratio”, “part”, “%” and the like indicating the composition are based on mass unless otherwise specified, and the “z” mark indicates that they are integrally laminated.
[0003] また、「光輝性」とは、レリーフ形状がヘアライン柄、万線柄、マット柄、ホログラム及 び z又は回折格子であるでのようなマイクロオーダのレリーフ形状で、反射層との作 用で、特異な光学的な意匠性を有する効果をいう。  [0003] In addition, "brilliance" is a micro-order relief shape in which the relief shape is a hairline pattern, a line pattern, a mat pattern, a hologram, and a z or diffraction grating. It means the effect of having a unique optical design.
[0004] さらに、「第 1基材 11Aと第 2基材 11Bとを」合わせて、「基材 11」と呼称し、他の層も 同様とする。  [0004] Furthermore, "first base material 11A and second base material 11B" are collectively referred to as "base material 11", and the same applies to the other layers.
[0005] さらにまた、シート又はフィルムの JIS— K6900— 1994での定義では、シートとは 薄く一般にその厚さが長さと幅の割りには小さい平らな製品をいい、フィルムとは長さ 及び幅に比べて厚さが極めて小さぐ最大厚さが任意に限定されて 、る薄 、平らな 製品で、通例、ロールの形で供給されるものをいう。従って、シートの中でも厚さの特 に薄いものがフィルムであるといえる力 シートとフィルムの境界は定かではなぐ明 確に区別しにくいので、本明細書ではシートとフィルムの両方を含めて「フィルム」と 定義する。  [0005] Furthermore, according to the definition of JIS-K6900-1994 for sheets or films, a sheet is a thin and generally a flat product whose thickness is small relative to the length and width, and a film is a length and width. This is a thin, flat product, usually supplied in the form of a roll, with a maximum thickness that is extremely small compared to the thickness. Therefore, it can be said that the film is particularly thin in the thickness of the sheet. Since the boundary between the sheet and the film is not clear, it is difficult to clearly distinguish between the sheet and the film. ".
背景技術  Background art
[0006] (主なる用途） [0006] (Main applications)
本発明の複数図柄光輝性フィルムな 、しスレッド、及び該複数図柄光輝性フィルム ないしスレッドを用いて、該複数図柄光輝性フィルムの少なくとも 1部を、被転写体へ 貼着や漉き込みなどで移行させた光輝性複数図柄形成物の主なる用途としては、例 えば、紙幣、株券、証券、証書、商品券、小切手、手形、人場券、通帳類、ギフト券、 乗車券、車馬券、印紙、切手、鑑賞券、入場証、通行証、チケット等の金券類、キヤッ シュカード、クレジットカード、 IDカード、プリペイドカード、メンバーズカード、 ICカー ド、光カードなどのカード類、グリーティングカード、ハガキ、名刺、運転免許証、 ス ポート等の各種証明書やその証明写真類、カートン、ケース、軟包装材などの包装 材類、バッグ類、帳票類、封筒、タグ、 OHPシート、スライドフィルム、しおり、書籍、雑 誌、カレンダー、ポスター、パンフレット、プリントクラブ (登録商標）、メニュー、パスポ ート、 POP用品、コースター、ディスプレイ、ネームプレート、キーボード、化粧品、腕 時計、ライター等の装身具、文房具、下敷き、レポート用紙など文具類、建材、パネ ル、エンブレム、キー、布、衣類、履物、ラジオ、テレビ、電卓、 OA機器等の装置類、 各種見本帳、アルバム、また、コンピュータグラフィックスの出力、医療画像出力など がある。し力しながら、光輝性を有する特異な意匠性、及び Z又はセキュリティ性を必 要とする用途であれば、特に限定されるものではない。 Using the multi-design glitter film or thread of the present invention and the multi-design glitter film or thread, at least a part of the multi-design glitter film is transferred to the transfer object by sticking or squeezing. Examples of main uses of the glittered multi-pattern formation For example, banknotes, stock certificates, securities, certificates, gift certificates, checks, bills, hall tickets, passbooks, gift certificates, boarding tickets, car horse tickets, stamps, stamps, appreciation tickets, entrance certificates, passports, tickets, etc. Cards such as cash cards, credit cards, ID cards, prepaid cards, members cards, IC cards, optical cards, greeting cards, postcards, business cards, driver's licenses, sports certificates, etc. Packaging materials such as cartons, cases, flexible packaging materials, bags, forms, envelopes, tags, transparencies, slide films, bookmarks, books, magazines, calendars, posters, brochures, print clubs (registered trademark) , Menus, passports, POP supplies, coasters, displays, nameplates, keyboards, cosmetics, wrist watches, lighters, accessories, sentences Stationery such as furniture, underlay, report paper, building materials, panels, emblems, keys, cloth, clothing, footwear, radio, television, calculator, office equipment, various sample books, albums, and computer graphics Output and medical image output. However, there is no particular limitation as long as it is a use that requires a unique design with glitter and Z or security.
[0007] (背景技術） [0007] (Background technology)
従来、金券類、カード類、及び各種証明書類などは、資格証明や一定の経済的価 値や効果を持っため、不正に偽造、変造、不正使用することが絶えない。特に、カラ 一コピー機の精度向上が著しぐ各種の媒体類の偽造を容易にしている。  Conventionally, vouchers, cards, and various certificates have qualifications and certain economic values and effects, so they are constantly counterfeited, altered, and illegally used. In particular, it has facilitated the forgery of various media that are markedly improved by color copying machines.
[0008] これを防止するため各種の偽造防止手段が施されている。光輝性、特にホログラム 、回折格子などのレリーフ形状を有する転写箔は、特異な装飾像や立体像を表現で きる意匠性と、これらホログラムや回折格子は高度な製造技術を要し、容易に製造で きないことから、偽造防止としてセキュリティー性の向上に利用されている。  In order to prevent this, various forgery prevention means are provided. Transfer foil with relief, especially holograms and diffraction gratings, has a design that can express unique decorative images and three-dimensional images, and these holograms and diffraction gratings require advanced manufacturing technology and are easily manufactured. Since it cannot be used, it is used to improve security to prevent forgery.
[0009] し力しながら、これらの光輝性は片側のみであり、さらなる意匠性とセキュリティ性を 向上するために、複数の図柄を有する複数図柄光輝性フィルムはなぐまた、製造が 容易で低コストであることが求められている。また、複数の図柄を有する複数図柄光 輝性スレッドは従来なぐ用紙との一体感に優れ、さらに、製造が容易で低コストのも のが求められている。  [0009] However, these glitters are only on one side, and in order to further improve the design and security, a multi-design glitter film having a plurality of designs is not available. It is required to be. In addition, a multi-design glittering thread having a plurality of designs is required to be excellent in the sense of unity with conventional paper, and to be easy to manufacture and low-cost.
[0010] また、意匠性とセキュリティ性を向上するために、光輝性に優れた複数の図柄を有 し、かつ、総厚さが極めて薄くて、被転写体ゃ抄き込み用紙との一体感に優れ、さら に、省資源で、製造が容易であることが求められている。 [0010] In addition, in order to improve design and security, it has a plurality of patterns with excellent brilliancy, and the total thickness is extremely thin. Excellent and even In addition, it is required to save resources and be easy to manufacture.
[0011] (先行技術）  [0011] (prior art)
従来、偽造防止用紙に窓を設け、ホログラムを有するスレッドを表裏両方の面から 見えるようにするものが知られている（例えば、特許文献 1参照。 ) oしかしながら、両 側から観察できる力 ホログラム図柄は単一であるという問題点がある。  Conventionally, it is known that a forgery prevention paper is provided with a window so that a thread having a hologram can be seen from both front and back surfaces (for example, see Patent Document 1). However, force that can be observed from both sides Hologram design Has the problem of being single.
[0012] また、片面に金属蒸着膜を形成したホログラフィックフィルムを 2枚、この金属蒸着 膜を内側にして接着剤を用いて貼合わせた積層フィルムを細幅に裁断する両面光 輝性ホログラム装飾糸が知られている（例えば、特許文献 2参照。 )0しかしながら、表 裏の発色性及び立体感の差をなくし、また、金属薄膜の腐食を防止するために、本 願の課題とは全く異なる課題を解消するために、単一図柄の 2枚のフィルムを背中合 わせに貼合して、金属薄膜がフィルムで挟んだ両面光輝性ホログラム装飾糸であり、 実施例からも同一図柄の 2枚を用いており、同じ図柄を用いていることは明らかであ る。 [0012] Also, a double-sided bright hologram decoration in which two holographic films each having a metal vapor-deposited film formed on one side and a laminated film laminated using an adhesive with the metal vapor-deposited film on the inside are cut into narrow widths yarns are known (e.g., see Patent Document 2.) 0 However, eliminating the difference of the table back chromogenic and three-dimensional effect, also, in order to prevent corrosion of the metal thin film, completely the problem of the present Application In order to solve different problems, this is a double-sided glittering hologram decorative yarn in which two films of a single design are bonded back to back and a metal thin film is sandwiched between the films. It is clear that they use the same design.
[0013] さらに、片側に 2層のレリーフ形成層を有する転写箔が知られている（例えば、特許 文献 3参照。 )0し力しながら、該 2層のレリーフ形成層は、透明ホロと金属ホロの組み 合せのため、 2つのホログラム再生像を片側より観察するものである。 [0013] In addition, the transfer foil having a relief forming layer of the two layers are known to one side (e.g., see Patent Document 3.) While 0 tooth force, the two-layer relief-forming layer is transparent holo metal Two hologram reconstructed images are observed from one side for the combination of horo.
[0014] さらにまた、本出願人も、光輝性スレッドを基紙から間欠的に露出する表出部と被 覆部  [0014] Furthermore, the present applicant also discloses an exposed portion and a covered portion that intermittently expose the glittering thread from the base paper.
とを設ける偽造防止用紙を開示している (例えば、特許文献 4参照。 )0しかしながら、 用紙の端面を見なくても偽造品であるかどうかを判断でき、同時に光輝性スレッドが 基紙力も剥がれに《するためのものである。いずれの先行技術も、表裏面より所望 の異なる図柄を観察することにつ!/、ては記載も示唆もされて!/、な 、。 (For example, see Patent Document 4.) 0 However, it is possible to determine whether the paper is a counterfeit product without looking at the edge of the paper, and at the same time, the glittering thread peels off the base paper strength. It is intended for Both of the prior arts have been observed and suggested to observe different desired patterns from the front and back surfaces! /.
[0015] ところで、従来、片面に金属蒸着膜を形成したホログラフィックフィルムを 2枚、この 金属蒸着膜を内側にして接着剤を用いて貼合わせた積層フィルムを細幅に裁断す る両面光輝性ホログラム装飾糸が知られている (例えば、特許文献 2参照。 )0しかし ながら、表裏の発色性及び立体感の差をなくし、また、金属薄膜の腐食を防止するた めに、本願の課題とは全く異なる課題を解消するために、単一図柄の 2枚のフィルム を背中合わせに貼合して、金属薄膜がフィルムで挟んだ両面光輝性ホログラム装飾 糸であり、実施例からも同一図柄の 2枚を用いており、同じ図柄を用いていることは明 らかである。 [0015] By the way, two-sided glitter that conventionally cuts two laminated holographic films with a metal vapor-deposited film on one side and a laminated film laminated with an adhesive with the metal vapor-deposited film on the inside. hologram decoration yarn is known (e.g., see Patent Document 2.) 0 However, eliminating the difference between the front and back of chromogenic and three-dimensional effect, also, in order to prevent corrosion of the metal thin film, the present challenges and In order to solve a completely different problem, a double-sided glitter hologram decoration in which two films of a single pattern are bonded back to back and a metal thin film sandwiched between the films It is a thread, and two pieces of the same design are used from the examples, and it is clear that the same design is used.
[0016] さらに、片側に 2層のレリーフ形成層を有する転写箔が知られている（例えば、特許 文献 3参照。 )0し力しながら、同一面に異なるパターンで 2回エンボスする転写箔の 製造方法に関する特許であり、両面光輝性という事に関する記載はない。 [0016] In addition, the transfer foil having a relief forming layer of the two layers on one side is known (e.g., see Patent Document 3.) 0 with teeth force, the transfer foil embossing twice with different patterns on the same surface It is a patent relating to a manufacturing method, and there is no description regarding the double-sided glitter.
[0017] さらにまた、本出願人も、光輝性スレッドを基紙から間欠的に露出する表出部と被 覆部とを設ける偽造防止用紙を開示している (例えば、特許文献 4参照。 )0しかしな がら、用紙の端面を見なくても偽造品であるかどうかを判断でき、同時に光輝性スレツ ドが基紙力も剥がれにくくするためのものである。 [0017] Furthermore, the present applicant has also disclosed a forgery prevention paper provided with an exposed portion and a covering portion that intermittently expose the glittering thread from the base paper (see, for example, Patent Document 4). 0 However Na husk, even without looking at the end surface of the paper can determine whether the counterfeit is for hard to peel off simultaneously glitter Suretsu de groups paper strength.
[0018] エンボス加工は片面エンボスで十分である力 両面エンボスでもよいとの記載が知 られている（例えば、特許文献 5参照)。し力しながら、両面エンボスに関してこれ以上 の具体的な説明はなされておらず、また、エンボスする絵柄に関してはなんら示唆さ れていない。両面エンボスの明確な意味は記載されておらず、両面にレリーフパター ンが形成されているか明確ではない。いずれの先行技術も、表裏面に異なる図柄の 光輝性図柄を有することについては記載も示唆もされていない。また、総厚さも厚ぐ 偽造防止用紙としての一体感に欠けるものであった。  [0018] It is known that embossing may be a double-sided embossing that is sufficient with single-sided embossing (see, for example, Patent Document 5). However, there is no further explanation about double-sided embossing, and there is no suggestion about the embossed pattern. The clear meaning of double-sided embossing is not described, and it is not clear whether a relief pattern is formed on both sides. None of the prior art describes or suggests that the front and back surfaces have different brilliant designs. In addition, the total thickness was too thick to lack a sense of unity as anti-counterfeit paper.
特許文献 1 :特開 2001- 172897号公報  Patent Document 1: JP 2001-172897
特許文献 2：特開平 06-257028号公報  Patent Document 2: Japanese Patent Laid-Open No. 06-257028
特許文献 3 :特開平 07-199781号公報  Patent Document 3: Japanese Patent Application Laid-Open No. 07-199781
特許文献 4:特開平 10-71759号公報  Patent Document 4: Japanese Patent Laid-Open No. 10-71759
特許文献 5 :特開 2001—31729号公報  Patent Document 5: JP 2001-31729 A
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0019] 本発明は上記のような従来技術の問題点を解消するためになされたものである。 The present invention has been made to solve the above-described problems of the prior art.
[0020] 第 1の本発明は、 2つの異なる光輝性の模様及び/又は図柄を設けることで、ホロ グラムや回折格子などの特異な光輝性意匠や光学的な効果が得られ、製造が容易 で低コストである複数図柄光輝性フィルムならびにこれを用いた光輝性複数図柄形 成物を提供することに向けられたものである。 [0021] さらに第 2の本発明は、 2つの異なる光輝性の模様及び Z又は図柄を設けることで 、ホログラムや回折格子などの特異な光輝性意匠や光学的な効果、及び Z又はセキ ユリティ性が得られ、用紙との一体感に優れ、製造が容易で低コストである複数図柄 光輝性スレッドを提供することに向けられたものである。 [0020] The first aspect of the present invention provides a unique glitter design such as a hologram and a diffraction grating and an optical effect by providing two different glitter patterns and / or patterns, and is easy to manufacture. The present invention is directed to providing a multi-design glitter film having low cost and a multi-design glitter composition using the same. [0021] Furthermore, the second aspect of the present invention provides a unique glitter design such as a hologram or a diffraction grating, an optical effect, and Z or security by providing two different glitter patterns and Z or patterns. The present invention is directed to providing a multi-pattern glitter thread that is excellent in unity with paper, easy to manufacture, and low in cost.
[0022] さらに、第 3の本発明は、複数図柄のいずれもが、榭脂の剥れ、いわゆる「版取られ  [0022] Further, according to the third aspect of the present invention, all of the plurality of patterns are peeled off of the grease, so-called “plate removal”.
(柄ヌケ)」を起こさない光輝性に優れる複数光輝性図柄を有し、基材が 1枚でよく省 資源であり、総厚さが極めて薄ぐ被転写体ゃ抄き込み用紙との一体感に優れた光 輝性フィルム、及びそれを用いた光輝性図柄形成物を提供することに向けられたも のである。  It has multiple glitter patterns that do not cause `` pattern removal '', has only one base material, is resource-saving, and has a total thickness that is extremely thin. The present invention is directed to providing a brilliant film excellent in bodily sensation, and a brilliant pattern formation using the same.
課題を解決するための手段  Means for solving the problem
[0023] 第 1の発明 [0023] First invention
上記の課題を解決するために、本発明に係る複数図柄光輝性フィルムは、少なくと も光輝性の第 1図柄及び光輝性の第 2図柄を有し、前記第 1図柄と前記第 2図柄の 図柄が異なっているように、したものである。  In order to solve the above-mentioned problems, the multi-design glitter film according to the present invention has at least the first design of glitter and the second design of glitter, and the first design and the second design of the second design. The design is different.
[0024] さらに本発明に係る複数図柄光輝性フィルムは、上記第 1図柄及び第 2図柄の図 柄がヘアライン柄、万線柄、マット柄、ホログラム及び Z又は回折格子であるように、 したものである。 [0024] Further, the multi-design glitter film according to the present invention is such that the design of the first design and the second design is a hairline design, a line design, a mat design, a hologram and Z or a diffraction grating. It is.
[0025] さらに、他の態様に係る本発明に係る複数図柄光輝性フィルムは、少なくとも第 1レ リーフ形成層及び第 1反射層を有する第 1光輝性フィルムと、少なくとも第 2レリーフ 形成層及び第 2反射層を有する第 2光輝性フィルムとを、前記第 1反射層面と前記第 2反射層面とを接着層を介して積層されてなり、前記第 1レリーフ形成層と前記第 2レ リーフ形成層に形成されて 、るレリーフ形状が異なって 、るように、したものである。  [0025] Further, the multi-pattern glitter film according to the present invention according to another aspect includes a first glitter film having at least a first relief formation layer and a first reflection layer, at least a second relief formation layer, and a first relief film. A second glittering film having two reflective layers is formed by laminating the first reflective layer surface and the second reflective layer surface via an adhesive layer, and the first relief forming layer and the second relief forming layer. The relief shape is different so that it is formed.
[0026] さらに他の態様に係る本発明に係る複数図柄光輝性フィルムは、少なくとも第 1基 材、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィルムと、少なくとも第 2 基材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィルムとを、前記第 1 反射層面と前記第 2反射層面とを接着層を介して積層されてなり、前記第 1レリーフ 形成層と前記第 2レリーフ形成層に形成されて!ヽるレリーフ形状が異なって ヽるように 、したものである。 [0027] さらに他の態様に係る本発明に係る複数図柄光輝性フィルムは、少なくとも第 1基 材、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィルムと、少なくとも第 2 基材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィルムとを、前記第 1 基材面と前記第 2基材面とを接着層を介して貼合してなり、前記第 1レリーフ形成層と 前記第 2レリーフ形成層に形成されて!、るレリーフ形状が異なって 、るように、したも のである。 [0026] The multi-pattern glitter film according to the present invention according to still another aspect includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate. And a second glittering film having a second relief forming layer and a second reflecting layer, the first reflecting layer surface and the second reflecting layer surface being laminated via an adhesive layer, and the first relief forming layer. And the relief shapes formed in the second relief forming layer are different from each other. [0027] The multi-pattern glitter film according to the present invention according to still another aspect includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate. A second glittering film having a second relief forming layer and a second reflective layer, the first substrate surface and the second substrate surface being bonded via an adhesive layer, the first The relief forming layer and the second relief forming layer are formed in different relief shapes.
[0028] さらに他の態様に係る本発明に係る複数図柄光輝性フィルムは、少なくとも第 1基 材、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィルムと、少なくとも第 2 基材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィルムとを、前記第 1 反射面と前記第 2基材面とを接着層を介して貼合してなり、前記第 1レリーフ形成層と 前記第 2レリーフ形成層に形成されて!、るレリーフ形状が異なって 、るように、したも のである。  [0028] The multi-pattern glitter film according to the present invention according to still another embodiment includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate. A second glittering film having a second relief forming layer and a second reflective layer, the first reflective surface and the second substrate surface being bonded via an adhesive layer, and the first relief Formed on the forming layer and the second relief forming layer, the relief shapes are different from each other.
[0029] さらに他の態様に係る本発明に係る複数図柄光輝性フィルムは、第 1基材と、該第 1基材の一方の面へ、少なくとも第 1レリーフ形成層及び第 1反射層を有し、他方の面 へ、少なくとも第 2レリーフ形成層及び第 2反射層を有してなり、前記第 1レリーフ形成 層と前記第 2レリーフ形成層に形成されて!、るレリーフ形状が異なって 、るように、し たものである。  [0029] Further, the multi-pattern glittering film according to the present invention according to another aspect has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. And the other surface has at least a second relief forming layer and a second reflective layer, and is formed in the first relief forming layer and the second relief forming layer! It is like that.
[0030] さらに他の態様に係る本発明に係る複数図柄光輝性フィルムは、第 1基材と、該第 1基材の一方の面へ、少なくとも第 1レリーフ形成層及び第 1反射層を有し、さらに該 第 1反射層面へ、少なくとも第 2レリーフ形成層及び第 2反射層を設けてなり、前記第 1レリーフ形成層と前記第 2レリーフ形成層に形成されているレリーフ形状が異なって いるように、したものである。  [0030] The multi-pattern glittering film according to the present invention according to still another aspect has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. Further, at least the second relief forming layer and the second reflecting layer are provided on the first reflecting layer surface, and the relief shapes formed in the first relief forming layer and the second relief forming layer are different. As you can see.
[0031] さらに他の態様に係る本発明に係る複数図柄光輝性フィルムは、上記第 1レリーフ 形成層及び第 2レリーフ形成層の形成されているレリーフ形状がヘアライン柄、万線 柄、マット柄、ホログラム及び Z又は回折格子であるようなマイクロオーダのレリーフ 形状あるように、したものである。  [0031] Further, in the multi-pattern glittering film according to the present invention according to another aspect, the relief shape in which the first relief forming layer and the second relief forming layer are formed has a hairline pattern, a line pattern, a mat pattern, A micro-order relief shape such as a hologram and a Z or diffraction grating.
[0032] さらに他の態様に係る本発明に係る複数図柄光輝性フィルムは、上記第 1反射層 及び Z又は第 2反射層が金属層及び Z又は透明反射層であるように、したものであ る。 [0032] A multi-pattern glittering film according to the present invention according to yet another aspect is such that the first reflective layer and Z or the second reflective layer are a metal layer and Z or a transparent reflective layer. The
[0033] さらに他の態様に係る本発明に係る複数図柄光輝性フィルムは、上記いずれかに 記載の複数図柄光輝性フィルムにおいて、少なくとも層間及び Z又は表面に、基材 [0033] The multi-pattern glitter film according to the present invention according to yet another aspect is the multi-pattern glitter film according to any one of the above, wherein at least the interlayer and the Z or the surface have a substrate
、他の層及び Z又は印刷を設けてなるように、したものである。 Other layers and Z or printing are provided.
[0034] さらに他の態様に係る本発明に係る光輝性複数図柄形成物は、上記いずれか〖こ 記載の複数図柄光輝性フィルムを用いて、少なくとも 1部に光輝性の複数図柄を設 けてなるように、したものである。 [0034] In addition, the glitter multi-pattern formed product according to the present invention according to another embodiment is provided with a plurality of glitter multi-patterns in at least one part using any one of the above-described multi-design glitter films. That's what it did.
[0035] 第 2の発明 [0035] Second invention
第 2の本発明に係る複数図柄光輝性スレッドは、少なくとも光輝性の第 1図柄と、該 第 1図柄と図柄が異なる光輝性の第 2図柄を有する複数図柄光輝性フィルムを細幅 に裁断してなるようにしたことを特徴とするものである。  The multi-design glittering thread according to the second aspect of the present invention is formed by cutting a multi-design glitter film having at least the first design of glitter and the second design of glitter having a design different from the first design into a narrow width. It is characterized by having become.
[0036] さらに他の態様に係る本発明に係る複数図柄光輝性スレッドは、少なくとも第 1基材 、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィルムと、少なくとも第 2基 材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィルムとを、前記第 1反 射層面と前記第 2反射層面とを接着層を介して積層され、前記第 1レリーフ形成層と 前記第 2レリーフ形成層に形成されているレリーフ形状が異なっている複数図柄光輝 性フィルムを細幅に裁断してなるようにしたことを特徴としたものである。  [0036] A multi-design glitter thread according to another embodiment of the present invention includes a first glitter film having at least a first base material, a first relief forming layer, and a first reflective layer, and at least a second base material. A second glittering film having a second relief forming layer and a second reflecting layer, the first reflecting layer surface and the second reflecting layer surface being laminated via an adhesive layer, and the first relief forming layer and A plurality of design glitter films having different relief shapes formed on the second relief forming layer are cut into narrow widths.
[0037] さらに他の態様に係る本発明に係る複数図柄光輝性スレッドは、少なくとも第 1基材 、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィルムと、少なくとも第 2基 材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィルムとを、前記第 1基 材面と前記第 2基材面とを接着層を介して積層され、前記第 1レリーフ形成層と前記 第 2レリーフ形成層に形成されているレリーフ形状が異なっている複数図柄光輝性フ イルムを細幅に裁断してなるようにしたことを特徴としたものである。  [0037] The multi-pattern glitter thread according to the present invention according to still another aspect includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate. A second glittering film having a second relief forming layer and a second reflective layer, the first substrate surface and the second substrate surface being laminated via an adhesive layer, and the first relief forming layer. And a plurality of design glitter films having different relief shapes formed in the second relief forming layer are cut into narrow widths.
[0038] さらに他の態様に係る本発明に係る複数図柄光輝性スレッドは、少なくとも第 1基材 、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィルムと、少なくとも第 2基 材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィルムとを、前記第 1反 射層面と前記第 2基材面とを接着層を介して積層され、前記第 1レリーフ形成層と前 記第 2レリーフ形成層に形成されて!、るレリーフ形状が異なって 、る複数図柄光輝性 フィルムを細幅に裁断してなるようにしたことを特徴としたものである。 [0038] The multi-pattern glitter thread according to the present invention according to still another aspect includes a first glitter film having at least a first substrate, a first relief forming layer, and a first reflective layer, and at least a second substrate. And a second glittering film having a second relief forming layer and a second reflecting layer, the first reflecting layer surface and the second base material surface being laminated via an adhesive layer, and the first relief forming layer. It is formed on the second relief forming layer !, and the relief shape is different. It is characterized in that the film is cut into narrow widths.
[0039] さらに他の態様に係る本発明に係る複数図柄光輝性スレッドは、第 1基材と、該第 1 基材の一方の面へ、少なくとも第 1レリーフ形成層及び第 1反射層を有し、他方の面 へ、少なくとも第 2レリーフ形成層及び第 2反射層を有してなり、前記第 1レリーフ形成 層と前記第 2レリーフ形成層に形成されているレリーフ形状が異なっている複数図柄 光輝性フィルムを細幅に裁断してなるようにしたことを特徴としたものである。  [0039] A multi-pattern glittering thread according to the present invention according to still another aspect has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. And the other surface has at least a second relief forming layer and a second reflective layer, and the plurality of designs having different relief shapes formed on the first relief forming layer and the second relief forming layer. This is characterized in that the glittering film is cut into a narrow width.
[0040] さらに他の態様に係る本発明に係る複数図柄光輝性スレッドは、第 1基材と、該第 1 基材の一方の面へ、少なくとも第 1レリーフ形成層及び第 1反射層を有し、さらに該第 1反射層面へ、少なくとも第 2レリーフ形成層及び第 2反射層を設けてなり、前記第 1 レリーフ形成層と前記第 2レリーフ形成層に形成されているレリーフ形状が異なって V、る複数図柄光輝性フィルムを細幅に裁断してなるようにしたことを特徴としたもので ある。  [0040] The multi-pattern glittering thread according to the present invention according to still another aspect has a first base material and at least a first relief forming layer and a first reflective layer on one surface of the first base material. Further, at least a second relief forming layer and a second reflecting layer are provided on the first reflecting layer surface, and the relief shapes formed in the first relief forming layer and the second relief forming layer are different. The multi-pattern glittering film is cut into narrow widths.
[0041] さらに他の態様に係る本発明に係る複数図柄光輝性スレッドは、上記第 1図柄及び 第 2図柄の図柄がヘアライン柄、万線柄、マット柄、ホログラム及び Z又は回折格子 であるように、したものである。  [0041] In the multi-design glittering thread according to the present invention according to still another aspect, the design of the first design and the second design is a hairline design, a line design, a mat design, a hologram and Z or a diffraction grating. It is what you did.
[0042] さらに他の態様に係る本発明に係る複数図柄光輝性スレッドは、全体の厚さが 4〜 40 μ mであるように、したものである。  [0042] The multi-design glittering thread according to the present invention according to yet another aspect is such that the overall thickness is 4 to 40 µm.
[0043] さらに他の態様に係る本発明に係る光輝性複数図柄形成物は、上記のいずれか に記載の複数図柄光輝性スレッドを用いて、該複数図柄光輝性スレッドを基紙の少 なくとも一方の面の表面に抄き込んでなるように、したものである。  [0043] A glittering multi-pattern formed product according to the present invention according to yet another aspect uses the multi-design glittering thread according to any one of the above, and the multi-design glittering thread is used at least on the base paper. It is made to be formed on the surface of one side.
[0044] 第 3の発明  [0044] Third invention
第 3の発明に係る光輝性フィルムは、レリーフ形成層と金属薄膜層とを 1組の光輝 性図柄層として、層間プライマ層を介して、 2組又はそれ以上の組の光輝性図柄層を 有するように、したことを特徴とするものである。  The glitter film according to the third invention has a relief forming layer and a metal thin film layer as one set of glitter pattern layers, and has two or more groups of glitter pattern layers via an interlayer primer layer. As described above, this is a feature.
[0045] さらに他の態様に係る本発明の光輝性フィルムは、少なくとも 2種の光輝性図柄を 有しているように、したものである。 [0045] Further, the glitter film of the present invention according to another embodiment has at least two kinds of glitter patterns.
[0046] さらに他の態様に係る本発明の光輝性フィルムは、上記の光輝性図柄がヘアライン 柄、万線柄、ホログラム及び Z又は回折格子であるように、したものである。 [0047] さらに他の態様に係る本発明の光輝性フィルムは、少なくとも第 1金属薄膜層、第 1 光輝性図柄を有する第 1レリーフ形成層、層間プライマ層、第 2光輝性図柄を有する 第 2レリーフ形成層、及び第 2金属薄膜層力 なるように、したものである。 [0046] The glitter film of the present invention according to still another embodiment is such that the glitter pattern is a hairline pattern, a line pattern, a hologram, Z, or a diffraction grating. [0047] The glitter film of the present invention according to still another embodiment has at least a first metal thin film layer, a first relief forming layer having a first glitter pattern, an interlayer primer layer, and a second glitter pattern. The relief forming layer and the second metal thin film layer force are formed.
[0048] さらに他の態様に係る本発明の光輝性フィルムは、少なくとも 2つの光輝性図柄が、 表側及び裏面から、それぞれ視認できるように、したものである。  [0048] The glitter film of the present invention according to another embodiment is such that at least two glitter patterns can be visually recognized from the front side and the back side, respectively.
[0049] さらに他の態様に係る本発明の光輝性フィルムは、上記層間プライマ層のガラス転 移温度が 130°C以下であるように、したものである。  [0049] The glittering film of the present invention according to still another embodiment is such that the glass transition temperature of the interlayer primer layer is 130 ° C or lower.
[0050] さらに他の態様に係る本発明の光輝性フィルムは、全体厚さが 5〜20 μ mであるよ うに、したものである。  [0050] Further, the glitter film of the present invention according to another embodiment has an overall thickness of 5 to 20 μm.
[0051] さらに他の態様に係る本発明の光輝性フィルムは、上記のいずれかの光輝性フィ ルムを用いて、少なくとも 1部に光輝性図柄を設けてなるように、したものである。 発明の効果  [0051] Further, the glitter film of the present invention according to another embodiment is one in which a glitter pattern is provided on at least a part using any one of the glitter films described above. The invention's effect
[0052] 第 1の本発明によれば、光輝性の複数図柄が観察でき、特異な意匠性と高セキユリ ティ性を有する複数図柄光輝性フィルム、並びに、これを設けた光輝性複数図柄形 成物が提供される。  [0052] According to the first aspect of the present invention, a multi-design glittering film having a unique design and high security, and a multi-splitter design having the same can be observed. Things are provided.
[0053] また、第 2の本発明によれば、複数の光輝性図柄を有する複数図柄光輝性スレッド 、並びに、これを設けた光輝性複数図柄形成物が提供される。  [0053] Further, according to the second aspect of the present invention, there are provided a multi-design glittering thread having a plurality of glitter designs, and a glitter multi-pattern formation provided with the same.
[0054] さらに、第 3の本発明によれば、複数図柄のいずれもが、榭脂の剥れ、いわゆる「版 取られ (柄ヌケ)」を起こさな 、複数光輝性図柄を有し、基材が 1枚でよく省資源であり 、総厚さが極めて薄ぐ被転写体ゃ抄き込み用紙との一体感に優れた光輝性フィル ム、並びに、これを設けた光輝性複数図柄形成物が提供される。  [0054] Further, according to the third aspect of the present invention, each of the plurality of patterns has a plurality of glittering patterns without causing detachment of the grease, so-called "printing (pattern removal)". A glittering film that is excellent in unity with the transfer material and the paper to be transferred, which has a single material and is resource-saving and has a very thin total thickness, and a glittering multiple-patterned product provided with this Is provided.
図面の簡単な説明  Brief Description of Drawings
[0055] [図 1]本発明の 1実施例を示す光輝性フィルムの断面図。 [0055] FIG. 1 is a cross-sectional view of a glitter film showing an example of the present invention.
[図 2]本発明の 1実施例を示す光輝性フィルムの断面図。  FIG. 2 is a cross-sectional view of a glitter film showing an example of the present invention.
[図 3]本発明の 1実施例を示す光輝性フィルムの断面図。  FIG. 3 is a cross-sectional view of a glitter film showing an example of the present invention.
[図 4]本発明の 1実施例を示す光輝性フィルムの断面図。  FIG. 4 is a cross-sectional view of a glitter film showing an example of the present invention.
[図 5]本発明の 1実施例を示す光輝性フィルムの断面図。  FIG. 5 is a cross-sectional view of a glitter film showing an example of the present invention.
[図 6]本発明の 1実施例を示す光輝性フィルムの断面図。 圆 7]本発明の 1実施例を示す光輝性フィルムの断面図。 FIG. 6 is a cross-sectional view of a glitter film showing one example of the present invention. [7] A cross-sectional view of a glitter film showing one embodiment of the present invention.
圆 8]本発明の 1実施例を示す光輝性複数図柄形成物の平面図及び AA断面図。 圆 9]本発明の 1実施例を示す光輝性フィルムの断面図。 8] A plan view and a cross-sectional view of AA of the glittering multiple-pattern formation according to one embodiment of the present invention. [9] A cross-sectional view of a glittering film showing one embodiment of the present invention.
[図 10]本発明の 1実施例を示す光輝性フィルムの断面図。  FIG. 10 is a cross-sectional view of a glitter film showing an example of the present invention.
圆 11]本発明の 1実施例を示す光輝性フィルムの断面図。 [11] A cross-sectional view of a glitter film showing an example of the present invention.
圆 12]本発明の 1実施例を示す光輝性フィルムの断面図。 12] A sectional view of a glittering film showing one embodiment of the present invention.
圆 13]本発明の 1実施例を示す光輝性フィルムの断面図。 13] A cross-sectional view of a glittering film showing one embodiment of the present invention.
[図 14]本発明の 1実施例を示す光輝性フィルムの断面図。  FIG. 14 is a cross-sectional view of a glitter film showing an example of the present invention.
[図 15]本発明の 1実施例を示す光輝性フィルムの断面図。  FIG. 15 is a cross-sectional view of a glitter film showing an example of the present invention.
[図 16]本発明の 1実施例を示す光輝性フィルムの断面図。  FIG. 16 is a cross-sectional view of a glitter film showing an example of the present invention.
圆 17]本発明の 1実施例を示す光輝性フィルムの断面図。 圆 17] A cross-sectional view of a glitter film showing an example of the present invention.
圆 18]本発明の 1実施例を示す光輝性フィルムの断面図。 [18] A cross-sectional view of a glitter film showing an example of the present invention.
[図 19]本発明の 1実施例を示す光輝性フィルムの断面図。  FIG. 19 is a cross-sectional view of a glitter film showing an example of the present invention.
[図 20]本発明の 1実施例を示す光輝性フィルムの断面図。  FIG. 20 is a cross-sectional view of a glitter film showing an example of the present invention.
圆 21]本発明の 1実施例を示す光輝性フィルムの断面図。 21] A sectional view of a glitter film showing an example of the present invention.
圆 22]本発明の 1実施例を示す光輝性フィルムの図柄の視認状態を示す説明図。 圆 23]本発明の 1実施例を示す光輝性フィルムの図柄の視認状態を示す説明図。 圆 22] An explanatory view showing the visual recognition state of the design of the glitter film showing one embodiment of the present invention.圆 23] An explanatory view showing the visual recognition state of the design of the glitter film showing one embodiment of the present invention.
[図 24]本発明の 1実施例を示す光輝性フィルムの図柄の視認状態を示す説明図。 圆 25]本発明の 1実施例を示す光輝性フィルムの図柄の視認状態を示す説明図。 圆 26]本発明の 1実施例を示す光輝性図柄形成物の平面図及び断面図。 FIG. 24 is an explanatory view showing a visual recognition state of the design of the glitter film showing one embodiment of the present invention.圆 25] An explanatory view showing the visual recognition state of the design of the glitter film showing one embodiment of the present invention.圆 26] A plan view and a cross-sectional view of a glitter pattern formation showing one embodiment of the present invention.
符号の説明 Explanation of symbols
10：複数図柄光輝性フィルム（両面光輝性フィルム）  10: Multi-pattern glitter film (double-side glitter film)
11A、 11B :基材  11A, 11B: Base material
13A、 13B :プライマ層  13A, 13B: Primer layer
15A、 15B :レリーフ形成層  15A, 15B: Relief forming layer
17A、 17B :反射層  17A, 17B: Reflective layer
19 :接着層  19: Adhesive layer
310 :光輝性フィルム 315 :レリーフ形成層 310: Glittering film 315: Relief forming layer
315A、 315B、 315C、 315D :第 1〜！!レリーフ形成層  315A, 315B, 315C, 315D: 1st ~! ! Relief formation layer
317 :反射層 (金属薄膜層）  317: Reflective layer (metal thin film layer)
317A、 317B、 317C、 317D :第 l〜n反射層（金属薄膜層）  317A, 317B, 317C, 317D: l to n reflective layers (metal thin film layers)
321 :接着層  321: Adhesive layer
321B、 321D :層間プライマ層  321B, 321D: Interlayer primer layer
300 :光輝性図柄形成物  300: Glossy pattern formation
301 :基紙  301: Base paper
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0057] 第 1の発明 [0057] First invention
以下、第 1の本発明の実施形態について、図面を参照しながら、詳細に説明する。  Hereinafter, embodiments of the first invention will be described in detail with reference to the drawings.
[0058] 図 1〜8は、それぞれ、本発明の 1実施例を示す複数図柄光輝性フィルムの断面図 である。 [0058] Figs. 1 to 8 are cross-sectional views of a multi-pattern glitter film showing one embodiment of the present invention.
[0059] (複数図柄光輝性フィルム）  [0059] (Multi-pattern glitter film)
本発明の複数図柄光輝性フィルム 10の基本的な構成としては、少なくとも、第 1レリ ーフ形成層 15A (第 1レリーフ形状 16Aを有する) Z第 1反射層 17A、及び第 2反射 層 17BZ第 2レリーフ形成層 15B (第 2レリーフ形状 16Bを有する）を有し、かつ、第 1 レリーフ形状 16Aと第 2レリーフ形状 16Bとが異なっていればよい。第 1レリーフ形状 16Aは第 1図柄、第 2レリーフ形状 16Bは第 2図柄を示し、第 1図柄及び Z又は第 2 図柄の光輝性図柄は、光輝性であれば特に限定されず、 1部、全面、又は複数図柄 の組合わせでもよい。なお、レリーフ形状 16は反射層 17面に設けられている。  The basic structure of the multi-pattern glitter film 10 of the present invention includes at least the first relief forming layer 15A (having the first relief shape 16A), the Z first reflection layer 17A, and the second reflection layer 17BZ It is sufficient that the two relief forming layers 15B (having the second relief shape 16B) are provided and the first relief shape 16A and the second relief shape 16B are different. The 1st relief shape 16A shows the 1st design, the 2nd relief shape 16B shows the 2nd design, and the glitter design of the 1st design and Z or the 2nd design is not particularly limited as long as it is a glitter, 1 part, The entire surface or a combination of multiple symbols may be used. The relief shape 16 is provided on the surface of the reflective layer 17.
[0060] 本明細書では、主に 2つの光輝性図柄について記載する力 2つ以上の複数図柄 でもよぐ複数の光輝性図柄の場合については、光輝性図柄の繰返しであり省略さ せて頂く。  [0060] In the present specification, the force mainly described for two glitter designs. In the case of a plurality of glitter designs that may be two or more symbols, it is a repetition of the glitter design and will be omitted. .
[0061] (図柄合せ構成）  [0061] (Design matching structure)
第 1及び Z又は第 2の光輝性図柄の構成は特に限定されないが、例えば、図 1に 示すような、第 1レリーフ形成層 15A (第 1レリーフ形状 16Aを有する) Z第 1反射層 1 7AZ接着層 19Z第 2反射層 17BZ第 2レリーフ形成層 15B (第 2レリーフ形状 16B を有する）の層構成である。 The configuration of the first and Z or second glitter patterns is not particularly limited. For example, as shown in FIG. 1, the first relief forming layer 15A (having the first relief shape 16A) Z the first reflecting layer 1 7AZ adhesive layer 19Z second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B).
[0062] また、図 2に示すような、第 1光輝性フィルム 10A (第 1基材 11AZ第 1プライマ層 1 3A (必要に応じて) Z第 1レリーフ形成層 15A (第 1レリーフ形状 16Aを有する） Z第 1反射層 17A)と、第 2光輝性フィルム 10B (第 2反射層 17BZ第 2レリーフ形成層 15 B (第 2レリーフ形状 16Bを有する） Z第 2プライマ層 13B (必要に応じて) Z第 2基材 11B)との、第 1反射層 17A面と第 2反射層 17B面とを接着層 19で積層した層構成 でもよい。  Further, as shown in FIG. 2, the first glittering film 10A (first substrate 11AZ first primer layer 13A (if necessary) Z first relief forming layer 15A (first relief shape 16A Z) first reflective layer 17A) and second glittering film 10B (second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B) Z second primer layer 13B (if necessary) ) A layer structure in which the first reflective layer 17A surface and the second reflective layer 17B surface are laminated with an adhesive layer 19 with the Z second base material 11B) may be used.
[0063] (基材合せ構成）  [0063] (Substrate alignment structure)
図 3に示すような、第 1光輝性フィルム 10Aと、第 2光輝性フィルム 10Bとの、第 1基 材 11 A面と第 2基材 11B面とを接着層 19で積層した層構成でもよ 、。  As shown in FIG. 3, the first glittering film 10A and the second glittering film 10B may have a layer structure in which the first substrate 11A surface and the second substrate 11B surface are laminated with an adhesive layer 19. ,.
[0064] また、図 4に示すような、第 1光輝性フィルム 10A (第 1基材 11AZ第 1レリーフ形成 層 15A (第 1レリーフ形状 16Aを有する） Z第 1反射層 17A)と、第 2光輝性フィルム 1 OB (第 2基材 11BZ第 2レリーフ形成層 15B (第 2レリーフ形状 16Bを有する） Z第 2 反射層 17BZ第 2保護層 25B (必要に応じて)）との、第 1反射層 17A面と第 2基材 1 1B面とを接着層 19で積層した層構成でもよ ヽ。  [0064] Further, as shown in FIG. 4, the first glittering film 10A (first base material 11AZ first relief forming layer 15A (having the first relief shape 16A) Z first reflecting layer 17A), the second First reflection with glitter film 1 OB (second base material 11BZ second relief forming layer 15B (having second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary)) A layer structure in which the layer 17A surface and the second base material 11B surface are laminated with an adhesive layer 19 may be used.
