WO2005021437A1 - 多孔性物質とその製造方法 - Google Patents
多孔性物質とその製造方法 Download PDFInfo
- Publication number
- WO2005021437A1 WO2005021437A1 PCT/JP2004/010455 JP2004010455W WO2005021437A1 WO 2005021437 A1 WO2005021437 A1 WO 2005021437A1 JP 2004010455 W JP2004010455 W JP 2004010455W WO 2005021437 A1 WO2005021437 A1 WO 2005021437A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- fluoride
- surface area
- salt
- porous metal
- porous
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000011148 porous material Substances 0.000 title description 10
- 229910001512 metal fluoride Inorganic materials 0.000 claims abstract description 41
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims abstract description 28
- 239000000203 mixture Substances 0.000 claims abstract description 28
- 238000003682 fluorination reaction Methods 0.000 claims abstract description 25
- 239000003054 catalyst Substances 0.000 claims abstract description 18
- 230000002194 synthesizing effect Effects 0.000 claims abstract description 6
- 229910021563 chromium fluoride Inorganic materials 0.000 claims description 34
- FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 claims description 34
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 31
- 229910052751 metal Inorganic materials 0.000 claims description 24
- 239000002184 metal Substances 0.000 claims description 24
- 239000002994 raw material Substances 0.000 claims description 21
- -1 anorenium Chemical compound 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 18
- 150000003839 salts Chemical class 0.000 claims description 18
- BHHYHSUAOQUXJK-UHFFFAOYSA-L Zinc fluoride Inorganic materials F[Zn]F BHHYHSUAOQUXJK-UHFFFAOYSA-L 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 11
- 150000003377 silicon compounds Chemical class 0.000 claims description 11
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 9
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 9
- 150000002736 metal compounds Chemical class 0.000 claims description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 8
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 8
- 239000002210 silicon-based material Substances 0.000 claims description 8
- RMSOEGBYNWXXBG-UHFFFAOYSA-N 1-chloronaphthalen-2-ol Chemical compound C1=CC=CC2=C(Cl)C(O)=CC=C21 RMSOEGBYNWXXBG-UHFFFAOYSA-N 0.000 claims description 7
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 claims description 7
- 229910021583 Cobalt(III) fluoride Inorganic materials 0.000 claims description 7
- 238000000975 co-precipitation Methods 0.000 claims description 7
- 229910017052 cobalt Inorganic materials 0.000 claims description 7
- 239000010941 cobalt Substances 0.000 claims description 7
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 7
- YCYBZKSMUPTWEE-UHFFFAOYSA-L cobalt(ii) fluoride Chemical compound F[Co]F YCYBZKSMUPTWEE-UHFFFAOYSA-L 0.000 claims description 7
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 claims description 7
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 claims description 6
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 6
- 229910052791 calcium Inorganic materials 0.000 claims description 6
- 239000011575 calcium Substances 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- 239000011651 chromium Substances 0.000 claims description 6
- SHXXPRJOPFJRHA-UHFFFAOYSA-K iron(iii) fluoride Chemical compound F[Fe](F)F SHXXPRJOPFJRHA-UHFFFAOYSA-K 0.000 claims description 6
- DBJLJFTWODWSOF-UHFFFAOYSA-L nickel(ii) fluoride Chemical compound F[Ni]F DBJLJFTWODWSOF-UHFFFAOYSA-L 0.000 claims description 6
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 6
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 5
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 5
- 150000001844 chromium Chemical class 0.000 claims description 5
- 150000002366 halogen compounds Chemical class 0.000 claims description 5
- 235000012239 silicon dioxide Nutrition 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 4
- 238000005470 impregnation Methods 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910021529 ammonia Inorganic materials 0.000 claims description 3
- 239000003518 caustics Substances 0.000 claims description 3
- 150000001868 cobalt Chemical class 0.000 claims description 3
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 claims description 3
- 150000008282 halocarbons Chemical class 0.000 claims description 3
- 150000002471 indium Chemical class 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 150000002505 iron Chemical class 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- 239000011777 magnesium Substances 0.000 claims description 3
- 159000000003 magnesium salts Chemical class 0.000 claims description 3
- 150000002815 nickel Chemical class 0.000 claims description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 3
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 150000003751 zinc Chemical class 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- 239000004215 Carbon black (E152) Substances 0.000 claims description 2
- 150000001462 antimony Chemical class 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 125000005624 silicic acid group Chemical class 0.000 claims description 2
- 239000011888 foil Substances 0.000 claims 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 1
- 150000002940 palladium Chemical class 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 abstract 2
- 239000002243 precursor Substances 0.000 description 23
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 238000004438 BET method Methods 0.000 description 9
