WO2002051905A8 - Photobase generators, curable compositions prepared by using the same and process of curing - Google Patents

Photobase generators, curable compositions prepared by using the same and process of curing

Info

Publication number
WO2002051905A8
WO2002051905A8 PCT/JP2001/011528 JP0111528W WO02051905A8 WO 2002051905 A8 WO2002051905 A8 WO 2002051905A8 JP 0111528 W JP0111528 W JP 0111528W WO 02051905 A8 WO02051905 A8 WO 02051905A8
Authority
WO
WIPO (PCT)
Prior art keywords
generators
curing
curable compositions
compositions prepared
same
Prior art date
Application number
PCT/JP2001/011528
Other languages
French (fr)
Japanese (ja)
Other versions
WO2002051905A1 (en
Inventor
Shigeki Katogi
Original Assignee
Hitachi Chemical Co Ltd
Shigeki Katogi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Shigeki Katogi filed Critical Hitachi Chemical Co Ltd
Priority to AU2002225369A priority Critical patent/AU2002225369A1/en
Priority to KR1020037007865A priority patent/KR100566792B1/en
Priority to CNB018213545A priority patent/CN1326904C/en
Priority to JP2002553391A priority patent/JP3912287B2/en
Publication of WO2002051905A1 publication Critical patent/WO2002051905A1/en
Publication of WO2002051905A8 publication Critical patent/WO2002051905A8/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C243/00—Compounds containing chains of nitrogen atoms singly-bound to each other, e.g. hydrazines, triazanes
    • C07C243/40—Hydrazines having nitrogen atoms of hydrazine groups being quaternised

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Materials For Photolithography (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)

Abstract

Photobase generators capable of generating bases by irradiation with rays having wavelengths of 150 to 750nm, which generators are amineimide compounds represented by the general formula (|) or (||); curable compositions prepared by using the generators; and a process of curing with the generators: (|) (||) wherein R1's, R2's, and R3's are each independently hydrogen, C1-8 alkyl, C1-8 alkoxy, C1-8 alkylidene, C4-8 cycloalkyl, C4-8 cycloalkenyl, C1-6 phenoxyalkyl, substituted or unsubstituted phenyl, or substituted or unsubstituted benzyl; R4's are each independently C1-5 alkyl, hydroxyl, C4-8 cycloalkyl, C1-5 alkoxy, or phenyl; and Ar1 and Ar2 are each an aromatic group.
PCT/JP2001/011528 2000-12-27 2001-12-27 Photobase generators, curable compositions prepared by using the same and process of curing WO2002051905A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2002225369A AU2002225369A1 (en) 2000-12-27 2001-12-27 Photobase generators, curable compositions prepared by using the same and process of curing
KR1020037007865A KR100566792B1 (en) 2000-12-27 2001-12-27 Photobase generators, curable compositions prepared by using the same and process of curing
CNB018213545A CN1326904C (en) 2000-12-27 2001-12-27 Photobase generators, curable compositions prepared by using same and process of curing
JP2002553391A JP3912287B2 (en) 2000-12-27 2001-12-27 Photobase generator and curable composition and curing method using the same

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000398467 2000-12-27
JP2000-398467 2000-12-27
JP2001-129582 2001-04-26
JP2001129582 2001-04-26

Publications (2)

Publication Number Publication Date
WO2002051905A1 WO2002051905A1 (en) 2002-07-04
WO2002051905A8 true WO2002051905A8 (en) 2004-05-13

Family

ID=26606884

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/011528 WO2002051905A1 (en) 2000-12-27 2001-12-27 Photobase generators, curable compositions prepared by using the same and process of curing

Country Status (6)

Country Link
JP (2) JP3912287B2 (en)
KR (1) KR100566792B1 (en)
CN (1) CN1326904C (en)
AU (1) AU2002225369A1 (en)
TW (1) TWI245778B (en)
WO (1) WO2002051905A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7440033B2 (en) 2020-01-10 2024-02-28 株式会社レゾナック Photocurable resin composition and adhesive