[0065] (両面 2図柄構成）  [0065] (Double-sided 2 symbol composition)
図 5に示すような、第 1基材 11Aの、一方の面に第 1レリーフ形成層 15A (第 1レリー フ形状 16Aを有する) Z第 1反射層 17AZ第 1保護層 25A (必要に応じて)を設け、 他方の面に第 2レリーフ形成層 15B (第 2レリーフ形状 16Bを有する) Z第 2反射層 1 7BZ第 2保護層 25B (必要に応じて）を設けてもよ!、。  As shown in FIG. 5, the first relief forming layer 15A (having the first relief shape 16A) on one side of the first base material 11A Z the first reflective layer 17AZ the first protective layer 25A (if necessary) ) And the second relief forming layer 15B (having the second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary) may be provided on the other surface!
[0066] さらに、図 3には印刷 27、第 1保護層 25A、第 2保護層 25B、図 4には第 2保護層 2 5B、図 5には第 1保護層 25A、第 2保護層 25B、を例示しているが、該印刷、保護層 、他の基材、及び Z又は他の層を設けてもよぐ該層を設ける位置は、層間及び Z又 は表面の 1又は複数でよい。  Further, FIG. 3 shows printing 27, first protective layer 25A and second protective layer 25B, FIG. 4 shows second protective layer 25B, and FIG. 5 shows first protective layer 25A and second protective layer 25B. However, the position where the layer on which the printing, protective layer, other substrate, and Z or other layer may be provided may be one or more of the interlayer and Z or the surface. .
[0067] (片面 2図柄構成）  [0067] (2-sided design on one side)
図 6に示すような、第 1基材 11Aへ、第 1レリーフ形成層 15A (第 1レリーフ形状 16A を有する) Z第 1反射層 17Aを設け、該第 1反射層 17A面へさらに、第 2レリーフ形成 層 15B (第 2レリーフ形状 16Bを有する) Z第 2反射層 17BZ第 2保護層 25B (必要 に応じて）を設けてもよい。 As shown in FIG. 6, a first relief forming layer 15A (having a first relief shape 16A) Z first reflective layer 17A is provided on the first base material 11A, and a second second layer is further formed on the surface of the first reflective layer 17A. Relief formation A layer 15B (having the second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary) may be provided.
[0068] また、図 7に示すように、図 6の構成の第 2保護層 25Bの代わりに、第 2接着層 21B と第 2支持基材 30Bを設けてもよぐ粘着ラベルや転写箔とすることができる。  In addition, as shown in FIG. 7, instead of the second protective layer 25B having the configuration of FIG. 6, an adhesive label or transfer foil that may be provided with a second adhesive layer 21B and a second support substrate 30B can do.
[0069] (材料と層形成）  [0069] (Material and layer formation)
次に、基材ゃ層の材料、層の形成について、説明するが、第 1基材 11A及び第 2 基材 11B (合わせて基材 11)、第 1レリーフ形成層 15A及び第 2レリーフ形成層 15B (合わせてレリーフ形成層 15)、第 1反射層 17A及び第 2反射層 17B (合わせて反射 層 17)、第 1保護層 25A及び第 2保護層 25B (合わせて保護層 25)、接着層 19、 21 B、 23は、同じ材料、形成法及び厚さでもよぐ異なるものでもよい。また、 3図柄以上 の場合は、説明を省略しているが、第 3レリーフ形成層 15Cや第 4レリーフ形成層 15 D、第 3反射層 17Cや第 4反射層 17Dでも同様である。  Next, the material of the base material layer and the formation of the layer will be described. The first base material 11A and the second base material 11B (base material 11 together), the first relief forming layer 15A and the second relief forming layer 15B (together relief forming layer 15), first reflective layer 17A and second reflective layer 17B (together reflective layer 17), first protective layer 25A and second protective layer 25B (together protective layer 25), adhesive layer 19, 21 B and 23 may be the same material, forming method and different thickness. In the case of three or more symbols, the description is omitted, but the same applies to the third relief forming layer 15C, the fourth relief forming layer 15D, the third reflecting layer 17C, and the fourth reflecting layer 17D.
[0070] (基材）  [0070] (Substrate)
基材 11の材料としては、耐熱性、機械的強度、製造に耐える機械的強度、耐溶剤 性などがあれば、用途に応じて種々の材料が適用できる。例えば、ポリエチレンテレ フタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリエチレンテレフ タレート-イソフタレート共重合体、又はテレフタル酸-シクロへキサンジメタノール-ェ チレングリコール共重合体などのポリエステル系榭脂、ナイロン (商品名） 6、ナイロン (商品名） 66、ナイロン (商品名） 610、又はナイロン (商品名） 12などのポリアミド系榭 脂、ポリエチレン、ポリプロピレン、ポリブテン、又はポリメチルペンテンなどのポリオレ フィン系榭脂、ポリノルボネンなどの環状ポリオレフイン系榭脂、ポリ塩ィ匕ビュルなどの ビュル系榭脂、ポリアタリレート、ポリメタアタリレート、又はポリメチルメタアタリレートな どの (メタ)アクリル系榭脂、ポリイミド、ポリアミドイミド、又はポリエーテルイミドなどのィ ミド系榭脂、ポリアリレート、ポリスルホン、ポリエーテルスルホン、ポリフエ-レンエー テル、ポリフエ-レンスルフイド（PPS)、ポリアラミド、ポリエーテルケトン、ポリエーテル 二トリル、ポリエーテルエーテルケトン、又はポリエーテルサルファイトなどのェンジ二 アリング榭脂、ポリスチレン、高衝撃ポリスチレン、 AS榭脂、又は ABS榭脂などのス チレン系榭脂、ポリビュルアルコール榭脂、又はエチレン ビュルアルコール共重合 体等のポリビュルアルコール系榭脂、エチレン一四フッ化工チレン共重合体、三フッ 化塩化エチレン、四フッ化工チレン パーフルォロアルキルビュルエーテル共重合 体、フッ化ビ-リデン、フッ化ビュル、又はパーフルオローパーフロロプロピレンーパ 一フロロビュルエーテル共重合体等のフッ素系榭脂、セロファン、セルローストリァセ テート、セルロースダイアセテート、又は-トロセルロースなどのセルロース系フイノレム 、ポリカーボネート系榭脂、エチレン 酢酸ビニル共重合体ケン化物、ポリビニルブ チラール榭脂、ポリ酢酸ビュル系榭脂、ァセタール系榭脂、などがある。 As the material of the base material 11, various materials can be applied depending on the use as long as they have heat resistance, mechanical strength, mechanical strength that can withstand manufacturing, and solvent resistance. For example, polyester resin such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene terephthalate-isophthalate copolymer, or terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer, nylon (product Name) 6, Nylon (trade name) 66, Nylon (trade name) 610, Nylon (trade name) 12, etc. Polyamide resin, Polyolefin, Polypropylene, Polybutene or Polymethyl pentene, etc. (Meth) acrylic resins such as cyclic polyolefins such as polynorbornene, burs such as polysalts and burs, poly acrylate, polymeta acrylate, or polymethyl meta acrylate, polyimide, polyamide imide Or Polyer Imido resins such as imide, polyarylate, polysulfone, polyethersulfone, polyphenylene ether, polyphenylene sulfide (PPS), polyaramid, polyetherketone, polyether nitrile, polyetheretherketone, or polyethersulfur Engineered resin such as Fight, polystyrene, high impact polystyrene, AS resin, or styrene-based resin such as ABS resin, polybulu alcohol resin, or ethylene butyl alcohol copolymer Polybula alcohol-based resin such as ethylene tetrafluoroethylene, tetrafluoroethylene, tetrafluoroethylene perfluoroalkyl butyl ether copolymer, vinylidene fluoride, fluoride Fluorine-based resin such as perfluoro-perfluoropropylene-perfluorobutyl ether copolymer, cellulose-based resin such as cellophane, cellulose triacetate, cellulose diacetate, or -trocellulose, polycarbonate-based resin, ethylene Examples include saponified vinyl acetate copolymer, polyvinyl butyral resin, polyacetate resin, and acetal resin.
[0071] 該基材 11は、これら榭脂を主成分とする共重合榭脂、または、混合体 (ァロイでを 含む）、若しくは複数層からなる積層体であっても良い。また、該基材 11は、延伸フィ ルムでも、未延伸フィルムでも良いが、強度を向上させる目的で、一軸方向または二 軸方向に延伸したフィルムが好ましい。該基材 11は、これら榭脂の少なくとも 1層から なるフィルム、シート、ボード状として使用する。  [0071] The substrate 11 may be a copolymerized resin mainly composed of these resins, a mixture (including alloy), or a laminate composed of a plurality of layers. The substrate 11 may be a stretched film or an unstretched film, but a film stretched in a uniaxial direction or a biaxial direction is preferable for the purpose of improving the strength. The substrate 11 is used as a film, sheet, or board formed of at least one layer of these resins.
[0072] 該基材 11の厚さは、特に限定されるものではなぐ用途などに合わせて適宜選択 すればよい。ラベル、転写箔、スレッドなどの薄物を作製する際には、耐熱性、機械 的強度がよいポリエチレンテレフタレート、ポリエチレンナフタレートが好適である。ま た、包装材料のような、特に安価な製品を作製する際には、ポリプロピレン、ポリ塩ィ匕 ビニル等の材料が好適である。また、後述するレリーフの賦型方法によっては、紙基 材も用 、ることができる。  [0072] The thickness of the substrate 11 is not particularly limited, and may be appropriately selected according to the usage. When producing thin materials such as labels, transfer foils, and threads, polyethylene terephthalate and polyethylene naphthalate having good heat resistance and mechanical strength are suitable. Further, when producing a particularly inexpensive product such as a packaging material, a material such as polypropylene or polyvinyl chloride is preferable. Further, depending on the relief shaping method described later, a paper base material can also be used.
[0073] (プライマ層） [0073] (Primer layer)
また、該基材 11は、層を形成する面側に、層間の密着力を向上させるために、必 要に応じてプライマ層 13、またはコロナ放電処理、プラズマ処理、オゾンガス処理、 フレーム処理、予熱処理、除塵埃処理、アルカリ処理などなどの易接着処理を施して もよい。特に、プライマ層 13は、例えば、ポリウレタン系榭脂、ポリエステル系榭脂、ポ リアミド系榭脂、エポキシ系榭脂、フエノール系榭脂、ポリ塩ィ匕ビュル系榭脂、ポリ酢 酸ビュル系榭脂、塩ィ匕ビュル 酢酸ビュル共重合体、酸変性ポリオレフイン系榭脂、 エチレンと酢酸ビュル或いはアクリル酸などとの共重合体、（メタ)アクリル系榭脂、ポ リビュルアルコール系榭脂、ポリビュルァセタール榭脂、ポリブタジエン系榭脂、ゴム 系化合物、石油系榭脂、アルキルチタネート系化合物、ポリエチレンイミン系化合物 、イソシァネート系化合物、澱粉、カゼイン、アラビアゴム、セルロース誘導体、ヮック ス類などを使用することができる。 Further, the base material 11 has a primer layer 13 or a corona discharge treatment, a plasma treatment, an ozone gas treatment, a flame treatment, a pre-treatment, if necessary, in order to improve the adhesion between the layers on the surface on which the layer is formed. Easy adhesion treatment such as heat treatment, dust removal treatment or alkali treatment may be performed. In particular, the primer layer 13 includes, for example, a polyurethane-based resin, a polyester-based resin, a polyamide-based resin, an epoxy-based resin, a phenol-based resin, a polysalt-bulb-based resin, and a poly-acetic acid-based resin. Fat, salt-but-butyl acetate acetate copolymer, acid-modified polyolefin resin, copolymer of ethylene and acetate acetate or acrylic acid, (meth) acrylic resin, polybutyl alcohol resin, poly Buracetal resin, polybutadiene resin, rubber compound, petroleum resin, alkyl titanate compound, polyethyleneimine compound Further, isocyanate compounds, starch, casein, gum arabic, cellulose derivatives, coconuts, etc. can be used.
[0074] 上記の榭脂又はそのモノマー、オリゴマー、若しくはプレボリマー等の一種乃至複 数を主成分とし、これに、必要ならば、例えば、各種の安定剤、充填剤、反応開始剤 、硬化剤ないし架橋剤、などの添加剤を単独又は複数を任意に添加したり、主剤と 硬化剤とを組み合わせて、 1液硬化型、又は 2液硬化型等のいずれのものでも使用 することができる。これらの榭脂を、適宜溶剤に溶解又は分散し、必要に応じて充分 に混練して、コーティング剤組成物 (インキ、塗布液)を調整し、これを基材 11に公知 のコーティング法で塗布し乾燥する力、乾燥又は乾燥した後のエージング処理によつ て反応させて、プライマ層 13とする。該プライマー層 13の厚さは、 0. 05〜10 m程 度、好ましくは 0. 1〜5 μ m、さらに好ましくは、 0. 2〜1 μ mである。また、 EC法によ りレリーフ形状 16を賦型する場合、通常プライマ層を設けなくてもよい。塗布方法とし ては、例えば、ロールコート法、グラビアコート法、スプレイコート法、エアナイフコート 法、キスコート法、その他等のコーティング法がある。プライマ層 13A及びプライマ層 13Bは、同じ材料及び厚さでもよく、異なるものでもよい。  [0074] One or more of the above-mentioned rosins or monomers, oligomers, or prepolymers thereof are the main components. If necessary, for example, various stabilizers, fillers, reaction initiators, curing agents, One or a plurality of additives such as a cross-linking agent can be optionally added, or a main component and a curing agent can be combined to use either a one-component curable type or a two-component curable type. These waxes are appropriately dissolved or dispersed in a solvent, and sufficiently kneaded as necessary to prepare a coating agent composition (ink, coating solution), which is applied to the substrate 11 by a known coating method. Then, the primer layer 13 is made to react by the drying force or the aging treatment after drying or drying. The primer layer 13 has a thickness of about 0.05 to 10 m, preferably 0.1 to 5 μm, and more preferably 0.2 to 1 μm. In addition, when the relief shape 16 is formed by the EC method, it is usually unnecessary to provide a primer layer. Examples of the coating method include coating methods such as a roll coating method, a gravure coating method, a spray coating method, an air knife coating method, a kiss coating method, and others. The primer layer 13A and the primer layer 13B may be the same material and thickness, or may be different.
[0075] (レリ一フの賦型）  [0075] (Relief shaping)
レリーフ形成層 15面へレリーフ形状 16を賦形 (複製とも呼称する)する。該賦形方 法としては、当業者が呼称する「熱圧法」、及び「EC法」が適用できる。該賦形方法 によって、使用する材料が異なるので、別々に説明する。  The relief shape 16 is shaped (also referred to as replication) on the relief forming layer 15 surface. As the shaping method, “hot pressing method” and “EC method” called by those skilled in the art can be applied. The materials used depend on the shaping method, and will be described separately.
[0076] (熱圧法）  [0076] (Hot pressure method)
まず、熱圧法は、基材 11ヘレリーフ形成層 15を形成した後に、該レリーフ形成層 1 5の表面に、レリーフが形成されているスタンパ (金属版、又は榭脂版)を熱圧着 (所 謂エンボス）をして、該レリーフをレリーフ形成層 15へ賦型し複製した後に、スタンパ を剥離する方法である。加熱温度、加圧力は適宜調整される。  First, in the hot pressing method, after forming the relief forming layer 15 on the substrate 11, a stamper (metal plate or resin plate) on which a relief is formed is thermocompression-bonded on the surface of the relief forming layer 15 (so-called “so-called”). This is a method in which the stamper is peeled after embossing) and shaping the relief to the relief forming layer 15 and replicating. The heating temperature and pressure are adjusted as appropriate.
[0077] (レリーフ形成層） [0077] (Relief forming layer)
熱圧法に用いるレリーフ形成層 15の材料としては、ポリ塩化ビニル、アクリル榭脂（ 例、ポリメチルメタアタリレート）、ポリスチレン、ポリカーボネート等の熱可塑性榭脂、 そして、不飽和ポリエステル、メラミン、エポキシ、ポリエステル (メタ）アタリレート、ウレ タン (メタ）アタリレート、エポキシ (メタ）アタリレート、ポリエーテル (メタ）アタリレート、ポ リオール (メタ）アタリレート、メラミン (メタ）アタリレート、トリアジン系アタリレート等の熱 硬化性榭脂を硬化させたもの、不飽和エチレン系モノマーと不飽和エチレン系オリゴ マーを適宜混合したものに増感剤を添加した組成物等の紫外線硬化性榭脂を硬化 させたもの、或いは、上記熱可塑性榭脂と熱硬化性榭脂の混合物やラジカル重合性 不飽和基を有する熱成形性物質が使用可能である。特に耐薬品性、耐光性及び耐 候性等の耐久性に優れた熱硬化性榭脂、紫外線や電子線などの電離放射線硬化 性榭脂が好ましい。さら〖こは、耐熱性、耐圧性に優れた材料が好ましい。すなわち、 請求項 3〜6の発明では、第 1光輝性フィルムと第 2光輝性フィルムを貼り合せる際の 熱や圧力に耐えるレリーフ形成材料が好ましい。また、請求項 7〜8の発明では、第 1 レリーフ形成層を形成後、さらに、第 2レリーフ形成層を第 1基材の 11Aの反対面、も しくは同一面に形成するため、第 1レリーフ形成層の材料としては第 2レリーフ形成層 にレリーフを賦型する際の熱や圧力に耐える材料が好ま ヽ。このような特性を有す る電離放射線硬化榭脂としては、例えば、エポキシ変性アタリレート榭脂、ウレタン変 性アタリレート樹脂、アクリル変性ポリエステル等の電離放射線硬化性樹脂を硬化さ せたものが適用でき、好ましくはウレタン変性アタリレート榭脂である。 The material of the relief forming layer 15 used for the hot pressing method is thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Polyester (meth) acrylate, urea Cures thermosetting resins such as tan (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate, melamine (meth) acrylate, triazine acrylate A product obtained by curing an ultraviolet curable resin such as a composition in which an unsaturated ethylene monomer and an unsaturated ethylene oligomer are appropriately mixed with a sensitizer added thereto, or the above thermoplastic resin It is possible to use a mixture of a thermosetting resin and a thermosetting resin having a radical polymerizable unsaturated group. Particularly preferred are thermosetting resins excellent in durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams. Sarakuko is preferably a material having excellent heat resistance and pressure resistance. That is, in the inventions of claims 3 to 6, a relief forming material that can withstand heat and pressure when the first glittering film and the second glittering film are bonded together is preferable. In the inventions of claims 7 to 8, after the first relief forming layer is formed, the second relief forming layer is formed on the opposite surface of 11A of the first base material or on the same surface. The material of the relief forming layer is preferably a material that can withstand the heat and pressure when the relief is formed on the second relief forming layer. Examples of ionizing radiation curable resins having such characteristics include those obtained by curing ionizing radiation curable resins such as epoxy-modified acrylate resins, urethane-modified acrylate resins, and acrylic-modified polyesters. Preferably, it is urethane-modified attalylate resin.
レリーフ形成層 15の好ましい 1つとしては、一般式 (a)で表されるウレタン変性アタリ ル系榭脂を主成分とする未硬化の電離放射線硬化性榭脂組成物の硬化物である。 具体的には、本出願人が特開 2000— 273129号公報で開示している光硬化性榭 脂組成物などが適用でき、前記明細書に記載の光硬化性榭脂組成物 Aを本明細書 の実施例でも使用し、「電離放射線硬化性榭脂組成物 A」と表記して 、る。  A preferable one of the relief forming layer 15 is a cured product of an uncured ionizing radiation curable resin composition mainly composed of a urethane-modified talyl resin represented by the general formula (a). Specifically, the photocurable resin composition disclosed by the present applicant in Japanese Patent Application Laid-Open No. 2000-273129 can be applied, and the photocurable resin composition A described in the above specification can be applied to the present specification. It is also used in the examples in the manual and is described as “ionizing radiation curable resin composition A”.
[化 1]
Figure imgf000019_0001
[Chemical 1]
Figure imgf000019_0001
[0079] (ここで、 6個の Rは夫々互いに独立して水素原子またはメチル基を表わし、 Rは  [0079] (wherein six R's each independently represent a hydrogen atom or a methyl group,
1 2 炭素数が 1〜20個の炭化水素基を表わす。 1、 m、 n、 o及び pの合計を 100とした場 合に、 1ίま 20〜90、 miま 0〜80、 ηίま 0〜50、 ο+ρίま 10〜80、 piま 0〜40の整数であ る。 Xおよび Yは直鎖状または分岐鎖状のアルキレン基を表わし、 Zはウレタン変性ァ クリル樹脂を改質するための基を表し、好ましくは嵩高い環状構造の基を表わす。 ) レリーフ形成層 15の好ましい他の 1つとしては、融点が 40°C以上のイソシァネート 化合物と、イソシァネート基と反応し得る (メタ)アクリル化合物との反応生成物であつ て、軟ィ匕点が 40°C以上のものを含有する榭脂である。  1 2 represents a hydrocarbon group having 1 to 20 carbon atoms. When the sum of 1, m, n, o and p is 100, 1ί or 20 ~ 90, mi or 0 ~ 80, ηί or 0 ~ 50, ο + ρί or 10 ~ 80, pi or 0 ~ 40 It is an integer. X and Y represent a linear or branched alkylene group, Z represents a group for modifying a urethane-modified acryl resin, and preferably represents a group having a bulky cyclic structure. ) Another preferred relief forming layer 15 is a reaction product of an isocyanate compound having a melting point of 40 ° C. or higher and a (meth) acrylic compound capable of reacting with an isocyanate group, and has a soft point. This is a resin containing 40 ° C or higher.
[0080] 即ち、（1)融点が 40°C以上のイソシァネートイ匕合物と、（メタ)アタリロイル基を有し て!、て且つイソシァネート基と反応し得る (メタ)アクリルィ匕合物との反応生成物であつ て、軟ィ匕点が 40°C以上のものを含有する力、（2)融点が 40°C以上のイソシァネート 化合物と、（メタ)アタリロイル基を有して 、て且つイソシァネート基と反応し得る (メタ） アクリル化合物及び (メタ)アタリロイル基を有しておらず且つイソシァネート基と反応 し得る化合物との反応生成物であって、軟ィ匕点が 40°C以上のものを含有する電離放 射線硬化性榭脂の硬化物である。また、イソシァネートイ匕合物が、非芳香族性炭化 水素環に結合したイソシァネート基を有するもの、イソホロンジイソシァネートの三量 体、又はイソホロンジイソシァネートと活性水素含有ィ匕合物との反応生成物であり、さ らに、（メタ)アクリルィ匕合物力 （メタ)アクリル酸、水酸基を有する (メタ)アタリレートで あることが好ましい。具体的には、特開 2001— 329031号公報で開示されている光 硬化性榭脂が適用でき、本明細書の実施例では「電離放射線硬化性榭脂組成物 B」 と表記している。 [0080] That is, (1) a reaction between an isocyanate compound having a melting point of 40 ° C or higher and a (meth) acrylic compound having a (meth) atallyloyl group and capable of reacting with an isocyanate group. A product that has a soft melting point of 40 ° C or higher, (2) an isocyanate compound having a melting point of 40 ° C or higher, a (meth) atallyloyl group, and an isocyanate group A reaction product of a (meth) acrylic compound that can react with a compound and a compound that does not have a (meth) ataryloyl group and can react with an isocyanate group, and has a soft spot of 40 ° C or higher. It is a cured product of ionizing radiation curable resin containing. Further, the isocyanate compound has an isocyanate group bonded to a non-aromatic hydrocarbon ring, a trimer of isophorone diisocyanate, or an isophorone diisocyanate and an active hydrogen-containing compound. It is a reaction product. Furthermore, (meth) acrylic compound strength (meth) acrylic acid, (meth) acrylate having a hydroxyl group Preferably there is. Specifically, the photocurable resin disclosed in Japanese Patent Application Laid-Open No. 2001-329031 can be applied, and in the examples of this specification, it is expressed as “ionizing radiation curable resin composition B”.
[0081] (レリーフ形成層の形成） [0081] (Formation of relief forming layer)
レリーフ形成層 15を設ける方法としては、前述した材料、例えば、ウレタン変性ァク リル系榭脂の電離放射線硬化性榭脂には、必要に応じて、光重合開始剤、光増感 剤、光重合促進剤、多官能のモノマーやオリゴマー、離型剤、重合防止剤、粘度調 節剤、界面活性剤、消泡剤等の各種助剤、また、シリコーン、スチレン ブタジエンラ バー等の高分子体などを配合してもよぐこれらを有機溶媒へ溶解又は分散させるか As a method for providing the relief forming layer 15, for the above-mentioned materials, for example, an ionizing radiation curable resin of urethane-modified acrylic resin, a photopolymerization initiator, a photosensitizer, a photosensitizer can be used. Polymerization accelerators, polyfunctional monomers and oligomers, mold release agents, polymerization inhibitors, viscosity modifiers, surfactants, antifoaming agents, and other auxiliaries, and polymers such as silicone and styrene butadiene rubber Can they be dissolved or dispersed in an organic solvent?
、又は溶媒をカ卩えずノンソルベント状の、レリーフ形成層 15組成物 (インキ）とする。該 レリーフ形成層 15組成物 (インキ）を、例えば、口—ルコ—ト法、グラビアコ―ト法、そ の他公知のコーティング法又は印刷法で、塗布し、必要に応じて乾燥すればよい。 該レリーフ形成層 15の厚さは、通常は 0. 1〜： LO /z m程度、好ましくは 0. 2〜5 /ζ πι、 さらに好ましくは 0. 5〜2 /ζ πιである。 0. 5 m未満では光輝性 (輝度）が著しく低下 し、 2 mを超えても輝度は十分である力 コスト的に不利である。 Or, the solvent is not used, but the non-solvent relief forming layer 15 composition (ink) is used. The relief forming layer 15 composition (ink) may be applied by, for example, a mouth coat method, a gravure coat method, other known coating methods or printing methods, and dried if necessary. . The thickness of the relief forming layer 15 is usually about 0.1 to about LO / zm, preferably 0.2 to 5 / ζ πι, and more preferably 0.5 to 2 / ζ πι. If it is less than 0.5 m, the brightness (brightness) is remarkably reduced, and if it exceeds 2 m, the brightness is sufficient. This is disadvantageous in terms of cost.
[0082] (レリーフ形状）  [0082] (Relief shape)
レリーフ形状 16は凹凸形状であり特に限定されるものではないが、微細な凹凸形 状を有する光拡散、光散乱、光反射、光回折などの機能を発現するものが好ましく、 例えば、フーリエ変換やレンチキュラーレンズ、光回折パターン、モスアイ、が形成さ れたものである。また、光回折機能はないが、特異な光輝性を発現するヘアライン柄 、マット柄、万線柄、干渉パターンなどでもよい。  The relief shape 16 is a concavo-convex shape and is not particularly limited, but preferably has a fine concavo-convex shape and expresses functions such as light diffusion, light scattering, light reflection, and light diffraction, such as Fourier transform and A lenticular lens, a light diffraction pattern, and a moth eye are formed. Further, although it does not have a light diffraction function, it may be a hairline pattern, a mat pattern, a line pattern, an interference pattern or the like that expresses a unique glitter.
[0083] 光回折凹凸パターンとしては、物体光と参照光との光の干渉による干渉縞が凹凸 模様で記録されたホログラムや回折格子が適用できる。ホログラムとしては、フレネル ホログラム等のレーザ再生ホログラム、及びレインボーホログラム等の白色光再生ホロ グラム、さらに、それらの原理を利用したカラーホログラム、コンピュータジエネレーテ イツドホログラム (CGH)、ホログラフィック回折格子などがある。  As the light diffraction concavo-convex pattern, a hologram or diffraction grating in which interference fringes due to the interference of light between the object light and the reference light are recorded as a concavo-convex pattern can be applied. Holograms include laser reproduction holograms such as Fresnel holograms, white light reproduction holograms such as rainbow holograms, color holograms utilizing these principles, computer-generated holograms (CGH), holographic diffraction gratings, etc. There is.
[0084] 本明細書記載の図柄とは、これらの各種凹凸パターンを 1種もしくは 2種以上組み 合わせて形成される絵柄をいい、例えば、「abc」 「Security」といったテキストパタ ーンや、スナメ柄、水玉柄と呼ばれる幾何学パターン、さらには、花や鳥などの図柄 を模擬して作製された絵画パターンなどの組み合わせで形成された絵柄を、上記し たホログラムや回折格子力 なる光回折凹凸パターンの組み合わせで可視化した絵 柄をいう。また、複数図柄とは、これらの図柄を 1種かつ 1回用いたのみでは形成され ない図柄をいい、通常 2種以上の図柄を複数回用いて作製される図柄をいう。ただし 、例えば、基材面から「Security」と観測される図柄の作製された光輝性フィルムの 蒸着面同士を貼り合せことで表裏カゝらともに「Security」を観察可能な場合も本発明 の複数図柄光輝性フィルムである。 [0084] The design described in this specification refers to a design formed by combining one or more of these various concavo-convex patterns, for example, text patterns such as "abc" and "Security". The above-mentioned holograms and diffraction gratings are created by combining patterns such as geometric patterns called screens, snakes and polka dots, and painting patterns created by simulating flowers and birds. This is a picture visualized by a combination of powerful diffraction patterns. In addition, “multiple symbols” refers to symbols that cannot be formed by using these symbols once and once, and usually refers to symbols that are created using two or more symbols multiple times. However, for example, from a substrate surface "Security" and to the observed pattern of the prepared glitter sides mosquitoゝRaTomo by bonding the deposition surfaces of the film of The present invention is also "Securit y" possible observations It is a multi-pattern glitter film.
[0085] 回折格子としては、ホログラム記録手段を利用したホログラフィック回折格子があげ られ、その他、電子線描画装置等を用いて機械的に回折格子を作成することにより、 計算に基づいて任意の回折光が得られる回折格子をあげることもできる。また、機械 切削法でもよい。これらのホログラム及び Z又は回折格子の単一若しくは多重に記 録しても、組み合わせて記録しても良い。これらの原版は公知の材料、方法で作成 することができ、通常、感光性材料を塗布したガラス板を用いたレーザ光干渉法、電 子線レジスト材料を塗布したガラス板に電子線描画法、機械切削法などが適用でき る。 [0085] Examples of the diffraction grating include a holographic diffraction grating using a hologram recording means. In addition, a diffraction grating is mechanically created using an electron beam drawing apparatus or the like, so that any diffraction can be performed based on calculation. A diffraction grating from which light can be obtained can also be mentioned. Alternatively, a mechanical cutting method may be used. These holograms and Z or diffraction gratings may be recorded in a single or multiple manner, or in combination. These masters can be prepared by known materials and methods. Usually, a laser beam interference method using a glass plate coated with a photosensitive material, an electron beam drawing method on a glass plate coated with an electron beam resist material, Machine cutting method can be applied.
[0086] (レリ一フの賦型）  [0086] (Reliff's shaping)
該レリーフ形成層 15面へ上記のレリーフ形状 16を賦形 (複製とも呼称する)する。 熱圧法での賦形は、レリーフ形成層 15の表面に、レリーフが形成されているスタンパ (金属版、又は榭脂版)を圧着 (所謂エンボス)をして、該レリーフをレリーフ形成層 15 へ賦型し複製した後に、スタンパを剥離することで行う。レリーフ形成層の材料によつ てはエンボス中に電離放射線を照射してからスタンパを剥離することでレリーフを複 製する。商業的な複製は、長尺状で行うことで連続な複製作業ができる。また、シリン ダ一にスタンパをとりつけたり、シリンダーに直接レリーフを刻むなどして作製された シリンダー状のスタンパを用いて、より商業的にレリーフを複製することができる。  The relief shape 16 is shaped (also referred to as replication) on the surface of the relief forming layer 15. In the shaping by the hot pressing method, a stamper (metal plate or resin plate) on which a relief is formed is pressure-bonded (so-called emboss) to the surface of the relief forming layer 15, and the relief is applied to the relief forming layer 15. After forming and duplicating, the stamper is peeled off. Depending on the material of the relief forming layer, the relief is duplicated by irradiating ionizing radiation during embossing and then removing the stamper. Commercial duplication can be carried out in a long form, allowing continuous duplication work. In addition, the relief can be replicated more commercially by using a cylindrical stamper that is manufactured by attaching a stamper to the cylinder or by cutting a relief directly into the cylinder.
[0087] (レリーフの硬化）  [0087] (Relief hardening)
レリーフ形成層 15として電離放射線硬化性榭脂を用いた場合には、スタンパでェ ンボス中、又はエンボス後に、電離放射線を照射して、電離放射線硬化性榭脂を硬 化させる。上記の電離放射線硬化性榭脂は、レリーフを形成後に、電離放射線を照 射して硬化 (反応)させると電離放射線硬化榭脂 (レリーフ形成層 15)となる。電離放 射線としては、電磁波が有する量子エネルギーで区分する場合もあるが、本明細書 では、すべての紫外線 (UV—A、 UV— B、 UV— C)、可視光線、ガンマ一線、 X線 、電子線を包含するものと定義する。従って、電離放射線としては、紫外線 (UV)、可 視光線、ガンマ一線、 X線、または電子線などが適用できる力 紫外線 (UV)が好適 であり、波長 300〜400nmの紫外線が最適である。電離放射線で硬化する電離放 射線硬化性榭脂は、紫外線硬化の場合は光重合開始剤、及び Z又は光重合促進 剤を添カ卩し、エネルギーの高い電子線硬化の場合は添カ卩しないで良ぐまた、適正 な触媒が存在すれば、熱エネルギーでも硬化できる。レリーフ形成層 15として、熱硬 化性榭脂を用いた場合には、使用する熱硬化性榭脂の硬化条件に応じた温湿度環 境下で、エージングを行い硬化させればよい。 When ionizing radiation curable resin is used as the relief forming layer 15, the ionizing radiation curable resin is hardened by irradiating ionizing radiation during embossing or after embossing with a stamper. Make it. When the ionizing radiation curable resin is cured (reacted) by irradiation with ionizing radiation after the relief is formed, the ionizing radiation curable resin (relief forming layer 15) is formed. Ionizing radiation may be classified according to the quantum energy of electromagnetic waves, but in this specification, all ultraviolet rays (UV—A, UV—B, UV—C), visible light, gamma rays, X-rays, It is defined as including an electron beam. Accordingly, as the ionizing radiation, ultraviolet rays (UV), visible rays, gamma rays, X-rays, or electron rays can be applied, and ultraviolet rays having a wavelength of 300 to 400 nm are most suitable. An ionizing radiation curable resin that is cured by ionizing radiation adds a photopolymerization initiator and Z or a photopolymerization accelerator in the case of ultraviolet curing, and does not add it in the case of high energy electron beam curing. It can also be cured with thermal energy if an appropriate catalyst is present. When a thermosetting resin is used as the relief forming layer 15, it may be cured by aging in a temperature and humidity environment according to the curing conditions of the thermosetting resin to be used.
[0088] (EC法）  [0088] (EC method)
EC法は、所謂、当業者がエタストルージョンコーティング (EC)と呼ぶ方法である。 まず、押出機で、押出榭脂を加熱し溶融させて、 Tダイスで必要な幅方向に拡大伸 張させてカーテン状に押し出す。該溶融榭脂層を基材 11上へ流下させて、ゴムロー ルと冷却した金属ロールとで挟持することで、押出榭脂層の形成と、基材 11への接 着と積層が同時に行われる。この際に、金属ロールの表面にレリーフが形成されてい るスタンパ (金属版、又は榭脂版)を貼着しておくことで、溶融榭脂層の表面へレリー フ形状 16が転写され、これが冷却されてレリーフ形状 16が固定された押出榭脂層と なり、該表面にレリーフが賦型できる。この際の押出榭脂層がレリーフ形成層 15とな る。レリーフの形状とスタンパについては熱圧法と同様である。  The EC method is a so-called method called “etrusion coating (EC)” by those skilled in the art. First, with an extruder, the extruded resin is heated and melted, expanded and stretched in the required width direction with a T-die, and extruded into a curtain shape. The molten resin layer is allowed to flow down onto the base material 11 and is sandwiched between a rubber roll and a cooled metal roll, whereby the formation of the extruded resin layer, the attachment to the base material 11 and the lamination are performed simultaneously. . At this time, the relief shape 16 is transferred to the surface of the molten resin layer by sticking a stamper (metal plate or resin plate) having a relief formed on the surface of the metal roll. The extruded resin layer is cooled and the relief shape 16 is fixed, and a relief can be formed on the surface. The extruded resin layer at this time becomes the relief forming layer 15. The relief shape and stamper are the same as in the hot press method.
[0089] (EC法のレリーフ形成層） [0089] (Relief formation layer of EC method)
EC法のレリーフ形成層 15 (押出榭脂層）としては、例えば、低密度ポリエチレン (L DPE)、中密度ポリエチレン (MDPE)、高密度ポリエチレン (HDPE)、直鎖状 (線状 )低密度ポリエチレン（LLDPE)、ポリプロピレン（PP)、エチレン 酢酸ビュル共重 合体 (EVA)、アイオノマー榭脂、エチレン アクリル酸共重合体 (EAA)、エチレン アクリル酸ェチル共重合体（EEA)、エチレンーメタクリル酸共重合体（EMAA)、 エチレンーメタクリル酸メチル共重合体（EMMA)、エチレン プロピレン共重合体（ E— P)、ポリメチルペンテン、ポリブテン、ポリノルボネンなどの環状ポリオレフイン、ポ リエチレンまたはポリプロピレン等のポリオレフイン系榭脂をアクリル酸、メタクリル酸、 マレイン酸、無水マレイン酸、フマール酸、ィタコン酸等の不飽和カルボン酸で変性 した酸変性ポリオレフイン榭脂、ポリ酢酸ビニル系榭脂などが適用できる。これらの榭 脂を単独又は複数を組み合せて使用でき、必要に応じて、適宜添加剤を加えても良 い。 Examples of the relief forming layer 15 (extruded resin layer) of the EC method include low density polyethylene (LDPE), medium density polyethylene (MDPE), high density polyethylene (HDPE), and linear (linear) low density polyethylene. (LLDPE), polypropylene (PP), ethylene acetate copolymer (EVA), ionomer resin, ethylene acrylic acid copolymer (EAA), ethylene acrylate copolymer (EEA), ethylene-methacrylic acid copolymer Coalescence (EMAA), Ethylene-methyl methacrylate copolymer (EMMA), ethylene-propylene copolymer (EP), cyclic polyolefins such as polymethylpentene, polybutene, and polynorbornene, and polyolefin resins such as polyethylene or polypropylene are treated with acrylic acid, methacrylic acid. Acid-modified polyolefin resins modified with unsaturated carboxylic acids such as acid, maleic acid, maleic anhydride, fumaric acid, and itaconic acid, and polyvinyl acetate-based resins can be used. These resins can be used singly or in combination, and if necessary, additives may be added appropriately.
[0090] EC法のレリーフ形成層 15 (押出榭脂層）の厚さは、通常は 5〜300 /ζ πι程度、好ま しくは 10〜： L 00 mである。 10 m以下の厚さでは賦型性が低下し、 100 m以上 の厚さでは、材料が無駄である。  [0090] The thickness of the relief forming layer 15 (extruded resin layer) of the EC method is usually about 5 to 300 / ζ πι, preferably 10 to L00m. When the thickness is less than 10 m, the formability is reduced, and when the thickness is more than 100 m, the material is wasted.
[0091] また、前述したように、 EC法によるレリーフの賦型法の際には、合成樹脂フィルムに カロえて、紙基材も用いることができる。紙基材としては、例えば、強サイズ性の晒また は未晒の紙基材、あるいは純白ロール紙、クラフト紙、板紙、加工紙等の紙基材、そ の他等を使用することができる。また、該紙基材に、各種の榭脂のフィルム乃至シート などを貼合したものを用いてもょ 、。  [0091] Further, as described above, in the relief shaping method by the EC method, a paper base material can be used in addition to the synthetic resin film. As the paper substrate, for example, a paper substrate such as a strong sized bleached or unbleached paper, a pure white roll paper, kraft paper, paperboard, processed paper, or the like can be used. . Also, it is possible to use a paper substrate in which various resin films or sheets are bonded.
[0092] (反射層）  [0092] (Reflective layer)
反射層 17A及び反射層 17B (反射層 17)は、所定のレリーフ構造を設けたレリーフ 形成層 15面のレリーフ面へ、反射層 17を設けることにより、レリーフの反射及び Z又 は回折効果を高めるので、レリーフ形成層 15の反射率より高ければ、特に限定され ず、例えば金属、または屈折率に差のある透明金属化合物が適用できる。この反射 層 17はレリーフ構造を設ける前に、レリーフ形成層 15へ形成することも可能である。 すなわち、各層の材料、スタンパを適宜選定することで、反射層 17形成後にレリーフ 形成することも可能である。  Reflective layer 17A and reflective layer 17B (reflective layer 17) enhance the reflection and Z or diffraction effect of the relief by providing reflective layer 17 on the relief surface of relief forming layer 15 with a predetermined relief structure. Therefore, it is not particularly limited as long as it is higher than the reflectance of the relief forming layer 15, and for example, a metal or a transparent metal compound having a difference in refractive index can be applied. The reflective layer 17 can be formed on the relief forming layer 15 before providing the relief structure. That is, a relief can be formed after forming the reflective layer 17 by appropriately selecting the material and stamper of each layer.
[0093] 該反射層 17に用いる金属としては、金属光沢を有し光を反射する金属元素の薄膜 で、 Cr、 Ni、 Ag、 Au、 Al等の金属、及びその酸ィ匕物、硫化物、窒化物等の薄膜を 単独又は複数を組み合わせてもよい。上記の光反射性の金属薄膜の形成は、いず れも 10〜2000nm程度、好ましくは 20〜： LOOOnmの厚さになるよう、真空蒸着法、ス ノ ッタリング法、イオンプレーティング法などの真空薄膜法で得られる力 その他、メッ キなどによっても形成できる。反射層 17の厚さがこの範囲未満では、光がある程度透 過して効果が減じ、また、それ以上では、反射効果は変わらないので、コスト的に無 駄である。 [0093] The metal used for the reflective layer 17 is a metal element thin film that has a metallic luster and reflects light, such as Cr, Ni, Ag, Au, Al, and its oxides and sulfides. A thin film of nitride or the like may be used alone or in combination. The above light-reflective metal thin films are all formed to a thickness of about 10 to 2000 nm, preferably 20 to: a vacuum such as a vacuum deposition method, a sputtering method, or an ion plating method so as to have a thickness of LOOOnm. The power obtained by the thin film method It can also be formed by a key. If the thickness of the reflective layer 17 is less than this range, the light is transmitted to some extent and the effect is reduced, and if it is more than that, the reflective effect is not changed, so that the cost is useless.
[0094] また、反射層 17として、ほぼ無色透明な色相で、その光学的な屈折率がレリーフ形 成層のそれとは異なる金属化合物を用いることにより、金属光沢が無いにもかかわら ず、ホログラムなどの光輝性を視認できるから、透明なホログラムなどの光輝性フィル ムを作製することができる。  [0094] Further, as the reflective layer 17, a metal compound having an almost colorless and transparent hue and an optical refractive index different from that of the relief forming layer is used, so that a hologram such as a hologram can be used even though there is no metallic luster. Since the glitter is visible, a glitter film such as a transparent hologram can be produced.
[0095] 透明な金属又は金属化合物としては、例えば、レリーフ形成層 15よりも光屈折率の 高い薄膜、および光屈折率の低い薄膜とがあり、前者の例としては、 ZnS、 TiO、 Al  [0095] Examples of the transparent metal or metal compound include a thin film having a higher refractive index than that of the relief forming layer 15 and a thin film having a lower refractive index. Examples of the former include ZnS, TiO, Al
2 2
O、 Sb S、 SiO、 SnO、 ITO等があり、後者の例としては、 LiF、 MgF、 A1FがあO, Sb S, SiO, SnO, ITO, etc., examples of the latter include LiF, MgF, A1F.
2 3 2 3 2 2 3 る。好ましくは、金属酸化物又は窒化物であり、具体的には、 Be、 Mg、 Ca、 Cr、 Mn 、 Cu、 Ag、 Al、 Sn、 In、 Te、 Fe、 Co、 Zn、 Ge、 Pb、 Cd、 Biゝ Se、 Ga、 Rb、 Sb、 Pb 、 Ni、 Sr、 Ba、 La、 Ce、 Au等の酸ィ匕物又は窒化物、他はそれらを 2種以上を混合し たもの等が挙げられる。またアルミニウム等の一般的な光反射性の金属薄膜も、厚み 力 S200A以下になると、透明性が出て使用できる。透明金属化合物の形成は、金属 の薄膜と同様、レリーフ形成層 15のレリーフ面に、 10〜2000nm程度、好ましくは 2 0〜： LOOOnmの厚さになるよう、蒸着、スパッタリング、イオンプレーティング、 CVDな どの真空薄膜法などにより設ければよい。さらには、レリーフ形成層 15と光の屈折率 の異なる透明な合成樹脂を使用してもよぐ接着層 19、 21Bや保護層 25材料とレリ ーフ形成層 15材料の屈折率が十分に異なる場合には、接着層 19、 21Bや保護層 2 5が反射層 17を兼ねることもできる。 2 3 2 3 2 2 3 Preferably, it is a metal oxide or nitride, specifically, Be, Mg, Ca, Cr, Mn, Cu, Ag, Al, Sn, In, Te, Fe, Co, Zn, Ge, Pb, Cd Bi, Se, Ga, Rb, Sb, Pb, Ni, Sr, Ba, La, Ce, Au, etc. . Also, general light-reflective metal thin films such as aluminum can be used with transparency when the thickness force is S200A or less. The transparent metal compound is formed on the relief surface of the relief forming layer 15 in the same manner as the metal thin film by vapor deposition, sputtering, ion plating, CVD so as to have a thickness of about 10 to 2000 nm, preferably 20 to LOOOnm. For example, a vacuum thin film method may be used. Furthermore, the refractive index of the adhesive layer 19, 21B or the protective layer 25 material and the relief forming layer 15 material may be sufficiently different from the relief forming layer 15 which may use a transparent synthetic resin having a different light refractive index. In this case, the adhesive layers 19 and 21B and the protective layer 25 can also serve as the reflective layer 17.