- 239000004115 Sodium Silicate Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 8
- 229910052911 sodium silicate Inorganic materials 0.000 description 8
- 239000012298 atmosphere Substances 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 5
- 230000003197 catalytic effect Effects 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 4
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 3
- 229910000423 chromium oxide Inorganic materials 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- UBOXGVDOUJQMTN-UHFFFAOYSA-N 1,1,2-trichloroethane Chemical compound ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 2
- NPNPZTNLOVBDOC-UHFFFAOYSA-N 1,1-difluoroethane Chemical compound CC(F)F NPNPZTNLOVBDOC-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- XWCDCDSDNJVCLO-UHFFFAOYSA-N Chlorofluoromethane Chemical compound FCCl XWCDCDSDNJVCLO-UHFFFAOYSA-N 0.000 description 2
- 229910021556 Chromium(III) chloride Inorganic materials 0.000 description 2
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229960000359 chromic chloride Drugs 0.000 description 2
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000004760 silicates Chemical class 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- QVLAWKAXOMEXPM-UHFFFAOYSA-N 1,1,1,2-tetrachloroethane Chemical compound ClCC(Cl)(Cl)Cl QVLAWKAXOMEXPM-UHFFFAOYSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- WGZYQOSEVSXDNI-UHFFFAOYSA-N 1,1,2-trifluoroethane Chemical compound FCC(F)F WGZYQOSEVSXDNI-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- AHFMSNDOYCFEPH-UHFFFAOYSA-N 1,2-difluoroethane Chemical compound FCCF AHFMSNDOYCFEPH-UHFFFAOYSA-N 0.000 description 1
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 229950005499 carbon tetrachloride Drugs 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 229960001701 chloroform Drugs 0.000 description 1
- UOUJSJZBMCDAEU-UHFFFAOYSA-N chromium(3+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[Cr+3].[Cr+3] UOUJSJZBMCDAEU-UHFFFAOYSA-N 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- UMNKXPULIDJLSU-UHFFFAOYSA-N dichlorofluoromethane Chemical compound FC(Cl)Cl UMNKXPULIDJLSU-UHFFFAOYSA-N 0.000 description 1
- 229940099364 dichlorofluoromethane Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- UHCBBWUQDAVSMS-UHFFFAOYSA-N fluoroethane Chemical compound CCF UHCBBWUQDAVSMS-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 229940052308 general anesthetics halogenated hydrocarbons Drugs 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 159000000010 radium salts Chemical class 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C19/00—Acyclic saturated compounds containing halogen atoms
- C07C19/08—Acyclic saturated compounds containing halogen atoms containing fluorine
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/24—Chromium, molybdenum or tungsten
- B01J23/26—Chromium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/84—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/85—Chromium, molybdenum or tungsten
- B01J23/86—Chromium
- B01J23/864—Cobalt and chromium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/03—Precipitation; Co-precipitation
- B01J37/031—Precipitation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/22—Halogenating
- B01J37/26—Fluorinating
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B9/00—General methods of preparing halides
- C01B9/08—Fluorides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/06—Halogens; Compounds thereof
- B01J27/132—Halogens; Compounds thereof with chromium, molybdenum, tungsten or polonium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/60—Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
- B01J35/61—Surface area
- B01J35/613—10-100 m2/g
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/60—Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
- B01J35/61—Surface area
- B01J35/615—100-500 m2/g
Definitions
- the present invention relates to a raw material composition for synthesizing a porous metal fluoride, a porous metal fluoride obtained by fluorinating the raw material, a fluorine catalyst containing the porous metal fluoride, and a fluorine-containing catalyst.
- the present invention relates to a method for producing a fluoro compound using a catalyst.
- Porous materials having micro and meso-sized pores are widely used for catalysts, selective separation, selective reactions, sensors, and the like (Non-Patent Document 1).
- Non-Patent Documents 2 are silicates or metal oxides. Since these silicates and metal oxides react and corrode themselves in a corrosive atmosphere such as in the presence of hydrogen fluoride, and at high temperatures the pore structure is destroyed. It has the disadvantage that it cannot be used stably.
- Non-Patent Documents 4 and 5 porous aluminum fluoride
- porous magnesium fluoride Non-Patent Document 6
- porous calcium fluoride Non-Patent Documents
- Patent Document 1 porous chromium fluoride
- porous chromium fluoride is usually made by fluorinating chromium oxide, but the catalytic activity of the chromium fluoride catalyst is affected by the surface area of the precursor chromium oxide, and the surface area of chromium oxide is reduced. It is reported that as the size increases, the catalytic activity of fluorination improves (Patent Document 3). As described above, porous materials having a large surface area are expected to have excellent properties such as high catalytic activity. However, there has been a demand for the development of a stable porous material.
