AU2002225369A1 - Photobase generators, curable compositions prepared by using the same and process of curing - Google Patents

Photobase generators, curable compositions prepared by using the same and process of curing

Info

Publication number
AU2002225369A1
AU2002225369A1 AU2002225369A AU2002225369A AU2002225369A1 AU 2002225369 A1 AU2002225369 A1 AU 2002225369A1 AU 2002225369 A AU2002225369 A AU 2002225369A AU 2002225369 A AU2002225369 A AU 2002225369A AU 2002225369 A1 AU2002225369 A1 AU 2002225369A1
Authority
AU
Australia
Prior art keywords
curing
same
curable compositions
compositions prepared
photobase generators
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002225369A
Inventor
Shigeki Katogi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of AU2002225369A1 publication Critical patent/AU2002225369A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C243/00—Compounds containing chains of nitrogen atoms singly-bound to each other, e.g. hydrazines, triazanes
    • C07C243/40—Hydrazines having nitrogen atoms of hydrazine groups being quaternised
AU2002225369A 2000-12-27 2001-12-27 Photobase generators, curable compositions prepared by using the same and process of curing Abandoned AU2002225369A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000398467 2000-12-27
JP2000-398467 2000-12-27
JP2001129582 2001-04-26
JP2001-129582 2001-04-26
PCT/JP2001/011528 WO2002051905A1 (en) 2000-12-27 2001-12-27 Photobase generators, curable compositions prepared by using the same and process of curing

Publications (1)

Publication Number Publication Date
AU2002225369A1 true AU2002225369A1 (en) 2002-07-08

Family

ID=26606884

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002225369A Abandoned AU2002225369A1 (en) 2000-12-27 2001-12-27 Photobase generators, curable compositions prepared by using the same and process of curing

Country Status (6)

Country Link
JP (2) JP3912287B2 (en)
KR (1) KR100566792B1 (en)
CN (1) CN1326904C (en)
AU (1) AU2002225369A1 (en)
TW (1) TWI245778B (en)
WO (1) WO2002051905A1 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6835513B2 (en) 2002-03-28 2004-12-28 Samsung Electronic Co., Ltd. Carbazole based charge transport compounds
KR100641358B1 (en) 2004-09-23 2006-11-01 삼성전자주식회사 method of fabricating ink-jet print head using photocurable resin composition
JPWO2007111092A1 (en) 2006-03-24 2009-08-06 コニカミノルタエムジー株式会社 Transparent barrier sheet and method for producing transparent barrier sheet
JP5057016B2 (en) * 2006-06-26 2012-10-24 株式会社スリーボンド Amine imide compound activated by irradiation of active energy ray, composition using the same, and curing method thereof
WO2008072651A1 (en) * 2006-12-14 2008-06-19 Asahi Kasei Chemicals Corporation Photobase generator and photocurable resin composition
TWI423997B (en) * 2007-12-28 2014-01-21 Mitsui Chemicals Inc Latent curing agent, epoxy resin composition containing the same, seal agent and organic electro-luminescence display
WO2010064631A1 (en) * 2008-12-02 2010-06-10 和光純薬工業株式会社 Photobase generator
CN102803205B (en) 2009-06-17 2015-12-16 三键精密化学有限公司 Alkali and free-radical generating agent, use its composition and solidify the method for described composition
WO2013089100A1 (en) 2011-12-16 2013-06-20 株式会社スリーボンド Curable resin composition
US20160152783A1 (en) 2013-07-18 2016-06-02 Cemedine Co., Ltd. Photocurable composition
EP3081612B1 (en) 2013-12-13 2018-11-14 Cemedine Co., Ltd. Photocurable composition having adhesive properties
JP6811949B2 (en) * 2016-03-04 2021-01-13 学校法人東京理科大学 Photocurable composition
CN110382597A (en) * 2017-05-10 2019-10-25 学校法人东京理科大学 Curable with actinic energy ray composition, the manufacturing method of cured film and hardening thing
KR20200091883A (en) * 2017-12-12 2020-07-31 갓코호우징 도쿄리카다이가쿠 Active energy ray curable composition
CN112368354B (en) * 2018-06-26 2024-04-09 日东电工株式会社 Sealant sheet
JP7440033B2 (en) 2020-01-10 2024-02-28 株式会社レゾナック Photocurable resin composition and adhesive
JP6877791B2 (en) * 2020-03-09 2021-05-26 学校法人東京理科大学 Base conversion breeding agent
KR20240044519A (en) * 2021-12-28 2024-04-04 아사히 가세이 가부시키가이샤 Epoxy resin compositions, cured products, sealants and adhesives

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2830953A1 (en) * 1978-07-14 1980-01-24 Bayer Ag AMMONIUM SALTS OF ALPHA KETOCARBONIC ACIDS
EP0088050B1 (en) * 1982-02-26 1986-09-03 Ciba-Geigy Ag Coloured photo-hardenable composition
DE3577859D1 (en) * 1985-02-14 1990-06-28 Mitsubishi Electric Corp EPOXY RESIN COMPOSITION.
DE69324942T2 (en) * 1992-02-14 1999-10-07 Shipley Co Radiation sensitive compositions and methods
GB9420107D0 (en) * 1994-10-05 1994-11-16 Kemira Coatings Limted Polyurethane composition
JPH10139748A (en) * 1996-11-08 1998-05-26 Chugoku Marine Paints Ltd New amineimide compound
EP0898202B1 (en) * 1997-08-22 2000-07-19 Ciba SC Holding AG Photogeneration of amines from alpha-aminoacetophenones

Also Published As

Publication number Publication date
TWI245778B (en) 2005-12-21
WO2002051905A8 (en) 2004-05-13
WO2002051905A1 (en) 2002-07-04
KR20030077553A (en) 2003-10-01
JP4555995B2 (en) 2010-10-06
JP2006328427A (en) 2006-12-07
KR100566792B1 (en) 2006-04-03
JPWO2002051905A1 (en) 2004-04-22
CN1326904C (en) 2007-07-18
CN1531562A (en) 2004-09-22
JP3912287B2 (en) 2007-05-09

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase