WO2004112940A1 - 酸化触媒と低温プラズマとを利用する気体処理方法及び気体処理装置 - Google Patents
酸化触媒と低温プラズマとを利用する気体処理方法及び気体処理装置 Download PDFInfo
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- WO2004112940A1 WO2004112940A1 PCT/JP2004/004521 JP2004004521W WO2004112940A1 WO 2004112940 A1 WO2004112940 A1 WO 2004112940A1 JP 2004004521 W JP2004004521 W JP 2004004521W WO 2004112940 A1 WO2004112940 A1 WO 2004112940A1
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- 239000003054 catalyst Substances 0.000 title claims abstract description 141
- 238000007254 oxidation reaction Methods 0.000 title claims abstract description 66
- 230000003647 oxidation Effects 0.000 title claims abstract description 62
- 238000012545 processing Methods 0.000 title claims abstract description 26
- 238000003672 processing method Methods 0.000 title claims abstract description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 60
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 60
- 239000012855 volatile organic compound Substances 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims description 27
- 239000012212 insulator Substances 0.000 claims description 18
- 230000001681 protective effect Effects 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 abstract description 19
- 229910002091 carbon monoxide Inorganic materials 0.000 abstract description 19
- 244000005700 microbiome Species 0.000 abstract description 10
- 239000007789 gas Substances 0.000 description 107
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 32
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 16
- 238000012546 transfer Methods 0.000 description 13
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 12
- 230000000694 effects Effects 0.000 description 10
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 9
- 239000000853 adhesive Substances 0.000 description 9
- 230000001070 adhesive effect Effects 0.000 description 9
- 239000001569 carbon dioxide Substances 0.000 description 8
- 229910002092 carbon dioxide Inorganic materials 0.000 description 8
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 6
- 239000005751 Copper oxide Substances 0.000 description 6
- 239000003463 adsorbent Substances 0.000 description 6
- 229910000431 copper oxide Inorganic materials 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 235000019645 odor Nutrition 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 238000007599 discharging Methods 0.000 description 4
- 150000002894 organic compounds Chemical class 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 4
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- GOPYZMJAIPBUGX-UHFFFAOYSA-N [O-2].[O-2].[Mn+4] Chemical class [O-2].[O-2].[Mn+4] GOPYZMJAIPBUGX-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 3
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 229910000428 cobalt oxide Inorganic materials 0.000 description 2
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000004332 deodorization Methods 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 2
- 150000002484 inorganic compounds Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- -1 nitric oxide compound Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 2
- 229910001950 potassium oxide Inorganic materials 0.000 description 2
- 229910001923 silver oxide Inorganic materials 0.000 description 2
- 239000000779 smoke Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- LXKCHCXZBPLTAE-UHFFFAOYSA-N 3,4-dimethyl-1H-pyrazole phosphate Chemical compound OP(O)(O)=O.CC1=CNN=C1C LXKCHCXZBPLTAE-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 241000208125 Nicotiana Species 0.000 description 1
- 235000002637 Nicotiana tabacum Nutrition 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005495 cold plasma Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000009965 odorless effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 230000000391 smoking effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L9/00—Disinfection, sterilisation or deodorisation of air
- A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
- A61L9/22—Ionisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/864—Removing carbon monoxide or hydrocarbons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/8678—Removing components of undefined structure
- B01D53/8687—Organic components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J15/00—Chemical processes in general for reacting gaseous media with non-particulate solids, e.g. sheet material; Apparatus specially adapted therefor
- B01J15/005—Chemical processes in general for reacting gaseous media with non-particulate solids, e.g. sheet material; Apparatus specially adapted therefor in the presence of catalytically active bodies, e.g. porous plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/30—Sulfur compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/50—Carbon oxides
- B01D2257/502—Carbon monoxide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D2257/00—Components to be removed
- B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
- B01D2257/708—Volatile organic compounds V.O.C.'s
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0824—Details relating to the shape of the electrodes
- B01J2219/0826—Details relating to the shape of the electrodes essentially linear
- B01J2219/0828—Wires
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0824—Details relating to the shape of the electrodes
- B01J2219/0826—Details relating to the shape of the electrodes essentially linear
- B01J2219/083—Details relating to the shape of the electrodes essentially linear cylindrical
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0875—Gas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
- B01J2219/0896—Cold plasma
Definitions
- the present invention relates to a gas processing method and a gas processing apparatus using an oxidation catalyst (for example, an oxidation catalyst containing a metal oxide such as manganese oxide and copper oxide, in particular, a hopcalite catalyst) and low-temperature plasma.