[0096] (複数図柄化） [0096] (Multiple designs)
以上のようにして、光輝性フィルム 10A及び 10Bが得られる。請求項 7〜8の発明で は、層の構成に従って、レリーフ形成層 15、レリーフ形状 16及び反射層 17を作製す る工程を繰り返すことで、複数図柄を有する本発明の複数図柄光輝性フィルム 10を 得ることでさる。  As described above, the glitter films 10A and 10B are obtained. In the inventions of claims 7 to 8, the multi-pattern glittering film 10 of the present invention having a plurality of designs is obtained by repeating the steps of producing the relief forming layer 15, the relief shape 16 and the reflective layer 17 according to the layer configuration. By getting
[0097] このように、 1つの基材に対してレリーフ形成層 15、レリーフ形状 16及び反射層 17を 作製する工程を繰り返すことで複数図柄を有する複数図柄光輝性フィルムを作製す る際には、後からレリーフ形成層にレリーフ形状 16を作製する工程で、先に作製した レリーフ形状 16を破壊しないことが必要となる。 [0097] In this manner, a multi-design glitter film having a plurality of designs is produced by repeating the process of producing the relief forming layer 15, the relief shape 16 and the reflective layer 17 on one base material. In this case, it is necessary not to destroy the relief shape 16 produced earlier in the step of producing the relief shape 16 in the relief forming layer later.
[0098] このため先に形成された第 1レリーフ形成材料のガラス転移温度を Tgl (u)、この材 料の硬化後のガラス転移温度を Tgl (h)、後から形成された第 2レリーフ形成層を作 製する材料のガラス転移温度を Tg2 (u)、この材料の硬化後のガラス転移温度を Tg 2 (h)とするとき、第 1レリーフ形成層は第 2レリーフ形成層のレリーフが賦型される前 に硬化されるとともに、 Tgl (h) >Tg2 (u)の関係があることが好ましい。  [0098] For this reason, the glass transition temperature of the first relief forming material formed earlier is Tgl (u), the glass transition temperature after hardening of this material is Tgl (h), and the second relief formed later is formed. When the glass transition temperature of the material from which the layer is made is Tg2 (u) and the glass transition temperature of this material after curing is Tg2 (h), the relief of the second relief forming layer is added to the first relief forming layer. It is preferable that the resin is cured before being molded and has a relationship of Tgl (h)> Tg2 (u).
[0099] また、第 1レリーフ形成層の材料、第 2レリーフ形成層の材料として一般的な熱可塑 性榭脂を使用する場合には、 Tgl (u) =Tgl (h) =Tgl、さらに、 Tg2 (u) =Tg2 (h) =Tg2とすると、 Tgl >Tg2の関係があることが好ましい。第 3、第 4とさらに複数個の レリーフ形成層を有する場合は、 Tgl >Tg2>Tg3 >Tg4、すなわち、 Tgl (u) >T g2 (u) >Tg3 (u) >Tg4 (u)の関係があることが好ましい。  [0099] When a general thermoplastic resin is used as the material of the first relief forming layer and the material of the second relief forming layer, Tgl (u) = Tgl (h) = Tgl, When Tg2 (u) = Tg2 (h) = Tg2, it is preferable that there is a relationship of Tgl> Tg2. When there are 3rd, 4th and more relief forming layers, Tgl> Tg2> Tg3> Tg4, that is, Tgl (u)> T g2 (u)> Tg3 (u)> Tg4 (u) It is preferable that there is.
[0100] しかしながら、硬化性榭脂を使用する場合にはこの式 (Tgl >Tg2)の関係が成立す ることが特に好ましいわけではない。先にレリーフ形成される榭脂として硬化性榭脂 を使用すると、硬化前の Tgl (u)が低くても、レリーフ形成後にこの榭脂を硬化するこ とで、後から第 2レリーフ形成層にレリーフを賦型する時点において Tgl (h)を十分に 高くすることが容易なため好ましい。逆に、後からレリーフ形成する榭脂として硬化性 榭脂を使用すれば、第 2レリーフ形成層にレリーフを賦型する温度を十分に低くする とともに、第 2レリーフ形成後にこの榭脂を Tg2 (h)まで硬化することで製品の耐久性 を十分に高くすることができるので好ましい。すなわちレリーフ賦型時には硬化してお らず、レリーフ賦型後硬化可能な硬化性榭脂を使用することで、未硬化時の樹脂の ガラス転移温度が Tgl (u) =Tg2 (u)、もしくは、 Tgl (u)く Tg2 (u)の関係にあって も、 Tgl (h) >Tg2 (u)の関係を成立することができ、先に形成されたレリーフの形状 を破壊することなく後に形成するレリーフを作製することができる。このようなレリーフ 榭脂の硬化を、全工程中、最適な工程で行うためには、レリーフ形成材料としては、 電離放射線硬化性榭脂が特に好ましい。 3層以上の複数図柄を有する際にも同様 である。  [0100] However, when using a curable resin, it is not particularly preferable that the relationship of this formula (Tgl> Tg2) is satisfied. When a curable resin is used as the resin that is formed in advance, even if the Tgl (u) before curing is low, the resin is cured after the relief is formed, so that it can be later applied to the second relief forming layer. This is preferable because it is easy to make Tgl (h) sufficiently high at the time of shaping the relief. Conversely, if a curable resin is used as the resin for relief formation later, the temperature at which the relief is formed in the second relief forming layer is sufficiently lowered, and the resin is converted to Tg2 ( Curing up to h) is preferable because the durability of the product can be sufficiently increased. In other words, by using a curable resin that is not cured during relief molding and can be cured after relief molding, the glass transition temperature of the uncured resin is Tgl (u) = Tg2 (u), or Even if there is a relationship between Tgl (u) and Tg2 (u), the relationship of Tgl (h)> Tg2 (u) can be established, and it can be formed later without destroying the shape of the relief formed earlier. A relief can be produced. In order to cure such relief resin in an optimal process among all processes, ionizing radiation curable resin is particularly preferable as the relief forming material. The same applies when having multiple designs of three or more layers.
[0101] 上記に示したガラス転移温度の関係を満足しないと、レリーフ形状の形状維持が困 難となり、ひび割れ、白化等が生じ、光輝性複数図柄としての十分な輝度が得られな くなつてしまう。 [0101] If the above glass transition temperature relationship is not satisfied, it is difficult to maintain the relief shape. It becomes difficult, cracking, whitening, etc. occur, and sufficient brightness as a glittering design cannot be obtained.
[0102] 但し、上記のガラス転移温度は、動的粘弾性測定における損失正接 (tan δ )が最 大値をとる温度を当該樹脂のガラス転移温度としたものである。粘弾性の測定方法は 、測定機器としてレオメトリックス製 ARESを用い、測定条件は、パラレルプレート 10 πιπι Φ、歪み 1 %、振幅 1Ηζ、昇温速度 2°CZmin.で、試料の榭脂の温度を 30°Cか ら 200°Cに昇温させることにより行う。また、一般に貯蔵弾性率 G' は弾性成分で、高 分子中でのコイルの振動や凝集体構造などの構造が生じることによって発生し、損 失弾性率 Gグ は粘性成分であり、静的の剪断応力と等価なものである。 tan δは G" /G' により求められ、材料が変形する際にどれくらいのエネルギーを吸収するかの 指標となる。  [0102] However, the glass transition temperature described above is the temperature at which the loss tangent (tan δ) in the dynamic viscoelasticity measurement has the maximum value, as the glass transition temperature of the resin. The measurement method of viscoelasticity is ARES manufactured by Rheometrics as a measuring instrument. The measurement conditions are parallel plate 10 πιπι Φ, strain 1%, amplitude 1Ηζ, heating rate 2 ° CZmin. The temperature is raised from 30 ° C to 200 ° C. In general, the storage elastic modulus G ′ is an elastic component, which is generated by the generation of a structure such as a coil vibration or an aggregate structure in a high molecule, and the loss elastic modulus G g is a viscous component, which is a static component. It is equivalent to shear stress. tan δ is determined by G "/ G 'and is an index of how much energy is absorbed when the material is deformed.
[0103] また、請求項 3〜6の発明では、 2枚の光輝性フィルム 1 OAと 10Bの、反射層 17Aと 反射層 17B面、基材 1 1 Aと基材 11B面、又は反射層 17Aと基材 11B面とを積層す ればよい。該積層方法としては、貼合できればよぐ特に限定されないが、例えば、ド ライラミネーシヨン法、押出ラミネーシヨン法、粘着剤ラミネーシヨン法、熱ラミネーショ ン法などの公知の方法が適用でき、接着層 19の材料は、貼合方法に応じて適宜選 択すればよい。  [0103] Further, in the inventions of claims 3 to 6, the two glitter films 1OA and 10B, the reflective layer 17A and the reflective layer 17B surface, the base material 11A and the base material 11B surface, or the reflective layer 17A And the substrate 11B surface may be laminated. The laminating method is not particularly limited as long as it can be bonded. For example, a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method can be applied. The 19 materials may be appropriately selected according to the bonding method.
[0104] また、熱圧賦型法と EC賦型法とを組み合わせてもよぐ図 5、図 6、及び図 7に示す 層構成の場合には、例えば、まず、第 1基材 11A上の第 1レリーフ形成層 15Aへ熱 圧賦型法で賦型し、第 1反射層 17Aを形成又は形成せずに、第 1基材 11A面又は 第 1反射層 17A面へ、 EC賦型法で第 2レリーフ形成層 15Bを賦型すればょ ヽ。  [0104] Further, in the case of the layer configuration shown in Figs. 5, 6, and 7 in which the hot pressing molding method and the EC molding method may be combined, for example, first, on the first base material 11A The first relief forming layer 15A is molded by the thermo-pressure molding method, and the first reflective layer 17A is not formed or formed, and the first substrate 11A surface or the first reflective layer 17A surface is EC molded. Then mold the second relief forming layer 15B.
[0105] さらにまた、図 2、図 3、及び図 4に示す層構成の場合には、異なる図柄を有する、 2 又は 2以上の複数の光輝性フィルムを熱圧賦型法並びに EC賦型法にてそれぞれ作 製しておき、該光輝性フィルムの表裏面を如何様に組合わせて積層してよ!、。  [0105] Furthermore, in the case of the layer structure shown in Fig. 2, Fig. 3, and Fig. 4, two or more glitter films having different designs are subjected to a hot press molding method and an EC molding method. Please make them individually and then stack them together in any way!
[0106] さらに、図 1に示す層構成の場合には、例えば、まず、第 1光輝性フィルムと、第 2光 輝性フィルムを貼り合せた後、基材 11A、基材 1 IBをそれぞれ剥離することで作製 可能である。基材とレリーフ形成材料の接着性を調整することで、図 1に示す層構成 のフィルムを作製できる。基材とレリーフ形成層の接着力が強すぎる場合には、通常 接着力アップのために使用するプライマ層に変えて、接着力を低下するプライマ層 材料を使用することで、第 1光輝性フィルムと第 2光輝性フィルムを貼り合せた後に、 それぞれの基材を剥離することで、図 1に示す層構成のフィルムを作製することがで きる。 [0106] Further, in the case of the layer configuration shown in FIG. 1, for example, first, the first glitter film and the second glitter film are bonded together, and then the substrate 11A and the substrate 1 IB are peeled off, respectively. It is possible to make it. By adjusting the adhesion between the base material and the relief forming material, a film having the layer structure shown in FIG. 1 can be produced. If the adhesive strength between the substrate and the relief forming layer is too strong, By using a primer layer material that lowers the adhesive strength instead of the primer layer used to increase the adhesive strength, after bonding the first and second glitter films, By peeling, a film having the layer structure shown in FIG. 1 can be produced.
[0107] (他の層） [0107] (Other layers)
また、本発明の複数図柄光輝性フィルム 10には、何らかの手段を用いて光輝性図 柄が観察できる範囲で、必要に応じて、層構成の層間及び Z又は表面に、保護層、 着色層、磁気印刷層、及び Z又は榭脂層などの他の層、並びに Z又は印刷、プライ マ層などを設けてもよい。  Further, in the multi-pattern glitter film 10 of the present invention, a protective layer, a colored layer, and a layer may be provided between the layers and Z or the surface of the layer structure, as long as the glitter pattern can be observed by some means. Magnetic printing layers and other layers such as Z or resin layers, and Z or printing, primer layers, etc. may be provided.
[0108] 上記の保護層としては、前記のレリーフ形成層で説明した構成樹脂と同様に、ァク リル榭脂等の熱可塑性榭脂、そして、不飽和ポリエステル、メラミン、エポキシウレタン (メタ)アタリレート等の熱硬化性榭脂を硬化させたもの、不飽和エチレン系モノマーと 不飽和エチレン系オリゴマーを適宜混合したものに増感剤を添加した組成物等の紫 外線硬化性榭脂を硬化させたもの、或いは、上記熱可塑性榭脂と熱硬化性榭脂の 混合物やラジカル重合性不飽和基を有する熱成形性物質が使用可能である。特に 耐薬品性、耐光性及び耐候性等の耐久性に優れた熱硬化性榭脂、紫外線や電子 線などの電離放射線硬化性榭脂が好まし!/、。  [0108] As the protective layer, similar to the constituent resin described in the relief forming layer, thermoplastic resin such as acryl resin, unsaturated polyester, melamine, epoxy urethane (meth) atari Curing ultraviolet curable resin such as a composition obtained by curing a thermosetting resin such as a rate, a composition in which an unsaturated ethylene monomer and an unsaturated ethylene oligomer are appropriately mixed, and a sensitizer added. Or a mixture of the thermoplastic resin and the thermosetting resin, or a thermoformable substance having a radically polymerizable unsaturated group can be used. In particular, thermosetting resins with excellent durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams are preferred!
[0109] (他の支持基材）  [0109] (Other supporting substrates)
以上のようにして得られた本発明の複数図柄光輝性フィルムへは、さらに、別の基 材ゃ層を設けてもよい。例えば図 7に示すように、反射層 17Bの表面に接着層 21B を介して支持基材 30Bを設けることで、金属表面を保護することができる。支持基材 としては、基材 11に関して記載した材料が使用される。これらの合成樹脂フィルムや 紙基材などを、ドライラミネーシヨン法、押出ラミネーシヨン法、粘着剤ラミネーシヨン法 、熱ラミネーシヨン法などの公知の方法で積層すればよい。また、この支持基材として 離型処理した支持基材を用いることで、意匠性、セキュリティー性に優れた粘着ラベ ルとすることができる。  Another base material layer may be further provided on the multi-pattern glittering film of the present invention obtained as described above. For example, as shown in FIG. 7, the metal surface can be protected by providing a support substrate 30B on the surface of the reflective layer 17B via an adhesive layer 21B. As the supporting substrate, the materials described for the substrate 11 are used. These synthetic resin films and paper base materials may be laminated by a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method. Further, by using a support substrate that has been subjected to a release treatment as the support substrate, it is possible to obtain an adhesive label that is excellent in design and security.
[0110] (接着剤）  [0110] (Adhesive)
接着層 19、 21B、 23に使用する接着剤としては、上記した従来公知の積層方法に 順じて適宜材料を選定すればよい。例えば、ドライラミネーシヨン法にて、積層する場 合、熱、または紫外線'電子線などの電離放射線で硬化する接着剤が適用できる。 熱硬化接着剤としては、 2液硬化型ウレタン系接着剤、ポリエステルウレタン系接着 剤、ポリエーテルウレタン系接着剤、アクリル系接着剤、ポリエステル系接着剤、ポリ アミド系接着剤、ポリ酢酸ビニル系接着剤、エポキシ系接着剤、ゴム系接着剤などが 適用できる。なかでも 2液硬化型ウレタン系接着剤が好適である。溶媒へ分散または 溶解した接着剤を塗布し乾燥させて、 2枚の光輝性フィルムを重ねて積層した後に、 30〜120°Cで数時間〜数日間エージングすることで、接着剤を硬化させるとよい。 既に形成されたレリーフ形状を破壊することがないよう、できるだけ低温で硬化できる 接着剤、好ましくは賦型されたレリーフ形成層材料のガラス転移温度 Tg (h)より低 ヽ 温度で硬化できる接着剤、さらに好ましくは Tg (u)より低 ヽ温度で硬化できる接着剤 、が特に好ましく使用される。該接着層の膜厚としては、 0. 1〜20 ;ζ ΐη (乾燥状態） 程度、好ましくは 1. 0〜5. O /z mである。 As the adhesive used for the adhesive layers 19, 21B, 23, the above-described conventionally known laminating method is used. The materials may be selected as appropriate. For example, in the case of laminating by the dry lamination method, an adhesive that is cured by ionizing radiation such as heat or ultraviolet rays' electron beam can be applied. Thermosetting adhesives include two- component curable urethane adhesives, polyester urethane adhesives, polyether urethane adhesives, acrylic adhesives, polyester adhesives, polyamide adhesives, and polyvinyl acetate adhesives. Adhesives, epoxy adhesives, rubber adhesives, etc. can be applied. Among these, a two-component curable urethane adhesive is preferable. When an adhesive dispersed or dissolved in a solvent is applied and dried, two glitter films are stacked and laminated, and then the adhesive is cured by aging at 30 to 120 ° C for several hours to several days. Good. An adhesive that can be cured at the lowest possible temperature so as not to destroy the already formed relief shape, preferably an adhesive that can be cured at a temperature lower than the glass transition temperature Tg (h) of the shaped relief forming layer material, More preferably, an adhesive that can be cured at a lower temperature than Tg (u) is particularly preferably used. The thickness of the adhesive layer is about 0.1 to 20; about ζ ΐη (dry state), preferably 1.0 to 5. O / zm.
(光輝性複数図柄形成物） (Glittering multiple pattern formation)
本発明の光輝性複数図柄形成物 100は、本発明の複数図柄光輝性フィルム 10を 、他の支持基材へ様々の貼着方法で付与したものである。貼着方法は特に限定され るものではなぐ例えば、接着剤や粘着剤による法、熱圧着法、抄込みによる抄紙法 、ラベルや転写箔などとしてもよい。該光輝性複数図柄形成物は、図柄の異なる少な くとも光輝性の第 1図柄及び光輝性の第 2図柄を有し、特異な意匠性、セキュリティ性 を持っている。図 8に、本発明の光輝性複数図柄形成物の一つの例を示したが、第 1 光輝性フィルム 10A (第 1基材 11AZ第 1プライマ層 13A (必要に応じて) Z第 1レリ ーフ形成層 15A (第 1レリーフ形状 16Aを有する) Z第 1反射層 17A)と、第 2光輝性 フィルム 10B (第 2反射層 17BZ第 2レリーフ形成層 15B (第 2レリーフ形状 16Bを有 する） Z第 2プライマ層 13B (必要に応じて) Z第 2基材 11B)との、第 1反射層 17A 面と第 2反射層 17B面とを接着層 19で積層した層構成である複数図柄光輝性フィル ム 10と、基紙 101とを、複数図柄光輝性フィルム 10の第 2基材 11Bと基紙 101とが接 着層 23を介して接するように貼着することができる。図示したものは、支持基材として 、基紙を用いたものであるが、これに限らず、合成樹脂フィルム、カード、ガラス等、適 宜変更できる。 The glitter multi-pattern formed article 100 of the present invention is obtained by applying the multi-pattern glitter film 10 of the present invention to other supporting bases by various sticking methods. The sticking method is not particularly limited. For example, a method using an adhesive or a pressure-sensitive adhesive, a thermocompression bonding method, a paper making method using paper making, a label or a transfer foil may be used. The glitter multi-pattern formation has at least the first and second glitter designs having different designs, and has a unique design and security. FIG. 8 shows an example of the glitter multi-patterned product of the present invention. The first glitter film 10A (first substrate 11AZ first primer layer 13A (if necessary) Z first release Forming layer 15A (having first relief shape 16A) Z first reflecting layer 17A) and second glittering film 10B (second reflecting layer 17BZ second relief forming layer 15B (having second relief shape 16B) Z 2nd primer layer 13B (optional) Z 2nd base material 11B), multi-pattern luminosity consisting of a layer structure in which first reflective layer 17A surface and second reflective layer 17B surface are laminated with adhesive layer 19 The adhesive film 10 and the base paper 101 can be attached so that the second base material 11B of the multi-pattern glitter film 10 and the base paper 101 are in contact with each other through the adhesive layer 23. The illustrated one uses a base paper as the supporting substrate, but is not limited to this, and is not limited to a synthetic resin film, card, glass, or the like. You can change it.
[0112] 第 2の発明  [0112] Second invention
以下、第 2の本発明に係る複数図柄光輝性スレッドの実施形態について、図面を 参照しながら、詳細に説明する。  Hereinafter, an embodiment of the multi-pattern glitter thread according to the second aspect of the present invention will be described in detail with reference to the drawings.
[0113] 図 9〜15は、第 2の本発明の 1実施例を示す複数図柄光輝性スレッドの断面図で あり、図 16は、本発明の 1実施例を示す光輝性複数図柄形成物の平面図及び AA 断面図である。  [0113] FIGS. 9 to 15 are cross-sectional views of a multi-design glitter thread showing one embodiment of the second invention, and FIG. 16 is a diagram of a glitter multi-pattern formation showing one embodiment of the invention. It is a top view and AA sectional drawing.
[0114] (複数図柄光輝性スレッド）  [0114] (Multi-pattern glitter thread)
本発明の複数図柄光輝性スレッド 10の基本的な構成としては、少なくとも、第 1レリ ーフ形成層 15A (第 1レリーフ形状 16Aを有する) Z第 1反射層 17A、及び第 2反射 層 17BZ第 2レリーフ形成層 15B (第 2レリーフ形状 16Bを有する）を有し、かつ、第 1 レリーフ形状 16Aと第 2レリーフ形状 16Bとが異なっていればよい。第 1レリーフ形状 16Aは第 1図柄、第 2レリーフ形状 16Bは第 2図柄を示し、第 1図柄及び Z又は第 2 図柄の光輝性図柄は、光輝性であれば特に限定されず、 1部、全面、又は複数図柄 の組合わせでもよい。なお、レリーフ形状は反射層 17面に設けられている。  The basic structure of the multi-pattern glittering thread 10 of the present invention includes at least the first relief forming layer 15A (having the first relief shape 16A), the Z first reflecting layer 17A, and the second reflecting layer 17BZ It is sufficient that the two relief forming layers 15B (having the second relief shape 16B) are provided and the first relief shape 16A and the second relief shape 16B are different. The 1st relief shape 16A shows the 1st design, the 2nd relief shape 16B shows the 2nd design, and the glitter design of the 1st design and Z or the 2nd design is not particularly limited as long as it is a glitter, 1 part, The entire surface or a combination of multiple symbols may be used. The relief shape is provided on the surface of the reflective layer 17.
[0115] 本明細書では、主に 2つの光輝性図柄について記載する力 2つ以上の複数図柄 でもよぐ複数の光輝性図柄の場合については、光輝性図柄の繰返しであり省略さ せて頂く。 2つ以上の複数図柄としては、例えば、第 3レリーフ形成層 15CZ第 3反射 層 17CZ第 1レリーフ形成層 15 AZ第 1反射層 17AZ接着層 19Z第 2反射層 17B Z第 2レリーフ形成層 15B、第 3レリーフ形成層 15CZ第 3反射層 17CZ第 1レリー フ形成層 15AZ第 1反射層 17AZ接着層 19Z第 2反射層 17BZ第 2レリーフ形成 層 15BZ第 4反射層 17DZ第 4レリーフ形成層 15Dの層構成とすることで、 3又は 4 図柄とすることができる。この場合には第 3反射層 17C及び第 4反射層 17Dを透明反 射層とすると、意匠性に富んだ光輝性スレッドとできる。また、セキュリティー性向上の ため意図的に半透明、不透明にするものよい。  [0115] In the present specification, the force mainly described for two glitter designs. In the case of a plurality of glitter designs that may be two or more symbols, it is a repetition of the glitter design and will be omitted. . The two or more patterns include, for example, the third relief forming layer 15CZ third reflecting layer 17CZ first relief forming layer 15 AZ first reflecting layer 17AZ adhesive layer 19Z second reflecting layer 17B Z second relief forming layer 15B, 3rd relief forming layer 15CZ 3rd reflective layer 17CZ 1st relief forming layer 15AZ 1st reflective layer 17AZ adhesive layer 19Z 2nd reflective layer 17BZ 2nd relief forming layer 15BZ 4th reflective layer 17DZ 4th relief forming layer 15D layer By configuring it, it can be 3 or 4 symbols. In this case, if the third reflective layer 17C and the fourth reflective layer 17D are transparent reflective layers, it is possible to obtain a glittering thread having a rich design. Also, it should be intentionally made translucent and opaque to improve security.
[0116] (図柄合せ構成）  [0116] (Design combination structure)
第 1及び Z又は第 2の層構成は特に限定されないが、例えば、図 1に示すような、 第 1レリーフ形成層 15A (第 1レリーフ形状 16Aを有する) Z第 1反射層 17AZ接着 層 19Z第 2反射層 17BZ第 2レリーフ形成層 15B (第 2レリーフ形状 16Bを有する） の層構成である。 The first and Z or the second layer structure is not particularly limited.For example, as shown in FIG. 1, the first relief forming layer 15A (having the first relief shape 16A) Z the first reflective layer 17AZ adhesion Layer 19Z is a layer structure of second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B).
[0117] また、図 2に示すような、第 1光輝性フィルム 10A (第 1基材 11AZ第 1プライマ層 1 3A (必要に応じて) Z第 1レリーフ形成層 15A (第 1レリーフ形状 16Aを有する） Z第 1反射層 17A)と、第 2光輝性フィルム 10B (第 2反射層 17BZ第 2レリーフ形成層 15 B (第 2レリーフ形状 16Bを有する） Z第 2プライマ層 13B (必要に応じて) Z第 2基材 11B)との、第 1反射層 17A面と第 2反射層 17B面とを接着層 19で積層した層構成 が好ましい。  In addition, as shown in FIG. 2, the first glittering film 10A (first base material 11AZ first primer layer 13A (if necessary) Z first relief forming layer 15A (first relief shape 16A Z) first reflective layer 17A) and second glittering film 10B (second reflective layer 17BZ second relief forming layer 15B (having second relief shape 16B) Z second primer layer 13B (if necessary) ) A layer configuration in which the first reflective layer 17A surface and the second reflective layer 17B surface are laminated with an adhesive layer 19 with the Z second base material 11B) is preferable.
[0118] また、基材を除去してもよぐ図示しないが、第 1基材 11AZ第 1レリーフ形成層 15 A (第 1レリーフ形状 16Aを有する) Z第 1反射層 17AZ接着層 19Z第 2反射層 17B Z第 2レリーフ形成層 15B (第 2レリーフ形状 16Bを有する）の層構成でもよい。さらに また、第 1基材 11Aと第 2基材 11Bの両基材を除去すると、図 1の構成となる。基材の 除去は片側を除去して抄き込んだり、抄き込みの後にもう片方を除去したり、すれば よい。抄き込みに代え、接着剤を用いるなどして適宜貼り合せてもよい。  [0118] Although the substrate may be removed, the first substrate 11AZ first relief forming layer 15A (having the first relief shape 16A) Z first reflective layer 17AZ adhesive layer 19Z second The layer structure of the reflective layer 17B Z second relief forming layer 15B (having the second relief shape 16B) may be used. Further, when both the first base material 11A and the second base material 11B are removed, the structure shown in FIG. 1 is obtained. The substrate can be removed by removing one side of the paper, or removing the other after the paper making. Instead of paper making, it may be appropriately bonded by using an adhesive or the like.
[0119] (基材合せ構成）  [0119] (Base material alignment)
図 3に示すような、第 1光輝性フィルム 10Aと、第 2光輝性フィルム 10Bとの、第 1基 材 11 A面と第 2基材 11B面とを接着層 19で積層した層構成でもよ 、。  As shown in FIG. 3, the first glittering film 10A and the second glittering film 10B may have a layer structure in which the first substrate 11A surface and the second substrate 11B surface are laminated with an adhesive layer 19. ,.
[0120] また、図 4に示すような、第 1光輝性フィルム 10A (第 1基材 11AZ第 1レリーフ形成 層 15A (第 1レリーフ形状 16Aを有する） Z第 1反射層 17A)と、第 2光輝性フィルム 1 OB (第 2基材 11BZ第 2レリーフ形成層 15B (第 2レリーフ形状 16Bを有する） Z第 2 反射層 17BZ第 2保護層 25B (必要に応じて)）との、第 1反射層 17A面と第 2基材 1 1B面とを接着層 19で積層した層構成でもよ ヽ。  Further, as shown in FIG. 4, the first glittering film 10A (first base material 11AZ first relief forming layer 15A (having the first relief shape 16A) Z first reflecting layer 17A), the second First reflection with glitter film 1 OB (second base material 11BZ second relief forming layer 15B (having second relief shape 16B) Z second reflective layer 17BZ second protective layer 25B (if necessary)) A layer structure in which the layer 17A surface and the second base material 11B surface are laminated with an adhesive layer 19 may be used.
[0121] (両面 2図柄構成）  [0121] (Double-sided 2 symbol composition)
図 5に示すような、第 1基材 11Aの、一方の面に第 1レリーフ形成層 15A (第 1レリー フ形状 16Aを有する) Z第 1反射層 17AZ第 1保護層 25A (必要に応じて)を設け、 他方の面に第 2レリーフ形成層 15B第 2レリーフ形状 16Bを有する） Z第 2反射層 17 BZ第 2保護層 25B (必要に応じて）を設けてもよ!、。  As shown in FIG. 5, the first relief forming layer 15A (having the first relief shape 16A) on one side of the first base material 11A Z the first reflective layer 17AZ the first protective layer 25A (if necessary) And the second relief forming layer 15B and the second relief shape 16B are provided on the other surface.) A Z second reflective layer 17 BZ second protective layer 25B (if necessary) may be provided.
[0122] さらに、図 3には印刷 27、第 1保護層 25A、第 2保護層 25B、図 4には第 2保護層 2 5B、図 5には、第 1保護層 25A、第 2保護層 25Bを例示しているが、該印刷、保護層 、他の基材、及び Z又は他の層を設けてもよぐ該層を設ける位置は、層間及び Z又 は表面の 1又は複数でよい。 [0122] Further, FIG. 3 shows printing 27, first protective layer 25A, second protective layer 25B, and FIG. 4 shows second protective layer 2 5B and FIG. 5 illustrate the first protective layer 25A and the second protective layer 25B, but the printing, protective layer, other base material, and Z or other layers may be provided. The location of the can be one or more of the interlayer and Z or surface.
[0123] (片面 2図柄構成）  [0123] (2 symbols on one side)
図 6に示すように、第 1基材 11Aへ、第 1レリーフ形成層 15A (第 1レリーフ形状 16 Aを有する) Z第 1反射層 17Aを設け、該第 1反射層 17A面へさらに、第 2レリーフ形 成層 15B (第 2レリーフ形状 16Bを有する) Z第 2反射層 17BZ第 2保護層 25B (必 要に応じて)を設けてもよい。  As shown in FIG. 6, a first relief forming layer 15A (having a first relief shape 16A) Z first reflective layer 17A is provided on the first base material 11A, and the first reflective layer 17A surface is further provided with a first relief layer 17A. A two-relief layer 15B (having a second relief shape 16B) Z a second reflective layer 17BZ a second protective layer 25B (if necessary) may be provided.
[0124] また、図 7に示すように、図 6の構成の第 2保護層 25Bの代わりに、接着層 21Bを設 け、第 2支持基材 30Bを積層することができる。これにより、第 2支持基材が保護層と して働き、反射層の耐久性をより向上させることができる。  Further, as shown in FIG. 7, instead of the second protective layer 25B having the configuration of FIG. 6, an adhesive layer 21B can be provided and the second support base material 30B can be laminated. As a result, the second support base material acts as a protective layer, and the durability of the reflective layer can be further improved.
[0125] (材料と層形成）  [0125] (Material and layer formation)
次に、基材ゃ層の材料、層の形成について、説明するが、第 1基材 11A及び第 2 基材 11B (合わせて基材 11)、第 1レリーフ形成層 15A及び第 2レリーフ形成層 15B (合わせてレリーフ形成層 15)、第 1反射層 17A及び第 2反射層 17B (合わせて反射 層 17)、第 1保護層 25A及び第 2保護層 25B (合わせて保護層 25)、接着層 19、 21 Bは、同じ材料、形成法及び厚さでもよぐ異なるものでもよい。また、 3図柄以上の場 合は、説明を省略している力 第 3レリーフ形成層 15Cや第 4レリーフ形成層 15D、 第 3反射層 17Cや第 4反射層 17Dでも同様である。  Next, the material of the base material layer and the formation of the layer will be described. The first base material 11A and the second base material 11B (base material 11 together), the first relief forming layer 15A and the second relief forming layer 15B (together relief forming layer 15), first reflective layer 17A and second reflective layer 17B (together reflective layer 17), first protective layer 25A and second protective layer 25B (together protective layer 25), adhesive layer 19, 21 B may be the same material, forming method and different thickness. In the case of three or more patterns, the same is applied to the third relief forming layer 15C, the fourth relief forming layer 15D, the third reflecting layer 17C, and the fourth reflecting layer 17D that are not described.
[0126] (基材）  [0126] (Base material)
基材 11の材料としては、耐熱性、機械的強度、製造に耐える機械的強度、耐溶剤 性などがあれば、用途に応じて種々の材料が適用できる。例えば、ポリエチレンテレ フタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリエチレンテレフ タレート-イソフタレート共重合体、又はテレフタル酸-シクロへキサンジメタノール-ェ チレングリコール共重合体などのポリエステル系榭脂、ナイロン (商品名） 6、ナイロン (商品名） 66、ナイロン (商品名） 610、又はナイロン (商品名） 12などのポリアミド系榭 脂、ポリエチレン、ポリプロピレン、ポリブテン、又はポリメチルペンテンなどのポリオレ フィン系榭脂、ポリノルボネンなどの環状ポリオレフイン系榭脂、ポリ塩ィ匕ビュルなどの ビュル系榭脂、ポリアタリレート、ポリメタアタリレート、又はポリメチルメタアタリレートな どの (メタ)アクリル系榭脂、ポリイミド、ポリアミドイミド、又はポリエーテルイミドなどのィ ミド系榭脂、ポリアリレート、ポリスルホン、ポリエーテルスルホン、ポリフエ-レンエー テル、ポリフエ-レンスルフイド（PPS)、ポリアラミド、ポリエーテルケトン、ポリエーテル 二トリル、ポリエーテルエーテルケトン、又はポリエーテルサルファイトなどのェンジ二 アリング榭脂、ポリスチレン、高衝撃ポリスチレン、 AS榭脂、又は ABS榭脂などのス チレン系榭脂、ポリビュルアルコール榭脂、又はエチレン ビュルアルコール共重合 体等のポリビュルアルコール系榭脂、エチレン一四フッ化工チレン共重合体、三フッ 化塩化エチレン、四フッ化工チレン パーフルォロアルキルビュルエーテル共重合 体、フッ化ビ-リデン、フッ化ビュル、又はパーフルオローパーフロロプロピレンーパ 一フロロビュルエーテル共重合体等のフッ素系榭脂、セロファン、セルローストリァセ テート、セルロースダイアセテート、又は-トロセルロースなどのセルロース系フイノレム 、ポリカーボネート系榭脂、エチレン 酢酸ビニル共重合体ケン化物、ポリビニルブ チラール榭脂、ポリ酢酸ビュル系榭脂、ァセタール系榭脂、などがある。 As the material of the base material 11, various materials can be applied depending on the use as long as they have heat resistance, mechanical strength, mechanical strength that can withstand manufacturing, and solvent resistance. For example, polyester resin such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene terephthalate-isophthalate copolymer, or terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer, nylon (product Name) 6, Nylon (trade name) 66, Nylon (trade name) 610, Nylon (trade name) 12, etc. Polyamide resin, Polyolefin, Polypropylene, Polybutene or Polymethyl pentene, etc. Such as cyclic polyolefin resin such as polynorbornene, poly salt (Meth) acrylic resin such as bulle resin, polyacrylate, polymetaacrylate, or polymethylmetaacrylate, polyimide resin such as polyimide, polyamideimide, or polyetherimide, polyarylate, Engineered ring resins such as polysulfone, polyethersulfone, polyphenylene ether, polyphenylene sulfide (PPS), polyaramid, polyetherketone, polyether nitrile, polyetheretherketone, or polyethersulfite, polystyrene, high Polystyrene alcohol such as impact polystyrene, AS resin, or ABS resin, polybulal alcohol resin, or polybutyl alcohol copolymer such as ethylene polyalcohol copolymer, ethylene tetrafluoroethylene copolymer , Ethylene trifluoride, tetrafluoroethylene Chemical Tylene Perfluoroalkyl butyl ether copolymer, fluorinated resin, cellophane, cellulose triacetate such as vinylidene fluoride, fluorinated butyl, or perfluoro-perfluoropropylene-perfluoro butyl ether copolymer Cellulosic vinylene such as tate, cellulose diacetate, or -trocellulose, polycarbonate resin, saponified ethylene vinyl acetate copolymer, polyvinyl butyral resin, polyacetate resin, and acetal resin .
[0127] 該基材 11は、これら榭脂を主成分とする共重合榭脂、または、混合体 (ァロイでを 含む）、若しくは複数層からなる積層体であっても良い。また、該基材 11は、延伸フィ ルムでも、未延伸フィルムでも良いが、強度を向上させる目的で、一軸方向または二 軸方向に延伸したフィルムが好ましい。該基材 11は、これら榭脂の少なくとも 1層から なるフィルム、シート、ボード状として使用する。  [0127] The substrate 11 may be a copolymerized resin containing these resins as a main component, a mixture (including alloy), or a laminate composed of a plurality of layers. The substrate 11 may be a stretched film or an unstretched film, but a film stretched in a uniaxial direction or a biaxial direction is preferable for the purpose of improving the strength. The substrate 11 is used as a film, sheet, or board formed of at least one layer of these resins.
[0128] また、本発明の複数図柄光輝性スレッド 10の全体の総厚さとしては、細幅に裁断さ れ、さらに紙基材へ抄き込まれるので、スレッドの厚さを極わめて薄くする必要があり 、 4〜40 μ m程度、好ましくは 8〜30 μ m、さらに好ましくは 10〜24 μ mである。 4 μ m未満では、機械的な強度が不足して、裁断時や抄紙時にスレッドが切断したり、低 歩留まりや低生産性、である。 40 /z m以上では、抄紙機による抄き込み適性はよい 1S 抄紙された用紙に凹凸が生じたり、スレッドが紙基材カも容易に剥離したり、また 、用紙としての一体感がないので、別の用紙へ別の光輝性物を貼着されるなどの偽 造をされ易いという欠点がある。該複数図柄光輝性スレッド 10の総厚さの大部分は 基材 11の厚さであり、第 1基材 11A及び第 2基材 11Bの厚さとしては、同じでも別の 厚さでもよいが、積層した際のカールを少なくする点から同じ厚さが好ましい。 [0128] In addition, the total thickness of the multi-pattern glittering thread 10 of the present invention is cut into a thin width and further cut into a paper base material. It is necessary to make it thin, and it is about 4 to 40 μm, preferably 8 to 30 μm, more preferably 10 to 24 μm. If it is less than 4 μm, the mechanical strength is insufficient, threads are cut during cutting and paper making, and the yield and productivity are low. At 40 / zm or more, the papermaking machine has good suitability for paper making.Since paper is uneven, the paper base is easily peeled off, and there is no sense of unity as paper. There is a drawback that it is easy to forge, such as attaching another glittering material to another paper. Most of the total thickness of the multi-pattern glitter thread 10 is the thickness of the base material 11, and the thicknesses of the first base material 11A and the second base material 11B may be the same or different. Although the thickness may be sufficient, the same thickness is preferable from the viewpoint of reducing curling when laminated.
[0129] 通常、複数図柄光輝性スレッドには 2枚の基材 11があるので、 1枚の基材 11の厚さ は極めて薄くせねばならない。該基材 11の厚さとしては、 2〜20 /ζ πι程度、好ましく は 4〜15 /ζ πι、さらに好ましくは 5〜 12 mである。該薄さでも機械的強度がよぐ耐 熱性もよ 、ポリエチレンテレフタレート、ポリエチレンナフタレートが好適である。  [0129] Usually, since the multi-design glitter thread has two base materials 11, the thickness of the single base material 11 must be extremely thin. The thickness of the substrate 11 is about 2 to 20 / ζ πι, preferably 4 to 15 / ζ πι, and more preferably 5 to 12 m. Polyethylene terephthalate and polyethylene naphthalate are suitable because they are thin but have good mechanical strength and heat resistance.
[0130] (プライマ層）  [0130] (Primer layer)
また、該基材 11は、層を形成する面側に、層間の密着力を向上させるために、必 要に応じてプライマ層 13、またはコロナ放電処理、プラズマ処理、オゾンガス処理、 フレーム処理、予熱処理、除塵埃処理、アルカリ処理などなどの易接着処理を施して もよい。特に、プライマ層 13は、例えば、ポリウレタン系榭脂、ポリエステル系榭脂、ポ リアミド系榭脂、エポキシ系榭脂、フエノール系榭脂、ポリ塩ィ匕ビュル系榭脂、ポリ酢 酸ビュル系榭脂、塩ィ匕ビュル 酢酸ビュル共重合体、酸変性ポリオレフイン系榭脂、 エチレンと酢酸ビュル或いはアクリル酸などとの共重合体、（メタ)アクリル系榭脂、ポ リビュルアルコール系榭脂、ポリビュルァセタール榭脂、ポリブタジエン系榭脂、ゴム 系化合物、石油系榭脂、アルキルチタネート系化合物、ポリエチレンイミン系化合物 、イソシァネート系化合物、澱粉、カゼイン、アラビアゴム、セルロース誘導体、ヮック ス類などを使用することができる。  Further, the base material 11 has a primer layer 13 or a corona discharge treatment, a plasma treatment, an ozone gas treatment, a flame treatment, a pre-treatment, if necessary, in order to improve the adhesion between the layers on the surface on which the layer is formed. Easy adhesion treatment such as heat treatment, dust removal treatment or alkali treatment may be performed. In particular, the primer layer 13 includes, for example, a polyurethane-based resin, a polyester-based resin, a polyamide-based resin, an epoxy-based resin, a phenol-based resin, a polysalt-bulb-based resin, and a poly-acetic acid-based resin. Fat, salt-but-butyl acetate acetate copolymer, acid-modified polyolefin resin, copolymer of ethylene and acetate acetate or acrylic acid, (meth) acrylic resin, polybutyl alcohol resin, poly Use buracetal resin, polybutadiene resin, rubber compound, petroleum resin, alkyl titanate compound, polyethyleneimine compound, isocyanate compound, starch, casein, gum arabic, cellulose derivative, wax, etc. can do.
[0131] 上記の榭脂又はそのモノマー、オリゴマー、若しくはプレボリマー等の一種乃至複 数を主成分とし、これに、必要ならば、例えば、各種の安定剤、充填剤、反応開始剤 、硬化剤ないし架橋剤、などの添加剤を単独又は複数を任意に添加したり、主剤と 硬化剤とを組み合わせて、 1液硬化型、又は 2液硬化型等のいずれのものでも使用 することができる。これらの榭脂を、適宜溶剤に溶解又は分散し、必要に応じて充分 に混練して、コーティング剤組成物 (インキ、塗布液)を調整し、これを基材 11に公知 のコーティング法で塗布し乾燥する力、乾燥又は乾燥した後のエージング処理によつ て反応させて、プライマ層 13とする。該プライマー層 13の厚さは、 0. 05〜10 m程 度、好ましくは 0. 1〜5 /ζ πι、さらに好ましくは、 0. 2〜： mである。塗布方法として は、例えば、ロールコート法、グラビアコート法、スプレイコート法、エアナイフコート法 、キスコート法、その他等のコーティング法がある。プライマ層 13A及びプライマ層 13 Bは、同じ材料及び厚さでもよく、異なるものでもよい。 [0131] The main component is one or more of the above-mentioned rosins or monomers, oligomers, or prepolymers thereof. If necessary, for example, various stabilizers, fillers, reaction initiators, curing agents, One or a plurality of additives such as a cross-linking agent can be arbitrarily added, or a main component and a curing agent can be combined to use either a one-component curable type or a two-component curable type. These waxes are appropriately dissolved or dispersed in a solvent, and kneaded thoroughly as necessary to prepare a coating agent composition (ink, coating solution), which is applied to the substrate 11 by a known coating method. Then, the primer layer 13 is obtained by reacting with a drying force, aging treatment after drying or drying. The primer layer 13 has a thickness of about 0.05 to 10 m, preferably 0.1 to 5 / ζ πι, and more preferably 0.2 to m. Examples of the coating method include coating methods such as a roll coating method, a gravure coating method, a spray coating method, an air knife coating method, a kiss coating method, and others. Primer layer 13A and primer layer 13 B may be the same material and thickness, or may be different.