- Non-patent document 1 Yunfeng Lu, et al., Nature, 389 (25), 364 (1997)
- Non-Patent Document 2 Hui-suk Yun, et al "Adv. Mater., 13 (18), 1377 (2001)
- Non-Patent Document 3 Hong Yang, et al., Nature, 379 (22), 703 (1996)
- Non-Patent Document 4 H.D.Quan, et al "J. Fluorine Chem” 99, 176 (1999)
- Non-Patent Document 5 H.D.Quan, et al "Tetrahedron, 57, 4111 (2001)
- Non-Patent Document 6 M. Wojciechowska, et al "Catal. Lett., 66, 147 (2000)
- Non-Patent Document 7 0. (311 & 11, et al "J. Fluorine Chem., 116, 65 (2002)
- Patent Document 1 US Pat. No. 3,258,500
- Patent Document 2 International Publication No. 98/10862 pamphlet
- Patent Document 3 European Patent Application No. 0514932
- a first object of the present invention is to provide a raw material composition suitably used for synthesizing a porous metal fluoride having a large surface area and being stable even in a corrosive atmosphere or the like.
- the second object is to provide a porous metal fluoride which has a large surface area by fluorinating the raw material composition and is stable even in a corrosive atmosphere, and the third object is to provide the porous metal fluoride.
- a fourth object is to provide a fluorination catalyst containing a fluoride, and to provide an efficient method for producing a fluoro compound using the fluorination catalyst.
- the present inventor has conducted intensive studies to solve the above-mentioned problems, and as a result, the raw material composition containing a silicon compound in a metal compound which is a precursor of a porous metal fuzzy object is subjected to a fluorination treatment. As a result, they have found that a porous metal fluoride having a large surface area and stable even in a corrosive atmosphere or the like can be provided, and the present invention has been completed.
- a method for producing a porous metal fluoride which comprises introducing a silicon-containing compound into a metal salt and then subjecting the metal salt to hydrogen fluoride treatment.
- the metal salt is at least one metal compound selected from chromium, cobalt, anorenium, calcium, magnesium, nickele, titanium, zinc, indium and iron.
- the raw material composition according to any one of the above.
- 90m has a surface area of chromium fluoride, cobalt fluoride having a surface area of 110m 2 / g- 300m 2 / g , 80m 2 / g- 300m 2 / g with a surface area of 2 / g- 500m 2 / g
- Anodium fluoride 100m 2 / g—Calcium fluoride with a surface area of 300m 2 / g, 70m 2 / g
- Porous chromium fluoride characterized by a surface area of 90m 2 Zg—200m 2 / g
- Porous metal fluoride power Selected from chromium fluoride, cobalt fluoride, aluminum fluoride, calcium fluoride, magnesium fluoride, nickel fluoride, titanium fluoride, zinc fluoride, indium fluoride and iron fluoride
- a fluorination catalyst comprising the porous metal fluoride according to any one of (7) to (12).
- a process for producing a fluoro compound which comprises reacting a hydrogen or fluorine compound with hydrogen fluoride in the presence of the fluorination catalyst according to (13) or (14).
- the raw material composition according to the present invention comprising a metal compound and a silicon compound is often porous and amorphous, and its surface area may be 400 m 2 / g or more depending on the case.
- the chemical composition turns into a fluoride of the metal by a reaction with hydrogen fluoride. Because of these characteristics, fluorination treatment gives a porous metal fluoride with a much larger surface area than conventional products and is stable even in corrosive atmospheres. . Further, the obtained porous metal fluoride has excellent fluorination catalytic activity, and when used as a catalyst for producing a fluoro compound by reacting a halide with hydrogen fluoride, it can be used in a high yield. Can be obtained.
- the raw material composition for synthesizing a porous metal fluoride of the present invention comprises a metal compound containing a silicon compound.
- the metal compound containing a silicon compound is not particularly limited as long as it gives a porous metal fluoride by hydrogen fluoride treatment, but chromium, cobalt, aluminum, calcium, magnesium, nickel, titanium, zinc, Indium, iron salts, or mixtures thereof are preferred. More preferably, these oxides, hydroxides, or mixtures thereof are preferred. More preferred are chromium oxides and hydroxides and salts containing these.