- an oxidation catalyst for example, an oxidation catalyst containing a metal oxide such as manganese oxide and copper oxide, in particular, a hopcalite catalyst
- harmful components for example, carbon monoxide or volatile organic compounds
- Odor can be deodorized.
- microorganisms can be eliminated or reduced from the treated gas. Background art
- the hopcalite catalyst is an oxidizing catalyst composed of manganese oxide, copper oxide, and other metal oxides (for example, potassium oxide, silver oxide, or cobalt oxide), and has a function of removing carbon monoxide by oxidation.
- oxidizing catalyst composed of manganese oxide, copper oxide, and other metal oxides (for example, potassium oxide, silver oxide, or cobalt oxide)
- metal oxides for example, potassium oxide, silver oxide, or cobalt oxide
- a method using a hopcalite catalyst for adsorbing carbon monoxide when producing medical-quality air Japanese Unexamined Patent Publication No. Hei 8-26666) No. 29
- a method using a hopcalite catalyst as an adsorbent for carbon monoxide which is an impurity in an inert gas stream Japanese Patent Application Laid-Open No. H10-137530
- a method using a hopcalite catalyst as a catalyst for removing an odor component from fuel Japanese Patent Application Laid-Open No. Hei 8-245576 is known.
- a deodorization technique using low-temperature plasma is also known.
- a low-temperature plasma deodorization apparatus including a high-pressure discharge unit capable of generating low-temperature plasma and a catalyst unit filled with an oxidation-promoting catalyst is known.
- organic solvent removal method using low temperature plasma A method of removing nitrogen oxides as a gas oxidizing effect using low-temperature plasma is also known, but a method of converting carbon monoxide in gas into carbon dioxide using low-temperature plasma is particularly known.
- there is no known technique for using a hopcalite catalyst and low-temperature plasma in combination and thus it is not known that the activity of the hopcalite catalyst is improved by low-temperature plasma. Disclosure of the invention
- the inventor of the present invention has been studying the development of a technology for detoxifying a gas containing harmful components (for example, carbon monoxide and a nitric oxide compound) with high efficiency.
- a gas containing harmful components for example, carbon monoxide and a nitric oxide compound
- hopcalite catalyst has been found to have improved activity.
- a metal oxide oxidation catalyst e.g., hopcalite catalyst
- the present invention provides a method for generating low-temperature plasma in the presence of a metal oxide oxidation catalyst (for example, an oxidation catalyst containing metal oxides such as manganese oxide and copper oxide, in particular, a hopcalite catalyst or activated manganese dioxide). And a method for treating gas.
- a metal oxide oxidation catalyst for example, an oxidation catalyst containing metal oxides such as manganese oxide and copper oxide, in particular, a hopcalite catalyst or activated manganese dioxide.
- the gas is oxidized (for example, harmful components in the gas to be treated, for example, carbon monoxide or nitrogen monoxide are oxidized to carbon dioxide or nitrogen dioxide, respectively). Or decompose volatile organic compounds or deodorize odors.
- the present invention has a low-temperature plasma generating section for holding a metal oxide oxidation catalyst (for example, an oxidation catalyst containing a metal oxide such as manganese oxide and copper oxide, particularly, a hopcalite catalyst or activated manganese dioxide).
- a metal oxide oxidation catalyst for example, an oxidation catalyst containing a metal oxide such as manganese oxide and copper oxide, particularly, a hopcalite catalyst or activated manganese dioxide.
- the low-temperature plasma generating section includes a cylindrical electrode, and a rod-shaped electrode arranged at a position of a center axis of the cylindrical electrode. Either a metal oxide oxidation catalyst supported so that the catalyst surface is exposed, or a metal oxide oxidation catalyst filled between the cylindrical electrode and the rod-shaped electrode is provided.
- the low-temperature plasma generating section includes: a cylindrical insulator; a cylindrical electrode provided in contact with an outer surface of the cylindrical insulator; A plurality of strip electrodes arranged on the inner surface of the insulator; and a metal oxide oxidation catalyst also arranged on the inner surface of the cylindrical insulator, wherein the strip electrodes are cylindrical insulating.
- the metal oxide oxidation catalyst extends axially parallel to each other on the inner surface of the body, and the metal oxide oxidation catalyst is supported between the band-shaped electrodes so that the particulate catalyst surface is exposed, or It is filled inside the cylindrical insulator.
- the low-temperature plasma generating section includes a plurality of cylindrical electrodes divided into two groups that mutually discharge each other inside the housing, and a catalyst surface is formed on the cylindrical electrode surface. Either a metal oxide oxidation catalyst supported so as to be exposed is provided, or a metal oxide oxidation catalyst filled inside the housing is provided.
- the low-temperature plasma generating section includes: (a) a cylindrical electrode including: (a) a core electrode; and a cylindrical insulating sheath body surrounding the core electrode.
- a metal oxide oxide catalyst comprising: a protective electrode; and (b) a conductive mesh electrode; and a metal oxide oxidation catalyst supported on the conductive mesh electrode so that a catalyst surface is exposed. It has a metal oxide oxidation catalyst filled inside.
- Fig. 1 is a schematic diagram of a low-temperature plasma generator according to the present invention in which a metal oxide oxidation catalyst is dispersed and supported on the inner wall of a cylinder of a coaxial cylindrical low-temperature plasma generator having a cylindrical electrode and a rod-shaped electrode. It is a perspective view.
- FIG. 2 is a schematic sectional view of the low-temperature plasma generator of FIG.
- FIG. 3 is a schematic diagram of a low-temperature plasma generator according to the present invention in which a metal oxide oxidation catalyst is filled inside a cylinder of a coaxial cylindrical low-temperature plasma generator similar to FIG. 1 having a cylindrical electrode and a rod-shaped electrode.
- FIG. 1 is a schematic sectional view of the low-temperature plasma generator of FIG.
- FIG. 3 is a schematic diagram of a low-temperature plasma generator according to the present invention in which a metal oxide oxidation catalyst is filled inside a cylinder of a coaxial cylindrical low-temperature plasma generator similar to FIG. 1 having a cylindrical electrode and a rod-shaped electrode.
- Fig. 4 is a schematic diagram of a low-temperature plasma generator according to the present invention in which a metal oxide oxidation catalyst is dispersed and supported on the inner wall of a cylinder of a creeping discharge type low-temperature plasma generator having a cylindrical electrode and a strip electrode. It is a perspective view.
- FIG. 5 is a schematic cross-sectional view of the creeping discharge type low-temperature plasma generator of FIG.
- FIG. 6 is a schematic view of a low-temperature plasma generator according to the present invention in which a metal oxide oxidation catalyst is dispersed and supported on the surface of a column-shaped electrode group of a low-temperature plasma generation section having a column-shaped electrode group in a housing. It is a perspective view.
- FIG. 7 shows a low-temperature low-temperature plasma according to the present invention in which a metal oxide oxidation catalyst is dispersed and supported on the surface of a mesh-like electrode group of a low-temperature plasma generating section having a columnar electrode group and a mesh-like electrode group in a housing. It is a typical perspective view of a plasma generator.
- FIG. 8 is a schematic sectional view of the low-temperature plasma generator of FIG.
- FIG. 9 is a schematic sectional view of a typical embodiment of the device of the present invention. BEST MODE FOR CARRYING OUT THE INVENTION
- the gas to be treated by the method of the present invention and the apparatus of the present invention is not particularly limited as long as it is an oxidizable gaseous compound (that is, an inorganic compound or an organic compound).
- an oxidizable gaseous compound that is, an inorganic compound or an organic compound.
- Carbon monoxide, sulfur dioxide, hydrogen sulfide, or nitrogen oxides for example, nitric oxide
- the organic compound volatile organic compounds (VOC) can be mentioned.
- VOC volatile organic compounds
- the gas to be treated include air, and the oxidizable gaseous inorganic compound or gaseous organic compound which may be mixed in the air can be treated.
- the method and apparatus of the present invention are suitable for treating gases (e.g., polluted air) containing harmful components (e.g., carbon monoxide, nitric oxide, and / or volatile organic compounds), Suitable for treating gases containing low concentrations of harmful components.
- harmful components e.g., carbon monoxide, nitric oxide, and / or volatile organic compounds
- low concentration refers to the oxidizable compound (particularly, carbon monoxide, Nitrogen monoxide or volatile organic compounds) is preferably 1 ppm or less, more preferably 0.5 ppm or less.
- the volatile organic compound and (VOC), for example, alcohols, ketones, esters, ethers, or Fang aromatic compound (e.g., phenol, toluene, styrene, or benzene) in the c present invention is the By subjecting the gas to be treated to low-temperature plasma treatment in the presence of a metal oxide oxidation catalyst (for example, hopcalite catalyst), carbon monoxide contained in the gas to be treated is converted into carbon dioxide. Can be converted to nitrogen with high efficiency, and independently of this, nitric oxide can be converted to nitrogen dioxide with high efficiency and easily subjected to adsorption treatment and chemical treatment. VOCs can be decomposed (eg, converted to carbon dioxide and water) with high efficiency to detoxify them.
- the low-temperature plasma used in the present invention can be generated by a known method, for example, by electric discharge. As the discharge, for example, microwave discharge, AC discharge, or DC discharge can be used.