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6835513B2 (en) 2002-03-28 2004-12-28 Samsung Electronic Co., Ltd. Carbazole based charge transport compounds
KR100641358B1 (en) 2004-09-23 2006-11-01 삼성전자주식회사 method of fabricating ink-jet print head using photocurable resin composition
EP2000299A4 (en) 2006-03-24 2009-08-05 Konica Minolta Med & Graphic Transparent barrier sheet and method for producing transparent barrier sheet
JP5057016B2 (en) * 2006-06-26 2012-10-24 株式会社スリーボンド Amine imide compound activated by irradiation of active energy ray, composition using the same, and curing method thereof
CN101553549B (en) * 2006-12-14 2013-02-20 旭化成电子材料株式会社 Photobase generator and photocurable resin composition
JP5486927B2 (en) * 2007-12-28 2014-05-07 三井化学株式会社 Latent curing agent, epoxy resin composition containing the same, sealing agent and organic EL display
JP5682311B2 (en) * 2008-12-02 2015-03-11 和光純薬工業株式会社 Photobase generator
JP5549819B2 (en) * 2009-06-17 2014-07-16 スリーボンドファインケミカル株式会社 Base and radical generator, composition using the same and method of curing the same
WO2013089100A1 (en) 2011-12-16 2013-06-20 株式会社スリーボンド Curable resin composition
US20160152783A1 (en) 2013-07-18 2016-06-02 Cemedine Co., Ltd. Photocurable composition
CN105829485B (en) 2013-12-13 2018-10-12 思美定株式会社 Photocurable composition with adhesiveness
JP6811949B2 (en) * 2016-03-04 2021-01-13 学校法人東京理科大学 Photocurable composition
TWI758475B (en) * 2017-05-10 2022-03-21 學校法人東京理科大學 Active energy ray-curable composition, method for producing cured film and cured product
WO2019116931A1 (en) * 2017-12-12 2019-06-20 学校法人東京理科大学 Active energy ray-curable composition
CN112334562B (en) * 2018-06-26 2024-04-09 日东电工株式会社 Sealant sheet
JP6877791B2 (en) * 2020-03-09 2021-05-26 学校法人東京理科大学 Base conversion breeding agent
CN118302470A (en) * 2021-12-28 2024-07-05 旭化成株式会社 Epoxy resin composition, cured product, sealing material, and adhesive

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2830953A1 (en) * 1978-07-14 1980-01-24 Bayer Ag AMMONIUM SALTS OF ALPHA KETOCARBONIC ACIDS
DE3365773D1 (en) * 1982-02-26 1986-10-09 Ciba Geigy Ag Coloured photo-hardenable composition
DE3577859D1 (en) * 1985-02-14 1990-06-28 Mitsubishi Electric Corp EPOXY RESIN COMPOSITION.
EP0555749B1 (en) * 1992-02-14 1999-05-19 Shipley Company Inc. Radiation sensitive compositions and processes
GB9420107D0 (en) * 1994-10-05 1994-11-16 Kemira Coatings Limted Polyurethane composition
JPH10139748A (en) * 1996-11-08 1998-05-26 Chugoku Marine Paints Ltd New amineimide compound
EP0898202B1 (en) * 1997-08-22 2000-07-19 Ciba SC Holding AG Photogeneration of amines from alpha-aminoacetophenones

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7440033B2 (en) 2020-01-10 2024-02-28 株式会社レゾナック Photocurable resin composition and adhesive

Also Published As

Publication number Publication date
JP3912287B2 (en) 2007-05-09
TWI245778B (en) 2005-12-21
CN1326904C (en) 2007-07-18
CN1531562A (en) 2004-09-22
JP2006328427A (en) 2006-12-07
WO2002051905A1 (en) 2002-07-04
JPWO2002051905A1 (en) 2004-04-22
JP4555995B2 (en) 2010-10-06
AU2002225369A1 (en) 2002-07-08
KR20030077553A (en) 2003-10-01
KR100566792B1 (en) 2006-04-03

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