- the silicon compound is not particularly limited as long as it can be applied to the present production method, but is preferably silicon dioxide (SiO 2), caustic hydrofluoric acid (H SiF), and orthocaic acid (H SiO 2). , Metasilicic acid (H SiO), ortho-dicarboxylic acid (H Si 0), meta-di-acid (H Si 0), meta-tri-carboxylic acid (H Si 0)
- the content of silicon when the silicon compound is added to the metal compound is 0.1 to 20% by weight, preferably 115 to 5% by weight. If the content of silicon is too large, the structure may be destroyed during the treatment with hydrogen fluoride, which is not preferable.
- the method for incorporating the silicon compound into the precursor is not particularly limited, and examples thereof include a coprecipitation method, an impregnation method, and a method of directly mixing the precursor and the silicon compound.
- an aqueous solution of a metal salt, a silicon-containing compound and a base are mixed to precipitate a metal hydroxide containing the silicon-containing compound.
- the base used at this time is not particularly limited as long as a hydroxide precipitate can be obtained by this method, but examples thereof include ammonia, sodium hydroxide, potassium hydroxide, sodium carbonate, and potassium carbonate.
- the pH at the time of precipitation is 6-9, preferably 7-8.
- the precipitate obtained is filtered and washed with water, preferably with deionized water.
- the precursor into which the silicon-containing compound has been introduced is fired if necessary.
- the temperature is 300-600 ° C, preferably 400-500 ° C, and firing in air may be used, but firing in a nitrogen atmosphere is preferable.
- the raw material composition (hereinafter also referred to as a precursor) obtained as described above is often porous and amorphous, and its surface area may be 400 m 2 / g or more in some cases. is there.
- the metal becomes a fluoride of the metal by the reaction with hydrogen fluoride. Due to these characteristics, the surface area measured by the BET method by fluorination treatment has a larger surface area, for example, 90 m 2 / g—200 m 2 / g, and is stable even in a corrosive atmosphere. Provides a porous metal fluoride.
- chromium fluoride having a surface area of 90 m 2 / g to 500 m 2 / g, particularly porous chromium fluoride having a surface area of 90 m 2 / g to 200 m 2 / g is preferable.
- the hydrogen fluoride treatment may be performed by bringing the precursor into contact with hydrogen fluoride or hydrogen fluoride diluted with a diluent gas such as nitrogen gas or argon gas.
- the temperature of the hydrogen fluoride treatment is from room temperature to 500 ° C, preferably from 50 ° C to 350 ° C. There is no particular limitation on the amount of hydrogen fluoride.
- the remaining hydrogen fluoride can be removed by flowing a nitrogen stream.
- the porous metal fluoride according to the present invention is obtained by fluorinating a halogen compound such as carbon black. It can be suitably used as a catalyst for producing a fluoro compound by fluorination with hydrogen fluoride. Further, a chromium salt, a cobalt salt, an iron salt, a zinc salt, a magnesium salt, a silver salt, a nickel salt, an indium salt, or a mixture thereof may be added to the porous metal fluoride. As for the method of addition, it may be added to the porous fluorinated product, or may be added to the precursor by an impregnation method or a coprecipitation method, and then subjected to a hydrogen fluoride treatment. The amount of addition is 1: 1 to 100: 1, preferably 3: 1 10: 1, in a molar ratio of the metal of the porous fluoride to the metal of the additive.
- halogen compound which is a starting material for producing a fluoro compound examples include halogenated hydrocarbons such as chlorocarbons, fluorofluorocarbons, hydrochlorofluorocarbons, and chloroolefins.
- Specific columns include chloromethane, dichloromethane, trichloromethane, tetrachloromethane, chlorofluoromethane, dichlorofluoromethane, chlorodifluoromethane, chloromethane, 1,1-dichloromethane, 1,2-dichloroethane, 1,1,1_trichloroethane, 1,1,2_trichloroethane, 1,1,1,2-tetrachloroethane, 1,1,2,2-tetrachloroethane, 1_black mouth 1, 1, 1-difluoro- 1, 2-difluoro-, 1_ 2, 2, 2-difluoro-, 1, 1-dichloro- 1-fluoro-, 1, 1-dichloro-2- 2-fluoro-, 1 1,2-dichloroethylene, 1,2-dichloroethylene, 1,2-dichloroethylene, trichloroethylene, tetrachloroethylene, 1,1-dichloro-2,2-dichloro-1,
- the hydrogen fluoride used in these catalytic fluorination reactions is advantageously used in an excess amount with respect to the starting halogen compound, usually in an amount of 1 to 30 equivalents, preferably 3 to 10 equivalents. Preferably, it is used. In this case, hydrogen fluoride diluted with a diluent gas such as nitrogen gas or argon gas can also be used.
- a diluent gas such as nitrogen gas or argon gas
- the reaction temperature of the fluorination is usually 200 ° C, 450 ° C, preferably 230 ° C, 400 ° C.