- Electrode pairs used in these discharge methods include, for example, parallel cylindrical electrodes, coaxial cylinders — rod electrodes, spherical gap electrodes, parallel plate electrodes, cylindrical single-plate electrodes, creeping discharge electrodes, or special electrodes (eg, blade electrodes) Can be mentioned.
- the electrode gap is set to about 1 Omm in a discharge using parallel plate electrodes, the gas between the electrodes can be turned into plasma by applying an AC voltage of tens to several tens of kV between the electrodes. it can.
- a known oxidation catalyst containing, for example, manganese oxide and copper oxide for example, a hopcalite catalyst can be used as the metal oxide oxidation catalyst.
- the metal oxide oxidation catalyst include the hopcalite catalyst and activated manganese dioxide.
- the hopcalite catalyst is manufactured by solidifying a mixture of manganese oxide, copper oxide, and other metal oxides (for example, potassium oxide, silver oxide, or cobalt oxide) into particles and drying or sintering the mixture. You.
- the shape of the metal oxide oxidation catalyst (for example, hopcalite catalyst) used in the present invention is not particularly limited, but it can be generally used in the form of powder or granules, for example, granules of about 1 to 3 mm.
- a metal oxide oxidation catalyst for a low-temperature plasma generation electrode for example, the arrangement of the hopcalite catalyst is not particularly limited as long as the activity of the metal oxide oxidation catalyst can be improved by low-temperature plasma.
- the metal oxide oxidation catalyst can be carried on the surface of all electrodes or the surface of some electrodes for generating low-temperature plasma.
- both of a pair of electrodes for discharging for example, an ungrounded electrode and a grounded electrode
- the electrode for example, an ungrounded electrode and a grounded electrode
- an adhesive can be used.
- an adhesive can be applied to the whole or a part of the electrode surface of the columnar electrode, and subsequently, a powdery or granular hopcalite catalyst can be shaken and fixed.
- the shape of the electrode may be a shape that is suitable for supporting a powdery or granular metal oxide oxidation catalyst (for example, hopcalite catalyst) and has air permeability, for example, a mesh shape.
- a powdery or granular metal oxide oxidation catalyst for example, hopcalite catalyst
- has air permeability for example, a mesh shape.
- a granular hopcalite catalyst having a mesh size smaller than the particle size of the granular hopcalite catalyst is simply placed on a mesh plate electrode arranged in the horizontal direction, and substantially the entire surface of the granular hopcalite catalyst is covered. It can be brought into contact with the processing gas.
- an adhesive can be used for fixing to the mesh-shaped flat electrode.
- the mesh-shaped flat electrode supporting the fixed granular hopcalite catalyst can be arranged in a direction other than the horizontal direction (for example, the vertical direction). it can. Further, an electrode having a form in which a granular hopcalite catalyst is confined inside a mesh-shaped three-
- a pair of electrodes for performing discharge is a combination of a non-grounded electrode and a grounded electrode, and a particulate hopcalite catalyst is carried or placed on the electrode surface, it is preferable to dispose it on the grounded electrode side.
- Powdered or granular metal oxide oxidation catalysts can be supported on portions other than the electrode surface (eg, the surface of the insulator in the surface discharge electrode). Can also be. In this case, the powdery or granular metal oxide oxidation catalyst is supported on portions other than the electrode surface, and the powdery or granular metal oxide oxidation catalyst is also supported or placed on the surface of each electrode. be able to.
- a metal oxide oxidation catalyst (particularly, a powdery or granular metal oxide oxidation catalyst) can be filled in the low-temperature plasma generation section.
- a metal oxide oxidation catalyst it is necessary to fill the space between the powdery or granular metal oxide oxidation catalysts so that the gas to be treated can pass through.
- FIG. 1 shows a low-temperature plasma generator 10 according to the present invention in which a metal oxide oxidation catalyst is dispersed and supported on the inner wall of a cylinder of a coaxial cylindrical low-temperature plasma generator having a cylindrical electrode and a rod-shaped electrode.
- FIG. 2 is a schematic perspective view, and FIG. 2 is a schematic sectional view thereof.
- the low-temperature plasma generator 10 includes a cylindrical electrode 12 and a rod-shaped electrode 11 arranged at a position of a center axis of the cylindrical electrode 12.
- a large number of granular hopcalite catalysts 13 supported by an appropriate method such as an adhesive so that the surface of the granular catalyst is exposed are provided on the inner surface of the cylindrical electrode 12.
- the gas to be treated G is inserted from one opening of the cylindrical electrode 12, and the treated gas C is exhausted from the other opening.