[0132] (レリーフの賦型）  [0132] (Relief shaping)
レリーフ形成層 15面へレリーフ形状 16を賦形 (複製とも呼称する)する。該賦形方 法としては、当業者が呼称する「熱圧法」が適用できる。まず、熱圧法は、基材 11へ レリーフ形成層 15を形成した後に、該レリーフ形成層 15の表面に、レリーフが形成さ れているスタンノ (金属版、又は榭脂版)を圧着 (所謂エンボス)をして、該レリーフを レリーフ形成層 15へ賦型し複製した後に、スタンパを剥離する方法である。  The relief shape 16 is shaped (also referred to as replication) on the relief forming layer 15 surface. As the shaping method, a “hot pressing method” called by those skilled in the art can be applied. First, in the hot pressing method, after forming the relief forming layer 15 on the base material 11, a stano (metal plate or resin plate) on which the relief is formed is pressure-bonded to the surface of the relief forming layer 15 (so-called embossing). ), The relief is shaped into the relief forming layer 15 and replicated, and then the stamper is peeled off.
[0133] (レリーフ形成層）  [0133] (Relief forming layer)
熱圧法に用いるレリーフ形成層 15の材料としては、ポリ塩化ビニル、アクリル榭脂（ 例、ポリメチルメタアタリレート）、ポリスチレン、ポリカーボネート等の熱可塑性榭脂、 そして、不飽和ポリエステル、メラミン、エポキシ、ポリエステル (メタ）アタリレート、ウレ タン (メタ）アタリレート、エポキシ (メタ）アタリレート、ポリエーテル (メタ）アタリレート、ポ リオール (メタ）アタリレート、メラミン (メタ）アタリレート、トリアジン系アタリレート等の熱 硬化性榭脂を硬化させたもの、不飽和エチレン系モノマーと不飽和エチレン系オリゴ マーを適宜混合したものに増感剤を添加した組成物等の紫外線硬化性榭脂を硬化 させたもの、或いは、上記熱可塑性榭脂と熱硬化性榭脂の混合物やラジカル重合性 不飽和基を有する熱成形性物質が使用可能である。特に耐薬品性、耐光性及び耐 候性等の耐久性に優れた熱硬化性榭脂、紫外線や電子線などの電離放射線硬化 性榭脂が好ましい。さら〖こは、耐熱性、耐圧性に優れた材料が好ましい。すなわち、 請求項 14〜16の発明では、第 1光輝性フィルムと第 2光輝性フィルムを貼り合せる際 の熱や圧力に耐えるレリーフ形成材料が好ましい。また、請求項 17〜18の発明では 、第 1レリーフ形成層を形成後、さらに、第 2レリーフ形成層を第 1基材の 11Aの反対 面、もしくは同一面に形成するため、第 1レリーフ形成層の材料としては第 2レリーフ 形成層にレリーフを賦型する際の熱や圧力に耐える材料が好ま ヽ。このような特性 を有する電離放射線硬化榭脂としては、例えば、エポキシ変性アタリレート榭脂、ウレ タン変性アタリレート榭脂、アクリル変性ポリエステル等の電離放射線硬化性榭脂を 硬化させたものが適用でき、好ましくはウレタン変性アタリレート榭脂である。  The material of the relief forming layer 15 used for the hot pressing method is thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, poly (meth) acrylate, melamine (meth) acrylate, triazine acrylate Cured UV curable resin such as a composition in which a sensitizer is added to an appropriate mixture of an unsaturated ethylene monomer and an unsaturated ethylene oligomer. Or a mixture of the above-mentioned thermoplastic and thermosetting resins and radically polymerizable unsaturated groups Molding material can be used. Particularly preferred are thermosetting resins excellent in durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams. Sarakuko is preferably a material having excellent heat resistance and pressure resistance. That is, in the inventions of claims 14 to 16, a relief forming material that can withstand heat and pressure when the first glittering film and the second glittering film are bonded together is preferable. In the inventions of claims 17 to 18, after the first relief forming layer is formed, the second relief forming layer is further formed on the opposite surface or the same surface of 11A of the first base material. The material of the layer is preferably a material that can withstand the heat and pressure when the relief is formed on the second relief forming layer. As the ionizing radiation curable resin having such characteristics, for example, those obtained by curing an ionizing radiation curable resin such as epoxy-modified acrylate resin, urethane-modified acrylate resin, and acrylic-modified polyester can be applied. Preferably, it is urethane-modified attalylate resin.
[0134] レリーフ形成層 15の好ましい 1つとしては、一般式 (a)で表されるウレタン変性アタリ ル系榭脂を主成分とする未硬化の電離放射線硬化性榭脂組成物を硬化させたの硬 化物である。具体的には、本出願人が特開 2000— 273129号公報で開示している 光硬化性榭脂組成物などが適用でき、前記明細書に記載の光硬化性榭脂組成物 A を本明細書の実施例でも使用し、「電離放射線硬化性榭脂組成物 A」と表記している [0134] One preferable example of the relief forming layer 15 is a urethane-modified attali represented by the general formula (a). This is a cured product obtained by curing an uncured ionizing radiation curable resin composition mainly composed of a ruby resin. Specifically, the photocurable resin composition disclosed by the present applicant in Japanese Patent Application Laid-Open No. 2000-273129 can be applied, and the photocurable resin composition A described in the above specification can be applied to the present specification. Used in the examples in the certificate, and is labeled as “ionizing radiation curable resin composition A”
[化 2] [Chemical 2]
Figure imgf000035_0001
Figure imgf000035_0001
[0135] (ここで、 6個の Rは夫々互いに独立して水素原子またはメチル基を表わし、 Rは  [Wherein six R's each independently represent a hydrogen atom or a methyl group,
1 2 炭素数が 1〜20個の炭化水素基を表わす。 1、 m、 n、 o及び pの合計を 100とした場 合に、 1ίま 20〜90、 miま 0〜80、 ηίま 0〜50、 ο+ρίま 10〜80、 piま 0〜40の整数であ る。 Xおよび Yは直鎖状または分岐鎖状のアルキレン基を表わし、 Zはウレタン変性ァ クリル樹脂を改質するための基を表し、好ましくは嵩高い環状構造の基を表わす。 ) レリーフ形成層 15の好ましい他の 1つとしては、融点が 40°C以上のイソシァネート 化合物と、イソシァネート基と反応し得る (メタ)アクリル化合物との反応生成物であつ て、軟ィ匕点が 40°C以上のものを含有する榭脂である。  1 2 represents a hydrocarbon group having 1 to 20 carbon atoms. When the sum of 1, m, n, o and p is 100, 1ί or 20 ~ 90, mi or 0 ~ 80, ηί or 0 ~ 50, ο + ρί or 10 ~ 80, pi or 0 ~ 40 It is an integer. X and Y represent a linear or branched alkylene group, Z represents a group for modifying a urethane-modified acryl resin, and preferably represents a group having a bulky cyclic structure. ) Another preferred relief forming layer 15 is a reaction product of an isocyanate compound having a melting point of 40 ° C. or higher and a (meth) acrylic compound capable of reacting with an isocyanate group, and has a soft point. This is a resin containing 40 ° C or higher.
[0136] 即ち、（1)融点が 40°C以上のイソシァネートイ匕合物と、（メタ)アタリロイル基を有し て!、て且つイソシァネート基と反応し得る (メタ)アクリルィ匕合物との反応生成物であつ て、軟ィ匕点が 40°C以上のものを含有する力、（2)融点が 40°C以上のイソシァネート 化合物と、（メタ)アタリロイル基を有して 、て且つイソシァネート基と反応し得る (メタ） アクリル化合物及び (メタ)アタリロイル基を有しておらず且つイソシァネート基と反応 し得る化合物との反応生成物であって、軟ィ匕点が 40°C以上のものを含有する電離放 射線硬化性榭脂の硬化物である。また、イソシァネートイ匕合物が、非芳香族性炭化 水素環に結合したイソシァネート基を有するもの、イソホロンジイソシァネートの三量 体、又はイソホロンジイソシァネートと活性水素含有ィ匕合物との反応生成物であり、さ らに、（メタ)アクリルィ匕合物力 （メタ)アクリル酸、水酸基を有する (メタ)アタリレートで あることが好ましい。具体的には、特開 2001— 329031号公報で開示されている光 硬化性榭脂が適用でき、本明細書の実施例では「電離放射線硬化性榭脂組成物 B」 と表記している。 That is, (1) a reaction between an isocyanate compound having a melting point of 40 ° C. or higher and a (meth) acrylic compound having a (meth) atallyloyl group and capable of reacting with an isocyanate group. A product that has a soft melting point of 40 ° C or higher, (2) an isocyanate compound having a melting point of 40 ° C or higher, a (meth) atallyloyl group, and an isocyanate group Can react with (meta) An ionizing radiation curable product containing a reaction product of an acrylic compound and a compound that does not have a (meth) attalyloyl group and can react with an isocyanate group and has a soft spot of 40 ° C or higher. It is a cured product of rosin. Further, the isocyanate compound has an isocyanate group bonded to a non-aromatic hydrocarbon ring, a trimer of isophorone diisocyanate, or an isophorone diisocyanate and an active hydrogen-containing compound. It is a reaction product, and (meth) acrylic compound strength (meth) acrylic acid and (meth) acrylate having a hydroxyl group are preferred. Specifically, the photocurable resin disclosed in Japanese Patent Application Laid-Open No. 2001-329031 can be applied, and in the examples of this specification, it is expressed as “ionizing radiation curable resin composition B”.
[0137] (レリーフ形成層の形成） [0137] (Formation of relief forming layer)
レリーフ形成層 15を設ける方法としては、前述した材料、例えば、ウレタン変性ァク リル系榭脂の電離放射線硬化性榭脂には、必要に応じて、光重合開始剤、光増感 剤、光重合促進剤、多官能のモノマーやオリゴマー、離型剤、重合防止剤、粘度調 節剤、界面活性剤、消泡剤等の各種助剤、また、シリコーン、スチレン ブタジエンラ バー等の高分子体などを配合してもよぐこれらを有機溶媒へ溶解又は分散させるか As a method for providing the relief forming layer 15, for the above-mentioned materials, for example, an ionizing radiation curable resin of urethane-modified acrylic resin, a photopolymerization initiator, a photosensitizer, a photosensitizer can be used. Polymerization accelerators, polyfunctional monomers and oligomers, mold release agents, polymerization inhibitors, viscosity modifiers, surfactants, antifoaming agents, and other auxiliaries, and polymers such as silicone and styrene butadiene rubber Can they be dissolved or dispersed in an organic solvent?
、又は溶媒をカ卩えずノンソルベント状の、レリーフ形成層 15組成物 (インキ）とする。該 レリーフ形成層 15組成物 (インキ）を、例えば、ロールコート法、グラビアコート法、そ の他公知のコーティング法又は印刷法で、塗布し、必要に応じて乾燥すればよい。 該レリーフ形成層 15の厚さは、通常は 0. 1〜： LO /z m程度、好ましくは 0. 2〜5 /ζ πι、 さらに好ましくは 0. 5〜2 /ζ πιである。 0. 5 m未満では光輝性 (輝度）が著しく低下 し、 2 mを超えても輝度は十分である力 コスト的に不利である。 Or, the solvent is not used, but the non-solvent relief forming layer 15 composition (ink) is used. The relief forming layer 15 composition (ink) may be applied by, for example, a roll coating method, a gravure coating method, other known coating methods or printing methods, and dried as necessary. The thickness of the relief forming layer 15 is usually about 0.1 to about LO / zm, preferably 0.2 to 5 / ζ πι, and more preferably 0.5 to 2 / ζ πι. If it is less than 0.5 m, the brightness (brightness) is remarkably reduced, and if it exceeds 2 m, the brightness is sufficient. This is disadvantageous in terms of cost.
[0138] (レリーフ形状）  [0138] (Relief shape)
レリーフ形状 16は凹凸形状であり特に限定されるものではないが、微細な凹凸形 状を有する光拡散、光散乱、光反射、光回折などの機能を発現するものが好ましく、 例えば、フーリエ変換やレンチキュラーレンズ、光回折パターン、モスアイ、が形成さ れたものである。また、光回折機能はないが、特異な光輝性を発現するヘアライン柄 、マット柄、万線柄、干渉パターンなどでもよい。  The relief shape 16 is a concavo-convex shape and is not particularly limited, but preferably has a fine concavo-convex shape and expresses functions such as light diffusion, light scattering, light reflection, and light diffraction, such as Fourier transform and A lenticular lens, a light diffraction pattern, and a moth eye are formed. Further, although it does not have a light diffraction function, it may be a hairline pattern, a mat pattern, a line pattern, an interference pattern or the like that expresses a unique glitter.
[0139] 光回折凹凸パターンとしては、物体光と参照光との光の干渉による干渉縞が凹凸 模様で記録されたホログラムや回折格子が適用できる。ホログラムとしては、フレネル ホログラム等のレーザ再生ホログラム、及びレインボーホログラム等の白色光再生ホロ グラム、さらに、それらの原理を利用したカラーホログラム、コンピュータジエネレーテ イツドホログラム (CGH)、ホログラフィック回折格子などがある。 [0139] As the light diffraction uneven pattern, the interference fringes due to the light interference between the object light and the reference light are uneven. A hologram or diffraction grating recorded in a pattern can be applied. Holograms include laser reproduction holograms such as Fresnel holograms and white light reproduction holograms such as rainbow holograms, color holograms utilizing these principles, computer-generated holograms (CGH), holographic diffraction gratings, etc. There is.
[0140] 本明細書記載の図柄とは、これらの各種凹凸パターンを 1種もしくは 2種以上組み 合わせて形成される絵柄をいい、例えば、「abc」 「Security」といったテキストパタ ーンや、スナメ柄、水玉柄と呼ばれる幾何学パターン、さらには、花や鳥などの図柄 を模擬して作製された絵画パターンなどの組み合わせで形成された絵柄を、上記し たホログラムや回折格子力 なる光回折凹凸パターンの組み合わせで可視化した絵 柄をいう。また、複数図柄とは、これらの図柄を 1種かつ 1回用いたのみでは形成され ない図柄をいい、通常 2種以上の図柄を複数回用いて作製される図柄をいう。ただし 、例えば、基材面から「Security」と観測される図柄の作製された光輝性フィルムの 蒸着面同士を貼り合せることで表裏カゝらともに「Security」を観察可能な場合も本発 明の複数図柄光輝性スレッドである。 [0140] The pattern described in this specification refers to a pattern formed by combining one or more of these various concavo-convex patterns. For example, text patterns such as "abc" and "Security" Patterns formed from combinations of geometric patterns called patterns, polka dots, and painting patterns created by simulating flowers and birds, etc. A picture visualized by a combination of patterns. In addition, “multiple symbols” refers to symbols that cannot be formed by using these symbols once and once, and usually refers to symbols that are created using two or more symbols multiple times. However, for example, the present invention can also be used when both the front and back sides can observe “Securit y ” by bonding the vapor-deposited surfaces of the glitter film with the design of “Security” observed from the substrate surface. This is a multi-designed glitter thread.
[0141] 回折格子としては、ホログラム記録手段を利用したホログラフィック回折格子があげ られ、その他、電子線描画装置等を用いて機械的に回折格子を作成することにより、 計算に基づいて任意の回折光が得られる回折格子をあげることもできる。また、機械 切削法でもよい。これらのホログラム及び Z又は回折格子の単一若しくは多重に記 録しても、組み合わせて記録しても良い。これらの原版は公知の材料、方法で作成 することができ、通常、感光性材料を塗布したガラス板を用いたレーザ光干渉法、電 子線レジスト材料を塗布したガラス板に電子線描画法、機械切削法などが適用でき る。 [0141] Examples of the diffraction grating include a holographic diffraction grating using a hologram recording means. In addition, a diffraction grating is mechanically created by using an electron beam drawing apparatus or the like, so that arbitrary diffraction can be performed based on calculation. A diffraction grating from which light can be obtained can also be mentioned. Alternatively, a mechanical cutting method may be used. These holograms and Z or diffraction gratings may be recorded in a single or multiple manner, or in combination. These masters can be prepared by known materials and methods. Usually, a laser beam interference method using a glass plate coated with a photosensitive material, an electron beam drawing method on a glass plate coated with an electron beam resist material, Machine cutting method can be applied.
[0142] (レリーフの賦型）  [0142] (Relief shaping)
該レリーフ形成層 15面へ上記のレリーフ形状 16を賦形 (複製とも呼称する)する。 熱圧法での賦形は、レリーフ形成層 15の表面に、レリーフが形成されているスタンパ (金属版、又は榭脂版)を圧着 (所謂エンボス)をして、該レリーフをレリーフ形成層 15 へ賦型し複製した後に、スタンパを剥離することで行う。また、レリーフ形成層 15表面 に、さらに反射層 17を形成後、この表面にスタンパを圧着して賦型することも可能で ある。レリーフ形成層の材料によってはエンボス中に電離放射線を照射してからスタ ンパを剥離することでレリーフを複製する。商業的な複製は、長尺状で行うことで連 続な複製作業ができる。また、シリンダーにスタンパをとりつけたり、シリンダーに直接 レリーフを刻むなどして作製されたシリンダー状のスタンパを用いて、より商業的にレ リーフを複製することができる。 The relief shape 16 is shaped (also referred to as replication) on the surface of the relief forming layer 15. In the shaping by the hot pressing method, a stamper (metal plate or resin plate) on which a relief is formed is pressure-bonded (so-called emboss) to the surface of the relief forming layer 15, and the relief is applied to the relief forming layer 15. After forming and duplicating, the stamper is peeled off. It is also possible to form a reflective layer 17 on the surface of the relief forming layer 15 and then mold it by pressing a stamper on the surface. is there. Depending on the material of the relief forming layer, the relief is replicated by irradiating ionizing radiation during embossing and then removing the stamper. Commercial duplication can be done in a continuous form, allowing continuous duplication work. In addition, the relief can be replicated more commercially by using a cylindrical stamper that is manufactured by attaching a stamper to the cylinder or by directly engraving the relief on the cylinder.
[0143] (レリーフの硬化）  [0143] (Relief hardening)
レリーフ形成層 15として電離放射線硬化性榭脂を用いた場合には、スタンパでェ ンボス中、又はエンボス後に、電離放射線を照射して、電離放射線硬化性榭脂を硬 化させる。上記の電離放射線硬化性榭脂は、レリーフを形成後に、電離放射線を照 射して硬化 (反応)させると電離放射線硬化榭脂 (レリーフ形成層 15)となる。電離放 射線としては、電磁波が有する量子エネルギーで区分する場合もあるが、本明細書 では、すべての紫外線 (UV—A、 UV— B、 UV— C)、可視光線、ガンマ一線、 X線 、電子線を包含するものと定義する。従って、電離放射線としては、紫外線 (UV)、可 視光線、ガンマ一線、 X線、または電子線などが適用できる力 紫外線 (UV)が好適 であり、波長 300〜400nmの紫外線が最適である。電離放射線で硬化する電離放 射線硬化性榭脂は、紫外線硬化の場合は光重合開始剤、及び Z又は光重合促進 剤を添カ卩し、エネルギーの高い電子線硬化の場合は添カ卩しないで良ぐまた、適正 な触媒が存在すれば、熱エネルギーでも硬化できる。レリーフ形成層 15として、熱硬 化性榭脂を用いた場合には、使用する熱硬化性榭脂の硬化条件に応じた温湿度環 境下で、エージングを行い硬化させればよい。  When ionizing radiation curable resin is used as the relief forming layer 15, ionizing radiation is irradiated during or after embossing with a stamper to harden the ionizing radiation curable resin. When the ionizing radiation curable resin is cured (reacted) by irradiation with ionizing radiation after the relief is formed, the ionizing radiation curable resin (relief forming layer 15) is formed. Ionizing radiation may be classified according to the quantum energy of electromagnetic waves, but in this specification, all ultraviolet rays (UV—A, UV—B, UV—C), visible light, gamma rays, X-rays, It is defined as including an electron beam. Accordingly, as the ionizing radiation, ultraviolet rays (UV), visible rays, gamma rays, X-rays, or electron rays can be applied, and ultraviolet rays having a wavelength of 300 to 400 nm are most suitable. An ionizing radiation curable resin that is cured by ionizing radiation adds a photopolymerization initiator and Z or a photopolymerization accelerator in the case of ultraviolet curing, and does not add it in the case of high energy electron beam curing. It can also be cured with thermal energy if an appropriate catalyst is present. When a thermosetting resin is used as the relief forming layer 15, it may be cured by aging in a temperature and humidity environment according to the curing conditions of the thermosetting resin to be used.
[0144] (反射層）  [0144] (Reflective layer)
反射層 17A及び反射層 17B (反射層 17)は、所定のレリーフ構造を設けたレリーフ 形成層 15面のレリーフ面へ、反射層 17を設けることにより、レリーフの反射及び Z又 は回折効果を高めるので、レリーフ形成層 15の反射率より高ければ、特に限定され ず、例えば金属、または屈折率に差のある透明金属化合物が適用できる。この反射 層 17はレリーフ構造を設ける前に、レリーフ形成層 15へ形成することも可能である。 すなわち、各層の材料、スタンパを適宜選定することで、反射層 17形成後にレリーフ 形成することも可能である。 [0145] 該反射層 17に用いる金属としては、金属光沢を有し光を反射する金属元素の薄膜 で、 Cr、 Ni、 Ag、 Au、 Al等の金属、及びその酸ィ匕物、硫化物、窒化物等の薄膜を 単独又は複数を組み合わせてもよい。上記の光反射性の金属薄膜の形成は、いず れも 10〜2000nm程度、好ましくは 20〜： LOOOnmの厚さになるよう、真空蒸着法、ス ノ ッタリング法、イオンプレーティング法などの真空薄膜法で得られる力 その他、メッ キなどによっても形成できる。反射層 17の厚さがこの範囲未満では、光がある程度透 過して効果が減じ、また、それ以上では、反射効果は変わらないので、コスト的に無 駄である。 Reflective layer 17A and reflective layer 17B (reflective layer 17) enhance the reflection and Z or diffraction effect of the relief by providing reflective layer 17 on the relief surface of relief forming layer 15 with a predetermined relief structure. Therefore, it is not particularly limited as long as it is higher than the reflectance of the relief forming layer 15, and for example, a metal or a transparent metal compound having a difference in refractive index can be applied. The reflective layer 17 can be formed on the relief forming layer 15 before providing the relief structure. That is, a relief can be formed after forming the reflective layer 17 by appropriately selecting the material and stamper of each layer. [0145] The metal used for the reflective layer 17 is a metal element thin film that has a metallic luster and reflects light, such as Cr, Ni, Ag, Au, and Al, and its oxides and sulfides. A thin film of nitride or the like may be used alone or in combination. The above light-reflective metal thin films are all formed to a thickness of about 10 to 2000 nm, preferably 20 to: a vacuum such as a vacuum deposition method, a sputtering method, or an ion plating method so as to have a thickness of LOOOnm. It can also be formed by the force obtained by the thin film method and other methods. If the thickness of the reflective layer 17 is less than this range, the light is transmitted to some extent and the effect is reduced, and if it is more than that, the reflective effect is not changed, so that the cost is useless.
[0146] また、反射層 17として、ほぼ無色透明な色相で、その光学的な屈折率がレリーフ形 成層のそれとは異なる金属化合物を用いることにより、金属光沢が無いにもかかわら ず、ホログラムなどの光輝性を視認できるから、透明なホログラムなどの光輝性フィル ムを作製することができる。  [0146] Further, as the reflective layer 17, a metal compound having an almost colorless and transparent hue and an optical refractive index different from that of the relief forming layer is used. Since the glitter is visible, a glitter film such as a transparent hologram can be produced.
[0147] 透明な金属又は金属化合物としては、例えば、レリーフ形成層 15よりも光屈折率の 高い薄膜、および光屈折率の低い薄膜とがあり、前者の例としては、 ZnS、 TiO、 Al  [0147] Examples of the transparent metal or metal compound include a thin film having a higher refractive index than the relief forming layer 15 and a thin film having a lower refractive index. Examples of the former include ZnS, TiO, Al
2 2
O、 Sb S、 SiO、 SnO、 ITO等があり、後者の例としては、 LiF、 MgF、 A1FがあO, Sb S, SiO, SnO, ITO, etc., examples of the latter include LiF, MgF, A1F.
2 3 2 3 2 2 3 る。好ましくは、金属酸化物又は窒化物であり、具体的には、 Be、 Mg、 Ca、 Cr、 Mn 、 Cu、 Ag、 Al、 Sn、 In、 Te、 Fe、 Co、 Zn、 Ge、 Pb、 Cd、 Biゝ Se、 Ga、 Rb、 Sb、 Pb 、 Ni、 Sr、 Ba、 La、 Ce、 Au等の酸ィ匕物又は窒化物、他はそれらを 2種以上を混合し たもの等が挙げられる。またアルミニウム等の一般的な光反射性の金属薄膜も、厚み 力 S200A以下になると、透明性が出て使用できる。透明金属化合物の形成は、金属 の薄膜と同様、レリーフ形成層 15のレリーフ面に、 10〜2000nm程度、好ましくは 2 0〜： LOOOnmの厚さになるよう、蒸着、スパッタリング、イオンプレーティング、 CVDな どの真空薄膜法などにより設ければよい。さらには、レリーフ形成層 15と光の屈折率 の異なる透明な合成樹脂を使用してもよぐ接着層 19、 21Bや保護層 25材料とレリ ーフ形成層 15材料の屈折率が十分に異なる場合には、接着層 19、 21Bや保護層 2 5が反射層 17を兼ねることもできる。 2 3 2 3 2 2 3 Preferably, it is a metal oxide or nitride, specifically, Be, Mg, Ca, Cr, Mn, Cu, Ag, Al, Sn, In, Te, Fe, Co, Zn, Ge, Pb, Cd Bi, Se, Ga, Rb, Sb, Pb, Ni, Sr, Ba, La, Ce, Au, etc. . Also, general light-reflective metal thin films such as aluminum can be used with transparency when the thickness force is S200A or less. The transparent metal compound is formed on the relief surface of the relief forming layer 15 in the same manner as the metal thin film by vapor deposition, sputtering, ion plating, CVD so as to have a thickness of about 10 to 2000 nm, preferably 20 to LOOOnm. For example, a vacuum thin film method may be used. Furthermore, the refractive index of the adhesive layer 19, 21B or the protective layer 25 material and the relief forming layer 15 material may be sufficiently different from the relief forming layer 15 which may use a transparent synthetic resin having a different light refractive index. In this case, the adhesive layers 19 and 21B and the protective layer 25 can also serve as the reflective layer 17.
[0148] (複数図柄化） [0148] (Multiple designs)
以上のようにして、光輝性フィルム 10A及び 10Bが得られる。請求項 5〜6の発明で は、層の構成に従って、レリーフ形成層 15、レリーフ形状 16及び反射層 17を作製す る工程を繰り返すことで、複数図柄を有する複数図柄光輝性フィルムを作製し、この 複数図柄光輝性フィルムを適宜スリットすることで本発明の複数図柄光輝性スレッド 1 0を得ることができる。 As described above, the glitter films 10A and 10B are obtained. In inventions of claims 5-6 According to the structure of the layer, by repeating the process of producing the relief forming layer 15, the relief shape 16 and the reflective layer 17, a multi-design glitter film having a plurality of designs is produced, and this multi-design glitter film is appropriately used. By slitting, the multi-design glitter thread 10 of the present invention can be obtained.
[0149] このように、 1つの基材に対してレリーフ形成層 15、レリーフ形状 16及び反射層 17を 作製する工程を繰り返すことで複数図柄を有する複数図柄光輝性フィルムを作製す る際には、後からレリーフ形成層にレリーフ形状 16を作製する工程で、先に作製した レリーフ形状を破壊しないことが必要となる。  [0149] As described above, when a multi-pattern glittering film having a plurality of designs is produced by repeating the process of producing the relief forming layer 15, the relief shape 16 and the reflective layer 17 on one base material, In the later step of producing the relief shape 16 in the relief forming layer, it is necessary not to destroy the relief shape produced earlier.
[0150] このため先に形成された第 1レリーフ形成材料のガラス転移温度を Tgl (u)、この材 料の硬化後のガラス転移温度を Tgl (h)、後から形成された第 2レリーフ形成層を作 製する材料のガラス転移温度を Tg2 (u)、この材料の硬化後のガラス転移温度を Tg 2 (h)とするとき、第 1レリーフ形成層は第 2レリーフ形成層のレリーフが賦型される前 に硬化されるとともに、 Tgl (h) >Tg2 (u)の関係があることが好ましい。  [0150] For this reason, the glass transition temperature of the first relief forming material formed earlier is Tgl (u), the glass transition temperature after curing of this material is Tgl (h), and the second relief formed later is formed. When the glass transition temperature of the material from which the layer is made is Tg2 (u) and the glass transition temperature of this material after curing is Tg2 (h), the relief of the second relief forming layer is added to the first relief forming layer. It is preferable that the resin is cured before being molded and has a relationship of Tgl (h)> Tg2 (u).
[0151] また、第 1レリーフ形成層の材料、第 2レリーフ形成層の材料として一般的な熱可塑 性榭脂を使用する場合には、 Tgl (u) =Tgl (h) =Tgl、さらに、 Tg2 (u) =Tg2 (h) =Tg2とすると、 Tgl >Tg2の関係があることが好ましい。第 3、第 4とさらに複数個の レリーフ形成層を有する場合は、 Tgl >Tg2>Tg3 >Tg4、すなわち、 Tgl (u) >T g2 (u) >Tg3 (u) >Tg4 (u)の関係があることが好ましい。  [0151] When general thermoplastic resin is used as the material of the first relief forming layer and the material of the second relief forming layer, Tgl (u) = Tgl (h) = Tgl, When Tg2 (u) = Tg2 (h) = Tg2, it is preferable that there is a relationship of Tgl> Tg2. When there are 3rd, 4th and more relief forming layers, Tgl> Tg2> Tg3> Tg4, that is, Tgl (u)> T g2 (u)> Tg3 (u)> Tg4 (u) It is preferable that there is.
[0152] しカゝしながら、硬化性榭脂を使用する場合には (Tgl >Tg2)の関係が成立すること が特に好ましいわけではない。先にレリーフ形成される榭脂として硬化性榭脂を使用 すると、硬化前の Tgl (u)が低くても、レリーフ形成後にこの榭脂を硬化することで、 後から第 2レリーフ形成層にレリーフを賦型する時点において Tgl (h)を十分に高く することが容易なため好ましい。逆に、後からレリーフ形成する榭脂として硬化性榭脂 を使用すれば、第 2レリーフ形成層にレリーフを賦型する温度を十分に低くするととも に、第 2レリーフ形成後にこの榭脂を Tg2 (h)まで硬化することで製品の耐久性を十 分に高くすることができるので好ましい。すなわちレリーフ賦型時には硬化しておらず 、レリーフ賦型後硬化可能な硬化性榭脂を使用することで、未硬化時の樹脂のガラ ス転移温度が Tgl (u) =Tg2 (u)、もしくは、 Tgl (u)く Tg2 (u)の関係にあっても、 T gl (h) >Tg2 (u)の関係を成立することができ、先に形成されたレリーフの形状を破 壊することなく後に形成するレリーフを作製することができる。このようなレリーフ榭脂 の硬化を、全工程中、最適な工程で行うためには、レリーフ形成材料としては、電離 放射線硬化性榭脂が特に好ましい。 3層以上の複数図柄を有する際にも同様である [0152] However, it is not particularly preferable that the relationship of (Tgl> Tg2) is satisfied when a curable resin is used. If a curable resin is used as the resin to be relief formed first, even if the Tgl (u) before curing is low, this resin is cured after the relief is formed, so that the relief is later applied to the second relief forming layer. This is preferable because it is easy to make Tgl (h) sufficiently high at the time of molding. On the contrary, if curable resin is used as the resin to be relief formed later, the temperature at which the relief is formed on the second relief forming layer is sufficiently lowered, and the resin is converted to Tg2 after the second relief is formed. Curing to (h) is preferable because the durability of the product can be sufficiently increased. In other words, by using a curable resin that is not cured during relief molding and can be cured after relief molding, the glass transition temperature of the resin when uncured is Tgl (u) = Tg2 (u), or , Tgl (u) Tg2 (u) The relationship gl (h)> Tg2 (u) can be established, and a relief formed later can be produced without destroying the shape of the relief formed earlier. In order to cure such relief resin in an optimal process among all processes, ionizing radiation curable resin is particularly preferable as the relief forming material. The same applies when having multiple designs of 3 layers or more.
[0153] 上記に示したガラス転移温度の関係を満足しないと、レリーフ形状の形状維持が困 難となり、ひび割れ、白化等が生じ、光輝性複数図柄としての十分な輝度が得られな くなつてしまう。 [0153] If the relationship of the glass transition temperature shown above is not satisfied, it will be difficult to maintain the relief shape, cracking, whitening, etc. will occur, and sufficient brightness as a glittering multiple pattern will not be obtained. End up.
[0154] 但し、上記のガラス転移温度は、動的粘弾性測定における損失正接 (tan δ )が最 大値をとる温度を当該樹脂のガラス転移温度としたものである。粘弾性の測定方法は 、測定機器としてレオメトリックス製 ARESを用い、測定条件は、パラレルプレート 10 πιπι Φ、歪み 1 %、振幅 1Ηζ、昇温速度 2°CZmin.で、試料の榭脂の温度を 30°Cか ら 200°Cに昇温させることにより行う。また、一般に貯蔵弾性率 G' は弾性成分で、高 分子中でのコイルの振動や凝集体構造などの構造が生じることによって発生し、損 失弾性率 Gグ は粘性成分であり、静的の剪断応力と等価なものである。 tan δは G" /G' により求められ、材料が変形する際にどれくらいのエネルギーを吸収するかの 指標となる。  [0154] However, the glass transition temperature described above is the temperature at which the loss tangent (tan δ) in the dynamic viscoelasticity measurement has the maximum value, as the glass transition temperature of the resin. The measurement method of viscoelasticity is ARES manufactured by Rheometrics as a measuring instrument. The measurement conditions are parallel plate 10 πιπι Φ, strain 1%, amplitude 1Ηζ, heating rate 2 ° CZmin. The temperature is raised from 30 ° C to 200 ° C. In general, the storage elastic modulus G ′ is an elastic component, which is generated by the generation of a structure such as a coil vibration or an aggregate structure in a high molecule, and the loss elastic modulus G g is a viscous component, which is a static component. It is equivalent to shear stress. tan δ is determined by G "/ G 'and is an index of how much energy is absorbed when the material is deformed.
[0155] また、請求項 13〜15の発明では、異なる図柄を有する、 2又は 2以上の複数の光 輝性フィルムを作製しておき、 2枚の光輝性フィルム 10Aと 10Bの、反射層 17Aと反 射層 17B面、基材 1 1八と基材11 7面、又は反射層 17Aと基材 11B面とを積層す ることで得られた複数図柄光輝性フィルムを適宜スリットすることで本発明の複数図柄 光輝性スレッド 10を得ることができる。該積層方法としては、貼合できればよぐ特に 限定されないが、例えば、ドライラミネーシヨン法、押出ラミネーシヨン法、粘着剤ラミネ ーシヨン法、熱ラミネーシヨン法などの公知の方法が適用でき、接着層の材料は、貼 合方法に応じて適宜選択すればょ 、。好ましくはドライラミネーシヨン法である。  [0155] In the inventions of claims 13 to 15, two or more glitter films having different designs are prepared, and the reflective layer 17A of the two glitter films 10A and 10B is prepared. And a reflecting layer 17B surface, a base material 11 18 and a base material 11 7 surface, or a reflective layer 17A and a base material 11B surface are laminated, and a plurality of design glitter films are obtained by appropriately slitting. The multi-design glitter thread 10 of the invention can be obtained. The laminating method is not particularly limited as long as it can be bonded. For example, a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method can be applied. The material should be selected appropriately according to the bonding method. The dry lamination method is preferred.
[0156] さらに、図 9に示す層構成の場合には、例えば、まず、第 1光輝性フィルムと、第 2光 輝性フィルムを貼り合せた後、基材 11A、基材 1 IBをそれぞれ剥離することで作製 可能である。基材とレリーフ形成材料の接着性を調整することで、図 9に示す層構成 のスレッドを作製できる。基材とレリーフ形成層の接着力が強すぎる場合には、通常 接着力アップのために使用するプライマ層に変えて、接着力を低下するプライマ層 材料を使用することで、第 1光輝性フィルムと第 2光輝性フィルムを貼り合せた後に、 それぞれの基材を剥離することで、図 9に示す層構成のスレッドを作製することができ る。 Furthermore, in the case of the layer configuration shown in FIG. 9, for example, first, the first glitter film and the second glitter film are bonded together, and then the substrate 11A and the substrate 1 IB are peeled off, respectively. It is possible to make it. The layer structure shown in Fig. 9 is achieved by adjusting the adhesion between the base material and the relief forming material. Thread can be made. If the adhesive strength between the substrate and the relief forming layer is too strong, the first glittering film can be obtained by using a primer layer material that reduces the adhesive strength instead of the primer layer that is usually used to increase the adhesive strength. After laminating the second glittering film, the respective base materials are peeled off to produce a thread having a layer structure shown in FIG.
[0157] (他の層）  [0157] (Other layers)
また、本発明の複数図柄光輝性スレッド 10には、光輝性図柄が観察できる範囲で 、必要に応じて、層構成の層間及び Z又は表面に、保護層、着色層、磁気印刷、及 び Z又は榭脂層などの他の層、並びに Z又は印刷、プライマ層などを設けてもよい。 上記の保護層としては、前記のレリーフ形成層で説明した構成樹脂と同様に、ァク リル榭脂等の熱可塑性榭脂、そして、不飽和ポリエステル、メラミン、エポキシウレタン Further, in the multi-pattern glitter thread 10 of the present invention, a protective layer, a colored layer, magnetic printing, and Z are provided on the interlayer and Z or the surface of the layer structure as necessary, as long as the glitter pattern can be observed. Or other layers, such as a resin layer, and Z or printing, a primer layer, etc. may be provided. As the protective layer, similar to the constituent resin described in the relief forming layer, thermoplastic resin such as acryl resin, unsaturated polyester, melamine, epoxy urethane
(メタ)アタリレート等の熱硬化性榭脂を硬化させたもの、不飽和エチレン系モノマーと 不飽和エチレン系オリゴマーを適宜混合したものに増感剤を添加した組成物等の紫 外線硬化性榭脂を硬化させたもの、或いは、上記熱可塑性榭脂と熱硬化性榭脂の 混合物やラジカル重合性不飽和基を有する熱成形性物質が使用可能である。特に 耐薬品性、耐光性及び耐候性等の耐久性に優れた熱硬化性榭脂、紫外線や電子 線などの電離放射線硬化性榭脂が好まし!/、。 Ultraviolet curable molds such as those obtained by curing thermosetting resin such as (meth) arylate, compositions obtained by appropriately adding unsaturated ethylene monomers and unsaturated ethylene oligomers, and adding sensitizers A product obtained by curing fat, a mixture of the above-mentioned thermoplastic resin and thermosetting resin, or a thermoformable substance having a radical polymerizable unsaturated group can be used. In particular, thermosetting resins with excellent durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams are preferred!
[0158] (他の支持基材）  [0158] (Other supporting substrates)
以上のようにして得られた本発明の複数図柄光輝性フィルムへは、さらに、別の基 材ゃ層を設けてもよい。別の基材としては、特に限定されず、基材 11に関して記載し た材料が例示される。これらの合成樹脂フィルムを、ドライラミネーシヨン法、押出ラミ ネーシヨン法、粘着剤ラミネーシヨン法、熱ラミネーシヨン法などの公知の方法で積層 すればよい。例えば図 7に示すように、反射層 17Bの表面に接着層 21Bを介して第 2 支持基材 30Bを設けることで、金属表面を保護することができる。  Another base material layer may be further provided on the multi-pattern glittering film of the present invention obtained as described above. Another substrate is not particularly limited, and examples thereof include the materials described for the substrate 11. These synthetic resin films may be laminated by a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method. For example, as shown in FIG. 7, the metal surface can be protected by providing the second supporting substrate 30B on the surface of the reflective layer 17B via the adhesive layer 21B.
[0159] (接着剤）  [0159] (Adhesive)
接着層 19、 21Bに使用する接着剤としては、上記した従来公知の積層方法に順じ て適宜材料を選定すればよい。例えば、ドライラミネーシヨン法にて、積層する場合、 熱、または紫外線'電子線などの電離放射線で硬化する接着剤が適用できる。熱硬 化接着剤としては、 2液硬化型ウレタン系接着剤、ポリエステルウレタン系接着剤、ポ リエーテルウレタン系接着剤、アクリル系接着剤、ポリエステル系接着剤、ポリアミド系 接着剤、ポリ酢酸ビニル系接着剤、エポキシ系接着剤、ゴム系接着剤などが適用で きる。なかでも 2液硬化型ウレタン系接着剤が好適である。溶媒へ分散または溶解し た接着剤を塗布し乾燥させて、 2枚の光輝性フィルムを重ねて積層した後に、 30〜1 20°Cで数時間〜数日間エージングすることで、接着剤を硬化させるとよい。既に形 成されたレリーフ形状を破壊することがないよう、できるだけ低温で硬化できる接着剤 、好ましくは賦型されたレリーフ形成層材料のガラス転移温度 Tg (h)より低 、温度で 硬化できる接着剤、さらに好ましくは Tg (u)より低い温度で硬化できる接着剤、が特 に好ましく使用される。該接着層の膜厚としては、 0. 1〜20 ;ζ ΐη (乾燥状態)程度、 好ましくは 1. 0〜5. 0 mである。 As an adhesive used for the adhesive layers 19 and 21B, a material may be appropriately selected in accordance with the above-described conventionally known lamination method. For example, when laminating by the dry lamination method, an adhesive that is cured by ionizing radiation such as heat or ultraviolet rays' electron beam can be applied. Thermosetting Adhesive adhesives include two-component curable urethane adhesives, polyester urethane adhesives, polyether urethane adhesives, acrylic adhesives, polyester adhesives, polyamide adhesives, and polyvinyl acetate adhesives. Epoxy adhesives and rubber adhesives can be applied. Among these, a two-component curable urethane adhesive is preferable. The adhesive dispersed or dissolved in a solvent is applied and dried, and two glitter films are stacked and laminated, and then the adhesive is cured by aging at 30 to 120 ° C for several hours to several days. It is good to let them. An adhesive that can be cured at the lowest possible temperature so as not to destroy the already formed relief shape, preferably an adhesive that can be cured at a temperature lower than the glass transition temperature Tg (h) of the shaped relief-forming layer material. More preferably, an adhesive that can be cured at a temperature lower than Tg (u) is particularly preferably used. The thickness of the adhesive layer is about 0.1 to 20; about ζ ΐη (dry state), preferably 1.0 to 5.0 m.
[0160] (表面易接着層） [0160] (Self-adhesive layer)
さらに、複数図柄光輝性スレッド 10の少なくともいずれかの表面に、紙基材との接 着を向上させる表面易接着層を設けてもよぐ該表面易接着層の材料としては、親水 性の材料、例えばポリビニルアルコール系榭脂、アクリル系榭脂、セルロース系榭脂 などが好ましい。但し、これらの印刷や他の層を設けても、全体の総厚さとしては、 4 〜40 μ m程度、好ましくは 8〜30 μ m、さらに好ましくは 10〜24 μ mであるの範囲と する。  Furthermore, a surface easy-adhesion layer that improves adhesion to the paper substrate may be provided on at least one surface of the multi-pattern glitter thread 10. For example, polyvinyl alcohol resin, acrylic resin, and cellulose resin are preferable. However, even if these printing and other layers are provided, the total thickness of the whole is about 4 to 40 μm, preferably 8 to 30 μm, more preferably 10 to 24 μm. To do.
[0161] なお、光輝性複数図柄形成物がフィルム基材の場合、複数図柄光輝性スレッド 10の 少なくともいずれかの表面に、フィルム基材との接着を向上させる表面易接着層を設 けてもよい。表面易接着層の材料としては、プライマ層と同様な材料が好ましく使用 できる。  [0161] When the glittering multiple-pattern formed product is a film substrate, a surface easy-adhesion layer that improves adhesion to the film substrate may be provided on at least one surface of the multiple-pattern glittering thread 10. Good. As the material for the surface easy-adhesion layer, the same material as the primer layer can be preferably used.