- the reaction can be carried out in either a batch system or a flow system.
- Examples of the fluoro compound obtained by the fluorination reaction of the present invention include fluoromethane, difluoromethane, trifluoromethane, tetrafluoromethane, fluoroethane, 1,1-difluoroethane, 1,2-difluoroethane, 1,1,1, and 1_Trifluoroetan, 1,1,2—Trifluoroethan, 1,1,1,2—Tetrafluoroeethane, 1,1,2,2-Tetrafluore Lohetan and pentafunolelohetan can be mentioned.
- Sodium silicate (NaSiO, 3g) was dissolved in 28% aqueous ammonia (114ml), and added to an aqueous solution of chromium trichloride (chromium content: about 10%, 240g) with vigorous stirring.
- the pH after mixing was about 7.
- the precipitate was collected by filtration, washed with deionized water, dried, and calcined at 450 ° C. under a nitrogen stream to obtain a chromium salt of a precursor containing silicon.
- the specific surface area by BET method is 36 6m / g.
- the specific surface area by the BET method was 176 m 2 / g.
- a precursor and porous chromium fluoride were prepared in the same manner as in Examples 1 and 2, except that 9 g of sodium silicate was used.
- the specific surface areas determined by the BET method were 470 and 169 m 2 / g, respectively, for the precursor and the porous chromium fluoride.
- the porous chromium fluoride obtained here was used, and the gas phase fluorination of dichloromethane was carried out in the same manner as in Example 3. Table 2 shows the results.
- a precursor and porous chromium fluoride were prepared in the same manner as in Examples 1 and 2, except that 9 g of sodium silicate was used and the firing temperature was 400 ° C.
- the specific surface areas by the BET method were 407 and 187 m 2 / g for the precursor and the porous chromium fluoride, respectively.
- gas phase fluorination of dichloromethane was carried out in the same manner as in Example 3. Table 3 shows the results.
- a precursor and porous chromium fluoride were prepared in the same manner as in Examples 1 and 2, except that 15 g of sodium silicate was used and the sintering temperature was 400 ° C.
- the specific surface areas by the BET method were 355 and 152 m 2 / g for the precursor and the porous chromium fluoride, respectively.
- the porous chromium fluoride obtained here was used, and the gas phase fluorination of dichloromethane was carried out in the same manner as in Example 3. Table 4 shows the results.
- a precursor and porous chromium fluoride were prepared in the same manner as in Examples 1 and 2, except that 0.9 g of sodium silicate was used.
- the specific surface areas determined by the BET method were 395 and 110 m 2 / g, respectively, for the precursor and the porous chromium fluoride.
- a porous chromium fluoride was prepared in the same manner as in Examples 1 and 2, except that sodium silicate was not used.
- the specific surface area by the BET method was 253 and 90 m 2 / g for the precursor and the porous chromium fluoride, respectively.
- gas phase fluorination of dichloromethane was carried out in the same manner as in Example 2. Table 6 shows the results.
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US20060216570A1 (en) * | 2005-03-24 | 2006-09-28 | Gayatri Vyas | Durable hydrophilic coatings for fuel cell bipolar plates |
CN101863502B (zh) * | 2010-06-24 | 2012-11-14 | 浙江师范大学 | 一种高比表面积的β-氟化铝的制备方法 |
JP5878429B2 (ja) * | 2012-05-29 | 2016-03-08 | ステラケミファ株式会社 | フッ化マグネシウム粒子、フッ化マグネシウム粒子の製造方法、フッ化マグネシウム粒子分散液、フッ化マグネシウム粒子分散液の製造方法、低屈折率層形成用組成物、低屈折率層形成用組成物の製造方法、低屈折率層付基材及び低屈折率層付基材の製造方法 |
CN104907065B (zh) * | 2014-03-12 | 2019-08-02 | 北京宇极科技发展有限公司 | 氟化催化剂、制备方法及用途 |
CN104907063A (zh) * | 2014-03-12 | 2015-09-16 | 北京宇极科技发展有限公司 | 铬基催化剂、制备方法及用途 |
CN106890662B (zh) * | 2017-02-24 | 2019-09-10 | 北京宇极科技发展有限公司 | 一种催化剂、其制备方法及其应用 |
CN112588307A (zh) * | 2020-12-30 | 2021-04-02 | 山东华安新材料有限公司 | 一种气相氟化制备1,1,2,2-四氟乙烷的方法 |
CN113480402B (zh) * | 2021-07-14 | 2023-04-28 | 山东华安新材料有限公司 | 一种副产再利用制备四氟乙烷的方法 |
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