- the rod-shaped electrode 11 it is not necessary to ground both the rod-shaped electrode 11 and the cylindrical electrode 12, but it is preferable to ground either one from the viewpoint of operation safety.
- the rod-shaped electrode 11 be on the non-ground side and the cylindrical electrode 12 be on the ground side.
- the rod-shaped non-grounded electrode 11 is connected to the electric wire 17 A
- the cylindrical grounded electrode 12 is connected to the grounded electric wire 17 B.
- Each of the electric wires 17 A, 1 7 B is connected to an AC power supply 18 (shown only in FIG. 1), and applies a high voltage between the rod-shaped non-grounded electrode 11 and the cylindrical grounded electrode 12.
- FIG. 3 shows a low-temperature plasma according to the present invention in which a metal oxide oxidation catalyst is filled inside a cylinder of a coaxial cylindrical low-temperature plasma generation part similar to Fig. 1 having a cylindrical electrode and a rod-shaped electrode.
- FIG. 2 is a schematic cross-sectional view of the mass generation device 30.
- the low-temperature plasma generator 30 is, like the low-temperature plasma generator 10 shown in FIG. 1, a cylindrical electrode 32 and a rod-shaped electrode 31 arranged at the center axis of the cylindrical electrode 32. It has. Further, unlike the low-temperature plasma generator 10 shown in FIG. 1, the internal space of the cylindrical electrode 32 is filled with a number of granular hopcalite catalysts 33.
- a filter or the like be provided at the opening (not shown) for inflow of the gas to be treated and the opening (not shown) for discharging the treated gas so that the particulate hopcalite catalyst 33 is not discharged.
- the gas to be treated G (not shown) is inserted from one opening of the cylindrical electrode 32, and the treated gas C (not shown) is exhausted from the other opening.
- the rod-shaped electrode 31 and the cylindrical electrode 32 it is not necessary to ground both the rod-shaped electrode 31 and the cylindrical electrode 32, but it is preferable to ground either one from the viewpoint of operation safety.
- the rod-shaped electrode 31 be on the non-ground side and the cylindrical electrode 32 be on the ground side.
- the rod-shaped ungrounded electrode 31 is connected to a wire (not shown), and the cylindrical grounded electrode 32 is connected to a grounded wire (not shown). It is connected to a power supply (not shown), and applies a high voltage between the rod-shaped non-grounded electrode 31 and the cylindrical grounded electrode 32.
- FIG. 4 is a schematic perspective view of a low-temperature plasma generator 20 using a surface discharge electrode
- FIG. 5 is a schematic sectional view thereof.
- the low-temperature plasma generator 20 includes a cylindrical insulator 24 and a cylindrical electrode 21.
- the cylindrical electrode 21 is in contact with the outer surface of the cylindrical insulator 24.
- the strip electrodes 22 extend axially in parallel with each other on the inner surface of the cylindrical insulator 24. Further, a large number of granular hopcalite catalysts 23 are supported between the strip electrodes 22 by an appropriate method such as an adhesive.
- the gas to be treated G is inserted through one opening of the cylindrical insulator 24, and the treated gas C is exhausted through the other opening.
- neither the cylindrical electrode 21 nor the strip electrode 22 need be grounded, but it is preferable to ground either one from the viewpoint of operation safety. If one of them is grounded, the cylindrical electrode 21 should be on the non-ground side and the strip electrode 22 should be on the ground side. Preferably.
- the power supply and the electric wire are omitted in FIGS. 4 and 5, but the cylindrical non-grounded electrode 21 is connected to the electric wire, and the band-shaped grounded electrode 22 is grounded on the other side.
- Each of the two wires is connected to an AC power source, and a high voltage is applied between the cylindrical non-ground electrode and the belt-like ground electrode 22. As in the low-temperature plasma generator 20 shown in FIGS.
- the inside of the cylindrical insulator of the low-temperature plasma generator including the cylindrical insulator, the cylindrical electrode, and the strip electrode is shown in FIG. Similar to the low-temperature plasma generator 30, a large number of granular hopcalite catalysts can be filled. Also in this case, it is preferable to provide a filter or the like in the opening for inflow of the gas to be treated and the opening for discharging the treated gas.
- FIG. 6 is a schematic perspective view showing a part of the side wall of the housing 51 of the low-temperature plasma generator 50, which is cut away.
- the low-temperature plasma generator 50 has a substantially rectangular parallelepiped housing 51 provided with an opening 52 for inflow of the gas G to be treated and an opening 53 for exhaust of the treated gas C.
- a large number of columnar electrodes 54 are provided inside 1.
- the above-mentioned columnar electrode 54 is divided into two electrode groups. It is not necessary to ground these electrode groups, but it is preferable to ground either one from the viewpoint of operation safety.
- the columnar electrode 54 is a protective electrode (a) including a core electrode and a cylindrical insulating sheath surrounding the core electrode (for example, cylindrical glass). Electrode) and (b) a combination of a cylindrical exposed electrode (for example, a cylindrical stainless steel electrode) whose electrode surface can directly contact the gas to be treated, or only the protective electrode (a). Can consist of When the protective electrode (a) and the exposed electrode (b) are combined, the protective electrode (a) is used as the non-grounded electrode group 54 A, and the exposed electrode (b) is used as the grounded electrode group 54. B and granular hopcalite catalyst Preferably, 56 is carried on the exposed electrode (b).
- the low-temperature plasma generator 50 shown in FIG. 6 described above inside the housing of the low-temperature plasma generator having a columnar electrode group in the housing, like the low-temperature plasma generator 30 shown in FIG. A number of particulate hopcalite catalysts can also be packed. Also in this case, it is preferable to provide a filter or the like at the opening for inflow of the gas to be treated and the opening for discharge of the processed gas.
- FIG. 7 is a schematic perspective view showing a part of a side wall of a housing 61 of the low-temperature plasma generator 60
- FIG. 8 is a schematic sectional view thereof.
- the low-temperature plasma generator 60 has a substantially rectangular parallelepiped housing 61 provided with an opening 62 for inflow of the gas G to be treated and an opening 63 for exhaust of the treated gas C, and the housing
- a large number of cylindrical electrode groups 64 and a plurality of mesh electrode groups 69 are provided inside 61.
- Each of the columnar electrode groups 64 is a protective electrode (for example, a cylindrical glass electrode) including a core electrode and a cylindrical insulating sheath surrounding the core electrode ( mesh electrode).
- Group 69 can be a reticulated plate structure of a conductive material, for example, a metal (eg, stainless steel, a titanium alloy, or a nickel alloy).
- the mesh-shaped electrode group 69 has a large number of granular hopcalite catalysts 66 fixed and supported so that the surface is exposed by an appropriate method such as an adhesive or the upper surface of the mesh-shaped electrode group 69. It is provided with a large number of granular hopcalite catalysts 66 simply placed.
- neither the columnar electrode group 64 nor the mesh electrode group 69 need be grounded, but from the viewpoint of safety in operation. Preferably, one of them is grounded. When one of them is grounded, it is preferable that the columnar electrode group 64 be on the non-grounding side and the mesh electrode group 69 be on the grounding side. Further, although not shown in FIGS.
- the cylindrical electrode group 64 and the mesh electrode group 69 are respectively connected to electric wires, and the electric wires are connected to an AC power supply.
- the wires connected to the grounding electrode group (especially the mesh-like grounding electrode group 69) are grounded.
- a high voltage is applied between the cylindrical electrode group 64 and the mesh electrode group 69.
- the mesh-shaped flat electrode group 69 carries the granular hopcalite catalyst 66 simply on its surface (in an unfixed state), as shown in FIGS.
- the mesh of the mesh-shaped flat electrode group 69 must be smaller than the particle size of the granular hopcalite catalyst 66.
- the mesh-shaped flat electrode group 69 carries the granular hopcalite catalyst 66 on its surface by fixing it with an appropriate method such as an adhesive
- the mesh-shaped flat electrode group 69 is The arrangement direction ⁇ screen is not particularly limited.
- FIG. 9 shows a typical embodiment of the device of the present invention.
- the gas processing apparatus 9 shown in FIG. 9 includes a low-temperature plasma generator 1 supporting a hopcalite catalyst. Further, the low-temperature plasma generator 1 is provided with a transfer pipe 8a as a supply means capable of supplying a gas to be treated (for example, polluted air) G, and the gas to be treated G is supplied to the low-temperature plasma. It can be introduced inside the generator 1. At the tip of the transfer pipe 8a, a gas to be treated (not shown) capable of continuously or intermittently taking in the gas to be treated G is provided.
- a gas to be treated (not shown) capable of continuously or intermittently taking in the gas to be treated G is provided.
- a transfer pipe 8b for transferring the processed gas C from the low-temperature plasma generator 1 to the exhaust port 5 is provided.
- a forced air supply fan 6 can be provided downstream of the low-temperature plasma generator 1 via a transfer pipe 8b if necessary.
- downstream and upstream mean downstream and upstream with respect to the flow direction of the gas to be treated G and the processed gas C, respectively.
- An exhaust port 5 for the treated gas C is provided downstream of the forced air supply fan 6 via a transfer pipe 8c.