[0162] (光輝性複数図柄形成物）  [0162] (Glittering multiple pattern formation)
本発明の光輝性複数図柄形成物 100は、本発明の複数図柄光輝性スレッド 10を 抄込みによる抄紙法で作製でき、図柄の異なる少なくとも光輝性の第 1図柄及び光 輝性の第 2図柄を有し、特異な意匠性、セキュリティ性を持っている。  The glitter multi-pattern formed article 100 of the present invention can be produced by a papermaking method by embedding the multi-pattern glitter thread 10 of the present invention, and has at least the first pattern of glitter and the second pattern of glitter having different patterns. It has a unique design and security.
[0163] 図 8に本発明の光輝性複数図柄形成物 100の 1実施例として、本発明の複数図柄 光輝性フィルムを細巾にスリットしてなる複数図柄光輝性スレッド 10を、基紙の少なく とも一方の面の表面に抄き込んで偽造防止用紙とし、該偽造防止用紙を使用した商 品券の例を示す。該偽造防止用紙に用いるスレッドは 1本でも複数本でもよい。また[0163] In FIG. 8, as an example of the glitter multi-pattern formed product 100 of the present invention, a multi-pattern glitter thread 10 formed by slitting the multi-pattern glitter film of the present invention in a narrow width is provided with less base paper. In both cases, an example of a gift certificate using paper forged on one side to produce a forgery-preventing paper is shown. One or more threads may be used for the anti-counterfeit paper. Also
、片面のみでも、両面でもよい。 Only one side or both sides may be used.
[0164] (抄紙法）  [0164] (Paper making method)
次に、抄紙法について説明する。ある意匠性を有する薄手のフィルムが細幅のスト ライプ状の形状となった場合に、製紙業の当業者はスレッドと称する。複数図柄光輝 性フィルムを幅が 0. 5〜30mm程度、好ましくは l〜10mmの狭い幅にスリットして、 該スリットされた複数図柄光輝性スレッドを基紙 101へ抄き込む。  Next, the papermaking method will be described. A person skilled in the paper industry calls a thread when a thin film having a certain design has a narrow striped shape. The multi-pattern glitter film is slit into a narrow width of about 0.5 to 30 mm, preferably 1 to 10 mm, and the slit multi-pattern glitter thread is incorporated into the base paper 101.
[0165] (基紙） [0165] (Base paper)
該偽造防止用紙の基紙 101としては、表面平滑性および耐熱性に優れ、適当な強 度、厚さを有するものであれば、特に制限はないが、上質紙等の洋紙、薄手の板紙、 カード紙等の紙が適用できる。 100〜200gZm2の坪量で、印字、転写適性に優れ る上質紙、コート紙が好ましい。該基紙 101へ、幅が 0. 5〜30mm程度、好ましくは 1 〜： LOmmの、狭い幅にスリットしたスレッドを抄き込んで製造する。即ち、針葉樹晒ク ラフトパルプ (NBKP)、広葉樹晒クラフトパルプ (LBKP)、針葉樹晒サルファイトパル プ（NBSP)、サーモメカニカルパルプ (TMP)等の木材パルプや麻、綿、藁を原料と した非木材パルプ等を適宜混合して叩解し、これに填料、乾燥紙力増強剤、湿潤紙 力増強剤、サイズ剤、定着剤、歩留り向上剤、濾水性向上剤、消泡剤、染料、着色顔 料、蛍光剤などを適宜添加し、通常フリーネス 400〜250mlC. S. F.に調整した紙 料を調製する。該紙料へ、狭い幅のスレッドを繰り出しながら、長網抄紙機や円網抄 紙機などの公知の抄紙機を使用して抄き込んで製造し、必要に応じてマシンカレン ダー、スーパーカレンダー処理をする。 The base paper 101 of the anti-counterfeit paper is not particularly limited as long as it has excellent surface smoothness and heat resistance and has an appropriate strength and thickness. Paper such as card paper can be applied. High-quality paper and coated paper having a basis weight of 100 to 200 gZm 2 and excellent printability and transferability are preferred. The base paper 101 is manufactured by embedding a thread having a width of about 0.5 to 30 mm, preferably 1 to LOmm, slit into a narrow width. In other words, softwood bleached kraft pulp (NBKP), hardwood bleached kraft pulp (LBKP), softwood bleached sulfite pulp (NBSP), thermomechanical pulp (TMP), etc. Mix and beat pulp as appropriate, and add filler, dry paper strength enhancer, wet paper strength enhancer, sizing agent, fixing agent, yield improver, freeness improver, antifoaming agent, dye, coloring pigment Add a suitable fluorescent agent, etc., and prepare a paper usually adjusted to freeness 400-250mlC. SF. The paper stock is manufactured by using a known paper machine such as a long paper machine or a circular paper machine while feeding a narrow-width thread, and if necessary, a machine calendar, a super calendar Process.
[0166] (観察） [0166] (Observation)
該本発明の複数図柄光輝性スレッド 10は、先の構成に加えて、印刷絵柄などを設 けたりしてもよい。また、スレッドは、基紙中へ埋没させてもよぐまた、半分埋め込み や、十分に接着していれば表面上でもよい。また、基紙の表面に部分的に露出させ てもよい。さらに基紙を部分的に薄くして埋め込んでもよぐ特に、部分埋め込みや部 分的に薄い該基紙 101では、本発明の複数図柄光輝性スレッド 10の両側の光輝性 図柄を十分に視認できる。また、埋没や半分埋め込みでは、少なくとも一方の光輝性 図柄が視認できな力つたり、視認しにくいが、必要に応じて、剥離して観察することで 観察できるので、本発明の範囲である。 The multi-design glittering thread 10 of the present invention may be provided with a printed pattern in addition to the above configuration. The thread may be embedded in the base paper, or it may be half-embedded or on the surface if it is sufficiently adhered. Further, it may be partially exposed on the surface of the base paper. Further, the base paper may be partially thinned and embedded. In particular, in the partially embedded or partially thin base paper 101, the glitter on both sides of the multi-pattern glitter thread 10 of the present invention is used. The design is fully visible. Further, in the case of burying or half-embedding, at least one of the glittering patterns is too strong or difficult to see, but if necessary, it can be observed by peeling and observing, so that it is within the scope of the present invention.
[0167] (製造）  [0167] (Manufacturing)
本発明の複数図柄光輝性スレッド 10の製造は、いずれの工程も既存の設備、技術 を用いることができるので、製造が容易で低コストに製造することができる。また、本発 明の光輝性複数図柄形成物 100の製造も、いずれの工程も既存の設備、技術を用 いることができるので、製造が容易で低コストに製造することができる。  The manufacturing of the multi-pattern glittering thread 10 of the present invention can be performed easily and at low cost because any process can use existing equipment and technology. In addition, since both the manufacturing process of the glittering multi-pattern formation product 100 of the present invention can use existing equipment and technology, it can be manufactured easily and at low cost.
[0168] 第 3の発明 [0168] Third invention
以下、本発明に係る光輝性フィルムの実施形態について、図面を参照しながら、詳 細に説明する。  Hereinafter, embodiments of the glitter film according to the present invention will be described in detail with reference to the drawings.
[0169] 図 17〜21は、本発明の 1実施例を示す光輝性フィルムの断面図であり、図 22〜2 5は、本発明の 1実施例を示す光輝性フィルムの図柄の視認状態を示す説明図であ り、図 26は、本発明の 1実施例を示す光輝性図柄形成物の平面図及び断面図であ る。  FIGS. 17 to 21 are cross-sectional views of the glitter film showing one embodiment of the present invention, and FIGS. 22 to 25 show the state of visual recognition of the pattern of the glitter film showing one embodiment of the present invention. FIG. 26 is a plan view and a cross-sectional view of the glitter pattern forming product showing one embodiment of the present invention.
[0170] (版取られ）  [0170] (taken off plate)
光輝性図柄層 320は、レリーフ形成層 315と、該レリーフ形成層 315形成されたレリ ーフ面に接して設けた金属薄膜層 317とからなり、レリーフは微細な凹凸で金属薄膜 層 317と相まって、光を回折、拡散、及び Z又は乱反射などで光輝性を発現する。  The glitter pattern layer 320 includes a relief forming layer 315 and a metal thin film layer 317 provided in contact with the relief surface on which the relief forming layer 315 is formed, and the relief is combined with the metal thin film layer 317 with fine irregularities. Brings out glitter by diffracting, diffusing light, and Z or diffuse reflection.
[0171] レリーフは、例えばホログラムの場合には、凹凸の高さ及び凸と凸の間隔は、通常 0 . 005mm以下程度と極めて微細であり、該レリーフ（凹凸）の賦型は版の製造ととも に高度な技術を要する。即ち、無理やり 1枚の基材 311へ複数図柄の形成をすると、 最初の第 1光輝性図柄層 320Aはレリーフの賦型は光輝性に優れ「レリーフ層形成 榭脂が版に撮られる現象」、いわゆる「版取られ (柄ヌケ)」の発生はないが、次の第 2 光輝性図柄層 320Bの賦型を行う際に、再び熱エンボスされるので、第 1金属薄膜層 317Aと第 2レリーフ形成層 315Bの接着が十分ではなぐ第 2光輝性図柄層 320B にエンボス図柄を形成する際に第 1金属薄膜層 317Aと第 2レリーフ形成層 315Bの 間で「レリーフ層形成樹脂が版に撮られる現象」、 、わゆる「版取られ (柄ヌケ)」が発 生してしまう。従って、片方図柄の意匠性が劣るものしか得られな力 た。 [0171] For example, in the case of a hologram, the height of the projections and depressions and the interval between the projections and projections are extremely fine, usually about 0.005 mm or less. Both require advanced technology. That is, when multiple patterns are forcibly formed on a single substrate 311, the first first glittering pattern layer 320A is excellent in the relief formation of the relief, “relief layer formation phenomenon where the resin is photographed on the plate”, Although there is no occurrence of so-called “plate removal (pattern removal)”, since the second glitter pattern layer 320B is subjected to heat embossing again at the time of shaping, the first metal thin film layer 317A and the second relief are formed. When the embossed pattern is formed on the second glittering pattern layer 320B where the adhesion of the forming layer 315B is not sufficient, the relief layer forming resin is taken on the plate between the first metal thin film layer 317A and the second relief forming layer 315B. `` Phenomenon '',, `` Plate removed (pattern missing) '' I will be born. Therefore, only one design with inferior design was obtained.
[0172] そこで、本発明者らは、さらに鋭意研究を進め、複数の光輝性図柄を有していても 、複数図柄のいずれもが、榭脂の剥れ、いわゆる「版取られ (柄ヌケ)」を起こさないこ とに注目し、本発明では、第 1光輝性図柄層と第 2光輝性図柄層との間に層間プライ マ層を設けることにより、榭脂の剥れ、いわゆる「版取られ (柄ヌケ)」を解決し、被転写 体ゃ抄き込み用紙との一体感に優れ、さらに、基材が 1枚でよいので省資源も可能と するに到った。  [0172] Therefore, the present inventors have further advanced research, and even if they have a plurality of glittering patterns, all of the plurality of patterns are peeled off of the grease, so-called "printing (pattern removal). In the present invention, an interlayer primer layer is provided between the first glitter pattern layer and the second glitter pattern layer, so that the resin is peeled off, so-called “plate”. "Small (pattern removal)" has been solved, and the transferred material is excellent in unity with the paper-making paper, and moreover, only one base material is required, thus saving resources.
[0173] 従来は、第 1光輝性図柄層 320Aの第 1光輝性フィルム 310Aと、第 2光輝性図柄 層 320Bの第 2光輝性フィルム 310Bと、 2種類の別の光輝性フィルム 310を作製して おいて、これを積層するしかな力つた力 厚さを薄くすることに限界があり、基材を 2枚 使用するので、資源の無駄遣いでもあった。  [0173] Conventionally, the first glittering film 310A of the first glittering pattern layer 320A, the second glittering film 310B of the second glittering pattern layer 320B, and two different kinds of glittering films 310 were produced. However, there is a limit to reducing the thickness of the force that can be used to stack these, and since two substrates are used, it was a waste of resources.
[0174] そこで、第 1光輝性図柄層 320Aと、第 2光輝性図柄層 320Bとの間へ、層間プライ マ層 321を設け、該層間プライマ層 321のガラス転移温度 (Tg)を、レリーフ形成層 3 15Aの Tgより低い 130°C以下とすることで、該層間プライマ層 321の接着作用で、ェ ンボス工程においても「版取られ (柄ヌケ)」が発生せず、光輝性が保持される。また、 基材 311は 1枚でよいので、総厚さを極めて薄ぐ例えば 5〜20 /ζ πιとすることができ る。総厚が極めて薄いと、スレッドとして基紙へ抄き込んでも、違和感がなく一体感に 優れている。  [0174] Therefore, an interlayer primer layer 321 is provided between the first glitter pattern layer 320A and the second glitter pattern layer 320B, and the glass transition temperature (Tg) of the interlayer primer layer 321 is formed as a relief. Layer 3 By setting the temperature to 130 ° C or lower, which is lower than the Tg of 15A, the adhesive action of the interlayer primer layer 321 does not cause `` plate removal (pattern removal) '' even in the embossing process, and the glitter is maintained. The Further, since only one substrate 311 is required, the total thickness can be made extremely thin, for example, 5 to 20 / ζ πι. If the total thickness is extremely thin, there is no sense of incongruity and excellent unity even if it is applied as a thread to the base paper.
[0175] (光輝性フィルム）  [0175] (Brightness film)
本発明の光輝性フィルム 310は、第 1レリーフ形成層 315Aと第 1金属薄膜層 317 Αとからなる第 1光輝性図柄層 320Αと、第 2レリーフ形成層 315Bと第 2金属薄膜層 317Bとからなる第 2光輝性図柄層 320Bとが、層間プライマ層 321Bを介して積層さ れていればよい。  The glitter film 310 of the present invention comprises a first glitter pattern layer 320 Α comprising a first relief forming layer 315 A and a first metal thin film layer 317, a second relief forming layer 315 B and a second metal thin film layer 317 B. The second glittering design layer 320B may be laminated via the interlayer primer layer 321B.
[0176] 図 11に示す例では、基材 311の一方の面へ、第 1レリーフ形成層 315Aと第 1金属 薄膜層 317Aとからなる第 1光輝性図柄層 320Aが、層間プライマ層 321Bを介して、 第 2レリーフ形成層 315Bと第 2金属薄膜層 317Bとからなる第 2光輝性図柄層 320B と基材に対して同一面に、積層されている。  [0176] In the example shown in FIG. 11, the first glittering design layer 320A composed of the first relief forming layer 315A and the first metal thin film layer 317A is disposed on one surface of the substrate 311 via the interlayer primer layer 321B. Thus, the second glitter pattern layer 320B composed of the second relief forming layer 315B and the second metal thin film layer 317B and the base material are laminated on the same surface.
[0177] また、基材に対して反対面に、第 3光輝性図柄層 320Cが設けると、図 12の例とな り、さらに、第 4光輝性図柄層 320Dを設けてもよぐ図 12の例の書面表示で下部分 へ設けると、図 13に示す例となる。図 13に示すように、第 3光輝性図柄層 320Cと第 4光輝性図柄層 320Dとが接する場合には、この間にも層間プライマ層 321Dを設け ることが好ましい。 [0177] Further, when the third glitter pattern layer 320C is provided on the opposite surface to the base material, the example of FIG. 12 is obtained. Furthermore, if the fourth glitter design layer 320D may be provided in the lower part of the written display of the example of FIG. 12, the example shown in FIG. 13 is obtained. As shown in FIG. 13, when the third bright design layer 320C and the fourth bright design layer 320D are in contact with each other, it is preferable to provide an interlayer primer layer 321D between them.
[0178] 図 11Aに示す例では、基材 311の一方の面へ、第 1レリーフ形成層 315Aと第一金 属薄膜層 317Aとからなる第 1光輝性図柄層 320Aが層間プライマー層 321Bを介し て、第 2レリーフ形成層 315Bと第 2金属薄膜層 317Bとからなる第 2光輝性図柄層 32 0B、保護層 325を基材に対して同一面に、積層されている。  [0178] In the example shown in FIG. 11A, the first glittering pattern layer 320A composed of the first relief forming layer 315A and the first metal thin film layer 317A is disposed on one surface of the substrate 311 via the interlayer primer layer 321B. Thus, the second glitter pattern layer 320B composed of the second relief forming layer 315B and the second metal thin film layer 317B and the protective layer 325 are laminated on the same surface.
[0179] また、図 11Bに示すような、図 11Aの構成の第金属薄膜層 317Bへ、接着層 321を 設けてもよぐ粘着ラベルや転写箔とすることができる。  Further, as shown in FIG. 11B, an adhesive label or a transfer foil may be provided in which an adhesive layer 321 may be provided on the first metal thin film layer 317B having the configuration of FIG. 11A.
[0180] 3以上の光輝性図柄層 320を設ける場合には、内側となった光輝性図柄が外側の 光輝性図柄の金属薄膜層で隠されてしまうので、外側の金属薄膜層を透明金属薄 膜層とすればよい。ここで外側の光輝性図柄とは、その光輝性図柄の少なくても一方 に他の光輝性図柄がないような光輝性図柄のことであり、内側の光輝性図柄とは、そ の光輝性図柄の両側に他の光輝性柄図柄が 2組以上存在するような光輝性図柄の ことである。すべての金属薄膜層が透明金属薄膜層でもよい。逆に、外側の金属薄 膜層を不透明とすることで破壊した場合にのみ内側の光輝性図柄を確認できる特異 なセキュリティーを有するスレッドとすることも可能である。  [0180] When three or more glitter pattern layers 320 are provided, the inner glitter pattern is hidden by the outer glitter pattern metal thin film layer. A film layer may be used. Here, the outer brilliant design is a brilliant design in which at least one of the brilliant designs has no other brilliant design, and the inner brilliant design is the brilliant design. It is a glitter design where there are two or more pairs of other glitter designs on both sides. All the metal thin film layers may be transparent metal thin film layers. Conversely, it is also possible to make a thread with unique security that allows the inner glittering pattern to be confirmed only when it is broken by making the outer metal thin film layer opaque.
[0181] また、第 l〜nの光輝性図柄層 320の図柄は、同じでも異なっていてもよい。例えば 、第 1光輝性図柄と第 2光輝性図柄を同じ図柄とすれば、表側及び裏面からそれぞ れ同一画像を視認することができる。図 13に示す例で、第 1金属薄膜層及び第 3金 属薄膜層を不透明金属薄膜層とし、第 2金属薄膜層及び第 4金属薄膜層を透明金 属薄膜層とすれば、表側及び裏面カゝらそれぞれ 2図柄、合計 4つの図柄を視認する ことができるので、極めて特異な意匠性、及び Z又はセキュリティ性が得られる。  [0181] In addition, the symbols of the 1st to n-th glitter design layers 320 may be the same or different. For example, if the first glitter pattern and the second glitter pattern are the same, the same image can be viewed from the front side and the back side. In the example shown in FIG. 13, the first metal thin film layer and the third metal thin film layer are opaque metal thin film layers, and the second metal thin film layer and the fourth metal thin film layer are transparent metal thin film layers. Each of them can visually recognize 2 designs, a total of 4 designs, so that a very unique design and Z or security can be obtained.
[0182] (材料と層形成）  [0182] (Material and layer formation)
次に、基材ゃ層の材料、層の形成について、説明するが、第 1レリーフ形成層 315 A、第 2レリーフ形成層 315B、第 3レリーフ形成層 315C及び第 4レリーフ形成層 315 D (合わせてレリーフ形成層 315)、第 1金属薄膜層 317A、第 2金属薄膜層 317B、 第 3金属薄膜層 317C及び第 4金属薄膜層 317D (合わせて金属薄膜層 317)、保護 層 325、層間プライマ層 321 B及び層間プライマ層 321 D (合わせて層間プライマ層 321)は、層が異なるのみで材料や形成法は同様であり、第 l〜nに読み替えればよ い。第 l〜nのレリーフ形成層及び金属薄膜層層は、同じ材料、形成法及び厚さでも よぐ異なるものでもよい。 Next, the material of the base material layer and the formation of the layer will be described. The first relief forming layer 315A, the second relief forming layer 315B, the third relief forming layer 315C, and the fourth relief forming layer 315D Relief forming layer 315), first metal thin film layer 317A, second metal thin film layer 317B, The third metal thin film layer 317C and the fourth metal thin film layer 317D (together with the metal thin film layer 317), the protective layer 325, the interlayer primer layer 321B, and the interlayer primer layer 321D (together with the interlayer primer layer 321) have different layers. However, the materials and the forming method are the same, and it should be read as l to n. The first to nth relief forming layers and the metal thin film layer layers may be the same material, forming method and different thickness.
[0183] (基材） [0183] (Base material)
基材 311の材料としては、耐熱性、機械的強度、製造に耐える機械的強度、耐溶 剤性などがあれば、用途に応じて種々の材料が適用できる。例えば、ポリエチレンテ レフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリエチレンテレ フタレート-イソフタレート共重合体、又はテレフタル酸-シクロへキサンジメタノール- エチレングリコール共重合体などのポリエステル系榭脂、ナイロン (商品名） 6、ナイ口 ン（商品名） 66、ナイロン (商品名） 610、又はナイロン（商品名） 12などのポリアミド系 榭脂、ポリエチレン、ポリプロピレン、ポリブテン、又はポリメチルペンテンなどのポリオ レフイン系榭脂、ポリノルボネンなどの環状ポリオレフイン系榭脂、ポリ塩化ビニルなど のビュル系榭脂、ポリアタリレート、ポリメタアタリレート、又はポリメチルメタアタリレート などの (メタ)アクリル系榭脂、ポリスチレン、高衝撃ポリスチレン、 AS榭脂、又は ABS 榭脂などのスチレン系榭脂、ポリビニルアルコール榭脂、又はエチレン ビニルアル コール共重合体等のポリビュルアルコール系榭脂、ポリカーボネート系榭脂、ェチレ ンー酢酸ビニル共重合体ケン化物、ポリビニルプチラール榭脂、ポリ酢酸ビニル系榭 脂、ァセタール系榭脂、などがある。該基材 311は、これら榭脂を主成分とする共重 合榭脂、または、混合体 (ァロイでを含む)、若しくは複数層カゝらなる積層体であって も良い。また、該基材 311は、延伸フィルムでも、未延伸フィルムでも良いが、強度を 向上させる目的で、一軸方向または二軸方向に延伸したフィルムが好ましい。該基 材 311は、これら榭脂の少なくとも 1層力もなるフィルム、シート、ボード状として使用 する。  As the material of the base material 311, various materials can be applied depending on the use as long as they have heat resistance, mechanical strength, mechanical strength withstanding manufacturing, and solvent resistance. For example, polyester resin such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene terephthalate-isophthalate copolymer, or terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer, nylon (trade name) ) 6, nylon (trade name) 66, nylon (trade name) 610, or nylon (trade name) 12, etc. polyamide resin, polyethylene, polypropylene, polybutene, or polyolefin resin such as polymethylpentene , Cyclic polyolefin resins such as polynorbornene, bur resins such as polyvinyl chloride, (meth) acrylic resins such as polyacrylate, polymetaacrylate, or polymethylmetaacrylate, polystyrene, high-impact polystyrene AS oil, Is a styrene resin such as ABS resin, a polyvinyl alcohol resin, or a polybutyl alcohol resin such as an ethylene vinyl alcohol copolymer, a polycarbonate resin, a saponified product of an ethylene-vinyl acetate copolymer, or a polyvinyl plastic. There are resin, polyvinyl acetate resin, and acetal resin. The base material 311 may be a copolymer resin containing these resins as a main component, a mixture (including alloy), or a laminate including a plurality of layers. The substrate 311 may be a stretched film or an unstretched film, but a film stretched in a uniaxial direction or a biaxial direction is preferable for the purpose of improving the strength. The base material 311 is used as a film, sheet, or board that has at least one layer strength of these resins.
[0184] 本発明の光輝性フィルム 310の全体の総厚さとしては特に限定されない。例えば 1 〜200 /ζ πι程度厚みとすることができる。また、細幅に裁断しスレッドとして紙基材へ 抄き込んだ用紙とする場合には、スレッドの厚さを極わめて薄くする必要があり、 3〜 40 μ m程度、好ましくは 4〜30 μ m、さら〖こ好ましくは 5〜20 μ mである。 3 μ m未満 では、機械的な強度が不足して、裁断時や抄紙時にスレッドが切断したり、低歩留ま りや低生産性、である。 40 m以上では、抄紙された用紙に凹凸が生じたり、スレッド が紙基材カも容易に剥離したり、また、用紙としての一体感がないので、別の用紙へ 別の光輝性物を貼着されるなどの偽造をされ易 、と 、う欠点がある。 [0184] The total thickness of the entire glittering film 310 of the present invention is not particularly limited. For example, the thickness can be about 1 to 200 / ζ πι. In addition, when using paper that has been cut into narrow widths and woven into a paper substrate as a thread, it is necessary to make the thread thickness extremely thin. It is about 40 μm, preferably 4 to 30 μm, more preferably 5 to 20 μm. If it is less than 3 μm, the mechanical strength is insufficient, threads are cut during cutting and paper making, and the yield is low and productivity is low. Above 40 m, the paper that has been made is uneven, the paper base is easily peeled off, and there is no sense of unity as the paper. There is a drawback that it is easy to be counterfeited such as being worn.
[0185] 光輝性フィルム 310の総厚さの大部分は基材 311の厚さであり、従来、複数の光輝 性図柄の形成する場合には、通常 2枚の基材を用いねばならな力つた。このため、総 厚さを減ずるには極薄に基材を使用せねばならず、塗布による層形成工程やレリー フの賦型工程では、良精度な設備、繊細な操作、しカゝもロスが多ぐ低歩留まりでコス トがかかっていた。本発明では、 1枚の基材 311でよいので、良加工適性で、安価で 、汎用な基材を使用することができる。機械的強度がよぐ耐熱性もよいポリエチレン テレフタレート、ポリエチレンナフタレートが好適で、例えば、厚さ 1〜200 /ζ πι程度の 基材を使用することができる。また、スレッドとする場合には、厚さ 2〜38 mの基材 好ましく 4〜18 mを使用することができる。該基材を用いると、従来設備、通常操作 で、容易に製造でき、し力も低コストである。  [0185] Most of the total thickness of the glitter film 310 is the thickness of the base material 311. Conventionally, in the case of forming a plurality of glitter patterns, it is usually necessary to use two base materials. I got it. For this reason, in order to reduce the total thickness, it is necessary to use a very thin base material, and in the layer formation process by coating and the relief shaping process, high-precision equipment, delicate operations, and loss of caulking are also lost. There were many low yields and cost. In the present invention, since only one base material 311 is sufficient, it is possible to use a general-purpose base material that is suitable for good processing and inexpensive. Polyethylene terephthalate and polyethylene naphthalate having good mechanical strength and good heat resistance are suitable. For example, a substrate having a thickness of about 1 to 200 / ζ πι can be used. Moreover, when using it as a thread | yarn, the base material with a thickness of 2-38 m, Preferably 4-18 m can be used. When the base material is used, it can be easily manufactured by conventional equipment and normal operation, and the force is low.
[0186] (プライマ層）  [0186] (Primer layer)
また、該基材 311は、レリーフ層を形成する面側に、層間の密着力を向上させるた めに、必要に応じてプライマ層 313、またはコロナ放電処理、プラズマ処理、オゾンガ ス処理、フレーム処理、予熱処理、除塵埃処理、アルカリ処理などなどの易接着処理 を施してもよい。特に好ましくは、プライマ層（図示せず)を設けておくことで、基材 31 1とレリーフ層との接着性を向上し、複製のランニング時の版取られをより抑制できる。 また、プライマ層は、基材 311と相乗して、熱及び/又は圧力の負荷が力かっても、 柔軟性があり、そのクッション作用で、レリーフ形成層 315への負荷を減じて、既に賦 型されているレリーフ形状の劣化を防止し、その結果、既に賦型されているレリーフ の光輝性が保持される。該プライマ層 313は、例えば、ポリウレタン系榭脂、ポリエス テル系榭脂、ポリアミド系榭脂、エポキシ系榭脂、フエノール系榭脂、ポリ塩化ビニル 系榭脂、ポリ酢酸ビニル系榭脂、塩ィヒビ二ルー酢酸ビニル共重合体、酸変性ポリオ レフイン系榭脂、エチレンと酢酸ビニル或いはアクリル酸などとの共重合体、（メタ）ァ クリル系榭脂、ポリビニルアルコール系榭脂、ポリビニルァセタール榭脂、ポリブタジ ェン系榭脂、ゴム系化合物、石油系榭脂、アルキルチタネート系化合物、ポリエチレ ンィミン系化合物、イソシァネート系化合物、澱粉、カゼイン、アラビアゴム、セルロー ス誘導体、ワックス類などを使用することができる。 In addition, the base material 311 has a primer layer 313 or a corona discharge treatment, a plasma treatment, an ozone gas treatment, a flame treatment as necessary to improve the adhesion between the layers on the surface side on which the relief layer is formed. Further, easy adhesion treatment such as pre-heat treatment, dust removal treatment and alkali treatment may be performed. Particularly preferably, by providing a primer layer (not shown), the adhesiveness between the base material 311 and the relief layer can be improved, and the plate-cutting during the running of replication can be further suppressed. In addition, the primer layer is flexible even when heat and / or pressure is applied in synergy with the base material 311, and its cushioning action reduces the load on the relief forming layer 315 and has already been molded. As a result, the relief of the already formed relief is retained. The primer layer 313 includes, for example, polyurethane-based resin, polyester-based resin, polyamide-based resin, epoxy-based resin, phenol-based resin, polyvinyl chloride-based resin, polyvinyl acetate-based resin, and salt vinyl. Two-rue vinyl acetate copolymer, acid-modified polyolefin resin, copolymer of ethylene and vinyl acetate or acrylic acid, (meth) a Kuryl resin, polyvinyl alcohol resin, polyvinyl acetal resin, polybutadiene resin, rubber compound, petroleum resin, alkyl titanate compound, polyethyleneimine compound, isocyanate compound, starch, casein Further, gum arabic, cellulose derivatives, waxes and the like can be used.
[0187] (レリーフの賦型）  [0187] (Relief shaping)
レリーフ形成層 315面へレリーフ形状を賦形 (複製とも呼称する)する。該賦形方法 としては、当業者が呼称する「熱圧法」が適用できる。まず、熱圧法は、基材 311ヘレ リーフ形成層 315を形成した後に、該レリーフ形成層 315の表面に、レリーフが形成 されているスタンパ (金属版、又は榭脂版)を圧着 (所謂エンボス)をして、該レリーフ をレリーフ形成層 315へ賦型し複製した後に、スタンパを剥離する方法である。  Relief forming layer 315 Relief shape is formed on the surface (also called replication). As the shaping method, a “hot pressing method” called by those skilled in the art can be applied. First, in the hot pressing method, after the relief forming layer 315 is formed on the base material 311, a stamper (metal plate or resin plate) on which the relief is formed is pressure-bonded to the surface of the relief forming layer 315 (so-called embossing). Then, the stamper is peeled off after the relief is shaped and copied to the relief forming layer 315.
[0188] なお、レリーフの賦形は、層が異なるのみで材料や形成法は同様であり、第 l〜nに 読み替えればよい。第 l〜nのレリーフは同じでも異なるものでもよい。  [0188] It should be noted that the relief shaping is the same in the material and the formation method except that the layers are different. The first to nth reliefs may be the same or different.
[0189] (レリーフ形成層）  [0189] (Relief forming layer)
熱圧法に用いるレリーフ形成層 315の材料としては、ポリ塩化ビニル、アクリル榭脂 (例、ポリメチルメタアタリレート）、ポリスチレン、ポリカーボネート等の熱可塑性榭脂、 そして、不飽和ポリエステル、メラミン、エポキシ、ウレタンなどの熱硬化性榭脂を硬化 させたもの、ポリエステル (メタ）アタリレート、ウレタン (メタ）アタリレート、エポキシ (メタ )アタリレート、ポリエーテル (メタ）アタリレート、ポリオール (メタ）アタリレート、メラミン（ メタ)アタリレート、トリアジン系アタリレート等の電離放射線硬化性榭脂を硬化させた もの、或いは、上記熱可塑性榭脂と熱硬化性榭脂、もしくは、電離放射線硬化性榭 脂の混合物が使用可能である。  The material of the relief forming layer 315 used in the hot pressing method is a thermoplastic resin such as polyvinyl chloride, acrylic resin (eg, polymethylmethacrylate), polystyrene, polycarbonate, and unsaturated polyester, melamine, epoxy, Hardened thermosetting resin such as urethane, polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, polyether (meth) acrylate, polyol (meth) acrylate, A product obtained by curing ionizing radiation curable resin such as melamine (meth) acrylate or triazine acrylate, or a mixture of the above thermoplastic resin and thermosetting resin or ionizing radiation curable resin. It can be used.
[0190] 特に耐薬品性、耐光性及び耐候性等の耐久性に優れた熱硬化性榭脂、紫外線や 電子線などの電離放射線で硬化する硬化性榭脂が好ましい。さら〖こは、耐熱性、耐 圧性に優れた材料が好ましい。すなわち、請求項 3〜6の発明では、第 1光輝性フィ ルムと第 2光輝性フィルムを貼り合せる際の熱や圧力に耐えるレリーフ形成材料が好 ましい。また、請求項 7〜8の発明では、第 1レリーフ形成層を形成後、さらに、第 2レ リーフ形成層を第 1基材の 11Aの反対面、もしくは同一面に形成するため、第 1レリ ーフ形成層の材料としては第 2レリーフ形成層にレリーフを賦型する際の熱や圧力に 耐える材料が好ましい。このような特性を有する電離放射線硬化性榭脂としては、好 ましくは、ポリエステル (メタ）アタリレート、ウレタン (メタ）アタリレート、エポキシ (メタ）ァ タリレート等の電離放射線硬化性榭脂を硬化させたものが適用でき、特に好ましくは ウレタン変性 [0190] Particularly preferred are thermosetting resins excellent in durability such as chemical resistance, light resistance and weather resistance, and curable resins cured by ionizing radiation such as ultraviolet rays and electron beams. Sarakuko is preferably a material with excellent heat resistance and pressure resistance. That is, in the inventions of claims 3 to 6, a relief forming material that can withstand heat and pressure when the first glitter film and the second glitter film are bonded together is preferable. In the inventions of claims 7 to 8, after the first relief forming layer is formed, the second relief forming layer is further formed on the opposite surface or the same surface of 11A of the first substrate. As the material for the roof forming layer, the heat and pressure when the relief is formed on the second relief forming layer Materials that can withstand are preferred. As ionizing radiation curable resins having such characteristics, ionizing radiation curable resins such as polyester (meth) acrylate, urethane (meth) acrylate and epoxy (meth) acrylate are preferably cured. Can be applied, particularly preferably urethane-modified
レリーフ形成層 1つとしては、一般式 (a)で表されるウレタン変性ァク リル系榭脂を主成分とする未硬化の電離放射線硬化性榭脂組成物を硬化させた硬 化物である。具体的には、本出願人が特開 2000— 273129号公報で開示している 光硬化性榭脂組成物などが適用でき、前記明細書に記載の光硬化性榭脂組成物 S を本明細書の実施例でも使用し、「電離放射線硬化性榭脂組成物 A」と表記している  One relief forming layer is a cured product obtained by curing an uncured ionizing radiation curable resin composition mainly composed of the urethane-modified acryl resin represented by the general formula (a). Specifically, the photocurable resin composition disclosed by the present applicant in Japanese Patent Application Laid-Open No. 2000-273129 can be applied, and the photocurable resin composition S described in the above specification can be applied to the present specification. Used in the examples in the manual and is labeled as "ionizing radiation curable resin composition A"
[化 3][Chemical 3]
Figure imgf000051_0001
Figure imgf000051_0001
(ここで、 6個の Rlは夫々互いに独立して水素原子またはメチル基を表わし、 R2は炭 素数が 1〜20個の炭化水素基を表わす。 1、 m、 n、 o及び pの合計を 100とした場合 に、 1ίま 20〜90、 miま 0〜80、 ηίま 0〜50、 ο+ρίま 10〜80、 piま 0〜40の整数である 。 Xおよび Yは直鎖状または分岐鎖状のアルキレン基を表わし、 Zはウレタン変性ァク リル榭脂を改質するための基を表し、好ましくは嵩高い環状構造の基を表わす。 ) レリーフ形成層 315の好ましい他の 1つとしては、融点が 40°C以上のイソシァネート 化合物と、イソシァネート基と反応し得る (メタ)アクリル化合物との反応生成物であつ て、軟ィ匕点が 40°C以上のものを含有する榭脂である。 (Wherein six Rl's each independently represent a hydrogen atom or a methyl group, and R2 represents a hydrocarbon group having 1 to 20 carbon atoms. The sum of 1, m, n, o and p is 100 is an integer from 1 to 20 to 90, mi to 0 to 80, ηί to 0 to 50, ο + ρί to 10 to 80, pi to 0 to 40. X and Y are linear or Represents a branched alkylene group, Z represents a group for modifying a urethane-modified acryl resin, and preferably represents a group having a bulky cyclic structure.) Other preferable one of the relief forming layer 315 Is a reaction product of an isocyanate compound having a melting point of 40 ° C or higher and a (meth) acrylic compound capable of reacting with an isocyanate group. In other words, it is a resin containing a soft low point of 40 ° C or higher.
[0193] 即ち、（1)融点が 40°C以上のイソシァネートイ匕合物と、（メタ)アタリロイル基を有し て!、て且つイソシァネート基と反応し得る (メタ)アクリルィ匕合物との反応生成物であつ て、軟ィ匕点が 40°C以上のものを含有する力、（2)融点が 40°C以上のイソシァネート 化合物と、（メタ)アタリロイル基を有して 、て且つイソシァネート基と反応し得る (メタ） アクリル化合物及び (メタ)アタリロイル基を有しておらず且つイソシァネート基と反応 し得る化合物との反応生成物であって、軟ィ匕点が 40°C以上のものを含有する電離放 射線硬化性榭脂の硬化物である。また、イソシァネートイ匕合物が、非芳香族性炭化 水素環に結合したイソシァネート基を有するもの、イソホロンジイソシァネートの三量 体、又はイソホロンジイソシァネートと活性水素含有ィ匕合物との反応生成物であり、さ らに、（メタ)アクリルィ匕合物力 （メタ)アクリル酸、水酸基を有する (メタ)アタリレートで あることが好ましい。具体的には、特開 2001— 329031号公報で開示されている光 硬化性榭脂が適用できる。（電離放射線硬化性組成物 Bとして、詳細を実勢例に別 途記載する。 ) [0193] That is, (1) a reaction between an isocyanate compound having a melting point of 40 ° C or higher and a (meth) acrylic compound having a (meth) atallyloyl group and capable of reacting with an isocyanate group. A product that has a soft melting point of 40 ° C or higher, (2) an isocyanate compound having a melting point of 40 ° C or higher, a (meth) atallyloyl group, and an isocyanate group A reaction product of a (meth) acrylic compound that can react with a compound and a compound that does not have a (meth) ataryloyl group and can react with an isocyanate group, and has a soft spot of 40 ° C or higher. It is a cured product of ionizing radiation curable resin containing. Further, the isocyanate compound has an isocyanate group bonded to a non-aromatic hydrocarbon ring, a trimer of isophorone diisocyanate, or an isophorone diisocyanate and an active hydrogen-containing compound. It is a reaction product, and (meth) acrylic compound strength (meth) acrylic acid and (meth) acrylate having a hydroxyl group are preferred. Specifically, a photocurable resin disclosed in JP 2001-329031 A can be applied. (As ionizing radiation curable composition B, details are separately described in actual examples.)
(レリーフ形成層の形成）  (Formation of relief forming layer)
レリーフ形成層 315を設ける方法としては、前述した材料、例えば、ウレタン変性ァ クリル系樹脂の電離放射線硬化性榭脂には、必要に応じて、光重合開始剤、光増感 剤、光重合促進剤、多官能のモノマーやオリゴマー、離型剤、重合防止剤、粘度調 節剤、界面活性剤、消泡剤等の各種助剤、また、シリコーン、スチレン ブタジエンラ バー等の高分子体などを配合してもよぐこれらを有機溶媒へ溶解又は分散させるか As a method of providing the relief forming layer 315, for the above-mentioned materials, for example, ionizing radiation curable resin of urethane-modified acryl-based resin, a photopolymerization initiator, a photosensitizer, and a photopolymerization acceleration may be used as necessary. Agents, polyfunctional monomers and oligomers, mold release agents, polymerization inhibitors, viscosity modifiers, surfactants, antifoaming agents, and other auxiliaries, and polymers such as silicone and styrene butadiene rubber. Can these be dissolved or dispersed in organic solvents?
、又は溶媒をカ卩えずノンソルベント状の、レリーフ形成層 15組成物 (インキ）とする。該 レリーフ形成層 15組成物 (インキ）を、例えば、口—ルコ—ト法、グラビアコ―ト法、そ の他公知のコーティング法又は印刷法で、塗布し、必要に応じて乾燥すればよい。 該レリーフ形成層 15の厚さは、通常は 0. 1〜： LO /z m程度、好ましくは 0. 2〜5 /ζ πι、 さらに好ましくは 0. 5〜2 /ζ πιである。 0. 5 m未満では光輝性 (輝度）が著しく低下 し、 2 mを超えても輝度は十分であり、コスト的に不利である。 Or, the solvent is not used, but the non-solvent relief forming layer 15 composition (ink) is used. The relief forming layer 15 composition (ink) may be applied by, for example, a mouth coat method, a gravure coat method, other known coating methods or printing methods, and dried if necessary. . The thickness of the relief forming layer 15 is usually about 0.1 to about LO / zm, preferably 0.2 to 5 / ζ πι, and more preferably 0.5 to 2 / ζ πι. If it is less than 0.5 m, the brightness (brightness) is remarkably lowered, and if it exceeds 2 m, the brightness is sufficient, which is disadvantageous in terms of cost.
[0194] (レリーフ形状） [0194] (Relief shape)
レリーフ形状は凹凸形状であり特に限定されるものではないが、微細な凹凸形状を 有する光拡散、光散乱、光反射、光回折などの機能を発現するものが好ましぐ例え ば、フーリエ変換やレンチキュラーレンズ、光回折パターン、モスアイ、が形成された ものである。また、光回折機能はないが、特異な光輝性を発現するヘアライン柄、マ ット柄、万線柄、干渉パターンなどでもよい。 The relief shape is uneven and is not particularly limited. For example, those that exhibit functions such as light diffusion, light scattering, light reflection, and light diffraction are preferably formed by Fourier transform, lenticular lens, light diffraction pattern, and moth eye. Further, although there is no light diffraction function, a hairline pattern, a mat pattern, a line pattern, an interference pattern, or the like that expresses a unique glitter may be used.
[0195] 光回折凹凸パターンとしては、物体光と参照光との光の干渉による干渉縞が凹凸 模様で記録されたホログラムや回折格子が適用できる。ホログラムとしては、フレネル ホログラム等のレーザ再生ホログラム、及びレインボーホログラム等の白色光再生ホロ グラム、さらに、それらの原理を利用したカラーホログラム、コンピュータジエネレーテ イツドホログラム (CGH)、ホログラフィック回折格子などがある。  [0195] As the light diffraction concavo-convex pattern, a hologram or diffraction grating in which interference fringes due to interference of light between the object light and the reference light are recorded in a concavo-convex pattern can be applied. Holograms include laser reproduction holograms such as Fresnel holograms, white light reproduction holograms such as rainbow holograms, color holograms utilizing these principles, computer-generated holograms (CGH), holographic diffraction gratings, etc. There is.
[0196] 本明細書記載の図柄とは、これらの各種凹凸パターンを 1種もしくは 2種以上組み 合わせて形成される絵柄をいい、例えば、「abc」 「Security」といったテキストパタ ーンや、スナメ柄、水玉柄と呼ばれる幾何学パターン、さらには、花や鳥などの図柄 を模擬して作製された絵画パターンなどの組み合わせで形成された絵柄を、上記し たホログラムや回折格子力 なる光回折凹凸パターンの組み合わせで可視化した絵 柄をいう。また、複数図柄とは、これらの図柄を 1種かつ 1回用いたのみでは形成され ない図柄をいい、通常 2種以上の図柄を複数回用いて作製される図柄をいう。ただし 、例えば、基材面から「Security」と観測される図柄の作製された光輝性フィルムの 蒸着面同士を貼り合せことで表裏カゝらともに「Security」を観察可能な場合も本発明 の複数図柄光輝性フィルムである。 [0196] The pattern described in this specification refers to a pattern formed by combining one or more of these various concavo-convex patterns. For example, text patterns such as "abc" and "Security" Patterns formed from combinations of geometric patterns called patterns, polka dots, and painting patterns created by simulating flowers and birds, etc. A picture visualized by a combination of patterns. In addition, “multiple symbols” refers to symbols that cannot be formed by using these symbols once and once, and usually refers to symbols that are created using two or more symbols multiple times. However, for example, from a substrate surface "Security" and to the observed pattern of the prepared glitter sides mosquitoゝRaTomo by bonding the deposition surfaces of the film of The present invention is also "Securit y" possible observations It is a multi-pattern glitter film.
[0197] 回折格子としては、ホログラム記録手段を利用したホログラフィック回折格子があげ られ、その他、電子線描画装置等を用いて機械的に回折格子を作成することにより、 計算に基づいて任意の回折光が得られる回折格子をあげることもできる。また、機械 切削法でもよい。これらのホログラム及び Z又は回折格子の単一若しくは多重に記 録しても、組み合わせて記録しても良い。これらの原版は公知の材料、方法で作成 することができ、通常、感光性材料を塗布したガラス板を用いたレーザ光干渉法、電 子線レジスト材料を塗布したガラス板に電子線描画法、機械切削法などが適用でき る。  [0197] Examples of the diffraction grating include a holographic diffraction grating using a hologram recording means. In addition, a diffraction grating is mechanically created by using an electron beam drawing apparatus or the like, so that arbitrary diffraction can be performed based on calculation. A diffraction grating from which light can be obtained can also be mentioned. Alternatively, a mechanical cutting method may be used. These holograms and Z or diffraction gratings may be recorded in a single or multiple manner, or in combination. These masters can be prepared by known materials and methods. Usually, a laser beam interference method using a glass plate coated with a photosensitive material, an electron beam drawing method on a glass plate coated with an electron beam resist material, Machine cutting method can be applied.
[0198] (レリーフの賦型） 該レリーフ形成層 315面へ上記のレリーフ形状 16を賦形 (複製とも呼称する)する。 熱圧法での賦形は、レリーフ形成層 315の表面に、レリーフが形成されているスタン パ (金属版、又は榭脂版)を圧着 (所謂エンボス)をして、該レリーフをレリーフ形成層 315へ賦型し複製した後に、スタンパを剥離することで行う。また、レリーフ形成層 11 5表面に、さらに反射層 117を形成後、この表面にスタンパを圧着して賦型することも 可能である。レリーフ形成層の材料によってはエンボス中に電離放射線を照射してか らスタンパを剥離することでレリーフを複製する。商業的な複製は、長尺状で行うこと で連続な複製作業ができる。また、シリンダーにスタンパをとりつけたり、シリンダーに 直接レリーフを刻むなどして作製されたシリンダー状のスタンパを用いて、より商業的 にレリーフを複製することができる。本層間プライマ層はロール式連続複製方式でも 有効であった。 [0198] (Relief shaping) The relief shape 16 is shaped (also referred to as replication) on the surface of the relief forming layer 315. In the shaping by the hot pressing method, a stamper (metal plate or resin plate) on which a relief is formed is pressure-bonded (so-called embossing) to the surface of the relief forming layer 315, and the relief is applied to the relief forming layer 315. After stamping and duplicating, the stamper is peeled off. It is also possible to form a reflective layer 117 on the surface of the relief forming layer 115 and then mold it by pressing a stamper on this surface. Depending on the material of the relief forming layer, the relief is replicated by irradiating ionizing radiation during embossing and then removing the stamper. Commercial duplication can be carried out continuously by making it long. In addition, the relief can be replicated more commercially by using a cylindrical stamper prepared by attaching a stamper to the cylinder, or by directly engraving the relief on the cylinder. This interlayer primer layer was also effective in the roll-type continuous replication method.
[0199] (レリーフの硬化） [0199] (Relief hardening)
レリーフ形成層 315として電離放射線硬化性榭脂を用いた場合には、スタンパでェ ンボス中、又はエンボス後に、電離放射線を照射して、電離放射線硬化性榭脂を硬 化させる。上記の電離放射線硬化性榭脂は、レリーフを形成後に、電離放射線を照 射して硬化 (反応)させると電離放射線硬化榭脂 (レリーフ形成層 315)となる。電離 放射線としては、電磁波が有する量子エネルギーで区分する場合もあるが、本明細 書では、すべての紫外線 (UV-A、 UV-B、 UV-C)、可視光線、ガンマ一線、 X線、 電子線を包含するものと定義する。従って、電離放射線としては、紫外線 (UV)、可 視光線、ガンマ一線、 X線、または電子線などが適用できる力 紫外線 (UV)が好適 であり、波長 300〜400nmの紫外線が最適である。電離放射線で硬化する電離放 射線硬化性榭脂は、紫外線硬化の場合は光重合開始剤、及び Z又は光重合促進 剤を添カ卩し、エネルギーの高い電子線硬化の場合は添カ卩しないで良ぐまた、適正 な触媒が存在すれば、熱エネルギーでも硬化できる。レリーフ形成層 315として、熱 硬化性榭脂を用いた場合には、使用する熱硬化性榭脂の硬化条件に応じた温湿度 環境下で、エージングを行 、硬化させればょ 、。  When ionizing radiation curable resin is used as the relief forming layer 315, ionizing radiation curable resin is cured by irradiation with ionizing radiation during or after embossing with a stamper. When the ionizing radiation curable resin is cured (reacted) by irradiation with ionizing radiation after the relief is formed, the ionizing radiation curable resin (relief forming layer 315) is formed. Ionizing radiation may be classified by the quantum energy of electromagnetic waves, but in this specification, all ultraviolet rays (UV-A, UV-B, UV-C), visible light, gamma rays, X-rays, electrons It is defined as including a line. Accordingly, as the ionizing radiation, ultraviolet rays (UV), visible rays, gamma rays, X-rays, or electron rays can be applied, and ultraviolet rays having a wavelength of 300 to 400 nm are most suitable. An ionizing radiation curable resin that is cured by ionizing radiation adds a photopolymerization initiator and Z or a photopolymerization accelerator in the case of ultraviolet curing, and does not add it in the case of high energy electron beam curing. It can also be cured with thermal energy if an appropriate catalyst is present. If a thermosetting resin is used as the relief forming layer 315, it should be aged and cured in a temperature and humidity environment according to the curing conditions of the thermosetting resin used.
[0200] (反射層）  [0200] (Reflective layer)
反射層 317A及び反射層 317B (反射層 317)は、所定のレリーフ構造を設けたレリ ーフ形成層 315面のレリーフ面へ、反射層 317を設けることにより、レリーフの反射及 び Z又は回折効果を高めるので、レリーフ形成層 315の反射率より高ければ、特に 限定されず、例えば金属、または屈折率に差のある透明金属化合物が適用できる。 この反射層 317はレリーフ構造を設ける前に、レリーフ形成層 315へ形成することも 可能である。すなわち、各層の材料、スタンパを適宜選定することで、反射層 317形 成後にレリーフ形成することも可能である。 The reflective layer 317A and the reflective layer 317B (reflective layer 317) are provided with a relief having a predetermined relief structure. The reflective layer 317 is provided on the relief surface of the surface forming layer 315 to enhance the reflection and Z or diffraction effect of the relief, so that it is not particularly limited as long as it is higher than the reflectance of the relief forming layer 315. Alternatively, a transparent metal compound having a difference in refractive index can be applied. The reflective layer 317 can be formed on the relief forming layer 315 before providing the relief structure. That is, a relief can be formed after forming the reflective layer 317 by appropriately selecting the material and stamper of each layer.
[0201] 該反射層 317に用いる金属としては、金属光沢を有し光を反射する金属元素の薄 膜で、 Cr、 Ni、 Ag、 Au、 Al等の金属、及びその酸ィ匕物、硫化物、窒化物等の薄膜 を単独又は複数を組み合わせてもよい。上記の光反射性の金属薄膜の形成は、い ずれも 10〜2000nm程度、好ましくは 20〜： LOOOnmの厚さになるよう、真空蒸着法 、スパッタリング法、イオンプレーティング法などの真空薄膜法で得られる力 その他 、メツキなどによっても形成できる。反射層 317の厚さがこの範囲未満では、光がある 程度透過して効果が減じ、また、それ以上では、反射効果は変わらないので、コスト 的に無駄である。 [0201] The metal used for the reflective layer 317 is a thin metal element film having a metallic luster and reflecting light, such as Cr, Ni, Ag, Au, and Al, and their oxides and sulfides. A thin film such as an oxide or nitride may be used alone or in combination. The above light-reflective metal thin film is formed by a vacuum thin film method such as a vacuum deposition method, a sputtering method, an ion plating method or the like so as to have a thickness of about 10 to 2000 nm, preferably 20 to: LOOOnm. It can also be formed by the obtained force and other factors. If the thickness of the reflective layer 317 is less than this range, light is transmitted to some extent and the effect is reduced, and if it is more than that, the reflective effect does not change, which is wasteful in cost.
[0202] また、反射層 317として、ほぼ無色透明な色相で、その光学的な屈折率がレリーフ 形成層のそれとは異なる金属化合物を用 V、ることにより、金属光沢が無 ヽにもかかわ らず、ホログラムなどの光輝性を視認できるから、透明なホログラムなどの光輝性フィ ルムを作製することができる。  [0202] Further, as the reflective layer 317, a metallic compound having an almost colorless and transparent hue and an optical refractive index different from that of the relief forming layer is used. In addition, since the glitter such as a hologram can be visually recognized, a glitter film such as a transparent hologram can be produced.
[0203] 透明な金属又は金属化合物としては、例えば、レリーフ形成層 15よりも光屈折率の 高い薄膜、および光屈折率の低い薄膜とがあり、前者の例としては、 ZnS、 TiO、 Al  [0203] Examples of the transparent metal or metal compound include a thin film having a higher refractive index than the relief forming layer 15 and a thin film having a lower refractive index. Examples of the former include ZnS, TiO, Al
2 2
O、 Sb S、 SiO、 SnO、 ITO等があり、後者の例としては、 LiF、 MgF、 A1FがあO, Sb S, SiO, SnO, ITO, etc., examples of the latter include LiF, MgF, A1F.
2 3 2 3 2 2 3 る。好ましくは、金属酸化物又は窒化物であり、具体的には、 Be、 Mg、 Ca、 Cr、 Mn 、 Cu、 Ag、 Al、 Sn、 In、 Te、 Fe、 Co、 Zn、 Ge、 Pb、 Cd、 Biゝ Se、 Ga、 Rb、 Sb、 Pb 、 Ni、 Sr、 Ba、 La、 Ce、 Au等の酸ィ匕物又は窒化物、他はそれらを 2種以上を混合し たもの等が挙げられる。またアルミニウム等の一般的な光反射性の金属薄膜も、厚み 力 S200A以下になると、透明性が出て使用できる。透明金属化合物の形成は、金属 の薄膜と同様、レリーフ形成層 315のレリーフ面に、 10〜2000nm程度、好ましくは 20〜： LOOOnmの厚さになるよう、蒸着、スパッタリング、イオンプレーティング、 CVD などの真空薄膜法などにより設ければよい。さらには、レリーフ形成層 315と光の屈 折率の異なる透明な合成樹脂を使用してもよぐ接着層 321や保護層 325材料とレリ ーフ形成層 315材料の屈折率が十分に異なる場合には、接着層 321や保護層 325 が反射層 317を兼ねることもできる。 2 3 2 3 2 2 3 Preferably, it is a metal oxide or nitride, specifically, Be, Mg, Ca, Cr, Mn, Cu, Ag, Al, Sn, In, Te, Fe, Co, Zn, Ge, Pb, Cd Bi, Se, Ga, Rb, Sb, Pb, Ni, Sr, Ba, La, Ce, Au, etc. . Also, general light-reflective metal thin films such as aluminum can be used with transparency when the thickness force is S200A or less. The transparent metal compound is formed on the relief surface of the relief forming layer 315 on the relief surface of the relief forming layer 315 by vapor deposition, sputtering, ion plating, CVD to a thickness of about 10 to 2000 nm, preferably 20 to LOOOnm. It may be provided by a vacuum thin film method or the like. Furthermore, if the refractive index of the adhesive layer 321 or the protective layer 325 material and the relief forming layer 315 material are sufficiently different from each other, it is possible to use a transparent synthetic resin having a refractive index different from that of the relief forming layer 315. In addition, the adhesive layer 321 and the protective layer 325 can also serve as the reflective layer 317.
[0204] 特に、例えば、図 20のように、第 1光輝性図柄層 320Aと第 3光輝性図柄層 320C との 2つの図柄を有する場合には、一方の反射層 317を透明薄膜とすれば、基材の 一方の面力も見たとき、 2つの光輝性図柄を同時に視認することができる。し力しなが ら、必須ではなぐ両方の反射層 17を不透明な金属薄膜でもよぐ破壊しての視認ゃ 、一方を脆質ィ匕することによるセキュリティ性の向上なども図れる。  [0204] In particular, for example, as shown in FIG. 20, in the case of having two designs of the first glitter design layer 320A and the third glitter design layer 320C, if one of the reflective layers 317 is a transparent thin film, When one surface force of the base material is also seen, it is possible to visually recognize two glittering patterns simultaneously. However, it is possible to improve the security by making both of the reflecting layers 17 not visible with a non-transparent metal film and then visually observing them by fragile one of them.
[0205] (層間プライマ層）  [0205] (Interlayer primer layer)
層間プライマ層 321Bの材料としては、反射層 (金属薄膜層)形成材料とレリーフ材 料の接着性を向上する材料であればよぐ好ましくは、レリーフ形成層 315Aの Tgよ り低い材料である。通常のレリーフ形成層 315の硬化前 Tgl30°C以下より低くするこ とで、反射層とレリーフ層との接着性を向上し、ランニング時の版取られを抑制できる 。蒸着層とレリーフ形成層 315の Tgに下限はないが、層間プライマ塗工物の卷取り 保管の必要性等を考慮したとき、常温より高いことが好ましい。また、反射層形成材 料との接着性に優れた層間プライマ層と、レリーフ層材料との接着性に優れた層間 プライマ層など、 2つ以上の層間プライマ層力 なっていてもよい。また、層間プライ マ層 321Bは、熱及び Z又は圧力の負荷がかかっても、レリーフ形成層 315の Tgより 低いので、柔軟性があり、そのクッション作用で、レリーフ形成層 315への負荷を減じ て、既に賦型されているレリーフ形状の劣化を防止し、その結果、既に賦型されてい るレリーフの光輝性が保持される。  The material of the interlayer primer layer 321B is preferably a material that improves the adhesion between the reflective layer (metal thin film layer) forming material and the relief material, and is lower than the Tg of the relief forming layer 315A. By lowering the normal relief forming layer 315 before curing at a Tgl of 30 ° C. or lower, the adhesion between the reflective layer and the relief layer can be improved, and plate removal during running can be suppressed. Although there is no lower limit to the Tg of the vapor deposition layer and the relief forming layer 315, it is preferably higher than room temperature in consideration of the necessity of removing and storing the interlayer primer coating. Further, two or more interlayer primer layers may be used, such as an interlayer primer layer having excellent adhesion to the reflective layer forming material and an interlayer primer layer having excellent adhesion to the relief layer material. In addition, the interlayer primer layer 321B is flexible because it is lower than the Tg of the relief forming layer 315 even when heat and Z or pressure are applied, and its cushioning action reduces the load on the relief forming layer 315. Thus, deterioration of the already shaped relief shape is prevented, and as a result, the glitter of the already shaped relief is maintained.
[0206] 層間プライマ層 321Bの材料としては、例えば、ポリウレタン系榭脂、ポリエステノレ系 榭脂、ポリアミド系榭脂、エポキシ系榭脂、フエノール系榭脂、ポリ塩ィ匕ビ二ル系榭脂 、ポリ酢酸ビニル系榭脂、塩ィヒビ二ルー酢酸ビニル共重合体、酸変性ポリオレフイン 系榭脂、エチレンと酢酸ビュル或いはアクリル酸などとの共重合体、（メタ）アクリル系 榭脂、ポリビニルアルコール系榭脂、ポリビニルァセタール榭脂、ポリブタジエン系榭 脂、ゴム系化合物、石油系榭脂、アルキルチタネート系化合物、ポリエチレンイミン系 化合物、イソシァネート系化合物、澱粉、カゼイン、アラビアゴム、セルロース誘導体、 ワックス類などを使用することができる。ポリエチレン榭脂、アクリロニトリル一ブタジェ ン—スチレン (ABS)榭脂、アクリロニトリル—スチレン (AS)榭脂、酢酸セルロース榭 脂、アイオノマー榭脂、ポリアクリロニトリル榭脂、これらの榭脂は 1種または 2種以上 を併用して用いることができる。イソシァネートなどの架橋剤を適宜添加し、接着性を 向上させてもよい。 [0206] The material of the interlayer primer layer 321B includes, for example, polyurethane-based resins, polyester-based resins, polyamide-based resins, epoxy-based resins, phenol-based resins, and polysalt-vinyl-based resins. , Polyvinyl acetate resin, salt vinyl acetate copolymer, acid-modified polyolefin resin, copolymer of ethylene and butyl acetate or acrylic acid, (meth) acrylic resin, polyvinyl alcohol Resin, polyvinylacetal resin, polybutadiene resin, rubber compound, petroleum resin, alkyl titanate compound, polyethyleneimine system Compounds, isocyanate compounds, starch, casein, gum arabic, cellulose derivatives, waxes and the like can be used. Polyethylene resin, acrylonitrile monobutagen-styrene (ABS) resin, acrylonitrile-styrene (AS) resin, cellulose acetate resin, ionomer resin, polyacrylonitrile resin, one or more of these resins Can be used in combination. A cross-linking agent such as isocyanate may be added as appropriate to improve the adhesion.
[0207] 層間プライマ層の形成にカ卩え、必要に応じて、コロナ放電処理、プラズマ処理など の表面処理により、基材とレリーフ層の密着性をあげるのもよい。すなわち、レリーフ 層を形成する面側に、層間の密着力を向上させるために、必要に応じてコロナ放電 処理、プラズマ処理、オゾンガス処理、フレーム処理、予熱処理、除塵埃処理、アル カリ処理などなどの易接着処理を施してもよい。層間プライマ層 321Bは、公知の方 法で、溶融又は溶液として塗布しても、ー且フィルム化して力ゝら貼合してもよい。  [0207] In consideration of the formation of the interlayer primer layer, if necessary, the adhesion between the substrate and the relief layer may be increased by surface treatment such as corona discharge treatment or plasma treatment. In other words, corona discharge treatment, plasma treatment, ozone gas treatment, flame treatment, pre-heat treatment, dust removal treatment, alkali treatment, etc. as necessary to improve the adhesion between the layers on the surface where the relief layer is formed. Easy adhesion treatment may be performed. The interlayer primer layer 321B may be applied as a melt or a solution by a known method, or may be formed into a film and bonded by force.
[0208] (光輝性図柄の複数化）  [0208] (Multiple glitter patterns)
以上説明してきた各層の形成、賦型を繰り返して、本発明の光輝性フィルム 310が 得られる。  The glittering film 310 of the present invention is obtained by repeating the formation and shaping of each layer described above.
[0209] 図 17に示す本発明の光輝性フィルム 310では、基材 311の一方の面へ、第 1レリ ーフ形成層 315Aを形成し、第 1光輝性図柄を賦型し、第 1反射層 317Aを形成し、 さらに、第 1反射層 317Aの表面へ、層間プライマ層 321Bを形成し、第 2レリーフ形 成層 315Bを形成し、第2光輝性図柄を賦型し、第 2反射層 317Bを形成すればよい [0209] In the glitter film 310 of the present invention shown in FIG. 17, the first relief forming layer 315A is formed on one surface of the base material 311, the first glitter pattern is shaped, and the first reflection is performed. The layer 317A is formed, and further, the interlayer primer layer 321B is formed on the surface of the first reflective layer 317A, the second relief forming layer 315B is formed, the second glitter pattern is formed, and the second reflective layer 317B is formed. Should be formed
[0210] また、図 17に示す本発明の光輝性フィルム 310の、第 1反射層 317Aと基材 311に 関して反対となる面へ、さらに第 3レリーフ形成層 315Cを形成し、第 3光輝性図柄を 賦型し、第 3反射層 317Cを形成すれば、図 20に示す光輝性フィルム 310となり、 3 つの光輝性図柄を有する。 [0210] Further, the third relief forming layer 315C is further formed on the surface opposite to the first reflective layer 317A and the base material 311 of the glitter film 310 of the present invention shown in FIG. When the characteristic pattern is formed and the third reflective layer 317C is formed, the glittering film 310 shown in FIG. 20 is obtained and has three glittering patterns.
[0211] さらに、図 12に示す光輝性フィルム 310の、第 3反射層 317C面へ、さらに層間ブラ イマ層 321Dを形成し、第 4レリーフ形成層 315Dを形成し、第 4光輝性図柄を賦型し 、透明な第 4反射層 317Dを形成すれば、図 21に示す光輝性フィルム 310となり、 4 つの光輝性図柄を有する。 [0212] 上記の複数図柄ィ匕についてさらに説明すると、以上のようにして、光輝性フィルム 3 10A及び 310Bが得られる。また、本発明では、層の構成に従って、レリーフ形成層 315、レリーフ形状 316及び反射層 317を作製する工程を繰り返すことで、複数図柄 を有する複数図柄光輝性フィルムを作製し、この複数図柄光輝性フィルムを適宜スリ ットすることで本発明の複数図柄光輝性スレッド 310を得ることができる。 [0211] Further, on the surface of the third reflective layer 317C of the glitter film 310 shown in FIG. 12, an interlayer primer layer 321D is further formed, a fourth relief forming layer 315D is formed, and a fourth glitter pattern is imparted. Then, when the transparent fourth reflective layer 317D is formed, the glitter film 310 shown in FIG. 21 is obtained and has four glitter patterns. [0212] Further description of the above-described plurality of patterns i will give the glitter films 310A and 310B as described above. Further, in the present invention, by repeating the steps of producing the relief forming layer 315, the relief shape 316, and the reflective layer 317 according to the layer configuration, a multi-design glitter film having a plurality of designs is produced. By appropriately slitting the film, the multi-design glittering thread 310 of the present invention can be obtained.
[0213] このように、 1つの基材に対してレリーフ形成層 315、レリーフ形状 316及び反射層 317を作製する工程を繰り返すことで複数図柄を有する複数図柄光輝性フィルムを 作製する際には、後からレリーフ形成層にレリーフ形状 316を作製する工程で、先に 作製したレリーフ形状を破壊しないことが必要となる。  [0213] Thus, when producing a multi-pattern glitter film having a plurality of designs by repeating the process of producing the relief forming layer 315, the relief shape 316 and the reflective layer 317 on one substrate, In the process of producing the relief shape 316 in the relief forming layer later, it is necessary not to destroy the relief shape produced earlier.
[0214] このため先に形成された第 1レリーフ形成材料のガラス転移温度を Tgl (u)、この材 料の硬化後のガラス転移温度を Tgl (h)、後から形成された第 2レリーフ形成層を作 製する材料のガラス転移温度を Tg2 (u)、この材料の硬化後のガラス転移温度を Tg 2 (h)とするとき、第 1レリーフ形成層は第 2レリーフ形成層のレリーフが賦型される前 に硬化されるとともに、 Tgl (h) >Tg2 (u)の関係があることが好ましい。  [0214] Therefore, Tgl (u) is the glass transition temperature of the first relief forming material formed earlier, Tgl (h) is the glass transition temperature after hardening of this material, and the second relief formation is formed later. When the glass transition temperature of the material from which the layer is made is Tg2 (u) and the glass transition temperature of this material after curing is Tg2 (h), the relief of the second relief forming layer is added to the first relief forming layer. It is preferable that the resin is cured before being molded and has a relationship of Tgl (h)> Tg2 (u).
[0215] また、第 1レリーフ形成層の材料、第 2レリーフ形成層の材料として一般的な熱可塑 性榭脂を使用する場合には、 Tgl (u) =Tgl (h) =Tgl、さらに、 Tg2 (u) =Tg2 (h) =Tg2とすると、 Tgl >Tg2の関係があることが好ましい。第 3、第 4とさらに複数個の レリーフ形成層を有する場合は、 Tgl >Tg2>Tg3 >Tg4、すなわち、 Tgl (u) >T g2 (u) >Tg3 (u) >Tg4 (u)の関係があることが好ましい。  [0215] When general thermoplastic resin is used as the material for the first relief forming layer and the material for the second relief forming layer, Tgl (u) = Tgl (h) = Tgl, When Tg2 (u) = Tg2 (h) = Tg2, it is preferable that there is a relationship of Tgl> Tg2. When there are 3rd, 4th and more relief forming layers, Tgl> Tg2> Tg3> Tg4, that is, Tgl (u)> T g2 (u)> Tg3 (u)> Tg4 (u) It is preferable that there is.
[0216] しカゝしながら、硬化性榭脂を使用する場合には (Tgl >Tg2)の関係が成立すること が特に好ましいわけではない。先にレリーフ形成される榭脂として硬化性榭脂を使用 すると、硬化前の Tgl (u)が低くても、レリーフ形成後にこの榭脂を硬化することで、 後から第 2レリーフ形成層にレリーフを賦型する時点において Tgl (h)を十分に高く することが容易なため好ましい。逆に、後からレリーフ形成する榭脂として硬化性榭脂 を使用すれば、第 2レリーフ形成層にレリーフを賦型する温度を十分に低くするととも に、第 2レリーフ形成後にこの榭脂を Tg2 (h)まで硬化することで製品の耐久性を十 分に高くすることができるので好ましい。すなわちレリーフ賦型時には硬化しておらず 、レリーフ賦型後硬化可能な硬化性榭脂を使用することで、未硬化時の樹脂のガラ ス転移温度が Tgl (u) =Tg2 (u)、もしくは、 Tgl (u)く Tg2 (u)の関係にあっても、 T gl (h) >Tg2 (u)の関係を成立することができ、先に形成されたレリーフの形状を破 壊することなく後に形成するレリーフを作製することができる。このようなレリーフ榭脂 の硬化を、全工程中、最適な工程で行うためには、レリーフ形成材料としては、電離 放射線硬化性榭脂が特に好ましい。 3層以上の複数図柄を有する際にも同様である [0216] However, when a curable resin is used, it is not particularly preferable that the relationship (Tgl> Tg2) is established. If a curable resin is used as the resin to be relief formed first, even if the Tgl (u) before curing is low, this resin is cured after the relief is formed, so that the relief is later applied to the second relief forming layer. This is preferable because it is easy to make Tgl (h) sufficiently high at the time of molding. On the contrary, if curable resin is used as the resin to be relief formed later, the temperature at which the relief is formed on the second relief forming layer is sufficiently lowered, and the resin is converted to Tg2 after the second relief is formed. Curing to (h) is preferable because the durability of the product can be sufficiently increased. In other words, by using a curable resin that is not cured at the time of relief molding and can be cured after relief molding, the glass of the resin at the time of uncuring can be used. Even if the transition temperature is Tgl (u) = Tg2 (u), or Tgl (u) and Tg2 (u), the relationship of T gl (h)> Tg2 (u) can be established. The relief formed later can be produced without destroying the shape of the relief formed earlier. In order to cure such relief resin in an optimal process among all processes, ionizing radiation curable resin is particularly preferable as the relief forming material. The same applies when having multiple designs of 3 layers or more.
[0217] 上記に示したガラス転移温度の関係を満足しないと、レリーフ形状の形状維持が困 難となり、ひび割れ、白化等が生じ、光輝性複数図柄としての十分な輝度が得られな くなつてしまう。 [0217] If the relationship of the glass transition temperature shown above is not satisfied, it will be difficult to maintain the relief shape, cracking, whitening, etc. will occur, and sufficient brightness as a glittering multiple pattern will not be obtained. End up.
[0218] 但し、上記のガラス転移温度は、動的粘弾性測定における損失正接 (tan δ )が最 大値をとる温度を当該樹脂のガラス転移温度としたものである。粘弾性の測定方法は 、測定機器としてレオメトリックス製 ARESを用い、測定条件は、パラレルプレート 10 πιπι Φ、歪み 1 %、振幅 1Ηζ、昇温速度 2°CZmin.で、試料の榭脂の温度を 30°Cか ら 200°Cに昇温させることにより行う。また、一般に貯蔵弾性率 G' は弾性成分で、高 分子中でのコイルの振動や凝集体構造などの構造が生じることによって発生し、損 失弾性率 G は粘性成分であり、静的の剪断応力と等価なものである。 tan δは G" /G' により求められ、材料が変形する際にどれくらいのエネルギーを吸収するかの 指標となる。  [0218] However, the glass transition temperature mentioned above is the temperature at which the loss tangent (tan δ) in the dynamic viscoelasticity measurement has the maximum value is defined as the glass transition temperature of the resin. The measurement method of viscoelasticity is ARES manufactured by Rheometrics as a measuring instrument. The measurement conditions are parallel plate 10 πιπι Φ, strain 1%, amplitude 1Ηζ, heating rate 2 ° CZmin. The temperature is raised from 30 ° C to 200 ° C. In general, the storage elastic modulus G ′ is an elastic component, which is generated by the generation of a coil vibration or aggregate structure in a high molecule, and the loss elastic modulus G is a viscous component. It is equivalent to stress. tan δ is determined by G "/ G 'and is an index of how much energy is absorbed when the material is deformed.
[0219] 本発明の光輝性フィルム 310は、複数の光輝性図柄を有し、該複数図柄のいずれ もが光輝性に優れ、基材が 1枚でよく省資源であり、総厚さが極めて薄くできる。光輝 性フィルム 310は、被転写体ゃ抄き込み用紙との一体感に優れている。コストの低減 も可能である。  [0219] The glitter film 310 of the present invention has a plurality of glitter designs, all of which have excellent glitter properties, a single substrate is sufficient, resource saving, and the total thickness is extremely high. Can be thin. The glittering film 310 is excellent in a sense of unity with the transfer material or paper. Costs can be reduced.
[0220] (他の層）  [0220] (Other layers)
また、本発明の光輝性フィルム 310には、光輝性図柄が観察できる範囲で、必要に 応じて、層構成の層間及び Z又は表面に、保護層、着色層、磁気印刷、及び Z又は 榭脂層などの他の層、並びに Z又は印刷、プライマ層などを設けてもよい。さらに、 光輝性フィルム 310の少なくともいずれかの表面に、易プライマ層を設けてもよぐ該 プライマ層の材料としては、親水性の材料、例えばポリビュルアルコール系榭脂、ァ クリル系榭脂、セルロース系榭脂などが好ま 、。 Further, the glittering film 310 of the present invention has a protective layer, a colored layer, magnetic printing, and Z or resin on the interlayer and Z or the surface of the layer structure as necessary, as long as the glittering pattern can be observed. Other layers, such as layers, as well as Z or printing, primer layers, etc. may be provided. Further, an easy primer layer may be provided on at least one surface of the glittering film 310. The primer layer is made of a hydrophilic material such as a polybutyl alcohol-based resin, a resin. Krill oil and cellulosic oil are preferred.
[0221] 上記の保護層としては、前記のレリーフ形成層で説明した構成樹脂と同様に、ァク リル榭脂等の熱可塑性榭脂、そして、不飽和ポリエステル、メラミン、エポキシウレタン (メタ)アタリレート等の熱硬化性榭脂を硬化させたもの、不飽和エチレン系モノマーと 不飽和エチレン系オリゴマーを適宜混合したものに増感剤を添加した組成物等の紫 外線硬化性榭脂を硬化させたもの、或いは、上記熱可塑性榭脂と熱硬化性榭脂の 混合物やラジカル重合性不飽和基を有する熱成形性物質が使用可能である。特に 耐薬品性、耐光性及び耐候性等の耐久性に優れた熱硬化性榭脂、紫外線や電子 線などの電離放射線硬化性榭脂が好まし!/、。  [0221] As the protective layer, as in the constituent resin described in the relief forming layer, thermoplastic resin such as acryl resin, unsaturated polyester, melamine, epoxy urethane (meth) atariate. Curing ultraviolet curable resin such as a composition obtained by curing a thermosetting resin such as a rate, a composition in which an unsaturated ethylene monomer and an unsaturated ethylene oligomer are appropriately mixed, and a sensitizer added. Or a mixture of the thermoplastic resin and the thermosetting resin, or a thermoformable substance having a radically polymerizable unsaturated group can be used. In particular, thermosetting resins with excellent durability such as chemical resistance, light resistance and weather resistance, and ionizing radiation curable resins such as ultraviolet rays and electron beams are preferred!
[0222] (複数の光輝性図柄形成物）  [0222] (Multiple glitter pattern formations)
本発明の光輝性図柄形成物 300は、本発明の光輝性フィルム 310を用いて、該光 輝性図柄の少なくとも 1部を、被転写体へ貼着、接着、や漉き込みなどで移行させを 抄込みによる抄紙法で作製することができ、光輝性に優れた複数の図柄を有し、特 異な意匠性、セキュリティ性を持たせることができる。  The glitter pattern formation product 300 of the present invention uses the glitter film 310 of the present invention to transfer at least a part of the glitter pattern to the transfer target body by adhering, bonding, or punching. It can be produced by a papermaking method by embedding and has a plurality of designs with excellent glitter, and can have special design and security.
[0223] 図 26に本発明の光輝性図柄形成物 300の一実施例として、本発明の光輝性フィ ルム 310を細巾にスリットしてなるスレッドを、基紙の少なくとも一方の面の表面に抄き 込んで偽造防止用紙とし、該偽造防止用紙を使用した商品券の例を示す。スレッド の総厚さが極めて薄くて、被転写体ゃ抄き込み用紙との一体感に優れ、さらに、省資 源で、製造が容易である。該偽造防止用紙に用いるスレッドは 1本でも複数本でもよ い。また、図 26 (B)は有価証券印刷部と同じ面に設けた場合、図 26 (C)は有価証券 印刷部と反対面に設けた場合、の片面のみの例で、もちろん両面に設けてもよい。  [0223] FIG. 26 shows, as an example of the glitter pattern formation 300 of the present invention, a thread formed by slitting the glitter film 310 of the present invention on a surface of at least one surface of a base paper. An example of a gift certificate using the anti-counterfeit paper, which has been prepared as an anti-counterfeit paper, is shown. The total thickness of the threads is extremely thin, and the transferred material is excellent in unity with the paper-making paper. In addition, it is resource-saving and easy to manufacture. One or more threads may be used for the anti-counterfeit paper. Fig. 26 (B) is an example of only one side when it is provided on the same side as the securities printing section, and Fig. 26 (C) is provided on the opposite side of the securities printing section. Also good.
[0224] (抄紙法）  [0224] (Paper making)
次に、抄紙法について説明する。本発明の光輝性フィルム 310が細幅のストライプ 状の形状となった場合に、製紙業の当業者はスレッドと称する。本発明の光輝性フィ ルム 310を幅力 SO. 5〜30mm程度、好ましくは 1〜： LOmmの狭い幅にスリットして、該 スレッドを基紙 301へ抄き込む。  Next, the papermaking method will be described. When the glitter film 310 of the present invention has a narrow stripe shape, those skilled in the papermaking industry call it a thread. The glitter film 310 of the present invention is slit to a width of SO. 5 to 30 mm, preferably 1 to a narrow width of LO mm, and the thread is incorporated into the base paper 301.
[0225] (基紙） [0225] (Base paper)
該偽造防止用紙の基紙 301としては、表面平滑性および耐熱性に優れ、適当な強 度、厚さを有するものであれば、特に制限はないが、上質紙等の洋紙、薄手の板紙、 カード紙等の紙が適用できる。 100〜200gZm2の坪量で、印字、転写適性に優れ る上質紙、コート紙が好ましい。該基紙 301へ、幅が 0. 5〜30mm程度、好ましくは 1 〜： LOmmの、狭い幅にスリットしたスレッドを抄き込んで製造する。即ち、針葉樹晒ク ラフトパルプ (NBKP)、広葉樹晒クラフトパルプ (LBKP)、針葉樹晒サルファイトパル プ（NBSP)、サーモメカニカルパルプ (TMP)等の木材パルプや麻、綿、藁を原料と した非木材パルプ等を適宜混合して叩解し、これに填料、乾燥紙力増強剤、湿潤紙 力増強剤、サイズ剤、定着剤、歩留り向上剤、濾水性向上剤、消泡剤、染料、着色顔 料、蛍光剤などを適宜添加し、通常フリーネス 400〜250mlC. S. F.に調整した紙 料を調製する。該紙料へ、狭い幅のスレッドを繰り出しながら、長網抄紙機や円網抄 紙機などの公知の抄紙機を使用して抄き込んで製造し、必要に応じてマシンカレン ダー、スーパーカレンダー処理をする。 The anti-counterfeit base paper 301 is excellent in surface smoothness and heat resistance and has an appropriate strength. There is no particular limitation as long as it has a thickness and thickness, but paper such as fine paper such as fine paper, thin paperboard, and card paper can be applied. High-quality paper and coated paper having a basis weight of 100 to 200 gZm2 and excellent printability and transferability are preferred. The base paper 301 is manufactured by embedding a thread having a width of about 0.5 to 30 mm, preferably 1 to LOmm, slit into a narrow width. In other words, softwood bleached kraft pulp (NBKP), hardwood bleached kraft pulp (LBKP), softwood bleached sulfite pulp (NBSP), thermomechanical pulp (TMP), etc. Mix and beat pulp as appropriate, and add filler, dry paper strength enhancer, wet paper strength enhancer, sizing agent, fixing agent, yield improver, freeness improver, antifoaming agent, dye, coloring pigment Add a suitable fluorescent agent, etc., and prepare a paper usually adjusted to freeness 400-250mlC. SF. The paper stock is manufactured by using a known paper machine such as a long paper machine or a circular paper machine while feeding a narrow-width thread, and if necessary, a machine calendar, a super calendar Process.
[0226] (他の支持基材）  [0226] (Other supporting substrates)
以上のようにして得られた本発明の複数図柄光輝性フィルムへは、さらに、別の基 材ゃ層を設けてもよい。例えば図 18に示すように、反射層 317Bの表面に接着層 32 1を介して支持基材 301を設けることで、金属表面を保護することができる。支持基材 としては、基材 301に関して記載した材料が使用される。これらの合成樹脂フィルム や紙基材などを、ドライラミネーシヨン法、押出ラミネーシヨン法、粘着剤ラミネーシヨン 法、熱ラミネーシヨン法などの公知の方法で積層すればよい。また、この支持基材とし て離型処理した支持基材を用いることで、意匠性、セキュリティー性に優れた粘着ラ ベルとすることができる。  Another base material layer may be further provided on the multi-pattern glittering film of the present invention obtained as described above. For example, as shown in FIG. 18, the metal surface can be protected by providing a support substrate 301 on the surface of the reflective layer 317B with an adhesive layer 321 interposed therebetween. As the supporting substrate, the materials described for the substrate 301 are used. These synthetic resin films and paper base materials may be laminated by a known method such as a dry lamination method, an extrusion lamination method, an adhesive lamination method, or a thermal lamination method. Further, by using a support substrate that has been subjected to a release treatment as the support substrate, an adhesive label having excellent design and security can be obtained.
[0227] (接着剤）  [0227] (Adhesive)
接着層 321に使用する接着剤としては、上記した従来公知の積層方法に順じて適 宜材料を選定すればよい。例えば、ドライラミネーシヨン法にて、積層する場合、熱、 または紫外線'電子線などの電離放射線で硬化する接着剤が適用できる。熱硬化接 着剤としては、 2液硬化型ウレタン系接着剤、ポリエステルウレタン系接着剤、ポリエ テルウレタン系接着剤、アクリル系接着剤、ポリエステル系接着剤、ポリアミド系接 着剤、ポリ酢酸ビニル系接着剤、エポキシ系接着剤、ゴム系接着剤などが適用できる 。なかでも 2液硬化型ウレタン系接着剤が好適である。溶媒へ分散または溶解した接 着剤を塗布し乾燥させて、 2枚の光輝性フィルムを重ねて積層した後に、 30〜120 °Cで数時間〜数日間エージングすることで、接着剤を硬化させるとよい。既に形成さ れたレリーフ形状を破壊することがないよう、できるだけ低温で硬化できる接着剤、好 ましくは賦型されたレリーフ形成層材料のガラス転移温度 Tg (h)より低 ヽ温度で硬化 できる接着剤、さらに好ましくは Tg (u)より低い温度で硬化できる接着剤、が特に好 ましく使用される。該接着層の膜厚としては、 0. 1〜20 ;ζ ΐη (乾燥状態)程度、好まし くは 1. 0〜5. O /z mである。 As an adhesive used for the adhesive layer 321, an appropriate material may be selected in accordance with the above-described conventionally known lamination method. For example, when laminating by the dry lamination method, an adhesive that is cured by ionizing radiation such as heat or ultraviolet rays' electron beam can be applied. Thermosetting adhesives include two-component curable urethane adhesives, polyester urethane adhesives, polyether urethane adhesives, acrylic adhesives, polyester adhesives, polyamide adhesives, and polyvinyl acetate adhesives. Adhesives, epoxy adhesives, rubber adhesives, etc. can be applied . Among these, a two-component curable urethane adhesive is preferable. The adhesive dispersed or dissolved in a solvent is applied and dried, and two glitter films are stacked and laminated, and then the adhesive is cured by aging at 30 to 120 ° C for several hours to several days. Good. An adhesive that can be cured at as low a temperature as possible, preferably at a temperature lower than the glass transition temperature Tg (h) of the formed relief forming layer material, so as not to destroy the already formed relief shape. Adhesives, more preferably adhesives that can be cured at temperatures below Tg (u), are particularly preferably used. The thickness of the adhesive layer is 0.1 to 20; about ζ ζη (dry state), preferably 1.0 to 5. O / zm.
[0228] (観察） [0228] (Observation)
該本発明の光輝性フィルム 310は、先の構成に加えて、印刷絵柄などを設けたりし てもよい。また、スレッドは、基紙中へ埋没させてもよぐまた、半分埋め込みや、十分 に接着していれば表面上でもよい。また、基紙の表面に部分的に露出させてもよい。 さらに基紙を部分的に薄くして埋め込んでもよぐ特に、半分埋め込みや部分的に薄 V、該基紙 301では、本発明の光輝性フィルム 310の両側の光輝性図柄を十分に視 認できる。また、埋没や部分埋め込みでは、少なくとも一方の光輝性図柄が視認でき なかったり、視認しにくいが、必要に応じて、剥離して観察することで観察できるので 、本発明の範囲である。  The glitter film 310 of the present invention may be provided with a printed pattern or the like in addition to the above configuration. The thread may be embedded in the base paper, or it may be half-embedded or on the surface if it is sufficiently adhered. Further, it may be partially exposed on the surface of the base paper. Further, the base paper may be partially thinned and embedded, in particular, half-embedded or partially thin V. With the base paper 301, the glitter pattern on both sides of the glitter film 310 of the present invention can be fully observed. . Further, in the case of embedding or partial embedding, at least one of the glittering patterns cannot be visually recognized or is difficult to visually recognize, but can be observed by peeling and observing as necessary, and thus is within the scope of the present invention.
[0229] (製造） [0229] (Manufacturing)
本発明の光輝性フィルム 310の製造は、いずれの工程も既存の設備、技術を用い ることができるので、製造が容易で低コストに製造することができる。また、本発明の 光輝性図柄形成物 300の製造も、いずれの工程も既存の設備、技術を用いることが できるので、製造が容易で低コストに製造することができる。  The production of the glitter film 310 of the present invention can be carried out easily and at a low cost because existing processes and techniques can be used in any process. In addition, since both the production of the glitter pattern formation 300 of the present invention and the existing equipment and technology can be used in both processes, the production is easy and can be produced at low cost.
実施例  Example
[0230] 以下、実施例及び比較例により、本発明を更に詳細に説明するが、本発明はこれ に限定されるものではない。  [0230] Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited thereto.
[0231] (実施例 A1) [0231] (Example A1)
(第 1の光輝性フィルムの作成）  (Creation of first glitter film)
基材 11 Aとして厚さ 6 μ mのルミラー 6CF53 (東レネ土製、 PETフィルム商品名）を用 いた。該基材 11 Aの一方の面へ、前述の電離放射線硬化性榭脂組成物 Aをグラビ ァリバースコーターで塗工し 100°Cで乾燥させて、厚さ 1 μ mのレリーフ形成層 15A を形成した。次に、該レリーフ形成層面へ、 2光束法によるレインボウホログラムから 2 P法で複製したスタンパを複製装置のエンボスローラーに貼着して、相対するローラ 一と間で加熱プレス (エンボス）して、微細な凹凸パターン力 なるレリーフを賦形させ た。賦形後直ちに、高圧水銀灯を用いて紫外線を照射して硬化させた。レリーフ形成 層 15Aのレリーフ面へ真空蒸着法で厚さが 500nmのアルミニウム薄膜を形成して反 射層 17Aとした。 Lumirror 6CF53 (product name: Torayen clay, PET film product name) with a thickness of 6 μm is used as the base material 11 A It was. The above-mentioned ionizing radiation curable resin composition A is applied to one surface of the substrate 11A with a gravure reverse coater and dried at 100 ° C. to form a relief forming layer 15A having a thickness of 1 μm. Formed. Next, a stamper duplicated by the 2P method from the rainbow hologram by the two-beam method is applied to the relief forming layer surface, and is applied to the embossing roller of the duplicating apparatus, and is heated and pressed (embossed) with the opposite roller. A relief with a fine patterning power was formed. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 15A by a vacuum deposition method to obtain a reflecting layer 17A.