- a forced air supply fan may be provided in the transfer pipe 8a instead of, or in addition to, the forced air supply fan 6.
- the gas G to be treated is introduced into the low-temperature plasma generator 1 from the transfer pipe 8a. Subsequently, when low-temperature plasma is generated inside the low-temperature plasma generator 1, radicals are generated by the low-temperature plasma. In addition, low temperature plasma The activity of the light catalyst is improved. Therefore, by the action of the radical and the hopcalite catalyst, the carbon monoxide to be treated G is oxidized to carbon dioxide with high efficiency, and the volatile organic compound (VOC) is also decomposed into carbon dioxide and water with high efficiency. Is done. At the same time, odors are eliminated with high efficiency.
- VOC volatile organic compound
- the treated gas C thus obtained is exhausted from the exhaust port 5 via the transfer pipe 8c by the forced air supply fan 6 via the transfer pipe 8b.
- the gas treatment apparatus 9 can treat the gas to be treated batchwise or preferably continuously. Particularly in the case of continuous treatment, the contaminants (especially carbon monoxide, nitrogen monoxide, and VOC) in the gas to be treated can be treated. ) Changes, it is possible to provide various concentration sensors in the transfer pipe 8a, the transfer pipe 8b, and / or the exhaust port 5 to control the gas flow rate and / or applied voltage of the gas to be treated. it can. Action
- the mechanism by which the activity of a metal oxide oxidation catalyst for example, a hopcalite catalyst
- low-temperature plasma a combination of metal oxide oxidation catalysts and low-temperature plasma can be used to detoxify carbon monoxide, nitrogen monoxide, or volatile organic compounds in the gas to be treated with unexpectedly high efficiency.
- a metal oxide oxidation catalyst for example, a hopcalite catalyst
- low-temperature plasma can be used to detoxify carbon monoxide, nitrogen monoxide, or volatile organic compounds in the gas to be treated with unexpectedly high efficiency.
- the present invention is not limited to the following inference.
- the hopcalite catalyst shows sufficient activity in a dry state, but is inactivated when it contains moisture.
- the hopcalite catalyst is used in combination with the low-temperature plasma. When low-temperature plasma is generated, the temperature of the discharge electrode Since it rises, even if the humidity of the gas to be treated is relatively high, the hopcalite catalyst is easily maintained in a dry state, and deactivation of the hopcalite catalyst can be avoided.
- ozone is generated together with the generation of radicals by the low-temperature plasma.
- Ozone is typically consumed mostly in the gas treatment process, but some may be exhausted with the treated gas without being consumed. Since the discharge of ozone is not preferable, a conventionally known low-temperature plasma-type gas processing apparatus needs to arrange a porous adsorbent (for example, activated carbon) at an outlet for ozone adsorption.
- porous adsorbents also adsorb dust contained in gases. The dust thus adsorbed by the porous adsorbent becomes a medium suitable for the growth of microorganisms.
- the growth of microorganisms is suppressed because ozone is generated, but when the operation of the low-temperature plasma type gas treatment equipment is stopped, the growth of microorganisms is suppressed. As a result, microorganisms will propagate on the porous adsorbent. When the operation of the low-temperature plasma type gas processing apparatus is restarted in this state, microorganisms will be discharged together with the processed gas.
- the conventional low-temperature plasma-type gas processing apparatus has these disadvantages.
- the metal oxide oxidation catalyst (eg, hopcalite catalyst) used in the present invention has an ozone decomposing property, and therefore, a porous adsorbent (eg, activated carbon) is disposed at the outlet for ozone adsorption. There is no need to do this or use can be reduced.
- the dust contained in the gas to be treated mainly adheres to the electrode surface, and the metal oxide oxidation catalyst carried on the electrode surface has an antibacterial activity. It is also suppressed from becoming a medium for microorganisms. Therefore, according to the present invention, even if the operation of the device is stopped and the operation is restarted, microbes can be eliminated or reduced in the treated gas.
- the present invention exhibits an excellent treatment effect, for example, polluted air containing low concentrations of carbon monoxide, nitric oxide, and Z or VOC, for example, polluted air containing automobile exhaust gas, etc.
- Suitable for treating air air in rooms that are not ventilated using long-term heating systems, and contaminated air containing tobacco smoke (eg, air in smoking rooms).
- the present invention can eliminate or reduce microorganisms from the treated gas, and therefore it is desirable to supply a sterilized or sterilized gas. It can also be suitably applied to air purifiers used in new environments (for example, medical institutions and homes).
- the cold plasma generator 1 in the gas processing device 9, shown in Figure 6 to structure similar
- a low-temperature plasma generator 50 having the following was used.