[0232] (第 2の光輝性フィルムの作成）  [0232] (Creation of second glittering film)
基材 11Bとして厚さ 6 μ mのルミラー 6CF53 (東レネ土製、 PETフィルム商品名）を用 いた。該基材 11Bの一方の面へ、前述の電離放射線硬化性榭脂組成物 Aをグラビ ァリバースコーターで塗工し 100°Cで乾燥させて、厚さ 1 μ mのレリーフ形成層 15B を形成した。次に、該レリーフ形成層面へ、回折格子から 2P法で複製したスタンパを 複製装置のエンボスローラーに貼着して、相対するローラーと間で加熱プレス (ェン ボス)して、微細な凹凸パターン力 なるレリーフを賦形させた。賦形後直ちに、高圧 水銀灯を用いて紫外線を照射して硬化させた。レリーフ形成層 15Bのレリーフ面へ 真空蒸着法で厚さが 500nmのアルミニウム薄膜を形成して反射層 17Bとした。  Lumirror 6CF53 (manufactured by Torayen clay, trade name of PET film) having a thickness of 6 μm was used as the base material 11B. The above-mentioned ionizing radiation curable resin composition A is applied to one surface of the substrate 11B with a gravure reverse coater and dried at 100 ° C to form a relief forming layer 15B having a thickness of 1 μm. did. Next, a stamper replicated from the diffraction grating by the 2P method on the relief forming layer surface is attached to an embossing roller of a replication apparatus, and heated and pressed (enbossed) with an opposing roller to form a fine uneven pattern. A powerful relief was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 15B by a vacuum vapor deposition method to obtain a reflective layer 17B.
[0233] (複数図柄光輝性フィルムの作成）  [0233] (Creation of multi-pattern glitter film)
第 1の光輝性フィルムの反射層 17Aと第 2の光輝性フィルムの反射層 17Bとを公知 のドライラミ法で貼合する。第 1の光輝性フィルムの反射層 17A面へ、グラビアコート 法で 2液硬化型ポリウレタン系接着剤を乾燥後の厚さが 1. 5 mになるように塗布し 乾燥した後に、第 2の光輝性フィルムの反射層 17B面とを重ね合せて加圧し、その後 40°Cで 3日間放置して、実施例 1の複数図柄光輝性フィルム 10を得た。該複数図柄 光輝性フィルム 10は、全体厚さが略 15 μ mで、一方の面がホログラム、他方の面は 回折格子による別個の光輝性図柄が、明るく観察することができ、該光輝性図柄は 誰でも、しかも暗がりでも一見しただけで観察でき識別することができた。さらに、カラ 一コピー機でコピーしたところ、ホログラム特有の輝きはなぐ複数図柄光輝性フィル ムのホログラムとコピーとは全く異なり、一目で真贋が判断できた。 [0234] (実施例 A2) The reflective layer 17A of the first glitter film and the reflective layer 17B of the second glitter film are bonded together by a known dry lamination method. Apply a two-part curable polyurethane adhesive to the reflective layer 17A surface of the first glitter film by gravure coating so that the thickness after drying is 1.5 m, and after drying, apply the second glitter. The reflective layer 17B surface of the conductive film was overlaid and pressurized, and then allowed to stand at 40 ° C. for 3 days to obtain a multi-pattern glitter film 10 of Example 1. The multi-pattern glittering film 10 has an overall thickness of approximately 15 μm, and one surface has a hologram, and the other surface has a separate glittering pattern formed by a diffraction grating. Anyone, even in the dark, could be observed and identified at a glance. Furthermore, when copying with a color copier, the hologram and copy of a multi-pattern glitter film that lacks the unique brightness of a hologram were completely different, and the authenticity could be judged at a glance. [0234] (Example A2)
反射層 17Aとして、スパッタリング法で厚さが 1 OOnmの酸化チタン薄膜を形成に用 いる以外は、実施例 A1と同様にして、複数図柄光輝性フィルム 10を得た。該複数図 柄光輝性フィルム 10は、全体厚さが略 15 mで、一方の面が回折格子による光輝 性図柄とホログラム図柄が、他方の面は回折格子による別個の透明な光輝性図柄が 、明るく観察することができた。  A multi-pattern glittering film 10 was obtained in the same manner as in Example A1 except that a titanium oxide thin film having a thickness of 1 OOnm was used for forming the reflective layer 17A by sputtering. The multi-pattern glitter film 10 has an overall thickness of approximately 15 m, one surface having a glitter pattern and a hologram pattern by a diffraction grating, and the other surface having a separate transparent glitter pattern by the diffraction grating. I could observe brightly.
[0235] (実施例 A3)  [0235] (Example A3)
基材 11Aとして厚さ 6 /ζ πι、基材 11Bとして厚さ 12 /z mの PETフィルムを用い、レリ ーフ形成層塗工液として、前述の電離放射線硬化性榭脂組成物 Bを用いる以外は、 実施例 A1と同様にして、複数図柄光輝性フィルム 10を得た。該複数図柄光輝性フィ ルム 10は、全体厚さが略 21 μ mで、一方の面がホログラム、他方の面は回折格子に よる別個の光輝性図柄が、明るく観察することができた。  Except using PET film with thickness 6 / ζ πι as substrate 11A, 12 / zm thickness as substrate 11B, and using ionizing radiation curable resin composition B as a relief forming layer coating liquid In the same manner as in Example A1, a multi-pattern glitter film 10 was obtained. The multi-pattern glitter film 10 had an overall thickness of approximately 21 μm, and a bright surface with a separate glitter pattern on one side of the hologram and a diffraction grating on the other side could be observed brightly.
[0236] (実施例 A4)  [0236] (Example A4)
基材 11A及び基材 11Bのレリーフ形成層 15を形成する面へ、ポリエステル榭脂を グラビアリバースコーターで塗工し 100°Cで乾燥させて、厚さ 0. 5 μ mのプライマ層 1 3A及び 13Bを形成する以外は実施例 A1と同様にして、複数図柄光輝性フィルム 1 0を得た。該複数図柄光輝性フィルム 10は、全体厚さが略 15 /z mで、一方の面がホ ログラム、他方の面は回折格子による別個の透明な光輝性図柄が、明るく観察するこ とができ、かつ、層間が強固に接着しているので、剥離などが発生しにくぐ耐久性が 良好であった。  Polyester resin is applied with a gravure reverse coater on the surface of the base material 11A and the base material 11B where the relief forming layer 15 is formed, dried at 100 ° C, and a primer layer having a thickness of 0.5 μm 1 3A and A multi-pattern glitter film 10 was obtained in the same manner as in Example A1 except that 13B was formed. The multi-pattern glitter film 10 has an overall thickness of approximately 15 / zm, one surface is a hologram, and the other surface is brightly observed with a separate transparent glitter pattern by a diffraction grating. In addition, since the interlayers are firmly bonded, the durability that peeling hardly occurs is good.
[0237] (実施例 A5)  [0237] (Example A5)
基材 11A、 11Bとして、厚さ 16 mの PETフィルムを用いる以外は実施例 A1と同 様にして、複数図柄光輝性フィルム 10を得た。該複数図柄光輝性フィルム 10は、全 体厚さが略 35 mで、一方の面がホログラム、他方の面は回折格子による別個の透 明な光輝性図柄が、明るく観察することができた。  A multi-pattern glittering film 10 was obtained in the same manner as in Example A1, except that a PET film having a thickness of 16 m was used as the base materials 11A and 11B. The multi-pattern glitter film 10 had an overall thickness of approximately 35 m, and a bright and distinct glitter pattern with a diffraction grating on one surface could be observed brightly.
[0238] (実施例 A6)  [0238] (Example A6)
基材 11A及び 11Bとして、厚さ 50 μ mの PETフィルムを用い、プライマ層 13A及び 13Bの厚さを 1 μ mとし、レリーフ形成層 15A及び 15Bの厚さを 2 mとする実施例 A 1と同様にして、複数図柄光輝性フィルム 10を得た。該複数図柄光輝性フィルム 10 は、全体厚さが略 110 /z mで、一方の面がホログラム、他方の面は回折格子による別 個の透明な光輝性図柄が、明るく観察することができた。 Example A: A PET film having a thickness of 50 μm is used as the base material 11A and 11B, the thickness of the primer layers 13A and 13B is 1 μm, and the thickness of the relief forming layers 15A and 15B is 2 m. In the same manner as in Example 1, a multi-pattern glitter film 10 was obtained. The multi-pattern glitter film 10 had an overall thickness of approximately 110 / zm, and one surface could be brightly observed with a hologram and another surface with a separate glitter pattern with a diffraction grating.
[0239] (実施例 A7)  [0239] (Example A7)
実施例 A1で作製してぉ 、た、第 1の光輝性フィルムの第 1基材 11Aと第 2の光輝 性フィルムの第 2基材 11Bとを公知のドライラミ法で貼合する。第 1の光輝性フィルム の第 1基材 11A面へ、グラビアコート法で 2液硬化型ポリウレタン系接着剤を乾燥後 の厚さが 1. 5 /z mになるように塗布し乾燥した後に、第 2の光輝性フィルムの第 2基 材 11B面とを重ね合せて加圧し、その後 40°Cで 3日間放置して、複数図柄光輝性フ イルム 10を得た。該複数図柄光輝性フィルム 10は、全体厚さが略 15 mで、一方の 面がホログラム、他方の面は回折格子による別個の光輝性図柄が、明るく観察するこ とができ、該光輝性図柄は誰でも、しかも暗がりでも一見しただけで観察でき識別す ることができた。さらに、カラーコピー機でコピーしたところ、ホログラム特有の輝きはな ぐ複数図柄光輝性フィルムのホログラムとコピーとは全く異なり、一目で真贋が判断 できた。  After producing in Example A1, the first substrate 11A of the first glitter film and the second substrate 11B of the second glitter film are bonded by a known dry lamination method. After applying and drying the two-component curable polyurethane adhesive on the first substrate 11A surface of the first glittering film by gravure coating method so that the thickness after drying becomes 1.5 / zm, The second substrate 11B side of the glittering film 2 was pressed and pressed, and then allowed to stand at 40 ° C for 3 days to obtain a multi-pattern glittering film 10. The multi-pattern glitter film 10 has an overall thickness of approximately 15 m, and one surface has a hologram, and the other surface has a separate glitter pattern by a diffraction grating. Anyone can observe and identify at a glance even in the dark. Furthermore, when copied with a color copier, the hologram and copy of a multi-pattern glitter film without the unique brightness of the hologram were completely different, and the authenticity could be judged at a glance.
[0240] (実施例 A8)  [0240] (Example A8)
実施例 A1で作製してぉ 、た、第 1の光輝性フィルムの第 1基材 11Aと第 2の光輝 性フィルムの第 2基材 11Bとを公知のドライラミ法で貼合する。第 1の光輝性フィルム の第 1基材 11A面へ、グラビアコート法で 2液硬化型ポリウレタン系接着剤を乾燥後 の厚さが 1. 5 /z mになるように塗布し乾燥した後に、第 2の光輝性フィルムの反射層 17B面とを重ね合せて加圧し、その後 40°Cで 3日間放置して、複数図柄光輝性フィ ルム 10を得た。該複数図柄光輝性フィルム 10は、全体厚さが略 15 mで、一方の 面がホログラム、他方の面は回折格子による別個の光輝性図柄が、明るく観察するこ とができた。  After producing in Example A1, the first substrate 11A of the first glitter film and the second substrate 11B of the second glitter film are bonded by a known dry lamination method. After applying and drying the two-component curable polyurethane adhesive on the first substrate 11A surface of the first glittering film by gravure coating method so that the thickness after drying becomes 1.5 / zm, The reflective layer 17B surface of the glitter film 2 was overlaid and pressurized, and then allowed to stand at 40 ° C for 3 days to obtain a multi-pattern glitter film 10. The multi-pattern glittering film 10 had an overall thickness of approximately 15 m, and a bright surface with a separate glittering pattern formed by a diffraction grating on one surface could be observed brightly.
[0241] (実施例 A9)  [0241] (Example A9)
実施例 A1で作製してぉ ヽた第 1の光輝性フィルムを用いて、該光輝性フィルムの 反射層 17A面へ、前述の電離放射線硬化性榭脂組成物 Aをグラビアリバースコータ 一で塗工し 100°Cで乾燥させて、厚さ 1 μ mのレリーフ形成層 15Bを形成した。 [0242] 次に、該レリーフ形成層面へ、回折格子カゝら 2P法で複製したスタンパを複製装置 のエンボスローラーに貼着して、相対するローラーと間で加熱プレス（エンボス）して、 微細な凹凸パターン力 なるレリーフを賦形させた。賦形後直ちに、高圧水銀灯を用 いて紫外線を照射して硬化させた。レリーフ形成層 15Bのレリーフ面へ真空蒸着法 で厚さが 500nmのアルミニウム薄膜を形成して反射層 17Bとして、複数図柄光輝性 フィルム 10を得た。該複数図柄光輝性フィルム 10は、全体厚さが略 8 mで、一方 の面がホログラム、他方の面は回折格子による別個の光輝性図柄が、明るく観察す ることがでさた。 Using the first glitter film prepared and prepared in Example A1, the above-mentioned ionizing radiation curable resin composition A was applied to the reflective layer 17A surface of the glitter film with a gravure reverse coater. Then, it was dried at 100 ° C. to form a relief forming layer 15B having a thickness of 1 μm. [0242] Next, a stamper duplicated by the diffraction grating cover 2P method is attached to the relief forming layer surface to an embossing roller of a duplicating apparatus, and is heated and pressed (embossed) with an opposing roller. Relief that has an uneven pattern power was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 15B by a vacuum deposition method to obtain a multi-pattern glittering film 10 as the reflective layer 17B. The multi-design glitter film 10 had an overall thickness of approximately 8 m, and one surface could be brightly observed with a hologram on one surface and a separate glitter pattern on the other surface with a diffraction grating.
[0243] (実施例 A10)  [0243] (Example A10)
実施例 A1で作製してぉ ヽた第 1の光輝性フィルムを用いて、該光輝性フィルムの 第 1基材 11A面へ、前述の電離放射線硬化性榭脂組成物 Aをグラビアリバースコー ターで塗工し 100°Cで乾燥させて、厚さ 1 mのレリーフ形成層 15Bを形成した。次 に、該レリーフ形成層面へ、回折格子カゝら 2P法で複製したスタンパを複製装置のェ ンボスローラーに貼着して、相対するローラーと間で加熱プレス（エンボス）して、微細 な凹凸パターン力 なるレリーフを賦形させた。賦形後直ちに、高圧水銀灯を用いて 紫外線を照射して硬化させた。レリーフ形成層 15Bのレリーフ面へ真空蒸着法で厚 さが 500nmのアルミニウム薄膜を形成して反射層 17Bとして、複数図柄光輝性フィ ルム 10を得た。該複数図柄光輝性フィルム 10は、全体厚さが略 8 mで、一方の面 がホログラム、他方の面は回折格子による別個の光輝性図柄が、明るく観察すること ができた。  Using the first glittering film prepared and prepared in Example A1, the above-mentioned ionizing radiation curable resin composition A was applied to the first substrate 11A surface of the glittering film with a gravure reverse coater. It was applied and dried at 100 ° C. to form a relief forming layer 15B having a thickness of 1 m. Next, a stamper duplicated by 2P method on the surface of the relief forming layer is attached to the embossing roller of the duplicating apparatus, and heated and pressed (embossed) with the opposing roller to make fine Relief that has uneven pattern force was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 15B by vacuum vapor deposition to obtain a multi-pattern glittering film 10 as the reflective layer 17B. The multi-pattern glittering film 10 had an overall thickness of about 8 m, and a bright surface with a separate glittering pattern formed by a diffraction grating on one surface could be observed brightly.
[0244] (実施例 Al l)  [0244] (Example Al l)
実施例 A1で作製してぉ 、た第 1の光輝性フィルムと、実施例 A1で作製した第 2の 光輝性フィルムの反射層 17Bの上に、前述の電離放射線硬化性榭脂組成物 Aをグ ラビアリバースコーターで塗工し 100°Cで乾燥させて、厚さ 0. 5 μ mの保護層 25を形 成し、これらを用いて、第 1の光輝性フィルムの反射層 17Aと、第 2の光輝性フィルム の第 2基材 11Bとが対向するように、公知のドライラミ法で貼合する。第 1の光輝性フ イルムの反射層 17A面へ、グラビアコート法で 2液硬化型ポリウレタン系接着剤を乾 燥後の厚さが 1. 5 /z mになるように塗布し乾燥した後に、第 2の光輝性フィルムの第 2基材 1 IB面とを重ね合せて加圧し、その後 40°Cで 3日間放置して、複数図柄光輝 性フィルム 10を得た。該複数図柄光輝性フィルム 10は、全体厚さが略 15 mで、一 方の面がホログラム、他方の面は回折格子による別個の光輝性図柄が、明るく観察 することができた。尚、実施例 11で作製した光輝性フィルムは、反射層 17Bが表面に 露出せず、保護層 25で被覆され、耐久性がより向上していた。 On the reflective layer 17B of the first glittering film prepared in Example A1 and the second glittering film prepared in Example A1, the ionizing radiation curable resin composition A described above was applied. Coating with a gravure reverse coater and drying at 100 ° C to form a protective layer 25 having a thickness of 0.5 μm, and using these, the reflective layer 17A of the first glittering film and the first Bonding is performed by a known dry lamination method so that the second substrate 11B of the glitter film 2 is opposed. After applying a two-component curable polyurethane adhesive to the reflective layer 17A surface of the first glittering film by the gravure coating method so that the thickness after drying is 1.5 / zm, and drying it, 2nd glitter film (2) Substrate (1) The IB surface was superposed and pressurized, and then allowed to stand at 40 ° C for 3 days to obtain a multi-pattern glitter film 10. The multi-pattern glitter film 10 had an overall thickness of approximately 15 m, and a bright surface with a separate glitter pattern on one side of the hologram and a diffraction grating on the other side could be observed brightly. Note that the glittering film produced in Example 11 was covered with the protective layer 25 without the reflective layer 17B being exposed on the surface, and the durability was further improved.
[0245] (実施例 A12)  [0245] (Example A12)
実施例 A5で作製した全体厚さが略 35 μ mの複数図柄光輝性フィルム 10の第 2基 材 11Bと、基紙 101として使用する 100 /z mの PETフィルムの一面とが対向するよう に、公知のドライラミ法で貼合する。複数図柄光輝性フィルム 10の第 2基材 11B面へ 、グラビアコート法で 2液硬化型ポリウレタン系接着剤を乾燥後の厚さが 5 μ mになる ように塗布し乾燥した後に、 100 /z mの PETフィルムとを重ね合せて加圧し、その後 40°Cで 3日間放置して、光輝性複数図形性物 100を得た。該光輝性複数図柄形成 物 100は、全体厚さが略 140 mで、一方の面がホログラム、他方の面は回折格子 による別個の光輝性図柄が、明るく観察することができた。  The second substrate 11B of the multi-pattern glitter film 10 having an overall thickness of approximately 35 μm produced in Example A5 is opposed to one surface of the 100 / zm PET film used as the base paper 101. Bonding is performed by a known dry lamination method. After applying and drying a two-component curable polyurethane adhesive on the second substrate 11B surface of the multi-pattern glitter film 10 by gravure coating method to a thickness of 5 μm after drying, 100 / zm The PET film was overlaid and pressurized, and then allowed to stand at 40 ° C for 3 days to obtain a glittering multi-graphical material 100. The glittering multiple-pattern formed product 100 had an overall thickness of approximately 140 m, and a bright surface with a separate glittering pattern formed by a diffraction grating on one surface could be observed brightly.
[0246] 次に、図 8〜図 10を参照して、第 2の発明にかかわる本発明の実施例、比較例に ついて説明する。  [0246] Next, with reference to FIG. 8 to FIG. 10, examples and comparative examples of the present invention according to the second invention will be described.
[0247] (実施例 B1)  [0247] (Example B1)
(第 1の光輝性フィルムの作成）  (Creation of first glitter film)
基材 111 Aとして厚さ 6 μ mのルミラー 6CF53 (東レネ土製、 PETフィルム商品名）を 用いた。該基材 111 Aの一方の面へ、前述の電離放射線硬化性榭脂組成物 Bをダラ ビアリバースコーターで塗工し 100°Cで乾燥させて、厚さ 1 μ mのレリーフ形成層 115 Aを形成した。次に、該レリーフ形成層面へ、 2光束法によるレインボウホログラムから 2P法で複製したスタンパを複製装置のエンボスローラーに貼着して、相対するローラ 一と間で加熱プレス (エンボス）して、微細な凹凸パターン力 なるレリーフを賦形させ た。賦形後直ちに、高圧水銀灯を用いて紫外線を照射して硬化させた。レリーフ形成 層 115Aのレリーフ面へ真空蒸着法で厚さが 500nmのアルミニウム薄膜を形成して 反射層 117Aとした。  Lumirror 6CF53 (manufactured by Torayen clay, trade name of PET film) having a thickness of 6 μm was used as the substrate 111A. The above-mentioned ionizing radiation curable resin composition B is applied to one surface of the substrate 111 A with a Daravia reverse coater and dried at 100 ° C. to form a relief forming layer 115 A having a thickness of 1 μm. Formed. Next, a stamper duplicated by the 2P method from a rainbow hologram by the two-beam method is applied to the relief forming layer surface, and is applied to the embossing roller of the duplicating apparatus, and is heated and pressed (embossed) with one opposing roller. Relief with a strong uneven pattern force was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 115A by a vacuum deposition method to obtain a reflective layer 117A.
[0248] (第 2の光輝性フィルムの作成） 基材 11 IBとして厚さ 6 μ mのルミラー 6CF53 (東レネ土製、 PETフィルム商品名）を 用いた。該基材 111Bの一方の面へ、前述の電離放射線硬化性榭脂組成物 Bをダラ ビアリバースコーターで塗工し 100°Cで乾燥させて、厚さ 1 μ mのレリーフ形成層 115 Bを形成した。次に、該レリーフ形成層面へ、回折格子から 2P法で複製したスタンパ を複製装置のエンボスローラーに貼着して、相対するローラーと間で加熱プレス（ェ ンボス)して、微細な凹凸パターン力もなるレリーフを賦形させた。賦形後直ちに、高 圧水銀灯を用いて紫外線を照射して硬化させた。レリーフ形成層 115Bのレリーフ面 へ真空蒸着法で厚さが 500nmのアルミニウム薄膜を形成して反射層 117Bとした。 [0248] (Creation of second glittering film) Lumirror 6CF53 (product name: PET film trade name, manufactured by Torayne soil) having a thickness of 6 μm was used as the base material 11 IB. The ionizing radiation curable resin composition B described above is applied to one surface of the substrate 111B with a Daravia reverse coater and dried at 100 ° C. to form a relief forming layer 115 B having a thickness of 1 μm. Formed. Next, a stamper duplicated from the diffraction grating by the 2P method is stuck on the relief forming layer surface to the embossing roller of the duplicating apparatus, and is heated and pressed (embossed) with the opposing roller, so that the fine uneven pattern force is also reduced. A relief was formed. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 115B by a vacuum deposition method to obtain a reflective layer 117B.
[0249] (複数図柄光輝性スレッドの作成）  [0249] (Create multiple design glitter thread)
第 1の光輝性フィルムの反射層 117Aと第 2の光輝性フィルムの反射層 117Bとを公 知のドライラミ法で貼合する。第 1の光輝性フィルムの反射層 117A面へ、グラビアコ ート法で 2液硬化型ポリウレタン系接着剤を乾燥後の厚さが 1. 5 mになるように塗 布し乾燥した後に、第 2の光輝性フィルムの反射層 117B面とを重ね合せて加圧し、 その後 40°Cで 3日間放置した後に、精密マイクロスリツタ機で幅 1. 5mmにスリットし て、細幅のスレッドとして、実施例 B1の複数図柄光輝性スレッド 110を得た。  The reflective layer 117A of the first glitter film and the reflective layer 117B of the second glitter film are bonded together by a known dry lamination method. Apply a two-component curable polyurethane adhesive to the reflective layer 117A surface of the first glittering film by the gravure coating method so that the thickness after drying is 1.5 m. The reflective layer 117B surface of the glitter film of 2 is overlaid and pressurized, and then left to stand at 40 ° C for 3 days, then slit with a precision micro slitter machine to a width of 1.5 mm, as a narrow thread, The multi-design glitter thread 110 of Example B1 was obtained.
[0250] 該複数図柄光輝性スレッド 110は、全体厚さが略 15 μ mで、一方の面がホログラム 、他方の面は回折格子による別個の光輝性図柄が、明るく観察することができ、該光 輝性図柄は誰でも、しかも暗がりでも一見しただけで観察でき識別することができた。 さらに、カラーコピー機でコピーしたところ、ホログラム特有の輝きはなぐスレッドのホ ログラムとコピーとは全く異なり、一目で真贋が判断できた。  [0250] The multi-design glitter thread 110 has an overall thickness of approximately 15 μm, and one face can be a hologram, and the other face can be brightly observed with a distinct glitter pattern by a diffraction grating. The glitter pattern could be observed and identified by anyone at a glance even in the dark. In addition, when copied with a color copier, the holograms and the copy of the thread with the unique brightness of the hologram were completely different, and the authenticity could be judged at a glance.
[0251] (実施例 B2)  [0251] (Example B2)
基材 111A及び基材 111Bとして厚さ 4. 5 mの PETフィルムを用いる以外は、実 施例 B1と同様にして、複数図柄光輝性スレッド 110を得た。該複数図柄光輝性スレ ッド 110は、全体厚さが略 12 /z mで、一方の面がホログラム、他方の面は回折格子 による別個の光輝性図柄が明るく観察ができ、該光輝性図柄は誰でも、しかも暗がり でも一見しただけで観察でき識別することができた。さらに、カラーコピー機でコピー したところ、ホログラム特有の輝きはなぐスレッドのホログラムとコピーとは全く異なり、 一目で真贋が判断できた。 [0252] (実施例 B3) A multi-pattern glittering thread 110 was obtained in the same manner as in Example B1 except that a PET film having a thickness of 4.5 m was used as the base material 111A and the base material 111B. The multi-design glitter thread 110 has an overall thickness of approximately 12 / zm, and one surface is a hologram, and the other surface is brightly observable with a separate glitter pattern by a diffraction grating. Anyone, even in the dark, could observe and identify with a glance. Furthermore, when copying with a color copier, the hologram's unique brightness was completely different from the hologram and copy of the thread, and the authenticity could be judged at a glance. [0252] (Example B3)
基材 111A及び基材 11 IBとして厚さ 9 μ mの PETフィルムを用いる以外は、実施 例 B1と同様にして、複数図柄光輝性スレッド 110を得た。該複数図柄光輝性スレッド 110は、全体厚さが略 21 mで、一方の面がホログラム、他方の面は回折格子によ る別個の光輝性図柄が明るく観察ができ、該光輝性図柄は誰でも、しかも暗がりでも 一見しただけで観察でき識別することができた。さらに、カラーコピー機でコピーした ところ、ホログラム特有の輝きはなぐスレッドのホログラムとコピーとは全く異なり、一 目で真贋が判断できた。  A multi-pattern glittering thread 110 was obtained in the same manner as in Example B1, except that a PET film having a thickness of 9 μm was used as the base material 111A and the base material 11 IB. The multi-design glitter thread 110 has an overall thickness of approximately 21 m, and one surface can be observed as a hologram, and the other surface can be brightly observed as a separate glitter pattern using a diffraction grating. But even in the dark, I could observe and identify it at a glance. Furthermore, when copied with a color copier, the hologram's unique brightness was completely different from the hologram and copy of the thread, and the authenticity could be judged at a glance.
[0253] (実施例 B4)  [0253] (Example B4)
基材 111Aとして厚さ 6 μ mの PETフィルムを用い、基材 111Bとして  A 6 μm thick PET film was used as substrate 111A, and substrate 111B was used.
厚さ 12 /z mの PETフィルムを用いる以外は、実施例 B1と同様にして、複数図柄光輝 性スレッド 110を得た。該複数図柄光輝性スレッド 110は、全体厚さが略 21 mで、 一方の面がホログラム、他方の面は回折格子による別個の光輝性図柄が明るく観察 ができ、該光輝性図柄は誰でも、しかも暗がりでも一見しただけで観察でき識別する ことができた。さらに、カラーコピー機でコピーしたところ、ホログラム特有の輝きはなく 、スレッドのホログラムとコピーとは全く異なり、一目で真贋が判断できた。  Except for using a PET film having a thickness of 12 / z m, a multi-pattern glittering thread 110 was obtained in the same manner as in Example B1. The multi-design glitter thread 110 has an overall thickness of approximately 21 m, a hologram on one surface, and a separate glitter pattern with a diffraction grating can be brightly observed on the other surface. Moreover, even in the dark, it was possible to observe and identify with a glance. Furthermore, when copying with a color copier, there was no hologram-specific brightness, and the hologram and copy of the thread were completely different, and authenticity could be judged at a glance.
[0254] (実施例 B5)  [0254] (Example B5)
基材 111A及び基材 111Bとして厚さ 16 μ mの PETフィルムを用いる以外は、実施 例 B1と同様にして、複数図柄光輝性スレッドを得た。該複数図柄光輝性スレッド 110 は、全体厚さが略 35 mで、一方の面がホログラム、他方の面は回折格子による別 個の光輝性図柄が、明るく観察することができた。  A multi-pattern glitter thread was obtained in the same manner as in Example B1, except that a PET film having a thickness of 16 μm was used as the base material 111A and the base material 111B. The multi-design glitter thread 110 had an overall thickness of approximately 35 m, and one surface could be a hologram, and the other surface could be brightly observed with another glitter pattern made of a diffraction grating.
[0255] (参考例 B1)  [0255] (Reference Example B1)
基材 111A及び基材 111Bとして厚さ 25 μ mの PETフィルムを用いる以外は、実施 例 B1と同様にして、複数図柄光輝性スレッドを得た。  A multi-pattern glitter thread was obtained in the same manner as in Example B1 except that a PET film having a thickness of 25 μm was used as the base material 111A and the base material 111B.
[0256] (実施例 B6)  [0256] (Example B6)
反射層 117Aとして、スパッタリング法で厚さが lOOnmの酸ィ匕チタン薄膜を形成を 用いる以外は、実施例 B1と同様にして、複数図柄光輝性スレッド 110を得た。該複 数図柄光輝性スレッド 110は、全体厚さが略 15 mで、一方の面が回折格子による 光輝性図柄とホログラム図柄が、他方の面は回折格子による別個の透明な光輝性図 柄が、明るく観察することができた。さらに、カラーコピー機でコピーしたところ、一方 のログラム特有の輝きはなぐスレッドのホログラムとコピーとは全く異なり、他方の回 折格子も特有の輝きがなぐ両側の面ともに一目で真贋が判断できた。 A multi-pattern glittering thread 110 was obtained in the same manner as in Example B1, except that a sputtering method was used to form a titanium oxide thin film having a thickness of lOOnm as the reflective layer 117A. The multi-pattern glitter thread 110 has an overall thickness of approximately 15 m, and one surface is formed by a diffraction grating. A bright and holographic pattern was observed, and the other surface was brightly observed with a separate transparent glitter pattern with a diffraction grating. Furthermore, when copying with a color copier, one of the holograms and copies of the thread with the unique brightness of one program was completely different, and the other side of the grating with the unique brightness of the other grating could be judged at a glance. .
[0257] (実施例 B7)  [0257] (Example B7)
レリーフ形成層 115A、 115Bの各塗工液として、前述の電離放射線硬化性榭脂組 成物 Aを用いる以外は、実施例 B1と同様にして、複数図柄光輝性スレッド 110を得 た。該複数図柄光輝性スレッド 110は、全体厚さが略 15 /z mで、一方の面がホロダラ ム、他方の面は回折格子による別個の光輝性図柄が、明るく観察することができた。  A plurality of design glitter threads 110 was obtained in the same manner as in Example B1, except that the ionizing radiation-curable resin composition A was used as the coating liquid for the relief forming layers 115A and 115B. The multi-design glitter thread 110 had an overall thickness of approximately 15 / z m, and a bright glitter pattern could be observed brightly on one side and a diffraction grating on the other side.
[0258] (実施例 B8)  [0258] (Example B8)
基材 111A及び基材 111Bのレリーフ形成層 115を形成する面へ、ポリエステル榭 脂をグラビアリバースコーターで塗工し 100°Cで乾燥させて、厚さ 0. 5 μ mの層間プ ライマ層 113A及び 113Bを形成する以外は実施例 B1と同様にして、複数図柄光輝 性スレッド 110を得た。該複数図柄光輝性スレッド 110は、全体厚さが略 16 mで、 一方の面がホログラム、他方の面は回折格子による別個の透明な光輝性図柄が、明 るく観察することができ、かつ、層間が強固に接着しているので、剥離などが発生しに くぐ耐久性が良好であった。  Polyester resin is applied to the surface on which the relief forming layer 115 of the base material 111A and the base material 111B is to be formed with a gravure reverse coater, and dried at 100 ° C, and an interlayer primer layer 113A having a thickness of 0.5 μm. And 113B were formed in the same manner as in Example B1 to obtain a multi-design glittering thread 110. The multi-design glitter thread 110 has an overall thickness of approximately 16 m, a hologram on one surface, and a separate transparent glitter pattern with a diffraction grating can be clearly observed on the other surface, and In addition, since the interlayers are firmly bonded, the durability that peeling hardly occurs is good.
[0259] (実施例 B9)  [0259] (Example B9)
基材 111A及び基材 111Bのレリーフ形成層 115を形成する面へ、ポリエステル榭 脂をグラビアリバースコーターで塗工し 100°Cで乾燥させて、厚さ 0. 5 μ mの層間プ ライマ層 113A及び 113Bを形成する以外は実施例 B2と同様にして、複数図柄光輝 性スレッド 110を得た。該複数図柄光輝性スレッド 110は、全体厚さが略 13 mで、 一方の面がホログラム、他方の面は回折格子による別個の透明な光輝性図柄が、明 るく観察することができ、かつ、層間が強固に接着しているので、剥離などが発生しに くぐ耐久性が良好であった。  Polyester resin is applied to the surface on which the relief forming layer 115 of the base material 111A and the base material 111B is to be formed with a gravure reverse coater, and dried at 100 ° C, and an interlayer primer layer 113A having a thickness of 0.5 μm. And 113B were formed in the same manner as in Example B2 to obtain a multi-design glitter thread 110. The multi-design glitter thread 110 has an overall thickness of approximately 13 m, a hologram on one surface, and a separate transparent glitter pattern with a diffraction grating can be clearly observed on the other surface, and In addition, since the interlayers are firmly bonded, the durability that peeling hardly occurs is good.
[0260] (実施例 B 10)  [0260] (Example B 10)
実施例 B1で作製してぉ 、た、第 1の光輝性フィルムの第 1基材 111Aと第 2の光輝 性フィルムの第 2基材 111Bとを公知のドライラミ法で貼合する。第 1の光輝性フィルム の第 1基材 111A面へ、グラビアコート法で 2液硬化型ポリウレタン系接着剤を乾燥後 の厚さが 1. 5 /z mになるように塗布し乾燥した後に、第 2の光輝性フィルムの第 2基 材 111B面とを重ね合せて加圧し、その後 40°Cで 3日間放置した後に、精密マイクロ スリツタ機で幅 1. 5mmにスリットして、細幅のスレッドとして、実施例 B10の複数図柄 光輝性スレッド 110を得た。該複数図柄光輝性スレッド 110は、全体厚さが略 15 /z m で、一方の面がホログラム、他方の面は回折格子による別個の光輝性図柄が、明るく 観察することができ、該光輝性図柄は誰でも、しかも暗がりでも一見しただけで観察 でき識別することができた。さらに、カラーコピー機でコピーしたところ、ホログラム特 有の輝きはなぐ複数図柄光輝性フィルムのホログラムとコピーとは全く異なり、一目 で真贋が判断できた。 After producing in Example B1, the first substrate 111A of the first glittering film and the second substrate 111B of the second glittering film are bonded by a known dry lamination method. 1st glitter film After applying a two-component curable polyurethane adhesive to the surface of the first substrate 111A using a gravure coating method to a thickness of 1.5 / zm after drying, the second glittering film The second substrate 111B surface was overlaid and pressurized, then left at 40 ° C for 3 days, then slit with a precision micro slitter machine to a width of 1.5 mm to form a narrow thread. A glittering thread 110 was obtained. The multi-design glitter thread 110 has an overall thickness of approximately 15 / zm, and one surface has a hologram and the other surface can be brightly observed with a separate glitter pattern by a diffraction grating. Anyone can observe and identify at a glance even in the dark. Furthermore, when copying with a color copier, the holograms and copies of the multi-pattern glitter film, which lacks the unique brightness of the hologram, were completely different, and the authenticity could be judged at a glance.
[0261] (実施例 B11)  [0261] (Example B11)
実施例 B1で作製してぉ 、た第 1の光輝性フィルムと、実施例 B1で作製した第 2の 光輝性フィルムの反射層 17Bの上に、前述の電離放射線硬化性榭脂組成物 Aをグ ラビアリバースコーターで塗工し 100°Cで乾燥させて、厚さ 0. 5 μ mの保護層 25を形 成し、これらを用いて、第 1の光輝性フィルムの反射層 17Aと、第 2の光輝性フィルム の第 2基材 11Bとが対向するように、公知のドライラミ法で貼合する。第 1の光輝性フ イルムの反射層 17A面へ、グラビアコート法で 2液硬化型ポリウレタン系接着剤を乾 燥後の厚さが 1. 5 /z mになるように塗布し乾燥した後に、第 2の光輝性フィルムの第 2基材 11B面とを重ね合せて加圧し、その後 40°Cで 3日間放置した後に、精密マイク ロスリツタ機で幅 1. 5mmにスリットして、細幅のスレッドとして、実施例 11の複数図柄 光輝性スレッド 10を得た。該複数図柄光輝性スレッド 10は、全体厚さが略 15 mで 、一方の面がホログラム、他方の面は回折格子による別個の光輝性図柄が、明るく観 察することができた。  On the reflective layer 17B of the first glittering film prepared in Example B1 and the second glittering film prepared in Example B1, the above-mentioned ionizing radiation curable resin composition A was applied. Coating with a gravure reverse coater and drying at 100 ° C to form a protective layer 25 having a thickness of 0.5 μm, and using these, the reflective layer 17A of the first glittering film and the first Bonding is performed by a known dry lamination method so that the second substrate 11B of the glitter film 2 is opposed. After applying a two-component curable polyurethane adhesive to the reflective layer 17A surface of the first glittering film by the gravure coating method so that the thickness after drying is 1.5 / zm, and drying it, The second substrate 11B surface of the glitter film of 2 is overlaid and pressurized, then left at 40 ° C for 3 days, then slit with a precision microphone loss slitter to a width of 1.5 mm to form a narrow thread Thus, the multi-design glitter thread 10 of Example 11 was obtained. The multi-design glitter thread 10 had an overall thickness of approximately 15 m, and a bright glitter pattern on one side of the hologram and a bright grating on the other side could be observed.
[0262] (実施例 B 12)  [0262] (Example B 12)
実施例 B1で作製してぉ 、た第 1の光輝性フィルムを用いて、該光輝性フィルムの 第 1基材 111A面へ、前述の電離放射線硬化性榭脂組成物 Aをグラビアリバースコ 一ターで塗工し 100°Cで乾燥させて、厚さ 1 mのレリーフ形成層 115Bを形成した。 次に、該レリーフ形成層面へ、回折格子カゝら 2P法で複製したスタンパを複製装置の エンボスローラーに貼着して、相対するローラーと間で加熱プレス (エンボス）して、微 細な凹凸パターン力 なるレリーフを賦形させた。賦形後直ちに、高圧水銀灯を用い て紫外線を照射して硬化させた。レリーフ形成層 115Bのレリーフ面へ真空蒸着法で 厚さが 500nmのアルミニウム薄膜を形成して反射層 117Bとして、複数図柄光輝性 フィルムを作製し、精密マイクロスリツタ機で幅 1. 5mmにスリットして、細幅のスレッド として、実施例 B12の複数図柄光輝性スレッド 110を得た。該複数図柄光輝性スレツ ド 110は、全体厚さが略 8 μ mで、一方の面がホログラム、他方の面は回折格子によ る別個の光輝性図柄が、明るく観察することができた。 Using the first glittering film prepared in Example B1, the above-mentioned ionizing radiation curable resin composition A was applied to the surface of the first substrate 111A of the glittering film with a gravure reverse coater. Then, it was dried at 100 ° C. to form a relief forming layer 115B having a thickness of 1 m. Next, a stamper copied by the diffraction grating mirror 2P method is applied to the surface of the relief forming layer. It was attached to an embossing roller and heated and pressed (embossed) with an opposing roller to form a relief with a fine uneven pattern force. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. A 500 nm thick aluminum thin film is formed on the relief surface of the relief forming layer 115B by vacuum deposition to produce a multi-pattern glitter film as the reflective layer 117B, and slit to a width of 1.5 mm with a precision micro slitter machine. As a result, a multi-pattern glittering thread 110 of Example B12 was obtained as a narrow thread. The multi-design glitter thread 110 had an overall thickness of approximately 8 μm, and a bright glitter pattern with a diffraction grating on one surface could be observed brightly on one surface.
[0263] (実施例 B 13)  [0263] (Example B 13)
実施例 B1で作製してぉ 、た第 1の光輝性フィルムを用いて、該光輝性フィルムの 反射層 117A面へ、前述の電離放射線硬化性榭脂組成物 Aをグラビアリバースコー ターで塗工し 100°Cで乾燥させて、厚さ 1 mのレリーフ形成層 115Bを形成した。次 に、該レリーフ形成層面へ、回折格子カゝら 2P法で複製したスタンパを複製装置のェ ンボスローラーに貼着して、相対するローラーと間で加熱プレス（エンボス）して、微細 な凹凸パターン力 なるレリーフを賦形させた。賦形後直ちに、高圧水銀灯を用いて 紫外線を照射して硬化させた。レリーフ形成層 115Bのレリーフ面へ真空蒸着法で厚 さが 500nmのアルミニウム薄膜を形成して反射層 117Bとして、複数図柄光輝性フィ ルムを作製し、精密マイクロスリツタ機で幅 1. 5mmにスリットして、細幅のスレッドとし て、実施例 B13の複数図柄光輝性スレッド 10を得た。該複数図柄光輝性スレッド 11 0は、全体厚さが略 8 /z mで、一方の面がホログラム、他方の面は回折格子による別 個の光輝性図柄が、明るく観察することができた。  Using the first glittering film prepared in Example B1, the ionizing radiation curable resin composition A was applied to the reflective layer 117A surface of the glittering film with a gravure reverse coater. Then, it was dried at 100 ° C. to form a relief forming layer 115B having a thickness of 1 m. Next, a stamper duplicated by 2P method on the surface of the relief forming layer is attached to the embossing roller of the duplicating apparatus, and heated and pressed (embossed) with the opposing roller to make fine Relief that has uneven pattern force was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. A 500 nm thick aluminum thin film is formed on the relief surface of the relief forming layer 115B by vacuum deposition to produce a multi-pattern glitter film as the reflective layer 117B, and slit to a width of 1.5 mm with a precision micro slitter machine. As a result, a multi-design glittering thread 10 of Example B13 was obtained as a narrow thread. The multi-design glitter thread 110 had an overall thickness of about 8 / zm, and one surface could be a bright image with one surface being a hologram and the other surface being a diffraction grating.
[0264] (実施例 B 14)  [0264] (Example B 14)
実施例 B13で作製した複数図柄光輝性スレッドを用いて、反射層 117B面へ、ダラ ビアコート法で 2液硬化型ポリウレタン系接着剤を乾燥後の厚さが 1. 5 mになるよう に塗布し乾燥した後に、保護基材 30として厚さ 6 μ mのルミラー 6CF53 (東レネ土製、 PETフィルム商品名）を用い、その保護基材 30と前記のウレタン系接着剤の接着層 とを重ね合せて加圧し、その後 40°Cで 3日間放置した後に、精密マイクロスリツタ機 で幅 1. 5mmにスリットして、細幅のスレッドとして、実施例 B 14の複数図柄光輝性ス レッド 110を得た。該複数図柄光輝性スレッド 110は、全体厚さが略 8 mで、一方の 面がホログラム、他方の面は回折格子による別個の光輝性図柄が、明るく観察するこ とができた。また、このスレッドは、第 2支持基材が保護基材としてはたらき、反射層 1 17Bが被覆されて 、るので、耐久性が良好である。 Using the multi-pattern glitter thread produced in Example B13, apply a two-component curable polyurethane adhesive to the reflective layer 117B surface by the dry via coating method so that the thickness after drying is 1.5 m. After drying, using Lumirror 6CF53 (product name: PET film product), 6 μm thick as the protective substrate 30, the protective substrate 30 and the adhesive layer of the urethane adhesive are overlapped. After pressurizing and leaving at 40 ° C for 3 days, slitting to a width of 1.5 mm with a precision micro slitter machine, and making it a narrow thread, the multiple design glittering thread of Example B 14 Red 110 was obtained. The multi-design glitter thread 110 had an overall thickness of approximately 8 m, and a bright glitter pattern could be observed brightly on one side of the hologram and on the other side of the diffraction grating. Further, this thread has good durability because the second support base material acts as a protective base material and the reflective layer 117B is coated.
[0265] (実施例 B15〜： B27)  [0265] (Examples B15 to B27)
実施例 Bl〜14で得られた複数図柄光輝性スレッド 110を紙料へ抄き込む。 NBK P20質量部、 LBKP80質量部を叩解し、白土 10質量部、紙力増強剤 0. 3質量部、 サイズ剤 1. 0質量部、硫酸バンドを適量加えて、紙料を調製した。該紙料を用いて、 2槽式円網抄紙機で抄紙速度 50mZ分で 2層抄合わせる。この際に、上記で製造し たスレッドをホログラム面を表面にして所定の位置に流した。次いで、公知の一般的 な方法に従い湿紙を脱水し、ドライヤーで乾燥することで、スレッドは基紙 101へ接 着し、本発明の光輝性複数図柄形成物 100である偽造防止用紙を製造した。  The multi-design glittering thread 110 obtained in Examples Bl to 14 is incorporated into the stock. NBK P20 parts by mass and LBKP80 parts by mass were beaten, and 10 parts by mass of white clay, 0.3 part by mass of paper strength enhancer, 1.0 part by mass of sizing agent, and an appropriate amount of sulfuric acid band were added to prepare a stock. Using the stock, two layers are combined with a two-tank circular paper machine at a papermaking speed of 50 mZ. At this time, the thread produced as described above was flowed to a predetermined position with the hologram surface as the surface. Next, the wet paper was dehydrated according to a known general method and dried with a dryer, so that the thread was attached to the base paper 101, and the anti-counterfeit paper which is the glittering multi-pattern formation 100 of the present invention was manufactured. .
[0266] 得られた偽造防止用紙は、スレッドの表面は露出した状態で、用紙の流れ方向にス レッドが基紙層へ埋設されて!、た。該偽造防止用紙のスレッド表面はホログラムが視 認でき、またスレッドを無理に剥離したところ、実施例 B1〜B 14で作製した複数図柄 光輝性スレッド 110を用いたものは、裏面に回折格子が視認でき、両面で異なる光輝 性図柄が明確に観察できた。さらに、カラーコピー機でコピーしたところ、一方のホロ グラム特有の輝きはなぐスレッドのホログラムとコピーとは全く異なり、他方の回折格 子も特有の輝きがなぐ両側の面ともに一目で真贋が判断できた。尚、実施例 B11で 作製したスレッドを用いた偽造防止用紙は、反射層 117Bが表面に露出せず、保護 層 125で被覆され、耐久性がより向上していた。また、このスレッドは、第 2支持基材 が保護基材としてはたらき、耐久性が良好である。  [0266] The obtained anti-counterfeit paper had a thread embedded in the base paper layer in the paper flow direction with the thread surface exposed! Holograms can be seen on the thread surface of the anti-counterfeit paper, and when the thread is forcibly peeled off, the diffraction grating is visually recognized on the back surface of the multi-pattern glitter thread 110 produced in Examples B1 to B14. It was possible to clearly observe different glitter patterns on both sides. In addition, when copying with a color copier, the hologram and copy of the thread that has the unique brightness of one hologram are completely different, and the other diffraction grating also has a unique brightness and both sides can be judged at a glance. It was. In the anti-counterfeit paper using the thread produced in Example B11, the reflective layer 117B was not exposed on the surface but was covered with the protective layer 125, and the durability was further improved. In addition, this thread has good durability because the second support base material acts as a protective base material.
[0267] (実施例 B28)  [0267] (Example B28)
実施例 B1で得られた複数図柄光輝性スレッド 110を紙料へ抄き込むが、スレッドの 表面が露出し、かつ、スレッドの裏面の紙料が流れ方向に濃淡になるようにする以外 は、実施例 B15と同様にして、光輝性複数図柄形成物 100である偽造防止用紙を製 造した。得られた偽造防止用紙は、スレッド表面はホログラムが視認でき、また裏面に 薄い紙料部分力もは光輝性の回折格子が視認でき、両面で異なる光輝性図柄が明 確に観察できた。 Incorporate the multi-design glitter thread 110 obtained in Example B1 into the stock, except that the surface of the thread is exposed and the stock on the back of the thread is shaded in the flow direction. In the same manner as in Example B15, anti-counterfeit paper, which is a glittering multiple-pattern formation 100, was produced. The obtained anti-counterfeit paper has a hologram on the thread surface, and a thin part of the material on the back with a glittering diffraction grating. I was able to observe exactly.
[0268] (比較例 B1)  [0268] (Comparative Example B1)
参考例 B1で得られた複数図柄光輝性スレッドを、実施例 B10と同様にして、光輝 性複数図柄形成物である偽造防止用紙を製造した。該偽造防止用紙の卷取りでは スレッド部分がコブ状となり、該コブ力 シヮが発生してしまった。またスレッド部分が 盛り上がって偽造防止用紙としての一体感に欠けるものであった。  The anti-counterfeit paper, which is a multi-design glittering product, was produced using the multi-design glitter thread obtained in Reference Example B1 in the same manner as in Example B10. When the anti-counterfeit paper is scraped, the thread portion has a hump shape, and the hump force is generated. In addition, the thread portion swelled and lacked a sense of unity as anti-counterfeit paper.
[0269] 以下、実施例及び比較例により、第 3の発明に係る本発明を詳細に説明するが、本 発明はこれに限定されるものではない。また、以下の実施例では、表裏からの視認状 況を説明しやすいようネガパターン、ポジパターンの明確な文字列「abc」、「xyz」等 の文字を引用したが、どちらのパターンが視認されようとも、表裏から目視した際、 2 種以上の図柄が視認できれば本発明の範囲内である。  [0269] Hereinafter, the present invention according to the third invention will be described in detail with reference to Examples and Comparative Examples, but the present invention is not limited thereto. Also, in the following examples, characters such as negative patterns and clear character strings “abc”, “xyz”, etc., are quoted in order to make it easy to explain the visual recognition status from the front and back. In fact, it is within the scope of the present invention if two or more kinds of symbols are visible when viewed from the front and back.
[0270] (実施例 C1)  [0270] (Example C1)
(電離放射線硬化性榭脂組成物 Bの作製）  (Preparation of ionizing radiation curable resin composition B)
まず、反応性生物 (A)は以下の手順で、生成した。撹拌機、還流冷却器、滴下漏 斗及び温度計を取り付けた反応器に、酢酸ェチル 206. lg及びイソホロンジイソシァ ネートの三量体（HULS社製品、 VESTANAT T1890、融点 110°C) 133. 5gを仕 込み、 80°Cに昇温して溶解させた。溶液中に空気を吹き込んだのち、ハイドロキノン モノメチルエーテル 0. 38g、ペンタエリスリトールトリアタリレート（大阪有機化学工業 社製品、ビスコート 300) 249. 3g及びジブチル錫ジラウレート 0. 38gを仕込んだ。 8 0°Cで 5時間反応させたのち酢酸ェチル 688. 9gを添加して冷却した。得られた反応 生成液は赤外吸収スペクトル分析の結果、イソシァネート基の吸収が消滅して 、るこ とを確認した。反応生成液力も酢酸ェチルを留去したものの軟ィ匕温度は 43°Cであつ た。  First, the reactive organism (A) was produced by the following procedure. A reactor equipped with a stirrer, reflux condenser, dropping funnel and thermometer, was equipped with 206.lg of ethyl acetate and isophorone diisocyanate trimer (HULS product, VESTANAT T1890, melting point 110 ° C) 133. 5 g was charged and heated to 80 ° C. to dissolve. After blowing air into the solution, 0.38 g of hydroquinone monomethyl ether, 249.3 g of pentaerythritol tritalylate (product of Osaka Organic Chemical Industry Co., Ltd., Biscoat 300) and 0.38 g of dibutyltin dilaurate were charged. After reacting at 80 ° C. for 5 hours, 688.9 g of ethyl acetate was added and cooled. As a result of infrared absorption spectrum analysis, it was confirmed that absorption of the isocyanate group disappeared and the obtained reaction product liquid was eliminated. As for the reaction product liquid power, although the ethyl acetate was distilled off, the soft temperature was 43 ° C.
[0271] 該反応生成物 (A)と、造膜性榭脂、光重合開始剤、及び溶媒から下記の組成で添 加して電離放射線硬化性榭脂組成物 Bを調製した。  [0271] An ionizing radiation-curable resin composition B was prepared by adding the reaction product (A), a film-forming resin, a photopolymerization initiator, and a solvent in the following composition.
[0272] く電離放射線硬化性榭脂組成物 M>  [0272] Ionizing radiation curable resin composition M>
反応性生物 (A) 24重量部  Reactive organism (A) 24 parts by weight
造膜性榭脂 (メタクリル榭脂:クラレ社製品 ノ ラペット GF) 6重量部 光重合開始剤 (ィルガキュア 184) 0. 9重量部 Film-forming resin (methacrylic resin: Kuraray product Norapet GF) 6 parts by weight Photopolymerization initiator (Irgacure 184) 0.9 parts by weight
酢酸ェチル 70重量部  70 parts by weight of ethyl acetate
基材 311として厚さ 6 μ mのルミラー 6CF53 (東レネ土製、 PETフィルム商品名）を用 いた。該基材 311の一方の面へ、前述の電離放射線硬化性榭脂組成物 Mをグラビ ァリバースコーターで塗工し 100°Cで乾燥させて、厚さ 1 mのレリーフ形成層 315A を形成した。次に、該レリーフ形成層面へ、 2光束法によるレインボウホログラム (柄 1 : 文字列「abc」の繰り返しパターン)から 2P法で複製したスタンパを複製装置のェンボ スローラーに貼着して、相対するローラーと間で加熱プレス（エンボス）して、微細な 凹凸パターン力 なるレリーフを賦形させた。賦形後直ちに、高圧水銀灯を用いて紫 外線を照射して硬化させた。レリーフ形成層 315Aのレリーフ面へ真空蒸着法で厚さ が 500nmのアルミニウム薄膜を形成して金属薄膜層 317Aとした。  Lumirror 6CF53 (manufactured by Torayen clay, trade name of PET film) having a thickness of 6 μm was used as the base material 311. The above-mentioned ionizing radiation curable resin composition M was applied to one surface of the substrate 311 with a gravure reverse coater and dried at 100 ° C. to form a relief forming layer 315A having a thickness of 1 m. . Next, a stamper duplicated by the 2P method from the rainbow hologram (pattern 1: repeated pattern of the character string “abc”) by the two-beam method is attached to the relief forming layer surface to the emboss roller of the duplicating apparatus, and the opposite roller. A relief with a fine concavo-convex pattern was formed by hot pressing (embossing). Immediately after shaping, it was cured by irradiating ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 315A by a vacuum deposition method to obtain a metal thin film layer 317A.
[0273] 該金属薄膜層 317A面へ、バイロン 200 (東洋紡績 (株)社製、ポリエステル榭脂商 品名）をグラビアリバースコーターで塗工し 100°Cで乾燥させて、厚さ 0. 5 μ mの層 間プライマ層 321Bを形成し、該層間プライマ層 321B面へさらに、前述の電離放射 線硬化性榭脂組成物 Mをグラビアリバースコーターで塗工し 100°Cで乾燥させて、 厚さ: mのレリーフ形成層 315Bを形成した。次に、該レリーフ形成層面へ、 2光束 法によるレインボウホログラム（柄 2：文字列「xyz」の繰り返しパターン)から 2P法で複 製したスタンパを複製装置のエンボスローラーに貼着して、相対するローラーと間で 加熱プレス (エンボス）して、微細な凹凸パターン力 なるレリーフを賦形させた。賦形 後直ちに、高圧水銀灯を用いて紫外線を照射して硬化させた。レリーフ形成層 315B のレリーフ面へ真空蒸着法で厚さが 500nmのアルミニウム薄膜 (金属薄膜層 317B) とした。このようにして、実施例 C1の光輝性フィルム 310を得た。 [0273] Byron 200 (polyester resin product name, manufactured by Toyobo Co., Ltd.) was applied to the 317A surface of the metal thin film layer with a gravure reverse coater and dried at 100 ° C to a thickness of 0.5 μm. The interlaminar primer layer 321B is formed, and the surface of the interlayer primer layer 321B is further coated with the above-mentioned ionizing radiation curable resin composition M with a gravure reverse coater and dried at 100 ° C to obtain a thickness. : m relief forming layer 315B was formed. Next, a stamper duplicated by the 2P method from the rainbow hologram (pattern 2: repeated pattern of the character string “xyz”) by the two-beam method is attached to the relief forming layer surface to the embossing roller of the duplicating device and opposed. Heat relief (embossing) was performed between the rollers to form a relief with a fine uneven pattern force. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film (metal thin film layer 317B) having a thickness of 500 nm was formed on the relief surface of the relief forming layer 315B by vacuum deposition. Thus, the glittering film 310 of Example C1 was obtained.
[0274] (実施例 C2) [0274] (Example C2)
基材として、 12 mの PETフィルムを用いる以外は、実施例 C1と同様にして、光輝 性フィルム 310を得た。  A glittering film 310 was obtained in the same manner as in Example C1, except that a 12-m PET film was used as the substrate.
[0275] (実施例 C3) [0275] (Example C3)
基材として、 16 mの PETフィルムを用いる以外は、実施例 C1と同様にして、光輝 性フィルム 310を得た。 [0276] (実施例 C4) A glittering film 310 was obtained in the same manner as in Example C1, except that a 16 m PET film was used as the substrate. [0276] (Example C4)
電離放射線硬化性榭脂組成物として、電離放射線硬化性榭脂組成物 Aを用いる 以外は、実施例 C1と同様にして、光輝性フィルム 310を得た。  A glittering film 310 was obtained in the same manner as in Example C1, except that the ionizing radiation curable resin composition A was used as the ionizing radiation curable resin composition.
[0277] (実施例 C5) [0277] (Example C5)
基材として、 12 mの PETフィルムを用いる以外は、実施例 C4と同様にして、光輝 性フィルム 310を得た。  A glittering film 310 was obtained in the same manner as in Example C4, except that a 12 m PET film was used as the substrate.
[0278] (実施例 C6) [0278] (Example C6)
電離放射線硬化性榭脂組成物として、基材として 16 mの PETフィルムを用いる以 外は、実施例 C4と同様にして、光輝性フィルム 310を得た。  As the ionizing radiation curable resin composition, a glittering film 310 was obtained in the same manner as in Example C4, except that a 16 m PET film was used as the substrate.
[0279] (実施例 C7) [0279] (Example C7)
実施例 C 1の光輝性フィルム 310の金属薄膜層 317B面へ前述の電離放射線硬化 性榭脂組成物 Aをグラビアリバースコーターで塗工し、 100°Cで乾燥させて、厚さ 0. 5 μ mの保護層 325を形成した。  Example C 1 Metallic thin film layer 310 of the glittering film 310 The above-mentioned ionizing radiation curable resin composition A was applied to the 317B surface with a gravure reverse coater, dried at 100 ° C, and a thickness of 0.5 μm. m protective layer 325 was formed.
[0280] (実施例 C8) [0280] (Example C8)
実施例 C 1の光輝性フィルム 310の金属薄膜層 317B面へグラビアコ一ト法で 2液 硬化型ポリウレタン系接着剤を乾燥後の厚さが 1. 5 mになるように塗布し乾燥した 後に、基材 301として厚さ 6 mのルミラー 6CF53 (東レネ土製、 PETフィルム商品名） を用い、基材 301と前記のポリウレタン系接着剤とを重ね合わせて加圧し、その後 40 °Cで 3日間放置し、実施例 C8の光輝性フィルムを得た。  Example C 1 After coating and drying a two-component curable polyurethane adhesive on the 317B surface with a gravure coat method so that the thickness after drying is 1.5 m. , Using Lumirror 6CF53 (product name: PET film product made by Torayen clay) with a thickness of 6 m as the base material 301, the base material 301 and the polyurethane adhesive were overlapped and pressurized, and then at 40 ° C for 3 days This was allowed to stand to obtain a glittering film of Example C8.
[0281] (評価） [0281] (Evaluation)
実施例 C1〜C8の光輝性フィルム 310を基材 (PETフィルム)越しに観察すると、 Vヽ ずれも、図 22のように、文字列「abc」の繰り返しパターン（ポジパターン）が観察され た。また、その反対側から観察すると文字列「xyz」の繰り返しパターン (ポジパターン )が観察された。版取られもなぐ良好な複製品が得られた。  When the glitter films 310 of Examples C1 to C8 were observed through the base material (PET film), a repetitive pattern (positive pattern) of the character string “abc” was observed as shown in FIG. When observed from the opposite side, a repeated pattern (positive pattern) of the character string “xyz” was observed. A good reproduction that could not be taken off was obtained.
[0282] (実施例 C9) [0282] (Example C9)
基材 311として厚さ 6 μ mのルミラー 6CF53 (東レネ土製、 PETフィルム商品名）を用 いた。該基材 311の一方の面へ、前述の電離放射線硬化性榭脂組成物 Bをグラビア リバースコーターで塗工し 100°Cで乾燥させて、厚さ 1 mのレリーフ形成層 315Aを 形成した。次に、該レリーフ形成層面へ、 2光束法によるレインボウホログラム (柄 1 : 文字列「abc」の繰り返しパターン)から 2P法で複製したスタンパを複製装置のェンボ スローラーに貼着して、相対するローラーと間で加熱プレス（エンボス）して、微細な 凹凸パターン力 なるレリーフを賦形させた。賦形後直ちに、高圧水銀灯を用いて紫 外線を照射して硬化させた。レリーフ形成層 315Aのレリーフ面へ真空蒸着法で厚さ が 500nmのアルミニウム薄膜を形成して金属薄膜層 317Aとした。 Lumirror 6CF53 (manufactured by Torayen clay, trade name of PET film) having a thickness of 6 μm was used as the base material 311. The ionizing radiation curable resin composition B described above is applied to one surface of the substrate 311 with a gravure reverse coater and dried at 100 ° C. to form a relief forming layer 315A having a thickness of 1 m. Formed. Next, a stamper duplicated by the 2P method from the rainbow hologram (pattern 1: repeated pattern of the character string “abc”) by the two-beam method is attached to the relief forming layer surface to the emboss roller of the duplicating apparatus, and the opposite roller. A relief with a fine concavo-convex pattern was formed by hot pressing (embossing). Immediately after shaping, it was cured by irradiating ultraviolet rays using a high-pressure mercury lamp. An aluminum thin film having a thickness of 500 nm was formed on the relief surface of the relief forming layer 315A by a vacuum deposition method to obtain a metal thin film layer 317A.
[0283] 該金属薄膜層 317A面へ、バイロン 200 (東洋紡績 (株)社製、ポリエステル榭脂商 品名）をグラビアリバースコーターで塗工し 100°Cで乾燥させて、厚さ 0. 5 μ mの層 間プライマ層 321Bを形成し、該層間プライマ層 321B面へさらに、電離放射線硬化 性榭脂組成物 Aをグラビアリバースコーターで塗工し 100°Cで乾燥させて、厚さ 1 mのレリーフ形成層 315Bを形成した。次に、該レリーフ形成層面へ、 2光束法による レインボウホログラム (柄 2：文字列「xyz」の繰り返しパターン)力も 2P法で複製したス タンパを複製装置のエンボスローラーに貼着して、相対するローラーと間で加熱プレ ス（エンボス）して、微細な凹凸パターン力もなるレリーフ（ポジパターン）を賦形させた 。賦形後直ちに、高圧水銀灯を用いて紫外線を照射して硬化させた。レリーフ形成 層 315Bのレリーフ面へ真空蒸着法で厚さが 300nmの酸ィ匕チタン薄膜を形成し金 属薄膜層 317Bとした。このようにして、実施例 C9の光輝性フィルム 310を得た。  [0283] Byron 200 (polyester resin product name, manufactured by Toyobo Co., Ltd.) was applied to the 317A surface of the metal thin film layer with a gravure reverse coater and dried at 100 ° C to a thickness of 0.5 μm. m-layer primer layer 321B was formed, and the surface of the interlayer primer layer 321B was further coated with ionizing radiation curable resin composition A with a gravure reverse coater and dried at 100 ° C to obtain a thickness of 1 m. A relief forming layer 315B was formed. Next, the rainbow hologram (pattern 2: repeated pattern of character string “xyz”) force by the two-beam method is applied to the relief forming layer surface, and the stamp duplicated by the 2P method is attached to the embossing roller of the duplicating apparatus and opposed. A relief (positive pattern) with a fine uneven pattern force was formed by heating (embossing) between the rollers. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. A 300 nm thick titanium oxide thin film was formed on the relief surface of the relief forming layer 315B by vacuum deposition to form a metal thin film layer 317B. Thus, the glittering film 310 of Example C9 was obtained.
[0284] (評価）  [0284] (Evaluation)
実施例 C9の光輝性フィルム 310を基材 (PET)越しに観察すると、図 23のように、 文字列「abc」の繰り返しパターン (ポジパターン）が観察された。また、その反対側か ら観察すると、文字列「xyz」の繰り返しパターン (ポジパターン)越しに、文字列「abc 」の繰り返しパターン (ネガパターン)が観察された。表 2柄、裏 1柄が観察され、非常 に意匠性の高いホログラムであった。版取られもなぐ良好な複製品が得られた。  When the glitter film 310 of Example C9 was observed through the base material (PET), a repeated pattern (positive pattern) of the character string “abc” was observed as shown in FIG. When observed from the opposite side, a repetitive pattern (negative pattern) of the character string “abc” was observed over a repetitive pattern (positive pattern) of the character string “xyz”. Two patterns on the front and one pattern on the back were observed, and the hologram was extremely high in design. A good reproduction that could not be taken off was obtained.
[0285] (実施例 C 10) [0285] (Example C 10)
さら〖こ、実施例 C9の光輝性フィルム 310の基材 311において、第 1金属薄膜層 31 7Aの反対側の PET面に、前述の電離放射線硬化性榭脂組成物 Bをグラビアリバ一 スコーターで塗工し 100°Cで乾燥させて、厚さ 1 μ mの第 3レリーフ形成層 315Cを形 成した。次に、該レリーフ形成層面へ、 2光束法によるレインボウホログラム (柄 3 :文 字列「ghi」の繰り返しパターン)から 2P法で複製したスタンパを複製装置のエンボス ローラーに貼着して、相対するローラーと間で加熱プレス (エンボス）して、微細な凹 凸パターン力もなるレリーフを賦形させた。賦形後直ちに、高圧水銀灯を用いて紫外 線を照射して硬化させた。第 3レリーフ形成層 315Cのレリーフ面へ真空蒸着法で厚 さが 500nmのアルミニウム薄膜を形成して金属薄膜層 317Cとした。 Further, in the base material 311 of the glitter film 310 of Example C9, the above-mentioned ionizing radiation curable resin composition B was applied to the PET surface opposite to the first metal thin film layer 317A using a gravure river coater. It was applied and dried at 100 ° C. to form a third relief forming layer 315C having a thickness of 1 μm. Next, a rainbow hologram (pattern 3: text) by the two-beam method is applied to the relief forming layer surface. (Repetition pattern of character string “ghi”) A stamper duplicated by the 2P method is attached to the embossing roller of the duplicating machine, and is heated and pressed (embossed) with the opposite roller to provide a relief with fine concave and convex pattern force. Was shaped. Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. A metal thin film layer 317C was formed by forming a 500 nm thick aluminum thin film on the relief surface of the third relief forming layer 315C by vacuum deposition.
[0286] (評価） [0286] (Evaluation)
実施例 C 10の光輝性フィルム 310を第 3レリーフ形成層 315C側から観察すると、 図 24のように、文字列「ghi」の繰り返しパターンが観察された。また、その反対側から 観察すると文字列「xyz」の繰り返しパターン (ポジパターン)越しに、文字列「abc」の 繰り返しパターン (ネガパターン)が観察された。版取られもなぐ良好な複製品が得 られた。  When the glitter film 310 of Example C10 was observed from the third relief forming layer 315C side, a repeated pattern of the character string “ghi” was observed as shown in FIG. When observed from the opposite side, a repetitive pattern (negative pattern) of the character string “abc” was observed over a repetitive pattern (positive pattern) of the character string “xyz”. A good reproduction that could not be removed was obtained.
[0287] (実施例 C 11)  [0287] (Example C 11)
実施例 C8の光輝性フィルム 310の第 3金属薄膜層 317C面へ、バイロン 200 (東洋 紡績 (株)社製、ポリエステル榭脂商品名）をグラビアリバースコーターで塗工し 100 °Cで乾燥させて、厚さ 0. 5 mの第 2層間プライマ層 321Dを形成し、該第 2層間プ ライマ層 321 D面へさらに、前述の電離放射線硬化性榭脂組成物 Mをグラビアリバ 一スコーターで塗工し 100°Cで乾燥させて、厚さ 1 μ mの第 4レリーフ形成層 315Dを 形成した。次に、該レリーフ形成層面へ、 2光束法によるレインボウホログラム (柄 4 : 絵柄「星型」の繰り返しパターン)から 2P法で複製したスタンパを複製装置のエンボス ローラーに貼着して、相対するローラーと間で加熱プレス (エンボス）して、微細な凹 凸パターン力もなるレリーフを賦形させた。賦形後直ちに、高圧水銀灯を用いて紫外 線を照射して硬化させた。第 4レリーフ形成層 315Dのレリーフ面へ真空蒸着法で厚 さが 300nmの透明な酸ィ匕チタン薄膜を形成して第 4金属薄膜層 317Dとした。  Byron 200 (manufactured by Toyobo Co., Ltd., trade name for polyester resin) was applied to the third metal thin film layer 317C of the glittering film 310 of Example C8 and dried at 100 ° C using a gravure reverse coater. Then, a second interlayer primer layer 321D having a thickness of 0.5 m was formed, and the above-mentioned ionizing radiation curable resin composition M was further applied to the second interlayer primer layer 321D surface with a gravure river scooter. Then, it was dried at 100 ° C. to form a fourth relief forming layer 315D having a thickness of 1 μm. Next, a stamper copied by the 2P method from a rainbow hologram (pattern 4: repetitive pattern of the pattern “star”) by the two-beam method is attached to the relief forming layer surface to the embossing roller of the copying apparatus, and the opposite roller A relief with a fine concave / convex pattern force was formed by hot pressing (embossing). Immediately after shaping, it was cured by irradiating with ultraviolet rays using a high-pressure mercury lamp. A fourth titanium thin film layer 317D was formed by forming a 300 nm thick transparent titanium oxide thin film on the relief surface of the fourth relief forming layer 315D by vacuum deposition.
[0288] (評価）  [0288] (Evaluation)
実施例 C11の光輝性フィルム 310を、第 4レリーフ形成層 315D側から観察すると、 図 25のように、絵柄「星型」の繰り返しパターン越しに、文字列「ghi」の繰り返しパタ ーンが観察された。また、その反対側から観察すると文字列「xyz」の繰り返しパター ン (ポジパターン)越しに、文字列「abc」の繰り返しパターン (ネガパターン）が観察さ れた。版取られもなぐ良好な複製品が得られた。 When the glittering film 310 of Example C11 is observed from the fourth relief forming layer 315D side, the repeated pattern of the character string “ghi” is observed over the repeated pattern of the pattern “star” as shown in FIG. It was done. When observed from the opposite side, the repeated pattern (negative pattern) of the character string “abc” is observed over the repeated pattern (positive pattern) of the character string “xyz”. It was. A good reproduction that could not be taken off was obtained.
[0289] (実施例 C12〜C20)  [0289] (Examples C12 to C20)
実施例 C1〜C11で得られた光輝性フィルム 310を紙料へ抄き込む。 NBKP20質 量部、 LBKP80質量部を叩解し、白土 10質量部、紙力増強剤 0. 3質量部、サイズ 剤 1. 0質量部、硫酸バンドを適量加えて、紙料を調製した。該紙料を用いて、 2槽式 円網抄紙機で抄紙速度 50mZ分で 2層抄合わせる。この際に、上記で製造したスレ ッドをホログラム面を表面にして所定の位置に流した。次いで、公知の一般的な方法 に従い湿紙を脱水し、ドライヤーで乾燥することで、スレッドは基紙 301へ接着し、本 発明の光輝性図柄形成物 300である偽造防止用紙を製造した。  The glitter film 310 obtained in Examples C1 to C11 is incorporated into a paper stock. NBKP20 parts by mass and LBKP80 parts by mass were beaten, and a stock was prepared by adding 10 parts by mass of white clay, 0.3 parts by mass of paper strength enhancer, 1.0 part by mass of sizing agent, and a sulfuric acid band. Using the stock, two layers are combined with a two-tank type circular paper machine at a papermaking speed of 50 mZ. At this time, the thread produced as described above was flowed to a predetermined position with the hologram surface as the surface. Next, the wet paper was dehydrated according to a known general method and dried with a drier, so that the thread adhered to the base paper 301, and the anti-counterfeit paper, which is the glitter pattern formation 300 of the present invention, was produced.
[0290] 得られた偽造防止用紙は、スレッドの表面は露出した状態で、用紙の流れ方向にス レッドが基紙層へ埋設されて!、た。無理に剥離したところ該偽造防止用紙のスレッド 表面は 各実施例で説明した両面で異なる光輝性図柄が明確に観察できた。さらに 、カラーコピー機でコピーしたところ、一方のホログラム特有の輝きはなぐスレッドの ホログラムとコピーとは全く異なり、両側の面ともに一目で真贋が判断できた。  [0290] The obtained anti-counterfeit paper had the thread surface exposed, and the thread was embedded in the base paper layer in the paper flow direction! When the film was forcibly peeled, the glitter surface of the anti-counterfeit paper was clearly observed with different glittering patterns on both sides described in each example. In addition, when copying with a color copier, the hologram and copy of the thread that has the unique brightness of one of the holograms was completely different, and the authenticity of both sides could be judged at a glance.

Claims

請求の範囲 The scope of the claims
[1] 少なくとも光輝性の第 1図柄及び光輝性の第 2図柄を有し、前記第 1図柄と前記第 2図柄の図柄が異なっている、複数図柄光輝'性フイノレム。  [1] A multi-design brilliant “Finolem” having at least a first brilliant design and a second brilliant design, wherein the first design and the second design are different.
[2] 前記第 1図柄及び第 2図柄の図柄力 ヘアライン柄、万線柄、マット柄、ホログラム 及び Z又は回折格子である、請求項 1に記載の複数図柄光輝性フィルム。  [2] The multi-design glittering film according to claim 1, wherein the design power of the first design and the second design is a hairline design, a line design, a mat design, a hologram and Z or a diffraction grating.
[3] 少なくとも第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィルムと、少なく とも第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィルムとを、前記第 1反 射層面と前記第 2反射層面とを接着層を介して積層されてなり、前記第 1レリーフ形 成層と前記第 2レリーフ形成層に形成されているレリーフ形状が異なっている、複数 図柄光輝性フィルム。  [3] The first reflective film having at least the first relief forming layer and the first reflective layer, and at least the second bright film having the second relief forming layer and the second reflective layer are the first reflective film. A multi-pattern glittering film in which a layer surface and the second reflective layer surface are laminated via an adhesive layer, and the relief shapes formed in the first relief forming layer and the second relief forming layer are different.
[4] 少なくとも第 1基材、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィル ムと、少なくとも第 2基材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィ ルムとを、前記第 1反射層面と前記第 2反射層面とを接着層を介して積層されてなり、 前記第 1レリーフ形成層と前記第 2レリーフ形成層に形成されているレリーフ形状が 異なっている、複数図柄光輝性フィルム。  [4] A first glitter film having at least a first substrate, a first relief forming layer and a first reflective layer, and a second glitter having at least a second substrate, a second relief forming layer and a second reflective layer. A relief film formed by laminating the first reflective layer surface and the second reflective layer surface via an adhesive layer, and formed in the first relief forming layer and the second relief forming layer. Different, multi-pattern glitter films.
[5] 少なくとも第 1基材、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィル ムと、少なくとも第 2基材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィ ルムとを、前記第 1基材面と前記第 2基材面とを接着層を介して貼合してなり、前記 第 1レリーフ形成層と前記第 2レリーフ形成層に形成されているレリーフ形状が異なつ ている、複数図柄光輝性フィルム。  [5] A first glitter film having at least a first substrate, a first relief forming layer and a first reflective layer, and a second glitter having at least a second substrate, a second relief forming layer and a second reflective layer. The first and second base material surfaces are bonded to each other via an adhesive layer, and are formed on the first relief forming layer and the second relief forming layer. Multi-pattern glitter film with different relief shapes.
[6] 少なくとも第 1基材、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィル ムと、少なくとも第 2基材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィ ルムとを、前記第 1反射面と前記第 2基材面とを接着層を介して貼合してなり、前記 第 1レリーフ形成層と前記第 2レリーフ形成層に形成されているレリーフ形状が異なつ ている、複数図柄光輝性フィルム。  [6] A first glitter film having at least a first substrate, a first relief forming layer and a first reflective layer, and a second glitter having at least a second substrate, a second relief forming layer and a second reflective layer. A relief film formed on the first relief forming layer and the second relief forming layer by bonding the first reflective surface and the second base material surface via an adhesive layer. A multi-pattern glitter film with different shapes.
[7] 第 1基材と、該第 1基材の一方の面へ、少なくとも第 1レリーフ形成層及び第 1反射 層を有し、他方の面へ、少なくとも第 2レリーフ形成層及び第 2反射層を有してなり、 前記第 1レリーフ形成層と前記第 2レリーフ形成層に形成されているレリーフ形状が 異なっている、複数図柄光輝性フィルム。 [7] The first base material has at least the first relief forming layer and the first reflective layer on one surface of the first base material, and at least the second relief forming layer and the second reflective surface on the other surface. A relief shape formed on the first relief forming layer and the second relief forming layer. Different, multi-pattern glitter films.
[8] 第 1基材と、該第 1基材の一方の面へ、少なくとも第 1レリーフ形成層及び第 1反射 層を有し、さらに該第 1反射層面へ、少なくとも第 2レリーフ形成層及び第 2反射層を 設けてなり、前記第 1レリーフ形成層と前記第 2レリーフ形成層に形成されているレリ ーフ形状が異なっている、複数図柄光輝性フィルム。  [8] The first base material has at least a first relief forming layer and a first reflective layer on one surface of the first base material, and further has at least a second relief forming layer and a surface on the first reflective layer surface. A multi-pattern glittering film comprising a second reflective layer and having different relief shapes formed on the first relief forming layer and the second relief forming layer.
[9] 前記第 1レリーフ形成層及び第 2レリーフ形成層の形成されているレリーフ形状が ヘアライン柄、万線柄、マット柄、ホログラム及び Z又は回折格子であるでのようなマ イク口オーダのレリーフ形状ある、請求項 3〜8のいずれ力 1項に記載の複数図柄光 輝性フィルム。  [9] The mouth shape on which the relief shape in which the first relief forming layer and the second relief forming layer are formed is a hairline pattern, a line pattern, a mat pattern, a hologram and Z or a diffraction grating. The multi-pattern glitter film according to any one of claims 3 to 8, which has a relief shape.
[10] 上記第 1反射層及び Z又は第 2反射層が金属層及び Z又は透明反射層である、 請求項 3〜9のいずれか 1項に記載の複数図柄光輝性フィルム。  [10] The multi-pattern glittering film according to any one of claims 3 to 9, wherein the first reflective layer and Z or the second reflective layer are a metal layer and Z or a transparent reflective layer.
[11] 請求項 1〜10のいずれか 1項に記載の複数図柄光輝性フィルムにおいて、少なくと も層間及び Z又は表面に、基材、他の層及び Z又は印刷を設けてなる、複数図柄光 輝性フィルム。  [11] The multiple-pattern glittering film according to any one of claims 1 to 10, wherein the multiple-pattern glittering film is provided with a substrate, another layer and Z or printing on at least the interlayer and Z or the surface. Bright film.
[12] 請求項 1〜： L 1のいずれか 1項に記載の複数図柄光輝性フィルムを用いて、少なくと も 1部に光輝性の複数図柄を設けてなる、光輝性複数図柄形成物。  [12] Claims 1 to: A glittering multi-pattern formed article, wherein the multi-pattern glittering film according to any one of L1 is provided with at least one part of the glittering multiple designs.
[13] 少なくとも光輝性の第 1図柄と、該第 1図柄と図柄が異なる光輝性の第 2図柄を有 する複数図柄光輝性フィルムを細幅に裁断してなる、複数図柄光輝性スレッド。  [13] A multi-design glittering thread obtained by cutting a multi-design glitter film having at least a first design of glitter and a second design of glitter having a different design from the first design into a narrow width.
[14] 少なくとも第 1基材、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィル ムと、少なくとも第 2基材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィ ルムとを、前記第 1反射層面と前記第 2反射層面とを接着層を介して積層され、前記 第 1レリーフ形成層と前記第 2レリーフ形成層に形成されているレリーフ形状が異なつ て 、る複数図柄光輝性フィルムを細幅に裁断してなる、複数図柄光輝性スレッド。  [14] a first glitter film having at least a first substrate, a first relief forming layer and a first reflective layer, and a second glitter having at least a second substrate, a second relief forming layer and a second reflective layer The first reflective layer surface and the second reflective layer surface are laminated via an adhesive layer, and the relief shapes formed in the first relief forming layer and the second relief forming layer are different. A multi-design glitter thread formed by cutting a multi-design glitter film into a narrow width.
[15] 少なくとも第 1基材、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィル ムと、少なくとも第 2基材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィ ルムとを、前記第 1基材面と前記第 2基材面とを接着層を介して積層され、前記第 1レ リーフ形成層と前記第 2レリーフ形成層に形成されているレリーフ形状が異なってい る複数図柄光輝性フィルムを細幅に裁断してなる、複数図柄光輝性スレッド。 [15] A first glitter film having at least a first substrate, a first relief forming layer and a first reflective layer, and a second glitter having at least a second substrate, a second relief forming layer and a second reflective layer. A relief film formed by laminating the first base material surface and the second base material surface via an adhesive layer, and formed in the first relief forming layer and the second relief forming layer. A multi-design glitter thread formed by cutting a multi-design glitter film with different widths.
[16] 少なくとも第 1基材、第 1レリーフ形成層及び第 1反射層を有する第 1光輝性フィル ムと、少なくとも第 2基材、第 2レリーフ形成層及び第 2反射層を有する第 2光輝性フィ ルムとを、前記第 1反射層面と前記第 2基材面とを接着層を介して積層され、前記第 1レリーフ形成層と前記第 2レリーフ形成層に形成されているレリーフ形状が異なって V、る複数図柄光輝性フィルムを細幅に裁断してなる、複数図柄光輝性スレッド。 [16] A first glitter film having at least a first substrate, a first relief forming layer and a first reflective layer, and a second glitter having at least a second substrate, a second relief forming layer and a second reflective layer. The first reflective layer surface and the second base material surface are laminated via an adhesive layer, and the relief shapes formed in the first relief forming layer and the second relief forming layer are different. V, multi-design glitter thread made by cutting a multi-design glitter film into narrow widths.
[17] 第 1基材と、該第 1基材の一方の面へ、少なくとも第 1レリーフ形成層及び第 1反射 層を有し、他方の面へ、少なくとも第 2レリーフ形成層及び第 2反射層を有してなり、 前記第 1レリーフ形成層と前記第 2レリーフ形成層に形成されているレリーフ形状が 異なって!/、る複数図柄光輝性フィルムを細幅に裁断してなる、複数図柄光輝性スレ ッド、。  [17] The first base material has at least a first relief forming layer and a first reflection layer on one surface of the first base material, and at least a second relief forming layer and a second reflection on the other surface. A plurality of patterns formed by cutting a plurality of pattern glitter films having different relief shapes formed on the first relief forming layer and the second relief forming layer! Brightness thread ,.
[18] 第 1基材と、該第 1基材の一方の面へ、少なくとも第 1レリーフ形成層及び第 1反射 層を有し、さらに該第 1反射層面へ、少なくとも第 2レリーフ形成層及び第 2反射層を 設けてなり、前記第 1レリーフ形成層と前記第 2レリーフ形成層に形成されているレリ ーフ形状が異なっている複数図柄光輝性フィルムを細幅に裁断してなる、複数図柄 光輝性スレッド。  [18] At least a first relief forming layer and a first reflective layer are provided on one surface of the first base material and the first base material, and at least a second relief forming layer is provided on the first reflective layer surface. A plurality of glittering films having different relief shapes formed on the first relief forming layer and the second relief forming layer, each having a second reflective layer; Design Bright thread.
[19] 上記第 1図柄及び第 2図柄の図柄がヘアライン柄、万線柄、マット柄、ホログラム及 び Z又は回折格子である、請求項 13〜18のいずれか 1項に記載の複数図柄光輝 性スレッド。  [19] The multi-pattern radiance according to any one of claims 13 to 18, wherein the designs of the first design and the second design are a hairline design, a line design, a mat design, a hologram, and Z or a diffraction grating. Sex thread.
[20] 全体の厚さが、 4〜40 μ mである、請求項 13〜19のいずれ力 1項に記載の複数図 柄光輝性スレッド。  [20] The multi-pattern glittering thread according to any one of claims 13 to 19, wherein the total thickness is 4 to 40 µm.
[21] 請求項 13〜20のいずれか 1項に記載の複数図柄光輝性スレッドを用いて、該複 数図柄光輝性スレッドを基紙の少なくとも一方の面の表面に抄き込んだことを特徴と する光輝性複数図柄形成物。  [21] A multi-design glittering thread according to any one of claims 13 to 20, wherein the multiple-design glitter thread is engraved on the surface of at least one surface of the base paper. A glittering multi-patterned product.
[22] 請求項 13〜20のいずれかに記載の複数図柄光輝性スレッドを用いて、該複数図 柄光輝性スレッドを基紙の少なくとも一部に設けたことを特徴とする光輝性複数図柄 形成物。 [22] A multi-design glittering thread according to any one of claims 13 to 20, wherein the multi-design glittering thread is provided on at least a part of a base paper. object.
[23] レリーフ形成層と反射層とを 1組の光輝性図柄層として、層間プライマ層を介して、 2組又はそれ以上の組の光輝性図柄層を有してなる、光輝性フィルム。 [23] A glittering film comprising a relief forming layer and a reflective layer as a pair of glittering design layers, and having two or more groups of glittering design layers via an interlayer primer layer.
[24] 少なくとも 2種の光輝性図柄を有している、請求項 23記載の光輝性フィルム。 24. The glitter film according to claim 23, wherein the glitter film has at least two kinds of glitter patterns.
[25] 上記の光輝性図柄がヘアライン柄、万線柄、ホログラム及び Z又は回折格子である [25] The glitter pattern is a hairline pattern, a line pattern, a hologram and Z or a diffraction grating.
、請求項 23または 24に記載の光輝性フィルム。 The glitter film according to claim 23 or 24.
[26] 少なくとも第 1反射層、第 1光輝性図柄を有する第 1レリーフ形成層、層間プライマ 層、第 2光輝性図柄を有する第 2レリーフ形成層、及び第 2反射層からなる、請求項 226. The method according to claim 2, comprising at least a first reflective layer, a first relief forming layer having a first glitter pattern, an interlayer primer layer, a second relief forming layer having a second glitter pattern, and a second reflective layer.
3〜25の!、ずれ力 1項に記載の光輝性フィルム。 The glittering film according to item 1 of 3 to 25!
[27] 少なくとも 2つの光輝性図柄が、表側及び裏面から、それぞれ視認できる、請求項 2[27] The at least two brilliant symbols are visible from the front side and the back side, respectively.
3〜26の!、ずれ力 1項に記載の光輝性フィルム。 The glittering film according to item 1 of 3-26!
[28] 上記層間プライマ層のガラス転移温度が 130°C以下である、請求項 23〜27のい ずれ力 1項に記載の光輝性フィルム。 [28] The glitter film according to any one of [23] to [27], wherein the interlayer primer layer has a glass transition temperature of 130 ° C. or lower.
[29] 全体厚さが 5〜20 μ mである、請求項 23〜28のいずれか 1項に記載の光輝性フィ ノレム。 [29] The glittering finolem according to any one of claims 23 to 28, wherein the total thickness is 5 to 20 μm.
[30] 請求項 23〜29のいずれか 1項に記載の光輝性フィルムを用いて、少なくとも 1部に 光輝性図柄を設けてなる、光輝性図柄形成物。  [30] A glittering pattern forming product comprising the glittering film according to any one of claims 23 to 29, wherein at least one part is provided with a glittering pattern.
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