- the total number of the group 54B and the group 54A of the non-ground side cylindrical glass electrodes not supporting the hopcalite catalyst was 74, and the distance between the electrodes was 4.75 mm.
- the hopcalite catalyst particles were supported on the surface of the cylindrical exposed SUS electrode 54 B at a density of about 0.17 g / cm 2 .
- the gas to be treated smoke from smokers was collected and used in polytetrafluoroethylene (Teflon) bags.
- the gas to be treated was introduced into the low-temperature plasma generator 1 (50) of the gas treatment device 9 from the transfer pipe 8a as the gas to be treated supply means (the low-temperature plasma was generated by setting the applied voltage to 8 kV.
- the test was performed under the conditions of a temperature of 22 ° C. and a humidity of 60% Subsequently, the treated gas was exhausted from the exhaust port 5 via the transfer pipe 8 c by the forced air supply fan 6.
- the processing capacity is determined by the concentration of volatile organic compounds (VOC) contained in the gas to be treated
- VOC volatile organic compounds
- the concentration of VOC contained in the treated gas treated by the gas treatment device of the present invention was measured, and the VOC removal rate by the gas treatment device of the present invention was calculated from the results.
- the treated gas sample was collected at the treated gas inlet and the treated gas sample was collected at the treated gas outlet.
- the measurement of the VOC concentration was carried out using a gas chromatograph mass spectrometer (Hület Packard; HP6890) equipped with a gas concentrator (Entec, Model I 7000). Table 1 shows the VOC measurement results and the VOC removal rates calculated from the results.
- Example 1 The processing capacity when low-temperature plasma was generated in the absence of a hopcalite catalyst was investigated. Specifically, the low-temperature plasma generator 50 used in Example 1 does not carry a hopcalite catalyst in place of the ground-side cylindrical exposed S US electrode group 54 B carrying a hop-light catalyst. The test was performed in the same manner as in Example 1 except that the gas processing apparatus 9 including the low-temperature plasma generator having the ground-side cylindrical exposed SUS electrode group was used.
- Table 1 shows the VOC concentration of each of the gas to be treated and the treated gas, and the VOC removal rate.
- the processing capacity was investigated when the gas was treated only with the hopcalite catalyst without generating low-temperature plasma. Specifically, in the low-temperature plasma generator 50 used in Example 1, a test was performed in the same manner as in Example 1 except that the gas to be treated was processed without applying a voltage.
- Table 1 shows the VOC concentration of each of the gas to be treated and the treated gas, and the VOC removal rate.
- the activity of a metal oxide oxidation catalyst is improved by low-temperature plasma, so that harmful components (for example, carbon monoxide, nitrogen monoxide, Organic compounds) with high efficiency to make them harmless and to make odors odorless. Furthermore, microorganisms can be eliminated or reduced from the treated gas.
- a metal oxide oxidation catalyst for example, a hopcalite catalyst
- harmful components for example, carbon monoxide, nitrogen monoxide, Organic compounds
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US10/560,980 US7347979B2 (en) | 2003-06-17 | 2004-03-30 | Gas processing method and gas processing apparatus utilizing oxidation catalyst and low-temperature plasma |
CA002529732A CA2529732A1 (en) | 2003-06-17 | 2004-03-30 | Gas processing method and gas processing apparatus utilizing oxidation catalyst and low-temperature plasma |
JP2005507181A JPWO2004112940A1 (ja) | 2003-06-17 | 2004-03-30 | 酸化触媒と低温プラズマとを利用する気体処理方法及び気体処理装置 |
EP04724399A EP1649923A4 (en) | 2003-06-17 | 2004-03-30 | GAS TREATMENT METHOD AND GAS TREATMENT DEVICE USING AN OXIDATION CATALYST AND LOW TEMPERATURE PLASMA |
AU2004249019A AU2004249019A1 (en) | 2003-06-17 | 2004-03-30 | Gas processing method and gas processing apparatus utilizing oxidation catalyst and low-temperature plasma |
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Also Published As
Publication number | Publication date |
---|---|
JPWO2004112940A1 (ja) | 2006-07-27 |
EP1649923A1 (en) | 2006-04-26 |
CN100482323C (zh) | 2009-04-29 |
US20070098614A1 (en) | 2007-05-03 |
EP1649923A4 (en) | 2007-05-16 |
US7347979B2 (en) | 2008-03-25 |
KR20060026424A (ko) | 2006-03-23 |
CN1809413A (zh) | 2006-07-26 |
CA2529732A1 (en) | 2004-12-29 |
AU2004249019A1 (en) | 2004-12-29 |
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